KR900006277A - 시아나토 에스테르, 그의 경화성 수지 및 이로부터 제조된 물품 - Google Patents

시아나토 에스테르, 그의 경화성 수지 및 이로부터 제조된 물품 Download PDF

Info

Publication number
KR900006277A
KR900006277A KR1019890014949A KR890014949A KR900006277A KR 900006277 A KR900006277 A KR 900006277A KR 1019890014949 A KR1019890014949 A KR 1019890014949A KR 890014949 A KR890014949 A KR 890014949A KR 900006277 A KR900006277 A KR 900006277A
Authority
KR
South Korea
Prior art keywords
cyanato
maleimide
curable resin
prepolymer
esters
Prior art date
Application number
KR1019890014949A
Other languages
English (en)
Inventor
죠오지프 잭슨 로이
Original Assignee
오노 알버어스
셀 인터나쵸나아레 레사아치 마아츠샤피 비이부이
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 오노 알버어스, 셀 인터나쵸나아레 레사아치 마아츠샤피 비이부이 filed Critical 오노 알버어스
Publication of KR900006277A publication Critical patent/KR900006277A/ko

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/0622—Polycondensates containing six-membered rings, not condensed with other rings, with nitrogen atoms as the only ring hetero atoms
    • C08G73/0638—Polycondensates containing six-membered rings, not condensed with other rings, with nitrogen atoms as the only ring hetero atoms with at least three nitrogen atoms in the ring
    • C08G73/0644—Poly(1,3,5)triazines
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C261/00—Derivatives of cyanic acid
    • C07C261/02—Cyanates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/12—Unsaturated polyimide precursors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31721—Of polyimide

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

내용 없음

Description

시아나토 에스테르, 그의 경화성 수지 및 이로부터 제조된 물품
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (10)

  1. 하기식(Ⅰ)의 화합물.
    상기식에서, 각각의 R은 독립적으로 탄소수 1-4 의 알킬기이고 각각의 n은 독립적으로 0,1 또는 2이다.
  2. 제 1 항에 있어서, 각각의 R이 메틸기인 화합물.
  3. 제 1 항에 있어서, 각각의 n이 0인 화합물.
  4. (a) 제 1 항 내지 제 3 항중 어느 하나에 따른 적어도 하나의 시아나토 방향족 에스테르 또는 시아나토 에스테르와 임의로 아민과의 예비중합체 및 임의로 하나 또는 그 이상의 ,(b) (1) 제 2의 시아나토 에스테르 또는 임의로 아민과의 예비 중합체 ; (2) 아민 중 적어도 하나 또는 그 이상과 (a)의 공중합체 ; 및/또는 (c) 말레이미드 성분, 말레이미드의 예비중합체 또는 말레이미드와 아민의 에비공중합체를 포함하는 경화성 수지조성물.
  5. 제 4 항에 있어서, (a)가 시아나토 에스테르 예비중합체인 경화성 수지.
  6. 제 4 항 또는 제 5 항에 있어서, 제 2 의 시아나토 에스테르(b)가 방향족 시아네이트로 존재하는 경화성 수지.
  7. 제 4 항 내지 제 6 항중 어느 한 항에 있어서, 말레이미드 성분(c)이 단량체인 경화성 수지.
  8. 제 7 항에 있어서, 단량체가 메틸렌 디아닐린 비스말레이미드인 경화성 수지.
  9. 제 4 항 내지 제 6 항중 어느 한 항에 있어서, 말레이미드 성분(c)이 말레이미드 및 디아민의 예비중합체인 경화성 수지.
  10. 제 4 항 내지 제 9 항중 어느 하나에 따른 조성물로부터 제조된 제품.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019890014949A 1988-10-20 1989-10-17 시아나토 에스테르, 그의 경화성 수지 및 이로부터 제조된 물품 KR900006277A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US260,346 1988-10-20
US07/260,346 US4916210A (en) 1988-10-20 1988-10-20 Resin from alpha, alpha', alpha"-tris(4-cyanatophenyl)-1,3,5-triisopropylbenzene

Publications (1)

Publication Number Publication Date
KR900006277A true KR900006277A (ko) 1990-05-07

Family

ID=22988799

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019890014949A KR900006277A (ko) 1988-10-20 1989-10-17 시아나토 에스테르, 그의 경화성 수지 및 이로부터 제조된 물품

Country Status (6)

