KR900701067A - 레이저 장치 - Google Patents

레이저 장치

Info

Publication number
KR900701067A
KR900701067A KR1019890700851A KR890700851A KR900701067A KR 900701067 A KR900701067 A KR 900701067A KR 1019890700851 A KR1019890700851 A KR 1019890700851A KR 890700851 A KR890700851 A KR 890700851A KR 900701067 A KR900701067 A KR 900701067A
Authority
KR
South Korea
Prior art keywords
perot
fabry
etalon
wavelength
gap
Prior art date
Application number
KR1019890700851A
Other languages
English (en)
Other versions
KR920009706B1 (ko
Inventor
하지메 나까따니
요시부미 미노와
히또시 와까따
Original Assignee
시기 모리야
미쯔비시덴끼 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP62241066A external-priority patent/JPS6484682A/ja
Priority claimed from JP3189388U external-priority patent/JPH01135756U/ja
Application filed by 시기 모리야, 미쯔비시덴끼 가부시끼가이샤 filed Critical 시기 모리야
Publication of KR900701067A publication Critical patent/KR900701067A/ko
Application granted granted Critical
Publication of KR920009706B1 publication Critical patent/KR920009706B1/ko

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/13Stabilisation of laser output parameters, e.g. frequency or amplitude
    • H01S3/136Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling devices placed within the cavity
    • H01S3/137Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling devices placed within the cavity for stabilising of frequency
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/106Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
    • H01S3/1062Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using a controlled passive interferometer, e.g. a Fabry-Perot etalon
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22Gases
    • H01S3/223Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
  • Spectrometry And Color Measurement (AREA)

Abstract

내용 없음

Description

레이저 장치
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제2도는 본 발명에 의한 레이저장치의 1 실시예를 도시한 구성도,
제3도는 촬상소자(22)상의 줄무늬의 강도분포를 도시한 도면,
제4도는 본 발명의 다른 실시예를 도시한 구성도,
제5 도는 본 발명의 또다른 실시예를 도시한 구성도.

Claims (3)

  1. 레이저발진파장을 선택하는 파브리-페로-에탈론을 갖고, 파장이 가변인 레이저발진기에서 인출된 레이저빔을 파장 모니터수단으로 모니터해서 상기 파장모니터수단의 출력신호에 따라 상기 파브리-페로-에탈론의 갭의 압력을 조정하는 레이저장치.
  2. 특허청구의 범위 제 1 항에 있어서, 파브리-페로-에탈론의 갭의 압력을 조정하기 위해 상기 파브리-페로-에탈론을 밀봉용기에 수용하고, 내용적인 신축 가능한 용적신축수단을 상기 밀봉용기와 접속하고, 상기 파장 모니터수단의 출력신호에 따라서 구동기구를 거쳐서 상기 용적 신축수단을 작동시키는 것을 특징으로 하는 레이저장치.
  3. 특허 청구의 범위 제 1 항에 있어서, 파브리-페로-에탈론의 갭의 압력을 조정하기 위해 상기 파브리-페로-에탈론을 밀봉용기에 수용하고,상기 밀봉용기에 유통하는 가스를 상기 출력신호에 따라서 조작하는 것에 의해 상기 파브리-페로-에탈론의 갭의 압력을 조정하는 것을 특징으로 하는 레이저 장치.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019890700851A 1987-09-26 1988-09-22 레이저장치 KR920009706B1 (ko)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
JP62-241066 1987-09-26
JP62241066A JPS6484682A (en) 1987-09-26 1987-09-26 Laser apparatus
JP87-241066 1987-09-26
JP63-31893 1988-03-10
JP88-31893(U) 1988-03-10
JP3189388U JPH01135756U (ko) 1988-03-10 1988-03-10
PCT/JP1988/000970 WO1989003132A1 (en) 1987-09-26 1988-09-22 Laser device

Publications (2)

Publication Number Publication Date
KR900701067A true KR900701067A (ko) 1990-08-17
KR920009706B1 KR920009706B1 (ko) 1992-10-22

Family

ID=26370406

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019890700851A KR920009706B1 (ko) 1987-09-26 1988-09-22 레이저장치

Country Status (5)

Country Link
US (1) US4977563A (ko)
EP (1) EP0336972B1 (ko)
KR (1) KR920009706B1 (ko)
DE (1) DE3889323T2 (ko)
WO (1) WO1989003132A1 (ko)

