KR900701067A - 레이저 장치 - Google Patents
레이저 장치Info
- Publication number
- KR900701067A KR900701067A KR1019890700851A KR890700851A KR900701067A KR 900701067 A KR900701067 A KR 900701067A KR 1019890700851 A KR1019890700851 A KR 1019890700851A KR 890700851 A KR890700851 A KR 890700851A KR 900701067 A KR900701067 A KR 900701067A
- Authority
- KR
- South Korea
- Prior art keywords
- perot
- fabry
- etalon
- wavelength
- gap
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
- H01S3/136—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling devices placed within the cavity
- H01S3/137—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling devices placed within the cavity for stabilising of frequency
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
- H01S3/1062—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using a controlled passive interferometer, e.g. a Fabry-Perot etalon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
- Spectrometry And Color Measurement (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제2도는 본 발명에 의한 레이저장치의 1 실시예를 도시한 구성도,
제3도는 촬상소자(22)상의 줄무늬의 강도분포를 도시한 도면,
제4도는 본 발명의 다른 실시예를 도시한 구성도,
제5 도는 본 발명의 또다른 실시예를 도시한 구성도.
Claims (3)
- 레이저발진파장을 선택하는 파브리-페로-에탈론을 갖고, 파장이 가변인 레이저발진기에서 인출된 레이저빔을 파장 모니터수단으로 모니터해서 상기 파장모니터수단의 출력신호에 따라 상기 파브리-페로-에탈론의 갭의 압력을 조정하는 레이저장치.
- 특허청구의 범위 제 1 항에 있어서, 파브리-페로-에탈론의 갭의 압력을 조정하기 위해 상기 파브리-페로-에탈론을 밀봉용기에 수용하고, 내용적인 신축 가능한 용적신축수단을 상기 밀봉용기와 접속하고, 상기 파장 모니터수단의 출력신호에 따라서 구동기구를 거쳐서 상기 용적 신축수단을 작동시키는 것을 특징으로 하는 레이저장치.
- 특허 청구의 범위 제 1 항에 있어서, 파브리-페로-에탈론의 갭의 압력을 조정하기 위해 상기 파브리-페로-에탈론을 밀봉용기에 수용하고,상기 밀봉용기에 유통하는 가스를 상기 출력신호에 따라서 조작하는 것에 의해 상기 파브리-페로-에탈론의 갭의 압력을 조정하는 것을 특징으로 하는 레이저 장치.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62-241066 | 1987-09-26 | ||
JP62241066A JPS6484682A (en) | 1987-09-26 | 1987-09-26 | Laser apparatus |
JP87-241066 | 1987-09-26 | ||
JP63-31893 | 1988-03-10 | ||
JP88-31893(U) | 1988-03-10 | ||
JP3189388U JPH01135756U (ko) | 1988-03-10 | 1988-03-10 | |
PCT/JP1988/000970 WO1989003132A1 (en) | 1987-09-26 | 1988-09-22 | Laser device |
Publications (2)
Publication Number | Publication Date |
---|---|
KR900701067A true KR900701067A (ko) | 1990-08-17 |
KR920009706B1 KR920009706B1 (ko) | 1992-10-22 |
Family
ID=26370406
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019890700851A KR920009706B1 (ko) | 1987-09-26 | 1988-09-22 | 레이저장치 |
Country Status (5)
Country | Link |
---|---|
US (1) | US4977563A (ko) |
EP (1) | EP0336972B1 (ko) |
KR (1) | KR920009706B1 (ko) |
DE (1) | DE3889323T2 (ko) |
WO (1) | WO1989003132A1 (ko) |
Families Citing this family (35)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5081635A (en) * | 1987-08-25 | 1992-01-14 | Kabushiki Kaisha Komatsu Seisakusho | Apparatus for controlling output from an excimer laser device |
CA1313688C (en) * | 1987-10-28 | 1993-02-16 | Hitsoshi Wakata | Method of stabilizing a wavelength of a laser beam and wavelength stabilizing laser device |
US5130998A (en) * | 1990-02-21 | 1992-07-14 | Mitsubiski Denki Kaubshiki Kaisha | Laser device with oscillation wavelength control |
