JPH04318025A - Polyamic acid resin composition - Google Patents
Polyamic acid resin compositionInfo
- Publication number
- JPH04318025A JPH04318025A JP17629091A JP17629091A JPH04318025A JP H04318025 A JPH04318025 A JP H04318025A JP 17629091 A JP17629091 A JP 17629091A JP 17629091 A JP17629091 A JP 17629091A JP H04318025 A JPH04318025 A JP H04318025A
- Authority
- JP
- Japan
- Prior art keywords
- component
- dianhydride
- mol
- resin composition
- polyamic acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011342 resin composition Substances 0.000 title claims abstract description 13
- 229920005575 poly(amic acid) Polymers 0.000 title claims abstract description 11
- 150000004984 aromatic diamines Chemical class 0.000 claims abstract description 14
- QQGYZOYWNCKGEK-UHFFFAOYSA-N 5-[(1,3-dioxo-2-benzofuran-5-yl)oxy]-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(OC=2C=C3C(=O)OC(C3=CC=2)=O)=C1 QQGYZOYWNCKGEK-UHFFFAOYSA-N 0.000 claims abstract description 10
- 239000002253 acid Substances 0.000 claims abstract description 10
- 150000004985 diamines Chemical class 0.000 claims abstract description 10
- WKDNYTOXBCRNPV-UHFFFAOYSA-N bpda Chemical compound C1=C2C(=O)OC(=O)C2=CC(C=2C=C3C(=O)OC(C3=CC=2)=O)=C1 WKDNYTOXBCRNPV-UHFFFAOYSA-N 0.000 claims abstract description 9
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 claims abstract description 6
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 claims abstract description 4
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 abstract description 14
- 239000002184 metal Substances 0.000 abstract description 14
- 239000011888 foil Substances 0.000 abstract description 12
- 239000000758 substrate Substances 0.000 abstract description 11
- 239000000203 mixture Substances 0.000 abstract description 5
- DKKYOQYISDAQER-UHFFFAOYSA-N 3-[3-(3-aminophenoxy)phenoxy]aniline Chemical compound NC1=CC=CC(OC=2C=C(OC=3C=C(N)C=CC=3)C=CC=2)=C1 DKKYOQYISDAQER-UHFFFAOYSA-N 0.000 abstract description 2
- VQVIHDPBMFABCQ-UHFFFAOYSA-N 5-(1,3-dioxo-2-benzofuran-5-carbonyl)-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)=O)=C1 VQVIHDPBMFABCQ-UHFFFAOYSA-N 0.000 abstract description 2
- 125000000217 alkyl group Chemical group 0.000 abstract 1
- 125000006158 tetracarboxylic acid group Chemical group 0.000 abstract 1
- 229920001721 polyimide Polymers 0.000 description 12
- 239000000853 adhesive Substances 0.000 description 9
- 230000001070 adhesive effect Effects 0.000 description 9
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 6
- 239000004642 Polyimide Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 239000011889 copper foil Substances 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 239000009719 polyimide resin Substances 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- VOZKAJLKRJDJLL-UHFFFAOYSA-N 2,4-diaminotoluene Chemical compound CC1=CC=C(N)C=C1N VOZKAJLKRJDJLL-UHFFFAOYSA-N 0.000 description 1
- BWAPJIHJXDYDPW-UHFFFAOYSA-N 2,5-dimethyl-p-phenylenediamine Chemical compound CC1=CC(N)=C(C)C=C1N BWAPJIHJXDYDPW-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- 101100191174 Arabidopsis thaliana PPD3 gene Proteins 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- 208000023951 Polydactyly of an index finger Diseases 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 229940018564 m-phenylenediamine Drugs 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/032—Organic insulating material consisting of one material
- H05K1/0346—Organic insulating material consisting of one material containing N
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は、特にフレキシブルプリ
ント基板に適したポリアミック酸樹脂組成物に関するも
のであり、さらに詳しくは、2種または3種の芳香族テ
トラカルボン酸二無水物と2種またはそれ以上の芳香族
ジアミン成分とからなるポリアミック酸樹脂組成物に関
するものである。[Field of Industrial Application] The present invention relates to a polyamic acid resin composition particularly suitable for flexible printed circuit boards, and more particularly, it relates to a polyamic acid resin composition that is composed of two or three aromatic tetracarboxylic dianhydrides and two or more aromatic tetracarboxylic dianhydrides. The present invention relates to a polyamic acid resin composition comprising more aromatic diamine components.
