KR920000590B1 - 박막 제조방법 - Google Patents
박막 제조방법 Download PDFInfo
- Publication number
- KR920000590B1 KR920000590B1 KR1019860005952A KR860005952A KR920000590B1 KR 920000590 B1 KR920000590 B1 KR 920000590B1 KR 1019860005952 A KR1019860005952 A KR 1019860005952A KR 860005952 A KR860005952 A KR 860005952A KR 920000590 B1 KR920000590 B1 KR 920000590B1
- Authority
- KR
- South Korea
- Prior art keywords
- thin film
- predetermined
- metal
- reaction gas
- insulating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/027—Graded interfaces
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Insulating Bodies (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60-160216 | 1985-07-22 | ||
| JP60160216A JPS6222314A (ja) | 1985-07-22 | 1985-07-22 | 薄膜製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR870001326A KR870001326A (ko) | 1987-03-13 |
| KR920000590B1 true KR920000590B1 (ko) | 1992-01-16 |
Family
ID=15710240
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019860005952A Expired KR920000590B1 (ko) | 1985-07-22 | 1986-07-22 | 박막 제조방법 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPS6222314A (https=) |
| KR (1) | KR920000590B1 (https=) |
| DE (1) | DE3624772A1 (https=) |
| GB (1) | GB2178064A (https=) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63303054A (ja) * | 1987-06-04 | 1988-12-09 | Toyota Motor Corp | 多層膜の形成方法 |
| DE3726731A1 (de) * | 1987-08-11 | 1989-02-23 | Hartec Ges Fuer Hartstoffe Und | Verfahren zum aufbringen von ueberzuegen auf gegenstaende mittels magnetfeldunterstuetzter kathodenzerstaeubung im vakuum |
| DE3737404A1 (de) * | 1987-11-04 | 1989-05-18 | Bartl Josef Franz | Verfahren und einrichtung zur erzeugung haftfester vakuumbeschichtungen |
| GB9005321D0 (en) * | 1990-03-09 | 1990-05-02 | Matthews Allan | Modulated structure composites produced by vapour disposition |
| JPH04368A (ja) * | 1990-04-17 | 1992-01-06 | Riken Corp | 耐摩耗性被膜及びその製造法 |
| DE69428253T2 (de) | 1993-11-12 | 2002-06-27 | Ppg Industries Ohio, Inc. | Haltbare Sputterschicht aus Metalloxid |
| US5672386A (en) * | 1994-10-27 | 1997-09-30 | Kabushiki Kaisha Riken | Process for forming a coating of chromium and nitrogen having good wear resistance properties |
| US5587227A (en) * | 1994-10-27 | 1996-12-24 | Kabushiki Kaisha Riken | Coating of chromium and nitrogen having good wear resistance properties |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3791852A (en) * | 1972-06-16 | 1974-02-12 | Univ California | High rate deposition of carbides by activated reactive evaporation |
| JPS5941510B2 (ja) * | 1979-07-24 | 1984-10-08 | 双葉電子工業株式会社 | 酸化ベリリウム膜とその形成方法 |
| JPS58221271A (ja) * | 1982-06-18 | 1983-12-22 | Citizen Watch Co Ltd | イオンプレ−テイング法による被膜形成方法 |
| JPS60234965A (ja) * | 1984-05-04 | 1985-11-21 | Diesel Kiki Co Ltd | 薄膜製造方法 |
-
1985
- 1985-07-22 JP JP60160216A patent/JPS6222314A/ja active Granted
-
1986
- 1986-07-22 KR KR1019860005952A patent/KR920000590B1/ko not_active Expired
- 1986-07-22 GB GB08617904A patent/GB2178064A/en not_active Withdrawn
- 1986-07-22 DE DE19863624772 patent/DE3624772A1/de active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| DE3624772C2 (https=) | 1988-07-21 |
| JPH0467724B2 (https=) | 1992-10-29 |
| KR870001326A (ko) | 1987-03-13 |
| JPS6222314A (ja) | 1987-01-30 |
| GB2178064A (en) | 1987-02-04 |
| DE3624772A1 (de) | 1987-01-22 |
| GB8617904D0 (en) | 1986-08-28 |
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| Date | Code | Title | Description |
|---|---|---|---|
| A201 | Request for examination | ||
| PA0109 | Patent application |
St.27 status event code: A-0-1-A10-A12-nap-PA0109 |
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| PA0201 | Request for examination |
St.27 status event code: A-1-2-D10-D11-exm-PA0201 |
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| R17-X000 | Change to representative recorded |
St.27 status event code: A-3-3-R10-R17-oth-X000 |
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| PG1501 | Laying open of application |
St.27 status event code: A-1-1-Q10-Q12-nap-PG1501 |
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| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
St.27 status event code: A-1-2-D10-D21-exm-PE0902 |
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| T11-X000 | Administrative time limit extension requested |
St.27 status event code: U-3-3-T10-T11-oth-X000 |
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| T11-X000 | Administrative time limit extension requested |
St.27 status event code: U-3-3-T10-T11-oth-X000 |
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| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
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| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
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| G160 | Decision to publish patent application | ||
| PG1605 | Publication of application before grant of patent |
St.27 status event code: A-2-2-Q10-Q13-nap-PG1605 |
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| E701 | Decision to grant or registration of patent right | ||
| PE0701 | Decision of registration |
St.27 status event code: A-1-2-D10-D22-exm-PE0701 |
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| GRNT | Written decision to grant | ||
| PR0701 | Registration of establishment |
St.27 status event code: A-2-4-F10-F11-exm-PR0701 |
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| PR1002 | Payment of registration fee |
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| PR1001 | Payment of annual fee |
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| FPAY | Annual fee payment |
Payment date: 19970108 Year of fee payment: 6 |
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| PR1001 | Payment of annual fee |
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| LAPS | Lapse due to unpaid annual fee | ||
| PC1903 | Unpaid annual fee |
St.27 status event code: A-4-4-U10-U13-oth-PC1903 Not in force date: 19980117 Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE |
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