KR900003810B1 - Flexible printed circuit board and process for its production - Google Patents

Flexible printed circuit board and process for its production Download PDF

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KR900003810B1
KR900003810B1 KR1019870700570A KR870700570A KR900003810B1 KR 900003810 B1 KR900003810 B1 KR 900003810B1 KR 1019870700570 A KR1019870700570 A KR 1019870700570A KR 870700570 A KR870700570 A KR 870700570A KR 900003810 B1 KR900003810 B1 KR 900003810B1
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polyamic acid
printed circuit
circuit board
flexible printed
aromatic
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KR1019870700570A
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KR870700506A (en
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모리쯔구 모리타
가주오 미야자끼
아키히로 야마구찌
마사히로 오타
쇼오지 타마이
쿠니오 니시하라
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미쯔이도오아쯔가가꾸 가부시기가이샤
도쯔까 야스아끼
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Priority claimed from PCT/JP1986/000554 external-priority patent/WO1987002620A1/en
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1057Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain
    • C08G73/1064Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain containing sulfur
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G69/00Macromolecular compounds obtained by reactions forming a carboxylic amide link in the main chain of the macromolecule
    • C08G69/02Polyamides derived from amino-carboxylic acids or from polyamines and polycarboxylic acids
    • C08G69/26Polyamides derived from amino-carboxylic acids or from polyamines and polycarboxylic acids derived from polyamines and polycarboxylic acids
    • C08G69/265Polyamides derived from amino-carboxylic acids or from polyamines and polycarboxylic acids derived from polyamines and polycarboxylic acids from at least two different diamines or at least two different dicarboxylic acids
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1042Copolyimides derived from at least two different tetracarboxylic compounds or two different diamino compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1046Polyimides containing oxygen in the form of ether bonds in the main chain
    • C08G73/105Polyimides containing oxygen in the form of ether bonds in the main chain with oxygen only in the diamino moiety
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1067Wholly aromatic polyimides, i.e. having both tetracarboxylic and diamino moieties aromatically bound
    • C08G73/1071Wholly aromatic polyimides containing oxygen in the form of ether bonds in the main chain
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B3/00Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
    • H01B3/18Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
    • H01B3/30Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
    • H01B3/303Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups H01B3/38 or H01B3/302
    • H01B3/306Polyimides or polyesterimides
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0313Organic insulating material
    • H05K1/032Organic insulating material consisting of one material
    • H05K1/0346Organic insulating material consisting of one material containing N
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S428/00Stock material or miscellaneous articles
    • Y10S428/901Printed circuit
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/24Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24917Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including metal layer
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31678Of metal
    • Y10T428/31681Next to polyester, polyamide or polyimide [e.g., alkyd, glue, or nylon, etc.]
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31721Of polyimide

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Laminated Bodies (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)

Abstract

내용 없음.No content.

Description

[발명의 명칭][Name of invention]

플렉시블 프린트회로 기판 및 그 제법Flexible printed circuit board and its manufacturing method

[발명의 상세한 설명]Detailed description of the invention

[기술분야][Technical Field]

본 발명은 내열성, 전기적특성 및 기계적특성이 우수한 폴리이미드 금속장판(金屬張板)으로 이루어진 플렉시블 프린트회로 기판 및 그 제법에 관한 것이다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a flexible printed circuit board made of a polyimide metal sheet having excellent heat resistance, electrical characteristics, and mechanical characteristics, and a method of manufacturing the same.

[배경기술][Background]

플렉시블 프린트회로 기판은 가요성을 갖는 인쇄회로를 제조하기 위한 기판이고 최근에는 인쇄회로가 포함된 케이스들이 소형화되기 때문에 이용이 증가하고 있다. 이런 플렉시블 프린트회로 기판은 종래에는 동박(銅箔)에 폴리이미드필름을 접착제를 사용하여 접착시켜 제조하였다. 이런 기판에 있어서, 폴리이미드필름은 충분히 내열성, 전기적특성 및 기계적특성이 좋으나, 접착제의 특성이 불충분하기 때문에 폴리이미드필름의 특성이 완전히 이용되지 않는 결점이 있었다.Flexible printed circuit boards are substrates for manufacturing flexible printed circuits, and in recent years, their use has increased due to miniaturization of cases in which printed circuits are included. Such a flexible printed circuit board was conventionally manufactured by bonding a polyimide film to a copper foil using an adhesive. In such a substrate, the polyimide film is sufficiently good in heat resistance, electrical characteristics and mechanical properties, but the characteristics of the polyimide film are not fully utilized because of insufficient adhesive properties.

따라서, 접착제를 사용하지 않고 폴리이미드 금속장판으로 이루어진 플렉시블 프린트회로 기판을 제조하는 방법이 종래부터 시도되었다. 예를 들면 미국 특허 3,179,634, 일본국 특허공개 129862/74, 190091/83, -190092/83등에 기재되었다. 그렇지만 내열성, 접착성 및 가요성이 충분한 플렉시블 프린트회로 기판은 얻을수 없었다.Thus, a method of manufacturing a flexible printed circuit board made of a polyimide sheet metal sheet without using an adhesive has been conventionally tried. For example, US Pat. No. 3,179,634, Japanese Patent Laid-Open No. 129862/74, 190091/83, -190092/83, and the like. However, flexible printed circuit boards with sufficient heat resistance, adhesion and flexibility could not be obtained.

[발명의 개시][Initiation of invention]

본 발명은 상술한 문제점에 고려하여 이루었으며, 그 목적은 내열성, 전기적특성 및 접착성, 가요성등의기계적특성이 우수한 폴리이미드 금속장판으로 이루어진 플렉시블 프린트회로 기판 및 그 제법을 제공하는데 있다.SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, and an object thereof is to provide a flexible printed circuit board made of a polyimide sheet of metal having excellent mechanical properties such as heat resistance, electrical properties, adhesiveness, and flexibility, and a method of manufacturing the same.

본 발명은 대칭형 방향족 메타치환 제 1 급 디아민과 대칭형 방향족 파라치환 제 1 급 디아민을 당량비 10-60 : 90-40으로 혼합하고, 이 혼합물을 방향족 테트라카르복실산 무수물과 반응시켜 폴리이미드 전구체로서 폴리아미드산을 제조하고, 상기 폴리아미드산의 유기용매 용액을 금속박에 직접 코팅한 후, 가열하여 탈수하는 플렉시블 프린트회로 기판의 제법, 또는 대칭형 방향족 메타치환 제 1 급 디아민과 방향족 테트라카르복실산 무수물을 반응시켜 폴리아미드산(A)을 제조하고, 대칭형 방향족 파라치환 제 1 급 디아민과 방향족 테트라 카르복실산 무수물을 반응시켜 폴리아미드산(B)을 제조하고, 상기 폴리아미드산(A)의 유기용매 용액과 상기 폴리아미드산(B)의 유기용매 용액을 당량비 10-60 : 90-40으로 혼합한 후,·이 용액을 금속박에 직접 고팅하여 가열, 탈수하는 플렉시블 프린트회로 기판의 제법 및 이 방법에 의해 제조되는 플렉시블 프린트회로 기판에 관한 것이다.The present invention mixes a symmetrical aromatic metasubstituted primary diamine and a symmetrical aromatic parasubstituted primary diamine in an equivalent ratio of 10-60: 90-40, and reacts the mixture with an aromatic tetracarboxylic anhydride to give a polyimide precursor. A method of preparing a flexible printed circuit board which prepares amic acid, directly coats the organic solvent solution of the polyamic acid on metal foil, and dehydrates it by heating, or symmetrical aromatic metasubstituted primary diamine and aromatic tetracarboxylic anhydride. Reaction was carried out to prepare polyamic acid (A), symmetrical aromatic parasubstituted primary diamine and aromatic tetracarboxylic anhydride were reacted to prepare polyamic acid (B), and the organic solvent of the polyamic acid (A) The solution and the organic solvent solution of the polyamic acid (B) were mixed in an equivalent ratio of 10-60: 90-40, and then the solution was directly fixed to the metal foil. Open, and to a manufacturing method for the flexible printed circuit board produced by the method of the flexible printed circuit board of dehydration.

[발명의 최적실시상태][Optimum embodiment of invention]

또한 본 발명자들은 상기의 가열, 탈수가 불활성가스 분위기하에서 실시되는 경우 플렉시블 프린트회로기판이 더 우수한 특성을 갖는 것을 발견하였다.In addition, the present inventors have found that the flexible printed circuit board has better characteristics when the heating and dehydration is performed in an inert gas atmosphere.

또한, 폴리아미드산의 유기용매 용액을 금속박에 직접 코팅한 후, 실질적으로 반경화 건조상태(tack-free state)로 건조한 후, 로울형상으로 감아서, 이것을 불활성분위기하에서 가열, 탈수하는 방법에 의해 비교적 간단하고 경제적으로 플렉시블 프린트회로 기판을 제조할 수 있다는 것을 발견했다.In addition, the organic solvent solution of polyamic acid is directly coated on a metal foil, dried in a substantially tack-free state, wound in a roll shape, and heated and dehydrated in an inert atmosphere. It has been found that a flexible printed circuit board can be manufactured relatively simply and economically.

본 발명에 사용되는 대칭형 방향족 메타치환 제 1 급 디아민(이후, m-디아민으로 약칭한다)은 일반식The symmetrical aromatic metasubstituted primary diamine (hereinafter abbreviated as m-diamine) used in the present invention is a general formula

Figure kpo00001
Figure kpo00001

Figure kpo00002
Figure kpo00002

으로 표시된다(식중, X는 O,SO2,S,CO,CH2,C(CH3)2및 C(CF3)2으로부터 선택되고, 각각의 X는 같아도 된다).(Wherein X is selected from O, SO 2 , S, CO, CH 2 , C (CH 3 ) 2 and C (CF 3 ) 2 , and each X may be the same).

상기 일반식으로 표시되는 m-디아민의 예로서는, 3, 3'-디아미노 디페닐에테르, 3,3-디아미노 디페닐술피드, 3,3'-디아미노 디페닐 술폰, 3,3'-디아미노 벤조페논, 비스[4-(3-아미노페녹시)-페닐]메탄, 2,2-비스[4-(3-아미노페녹시)페닐] 프로판, 2,2-비스[4-(3-아미노페녹시)페닐-1,1-1,3,3,3-헥사플루오로프로판, 1,3-비스(3-아미노페녹시)벤젠, 4,4'-비스(3-아미노페녹시)비페닐, 비스[4-(3-아미노페녹시)페닐] 케톤, 비스 [4-(3-아미노페녹시) 페닐]술피드, 비스 [4-(3-아미노페녹시)페닐]술폰, 비스 [4-(3-아미노페녹시)페닐]에테르, 4,4'-비스(3-아미노페닐술포닐)디페닐에테르, 4,4'-비스(3-아미노티오페녹시)디페닐술폰, 1,4-비스[4-(3-아미노페녹시)벤조일]벤젠등을 열거할 수 있고 이들 m-디아민은 단독 또는 2종이상 혼합하여 사용할 수 있다.As an example of m-diamine represented by the said general formula, 3, 3'- diamino diphenyl ether, 3, 3- diamino diphenyl sulfide, 3,3'- diamino diphenyl sulfone, 3,3'- Diamino benzophenone, bis [4- (3-aminophenoxy) -phenyl] methane, 2,2-bis [4- (3-aminophenoxy) phenyl] propane, 2,2-bis [4- (3 -Aminophenoxy) phenyl-1,1-1,3,3,3-hexafluoropropane, 1,3-bis (3-aminophenoxy) benzene, 4,4'-bis (3-aminophenoxy ) Biphenyl, bis [4- (3-aminophenoxy) phenyl] ketone, bis [4- (3-aminophenoxy) phenyl] sulfide, bis [4- (3-aminophenoxy) phenyl] sulfone, Bis [4- (3-aminophenoxy) phenyl] ether, 4,4'-bis (3-aminophenylsulfonyl) diphenyl ether, 4,4'-bis (3-aminothiophenoxy) diphenyl Sulfone, 1,4-bis [4- (3-aminophenoxy) benzoyl] benzene, and the like. These m-diamines may be used alone or in combination of two or more thereof.

대칭형 방향족 파라치환 제1급 디아민(이후, P-디아민으로 약칭한다)는 일반식Symmetric aromatic para-substituted primary diamines (hereinafter abbreviated as P-diamines) are of the general formula

Figure kpo00003
Figure kpo00003

으로 표시된다(식중 X는 O,SO2,S,CO,CH2,C(CH3)2및 C(CF3)2로부터 선택되고각각의 X는 같거나 달라도 된다).Wherein X is selected from O, SO 2 , S, CO, CH 2 , C (CH 3 ) 2 and C (CF 3 ) 2 and each X may be the same or different.

상기 일반식으로 표시되는 P-디아민의 예로서는, 4,4'-디아미노디페닐에테르, 4,4'-디아미노디페닐술피드, 4,45°디아미노디페닐술폰, 4,4'-디아미노벤조페논, 비스[4-(4-아미노페녹시)페닐]메탄,2,2-비스[4-(4-아미노페녹시)페닐]프로판,2,2-비스[4-(4-아미노페녹시) 페닐]-1, 1-1, 3, 3, 3-헥사플루오로프로판, 1,3-비스(4-아미노페녹시)벤젠, 4,4'-비스(4-아미노페녹시) 비페닐, 비스[4-(4-아미노페녹시) 페닐] 케톤, 비스 [4-(4-아미노페녹시)페닐] 술폭시드, 비스 [4-(4-아미노페녹시) 페닐] 술폰, 비스 [4-(4-아미노페녹시) 페닐]에테르, 4,4'-비스 (4-아미노페닐술포닐) 디페닐에테르, 4,4'-비스 (4-아미노티오페녹시)디페닐술폰, 1,4-비스[4-(4-아미노페녹시)벤조일]벤젠등이 있으며, 이들 P-디아민은 단독 또는 2종이상 혼합해서 사용할 수 있다.As an example of P-diamine represented by the said general formula, 4,4'- diamino diphenyl ether, 4,4'- diamino diphenyl sulfide, 4,45 degrees diamino diphenyl sulfone, 4,4'- Diaminobenzophenone, bis [4- (4-aminophenoxy) phenyl] methane, 2,2-bis [4- (4-aminophenoxy) phenyl] propane, 2,2-bis [4- (4- Aminophenoxy) phenyl] -1, 1-1, 3, 3, 3-hexafluoropropane, 1,3-bis (4-aminophenoxy) benzene, 4,4'-bis (4-aminophenoxy ) Biphenyl, bis [4- (4-aminophenoxy) phenyl] ketone, bis [4- (4-aminophenoxy) phenyl] sulfoxide, bis [4- (4-aminophenoxy) phenyl] sulfone, Bis [4- (4-aminophenoxy) phenyl] ether, 4,4'-bis (4-aminophenylsulfonyl) diphenyl ether, 4,4'-bis (4-aminothiophenoxy) diphenyl Sulfone, 1,4-bis [4- (4-aminophenoxy) benzoyl] benzene, and the like, and these P-diamines may be used alone or in combination of two or more thereof.

상술한 디아민과 반응시키는 방향족 테트라카르복실산 무수물로서는 피로멜리트산 2무수들, 3,3', 4,4'-벤조페논테트라카르복실산 2무수물, 2,2', 3,3'-벤조페논테트라카르복실산 2무수물, 3,3', 4,4'-비페닐테트라카르복실산 2무수물, 2,2', 3,3'-비페닐테트라카르복실산 2무수물, 2,2-비스(3,4-디카르복시페닐)프로판 2무수물, 2,2-비스(2,3-디카르복시페닐) 프로판 2무수물, 비스(3,4-디카르복시페닐) 에테르 2무수물, 비스(3,4-디카르복시페닐)술폰 2무수물, 1,l-비스(2,3-디카르복시페닐)에탄 2무수물, 비스(2,3-디카르복시페닐)메탄 2무수물, 비스(3,4-디카르복시페닐)메탄 2무수물, 2,3,6,7-나프달렌테트라카르복실산 2무수물, 1,4,5,8-나프달렌테트라카르복실산 2무수물,1,2,5,6-나프탈렌테트라카르복실산 2무수물, 1,2,3,4-벤젠 테트라카르복실산 2무수물, 3,4,9,10-페릴렌 테트라카르복실산 2무수물, 2,3,6,7-안트라센케트라카르복실산 2무수물, 1,2,7,8-페난트렌 테트라카르복실산 2무수물등이 사용된다. 이들은 단독 또는 2종이상 혼합해서 사용할 수 있다.As aromatic tetracarboxylic anhydride reacted with the diamine mentioned above, pyromellitic dianhydride, 3,3 ', 4,4'- benzophenone tetracarboxylic dianhydride, 2,2', 3,3'- benzo Phenonetetracarboxylic dianhydride, 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride, 2,2', 3,3'-biphenyltetracarboxylic dianhydride, 2,2- Bis (3,4-dicarboxyphenyl) propane dianhydride, 2,2-bis (2,3-dicarboxyphenyl) propane dianhydride, bis (3,4-dicarboxyphenyl) ether dianhydride, bis (3, 4-dicarboxyphenyl) sulfone dianhydride, 1, l-bis (2,3-dicarboxyphenyl) ethane dianhydride, bis (2,3-dicarboxyphenyl) methane dianhydride, bis (3,4-dicarboxy Phenyl) methane dianhydride, 2,3,6,7-naphdalenetetracarboxylic dianhydride, 1,4,5,8-naphdalenetetracarboxylic dianhydride, 1,2,5,6-naphthalenetetra Carboxylic dianhydride, 1,2,3,4-benzene tetracarboxylic dianhydride, 3,4,9,10-perylene tetraca Include acid dianhydride, 2,3,6,7-anthracene Kane trad dianhydride, phenanthrene-1,2,7,8- tetracarboxylic acid dianhydride is used. These can be used individually or in mixture of 2 or more types.

중합 및 코팅의 목적으로 사용되는 유기용매로서는, 예를 들면, N-메틸-2-피롤리돈, N,N-디메틸아세트아미드, N,N-디메틸포름아미드, 1,3-디메틸-2-이미다졸리디논, N,N-디에틸아세트아미드, N,N-디메틸메톡시아세트아미드, 디메틸술폭시드, 피리딘, 디메틸술폰, 헥사메틸포스포아미드, 테트라메틸우레아, N-메틸카르로락탐, 테트라히드로퓨란, m-디옥산, P-디옥산, 1,2-디메톡시에탄, 비스(2-메톡시에틸)에테르, 1,2-비스(2-메톡시에톡시)에탄, 비스[2-(2-메톡시에톡시)에]에테르등이 있다.As the organic solvent used for the purpose of polymerization and coating, for example, N-methyl-2-pyrrolidone, N, N-dimethylacetamide, N, N-dimethylformamide, 1,3-dimethyl-2- Imidazolidinone, N, N-diethylacetamide, N, N-dimethylmethoxyacetamide, dimethylsulfoxide, pyridine, dimethylsulfone, hexamethylphosphoamide, tetramethylurea, N-methylcaractam, Tetrahydrofuran, m-dioxane, P-dioxane, 1,2-dimethoxyethane, bis (2-methoxyethyl) ether, 1,2-bis (2-methoxyethoxy) ethane, bis [2 -(2-methoxyethoxy) ether] ether and the like.