【0002】0002
【従来の技術】ポリイミドは高耐熱性ポリマーとして広
く知られているが、その分子骨格が剛直なために成形性
に欠点があった。また、近年の電子、電気工業の発展に
伴い、通信用、民生用機器の実装方式は、軽量で立体的
に実装できるフレキシブルプリント回路基板が広く使用
されている。このフレキシブルプリント回路基板には現
在広くポリイミドフィルムが使用されている。この場合
、ポリイミドフィルムに要求される性能として耐熱性、
金属箔との接着力、金属箔との熱膨張係数の一致、電気
絶縁性などがある。これまでに種々のポリイミドが開発
されているが、耐熱性に優れるものは金属との接着力が
劣り、一方接着力に優れるものは、熱膨張係数が金属箔
と比べると大きく、基板にロールを生じるなどの欠点が
あった。BACKGROUND OF THE INVENTION Polyimide is widely known as a highly heat-resistant polymer, but has a drawback in moldability due to its rigid molecular skeleton. Furthermore, with the recent development of the electronic and electrical industries, flexible printed circuit boards, which are lightweight and can be mounted three-dimensionally, have been widely used as a mounting method for communication and consumer equipment. Polyimide films are currently widely used in flexible printed circuit boards. In this case, the performance required of the polyimide film is heat resistance,
These include adhesive strength with metal foil, matching thermal expansion coefficient with metal foil, and electrical insulation. Various polyimides have been developed so far, but those with excellent heat resistance have poor adhesive strength with metals, while those with excellent adhesive strength have a larger coefficient of thermal expansion than metal foils, making it difficult to roll them onto substrates. There were drawbacks such as:
【0003】0003
【発明が解決しようとする課題】本発明は、耐熱性、金
属箔との接着力に優れ、さらに熱膨張係数の値が金属箔
の値に近いポリイミド樹脂を得ようとして研究した結果
得られたものである。[Problems to be Solved by the Invention] The present invention was obtained as a result of research aimed at obtaining a polyimide resin that has excellent heat resistance and adhesive strength with metal foil, and also has a coefficient of thermal expansion close to that of metal foil. It is something.
【0004】0004
【課題を解決するための手段】本発明は、3,3’,4
,4’−ビフェニルテトラカルボン酸二無水物(以下B
PDAと略す)を必須成分とし、3,3’,4,4’−
ベンゾフェノンテトラカルボン酸二無水物(以下BTD
Aと略す)および/またはビス(3,4−ジカルボキシ
フェニル)エーテル二無水物(以下ODPAと略す)を
0〜50モル%含む酸二無水物成分と、一般式(I)[Means for Solving the Problems] The present invention provides 3, 3', 4
, 4'-biphenyltetracarboxylic dianhydride (hereinafter referred to as B
(abbreviated as PDA) is an essential component, and 3,3',4,4'-
Benzophenone tetracarboxylic dianhydride (hereinafter referred to as BTD)
An acid dianhydride component containing 0 to 50 mol% of bis(3,4-dicarboxyphenyl)ether dianhydride (hereinafter abbreviated as ODPA); and general formula (I)
【
0005】[
0005
【化2】[Chemical 2]
【0006】で表される芳香族ジアミンの1種またはそ
れ以上と1,3−ビス(3−アミノフェノキシ)ベンゼ
ン(以下APBと略す)との比が70:30〜90:1
0である芳香族ジアミンからなり、酸成分とジアミン成
分のモル比が0.9〜1.1であるポリアミック酸樹脂
組成物に関するものである。The ratio of one or more aromatic diamines represented by: and 1,3-bis(3-aminophenoxy)benzene (hereinafter abbreviated as APB) is 70:30 to 90:1.
