KR920013692U - 화학약품에 의한 웨이퍼 식각(etching)장치 - Google Patents

화학약품에 의한 웨이퍼 식각(etching)장치

Info

Publication number
KR920013692U
KR920013692U KR2019900019577U KR900019577U KR920013692U KR 920013692 U KR920013692 U KR 920013692U KR 2019900019577 U KR2019900019577 U KR 2019900019577U KR 900019577 U KR900019577 U KR 900019577U KR 920013692 U KR920013692 U KR 920013692U
Authority
KR
South Korea
Prior art keywords
chemicals
etching device
wafer etching
wafer
etching
Prior art date
Application number
KR2019900019577U
Other languages
English (en)
Other versions
KR930006786Y1 (ko
Inventor
한경섭
Original Assignee
금성일렉트론 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 금성일렉트론 주식회사 filed Critical 금성일렉트론 주식회사
Priority to KR2019900019577U priority Critical patent/KR930006786Y1/ko
Publication of KR920013692U publication Critical patent/KR920013692U/ko
Application granted granted Critical
Publication of KR930006786Y1 publication Critical patent/KR930006786Y1/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Weting (AREA)
KR2019900019577U 1990-12-12 1990-12-12 화학약품에 의한 웨이퍼 식각(etching)장치 KR930006786Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019900019577U KR930006786Y1 (ko) 1990-12-12 1990-12-12 화학약품에 의한 웨이퍼 식각(etching)장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019900019577U KR930006786Y1 (ko) 1990-12-12 1990-12-12 화학약품에 의한 웨이퍼 식각(etching)장치

Publications (2)

Publication Number Publication Date
KR920013692U true KR920013692U (ko) 1992-07-27
KR930006786Y1 KR930006786Y1 (ko) 1993-10-06

Family

ID=19306817

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019900019577U KR930006786Y1 (ko) 1990-12-12 1990-12-12 화학약품에 의한 웨이퍼 식각(etching)장치

Country Status (1)

Country Link
KR (1) KR930006786Y1 (ko)

Also Published As

Publication number Publication date
KR930006786Y1 (ko) 1993-10-06

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