KR910003149A - 수성과산화수소 조성물 및 그것으로 인쇄 배선 판을 제조하는 방법 - Google Patents

수성과산화수소 조성물 및 그것으로 인쇄 배선 판을 제조하는 방법 Download PDF

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Publication number
KR910003149A
KR910003149A KR1019890010639A KR890010639A KR910003149A KR 910003149 A KR910003149 A KR 910003149A KR 1019890010639 A KR1019890010639 A KR 1019890010639A KR 890010639 A KR890010639 A KR 890010639A KR 910003149 A KR910003149 A KR 910003149A
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KR
South Korea
Prior art keywords
composition
hydrogen
general formula
alkyl
hydrogen peroxide
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KR1019890010639A
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English (en)
Inventor
에이 보우넌 브루스
이이 하이킬러 커어트
케이 윌리엄즈 로드니
Original Assignee
제임즈 제이 플린
이 아이 듀우판 디 네모아 앤드 캄파니
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 제임즈 제이 플린, 이 아이 듀우판 디 네모아 앤드 캄파니 filed Critical 제임즈 제이 플린
Publication of KR910003149A publication Critical patent/KR910003149A/ko

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/44—Compositions for etching metallic material from a metallic material substrate of different composition
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00—Etching, surface-brightening or pickling compositions
    • C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
    • C09K13/06—Etching, surface-brightening or pickling compositions containing an inorganic acid with organic material
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B15/00—Peroxides; Peroxyhydrates; Peroxyacids or salts thereof; Superoxides; Ozonides
    • C01B15/01—Hydrogen peroxide
    • C01B15/037—Stabilisation by additives
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/16—Acidic compositions
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/067—Etchants

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • ing And Chemical Polishing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Anti-Oxidant Or Stabilizer Compositions (AREA)

Abstract

내용 없음.

Description

수성과산화수소 조성물 및 그것으로 인쇄 배선 판을 제조하는 방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (14)

  1. 과산화수소 및 과산화수소에 녹는, 하기 일반식의 화합물로 구성된 안정화된 과산화수소 조성물 :
    상기식에서, X는 링킹(linking)기이고 Y는 금속 양이온 또는 H이다.
  2. 제1항에 있어서, X가 알킬부분이 1-13개 탄소원자를 함유하는 치환된 알킬인 조성물.
  3. 제1항에 있어서, X가 하기 일반식인 조성물 :
    상기식에서, R1및 R2는 각각 H 또는 C1-9알킬 또는 C5또는 C6포화또는 불포화 시클릭 기이고, m 및 n은, 각각 m과 n의 합이 12이하를 조건으로 하는, 0-9의 정수이다.
  4. 제3항에 있어서, R1및 R2가 같고 H 또는 C1-C4알킬인 조성물.
  5. 제1항에 있어서, Y가 수소인 조성물.
  6. 제3항에 있어서, Y가 수소인 조성물.
  7. 제1항에 있어서, 설퍼닐 산 화합물을 함유하는 조성물.
  8. 하기 (a)-(d)로 구성된 수성 화학적 부식제 조성물 : (a) 물 (b) 과산화 수소, (c) 무기산 (d) 과산화수소에 녹는, 일반식
    (여기서, X는 링킹기이고, Y는 금속 양이온이다.)
  9. 제8항에 있어서, X가 알킬 부분이 1-13개 탄소원자를 함유하는 치환된 알킬 부분인 조성물.
  10. 제8항에 있어서, X가 하기 일반식인 조성물 :
    상기식에서, R1및 R2는 각각 H 또는 C1-9알킬 또는 C5또는 C6포화 또는 불포화 시클릭 기이고, m 및 n은, 각각 m과 n의 합이 12이하인 조건을 가진, 1-9의 정수이다.
  11. 제10항에 있어서, R1및 R2가 같고 H 또는 C1-C4알킬인 조성물.
  12. 제8항에 있어서, Y가 수소인 조성물.
  13. 제10항에 있어서, Y가 수소인 조성물.
  14. 하기 (a)-(d)로 구성된 조성물을 가진 금속 부분을 함유하는 표면을 부식시키는 것으로 구성된 인쇄 배선판을 제조하는 방법 : (a) 물 (b) 과산화 수소, (c) 무기산 (d) 과산화수소에 녹는, 일반식
    의 화합물.(여기서, X는 링킹기이고, Y는 금속 양이온 또는 H이다.)
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019890010639A 1988-07-27 1989-07-26 수성과산화수소 조성물 및 그것으로 인쇄 배선 판을 제조하는 방법 KR910003149A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/224,803 US4915781A (en) 1988-07-27 1988-07-27 Stabilized hydrogen peroxide compositions
US224,803 1988-07-27

Publications (1)

Publication Number Publication Date
KR910003149A true KR910003149A (ko) 1991-02-27

Family

ID=22842281

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019890010639A KR910003149A (ko) 1988-07-27 1989-07-26 수성과산화수소 조성물 및 그것으로 인쇄 배선 판을 제조하는 방법

Country Status (14)

Country Link
US (1) US4915781A (ko)
EP (1) EP0353084A3 (ko)
JP (1) JPH02125886A (ko)
KR (1) KR910003149A (ko)
CN (1) CN1040184A (ko)
AU (1) AU613507B2 (ko)
BR (1) BR8903708A (ko)
DK (1) DK368489A (ko)
FI (1) FI893579A (ko)
IL (1) IL91114A0 (ko)
NO (1) NO893049L (ko)
NZ (1) NZ230080A (ko)
PT (1) PT91282A (ko)
ZA (1) ZA895726B (ko)

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Also Published As

Publication number Publication date
NO893049L (no) 1990-01-29
BR8903708A (pt) 1990-03-20
PT91282A (pt) 1990-02-08
DK368489A (da) 1990-01-28
FI893579A (fi) 1990-01-28
AU3900189A (en) 1990-02-01
AU613507B2 (en) 1991-08-01
IL91114A0 (en) 1990-03-19
ZA895726B (en) 1991-03-27
NO893049D0 (no) 1989-07-26
CN1040184A (zh) 1990-03-07
NZ230080A (en) 1990-08-28
FI893579A0 (fi) 1989-07-26
US4915781A (en) 1990-04-10
EP0353084A3 (en) 1990-04-18
JPH02125886A (ja) 1990-05-14
EP0353084A2 (en) 1990-01-31
DK368489D0 (da) 1989-07-26

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