US5068861A (en) * | 1990-07-19 | 1991-11-26 | Spectra-Physics Lasers, Inc. | Etalon apparatus |
US5243614A (en) * | 1990-11-28 | 1993-09-07 | Mitsubishi Denki Kabushiki Kaisha | Wavelength stabilizer for narrow bandwidth laser |
US5357336A (en) * | 1991-08-08 | 1994-10-18 | The Dow Chemical Company | Method and apparatus for multivariate characterization of optical instrument response |
DE19603637C1 (de) | 1996-02-01 | 1997-07-31 | Lambda Physik Gmbh | Laser zur Erzeugung schmalbandiger Strahlung |
US6137821A (en) * | 1997-06-04 | 2000-10-24 | Cymer, Inc. | Durable etalon based output coupler |
DE29714489U1 (de) * | 1997-08-13 | 1997-10-09 | Trumpf GmbH + Co., 71254 Ditzingen | Laserbearbeitungsmaschine mit Gasausgleichsvolumen |
US6476987B1 (en) | 1999-08-04 | 2002-11-05 | Lambda Physik Ag | Excimer laser with line narrowing |
US6424666B1 (en) | 1999-06-23 | 2002-07-23 | Lambda Physik Ag | Line-narrowing module for high power laser |
US6795473B1 (en) | 1999-06-23 | 2004-09-21 | Lambda Physik Ag | Narrow band excimer laser with a prism-grating as line-narrowing optical element |
US6345065B1 (en) | 1998-06-04 | 2002-02-05 | Lambda Physik Ag | F2-laser with line selection |
US6426966B1 (en) | 1999-02-10 | 2002-07-30 | Lambda Physik Ag | Molecular fluorine (F2) laser with narrow spectral linewidth |
US6516013B1 (en) | 1999-12-20 | 2003-02-04 | Lambda Physik Ag | Laser beam monitoring apparatus and method |
US6778584B1 (en) | 1999-11-30 | 2004-08-17 | Cymer, Inc. | High power gas discharge laser with helium purged line narrowing unit |
US6678291B2 (en) | 1999-12-15 | 2004-01-13 | Lambda Physik Ag | Molecular fluorine laser |
US6421365B1 (en) | 1999-11-18 | 2002-07-16 | Lambda Physik Ag | Narrow band excimer or molecular fluorine laser having an output coupling interferometer |
US6154470A (en) * | 1999-02-10 | 2000-11-28 | Lamba Physik Gmbh | Molecular fluorine (F2) laser with narrow spectral linewidth |
US6717973B2 (en) | 1999-02-10 | 2004-04-06 | Lambda Physik Ag | Wavelength and bandwidth monitor for excimer or molecular fluorine laser |
US6393040B1 (en) | 1999-02-24 | 2002-05-21 | Lambda Physik Ag | Molecular fluorine (F2) excimer laser with reduced coherence length |
DE29907349U1 (de) | 1999-04-26 | 2000-07-06 | Lambda Physik Gesellschaft zur Herstellung von Lasern mbH, 37079 Göttingen | Laser zur Erzeugung schmalbandiger Strahlung |
US6785316B1 (en) | 1999-08-17 | 2004-08-31 | Lambda Physik Ag | Excimer or molecular laser with optimized spectral purity |
US6735236B2 (en) * | 1999-09-03 | 2004-05-11 | Cymer, Inc. | High power gas discharge laser with line narrowing unit |
US6496528B2 (en) | 1999-09-03 | 2002-12-17 | Cymer, Inc. | Line narrowing unit with flexural grating mount |
US6553050B1 (en) | 1999-11-18 | 2003-04-22 | Lambda Physik Ag | Narrow band excimer or molecular fluorine laser having an output coupling interferometer |
US6603788B1 (en) | 1999-11-23 | 2003-08-05 | Lambda Physik Ag | Resonator for single line selection |
