KR900701749A - 치환 아세트아미드 유도체, 그의 제조법 및 이를 함유하는 항궤양제 - Google Patents

치환 아세트아미드 유도체, 그의 제조법 및 이를 함유하는 항궤양제

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KR900701749A
KR900701749A KR1019900700443A KR900700443A KR900701749A KR 900701749 A KR900701749 A KR 900701749A KR 1019900700443 A KR1019900700443 A KR 1019900700443A KR 900700443 A KR900700443 A KR 900700443A KR 900701749 A KR900701749 A KR 900701749A
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hydroxyethyl
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hydroxy
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노 자끼 가쯔오 시
가쯔유끼 이시이
이쿠오 우에다
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이베 사치아끼
제리아 신야꾸 고오교 가부시끼 가이샤
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Publication of KR900701749A publication Critical patent/KR900701749A/ko

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Abstract

내용 없음

Description

치환 아세트아미드 유도체, 그의 제조법 및 이를 함유하는 항궤양제
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (9)

  1. 다음 일반식(Ⅰ)
    [식중, Y는 피페리딘기, 1-피롤리디닐기 또는 3-히드록시-1-피롤리디닐기를 나타내고, Z는 다음(a)∼(e) (a)아미노기, (b)(식중, ℓ은 0내지 2의 정수, n은 1내지 3의 정수이며, R1은 히드록시기,1, 2-디히드록시에틸기, 1-히드록시에틸기, 2-페녹시-1-히드록시에틸기, 2-히드록시에톡시기, 저급알콕시카르보닐기, 2, 2-디메틸-1,3-디옥소란-4-일기 또는 저급아실옥시 메틸기를 나타낸다)로 표시되는 기, (c)(식중, R2는 아미노기, 저급알킬 아미노기, 디(2-히드록시에틸)아미노기, 저급알킬기 또는 저급알콕시기를 나타낸다)로 표시되는기, (d)(식중, R3및 R4는 수소원자 또는 저급알킬기를 나타낸다)로 표시되는 기,
    (식중, 1은 0내지 2의 정수, R5및 R6는 수소원자 또는 저급알킬기를 나타낸다)로 부터 선택된 기이다. 표시되는 치환 아세트아미드 유도체 및 그의 염.
  2. N-[3-[3-(피페리디노메틸)페녹시]프로필]-2-(2-히드록시에틸-1-티오)아세트아미드.
  3. 시클로텍스트린에 제1항 기체의 화합물을 포접시켜서 된 포접체.
  4. 일반식(Ⅱ)
    (식중, X는 할로겐원자, Y는 피페리디노기, 1-피롤리디닐기 또는 3-히드록시-1피롤리디닐기를 나타낸다]로 표시되는 아세트아미드 유도체와 일반식(Ⅲ)
    A-Za (Ⅲ)
    [식중, A는 수소원자, 칼륨원자 또는 나트륨원자를 나타내고, Za는 시아노기 또는 (b')-S-(CH2n)-R1(여기서, n은 1내지 3의 정수이며, R은 히드록시기, 1,2-디히드록시에틸기, 1-히드록시에틸기, 2-페녹시-1-히드록시에틸기, 2-히드록시에톡시기, 저급알콕시 카르보닐기, 2,2-디메틸-1,3-디옥소란-4-일 기 또는 저급아실옥시 메틸기를 나타낸다)로 표시되는 기이다]로 표시되는 화합물을 반응시킴을 특징으로 하는 일반식(Ⅰa)
    [식중, Y 및 Za는 전술한 바와 같다]로 표시되는 치환 아세트아미드 유도체의 제조법.
  5. 일반식(Ⅳ)
    [식중, Y는 피페리디노기, 1-피롤리디닐기 또는 3-히드록시-피롤리디닐기를 나타낸다]로 표시되는 아민 유도체와 일반식(V)
    B-Zb (Ⅴ)
    [식중, B는 저급알콕시 카르보닐메틸기, Zb는 다음(a)∼(e) (a)시아노기, (b)(식중, ℓ은 0내지 2의 정수, n은 1내지 3의 정수이며, R1a은 히드록시기,1, 2-디히드록시에틸기, 1-히드록시에틸기, 2-페녹시-1-히드록시에틸기, 2-히드록시 에톡시기 또는 2, 2-디메틸-1,3-디옥소란-4-일기를 나타낸다)로 표시되는 기, (c)(식중, R2a는 아미노기, 저급알콕시 아미노기, 디(2-히드록시에틸)아미노기 또는 저급알콕시기로 나타낸다)로 표시되는기, (d)(식중, R3및 R4는 수소원자 또는 저급알킬기를 나타낸다)로 표시되는 기.
    (식중, R5및 R6는 수소원자 또는 저급알킬기를 나타낸다)로 부터 선택된 기이다]로 표시되는 화합물을 반응시킴을 특징으로 하는 일반식(Ⅰb)
    [식중, Y 및 Zb는 전술한 바와 같다]로 표시되는 치환 아세트아미드 유도체의 제조법.
  6. 일반식(Ⅳ)
    [식중, Y는 피페리디노기, 1-피놀리디닐기 또는 3-히드록시-1-피놀리디닐기를 나타낸다]로 표시되는 아민유도체와 일반식(Ⅳ)
    [식중, n은 1내지 3의 정수를 나타낸다]로 표시되는 화합물을 반응시킴을 특징으로 하는 일반식(Ⅰc)
    [식중, Y는 전술한 바와 같다. n은 1내지 3의 정수를 나타낸다]로 표시되는 치환 아세트아미드 유도체의 제조법.
  7. 일반식(Ⅰe)
    [식중, Y는 피페리디노기, 1-피롤리디닐기 또는 3-히드록시-1-피롤리디닐기를 나타내며, R26는 저급알콕시기를 나타낸다]로 표시되는 아세트아미드 유도체와 일반식(Ⅶ)
    H-R2C(Ⅶ)
    [식중, R2C는 아미노기, 저급알킬 아미노기, 디(2-히드록시에틸)아미노기를 나타낸다]로 표시되는 화합물을 반응시킴을 특징으로 하는 일반식(Ⅰd)
    [식중, Y 및 R2C는 전술한 바와같다]로 표시되는 치환 아세트아미드 유도체의 제조법.
  8. 일반식(Ⅰg)
    [식중, Y는 피페리디노기, 1-피롤리디닐기 또는 3-히드록시-1-피롤리디닐기를 나타내고, Zc는 (b′)-S-(CH″2)-R1(식중, n은 1내지 3의 정수이며, R1은 히드록시기, 1,2-디히드록시에틸기, 1-히드록시에틸기, 2-페녹시-1-히드록시에틸기, 2-히드록시에톡시기, 저급알콕시 카르보닐기, 2,2-디메틸-1,3-디옥소란-4-일기 또는 저급아실옥시메틸기를 나타낸다)로 표시되는 기, 또는
    [식중, R5및 R6는 수소원자 또는 저급알킬기를 나타낸다)로 표시되는 기이다]로 표시되는 아세트아미드 유도체를 산화시킴을 특징으로 하는 일반식(Ⅰf)
    B식중, Y는 전술한 바와같다. Zd는[식중, q는 1 또는 2의 정수이며, n 및 R1은 전술한 바와같다]로 표시되는 기 또는
    [식중, q는 1또는 2의 정수이며, R5및 R6는 전술한 바와같다]로 표시되는 치환 아세트아미드 유도체의 제조법.
  9. 제1항 기재의 치환 아세트아미드 유도체 또는 그의 염 또는 이들과 시클로덱스트린과의 포접체를 유효성분으로 하는 항궤양제.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019900700443A 1988-07-05 1989-07-04 치환 아세트아미드 유도체, 그의 제조법 및 이를 함유하는 항궤양제 KR900701749A (ko)