Country Link
US (1) US4916210A (ko)
EP (1) EP0366184B1 (ko)
JP (1) JPH02157256A (ko)
KR (1) KR900006277A (ko)
CA (1) CA1317305C (ko)
DE (1) DE68904396T2 (ko)

Families Citing this family (54)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5516876A (en) 1983-09-27 1996-05-14 The Boeing Company Polyimide oligomers and blends
US5969079A (en) 1985-09-05 1999-10-19 The Boeing Company Oligomers with multiple chemically functional end caps
US5512676A (en) 1987-09-03 1996-04-30 The Boeing Company Extended amideimide hub for multidimensional oligomers
US5210213A (en) 1983-06-17 1993-05-11 The Boeing Company Dimensional, crosslinkable oligomers
US5705598A (en) 1985-04-23 1998-01-06 The Boeing Company Polyester sulfone oligomers and blends
US5714566A (en) 1981-11-13 1998-02-03 The Boeing Company Method for making multiple chemically functional oligomers
US5693741A (en) 1988-03-15 1997-12-02 The Boeing Company Liquid molding compounds
US5618907A (en) 1985-04-23 1997-04-08 The Boeing Company Thallium catalyzed multidimensional ester oligomers
US5817744A (en) 1988-03-14 1998-10-06 The Boeing Company Phenylethynyl capped imides
US5068309A (en) * 1990-03-29 1991-11-26 Hi-Tek Polymers, Inc. Low temperature curable dicyanate ester of dihydric phenol composition
US5320870A (en) * 1991-08-28 1994-06-14 The United States Of America As Represented By The Secretary Of The Navy Fire protective coating and method for applying same to a structure
US5292861A (en) * 1992-12-29 1994-03-08 International Business Machines Corporation Trifunctional cyanate esters, polymers thereof; use and preparation thereof
US7192681B2 (en) 2001-07-05 2007-03-20 Fuji Photo Film Co., Ltd. Positive photosensitive composition
JP4448705B2 (ja) 2004-02-05 2010-04-14 富士フイルム株式会社 感光性組成物及び該感光性組成物を用いたパターン形成方法
JP4469692B2 (ja) 2004-09-14 2010-05-26 富士フイルム株式会社 感光性組成物、該感光性組成物に用いられる化合物及び該感光性組成物を用いたパターン形成方法
JP4474256B2 (ja) 2004-09-30 2010-06-02 富士フイルム株式会社 レジスト組成物及びそれを用いたパターン形成方法
TWI530759B (zh) 2005-01-24 2016-04-21 富士軟片股份有限公司 適用於浸漬曝光之正型光阻組成物及使用它之圖案形成方法
JP4452632B2 (ja) 2005-01-24 2010-04-21 富士フイルム株式会社 感光性組成物、該感光性組成物に用いる化合物及び該感光性組成物を用いたパターン形成方法
JP4562537B2 (ja) 2005-01-28 2010-10-13 富士フイルム株式会社 感光性組成物、該感光性組成物に用いる化合物及び該感光性組成物を用いたパターン形成方法
EP1698937B1 (en) 2005-03-04 2015-12-23 FUJIFILM Corporation Positive resist composition and pattern-forming method using the same
US7960087B2 (en) 2005-03-11 2011-06-14 Fujifilm Corporation Positive photosensitive composition and pattern-forming method using the same
JP4579019B2 (ja) 2005-03-17 2010-11-10 富士フイルム株式会社 ポジ型レジスト組成物及び該レジスト組成物を用いたパターン形成方法
JP4752308B2 (ja) * 2005-04-06 2011-08-17 三菱瓦斯化学株式会社 樹脂組成物及びそれを用いた硬化物
EP1720072B1 (en) 2005-05-01 2019-06-05 Rohm and Haas Electronic Materials, L.L.C. Compositons and processes for immersion lithography
JP4724465B2 (ja) 2005-05-23 2011-07-13 富士フイルム株式会社 感光性組成物及び該感光性組成物を用いたパターン形成方法
JP4861767B2 (ja) 2005-07-26 2012-01-25 富士フイルム株式会社 ポジ型レジスト組成物およびそれを用いたパターン形成方法
JP4695941B2 (ja) 2005-08-19 2011-06-08 富士フイルム株式会社 液浸露光用ポジ型レジスト組成物及びそれを用いたパターン形成方法
TWI403843B (zh) 2005-09-13 2013-08-01 Fujifilm Corp 正型光阻組成物及使用它之圖案形成方法
TWI443461B (zh) 2005-12-09 2014-07-01 Fujifilm Corp 正型光阻組成物、用於正型光阻組成物之樹脂、用於合成該樹脂之化合物及使用該正型光阻組成物之圖案形成方法
JP4911456B2 (ja) 2006-11-21 2012-04-04 富士フイルム株式会社 ポジ型感光性組成物、該ポジ型感光性組成物に用いられる高分子化合物、該高分子化合物の製造方法及びポジ型感光性組成物を用いたパターン形成方法
JP4554665B2 (ja) 2006-12-25 2010-09-29 富士フイルム株式会社 パターン形成方法、該パターン形成方法に用いられる多重現像用ポジ型レジスト組成物、該パターン形成方法に用いられるネガ現像用現像液及び該パターン形成方法に用いられるネガ現像用リンス液
EP1962139A1 (en) 2007-02-23 2008-08-27 FUJIFILM Corporation Negative resist composition and pattern forming method using the same