US6504860B2 (en) | 2001-01-29 | 2003-01-07 | Cymer, Inc. | Purge monitoring system for gas discharge laser |
US7075963B2 (en) | 2000-01-27 | 2006-07-11 | Lambda Physik Ag | Tunable laser with stabilized grating |
US6834066B2 (en) | 2000-04-18 | 2004-12-21 | Lambda Physik Ag | Stabilization technique for high repetition rate gas discharge lasers |
US6862307B2 (en) | 2000-05-15 | 2005-03-01 | Lambda Physik Ag | Electrical excitation circuit for a pulsed gas laser |
US6747741B1 (en) | 2000-10-12 | 2004-06-08 | Lambda Physik Ag | Multiple-pass interferometric device |
US6486950B1 (en) | 2000-12-05 | 2002-11-26 | Jds Uniphase Corporation | Multi-channel wavelength monitor |
US7113705B2 (en) * | 2001-06-29 | 2006-09-26 | Tellabs Operations, Inc. | Methods and apparatus for sensing multiple wavelengths simultaneously in a single wavelength sensing device |
US6721079B2 (en) * | 2001-08-09 | 2004-04-13 | Accumux Technologies, Inc. | Optical path length tuning methods in etalons |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3534289A (en) * | 1967-02-06 | 1970-10-13 | Xerox Corp | Laser system with optical discriminator |
JPS5423598B2 (ko) * | 1972-03-18 | 1979-08-15 | ||
JPS5819460Y2 (ja) * | 1975-08-21 | 1983-04-21 | 日本電気株式会社 | ハチヨウセンタクキ |
US4097818A (en) * | 1976-09-03 | 1978-06-27 | Coherent, Inc. | Adjustable etalon laser mode selector and method of adjustment |
DE2722832A1 (de) * | 1977-05-20 | 1978-11-30 | Bosch Gmbh Robert | Anordnung zur verbesserung des stoerabstands bei der uebertragung bzw. aufzeichnung und/oder wiedergabe von signalen mittels laserstrahlen |
US4272734A (en) * | 1979-05-29 | 1981-06-09 | Spectra-Physics, Inc. | Dual reference interferometer for dye laser stabilization |
JPS637333U (ko) * | 1986-06-30 | 1988-01-19 | ||
US4743114A (en) * | 1986-07-11 | 1988-05-10 | The Perkin-Elmer Corporation | Fabry-Perot scanning and nutating imaging coherent radiometer |
JPS63160287A (ja) * | 1986-12-23 | 1988-07-04 | Nikon Corp | フアブリペロ−エタロンを備えるエキシマレ−ザ−装置 |
KR910006307B1 (ko) * | 1987-09-26 | 1991-08-19 | 미쓰비시덴기 가부시기가이샤 | 레이저 파장의 안정화 방법 및 파장 안정화 장치 |
-
1988
- 1988-09-22 WO PCT/JP1988/000970 patent/WO1989003132A1/ja active IP Right Grant
- 1988-09-22 EP EP88908361A patent/EP0336972B1/en not_active Expired - Lifetime
- 1988-09-22 US US07/362,409 patent/US4977563A/en not_active Expired - Fee Related
- 1988-09-22 DE DE3889323T patent/DE3889323T2/de not_active Expired - Fee Related
- 1988-09-22 KR KR1019890700851A patent/KR920009706B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
EP0336972A4 (en) | 1990-03-21 |
US4977563A (en) | 1990-12-11 |
KR920009706B1 (ko) | 1992-10-22 |
EP0336972A1 (en) | 1989-10-18 |
DE3889323D1 (de) | 1994-06-01 |
EP0336972B1 (en) | 1994-04-27 |
DE3889323T2 (de) | 1994-09-29 |
WO1989003132A1 (en) | 1989-04-06 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
G160 | Decision to publish patent application | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 19951021 Year of fee payment: 4 |
|
LAPS | Lapse due to unpaid annual fee |