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JP16582288 1988-07-05
JP165822/88 1988-07-05
PCT/JP1989/000670 WO1990000544A1 (en) 1988-07-05 1989-07-04 Substituted acetamide derivatives, process for their preparation and antiulcer drug containing same

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JPH0692948A (ja) * 1992-03-04 1994-04-05 Snow Brand Milk Prod Co Ltd 新規なアセタミド誘導体及びその用途
TW240222B (ko) 1992-03-23 1995-02-11 Sankyo Co
WO1994012473A1 (en) * 1992-11-20 1994-06-09 Kaken Pharmaceutical Co., Ltd. Acetamide derivative
KR100407720B1 (ko) * 2001-09-20 2003-12-01 경동제약 주식회사 N-[3-{3-(1-피페리디닐메틸)페녹시}프로필]아세톡시아세트아미드의 제조방법
US9598361B1 (en) 2016-04-12 2017-03-21 King Saud University Amino substituted acetamide derivative

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US4837316A (en) * 1985-08-29 1989-06-06 Fujirebio Kabushiki Kaisha Alkylamide derivatives with H2 -receptor antagonistic and cytoprotective action
JPH0662551B2 (ja) * 1985-08-29 1994-08-17 富士レビオ株式会社 置換フエノキシプロピルアミド誘導体およびその製造法

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