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US5081635A (en) * 1987-08-25 1992-01-14 Kabushiki Kaisha Komatsu Seisakusho Apparatus for controlling output from an excimer laser device
CA1313688C (en) * 1987-10-28 1993-02-16 Hitsoshi Wakata Method of stabilizing a wavelength of a laser beam and wavelength stabilizing laser device
US5130998A (en) * 1990-02-21 1992-07-14 Mitsubiski Denki Kaubshiki Kaisha Laser device with oscillation wavelength control
US5068861A (en) * 1990-07-19 1991-11-26 Spectra-Physics Lasers, Inc. Etalon apparatus
US5243614A (en) * 1990-11-28 1993-09-07 Mitsubishi Denki Kabushiki Kaisha Wavelength stabilizer for narrow bandwidth laser
US5357336A (en) * 1991-08-08 1994-10-18 The Dow Chemical Company Method and apparatus for multivariate characterization of optical instrument response
DE19603637C1 (de) 1996-02-01 1997-07-31 Lambda Physik Gmbh Laser zur Erzeugung schmalbandiger Strahlung
US6137821A (en) * 1997-06-04 2000-10-24 Cymer, Inc. Durable etalon based output coupler
DE29714489U1 (de) * 1997-08-13 1997-10-09 Trumpf GmbH + Co., 71254 Ditzingen Laserbearbeitungsmaschine mit Gasausgleichsvolumen
US6476987B1 (en) 1999-08-04 2002-11-05 Lambda Physik Ag Excimer laser with line narrowing
US6424666B1 (en) 1999-06-23 2002-07-23 Lambda Physik Ag Line-narrowing module for high power laser
US6795473B1 (en) 1999-06-23 2004-09-21 Lambda Physik Ag Narrow band excimer laser with a prism-grating as line-narrowing optical element
US6345065B1 (en) 1998-06-04 2002-02-05 Lambda Physik Ag F2-laser with line selection
US6426966B1 (en) 1999-02-10 2002-07-30 Lambda Physik Ag Molecular fluorine (F2) laser with narrow spectral linewidth
US6516013B1 (en) 1999-12-20 2003-02-04 Lambda Physik Ag Laser beam monitoring apparatus and method
US6778584B1 (en) 1999-11-30 2004-08-17 Cymer, Inc. High power gas discharge laser with helium purged line narrowing unit
US6678291B2 (en) 1999-12-15 2004-01-13 Lambda Physik Ag Molecular fluorine laser
US6421365B1 (en) 1999-11-18 2002-07-16 Lambda Physik Ag Narrow band excimer or molecular fluorine laser having an output coupling interferometer
US6154470A (en) * 1999-02-10 2000-11-28 Lamba Physik Gmbh Molecular fluorine (F2) laser with narrow spectral linewidth
US6717973B2 (en) 1999-02-10 2004-04-06 Lambda Physik Ag Wavelength and bandwidth monitor for excimer or molecular fluorine laser
US6393040B1 (en) 1999-02-24 2002-05-21 Lambda Physik Ag Molecular fluorine (F2) excimer laser with reduced coherence length
DE29907349U1 (de) 1999-04-26 2000-07-06 Lambda Physik Gesellschaft zur Herstellung von Lasern mbH, 37079 Göttingen Laser zur Erzeugung schmalbandiger Strahlung
US6785316B1 (en) 1999-08-17 2004-08-31 Lambda Physik Ag Excimer or molecular laser with optimized spectral purity
US6735236B2 (en) * 1999-09-03 2004-05-11 Cymer, Inc. High power gas discharge laser with line narrowing unit
US6496528B2 (en) 1999-09-03 2002-12-17 Cymer, Inc. Line narrowing unit with flexural grating mount
US6553050B1 (en) 1999-11-18 2003-04-22 Lambda Physik Ag Narrow band excimer or molecular fluorine laser having an output coupling interferometer
US6603788B1 (en) 1999-11-23 2003-08-05 Lambda Physik Ag Resonator for single line selection
US6504860B2 (en) 2001-01-29 2003-01-07 Cymer, Inc. Purge monitoring system for gas discharge laser
US7075963B2 (en) 2000-01-27 2006-07-11 Lambda Physik Ag Tunable laser with stabilized grating
US6834066B2 (en) 2000-04-18 2004-12-21 Lambda Physik Ag Stabilization technique for high repetition rate gas discharge lasers
US6862307B2 (en) 2000-05-15 2005-03-01 Lambda Physik Ag Electrical excitation circuit for a pulsed gas laser
US6747741B1 (en) 2000-10-12 2004-06-08 Lambda Physik Ag Multiple-pass interferometric device
US6486950B1 (en) 2000-12-05 2002-11-26 Jds Uniphase Corporation Multi-channel wavelength monitor
US7113705B2 (en) * 2001-06-29 2006-09-26 Tellabs Operations, Inc. Methods and apparatus for sensing multiple wavelengths simultaneously in a single wavelength sensing device
US6721079B2 (en) * 2001-08-09 2004-04-13 Accumux Technologies, Inc. Optical path length tuning methods in etalons

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US3534289A (en) * 1967-02-06 1970-10-13 Xerox Corp Laser system with optical discriminator
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JPS5819460Y2 (ja) * 1975-08-21 1983-04-21 日本電気株式会社 ハチヨウセンタクキ
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JPS63160287A (ja) * 1986-12-23 1988-07-04 Nikon Corp フアブリペロ−エタロンを備えるエキシマレ−ザ−装置
KR910006307B1 (ko) * 1987-09-26 1991-08-19 미쓰비시덴기 가부시기가이샤 레이저 파장의 안정화 방법 및 파장 안정화 장치

Also Published As

Publication number Publication date
EP0336972A4 (en) 1990-03-21
US4977563A (en) 1990-12-11
KR920009706B1 (ko) 1992-10-22
EP0336972A1 (en) 1989-10-18
DE3889323D1 (de) 1994-06-01
EP0336972B1 (en) 1994-04-27
DE3889323T2 (de) 1994-09-29
WO1989003132A1 (en) 1989-04-06

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