본 발명에 사용되는 폴리아미드산은, m-디아민과 P-디아민을 유기용메중에 있어서, m-디아민과 P-디아민의 당량비를 0.1-0.6 : 0.9-0.4, 바람직하게는 0.2-0.4 : 0.8-0.6으로 통상 -20℃∼100℃, 바람직하게는 0℃∼40℃에서 혼합한 후, 이것을 방향족 테트라카르복실산 무수물과, -20℃부터 사용되는 용매의 끓는점보다 낮은온도의 범위, 바람직하게는 0℃∼40℃에서 10분이상, 바람직하게는 1∼48시간동안 반응시켜 제조하고(방법 1), 또는 m-디아민과 방향족 테트라카르복실산 무수물을 -20℃부터 사용되는 용매의 끓는점보다 낮은온도의 범위, 바람직하게는 0℃∼40℃에서 10분이상, 바람직하게는 1∼48시간동안 반응시켜 폴리아미드산을 제조하고(A), P-디아민과 방향족 테트라카르복실산 무수물을 상기 폴리아미드산(A)의 제조방법과 마찬가지로하여 폴리아미드산(B)를 제조한 후, (A)와 (B)를 디아민환산의 당량비 0.1-0.6 : 0.9-0.4, 바람직하게는 0.2-0.4 : 0.8-0.6으로 혼합하여 제조한다(방법 2). 상기 방법으로 얻은 폴리아미드산용액은 5∼50%의 폴리아미드산 농도를 갖는다. 이들 두가지 방법중에서, 방법(1)은 기계적 특성등의 관점에서 특히 좋은 결과를 얻을 수 있다. m-디아민의 당량비가 60%이상인 경우에는, 생성된 폴리이미드는 열가소성이 강하고, 또한 프린트배선판은 취급하기 어려운 결점이 발생할 것이다. 특히, 이런 프린트배선판의 와관은, 폴리이미드필름이 납땜인두(300-350℃)에 직접 접촉되어 쉽게 손상되거나, 기판을 고온땜납용액조(280℃이상)에 담글때 변형될 수도 있다. m-디아민의 당량비가 10%이하인 경우에는 생성된 폴리이미드필름은 금속박에 대한 접착력이 약하고, 프린트배선판은 유연성 프린트회로가 막으로부터 벗겨지기 쉽기때문에 실용적으로 부적당할 것이다.In the polyamic acid used in the present invention, m-diamine and P-diamine are used in the organic solvent, and the equivalent ratio of m-diamine and P-diamine is 0.1-0.6: 0.9-0.4, preferably 0.2-0.4: 0.8-0.6 Usually at -20 ° C to 100 ° C, preferably at 0 ° C to 40 ° C, and then at lower temperatures than the boiling point of the aromatic tetracarboxylic anhydride and the solvent used from -20 ° C, preferably 0 It is prepared by reacting for 10 minutes or more at 1 DEG C to 40 DEG C, preferably 1 to 48 hours (Method 1), or at a temperature lower than the boiling point of the solvent used from -20 DEG C to m-diamine and aromatic tetracarboxylic anhydride. At a temperature of 0 ° C. to 40 ° C. for at least 10 minutes, preferably 1 to 48 hours, to prepare a polyamic acid (A), wherein the P-diamine and the aromatic tetracarboxylic anhydride are The polyamic acid (B) was prepared in the same manner as the acid (A) Johann then, (A) and the (B) equivalent ratio of 0.1 to 0.6 in terms of a diamine: prepared by mixing a 0.8 to 0.6 (Method 2): from 0.9 to 0.4, preferably 0.2-0.4. The polyamic acid solution obtained by the above method has a polyamic acid concentration of 5 to 50%. Among these two methods, the method (1) can obtain particularly good results in terms of mechanical properties and the like. If the equivalence ratio of m-diamine is 60% or more, the resulting polyimide will have a strong thermoplasticity, and the printed wiring board will have disadvantages that are difficult to handle. In particular, the tube of such a printed wiring board may be easily damaged by the polyimide film being in direct contact with the soldering iron (300-350 ° C), or may be deformed when the substrate is immersed in a high temperature solder solution bath (280 ° C or higher). If the equivalent ratio of m-diamine is 10% or less, the resulting polyimide film may be inadequate practically because the adhesion to the metal foil is weak, and the printed wiring board is likely to be peeled off from the film.

폴리아미드산의 제조에 사용되는 디아민의 각종 화합중에서 m-디아민은 특허청구범위 11에 서술한, 즉 식Of the various combinations of diamines used in the production of polyamic acids, m-diamine is described in claims 11, i.e.

Figure kpo00004
Figure kpo00004

(식중 X는 O,SO2,S,CO,CH2,C(CH3)2,C(CF3)2또는 직접연결함을 표시한다)으로 표시되는 화합물이 특히좋다. 한편, P-디아민은 4,4'-디아미노페닐에테르.및/또는 4,4'-비스(4-아미노페녹시)비페닐이 특히좋다. 또한 방향족 테트라카르복실산 무수물은 피로멜리트산 2무수물 및/또는 3,3', 4,4'-벤조페논테트라카르복실산 2무수물이 특히좋다. 이들의 사용은 내열성, 전기적특성, 및 접착성, 가요성등의 기계적특성이 우수한 플렉시블 프린트회로 기판을 얻을 수 있다.Particularly preferred are compounds represented by (wherein X represents O, SO 2 , S, CO, CH 2 , C (CH 3 ) 2 , C (CF 3 ) 2 or a direct link). On the other hand, P-diamine is particularly preferred 4,4'-diaminophenyl ether. And / or 4,4'-bis (4-aminophenoxy) biphenyl. The aromatic tetracarboxylic anhydride is particularly preferably pyromellitic dianhydride and / or 3,3 ', 4,4'-benzophenonetetracarboxylic dianhydride. The use of these results in a flexible printed circuit board having excellent mechanical properties such as heat resistance, electrical properties, adhesiveness, and flexibility.

폴리아미드산용액을 금속박에 코팅하기위하여, 폴리아미드산을 직접 사용하거나, 상술한 유기용매와 희석한 후 사용할 수 있다. 제조된 폴리이미드의 물성, 폴리아미드산의 도포물성 및 건조공정의 경제성으로, 폴리아미드산 5∼40중량% 보다 바람직 하게는 10∼30중량%를 함유하고, 대수점도(35℃, 농도 0.59/100ml, N,N-디메틸아세트아미드에서 측정한다)가 0.5∼6dl/g 보다 바람직하게는 0.1∼4dl/g인 폴리아미드산 용액을 사용하는 것이 바람직하다. 보다 간단한 방법으로서, 폴리아미드산의 점도는 도포할때에 회전점도계를 사용하여, 대략 측정할 수 있다. 이런 경우 바람직한 범위는 100∼500,000cps이다.In order to coat the polyamic acid solution on the metal foil, the polyamic acid may be used directly or after dilution with the organic solvent described above. From the physical properties of the produced polyimide, the coating properties of the polyamic acid and the economics of the drying process, the polyamic acid is more preferably 5 to 40% by weight, preferably 10 to 30% by weight, and has an algebraic viscosity (35 ° C., concentration 0.59 / It is preferable to use a polyamic acid solution having 100 ml, measured in N, N-dimethylacetamide), preferably 0.1 to 4 dl / g, more preferably 0.5 to 6 dl / g. As a simpler method, the viscosity of the polyamic acid can be roughly measured using a rotational viscometer at the time of application. In this case, the preferred range is 100 to 500,000 cps.

일반적으로, 폴리아미드산으로 코팅되는 금속박은 동박이나 알루미늄박이 사용된다. 그러나 니켈박등의 다른 전도성 금속박을 사용할 수도 있다.Generally, copper foil or aluminum foil is used for the metal foil coated with polyamic acid. However, other conductive metal foils such as nickel foil can also be used.

폴리아미드산 용액을 금속박에 코팅하는 조작은 캐스팅(casting)에 의하여 실시하는 것이 바람직하다. 구체적으로는, 금속박의 표면에 도막형성용 슬릿으로부터 폴리아미드산 용액을 토출하여, 균일한 두께를 갖는 도막층을 형성한다. 도막층의 두께를 조절하여 마지막으로 얻은 폴리이미드 도막층은 10∼1000㎛의 두께를 가질것이다. 두께가 10㎛이하인 경우에는, 플렉시블 프린트회로 기판은 적당한 강도를 갖지못할 것이고 1000㎛이상인 경우에는, 기판은 가요성이 약할 것이다. 10∼1000㎛의 두께를 갖는 폴리이미드 도막층을 얻기 위해서 폴리아미드산 용액은 일반적으로 30∼3000㎛의 두께로 도포하여야만 한다.The operation of coating the polyamic acid solution on the metal foil is preferably carried out by casting. Specifically, the polyamic acid solution is discharged from the slit for forming a film on the surface of the metal foil to form a coating layer having a uniform thickness. The final polyimide coating layer obtained by adjusting the thickness of the coating layer will have a thickness of 10-1000 μm. If the thickness is 10 mu m or less, the flexible printed circuit board will not have adequate strength, and if it is 1000 mu m or more, the substrate will be weak in flexibility. In order to obtain a polyimide coating layer having a thickness of 10 to 1000 mu m, the polyamic acid solution should generally be applied to a thickness of 30 to 3000 mu m.