The present invention relates to a polyamic acid resin composition comprising an aromatic diamine having a concentration of 0.0 and a molar ratio of an acid component to a diamine component of 0.9 to 1.1.
【0007】[0007]
【作用】本発明において用いられるポリアミック酸溶液
は、N−メチル−2−ピロリドン、(以下NMPと略す
)、ジメチルアセトアミド、ジメチルホルムアミド、ク
レゾール等の溶媒中で、芳香族カルボン酸二無水物成分
と芳香族ジアミン成分とを攪拌することにより得ること
ができる。芳香族カルボン酸二無水物成分と芳香族ジア
ミン成分のモル比は、0.90〜1.10が好ましく、
さらに好ましくは0.97〜0.99である。酸成分と
アミン成分のモル比が上述の範囲を外れると、生成する
ポリイミドの分子量が小さくなり、生成物の物性が低下
する。特に耐熱性を考慮する場合は、ジアミン成分過剰
で反応する方が望ましい。[Operation] The polyamic acid solution used in the present invention is prepared by combining an aromatic carboxylic dianhydride component in a solvent such as N-methyl-2-pyrrolidone (hereinafter abbreviated as NMP), dimethylacetamide, dimethylformamide, or cresol. It can be obtained by stirring the aromatic diamine component. The molar ratio of the aromatic carboxylic dianhydride component and the aromatic diamine component is preferably 0.90 to 1.10,
More preferably, it is 0.97 to 0.99. When the molar ratio of the acid component and the amine component is out of the above-mentioned range, the molecular weight of the polyimide produced becomes small and the physical properties of the product deteriorate. Particularly when considering heat resistance, it is preferable to react with an excess of the diamine component.
【0008】本発明のポリアミック酸中で用いられる酸
成分としては、BPDA、BTDA、ODPAなどがあ
る。BPDAのモル含量は、酸成分中の50モル%以上
が好ましく、特に好ましくは70〜80モル%である。
BTDAとODPAのモル比は、100:0〜0:10
0の範囲で任意に使用することができるが、90:10
〜50:50が好ましく、特に好ましくは80:20〜
70:30である。BPDAを必須成分として合成され
る樹脂組成物は、BTDA、ODPAと共重合体にする
ことにより、接着性をさらに向上させることができる。[0008] Acid components used in the polyamic acid of the present invention include BPDA, BTDA, and ODPA. The molar content of BPDA in the acid component is preferably 50 mol% or more, particularly preferably 70 to 80 mol%. The molar ratio of BTDA and ODPA is 100:0 to 0:10
Can be used arbitrarily within the range of 0, but 90:10
~50:50 is preferred, particularly preferably 80:20~
It is 70:30. A resin composition synthesized using BPDA as an essential component can further improve adhesiveness by making it a copolymer with BTDA and ODPA.