EP1975714A1 (en) 2007-03-28 2008-10-01 FUJIFILM Corporation Positive resist composition and pattern forming method
EP1975716B1 (en) 2007-03-28 2013-05-15 Fujifilm Corporation Positive resist composition and pattern forming method
EP2138898B1 (en) 2007-04-13 2014-05-21 FUJIFILM Corporation Method for pattern formation, and use of resist composition in said method
EP1980911A3 (en) 2007-04-13 2009-06-24 FUJIFILM Corporation Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming method
JP4617337B2 (ja) 2007-06-12 2011-01-26 富士フイルム株式会社 パターン形成方法
JP2008311474A (ja) 2007-06-15 2008-12-25 Fujifilm Corp パターン形成方法
US8088550B2 (en) 2007-07-30 2012-01-03 Fujifilm Corporation Positive resist composition and pattern forming method
JP5066405B2 (ja) 2007-08-02 2012-11-07 富士フイルム株式会社 電子線、ｘ線又はｅｕｖ用レジスト組成物及び該組成物を用いたパターン形成方法
JP5103316B2 (ja) 2007-08-03 2012-12-19 富士フイルム株式会社 新規なスルホニウム化合物を含有するポジ型レジスト組成物、該ポジ型レジスト組成物を用いたパターン形成方法及び新規なスルホニウム化合物
JP5449675B2 (ja) 2007-09-21 2014-03-19 富士フイルム株式会社 感光性組成物、該感光性組成物を用いたパターン形成方法及び該感光性組成物に用いられる化合物
JP5150296B2 (ja) 2008-02-13 2013-02-20 富士フイルム株式会社 電子線、ｘ線またはｅｕｖ用ポジ型レジスト組成物及びこれを用いたパターン形成方法
US9046773B2 (en) 2008-03-26 2015-06-02 Fujifilm Corporation Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method using the same, polymerizable compound and polymer compound obtained by polymerizing the polymerizable compound
JP5244711B2 (ja) 2008-06-30 2013-07-24 富士フイルム株式会社 感活性光線性または感放射線性樹脂組成物及びそれを用いたパターン形成方法
JP5997873B2 (ja) 2008-06-30 2016-09-28 富士フイルム株式会社 感光性組成物及びそれを用いたパターン形成方法
JP5746818B2 (ja) 2008-07-09 2015-07-08 富士フイルム株式会社 感活性光線性または感放射線性樹脂組成物及びそれを用いたパターン形成方法
JP5685533B2 (ja) * 2008-08-08 2015-03-18 ヘンケル アイピー アンド ホールディング ゲゼルシャフト ミット ベシュレンクテル ハフツング 低温硬化組成物
EP2356517B1 (en) 2008-12-12 2017-01-25 FUJIFILM Corporation Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same
KR101872219B1 (ko) 2008-12-12 2018-06-28 후지필름 가부시키가이샤 감활성광선성 또는 감방사선성 수지 조성물 및 그 조성물을 이용한 패턴 형성 방법
JP5377172B2 (ja) 2009-03-31 2013-12-25 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物及びそれを用いたパターン形成方法
JP5630133B2 (ja) * 2010-08-05 2014-11-26 三菱瓦斯化学株式会社 シアン酸エステル化合物、およびその硬化物
WO2012158415A1 (en) * 2011-05-17 2012-11-22 Huntsman Advanced Materials Americas Llc Halogen free thermoset resin system for low dielectric loss at high frequency applications
WO2020105505A1 (ja) 2018-11-22 2020-05-28 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、電子デバイスの製造方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1248668B (de) * 1963-02-16 1967-08-31 Farbenfabriken Bayer Aktienge Seilschaft Leverkusen Verfahren zur Herstellung von aromatischen Cyansaureestern
US3595900A (en) * 1968-07-01 1971-07-27 Minnesota Mining & Mfg Cyanatophenyl-terminated polyarylene ethers
US3738962A (en) * 1971-03-08 1973-06-12 Minnesota Mining & Mfg Cyanurates of cyanatophenyl-terminated polyarylene ethers
US3954693A (en) * 1973-09-24 1976-05-04 Lockheed Aircraft Corporation Coating
SE421006B (sv) * 1974-03-19 1981-11-16 Mitsubishi Gas Chemical Co Herdbar hartskomposition av en cyanatesterkomponent och en bismaleinsyraimidkomponent
US4157360A (en) * 1978-04-26 1979-06-05 Allied Chemical Corporation Thermoformable compositions comprising a crosslinked polycyanurate polymer and a thermoplastic polymer
US4403073A (en) * 1980-05-06 1983-09-06 Mitsubishi Gas Chemical Company, Inc. Curable resin composition
JPS6026030A (ja) * 1983-07-22 1985-02-08 Mitsubishi Gas Chem Co Inc 硬化性樹脂の製造法
US4709008A (en) * 1986-06-30 1987-11-24 Interez, Inc. Blend of tris (cyanatophenyl) alkane and bis(cyanatophenyl) alkane
US4749760A (en) * 1987-06-30 1988-06-07 Shell Oil Company Curable resin compositions