롤코터, 나이프코터, 콤마코터, 닥터블레이드(doctor blades), 플로오코터 (fIow coaters) 등등의 다른 공지된 코팅수단을 이용하는 것도 가능하다.It is also possible to use other known coating means such as roll coaters, knife coaters, comma coaters, doctor blades, fIow coaters and the like.

상기에 의해 형성된 폴리아미드산 도막층을 가열하여 탈용매, 탈수축합반응을 행한다. 이 조작은 상압, 감압 및 가압등의 임의의 조건하에서 행할 수 있다. 가열방법은 열기가열, 적외선가열, 원 적외선가열등을 사용할 수 있고, 이들 가열방법을 혼합하여 사용할 수도 있다. 일반적으로, 100∼200℃, 바람직하게는100∼150℃의 온도에서 3∼600분, 바람직하게는 4∼180분, 더욱 바람직하게는 5∼60분동안 가열하여 대부분의 용매를 제거한다. 다시 180∼350℃에서 2∼600분, 바람직하게는 3∼180분, 더욱 바람직하게는 5∼120분동안 가열하여 용매를 완전히 제거하고 폴리아미드산을 보다 안정한 폴리이미드로 전화한다. 만일, 탈용매및 탈수공정에서 코팅된 금속박이, 금속박표면이 산화되는 온도이상의 온도로 노출되는 경우에는, 금속박표면의 산화로 인하여 금속박의 기계적특성, 전기적특성 및 접착성이 저하된다. 따라서 금속박표면이 산화되는 온도이상에서는, 탈용매, 탈수공정을 질소, 헬륨, 네온, 아르곤등의 불활성가스 분위기에서 행하는 것이 금속박 표면의 산화를 방지하는데 가장 좋다. 여기서 사용된 불활성가스는, 금속박을 소정시간동안 가열할때 금속박표면이 전기적특성 또는 접착력등에 나쁜 영향을 미치는 실질적인 산화반응을 받지않는 기체분위기를 의미한다. 이것은 가열온도에 의존하지만 일반적으로 불활성가스 분위기는 산소함량이 10%이하, 바람직하게는 6%이하, 보다 바람직하게는 4%이하인 기체분위기를 의미한다.The polyamic acid coating film layer formed as described above is heated to perform desolvent and dehydration condensation reaction. This operation can be performed under arbitrary conditions, such as normal pressure, reduced pressure, and pressurization. As the heating method, hot heating, infrared heating, far infrared heating, or the like may be used, and these heating methods may be mixed and used. Generally, most solvents are removed by heating at 100 to 200 ° C., preferably at 100 to 150 ° C. for 3 to 600 minutes, preferably 4 to 180 minutes, more preferably 5 to 60 minutes. The mixture is then heated at 180 to 350 ° C. for 2 to 600 minutes, preferably 3 to 180 minutes, more preferably 5 to 120 minutes to completely remove the solvent and convert the polyamic acid to a more stable polyimide. If the metal foil coated in the desolvent and dehydration process is exposed to a temperature higher than the temperature at which the metal foil surface is oxidized, the mechanical properties, electrical properties, and adhesion of the metal foil are degraded due to oxidation of the metal foil surface. Therefore, above the temperature at which the metal foil surface is oxidized, it is best to prevent the oxidation of the metal foil surface by performing a desolvent and dehydration process in an inert gas atmosphere such as nitrogen, helium, neon, argon, or the like. The inert gas used herein refers to a gas atmosphere in which the metal foil surface is not subjected to substantial oxidation reaction when the metal foil is heated for a predetermined time, which adversely affects electrical properties or adhesion. This depends on the heating temperature but generally the inert gas atmosphere means a gas atmosphere with an oxygen content of 10% or less, preferably 6% or less, more preferably 4% or less.

상술한 가열 및 건조공정은 통상 고팅된 금속박을 펼치면서 행한다. 그렇지만 본 발명에 따라서 금속박에 폴리아미드산 의 유기용매 용액을 직접 고팅한 후, 실질적으로 반경화건조상태(도막층의 용제함량이 40중량%이하일때까지) 로 건조하고, 로울형상으로 감아서, 이것을 불활성분위기하에서 가열하여 탈용매, 탈수하는 것도 가능하다.The above-described heating and drying step is usually performed while spreading the coated metal foil. However, according to the present invention, after directly fixing the organic solvent solution of polyamic acid on the metal foil, it is dried in a substantially semi-dried state (until the solvent content of the coating layer is 40% by weight or less), and wound into a roll shape. It is also possible to heat this under an inert atmosphere to desolvent and dewater.

본 발명의 상술한 방법으로 제조하는 폴리이미드 금속장판으로 이루어진 플렉시블 프린트회로 기판은, 접착제층을 함유하지 않으며, 우수한 폴리이미드를 사용했기 때문에 내열성, 기계적특성 및 전기적특성이 우수하다.The flexible printed circuit board made of the polyimide metal sheet produced by the above-described method of the present invention does not contain an adhesive layer, and is excellent in heat resistance, mechanical properties, and electrical properties because excellent polyimide is used.

본 발명의 플렉시블 프린트회로 기판은 폴리이미드막을 동박등의 금속박에 직접, 또는 접착제의 사용없이, 적층하여 제조되기 때문에, 종래 기술에서 달성할 수 없었던 내열성, 전기적특성 및, 접착성, 가요성등의 기계적특성이 우수하다. 그러므로 우수한 내열성, 전기적 절연특성, 유전특성, 접착성 및 내절강도를 요구하는 전기회로의 제조에 매우 유용하다.Since the flexible printed circuit board of the present invention is manufactured by laminating a polyimide film directly on a metal foil such as copper foil or without the use of an adhesive, heat resistance, electrical properties, adhesiveness, flexibility, etc. Excellent mechanical properties Therefore, it is very useful for the manufacture of electric circuits requiring excellent heat resistance, electrical insulation properties, dielectric properties, adhesion and breakdown strength.

[실시예]EXAMPLE

본 발명의 실시예 및 비교예로서 본 발명 및 그 효과를 구체적으로 설명한다.The present invention and its effects will be described in detail as examples and comparative examples of the present invention.

실시예중의 대수점도는 35℃, 0.5g/100ml, N,N-디메틸아세트아미드에서 측정하였고, 회전점도는 E형점도계의 고점도용 회전자를 사용하여 25℃에서 측정하였다. 프린트회로 기판의 각종 성능특성은 아래에 서술한 방법에 의해 측정했다.The logarithmic viscosity in Examples was measured at 35 ° C., 0.5 g / 100 ml, N, N-dimethylacetamide, and the rotational viscosity was measured at 25 ° C. using a high viscosity rotor of an E-viscosity meter. Various performance characteristics of the printed circuit board were measured by the method described below.

(1) 박을 벗기는 강도(1) peeling strength

IPC-FC-241A의 방법에 준해서 측정했다.It measured according to the method of IPC-FC-241A.

(2) 표면저항(2) surface resistance

JIS C-6481에 준해서 측정했다.It measured according to JIS C-6481.

(3) 납땜에 대한 저항(3) resistance to soldering

납땜에 대한 저항은 JISC-6481에 준해서 측정했다. 구체적으로, 시료를 280℃의 땜납용액조에서 60초동안 침적시킨 후, 부풀음의 발생 및 폴리이미드필름의 변형을 관찰했다.Resistance to soldering was measured in accordance with JISC-6481. Specifically, after the sample was deposited for 60 seconds in a solder bath at 280 ° C., swelling and deformation of the polyimide film were observed.

(4) 수동식 납땜에 대한 저항(4) resistance to manual soldering

납땜인두의 선단부의 곡률반경이 0.5mm, 테이퍼 각도가 30°인 납땜인두를 사용하여, 선단부로의 하중이100g이 되도록 조절했다. 선단부의 온도가 325±25℃로 되도록 조절하고, 폴리이미드만으로 구성되는 막(두께 25㎛)위에 납땜인두를 수직이 되도록 세웠다. 납땜인두를 접촉시킨 후 5초이상 그대로 남아있는 경우에, 수동식납맴에 대한 저항이 좋은 경우는 ○으로, 5초이내에 파괴되는 경우는 ×로 평가했다.Using a soldering iron with a curvature radius of 0.5 mm and a taper angle of 30 °, the load to the tip was adjusted to 100 g. The temperature at the tip was adjusted to be 325 ± 25 ° C., and the soldering iron was erected vertically on a film composed of polyimide (thickness 25 μm). When the soldering iron was left in contact for 5 seconds or more, the resistance to the manual solder member was good, and the case of breaking within 5 seconds was evaluated as x.

(5) 내절강도(Folding endurance)(5) Folding endurance

JIS P-8115에 준해서, 구부러진 면의 곡률반경이 0.8mm, 정지하중 500g에서 측정을 행하였다.According to JIS P-8115, the curvature radius of the curved surface was measured at 0.8 mm and a static load of 500 g.

(6) 유전율 및 유전손실율(6) dielectric constant and dielectric loss rate

JIS C-6481에 준해서 주파수 1KHz에서 행하였다.It carried out at the frequency of 1 KHz according to JIS C-6481.

[실시예 1]Example 1

교반기, 환류냉각기 및 질소도입관을 갖춘 용기에 1,3-비스(3-아미노페녹시)벤젠 23.4g(0.08몰) 및 4,4'-디아미노디페닐에테르 24.0g(0.12몰)을 N,N-디메틸아세트아미드 420m1에 용해하였다. 이 용액에 질소분위기하에서 3,3', 4,4'-벤조페논테트라카르복실산 2무수물 64.4g(0.02몰)을 첨가하고, 이 혼합물을 10℃에서' 24시간동안 교반하여 폴리아미드산 용액을 얻었다. 이 용액의 대수점도는 1.5dl/g이었다. 이 폴리아미드산 용액을 N,N-디메틸아세트아미드에 폴리아미드산 농도 15%까지 희석하여 점도를 25000cps로 조절하고, 닥터블레이드를 사용하여 압연동박(두께 35㎛)에 희석용액을 균일하게 코팅했다. 이 코팅동박을130℃에서 60분간 가열건조한 후, 260℃의 질소분위기(산소농도 4%)하에서 60분간 가열하여 폴리이미드를고팅한 동박을 얻었다. 막두께는 25㎛이었다. 이 프린트회로 기판의 특성을 표1에 나타냈다.23.4 g (0.08 mol) of 1,3-bis (3-aminophenoxy) benzene and 24.0 g (0.12 mol) of 4,4'-diaminodiphenyl ether were added to a vessel equipped with a stirrer, a reflux cooler and a nitrogen introduction tube. It was dissolved in 420m1 of N-dimethylacetamide. 64.4 g (0.02 mol) of 3,3 ', 4,4'- benzophenone tetracarboxylic dianhydride are added to this solution under nitrogen atmosphere, and this mixture was stirred at 10 degreeC for 24 hours, and the polyamic-acid solution was carried out. Got. The algebraic viscosity of this solution was 1.5 dl / g. The polyamic acid solution was diluted in N, N-dimethylacetamide to a polyamic acid concentration of 15%, the viscosity was adjusted to 25000 cps, and the diluted solution was uniformly coated on the rolled copper foil (thickness 35 µm) using a doctor blade. . The coated copper foil was heated and dried at 130 ° C. for 60 minutes, and then heated for 60 minutes under a nitrogen atmosphere (oxygen concentration of 4%) at 260 ° C. to obtain a copper foil coated with polyimide. The film thickness was 25 micrometers. Table 1 shows the characteristics of this printed circuit board.

[실시예 2]Example 2

교반기, 환류냉각기 및 질소도입관을 갖춘 용기에, 4,4'-비스(3-아미노페녹시)비페닐 22.1g(0.06몰) 및 4,4'-디아미노디페닐에테르 28.0g(0.14몰)을 N,N-디메틸아세트아미드 350ml에 용해하였다. 이 용액을 0℃ 정도로 냉각한 후, 여기에 질소분위기하에서 피로멜리트산 2무수물 43.6g(0.20몰)을 첨가하여, 0℃정도에서 2시간동안 교반하였다. 다음에 이 혼합물을 실온으로 되돌려서 질소분위기하에서 20시간동안 교반하였다. 이렇게해서 얻은 폴리아미드산 용액의 대수점도는 1.7dl/g이었다. 이 폴리아미드산 용액을 N,N-디케틸아세트아미드에 폴리아미드산 농도 19%까지 회석하여 희전점도를 120000cps로 조절했다.In a vessel equipped with a stirrer, a reflux condenser and a nitrogen introduction pipe, 22.1 g (0.06 mol) of 4,4'-bis (3-aminophenoxy) biphenyl and 28.0 g (0.14 mol) of 4,4'-diaminodiphenyl ether ) Was dissolved in 350 ml of N, N-dimethylacetamide. After cooling this solution to about 0 degreeC, 43.6 g (0.20 mol) of pyromellitic dianhydrides were added to it under nitrogen atmosphere, and it stirred at about 0 degreeC for 2 hours. The mixture was then returned to room temperature and stirred for 20 hours under a nitrogen atmosphere. The logarithmic viscosity of the polyamic acid solution thus obtained was 1.7 dl / g. This polyamic acid solution was hydrated in N, N-diketylacetamide to a polyamic acid concentration of 19% to adjust the dilution viscosity to 120000 cps.

이 용액을 캐스팅에 의해 압연동박(두께 35㎛)에 균일하게 도포하고, 이것을 130℃에서 10분간 가열건조하고, 다시 160℃에서 10분간 가열건조한 후 270℃의 질소분위기(산소농도 3%)하에서 10분간 가열하여 폴리이미드를 코팅한 동박을 얻었다. 막두께는 25㎛이었다. 이 프린트회로 기판의 특성을 표1에 나타냈다.The solution was uniformly applied to the rolled copper foil (35 μm in thickness) by casting, heat dried at 130 ° C. for 10 minutes, and further dried at 160 ° C. for 10 minutes, and then under nitrogen atmosphere of 270 ° C. (oxygen concentration 3%). It heated for 10 minutes and obtained the copper foil which coated polyimide. The film thickness was 25 micrometers. Table 1 shows the characteristics of this printed circuit board.

[실시예 3]Example 3

코팅된 동박을 270℃로 건조할때 산소농도를 8%로.사용하는 것 이외에는 상술한 실시예 2와 동일한 방법으로하여 폴리이미드를 코팅한 동박을 얻었다. 이 프린트회로 기판의 특성을 표1에 나다냈다.The copper foil coated with polyimide was obtained in the same manner as in Example 2 except that the coated copper foil was used at an oxygen concentration of 8% when drying at 270 ° C. Table 1 shows the characteristics of this printed circuit board.

[실시예 4]Example 4

실시예 2에서 사용한 4,4'-디아미노디페닐에테르 28.0g 대신에 4,4°비스(4-아미노페녹시)비페닐 51.6g(0.14몰)을 사용한 것 이외에는 상술한 실시예 2와 마찬가지로하여 폴리아미드산 용액을 제조하였다. 이렇게해서 제조한 폴리아미드산 용액의 대수점도는 1.6dl/g이었다. 이 폴리아미드산 용액을 N,N-디메틸아세트아미,드에 폴리아미드산 농도 18%까지 희석하여, 회전점도를 105000cps로 조절하였다.In the same manner as in Example 2, except that 51.6 g (0.14 mol) of 4,4 ° bis (4-aminophenoxy) biphenyl was used instead of 28.0 g of 4,4'-diaminodiphenyl ether used in Example 2. To prepare a polyamic acid solution. The logarithmic viscosity of the polyamic acid solution thus prepared was 1.6 dl / g. The polyamic acid solution was diluted to 18% polyamic acid concentration in N, N-dimethylacetamide, and the rotational viscosity was adjusted to 105000 cps.

이 용액을 캐스팅에 의해 압연동박(두께 35㎛)에 균일하게 도포하고, 이것을 130℃에서 20분간 가열하여 건조하고, 다시 160℃에서 20분간 가열건조한 후, 270℃의 질소분위기(산소농도 3%)하에서 20분간 가열하여, 폴리이미드를 코팅한 동박을 얻었다. 막두께는 25㎛이었다. 이 프린트회로 기판의 특성을 표1에 나타냈다.The solution was uniformly coated on a rolled copper foil (35 μm in thickness) by casting, heated and dried at 130 ° C. for 20 minutes, and then dried by heating at 160 ° C. for 20 minutes, followed by a nitrogen atmosphere of 270 ° C. (oxygen concentration 3%). ) And it heated for 20 minutes, and obtained copper foil which coated polyimide. The film thickness was 25 micrometers. Table 1 shows the characteristics of this printed circuit board.

[실시예 5]Example 5

교반기, 환류냉각기 및 질소도입관을 갖춘 용기에 비스[4-(3-아미노페녹시)페닐케톤] 31.7g(0.08몰)및4,4'-디아미노디페닐에테르 24.0g(0.12몰)을 N,N-디메틸아세트아미드 400ml에 용해하였다. 이 용액에 질소분위기하에서 피로멜리트산 2무수물 43.6g(0.20롤)을 첨가하여 24시간동안 교반하였다. 이렇게해서 얻은 폴리아미드산 용액의 대수점도는 1.8dl/g이었다. 이 폴리아미드산 용액을 N,N-디메틸아세트아미드에 폴리아미드산 농도 13%까지 희석하여 회전점도를 25000cps로 조절하고, 닥터블레이드를 사용하여 HTE전해동박(두께 18㎛,Mitsui Metal Mining Co.제조)에 희석용액을 균일하게 코팅하였다. 이것을 130℃에서 10분간 가열건조하고, 다시 l60℃에서 10분동안 가열건조한 후, 270℃의 질소분위기하에서 10분간 가열하여 폴리이미드를 코팅한 동박을 얻었다. 막두께는 25㎛이었다.,이 프린트회로 기판의 특성을 표1에 나타냈다.In a vessel equipped with a stirrer, a reflux condenser and a nitrogen introduction tube, 31.7 g (0.08 mol) of bis [4- (3-aminophenoxy) phenyl ketone] and 24.0 g (0.12 mol) of 4,4'-diaminodiphenyl ether were added. It was dissolved in 400 ml of N, N-dimethylacetamide. 43.6 g (0.20 roll) of pyromellitic dianhydride was added to this solution under nitrogen atmosphere, and it stirred for 24 hours. The logarithmic viscosity of the polyamic acid solution thus obtained was 1.8 dl / g. The polyamic acid solution was diluted in N, N-dimethylacetamide to a polyamic acid concentration of 13% to adjust the rotational viscosity to 25000 cps, and the HTE electrolytic copper foil (manufactured by Mitsui Metal Mining Co., Ltd.) using a doctor blade. The diluted solution was uniformly coated on. The resultant was dried by heating at 130 ° C. for 10 minutes, and further dried by heating at l 60 ° C. for 10 minutes, and then heated under a nitrogen atmosphere at 270 ° C. for 10 minutes to obtain a polyimide-coated copper foil. The film thickness was 25 µm. Table 1 shows the characteristics of this printed circuit board.