【0009】一般式(I)で表わされる芳香族ジアミン
としては、p−フェニレンジアミン(以下PPDと略す
)、m−フェニレンジアミン(以下MPDと略す)、2
,4−トリレンジアミン(以下2,4−TDAと略す)
、1,4−ジメチル−2,5−ジアミノベンゼン(以下
25DPXと略す)などがある。これらの1種またはそ
れ以上とAPBの比は、70:30〜95:5が好まし
く、特に好ましくは75:25〜90:10である。A
PBをこの範囲で添加することにより、接着力を向上さ
せることができる。APBの添加量が30モル%を起え
ると接着力は向上するが、耐熱性が低下し、また熱膨張
係数も大きくなる。一般式(I)で表わされる芳香族ジ
アミンのうち、p−フェニレンジアミンの添加量はジア
ミン成分全量の20〜70モル%が好ましく、特に好ま
しくは30〜60モル%である。PPD添加量の増加と
ともにポリイミドフィルムの耐熱性は向上し、熱膨張係
数の値は小さくなる。一方、接着力は低下する。Examples of the aromatic diamine represented by the general formula (I) include p-phenylenediamine (hereinafter abbreviated as PPD), m-phenylenediamine (hereinafter abbreviated as MPD), 2
,4-tolylenediamine (hereinafter abbreviated as 2,4-TDA)
, 1,4-dimethyl-2,5-diaminobenzene (hereinafter abbreviated as 25DPX). The ratio of one or more of these to APB is preferably 70:30 to 95:5, particularly preferably 75:25 to 90:10. A
By adding PB in this range, the adhesive strength can be improved. If the amount of APB added is 30 mol %, the adhesive strength will improve, but the heat resistance will decrease and the coefficient of thermal expansion will also increase. Among the aromatic diamines represented by the general formula (I), the amount of p-phenylenediamine added is preferably 20 to 70 mol%, particularly preferably 30 to 60 mol%, based on the total amount of diamine components. As the amount of PPD added increases, the heat resistance of the polyimide film improves, and the value of the coefficient of thermal expansion decreases. On the other hand, the adhesive strength decreases.
【0010】本発明のポリアミック酸樹脂組成物は、銅
箔、アルミニウム箔等の金属箔へ塗布し、これを乾燥硬
化させることによりプリント回路基板を得ることができ
る。また、ガラスクロス等の基板に含浸してプリプレグ
とすることも可能である。これら基材に塗布した樹脂組
成物の乾燥温度は、通常80〜380℃であり、この温
度範囲で10〜180分間加熱することによってプリン
ト回路基板を得ることが出来る。The polyamic acid resin composition of the present invention can be applied to a metal foil such as a copper foil or an aluminum foil, and a printed circuit board can be obtained by drying and curing the composition. It is also possible to impregnate a substrate such as glass cloth to prepare a prepreg. The drying temperature of the resin composition applied to these base materials is usually 80 to 380°C, and a printed circuit board can be obtained by heating in this temperature range for 10 to 180 minutes.
【0011】本発明の樹脂組成物は、金属とポリイミド
等のプラスチックの接着に用いることもでき、また金属
同志、プラスチック同志の接着性にも優れている。また
、耐熱性に優れていることから、接着層を持たないポリ
イミドと金属箔とから構成される2層のフレキシブルプ
リント回路基板のポリイミド側同志を貼合わせることに
より、その両面板を得ることも出来る。さらに銅箔同志
を貼合わせることによっても両面フレキシブルプリント
回路基板を得ることが出来る。また、高耐熱性のフィル
ムカバーコート用の接着剤としても用いることが出来る
。The resin composition of the present invention can also be used for adhering metals to plastics such as polyimide, and has excellent adhesion between metals and between plastics. In addition, due to its excellent heat resistance, it is also possible to obtain a double-sided board by laminating the polyimide sides of two-layer flexible printed circuit boards made of polyimide and metal foil without an adhesive layer. . Furthermore, a double-sided flexible printed circuit board can also be obtained by bonding copper foils together. It can also be used as an adhesive for highly heat-resistant film cover coats.
【0012】0012
(実施例1)攪拌機、温度計、窒素導入管、還流冷却管
を備えた4ツ口ラスコヘジアミン成分として、PPD3
.24g(0.03モル)、25DPX8.17g(0
.06モル)、APB2.94g(0.01モル)を加
え、NMPを100g添加し、窒素気流下、室温で充分
に攪拌し、ジアミン成分を溶解した。次いで、BPDA
20.18g(0.07モル)、BTDA9.47g(
0.03モル)を徐々に添加し、NMPを75g加え、
室温で4時間攪拌した。ここへエタノール75gを加え
、さらに1時間攪拌した。得られた溶液の還元粘度(樹
脂0.5gを100mlのNMPへ溶解し、30℃の恒
温槽中で測定)は0.5であり、樹脂含量は15重量%
であった。この樹脂溶液を乾燥後の厚みが25μmにな
る様に厚さ35μmの銅箔上へ塗布し、100℃/1時
間、350℃/1時間乾燥し、フレキシブル基板を得た
。(Example 1) PPD3 was used as a four-necked glass cohediamine component equipped with a stirrer, a thermometer, a nitrogen inlet tube, and a reflux condenser tube.
.. 24g (0.03 mol), 25DPX8.17g (0
.. 06 mol) and 2.94 g (0.01 mol) of APB were added, and 100 g of NMP was added, followed by sufficient stirring at room temperature under a nitrogen stream to dissolve the diamine component. Then, BPDA
20.18g (0.07mol), BTDA9.47g (
0.03 mol) was gradually added, 75 g of NMP was added,
The mixture was stirred at room temperature for 4 hours. 75 g of ethanol was added thereto, and the mixture was further stirred for 1 hour. The reduced viscosity of the obtained solution (measured by dissolving 0.5 g of resin in 100 ml of NMP in a constant temperature bath at 30°C) was 0.5, and the resin content was 15% by weight.
Met. This resin solution was applied onto a 35 μm thick copper foil so that the thickness after drying would be 25 μm, and dried at 100° C. for 1 hour and at 350° C. for 1 hour to obtain a flexible substrate.
【0013】(実施例2)ジアミン成分として、PPD
5.41g(0.05モル)、MPD4.33g(0.
04モル)、APB2.92g(0.01モル)、酸成
分として、BPDA20.18g(0.07モル)、O
DPA9.12g(0.03モル)を用い、実施例1と
同様の装置および方法でフレキシブル基板を得た。(Example 2) As a diamine component, PPD
5.41g (0.05 mol), MPD 4.33g (0.
04 mol), APB 2.92 g (0.01 mol), BPDA 20.18 g (0.07 mol), O
A flexible substrate was obtained using the same apparatus and method as in Example 1 using 9.12 g (0.03 mol) of DPA.
【0014】(実施例3)ジアミン成分として、PPD
7.75g(0.07モル)、2,4−TDA2.44
g(0.02モル)、APB2.92g(0.01モル
)、酸成分として、BPDA20.18g(0.07モ
ル)、BTDA6.32g(0.02モル)、ODPA
3.04g(0.01モル)を用い、実施例1と同様の
装置および方法でフレキシブル基板を得た。(Example 3) As a diamine component, PPD
7.75g (0.07mol), 2,4-TDA2.44
g (0.02 mol), APB 2.92 g (0.01 mol), acid components: BPDA 20.18 g (0.07 mol), BTDA 6.32 g (0.02 mol), ODPA
A flexible substrate was obtained using the same apparatus and method as in Example 1 using 3.04 g (0.01 mol).
【0015】(比較例1)ジアミン成分として、25D
PX6.81g(0.05モル)、APB14.62g
(0.05モル)、酸成分として、BPDA20.18
g(0.07モル)、BTDA9.47g(0.03モ
ル)を用い、実施例1と同様の装置および方法でフレキ
シブル基板を得た。(Comparative Example 1) As a diamine component, 25D
PX6.81g (0.05mol), APB14.62g
(0.05 mol), BPDA20.18 as an acid component
A flexible substrate was obtained using the same apparatus and method as in Example 1, using 9.47 g (0.03 mol) of BTDA and 9.47 g (0.07 mol) of BTDA.
【0016】(比較例2)ジアミン成分として、PPD
7.57g(0.07モル)、24TDA3.67g(
0.03モル)、酸成分として、BTDA22.56g
(0.07モル)、ODPA9.12g(0.03モル
)を用い、実施例1と同様の装置および方法でフレキシ
ブル基板を得た。(Comparative Example 2) As the diamine component, PPD
7.57g (0.07mol), 24TDA3.67g (
0.03 mol), BTDA22.56g as acid component
A flexible substrate was obtained using the same apparatus and method as in Example 1 using ODPA (0.07 mol) and 9.12 g (0.03 mol) of ODPA.
【0017】以上、実施例1、2、3及び比較例1、2
で得られたフレキシブル基板及びそのフィルムを評価し
た結果を表1に示す。実施例の樹脂組成物を用いたフレ
キシブル基板は、比較例と比べ、ピール強度、熱膨張係
数にバランスのとれた優れた値を示した。Above, Examples 1, 2, 3 and Comparative Examples 1, 2
Table 1 shows the results of evaluating the flexible substrate and its film obtained in . The flexible substrate using the resin composition of the example showed excellent values with well-balanced peel strength and coefficient of thermal expansion compared to the comparative example.
【0018】[0018]
【表1】[Table 1]
【0019】[0019]
【発明の効果】本発明により得られたポリイミド樹脂は
、耐熱性、金属箔との接着性に優れ、さらに熱膨張係数
の値が金属箔に近いものである。これを用いることによ
り、従来のポリイミド樹脂に比べ、接着性、寸法安定性
、耐熱性に優れたフレキシブル基板を得ることができる
。また、プリプレグ含浸用組成物やフィルムカバーコー
ト用接着剤としても有用である。[Effects of the Invention] The polyimide resin obtained by the present invention has excellent heat resistance and adhesion to metal foil, and has a coefficient of thermal expansion close to that of metal foil. By using this, a flexible substrate can be obtained that has superior adhesiveness, dimensional stability, and heat resistance compared to conventional polyimide resins. It is also useful as a composition for impregnating prepregs and as an adhesive for film cover coats.
Claims (2)
ラカルボン酸二無水物を必須成分とし、3,3’,4,
4’−ベンゾフェノンテトラカルボン酸二無水物および
/またはビス(3,4−ジカルボキシフェニル)エーテ
ル二無水物0〜50モル%含むカルボン酸二無水物成分
と、一般式(I) 【化1】 で表される芳香族ジアミンの1種またはそれ以上と1,
3−ビス(3−アミノフェノキシ)ベンゼンとの比が7
0:30〜90:10である芳香族ジアミンからなり、
酸成分とジアミン成分のモル比が0.9〜1.1である
ポリアミック酸樹脂組成物。Claim 1: 3,3',4,4'-biphenyltetracarboxylic dianhydride as an essential component;
A carboxylic dianhydride component containing 0 to 50 mol% of 4'-benzophenone tetracarboxylic dianhydride and/or bis(3,4-dicarboxyphenyl)ether dianhydride, and general formula (I) [Formula 1] one or more aromatic diamines represented by 1,
The ratio to 3-bis(3-aminophenoxy)benzene is 7.
consisting of an aromatic diamine having a ratio of 0:30 to 90:10,
A polyamic acid resin composition in which the molar ratio of acid component to diamine component is 0.9 to 1.1.
