JPS62208690A - Flexible printed circuit and manufacture of the same - Google Patents

Flexible printed circuit and manufacture of the same

Info

Publication number
JPS62208690A
JPS62208690A JP61255908A JP25590886A JPS62208690A JP S62208690 A JPS62208690 A JP S62208690A JP 61255908 A JP61255908 A JP 61255908A JP 25590886 A JP25590886 A JP 25590886A JP S62208690 A JPS62208690 A JP S62208690A
Authority
JP
Japan
Prior art keywords
polyamic acid
printed circuit
flexible printed
aromatic
circuit board
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61255908A
Other languages
Japanese (ja)
Other versions
JPH0682895B2 (en
Inventor
守次 森田
邦夫 西原
彰宏 山口
正博 太田
正司 玉井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Toatsu Chemicals Inc
Original Assignee
Mitsui Toatsu Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Toatsu Chemicals Inc filed Critical Mitsui Toatsu Chemicals Inc
Priority to PCT/JP1986/000554 priority Critical patent/WO1987002620A1/en
Priority to KR1019870700570A priority patent/KR900003810B1/en
Priority to US07/069,449 priority patent/US4839232A/en
Priority to EP19860906455 priority patent/EP0243507B1/en
Priority to DE8686906455T priority patent/DE3684307D1/en
Publication of JPS62208690A publication Critical patent/JPS62208690A/en
Publication of JPH0682895B2 publication Critical patent/JPH0682895B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1057Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain
    • C08G73/1064Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain containing sulfur
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G69/00Macromolecular compounds obtained by reactions forming a carboxylic amide link in the main chain of the macromolecule
    • C08G69/02Polyamides derived from amino-carboxylic acids or from polyamines and polycarboxylic acids
    • C08G69/26Polyamides derived from amino-carboxylic acids or from polyamines and polycarboxylic acids derived from polyamines and polycarboxylic acids
    • C08G69/265Polyamides derived from amino-carboxylic acids or from polyamines and polycarboxylic acids derived from polyamines and polycarboxylic acids from at least two different diamines or at least two different dicarboxylic acids
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1042Copolyimides derived from at least two different tetracarboxylic compounds or two different diamino compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1046Polyimides containing oxygen in the form of ether bonds in the main chain
    • C08G73/105Polyimides containing oxygen in the form of ether bonds in the main chain with oxygen only in the diamino moiety
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1067Wholly aromatic polyimides, i.e. having both tetracarboxylic and diamino moieties aromatically bound
    • C08G73/1071Wholly aromatic polyimides containing oxygen in the form of ether bonds in the main chain
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B3/00Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
    • H01B3/18Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
    • H01B3/30Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
    • H01B3/303Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups H01B3/38 or H01B3/302
    • H01B3/306Polyimides or polyesterimides
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0313Organic insulating material
    • H05K1/032Organic insulating material consisting of one material
    • H05K1/0346Organic insulating material consisting of one material containing N
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S428/00Stock material or miscellaneous articles
    • Y10S428/901Printed circuit
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/24Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24917Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including metal layer
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31678Of metal
    • Y10T428/31681Next to polyester, polyamide or polyimide [e.g., alkyd, glue, or nylon, etc.]
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31721Of polyimide

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、耐熱性、電気特性および機械特性に優れたポ
リイミド金属張板からなるフレキシブルプリント回路基
板及びその製法に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a flexible printed circuit board made of a polyimide metal clad plate with excellent heat resistance, electrical properties and mechanical properties, and a method for manufacturing the same.

〔従来の技術〕[Conventional technology]

フレキシブルプリント回路基板は可撓f[を有するプリ
ント回路を製造するための4.(板であって、近年に於
いて、プリント回路か納まるケース類かコンパクト化さ
れるなどのために利用か増大している。このようなフレ
キシブルプリント回路基板は、従来、銅箔にポリイミド
フィルムを接着剤を用いて張り合せて製造されている。
4. Flexible printed circuit boards are used to produce printed circuits with flexible f[. (It is a board, and its use has increased in recent years as the cases in which printed circuits are housed have become more compact.) Such flexible printed circuit boards have conventionally been made by using polyimide film on copper foil. It is manufactured by sticking together using adhesive.

この基板においてポリイミドフィルムは1−分に耐熱性
、電気時Hおよび機械特性が良いが、接着剤の特性が不
1−分であるため、ポリイミドフィルムの特性が十分に
生かされていないという問題があった。
In this substrate, the polyimide film has good heat resistance, electrical resistance, and mechanical properties within 1-minutes, but since the properties of the adhesive are not within 1-minutes, there is a problem that the properties of the polyimide film are not fully utilized. there were.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

そこで、接着剤層を用いずに、ポリイミド金属張板から
なるフレキシブルプリント回路基板を製造する方法が従
来より検討されており、例としては、米国特許第3,1
79,634号、特開昭4!J−129862号、特開
昭58−190091号、特開昭58−190092号
などがある。しかしながら、耐熱性、接着性および可撓
性がいずれも十分であるフレキシブルプリント回路基板
は得られていない。
Therefore, methods of manufacturing flexible printed circuit boards made of polyimide metal clad plates without using an adhesive layer have been studied, for example, U.S. Pat.
No. 79,634, Japanese Patent Publication No. 4! J-129862, JP-A-58-190091, JP-A-58-190092, etc. However, a flexible printed circuit board with sufficient heat resistance, adhesiveness, and flexibility has not been obtained.

本発明は以上の問題点に鑑み成されたものであり、その
目的は、耐熱性および電気時+J[、並びに接7f+t
、可撓刊等の機械特性の全てに優れたポリイミド金属張
板からなるフレキシブルプリント回路、Jl(板及びそ
の製法を提供する、二とじある。
The present invention has been made in view of the above problems, and its purpose is to improve heat resistance, electric current +J[, and contact 7f+t].
, a flexible printed circuit made of a polyimide metal clad plate that has excellent mechanical properties such as flexible paper, Jl (Flexible printed circuit board and its manufacturing method, Nitoji).

〔問題点を解決するための手段〕[Means for solving problems]

すなわち本発明は、対称型芳香族パラ置換第1級アミン
と対称を芳香族パラ置換第1級アミンとを当量比で10
〜60:90〜40て混合して、芳香族テトラカルボン
酸無水物と反応させ、生成したポリイミドの前駆体であ
るポリアミド酸の有機溶媒溶液を金属箔に直接コーティ
ングした後、加熱、脱水するフレキシブルプリント回路
基板の製法、あるいは対称型芳香族メタ置換第1級アミ
ンと芳香族テトラカルボン酸無水物とを反応させ生成し
たポリアミド酸(A)の有機溶媒溶液と、対称型芳香族
パラ置換第1級アミンと芳香族テトラカルボン酸無水物
とを反応させ生成したポリアミド酸(1)の有機溶媒溶
液とを、当量比で10〜60:90〜40で混合した後
、金属箔に直接コーティングし、更に加熱、脱水するフ
レキシブルプリント回路基板の製法、及びこれらの方法
により製造されたフレキシブルプリント回路基板である
That is, the present invention uses a symmetric aromatic para-substituted primary amine and a symmetric aromatic para-substituted primary amine in an equivalent ratio of 10.
A flexible method in which metal foil is directly coated with an organic solvent solution of polyamic acid, which is a precursor of polyimide, by mixing at a ratio of ~60:90 to 40 and reacting with aromatic tetracarboxylic anhydride, followed by heating and dehydration. A method for manufacturing a printed circuit board, or an organic solvent solution of polyamic acid (A) produced by reacting a symmetric aromatic meta-substituted primary amine with an aromatic tetracarboxylic acid anhydride, and a symmetric aromatic para-substituted primary amine. An organic solvent solution of polyamic acid (1) produced by reacting a class amine and an aromatic tetracarboxylic acid anhydride is mixed in an equivalent ratio of 10 to 60:90 to 40, and then directly coated on metal foil, The present invention also provides a method for manufacturing a flexible printed circuit board that involves heating and dehydration, and a flexible printed circuit board manufactured by these methods.

さらに、本発明者は、−に記の加熱、脱水か不活+1カ
ス中において行なわれた場合は史に良好な特++1を示
1−ことも見出した。
Furthermore, the present inventors have also found that when the heating and dehydration described in 1-- are carried out in an inert +1 slag, excellent properties ++1 are exhibited.

また、ポリアミ]〜酸の4を機溶媒溶液を金属箔に直接
コーティングした後、実質的にタックフリーな状態迄乾
燥した後、ロール状に巻き取り、その巻き取った物をロ
ール状のま)、不活+′[ガス中において加熱、脱水さ
せた場合、比較的部t1iで、しかも、経済的にフレキ
シブルプリント回路基板ができることを見出した。
In addition, after directly coating metal foil with a solvent solution of polyamide]~acid 4, drying it to a substantially tack-free state, winding it up into a roll, and leaving the rolled product in a roll shape) It has been found that when heated and dehydrated in an inert +' gas, a flexible printed circuit board can be produced in a comparatively small amount t1i and moreover economically.

本発明に用いられる対称型芳香族メタ置換第1級アミン
(以後、m−ジアミンと略す)は次に示ず一般式により
表わすことができる。
The symmetrical aromatic meta-substituted primary amine (hereinafter abbreviated as m-diamine) used in the present invention can be represented by a general formula not shown below.