[실시예 6]Example 6

교반기, 환류냉각기 및 질소도입관을 갖춘 용기에 비스[4-(3-아미노페녹시)페닐술피드 24.0g(0.06몰)및 4,4',-비스(4-아미노페녹시)비페닐 51.6g(0.14몰)을 N,N-디메틸아세트아미드 420ml에 용해하였다. 이 용액에 질소분위기하에서 피로멜리트산 2무수물 43.6g(0.20몰)을 첨가하여 24시간 교반하였다. 이렇게해서 얻은 폴리아미드산용액의 대수점도는 2.1dl/g이었다. 이 폴리아미드산 용액을 N,N-디메틸아세트아미드에 폴리아미드산 농도 12%까지 희석하여 회전점도를 45,000cps로 조절하고, 닥터블레이드를 사용하여 HTE전해동박(두께 35㎛ ; Mitsui Metal Mining Co.)에 회석용액을 균일하게 코팅하였다. 이것을 130℃에서 10분간 가열건조하고, 다시 160℃에서 10분간 가열건조한 후, 270℃의 질소분위기(산소농도 3%)하에서 가열하여 폴리이미드를 코팅한 동박을 얻었다. 막두께는 50㎛이었다. 이 프린트회로기판의 특성을 표1에 나타냈다.24.0 g (0.06 mol) of bis [4- (3-aminophenoxy) phenylsulfide and 4,4 ',-bis (4-aminophenoxy) biphenyl in a container equipped with a stirrer, a reflux condenser and a nitrogen introduction tube. g (0.14 mol) was dissolved in 420 ml of N, N-dimethylacetamide. 43.6 g (0.20 mol) of pyromellitic dianhydrides were added to this solution under nitrogen atmosphere, and it stirred for 24 hours. The logarithmic viscosity of the polyamic acid solution thus obtained was 2.1 dl / g. The polyamic acid solution was diluted with N, N-dimethylacetamide to a polyamic acid concentration of 12% to adjust the rotational viscosity to 45,000 cps, using a doctor blade to HTE electrolytic copper foil (thickness 35 μm; Mitsui Metal Mining Co.) The lime solution was uniformly coated on. The resultant was dried by heating at 130 ° C. for 10 minutes and further dried by heating at 160 ° C. for 10 minutes, and then heated under a nitrogen atmosphere (oxygen concentration of 3%) at 270 ° C. to obtain a polyimide-coated copper foil. The film thickness was 50 micrometers. Table 1 shows the characteristics of this printed circuit board.

[실시예 7]Example 7

실시예 6 에서 사용한 비스[4-(3-아미노메녹시)페닐]술피드 24.0g대신에 비스[4-(3-아미노페녹시)페닐]술폰 25.9g(0.06몰)을 사용한 것 이외에는 상술한 실시예6과 마찬가지로 하여 폴리아미드산 용액을 제조하였다, 이 폴리아미드산 용액의 대수점도는 2.0dl/g이었다. 이 용액을 N,N-디메틸아세트아미드에 폴리아미드산 농도 13%까지 희석하여 회전점도를 40000cps로 조절하고, 이후에는 실시예6의 과정을 반복하여 폴리이미드를 코팅한 동박을 얻었다. 이 프린트회로기판의 특성을 표1에 나타냈다.25.9 g (0.06 mol) of bis [4- (3-aminophenoxy) phenyl] sulfone was used instead of 24.0 g of bis [4- (3-aminomenoxy) phenyl] sulfide used in Example 6. A polyamic acid solution was prepared in the same manner as in Example 6, and the logarithmic viscosity of the polyamic acid solution was 2.0 dl / g. The solution was diluted with N, N-dimethylacetamide to a polyamic acid concentration of 13% to adjust the rotational viscosity to 40000 cps, after which the procedure of Example 6 was repeated to obtain a polyimide-coated copper foil. Table 1 shows the characteristics of this printed circuit board.

[실시예 8]Example 8

실시예6에서 사용한 비스[4-(3-아미노메녹시)페닐]술피드 24.0g대신에 2,2-비스[4-(3-아미노페녹시)페닐]-1,1,1,3,3,3-헥사플루오로프로판 31.1g(0.06몰)을 사용한것 이외에는 상술한 실시예6과 마찬가지로 하여 폴리아미드산 용액을 제조했다. 이렇게해서 얻은 용액의 대수점도는 1.2dl/g이었다. 이 용액을 N,N-디메틸아세트아미드에 폴리아미드산 농도 18%까지 희석하여 회전점도를 45000cps로 조절하였다. 이후에는 실시예6의 과정을 반복하여 폴리이미드를 코팅한 동박을 얻었다. 이 프린트회로기판의 특성을 표1에 나타냈다.·2,2-bis [4- (3-aminophenoxy) phenyl] -1,1,1,3, instead of 24.0 g of bis [4- (3-aminomenoxy) phenyl] sulfide used in Example 6 A polyamic acid solution was prepared in the same manner as in Example 6 except that 31.1 g (0.06 mol) of 3,3-hexafluoropropane was used. The algebraic viscosity of the solution thus obtained was 1.2 dl / g. This solution was diluted to 18% polyamic acid concentration in N, N-dimethylacetamide to adjust the rotational viscosity to 45000 cps. Thereafter, the procedure of Example 6 was repeated to obtain a copper foil coated with polyimide. The characteristics of this printed circuit board are shown in Table 1.

[실시예 9]Example 9

교반기, 환류냉각기 및 질소도입관을 갖춘 용기에서 l,3-비스(3-아미노페녹시)벤젠 23.4g(0.08몰)을 N,N-디메틸아세트아미드 200ml에 용해하였다. 이 용액에 질소분위기하에서 3,3',4,4'-벤조페논테트라카르복실산 2무수몰 25.7g(0.08몰)을 첨가하여, 실온에서 24시간 교반해서 폴리아미드산 용액을 얻었다. 이렇게해서 얻은 폴리아미드산 용액외 대수점도는 1.8dl/g이였다. 이 용액을 용액A라고 표시한다.23.4 g (0.08 mole) of l, 3-bis (3-aminophenoxy) benzene was dissolved in 200 ml of N, N-dimethylacetamide in a vessel equipped with a stirrer, a reflux condenser and a nitrogen introduction tube. 25.7 g (0.08 mol) of 2, anhydrous mol of 3,3 ', 4,4'- benzophenone tetracarboxylic acid was added to this solution under nitrogen atmosphere, and it stirred at room temperature for 24 hours, and obtained the polyamic-acid solution. The algebraic viscosity other than the polyamic acid solution thus obtained was 1.8 dl / g. This solution is labeled as solution A.

한편, 4,4'-디아미노페닐아테르 24.0g(0.12몰)을 N,N-디메틸아세트아미드 250ml에 용해하였다. 이 용액에 질소분위기하에서 3,3'-4,4'-벤조페논테트라카르복실산 2무수물 38.7g(0.12몰)을첨가하여 실온에서 24시간 교반해서 폴리아미드산 용액을 얻었다. 이렇게해서 얻은 폴리아미드산 용액의 대수점도는 l.6dl/g이었다. 이 용액을 용액 B라고 한다.On the other hand, 24.0 g (0.12 mol) of 4,4'- diaminophenyl ether was dissolved in 250 ml of N, N-dimethylacetamide. 38.7 g (0.12 mol) of 3,3'-4,4'-benzophenone tetracarboxylic dianhydride was added to this solution under nitrogen atmosphere, and it stirred at room temperature for 24 hours, and obtained the polyamic-acid solution. The algebraic viscosity of the polyamic acid solution thus obtained was 1,6 dl / g. This solution is called solution B.

다음에 용액A 59g과 용액B 74g을 혼합하여 용액A의 폴리아미드산과 용액B의 폴리아미드산과의 당량비를 40 : 60으로 조절하였다. 이 용액을 N,N-디메틸아세트아미드에 풀리아미드산 농도 14%까지 희석하여 점도를 26000cps로 조절하여, 닥터블레이드를 사용하여 압연동박(두께 35㎛)에 희석용액을 균일하게 코팅하였다. 이것을 150℃에서 60분간 건조한 후 260℃의 질소분위기(산소농도 3%)하에서 30분간 가열하여 폴리이미드를 코팅한 동박을 얻었다. 막 두께는 25㎛이었다. 이 프린트회로기판의 특성을 표1에 나타냈다.Next, 59 g of Solution A and 74 g of Solution B were mixed to adjust the equivalence ratio between the polyamic acid of Solution A and the polyamic acid of Solution B to 40:60. The solution was diluted with N, N-dimethylacetamide to 14% of the polyalimic acid concentration to adjust the viscosity to 26000 cps, and the diluted solution was uniformly coated on the rolled copper foil (thickness 35 µm) using a doctor blade. The resultant was dried at 150 ° C. for 60 minutes and heated for 30 minutes under a nitrogen atmosphere (oxygen concentration of 3%) at 260 ° C. to obtain a copper foil coated with polyimide. The film thickness was 25 micrometers. Table 1 shows the characteristics of this printed circuit board.

[실시예 10]Example 10

교반기, 환류냉각기 및 질소도입관을 갖춘 용기에서 4,4'-비스(3-아미노페녹시)비페닐 22.lg(0.06몰)을 N,N-디메틸아세트아미드 150ml에 용해하였다. 이 용액에 질소분위기하에서 피로멜리트산 2무수물 13.lg(0.06몰)을 첨가하여 실온에서 24시간 교반해서 폴리아미드산 용액을 얻었다. 이렇게해서 얻은 폴리아미드산 용액의 대수점도는 1.7dl/g이었다. 이 용액을 용액C라고 한다.22.lg (0.06 mol) of 4,4'-bis (3-aminophenoxy) biphenyl was dissolved in 150 ml of N, N-dimethylacetamide in a vessel equipped with a stirrer, a reflux condenser and a nitrogen introduction tube. 13.lg (0.06 mol) of pyromellitic dianhydrides were added to this solution under nitrogen atmosphere, and it stirred at room temperature for 24 hours, and obtained the polyamic-acid solution. The logarithmic viscosity of the polyamic acid solution thus obtained was 1.7 dl / g. This solution is called solution C.

한편, 4,4'-디아미노디페닐에테르 28.0g(0.14몰)을 N,N-디메틸아세트아미드 240ml에 용해하였다. 이 용액에 질소분위기하에서 피로멜리트산 2무수물 30.5g(0.14몰)을 첨가하여 이 혼합물을 실온에서 24시간 교반해서 폴리아미드산 용액을 얻었다. 이렇게해서 얻은 폴리아미드산 용액의 대수점도는 1.6dl/g이었다. 이 용액을 용액D라 한다.On the other hand, 28.0 g (0.14 mol) of 4,4'-diaminodiphenyl ether was dissolved in 240 ml of N, N-dimethylacetamide. 30.5 g (0.14 mol) of pyromellitic dianhydrides were added to this solution under nitrogen atmosphere, and this mixture was stirred at room temperature for 24 hours, and the polyamic-acid solution was obtained. The logarithmic viscosity of the polyamic acid solution thus obtained was 1.6 dl / g. This solution is called solution D.

다음에, 용액C 44g과 용액D 71g을 혼합하여 용액C의 폴리아미드산과 용액D의 폴리아미드산과의 당량비를 30 : 70을 조절하였다. 이 용액을 N,N-디메틸아세트아미드에 폴리아미드산 농도 15%까지 희석하여 점도를 30000cps로 조절하였다. 그리고나서, 닥터블레이드를 사용하여 압연동박(두께 35㎛)에 희석용액을 균일하게 코팅하였다. 이것을 150℃에서 60분간 건조한 후, 260℃의 질소분위기(산소농도 3%)하에서 30분간 가열하여 폴리이미드를 코팅한 동박을 얻었다. 막두께는 25㎛이었다. 이 프린트회로기판의 특성을 표1에 나타냈다.Next, 44 g of solution C and 71 g of solution D were mixed to adjust the equivalent ratio of polyamic acid of solution C and polyamic acid of solution D to 30:70. The solution was diluted with N, N-dimethylacetamide to a polyamic acid concentration of 15% to adjust the viscosity to 30000 cps. Then, the diluted solution was uniformly coated on the rolled copper foil (thickness 35 mu m) using a doctor blade. After drying this at 150 degreeC for 60 minutes, it heated for 30 minutes in 260 degreeC nitrogen atmosphere (oxygen concentration 3%), and obtained the copper foil which coated polyimide. The film thickness was 25 micrometers. Table 1 shows the characteristics of this printed circuit board.

[비교예 1]Comparative Example 1

교반기, 환류냉각기 및 질소도입관을 갖춘 용기에서 1,3-비스(3-아미노페녹시)벤젠 58.4g(0.20몰)을 N,N-디메틸아세트아미드 430ml에 용해하였다. 이 용액에 질소분위기하에서 3,3',4,4'-벤조페논테트라카르복시란 2무수물 64.4g(0.20몰)을 첨가하여 이 혼합물을 10℃에서 24시간 교반하여 폴리아미드산 용액을 얻었다. 이렇게해서 얻은 폴리아미드산 용액의 대수점도는 1.4dl/g이었다. 이 폴리아미드산 용액을 N,N-디 메틸아세트아미드에, 폴리아미드산 농도 18%까지 희석하여 회전점도를 27000cps로 조절하였다. 그리고나서 닥터블레이드를 사용하여 압연동박(두께 35㎛)에 희석용액을 균일하게 코팅하였다. 이것을 130℃에서 60분간 건조한 후, 240℃의 질소분위기(산소농도 4%)하에서 60분간 가열하여 폴리이미드를 코팅한 동박을 얻었다. 막두께는 25㎛이었다. 이 프린트회로기판의 특성을 표2에 나타냈다.58.4 g (0.20 mol) of 1,3-bis (3-aminophenoxy) benzene was dissolved in 430 ml of N, N-dimethylacetamide in a vessel equipped with a stirrer, a reflux condenser and a nitrogen introduction tube. 64.4 g (0.20 mol) of 3,3 ', 4,4'- benzophenone tetracarboxylic dianhydride was added to this solution under nitrogen atmosphere, and this mixture was stirred at 10 degreeC for 24 hours, and the polyamic-acid solution was obtained. The algebraic viscosity of the polyamic acid solution thus obtained was 1.4 dl / g. The polyamic acid solution was diluted with N, N-dimethylacetamide to 18% polyamic acid concentration to adjust the rotational viscosity to 27000 cps. Then, the diluted solution was uniformly coated on the rolled copper foil (thickness 35 μm) using a doctor blade. After drying this at 130 degreeC for 60 minutes, it heated for 60 minutes in 240 degreeC nitrogen atmosphere (oxygen concentration 4%), and obtained the copper foil which coated polyimide. The film thickness was 25 micrometers. Table 2 shows the characteristics of this printed circuit board.

[비교예 2]Comparative Example 2

교반기, 환류냉각기 및 질소도입관을 갖춘 용기에서 4,4'-비스(4-아미노페녹시)비페닐 73.6g(0.20몰)을 N,N-디메틸아세트아미드 400ml에 용해하였다. 이 용액을 0℃정도에서 냉각한 후, 여기에 질소분위기하에서 피로멜리트산 2무수물 43.6g(0.20몰)을 첨가하여 0℃정도에서 2시간동안 교반하였다. 그리고나서 이 혼합물을 실온으로 되돌리고 질소분위기하에서 약 20시간 교반하였다. 이렇게해서 얻은 폴리아미드산 용액의 대수점도는 l.6dl/g이었다. 이 폴리아미드산 용액을 N,N-디메틸아세트아미드에 폴리아미드산 농도 18%까지 희석하여 회전점도를 110,000cps로 조절하였다.In a vessel equipped with a stirrer, a reflux condenser and a nitrogen introduction tube, 73.6 g (0.20 mol) of 4,4'-bis (4-aminophenoxy) biphenyl was dissolved in 400 ml of N, N-dimethylacetamide. After cooling this solution at about 0 degreeC, 43.6 g (0.20 mol) of pyromellitic dianhydrides were added to it under nitrogen atmosphere, and it stirred at about 0 degreeC for 2 hours. The mixture was then returned to room temperature and stirred for about 20 hours under a nitrogen atmosphere. The algebraic viscosity of the polyamic acid solution thus obtained was 1,6 dl / g. The polyamic acid solution was diluted with N, N-dimethylacetamide to a polyamic acid concentration of 18% to adjust the rotational viscosity to 110,000 cps.

이 용액을 캐스팅에 의해서 압연동박(두께 35㎛)에 균일하게 도포하였다. 이것을 130℃에서 10분간 가열건조하고, 다시 160℃에서 10분간 가열건조후, 270℃의 질소분위기(산소농도 3%)하에서 10분간 가열하여 폴리이미드를 코팅한 동박을 얻었다. 막두께는 25㎛이었다. 이 프린트회로기판의 특성을 표2에 나다냈다.This solution was apply | coated uniformly to the rolled copper foil (35 micrometers in thickness) by casting. The resultant was dried by heating at 130 ° C. for 10 minutes and further dried by heating at 160 ° C. for 10 minutes, and then heated under a 270 ° C. nitrogen atmosphere (oxygen concentration of 3%) for 10 minutes to obtain a polyimide-coated copper foil. The film thickness was 25 micrometers. Table 2 shows the characteristics of this printed circuit board.

[표 1]TABLE 1

Figure kpo00005
Figure kpo00005

[표 2]TABLE 2

Figure kpo00006
Figure kpo00006

Claims (14)

대칭형 방향족 메타치환 제1급 디아민과 대칭형 방향족 파라치환 제1급 디아민을 당량비 10-60 : 90-40으로 혼합한 후, 방향족테트라카르복실산 무수물과 반응시켜 생성된 폴리아미드 필름을 금속박에 직접 접합시키는 것을 특징으로 하는 플렉시블 프린트회로기판.After symmetrical aromatic metasubstituted primary diamine and symmetrical aromatic parasubstituted primary diamine are mixed in an equivalent ratio of 10-60: 90-40, the polyamide film produced by reacting with aromatic tetracarboxylic anhydride is directly bonded to the metal foil. Flexible printed circuit board, characterized in that. 대칭형 방향족 메타치환 제1급 디아민과 방향족 테트라 카르복실산 무수물을 반응시켜 폴리아미드산(A)을 제조하고, 대칭형 방향족 파라치환 제1급 디아민과 테트라카르복실산 무수물을 반응시켜 폴리아미드산(B)를 제조하여, 상기 폴리아미드산(A)과 상기 폴리아미드산(B)을 당량비 10-60 : 90-40으로 혼합하여 반응시켜서 생성된 폴리아미드 필름을 금속박에 직접 접합시키는 것을 특징으로 하는 플렉시블 프린트회로기판.A polyamic acid (A) is prepared by reacting a symmetrical aromatic metasubstituted primary diamine and an aromatic tetracarboxylic anhydride, and a polyamic acid (B is reacted by reacting a symmetrical aromatic parasubstituted primary diamine and tetracarboxylic anhydride. ), And the polyamide acid (A) and the polyamic acid (B) are mixed and mixed in an equivalent ratio of 10-60: 90-40 to react the resulting polyamide film directly with a metal foil. Printed circuit board. 제 1 항에 있어서, 상기 폴리이미드층의 두께가 10㎛∼1mm인것을 특징으로 하는 플렉시블 프린트회로기판.The flexible printed circuit board of claim 1, wherein the polyimide layer has a thickness of 10 μm to 1 mm. 제 2 항에 있어서, 상기 폴리이미드층의 두께가 10㎛∼1mm인것을 특징으로 하는 플렉시블 프린트회로기판.The flexible printed circuit board of claim 2, wherein the polyimide layer has a thickness of 10 μm to 1 mm. 플렉시블 프린트회로기판의 제조방법에 있어서, 대칭형 방향족메타치환 제1급 디아민과 대칭형 방향족 파라치환 제1급 디아민을 당량비 10-60 : 90-40으로 혼합한 후, 방향족 테트라카르복실산 무수물과 반응시켜 폴리이미드의 전구체로서 폴리아미드산을 제조하고, 상기 폴리아미드산의 유기용매용액을 금속박에 직접 코팅한 후, 코팅한 금속박을 가열하여 탈수시키는 것을 특징으로 하는 플레시블 프린트회로기판의 제조방법.In the method of manufacturing a flexible printed circuit board, a symmetrical aromatic metasubstituted primary diamine and a symmetrical aromatic parasubstituted primary diamine are mixed in an equivalent ratio of 10-60: 90-40, and then reacted with an aromatic tetracarboxylic anhydride. A polyamic acid is prepared as a precursor of a polyimide, the organic solvent solution of the polyamic acid is directly coated on a metal foil, and then the coated metal foil is heated and dehydrated to manufacture a flexible printed circuit board. 플렉시블 프린트회로기판의 제조방법에 있어서, 대칭형 방향족 메타치환 제1급 디아민과 방향족 테트라카르복실산 무수물을 반응시켜 폴리아미드산(A)를 제조하고, 대칭형 방향족 파라치환 제1급 디아민과방향족 카르복실산 무수물을 반응시켜 폴리아미드산(B)를 제조하여, 상기 폴리아미드산(A)의 유기용매용액과 상기 폴리아미드산(B)의 유기용매용액을 당량비 10-60 : 90-40으로 혼합하여, 이 혼합물을 금속박에 직접 코팅한후, 코팅한 금속박을 가열하여 탈수시키는 것을 특징으로 하는 플렉시블 프린트회로기판의 제조방법.In the method of manufacturing a flexible printed circuit board, a polyamic acid (A) is prepared by reacting a symmetrical aromatic metasubstituted primary diamine and an aromatic tetracarboxylic anhydride, and a symmetrical aromatic parasubstituted primary diamine and an aromatic carboxyl. The acid anhydride is reacted to produce polyamic acid (B), and the organic solvent solution of the polyamic acid (A) and the organic solvent solution of the polyamic acid (B) are mixed in an equivalent ratio of 10-60: 90-40. And directly coating the mixture on the metal foil, and then heating the dehydrated coated metal foil to produce a flexible printed circuit board. 제 5 항에 있어서, 상기 가열, 탈수공정을 불활성가스 분위기하에서 실시하는 것을 특징으로 하는 플렉시블 프린트회로기판의 제조방법.The method of manufacturing a flexible printed circuit board according to claim 5, wherein the heating and dehydration step is performed in an inert gas atmosphere. 제 6 항에 있어서, 상기 가열, 탈수공정을 불활성가스 분위기하에서 실시하는 것을 특징으로 하는 플렉시블 프린트회로기판의 제조방법.The method of manufacturing a flexible printed circuit board according to claim 6, wherein the heating and dehydration step is performed in an inert gas atmosphere. 제 5 항에 있어서, 상기 폴리아미드산 유기용매용액을 금속박에 직접 코팅에 의해 제조한 기판을, 실질적으로 반경화건조상태까지 건조하고, 로울형상으로 감아서, 이 로울형상의 기판을 볼활성가스분위기하에서 가열시켜 용매를 제거하여, 상기 폴리아미드산을 폴리이미드로 전환시키는 것을 특징으로 하는 플렉시블프린트회로기판의 제조방법.6. The substrate prepared by directly coating the polyamic acid organic solvent solution on a metal foil is dried to a substantially semi-cured dry state and wound in a roll shape, and the roll-shaped substrate is ball-activated. A method for manufacturing a flexible printed circuit board, characterized in that the polyamic acid is converted to polyimide by heating under an atmosphere to remove the solvent. 제 6 항에 있어서, 상기 폴리아미드산(A)의 유기용매용액과 상기 폴리아미드산(B)의 유기용매용액과의 혼합액을 금속박에 직접 코팅하여 이루어진 적층판을 실질적으로 반경화건조상태에서 건조하고, 로울형상으로 감아서, 이 로울형상의 적층판을 불활성가스분위기하에서 가열시켜 용매를 제거하여, 상기 폴리아미드산을 폴리이미드로 전화시키는 것을 특징으로 하는 플렉시블 프린트회로기판.The laminate according to claim 6, wherein the laminate obtained by directly coating the mixed solution of the organic solvent solution of the polyamic acid (A) and the organic solvent solution of the polyamic acid (B) on a metal foil is dried in a semi-cured and dried state. And a roll-shaped laminate is heated in an inert gas atmosphere to remove the solvent to convert the polyamic acid into a polyimide. 제 1 항에 있어서, 상기 대칭형 방향족 메타치환 제 1 급 디아민이 식(1)The method of claim 1, wherein the symmetrical aromatic metasubstituted primary diamine is formula (1)
Figure kpo00007
Figure kpo00007
(식중 X는 O,SO2,S,CO,CH2,C(CH3)2,C(CF3)2또는 직접 연결함을 표시한다)으로 표시되는 화합물임을 특징으로 하는 플렉시블 프린트회로기판.(Wherein X represents O, SO 2 , S, CO, CH 2 , C (CH 3 ) 2 , C (CF 3 ) 2 or a direct bond).
제 2 항에 있어서, 상기 대칭형 방향족 메타치환 제1급 디아민이 식(1)The method of claim 2, wherein the symmetric aromatic metasubstituted primary diamine is represented by Formula (1)
Figure kpo00008
Figure kpo00008
(식중 X는 O,SO2, S,CO, CH2, C(CH3)2, C(CF3)2또는 직접연결함을 표시한다)으로 표시되는 화합물임을 특징으로 하는 플렉시블 프린트회로기판의 제조방법.(Wherein X represents O, SO 2 , S, CO, CH 2 , C (CH 3 ) 2 , C (CF 3 ) 2 or a direct bond). Manufacturing method.
제 3 항에 있어서, 상기 대칭형 방향족 메타치환 제1급 디아민이 식(1)4. A method according to claim 3, wherein the symmetric aromatic metasubstituted primary diamine is of formula (1).
Figure kpo00009
Figure kpo00009
(식중 X는 O,SO2, S,CO, CH2, C(CH3)2, C(CF3)2또는 직접연결함을 표시한다)으로 표시되는 화합물임을 특징으로 하는 플렉시블 프련트회로기판의 제조방법.(Wherein X represents O, SO 2 , S, CO, CH 2 , C (CH 3 ) 2 , C (CF 3 ) 2 or a direct bond); Manufacturing method.
제 4 항에 있어서, 상기 대칭형 방향족 메타치환 제1급 디아민이 식(1)The method of claim 4, wherein the symmetric aromatic metasubstituted primary diamine is represented by Formula (1)
Figure kpo00010
Figure kpo00010
(식중 X는 O,SO2, S,CO, CH2, C(CH3)2, C(CF3)2또는 직접 연결함을 나타낸다)으로Wherein X represents O, SO 2 , S, CO, CH 2 , C (CH 3 ) 2 , C (CF 3 ) 2 or directly connected) 표시되는 화합물임을 특징으로 하는 플렉시블 프린트회로기판의 제조방법.Method for producing a flexible printed circuit board characterized in that the compound is displayed.
KR1019870700570A 1985-10-31 1986-10-31 Flexible printed circuit board and process for its production KR900003810B1 (en)

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