ン成分中のp−フェニレンジアミンの含有量が芳香族ジ
アミン成分全量の20〜70モル%からなる請求項1記
載のポリアミック酸樹脂組成物。2. The polyamic acid resin composition according to claim 1, wherein the content of p-phenylenediamine in the aromatic diamine component represented by general formula (I) is 20 to 70 mol% of the total amount of the aromatic diamine component. thing.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3176290A JP2938227B2 (en) | 1991-04-17 | 1991-04-17 | Polyamic acid resin |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3176290A JP2938227B2 (en) | 1991-04-17 | 1991-04-17 | Polyamic acid resin |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH04318025A true JPH04318025A (en) | 1992-11-09 |
JP2938227B2 JP2938227B2 (en) | 1999-08-23 |
Family
ID=16011004
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3176290A Expired - Lifetime JP2938227B2 (en) | 1991-04-17 | 1991-04-17 | Polyamic acid resin |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2938227B2 (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1993024583A1 (en) * | 1992-06-04 | 1993-12-09 | Sumitomo Bakelite Company Limited | Film adhesive and production thereof |
DE19604774A1 (en) * | 1996-02-09 | 1997-08-14 | Siemens Ag | Plastics carrier with an induction coil |
JP2011032358A (en) * | 2009-07-31 | 2011-02-17 | Ube Industries Ltd | Polyimide film and method for producing polyimide film |
WO2011035920A1 (en) * | 2009-09-24 | 2011-03-31 | Corus Technology Bv | A method of preparing a polyetherimide coating on a metallic substrate |
US20170306094A1 (en) * | 2014-09-30 | 2017-10-26 | Somar Corporation | Polyimide copolymer and molded article using same |
-
1991
- 1991-04-17 JP JP3176290A patent/JP2938227B2/en not_active Expired - Lifetime
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1993024583A1 (en) * | 1992-06-04 | 1993-12-09 | Sumitomo Bakelite Company Limited | Film adhesive and production thereof |
US5739263A (en) * | 1992-06-04 | 1998-04-14 | Sumitomo Bakelite Company Limited | Film adhesive and process for production thereof |
DE19604774A1 (en) * | 1996-02-09 | 1997-08-14 | Siemens Ag | Plastics carrier with an induction coil |
JP2011032358A (en) * | 2009-07-31 | 2011-02-17 | Ube Industries Ltd | Polyimide film and method for producing polyimide film |
WO2011035920A1 (en) * | 2009-09-24 | 2011-03-31 | Corus Technology Bv | A method of preparing a polyetherimide coating on a metallic substrate |
US20170306094A1 (en) * | 2014-09-30 | 2017-10-26 | Somar Corporation | Polyimide copolymer and molded article using same |
Also Published As
Publication number | Publication date |
---|---|
JP2938227B2 (en) | 1999-08-23 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US6320019B1 (en) | Method for the preparation of polyamic acid and polyimide | |
KR100668948B1 (en) | Metallic Laminate and Method for Preparing Thereof | |
KR100262417B1 (en) | Film adhesive and production thereof | |
JPH08224843A (en) | Multilayer aromatic polyimide film | |
JP4571043B2 (en) | Laminated body and method for producing the same | |
JP5547874B2 (en) | Polyimide resin | |
JPH0682895B2 (en) | Flexible printed circuit board and manufacturing method thereof | |
JPH04318025A (en) | Polyamic acid resin composition | |
EP1667501A1 (en) | Substrate for flexible printed wiring board and method for manufacturing same | |
JP2729063B2 (en) | Method of manufacturing flexible metal foil laminate | |
JP4412708B2 (en) | Polyamide acid, polyamide composition and polyimide | |
JP2927531B2 (en) | Flexible printed circuit board and method of manufacturing the same | |
JPH0446983A (en) | Polyimide adhesive | |
JP2977958B2 (en) | Polyamic acid resin for flexible printed circuit boards | |
JP2002114848A (en) | New thermoplastic polyimide resin and flexible metal foil-clad laminate | |
JP2668752B2 (en) | Heat resistant adhesive | |
JP4935406B2 (en) | High heat resistant polyimide resin composition | |
JP3295952B2 (en) | Method for manufacturing flexible wiring board | |
JPH09193292A (en) | Flexible copperclad laminate | |
JPH04266082A (en) | Manufacture of flexible wiring substrate | |
JP4574160B2 (en) | Polyimide and high-concentration polyamic acid composition excellent in adhesiveness | |
KR100822840B1 (en) | Flexible Copper-Clad Laminate | |
JP2002146306A (en) | Heat-resistant bond ply having excellent alkali etching property | |
JP2898782B2 (en) | Resin composition for flexible printed circuit boards | |
JPS61182941A (en) | Manufacture of flexible copper lined circuit substrate |