(上記一般式において、Xは0、so、 、 s 、c
o、に112 、 C(Clh)2. C(CF3)2
から選ばれ、それぞれのXは同じであっても良い。) 上記一般式で表わされるm−ジアミンの例としては3.
3°−ジアミノジフェニルエーテル、 3.3’−ジア
ミノジフェニルスルフィド、 3,3−ジアミノジフェ
ニルスルポン、 3.3“−ジアミノベンゾフェノン、
ビス(4−(3−アミノフェノキシ)フェニル)メタン
、2.2−ビス(/I−(3−アミノフェノキシ)フェ
ニル〕プロパン、2,2−ビス(4−(:]−アミノフ
ェノキシ)フェニル) −1,1,1,:1,3.3−
ヘキサフルオロプロパン、1.3−ビス(3−アミノフ
ェノキシ)ヘンセン、 4,4−ビス(:)−アミノフ
ェノキシ)ビフェニル、ビス(4−(:l−アミノフェ
ノキシ)フェニル〕ケトン、ヒス(4−(:l−アミノ
フェノキシ)フェニル〕スルフィド、ビス(4−(3−
アミノフェノキシ)フェニル〕スルポン、ビス〔4−(
3−アミノフェノキシ)フェニル〕エーテル、4.4−
ビス(3−アミノフェニルスルホニル)ジフェニルエー
テル、 4,4°−ビス(3−アミノチオフェノキシ)
ジフェニルスルホン、1.4−ビス(4−(3−アミノ
フェノキシ)ベンゾイル)ベンゼン等が挙げられ、これ
等は単独あるいは2種以」−混合して用いることができ
る。
(In the above general formula, X is 0, so, , s, c
o, Ni112, C(Clh)2. C(CF3)2
, and each X may be the same. ) Examples of m-diamines represented by the above general formula are 3.
3°-diaminodiphenyl ether, 3.3'-diaminodiphenyl sulfide, 3,3-diaminodiphenyl sulfone, 3.3"-diaminobenzophenone,
Bis(4-(3-aminophenoxy)phenyl)methane, 2,2-bis(/I-(3-aminophenoxy)phenyl)propane, 2,2-bis(4-(:]-aminophenoxy)phenyl) -1,1,1,:1,3.3-
Hexafluoropropane, 1,3-bis(3-aminophenoxy)hensen, 4,4-bis(:)-aminophenoxy)biphenyl, bis(4-(:l-aminophenoxy)phenyl)ketone, his(4- (:l-aminophenoxy)phenyl] sulfide, bis(4-(3-
aminophenoxy)phenyl]sulpone, bis[4-(
3-aminophenoxy)phenyl]ether, 4.4-
Bis(3-aminophenylsulfonyl) diphenyl ether, 4,4°-bis(3-aminothiophenoxy)
Examples include diphenylsulfone, 1,4-bis(4-(3-aminophenoxy)benzoyl)benzene, and these may be used alone or in combination of two or more.

また、対称型芳香族パラ置換第1級アミン(以後、p−
ジアミンと略す)は次に示す一般式により表わすことが
できる。
In addition, symmetric aromatic para-substituted primary amines (hereinafter p-
(abbreviated as diamine) can be represented by the general formula shown below.

(I−記、 一般式に於イー(X kL ”、811.
 、S 、t:fl、CI+、 、C([11,、)、
 、[:(C1i3)、から選ばれ、それぞれのXは同
してあっても異なっても良い。〕〕1−記一般で表わさ
れるp−シアミンの例としては4,4゛−ジアミノジフ
ェニルエーテル、 4.4°−ジアミノジフェニルスル
フィド、 4.4°−ジアミノジフェニルスルホン、 
4.4“−ジアミノベンゾフェノン、ビス(4−(4−
アミノフェノキシ)フェニル)メタン、2.2−ビス(
4−(4−アミノフェノキシ)フェニル〕プロパン、2
.2−ビス(4−(4−アミノフェノキシ)フェニル)
 −1,1,1,3,3,3−ヘキサフルオロプロパン
、1.3−ビス(4−アミノフェノキシ)ベンゼン、 
4,4゛−ビス(4−アミノフェノキシ)ビフェニル、
ビス(4−(4−アミノフェノキシ)フェニル〕ケトン
、ビス(4−(4−アミノフェノキシ)フェニル)スル
ホキシド、ヒス(4−(4−アミノフェノキシ)フェニ
ル〕スルホン、ヒス(4−(4−アミノフェノキシ)フ
ェニル〕ニーデル、 4,4°−V′ス(4−アミノフ
ェニルスルホニル)シフゴーニルニーデル、 4,4゛
−ビス(4−アミノチオフェノキシ)ジフェニルスルホ
ン、1.4−ビス〔4−(:(−アミノフェノキシ)ベ
ンゾイル〕ベンセン等か、挙げられ、これ等は(F独あ
るいは2種以上混合して用いることができる。
(In the general formula, I (X kL ”, 811.
,S ,t:fl,CI+, ,C([11,,),
, [:(C1i3), and each X may be the same or different. ] Examples of p-cyamine generally represented by 1- are 4,4'-diaminodiphenyl ether, 4.4'-diaminodiphenyl sulfide, 4.4'-diaminodiphenylsulfone,
4.4“-diaminobenzophenone, bis(4-(4-
aminophenoxy)phenyl)methane, 2,2-bis(
4-(4-aminophenoxy)phenyl]propane, 2
.. 2-bis(4-(4-aminophenoxy)phenyl)
-1,1,1,3,3,3-hexafluoropropane, 1,3-bis(4-aminophenoxy)benzene,
4,4゛-bis(4-aminophenoxy)biphenyl,
Bis(4-(4-aminophenoxy)phenyl)ketone, Bis(4-(4-aminophenoxy)phenyl)sulfoxide, His(4-(4-aminophenoxy)phenyl)sulfone, His(4-(4-aminophenoxy)phenyl)sulfoxide, phenoxy)phenyl]needle, 4,4°-V's(4-aminophenylsulfonyl)sifgonylneedle, 4,4゛-bis(4-aminothiophenoxy)diphenylsulfone, 1,4-bis[4- Examples include (:(-aminophenoxy)benzoyl)benzene, etc., and these can be used alone or in combination of two or more.

ジアミンと反応させる片香族テ]・ラカルボン酸無水物
としてはピロメリット酸二無水物、 3,3°。
The monocarboxylic acid anhydride to be reacted with the diamine is pyromellitic dianhydride, 3,3°.

4.4°−ヘンシフエノンテトラカルボン酸二無水物、
2,2°、3.3°−ベンゾフェノンテトラカルボン酸
二無水物、3,3°、4,4°−ビフェニルテトラカル
ボン酸二無水物、2,2°、3,3″−ビフェニルテト
ラカルボン酸二無水物、2.2−ビス(3,4−ジカル
ボキシフェニル)プロパンニ無水物、2,2−ビス(2
,3−ジカルボキシフェニル)ブロバンニ無水物、ビス
(3,4−カルボキシフェニル)エーテルニー無水物、
ビス(3,4−ジカルボキシフェニル)スルホン二無水
物、1.1−ビス(2,:I−ジカルボキシフェニル)
エタン 無水物、ヒス(2,:l−ジカルボキシフェニ
ル)メタン−無水物、ヒ゛ス(:l、4−シカルホへ一
ジフェニル)メタン−無水物、2.:l、6.7−ナフ
タレンテトラカルボン酸二無水物、1.4.5,11−
ナフタレンテトラカルボン酸二無水物、1,2,5.l
i−ナフタレンテトラカルボン酸二無水物、1,2,3
.4−ヘンセンデトラカルポン酸二無水物、 3,4,
9.10−ヘリレンデトラカルボン酸二無水物、2,3
,6.7−アントラセンテトラカルボン酸二無水物、1
,2,7.8−フェナントレンテトラカルボン酸二無水
物等が用いられる。これらは単独或いは2種以上混合し
て用いられる。
4.4°-hensiphenotetracarboxylic dianhydride,
2,2°, 3.3°-benzophenonetetracarboxylic dianhydride, 3,3°, 4,4°-biphenyltetracarboxylic dianhydride, 2,2°, 3,3″-biphenyltetracarboxylic acid dianhydride, 2,2-bis(3,4-dicarboxyphenyl)propanihydride, 2,2-bis(2
, 3-dicarboxyphenyl)brovani anhydride, bis(3,4-carboxyphenyl)ether dianhydride,
Bis(3,4-dicarboxyphenyl)sulfone dianhydride, 1,1-bis(2,:I-dicarboxyphenyl)
Ethane anhydride, his(2,:l-dicarboxyphenyl)methane-anhydride, his(:l,4-dicarboxydiphenyl)methane-anhydride, 2. :l, 6.7-naphthalenetetracarboxylic dianhydride, 1.4.5,11-
Naphthalenetetracarboxylic dianhydride, 1,2,5. l
i-Naphthalenetetracarboxylic dianhydride, 1,2,3
.. 4-Hensendetracarboxylic dianhydride, 3,4,
9.10-Helylenedetracarboxylic dianhydride, 2,3
, 6.7-anthracentetracarboxylic dianhydride, 1
, 2,7.8-phenanthrenetetracarboxylic dianhydride, etc. are used. These may be used alone or in a mixture of two or more.

重合及びコーティングの際に用いられる有機溶剤として
は、例えば、N−メチル−2−ピロリドン、N、N−ジ
メチルアセトアミド、N、N−ジメチルホルムアミド、
1.3−ジメチル−2−イミダゾリジノン、N。
Examples of organic solvents used during polymerization and coating include N-methyl-2-pyrrolidone, N,N-dimethylacetamide, N,N-dimethylformamide,
1.3-dimethyl-2-imidazolidinone, N.

N−ジエチルアセトアミド、N、N−ジメチルメトキシ
アセトアミド、ジメチルスルホキシド、ピリジン、ジメ
チルスルホン、ヘキサメヂルホスホルアミト、テ]・ラ
メチル尿素、N−メチルカプロラクタム、テトラヒドロ
ラン、■−ジオキサン、p−ジオキサン、1.2−ジメ
トキシエタン、ヒス(2−メトキシエヂル)エーテル、
1.2−ビス(2−メトギシエトキシ)エタン、ビス−
〔ンー(2−メl−キシエトキシ)エチル〕エーテル等
がある。
N-diethylacetamide, N,N-dimethylmethoxyacetamide, dimethyl sulfoxide, pyridine, dimethyl sulfone, hexamethyl phosphoramito, te]-ramethyl urea, N-methyl caprolactam, tetrahydrolane, ■-dioxane, p-dioxane, 1.2-dimethoxyethane, his(2-methoxyedyl) ether,
1.2-bis(2-methoxyethoxy)ethane, bis-
[-(2-mel-xyethoxy)ethyl]ether and the like.

本発明に於いて用いられるポリアミド酸は、m−シアミ
ンとp−ジアミンを有機溶剤中に於いて、あらかじめ、
m−ジアミンとp−ジアミンの当h1比を0.1〜0.
6  :  0.9〜0.4、特に好ましくは0.2〜
0.4  :  0.8〜0.6で混合した後、芳香族
テトラカルボン酸無水物と反応させる(方法1)か、あ
るいは、m−ジアミンと芳香族テトラカルボン酸無水物
とを反応させ生成したポリアミド酸(A)とp−ジアミ
ンと芳香族テトラカルボン酸無水物とを反応させ生成し
たポリアミド酸(1)とをジアミン換算の当量比で0.
1〜0.6  :  0.9〜0.4特に好ましく番よ
0.2〜0.4  :  0.8〜0.6で混合する(
方法2)ことにより得られる。これらの方法の中で、機
械的物性などの点から、方法1で製造した場合、特に好
ましい結果が得られる。ジアミンの中てm−ジアミンが
当量比で60%以トの場合には、生成したポリイミドは
熱可塑性が強く、ボリイミドフィルムにゝr111ごて
(:H]0〜:150℃)か直接触れた場合には、容y
、にフィルムか損傷を受けたり、高温子−m浴(280
℃以1)にフロートされた場合にはフィルムが変形を起
こしたりするなど、プリント配線板の外観をそこねるた
め、プリント配線基板として取り扱い難い欠点が生じる
The polyamic acid used in the present invention is prepared by adding m-cyamine and p-diamine in an organic solvent in advance.
The h1 ratio of m-diamine and p-diamine is 0.1 to 0.
6: 0.9 to 0.4, particularly preferably 0.2 to
0.4: After mixing at 0.8 to 0.6, it is reacted with aromatic tetracarboxylic anhydride (method 1), or it is produced by reacting m-diamine and aromatic tetracarboxylic anhydride. The resulting polyamic acid (A) and the polyamic acid (1) produced by reacting p-diamine and aromatic tetracarboxylic acid anhydride were mixed in an equivalent ratio of 0.
1 to 0.6: 0.9 to 0.4, particularly preferably 0.2 to 0.4: 0.8 to 0.6 (
Obtained by method 2). Among these methods, from the viewpoint of mechanical properties and the like, particularly preferable results can be obtained when manufacturing by method 1. When m-diamine is 60% or more in terms of equivalent ratio among diamines, the produced polyimide has strong thermoplasticity, and it is difficult to directly touch the polyimide film with a r111 iron (:H] 0 to 150℃). If the
, the film may be damaged or damaged in a high-temperature bath (280
If the film is floated at a temperature higher than 1), the film may be deformed and the appearance of the printed wiring board may be damaged, resulting in the drawback that it is difficult to handle as a printed wiring board.

また、m−ジアミンが当量比で10%以下の場合には、
生成したポリイミドフィルムの金属箔への接着力が弱く
、フレキシブルプリント回路の回路が容易にフィルムか
ら剥れ易く実用に供し得ないという欠点が生じる。
In addition, when m-diamine is 10% or less in equivalent ratio,
The adhesion of the produced polyimide film to the metal foil is weak, and the circuit of the flexible printed circuit easily peels off from the film, resulting in a drawback that it cannot be put to practical use.

また、ポリアミド酸を製造する際のジアミンの組合せの
中で、m−ジアミンとしては特許請求の範囲第9項にお
いて記載されている式(1)で表わされるジアミンが特
に好ましく、p−ジアミンとしては4,4°−ジアミノ
ジフェニルエーテルおよび/または4,4゛−ビス(4
−アミノフェノキシ)ビフェニルが特に好ましく使われ
、また、芳香族テトラカルボン酸無水物としては、ピロ
メリット酸二無水物および/または3.3”、/1,4
’−ベンゾフエノンテトラカルボン酸−無水物を用いた
場合が特に好ましく、耐熱性、電気特性並びに接着P[
、可撓Pl等の機械時f[に優れたフレキシブルプリン
ト回路16(盤を製造することができる。
Furthermore, among the combinations of diamines used in producing polyamic acid, the diamine represented by the formula (1) described in claim 9 is particularly preferable as m-diamine, and as p-diamine, 4,4°-diaminodiphenyl ether and/or 4,4°-bis(4
-aminophenoxy)biphenyl is particularly preferably used, and as the aromatic tetracarboxylic acid anhydride, pyromellitic dianhydride and/or 3.3'', /1,4
It is particularly preferable to use '-benzophenonetetracarboxylic acid anhydride, which improves heat resistance, electrical properties, and adhesion P[
It is possible to manufacture flexible printed circuits 16 (boards) with excellent mechanical properties such as flexible PL.

ポリアミド酸溶液を金属箔にコーティングする場合は、
ポリアミド酸を5〜40川j■パーセント、特に好まし
くは10〜30重量パーセント含有し、かつ、対数粘度
が0.5〜6 dl/g (:15℃、濃度0.5g/
100 x+1. N、N−ジメチルアセトアミドで測
定した値)、特に0.1〜4旧/gである溶液を用いる
ことが、製造したポリイミドの物性及び塗布、乾燥工程
での経済性から好ましい。
When coating metal foil with polyamic acid solution,
It contains polyamic acid in an amount of 5 to 40 percent by weight, particularly preferably 10 to 30 percent by weight, and has a logarithmic viscosity of 0.5 to 6 dl/g (15°C, concentration 0.5 g/g).
100 x+1. It is preferable to use a solution having a concentration of 0.1 to 4 mol/g (measured with N,N-dimethylacetamide), especially from the viewpoint of the physical properties of the produced polyimide and the economical efficiency of coating and drying steps.

ポリアミド酸をコーティングする対象の金属箔としては
、一般には、銅箔やアルミニウム箔が用いられるか、ニ
ッケル箔などの他の導電性の金属箔を用いることもでき
る。
As the metal foil to be coated with polyamic acid, copper foil or aluminum foil is generally used, or other conductive metal foil such as nickel foil can also be used.

ポリアミド酸溶液を金属箔にコーティングする操作は流
延塗布により行なわれることが好ましく、IL体的には
、次のような方法か利用される。
The operation of coating the metal foil with the polyamic acid solution is preferably carried out by casting, and the following method is used for the IL coating.

金属箔表面にポリアミド酸溶液を製膜用スリットから吐
出させて均 なJすさく厚さは、 般的には、30〜3
00μとなるように調節される)の塗++q層を形成さ
せる。他のコーティング毛段として、ロールコータ−、
ナイフコーター、コンマコーター、ドクターブレード、
フローコータなと他の公知の手段を利用することも可能
である。
The uniform thickness obtained by discharging a polyamic acid solution onto the surface of a metal foil through a film forming slit is generally 30 to 3.
00μ) coating ++q layer is formed. Other coating stages include roll coater,
knife coater, comma coater, doctor blade,
It is also possible to use other known means such as a flow coater.

上記のようにして調製されたポリアミド酸塗35層を、
次に加熱して脱溶媒、脱水縮合反応を行なう。この操作
は、常圧、減圧、あるいは加圧など任意の条件で行なう
ことができる。一般的には、所要時間、 100〜20
0℃、好ましくは100〜150℃に加熱し、大部分の
溶媒を除去する。更に180〜350℃、好ましくは2
00〜300℃に加熱し、溶媒の完全な除去を行なうと
共に、ポリアミド酸をより安定なポリイミドに転化する
。これらの脱溶媒、脱水工程で、金属箔表面か酸化され
る温度以上の温度にさらされる場合には、金属箔表面の
酸化が起こり金属箔の機械特性5電気特+′1及び接着
性の低Fが起こり易くなることかあるため、金属箔入1
「IIか酸化される温度以上では脱溶媒、脱水工程を不
活性ガス中で行なうことが、金属箔表面の酸化を防11
−するために特に好ましい。ここで不活+′1ガス中と
は、金属箔表面か、所定時間の加熱の際に実質的に電気
特性あるいは接着力等に悪影背を与える酸化反応を受け
ない気体雰囲気中であることを意味し、加熱温度に依存
1−るが、多くの場合、好ましくは酸素濃度が6%以下
である気体雰囲気を意味する。
35 layers of polyamic acid coating prepared as above,
Next, the mixture is heated to perform solvent removal and dehydration condensation reactions. This operation can be carried out under any conditions such as normal pressure, reduced pressure, or increased pressure. Generally, the required time is 100-20
Heat to 0°C, preferably 100-150°C to remove most of the solvent. Furthermore, 180 to 350°C, preferably 2
Heating to 00-300° C. completely removes the solvent and converts the polyamic acid into a more stable polyimide. During these desolvation and dehydration steps, if the metal foil surface is exposed to a temperature higher than the temperature at which it is oxidized, the metal foil surface will be oxidized and the mechanical properties of the metal foil may deteriorate. Since F may be more likely to occur, use metal foil 1.
``At temperatures above oxidation of metal foil, carrying out the desolvation and dehydration steps in an inert gas prevents oxidation of the metal foil surface.
- Particularly preferred for In this case, being in an inert +'1 gas means that the surface of the metal foil is in a gas atmosphere that does not substantially undergo an oxidation reaction that adversely affects electrical properties or adhesive strength during heating for a predetermined period of time. Although it depends on the heating temperature, in most cases it means a gaseous atmosphere in which the oxygen concentration is preferably 6% or less.

これらの加熱、乾燥はシートを広げた状態で行なうのが
一般的であるが、本発明の場合、ポリアミド酸の有機溶
媒溶液を金属箔に直接コートした後、実質的にタックフ
リーな状態迄乾燥(溶剤量が40重量パーセント以下)
した後、ロール状に巻き取り、その巻き取った物をロー
ル状のまN、不活性ガス中に於いて加熱し、脱溶剤、脱
水することも可能である。
These heating and drying processes are generally carried out with the sheet spread out, but in the case of the present invention, the metal foil is directly coated with an organic solvent solution of polyamic acid and then dried to a substantially tack-free state. (The amount of solvent is 40% by weight or less)
After that, it is possible to wind it up into a roll and heat the rolled product in N inert gas to remove the solvent and dehydrate it.

以上に述べたような方法で代表される本発明に係るポリ
イミド金属張シートからなるフレキシブルプリント回路
基板は、接着剤層を含まないこと、および、優わIごボ
リイミ1.の使用などにより、耐熱性、電気時+1、機
械時P1に優れている。
The flexible printed circuit board made of the polyimide metal-clad sheet according to the present invention, represented by the method described above, does not contain an adhesive layer, and has the following advantages:1. Due to the use of , it has excellent heat resistance, electrical +1, and mechanical P1.

〔実施例〕〔Example〕

次に本発明の実施例おにび比較例を小して本発明および
その効果を具体的に説明する。
Next, the present invention and its effects will be specifically explained by referring to Examples and Comparative Examples of the present invention.

実施例中の対数粘度は35℃、0.5g/l00nL 
N、N−ジメチルアセトアミド 粘度はE型粘度計の高粘度用ロータを用いて25℃で測
定した値である。プリント回路基板としての各種の性能
は以下に示す方法により測定した。
The logarithmic viscosity in the examples is 35°C, 0.5g/l00nL
The N,N-dimethylacetamide viscosity is a value measured at 25°C using a high viscosity rotor of an E-type viscometer. Various performances as a printed circuit board were measured by the methods shown below.

(1)箔引き剥し強さ TPC−FC−24 1Aの方法に準じて行なった。(1) Foil peeling strength It was carried out according to the method of TPC-FC-24 1A.

(2)表面抵抗 JIS C−6481に準じて行なった。(2) Surface resistance It was conducted according to JIS C-6481.

(3)耐半田性 、115 [’ニー64旧に準じて行なった。試料を2
80℃の半in浴中に60秒浸7rt シたのち「フク
レJ、「ポリイミドフィルムの変形」を観察した。
(3) Soldering resistance, 115 [Conducted according to 'Knee 64 old. 2 samples
After immersion in a half-in bath at 80° C. for 60 seconds for 7 rt, deformation of the polyimide film was observed.

(4)4毛”r−II+ +1 ’t′:ITIゴテの先端部の曲率r′−径か0.5m
m、=Jデ先部の角度が:10°であるゝr]11ゴテ
を、先端部への荷10かl003rになるように調節し
た。先端部の温度か325±25℃になるように調節1
7、ポリイミドたけからなる厚さ25μのフィルム1−
に、’l’ Illゴテな重直になるように1“l゛て
る。”I’−IIIゴテを)fて\から5秒より長く、
フィルムが破れなかった場合な○とし、5秒以内に破れ
た場合を×とした。
(4) 4 bristles "r-II+ +1 't': Curvature r'-diameter of tip of ITI iron 0.5m
The angle of the tip of m, = J is 10°. The 11 trowel was adjusted so that the load on the tip was 10 or 1003r. Adjust the temperature at the tip to 325±25℃1
7. 25μ thick film 1- made of polyimide
For more than 5 seconds, hold the 'I'-III trowel for more than 5 seconds.
If the film was not torn, it was marked as ○, and if it was torn within 5 seconds, it was marked as ×.

(5)耐折強さ JIS P−8115に準じ、折1110ず面の曲率半
径0.8mm、静11−荷重500grで測定を行なっ
た。
(5) Folding strength According to JIS P-8115, measurements were carried out at a curvature radius of 0.8 mm on the folded surface and a static 11-load of 500 gr.

(6)誘電率及び誘電正接 、115C−6481に準じて行なった。測定周波数は
1kllzで行なった。
(6) Dielectric constant and dielectric loss tangent, conducted according to 115C-6481. The measurement frequency was 1 kllz.

実施例1 攪拌器、還流冷却器及び窒素導入管を備えた容器で、1
.3−ビス(3−アミノフェノキシ)ベンゼン23.4
g(0,08モル)及び4,4°−ジアミノジフェニル
エーテル24.0g (0,12モル)をN、N−ジメ
チルアセトアミt” 420+n!に溶解した。この溶
液に窒素雰囲気]・に於いて 1 、:l ” 、 4
 、4°−ヘンシフJノンデトラカルホン酸−無水物6
4.4g(0,20モル)を添加し、10℃で24時間
攪攪拌てポリアミド酸溶液を/jlだ。こうして得られ
たポリアミド酸溶液の対数粘度は 1.5dl/gてあ
った。このポリアミド酸溶液をN、N−ジメチルアセト
アミドて15%迄界釈し粘度を25.000cpsに調
節し、ドクタープレー1・を用いて圧延銅箔(厚さ35
μ)に均一にコーティングした。このコーティング銅箔
を 130℃で60分間加熱乾燥した後、260℃の窒
素雰囲気(酸素濃度4%)の中で60分間加熱してポリ
イミドをコートした銅箔を得た。膜厚は25μであった
。この配線基板の特性は表−1の通りであった。
Example 1 In a container equipped with a stirrer, a reflux condenser and a nitrogen introduction tube, 1
.. 3-bis(3-aminophenoxy)benzene 23.4
g (0.08 mol) and 24.0 g (0.12 mol) of 4,4°-diaminodiphenyl ether were dissolved in N,N-dimethylacetamide t'' 420+n! in a nitrogen atmosphere]. 1, :l'', 4
, 4°-Hensif J nondetracarfonic acid anhydride 6
4.4 g (0.20 mol) was added and stirred at 10° C. for 24 hours to obtain a polyamic acid solution of 1/jl. The logarithmic viscosity of the polyamic acid solution thus obtained was 1.5 dl/g. This polyamic acid solution was diluted to 15% with N,N-dimethylacetamide, the viscosity was adjusted to 25,000 cps, and rolled copper foil (thickness 35
μ) was coated uniformly. This coated copper foil was dried by heating at 130° C. for 60 minutes, and then heated for 60 minutes in a nitrogen atmosphere (oxygen concentration: 4%) at 260° C. to obtain a polyimide-coated copper foil. The film thickness was 25μ. The characteristics of this wiring board were as shown in Table-1.

実施例2 攪拌器、還流冷却器及び窒素導入管を備えた容器に、4
.4°−ビス(3−アミノフェノキシ)ビフェニル22
.1g(0,06モル)及び4.4°−ジアミノジフェ
ニルエーテル28.0g (0,14モル)をN、N−
ジメチルアセトアミド :]5On+1に溶解し、0℃
f・1近まで冷却し、窒素雰囲気トーに於いてピロメリ
ット酸プ!1−水物4:ilig(0,20モル)を加
え0℃イ(1近で2時間型打した。次にL記溶液を室温
に戻し、窒素雰囲気ト−で約20時間攪拌を行なった。
Example 2 In a container equipped with a stirrer, a reflux condenser and a nitrogen inlet tube, 4
.. 4°-bis(3-aminophenoxy)biphenyl 22
.. 1 g (0.06 mol) and 28.0 g (0.14 mol) of 4.4°-diaminodiphenyl ether were
Dimethylacetamide:] Dissolved in 5On+1 and heated to 0℃
Cool to near f.1, and then remove pyromellitic acid in a nitrogen atmosphere. 1-Aqueous product 4: ilig (0.20 mol) was added and molded at 0°C for 2 hours. Next, the L solution was returned to room temperature and stirred in a nitrogen atmosphere for about 20 hours. .

こうして14られたポリアミド酸溶液の対数粘度は1.
7dl/gてあ)だ。このポリアミド酸溶液をN、N−
ジメチルアセトアミドで19%迄希釈し回転粘度を12
0.000cpsに調節した。
The logarithmic viscosity of the polyamic acid solution prepared in this way is 1.
7dl/gtea). This polyamic acid solution was mixed with N, N-
Dilute to 19% with dimethylacetamide and reduce the rotational viscosity to 12
It was adjusted to 0.000 cps.

この溶液を圧延銅箔(厚さ35μ)に均一に流延塗布し
、 130℃で10分さらに160℃で10分加熱乾燥
した後、270℃の窒素雰囲気(酸素濃度3%)の中で
10分間加熱して、ポリイミドをコートした銅箔を得た
。膜厚は25μであった。この配線基板の特性は表−1
の通りであった。
This solution was uniformly cast onto a rolled copper foil (thickness: 35 μm), heated and dried at 130°C for 10 minutes, and further at 160°C for 10 minutes, and then heated for 10 minutes in a nitrogen atmosphere (oxygen concentration 3%) at 270°C. The copper foil coated with polyimide was obtained by heating for a minute. The film thickness was 25μ. The characteristics of this wiring board are shown in Table-1.
It was as follows.

実施例3 加熱乾燥に於いて、 270℃で乾燥する際、酸素濃度
か8%である以外は実施例2と同様にしてポリイミドを
コートした銅箔を得た。この配線基板の特性を表−1に
示した。
Example 3 A copper foil coated with polyimide was obtained in the same manner as in Example 2, except that the oxygen concentration was 8% during heat drying at 270°C. The characteristics of this wiring board are shown in Table 1.

実hiIi例4 4.4°−ジアミノジフェニルエーテル28.0gの代
りに、 4.4°−ヒス(4−アミノフェノキシ)ビフ
ェニル51.63 (0,14モル)を使用した以外は
実施例2と同様にしてポリアミド酸溶液を作製した。こ
うして得られたポリアミド酸溶液の対数粘度は1.6d
l/gであった。このポリアミド酸溶液をN、N−ジメ
チルアセトアミドで18%迄希釈し、回転粘度を105
.0OOcpsに調節した。
Practical hIIi Example 4 Same as Example 2 except that 51.63 (0.14 mol) of 4.4°-his(4-aminophenoxy)biphenyl was used instead of 28.0 g of 4.4°-diaminodiphenyl ether. A polyamic acid solution was prepared. The logarithmic viscosity of the polyamic acid solution thus obtained was 1.6 d.
It was l/g. This polyamic acid solution was diluted to 18% with N,N-dimethylacetamide, and the rotational viscosity was adjusted to 105%.
.. Adjusted to 0OOcps.

この溶液を圧延銅箔(厚さ35μ)に均一に流延塗布し
、 130℃で20分さらに160℃で20分加熱乾燥
した後、270℃の窒素雰囲気(酸素濃度3%)の中で
20分間加熱して、ポリイミドをコートした銅箔を得た
。膜厚は25μであった。この配線基板の特性は表−1
の通りであった。
This solution was uniformly cast onto a rolled copper foil (thickness 35 μm), heated and dried at 130°C for 20 minutes, and further at 160°C for 20 minutes, and then heated and dried in a nitrogen atmosphere (oxygen concentration 3%) at 270°C for 20 minutes. The copper foil coated with polyimide was obtained by heating for a minute. The film thickness was 25μ. The characteristics of this wiring board are shown in Table-1.
It was as follows.

実施例5 攪拌器、還流冷却器及び窒素導入管を備えた容器に、室
温で、ビス(4−(3−アミノフェノキシ)フェニルコ
ケトン31.7g (0−08モル)及び4,4°−ジ
アミノジフェニルエーテル24.0g (0−12モル
)をN、N−ジメチルアセトアミド4011alに溶解
し、窒素雰囲気Fに於いてピロメリット酸−=無水物4
:1.Iig(0,20モル)を加え約24時間型vr
を行なった。こうしてmられたポリアミド酸溶液の対数
粘度は 1.l1d173であった。このポリアミ]・
酸溶液をN、N−シメヂルアセトアミ1−で1:1%迄
イ、釈し、回転粘度を25,000cpsに凋節し、ド
クターブレードを用いてIITE電解銅7i(Jゾさ1
8μ、三)]金属鉱業■製)に均一にコーティングした
。このコーティング銅箔を130℃で10分、さらに 
160℃で10分加熱乾燥した後、270℃の窒素雰囲
気(酸素濃度3%)の中で10分間加熱して、ポリイミ
ドをコートした銅箔を得た。膜厚は25μであった。こ
の配線基板の特性は表−1の通りであったみ 実施例6 攪拌器、還流冷却器及び窒素導入管を備えた容器に、室
温でビス(4−(3−アミノフェノキシ)フェニル〕ス
ルフィド24.0g (0,06モル)及び4.4°−
ビス(4−アミノフェノキシ)ビフェニル51.6g(
0,Nモル)をN、N−ジメチルアセ]・アミド420
耐に溶解17、窒素雰囲気に於いてピロメリット酸土無
氷物4:1.tig (0,20モル)を加え、約21
1 u、′、間攪打を′4iなった。3二うして(:?
ら才lだポリアミド酸溶液の対数粘度は’、!、ldl
/g−Cありだ。このポリアミ1〜酸溶液なN、N−ジ
メチルアセトアミドで12%迄希釈し、回転粘度を4r
+、0fTOcpsに調節し、ドクターブレードを用い
てIf T IX′市解銅箔(厚さ35μ、三井金属鉱
業■製)に均 にコーディングした。このコーティング
銅箔を 130℃で10分、さらに160℃で10分加
熱乾燥した後、 270℃の窒素雰囲気(酸素濃度3%
)の中で10分間加熱して、ポリイミドをコートした銅
箔を得た。膜厚は50μであった。この配線基板の特性
は表−1の通りであった。
Example 5 31.7 g (0-08 mol) of bis(4-(3-aminophenoxy)phenyl coketone) and 4,4°- 24.0 g (0-12 mol) of diaminodiphenyl ether was dissolved in N,N-dimethylacetamide 4011al, and pyromellitic acid anhydride 4 was dissolved in nitrogen atmosphere F.
:1. Add Iig (0.20 mol) and vr for about 24 hours.
I did it. The logarithmic viscosity of the polyamic acid solution thus determined is 1. It was l1d173. This polyamide]・
The acid solution was diluted with N,N-shimedylacetamide 1-1 to 1:1%, the rotational viscosity was reduced to 25,000 cps, and IITE electrolytic copper 7i (J-zosa 1) was added using a doctor blade.
8μ, 3)] manufactured by Metal Mining Co., Ltd.) was uniformly coated. This coated copper foil was heated to 130℃ for 10 minutes, and then
After drying by heating at 160° C. for 10 minutes, heating was performed for 10 minutes at 270° C. in a nitrogen atmosphere (oxygen concentration: 3%) to obtain a polyimide-coated copper foil. The film thickness was 25μ. The characteristics of this wiring board are as shown in Table 1.Example 6 Bis(4-(3-aminophenoxy)phenyl)sulfide 24 .0g (0,06 mol) and 4.4°-
Bis(4-aminophenoxy)biphenyl 51.6g (
0,N mol) to N,N-dimethylace]amide 420
Resistant to dissolution 17, pyromellitic acid ice-free material 4:1 in nitrogen atmosphere. tig (0.20 mol) and about 21
1 u,', the stirring stroke became '4i. 32 then(:?
The logarithmic viscosity of the polyamic acid solution is ',! ,ldl
/g-C available. This polyamide 1 was diluted to 12% with an acid solution of N,N-dimethylacetamide and the rotational viscosity was adjusted to 4r.
+, 0 fTOcps, and coated uniformly onto If T IX' copper foil (thickness 35 μm, manufactured by Mitsui Mining & Smelting Co., Ltd.) using a doctor blade. After heating and drying this coated copper foil at 130°C for 10 minutes and then at 160°C for 10 minutes, it was placed in a nitrogen atmosphere at 270°C (oxygen concentration 3%).
) for 10 minutes to obtain polyimide-coated copper foil. The film thickness was 50μ. The characteristics of this wiring board were as shown in Table-1.

実施例7 ビス(4−(3−アミノフェノキシ)フェニル〕スルフ
ォン25.9g (0,06モル)をビス(4−(3−
アミノフェノキシ)フェニル〕スルフィト 24.Og
の替りに用いた以外は実施例6と同様にしてポリアミド
酸溶液を得た。この溶液の対数粘度は2.c+dl/g
てあった。この溶液なN、N−ジメチルアセ1〜アミド
で13%迄希釈し、回転粘度を40.000cpsに調
節した。この後、実施例6と同様にしてポリイミドをツ
ー1−シだ銅箔を/jJだ。この配線ノ、L板の特P1
゛は表−1の通りであった。
Example 7 25.9 g (0.06 mol) of bis(4-(3-aminophenoxy)phenyl)sulfone was added to bis(4-(3-
Aminophenoxy)phenyl]sulfite 24. Og
A polyamic acid solution was obtained in the same manner as in Example 6 except that . The logarithmic viscosity of this solution is 2. c+dl/g
There was. This solution was diluted to 13% with N,N-dimethylacetic acid amide and the rotational viscosity was adjusted to 40.000 cps. Thereafter, in the same manner as in Example 6, the polyimide was removed and the copper foil was removed. This wiring, L board special P1
゛ was as shown in Table-1.

実施例8 2.2−ヒス(4−(3−アミノフェノキシ)フェニル
) −1,1,1,3,:]、:]l−ヘキサフルオロ
プロパン311g (0,06モル)をビス(4−(3
−アミノフェノキシ)フェニル〕スルフィト 24.0
gの替りに用いた以外は実施例6と同様にしてポリアミ
ド酸溶液を得た。この溶液の対数粘度は 1.2dl/
gであった。この溶液をN、N−ジメチルアセトアミド
で18%迄希釈し、回転粘度を45,0OOcpsに調
節した。この後、実施例6と同様にして、ポリイミドを
コートした銅箔を得た。この配線基板の特性は表−1の
通りであった。
Example 8 2.2-His(4-(3-aminophenoxy)phenyl)-1,1,1,3,:],:] 311 g (0.06 mol) of l-hexafluoropropane was dissolved in bis(4- (3
-Aminophenoxy)phenyl]sulfite 24.0
A polyamic acid solution was obtained in the same manner as in Example 6, except that g was used instead of g. The logarithmic viscosity of this solution is 1.2 dl/
It was g. This solution was diluted to 18% with N,N-dimethylacetamide and the rotational viscosity was adjusted to 45.0 OO cps. Thereafter, a copper foil coated with polyimide was obtained in the same manner as in Example 6. The characteristics of this wiring board were as shown in Table-1.

実施例9 撹拌器、環流冷却器及び窒素導入管を備えた容器で1.
3−ビス(3−アミノフェノキシ)ベンゼン23.4g
 (0,08モル)をN、N−ジメチルアセトアミド2
00 telに溶解し、この溶液に窒素雰囲気トーに於
て;(、;ド、4.4 ′−ヘンソフェノンデ]・シカ
ルホン酸二無水物25.71<(0,08モル)を添加
し、室温で24時間撹拌してポリアミド酸溶液を得た。
Example 9 In a vessel equipped with a stirrer, a reflux condenser and a nitrogen inlet tube, 1.
3-bis(3-aminophenoxy)benzene 23.4g
(0.08 mol) to N,N-dimethylacetamide 2
To this solution in a nitrogen atmosphere was added 25.71<(0.08 mol) of 4,4'-hensophenone de] cyclophonic dianhydride, and the solution was stirred at room temperature. A polyamic acid solution was obtained by stirring for 24 hours.

こうして得られたポリアミ]・酸溶液の対数粘度は1.
l1dl/gであった。この溶液をA液とする。
The logarithmic viscosity of the polyamide acid solution thus obtained was 1.
It was 1 dl/g. This solution will be referred to as Solution A.

また、 4.4′−ジアミノジフェニルエーテルz4.
og(o、+2モル)をN、N−ジメチルアセトアミド
250 mlに溶解し、この溶液に窒素雰囲気下に於い
て3.3′、4.4 ′−ベンゾフェノンテトラカルボ
ン酸二無水物38.7g(0,12モル)を添加し、室
温で24時間撹拌してポリアミド酸溶液を得た。こうし
て得られたポリアミド酸溶液の対数粘度は1.6dl/
gであった。この溶液をB液とする。
Also, 4.4'-diaminodiphenyl ether z4.
og (o, +2 mol) was dissolved in 250 ml of N,N-dimethylacetamide, and 38.7 g of 3.3', 4.4'-benzophenonetetracarboxylic dianhydride ( 0.12 mol) was added thereto and stirred at room temperature for 24 hours to obtain a polyamic acid solution. The logarithmic viscosity of the polyamic acid solution thus obtained was 1.6 dl/
It was g. This solution will be referred to as Solution B.

次にA液!i9g、B液74gを混合し、A液のアミド
酸とB液のアミド酸との当1■比を40:60に調整し
た。この溶液をN、N−ジメチルアセトアミドで14%
迄希釈し、粘度を26000cpsに調整し、ドクター
ブレードを用いて圧延銅箔(Jソさ35pn)に均一に
コーティングした。このコーティング銅箔な150℃で
60分間乾燥した後、260℃の窒素雰囲気(酸、+2
濃度3’4)の中で30分間加熱してポリイミドをコー
1〜した銅箔を/Uた。膜厚は2511m+であった。
Next is liquid A! 9 g of liquid B and 74 g of liquid B were mixed, and the ratio of amic acid in liquid A to amic acid in liquid B was adjusted to 40:60. This solution was diluted to 14% with N,N-dimethylacetamide.
The viscosity was adjusted to 26,000 cps and uniformly coated on rolled copper foil (J size 35 pn) using a doctor blade. After drying this coated copper foil at 150°C for 60 minutes, it was dried in a nitrogen atmosphere (acid, +2
Copper foil coated with polyimide was coated with polyimide by heating for 30 minutes at a concentration of 3'4). The film thickness was 2511 m+.

この配線基盤の特性は表−1の通りてあった。The characteristics of this wiring board are shown in Table 1.

実施例10 攪拌器、環流冷却器及び窒素導入管を備えた容器で4.
4′−ビス(3−アミノフェノキシ)ビフェニル22.
1g (0,06モル)をN、N−ジメチルアセ]・ア
ミド150nlに溶解し、この溶液に窒素雰囲気下に於
てピロメリット酸二無水物+3.1g(0,06モル)
を添加し、室温で24時間撹拌してポリアミド酸溶液を
得た。こうして得られたポリアミド酸溶液の対数粘度は
1.7dl/gであった。この溶液をC液とする。
Example 10 4. In a vessel equipped with a stirrer, a reflux condenser and a nitrogen inlet tube.
4'-bis(3-aminophenoxy)biphenyl22.
1 g (0.06 mol) was dissolved in 150 nl of N,N-dimethylace]amide, and pyromellitic dianhydride + 3.1 g (0.06 mol) was added to this solution under a nitrogen atmosphere.
was added and stirred at room temperature for 24 hours to obtain a polyamic acid solution. The logarithmic viscosity of the polyamic acid solution thus obtained was 1.7 dl/g. This solution will be referred to as Solution C.

また、 4,4′−ジアミノジフェニルエーテル28.
0g(0,14モル)をN、N−ジメチルアセトアミド
240 telに溶解し、この溶液に窒素雰囲気下に於
いてピロメリット酸二無水物:10,5g(0,14干
ル)を添加し、室温で24時間撹拌してポリアミド酸溶
液を1:lた。にうして得られたポリアミド酸溶液の対
数粘Iηは1.6dl/gであった。この溶液をD液と
する。
Also, 4,4'-diaminodiphenyl ether28.
0 g (0.14 mol) was dissolved in 240 tel of N,N-dimethylacetamide, and 10.5 g (0.14 mol) of pyromellitic dianhydride was added to this solution under a nitrogen atmosphere. After stirring at room temperature for 24 hours, the polyamic acid solution was diluted to 1:1. The logarithmic viscosity Iη of the polyamic acid solution obtained in this manner was 1.6 dl/g. This solution will be referred to as Solution D.

次にC液44g、D液713を混合17、C液のアミド
酸とD液のアミド酸との当I11比を:l O: 70
に調整した。この溶液をN、N−ジメチルアセI・アミ
ド゛てI5%迄希釈し、粘度を3000 Or、p s
に調整し、ドクターブレードを用いて圧延銅箔(厚さ3
5p)に均一にコーティングした。このコーティング銅
箔を150℃で60分間乾燥した後、260℃の窒素雰
囲気(酸素濃度3%)の中で30分間加熱してポリイミ
ドをコートした銅箔を得た。膜厚は25μ船であった。
Next, 44 g of liquid C and 713 g of liquid D were mixed 17, and the ratio of the amic acid of liquid C and the amic acid of liquid D was: l O: 70
Adjusted to. This solution was diluted to 5% I with N,N-dimethylacetamide, and the viscosity was adjusted to 3000 Or, ps.
using a doctor blade to remove rolled copper foil (thickness 3
5p) was uniformly coated. This coated copper foil was dried at 150° C. for 60 minutes, and then heated in a nitrogen atmosphere (oxygen concentration 3%) at 260° C. for 30 minutes to obtain a polyimide-coated copper foil. The film thickness was 25 μm.

この配線基盤の特性は表−1の通りであった。The characteristics of this wiring board are shown in Table-1.

比較例1 攪拌器、還流冷却器及び窒素導入管を備えた容器で1,
3−ビス(3−アミノフェノキシ)ベンゼン58.4g
 (0,20モル)をN、N−ジメチルアセトアミド4
30nffiに溶解した。この溶液に窒素雰囲気下に於
いて3,3°、4,4°−ベンゾフェノンテトラカルボ
ン酸二、無水物64.4g(0,20モル)を添加17
.10℃で24時間攪拌してポリアミド酸溶液を得た。
Comparative Example 1 In a container equipped with a stirrer, a reflux condenser, and a nitrogen introduction tube,
3-bis(3-aminophenoxy)benzene 58.4g
(0.20 mol) to N,N-dimethylacetamide 4
It was dissolved in 30nffi. To this solution was added 64.4 g (0.20 mol) of 3,3°,4,4°-benzophenonetetracarboxylic acid dianhydride under a nitrogen atmosphere.
.. The mixture was stirred at 10° C. for 24 hours to obtain a polyamic acid solution.

得られた溶液中のポリアミド酸の月数粘度は1.4dl
/gてあった。このポリアミド酸溶液なN、N−ジメチ
ルアセトアミド cpsによ1節し、ドクターブレードを用いて圧延銅箔
( J!;1さ3511)に均一 にコーティングした
。このコープインク銅箔を130℃で60分間加熱乾燥
した後、 240℃の窒素雰囲気(酸素濃度4%)の中
で60分間加熱してポリイミドをコートした銅箔な得た
。膜厚は25μであった。この配線基板の特性は表−2
の通りであった。
The monthly viscosity of the polyamic acid in the obtained solution was 1.4 dl.
/g was there. This polyamic acid solution, N,N-dimethylacetamide CPS, was applied to the solution and coated uniformly onto rolled copper foil (J!; 1 3511) using a doctor blade. This cope ink copper foil was dried by heating at 130° C. for 60 minutes, and then heated for 60 minutes in a nitrogen atmosphere (oxygen concentration: 4%) at 240° C. to obtain a polyimide-coated copper foil. The film thickness was 25μ. Table 2 shows the characteristics of this wiring board.
It was as follows.

比較例2 攪拌器、還流冷却器及び窒素導入管を備えた容器に4.
4′−ビス(4−アミノフェノキシ)ビフェニル73.
6g (0.20モル)をN,N−ジメチルアセトアミ
ド 400ffifiに溶解し、0℃付近まで冷却し、
窒素雰囲気下に於いてピロメリット酸二無水物43.6
g(0.20モル)を加え0℃付近で2時間攪拌した。
Comparative Example 2 4.
4'-bis(4-aminophenoxy)biphenyl73.
6g (0.20mol) was dissolved in 400ffifi of N,N-dimethylacetamide, cooled to around 0°C,
Pyromellitic dianhydride 43.6 under nitrogen atmosphere
g (0.20 mol) and stirred at around 0°C for 2 hours.

次に1−記溶液を室温に戻し窒素雰囲気下で約20時間
型1′1゛を行なった。こうして得られたポリアミド酸
溶lルの対数粘度は 1.6dl/gであった。このポ
リアミド酸溶液なN,N−ジメチルアセトアミドル%迄
fi′1釈し回転粘度をl Nl 、000t:psに
謳■節した。
Next, the solution in 1- was returned to room temperature and subjected to type 1'1' for about 20 hours under a nitrogen atmosphere. The logarithmic viscosity of the polyamic acid solution thus obtained was 1.6 dl/g. This polyamic acid solution was diluted to fi'1% N,N-dimethylacetoamide, and the rotational viscosity was expressed as 1 Nl, 000 t:ps.

この溶液な月延銅箔( J’/さ:+5/7 ) 1.
:y均 に流延塗布し、 130℃て10分さらに I
lill−Cで10分加熱乾燥した後、270℃窒素雰
囲気(酸素濃度3%)の中で10分間加熱してポリイミ
ドをコートした銅箔を得た。膜厚は25μであった。こ
の配線基板の特性は表−2の通りであった。
This solution Tsukinobu copper foil (J'/Sa: +5/7) 1.
:Y-uniformly cast and further coated at 130℃ for 10 minutes.
After drying by heating with lill-C for 10 minutes, it was heated for 10 minutes at 270° C. in a nitrogen atmosphere (oxygen concentration 3%) to obtain a polyimide-coated copper foil. The film thickness was 25μ. The characteristics of this wiring board were as shown in Table-2.

〔発明の効果〕〔Effect of the invention〕

1記実旅例かられかるように、本発明に係る′フレキシ
ブルプリント回路1.(板は、ポリイミド膜を接着剤を
介さずに、直接銅箔等の金属箔に積層してできたもので
あり、従来の方法ではなし得なかった、耐熱性、電気特
性及び接着性、可撓性等の機械特性の全てにおいて良好
な特性を示すフレキシブルプリント回路基板であり、耐
熱性、絶縁性、誘電特性、接着力、耐折性の増々要求さ
れる電子回路において極めて有用な回路基板として提供
することができるものである。
As can be seen from Example 1, the flexible printed circuit 1 according to the present invention. (The board is made by laminating a polyimide film directly onto metal foil such as copper foil without using an adhesive, and it has heat resistance, electrical properties, adhesive properties, and flexibility that could not be achieved with conventional methods.) This is a flexible printed circuit board that exhibits good mechanical properties in all aspects such as flexibility, and is extremely useful in electronic circuits where heat resistance, insulation, dielectric properties, adhesive strength, and bending durability are increasingly required. It is something that can be provided.

Claims (9)

【特許請求の範囲】[Claims] (1)対称型芳香族メタ置換第1級アミンと対称型芳香
族パラ置換第1級アミンとを当量比で 10〜60:90〜40で混合した後、芳香族テトラカ
ルボン酸無水物と反応させて生成したポリイミドのフィ
ルムが直接金属箔に接合されていることを特徴とするフ
レキシブルプリント回路基板。
(1) After mixing a symmetrical aromatic meta-substituted primary amine and a symmetrical aromatic para-substituted primary amine in an equivalent ratio of 10 to 60:90 to 40, the mixture is reacted with an aromatic tetracarboxylic anhydride. A flexible printed circuit board characterized in that a polyimide film produced by this process is directly bonded to metal foil.
(2)対称型芳香族メタ置換第1級アミンと芳香族テト
ラカルボン酸無水物とを反応させて生成したポリアミド
酸(A)と、対称型芳香族パラ置換第1級アミンと芳香
族テトラカルボン酸無水物とを反応させて生成したポリ
アミド酸(1)とを当量比で10〜60:90〜40で
混合した後、反応を更に進めて生成したポリイミドのフ
ィルムが直接金属箔に接合されていることを特徴とする
フレキシブルプリント回路基板。
(2) Polyamic acid (A) produced by reacting a symmetrical aromatic meta-substituted primary amine and an aromatic tetracarboxylic acid anhydride, a symmetrical aromatic para-substituted primary amine, and an aromatic tetracarboxylic acid After mixing polyamic acid (1) produced by reacting with an acid anhydride in an equivalent ratio of 10 to 60:90 to 40, the reaction is further advanced and the produced polyimide film is directly bonded to the metal foil. A flexible printed circuit board characterized by:
(3)前記ポリイミド層の厚みが10μm〜1mmであ
る、特請請求の範囲第1項又は第2項に記載のフレキシ
ブルプリント回路基板。
(3) The flexible printed circuit board according to claim 1 or 2, wherein the polyimide layer has a thickness of 10 μm to 1 mm.
(4)対称型芳香族メタ置換第1級アミンと対称型芳香
族パラ置換第1級アミンとを当量比で 10〜60:90〜40で混合し、芳香族テトラカルボ
ン酸無水物と反応させ、生成したポリイミドの前駆体で
あるポリアミド酸の有機溶媒溶液を金属箔に直接コーテ
ィングした後、加熱、脱水することを特徴とするフレキ
シブルプリント回路基板の製法。
(4) A symmetric aromatic meta-substituted primary amine and a symmetric aromatic para-substituted primary amine are mixed in an equivalent ratio of 10 to 60:90 to 40, and the mixture is reacted with an aromatic tetracarboxylic anhydride. A method for producing a flexible printed circuit board, which comprises directly coating a metal foil with an organic solvent solution of polyamic acid, which is a precursor of polyimide, and then heating and dehydrating it.
(5)対称型芳香族メタ置換第1級アミンと芳香族テト
ラカルボン酸無水物とを反応させ生成したポリアミド酸
(A)の有機溶媒溶液と、対称型芳香族パラ置換第1級
アミンと芳香族テトラカルボン酸無水物とを反応させ生
成したポリアミド酸(B)の有機溶媒溶液とを、当量比
で 10〜60:90〜40で混合した後、金属箔に直接コ
ーティングし、更に加熱、脱水することを特徴とするフ
レキシブルプリント回路基板の製法。
(5) An organic solvent solution of polyamic acid (A) produced by reacting a symmetrical aromatic meta-substituted primary amine and an aromatic tetracarboxylic anhydride, a symmetrical aromatic para-substituted primary amine, and an aromatic After mixing an organic solvent solution of polyamic acid (B) produced by reacting with a group tetracarboxylic acid anhydride at an equivalent ratio of 10 to 60:90 to 40, the mixture is directly coated on metal foil, and further heated and dehydrated. A method for manufacturing a flexible printed circuit board characterized by:
(6)前記加熱、脱水を不活性ガス中において行なう特
許請求の範囲第4項又は第5項に記載のフレキシブルプ
リント回路基板の製法。
(6) The method for manufacturing a flexible printed circuit board according to claim 4 or 5, wherein the heating and dehydration are performed in an inert gas.
(7)前記ポリアミド酸の有機溶媒溶液を金属箔に直接
コーティングしてなる基板を、実質的にタックフリーな
状態迄乾燥し、ロール状に巻き取り、そのロール状の基
板を不活性ガス中において加熱することにより、脱溶媒
、該ポリアミド酸をイミド化させる特許請求の範囲第4
項に記載のフレキシブルプリント回路基板の製法。
(7) A substrate obtained by directly coating metal foil with the organic solvent solution of the polyamic acid is dried until it is substantially tack-free, wound up into a roll, and the rolled substrate is placed in an inert gas. Claim 4: By heating, the solvent is removed and the polyamic acid is imidized.
A method for manufacturing a flexible printed circuit board as described in Section.
(8)前記ポリアミド酸(A)の有機溶媒溶液と前記ポ
リアミド酸(B)の有機溶媒溶液との混合液を金属箔に
直接コーティングしてなる基板を、実質的にタックフリ
ーな状態迄乾燥し、ロール状に巻き取り、そのロール状
の基板を不活性ガス中において加熱することにより、脱
溶媒、該ポリアミド酸をイミド化させる特許請求の範囲
第5項に記載のフレキシブルプリント回路基板の製法。
(8) A substrate obtained by directly coating metal foil with a mixture of the organic solvent solution of the polyamic acid (A) and the organic solvent solution of the polyamic acid (B) is dried to a substantially tack-free state. The method for producing a flexible printed circuit board according to claim 5, wherein the polyamic acid is imidized by removing the solvent and imidizing the polyamic acid by winding the board into a roll and heating the rolled board in an inert gas.
(9)前記対称型芳香族メタ置換第1級アミンが式(1
) ▲数式、化学式、表等があります▼(1) (ただし、上記の式でXは、O、SO_2、S、Co、
CH_2、C(CH_3)_2、C(CF_3)_2あ
るいは直結を表わす) である特許請求の範囲第1項乃至第3項のいずれかに記
載のフレキシブルプリント回路基板。
(9) The symmetric aromatic meta-substituted primary amine has the formula (1
) ▲There are mathematical formulas, chemical formulas, tables, etc.▼(1) (However, in the above formula, X is O, SO_2, S, Co,
The flexible printed circuit board according to any one of claims 1 to 3, which is CH_2, C(CH_3)_2, C(CF_3)_2 or direct connection).
JP61255908A 1985-10-31 1986-10-29 Flexible printed circuit board and manufacturing method thereof Expired - Lifetime JPH0682895B2 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
PCT/JP1986/000554 WO1987002620A1 (en) 1985-10-31 1986-10-31 Flexible printed circuit board and process for its production
KR1019870700570A KR900003810B1 (en) 1985-10-31 1986-10-31 Flexible printed circuit board and process for its production
US07/069,449 US4839232A (en) 1985-10-31 1986-10-31 Flexible laminate printed-circuit board and methods of making same
EP19860906455 EP0243507B1 (en) 1985-10-31 1986-10-31 Flexible laminate for printed circuit board and process for its production
DE8686906455T DE3684307D1 (en) 1985-10-31 1986-10-31 FLEXIBLE LAMINATE FOR BOARD FOR PRINTED CIRCUITS AND METHOD FOR THE PRODUCTION THEREOF.

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP60-242935 1985-10-31
JP24293585 1985-10-31

Publications (2)

Publication Number Publication Date
JPS62208690A true JPS62208690A (en) 1987-09-12
JPH0682895B2 JPH0682895B2 (en) 1994-10-19

Family

ID=17096404

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (2)

Country Link
JP (1) JPH0682895B2 (en)
KR (1) KR900003810B1 (en)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02112935A (en) * 1988-10-24 1990-04-25 Asahi Chem Ind Co Ltd Thin film flexible printed wiring board
JPH02198837A (en) * 1989-01-27 1990-08-07 Toshiba Chem Corp Preparation of circuit base board
JPH02294362A (en) * 1989-05-08 1990-12-05 Asahi Chem Ind Co Ltd Novel polyamic acid composition
JPH0347837A (en) * 1988-10-28 1991-02-28 Mitsui Toatsu Chem Inc Polyimide and production thereof
JPH03209792A (en) * 1990-01-11 1991-09-12 Nitsukan Kogyo Kk Both-side metal-cladded flexible printed circuit board and manufacture thereof
WO2006033272A1 (en) * 2004-09-24 2006-03-30 Kaneka Corporation Novel polyimide film improved in adhesion
JP2007326962A (en) * 2006-06-08 2007-12-20 Mitsubishi Gas Chem Co Inc Polyimide resin, polyimide film and polyimide laminate
JP5163126B2 (en) * 2005-10-25 2013-03-13 日立化成株式会社 Flexible laminated board, manufacturing method thereof, and flexible printed wiring board
JP2016060128A (en) * 2014-09-18 2016-04-25 三菱樹脂株式会社 Transfer film, production method of resin/glass laminate using the same, and resin/glass laminate
WO2017159274A1 (en) * 2016-03-17 2017-09-21 新日鉄住金化学株式会社 Polyamide acid, thermoplastic polyimide, resin film, metal-clad laminate and circuit board
JP2023500716A (en) * 2019-11-07 2023-01-10 ピーアイ アドヴァンスド マテリアルズ カンパニー リミテッド High heat resistance and low dielectric polyimide film and its manufacturing method

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58190092A (en) * 1982-04-30 1983-11-05 宇部興産株式会社 Method of producing flexible circuit board
JPS58190093A (en) * 1982-04-30 1983-11-05 宇部興産株式会社 Method of producing flexible circuit board
JPS58190091A (en) * 1982-04-30 1983-11-05 宇部興産株式会社 Method of producing flexible circuit board

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58190092A (en) * 1982-04-30 1983-11-05 宇部興産株式会社 Method of producing flexible circuit board
JPS58190093A (en) * 1982-04-30 1983-11-05 宇部興産株式会社 Method of producing flexible circuit board
JPS58190091A (en) * 1982-04-30 1983-11-05 宇部興産株式会社 Method of producing flexible circuit board

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02112935A (en) * 1988-10-24 1990-04-25 Asahi Chem Ind Co Ltd Thin film flexible printed wiring board
JPH0347837A (en) * 1988-10-28 1991-02-28 Mitsui Toatsu Chem Inc Polyimide and production thereof
JPH02198837A (en) * 1989-01-27 1990-08-07 Toshiba Chem Corp Preparation of circuit base board
JPH02294362A (en) * 1989-05-08 1990-12-05 Asahi Chem Ind Co Ltd Novel polyamic acid composition
JPH03209792A (en) * 1990-01-11 1991-09-12 Nitsukan Kogyo Kk Both-side metal-cladded flexible printed circuit board and manufacture thereof
WO2006033272A1 (en) * 2004-09-24 2006-03-30 Kaneka Corporation Novel polyimide film improved in adhesion
US8501279B2 (en) 2005-10-25 2013-08-06 Hitachi Chemical Company, Ltd. Flexible laminate board, process for manufacturing of the board, and flexible print wiring board
JP5163126B2 (en) * 2005-10-25 2013-03-13 日立化成株式会社 Flexible laminated board, manufacturing method thereof, and flexible printed wiring board
JP2007326962A (en) * 2006-06-08 2007-12-20 Mitsubishi Gas Chem Co Inc Polyimide resin, polyimide film and polyimide laminate
JP2016060128A (en) * 2014-09-18 2016-04-25 三菱樹脂株式会社 Transfer film, production method of resin/glass laminate using the same, and resin/glass laminate
WO2017159274A1 (en) * 2016-03-17 2017-09-21 新日鉄住金化学株式会社 Polyamide acid, thermoplastic polyimide, resin film, metal-clad laminate and circuit board
US10844175B2 (en) 2016-03-17 2020-11-24 Nippon Steel Chemical & Material Co., Ltd. Polyamide acid, thermoplastic polyimide, resin film, metal-clad laminate and circuit board
JP2023500716A (en) * 2019-11-07 2023-01-10 ピーアイ アドヴァンスド マテリアルズ カンパニー リミテッド High heat resistance and low dielectric polyimide film and its manufacturing method

Also Published As

Publication number Publication date
KR900003810B1 (en) 1990-05-31
JPH0682895B2 (en) 1994-10-19
KR870700506A (en) 1987-12-29

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