Also Published As

Publication number Publication date
EP0366184A1 (en) 1990-05-02
EP0366184B1 (en) 1993-01-13
JPH02157256A (ja) 1990-06-18
DE68904396T2 (de) 1993-05-13
DE68904396D1 (de) 1993-02-25
CA1317305C (en) 1993-05-04
US4916210A (en) 1990-04-10

Similar Documents

Publication Publication Date Title
KR900006277A (ko) 시아나토 에스테르, 그의 경화성 수지 및 이로부터 제조된 물품
BR9307444A (pt) Composição polimérica óleo lubrificante concentrado e processo para a preparação da composição polimérica
ES2076934T3 (es) Catalizador metaloceno de hafnio para la polimerizacion de olefinas.
KR890000599A (ko) 경화성 수지 조성물 및 이를 포함한 물품
MX196841B (es) Composiciones de revestimiento curable que contienen aditivos de carbamato
KR890014688A (ko) 폴리아릴렌 설파이드 수지조성물
DE69506834D1 (de) Carbamatharz und Zusätze enthaltende vernetzbare Beschichtungszusammensetzungen
KR890008250A (ko) 경화성 에폭시 수지 조성물
KR910006411A (ko) 열가소성 엘라스토머 조성물
ATE238549T1 (de) Phosphatase-aktivierte quervernetzende konjugierende und reduzierende agenzien, verfahren unter verwendung solcher agenzien und reagenzien die phosphatase-aktivierte quervernetzende und konjugierende agenzien enthalten
DK0568147T3 (da) Polysiloxanstabilisatorer indeholdende sterisk hindrede phenolgrupper og oxamidgrupper
EP0243207A3 (en) Alpha-alkylacrylamide derivatives and their polymers
ES2023695B3 (es) Componentes endurecedores y su utilizacion
KR890008206A (ko) 폴리아미노비스 이미드 계수지
AU2002331700A1 (en) Polyamines and polymers made therewith
JPS5622311A (en) Thermosetting resin composition
DE69228797T2 (de) Vollständig aromatische Polyamidharzzusammensetzung mit verbesserter Lichtbeständigkeit
BR9808633A (pt) Polìmero fotocromático auto-estabilizado à luz, sua preparação e artigos contendo o mesmo
EP0484540A4 (en) Automotive topcoating composition
KR900018276A (ko) 수지 조성물
KR910004748A (ko) 경화형 조성물
KR920021655A (ko) 열가소성 수지 조성물
KR910014485A (ko) 접착제 조성물
KR920000837A (ko) 내충격성 폴리아미드 수지 조성물
KR920012284A (ko) 폴리 아미드 수지 조성물

Legal Events

Date Code Title Description
WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid