KR890007708A - 진공 증발장치 - Google Patents

진공 증발장치

Info

Publication number
KR890007708A
KR890007708A KR1019870014123A KR870014123A KR890007708A KR 890007708 A KR890007708 A KR 890007708A KR 1019870014123 A KR1019870014123 A KR 1019870014123A KR 870014123 A KR870014123 A KR 870014123A KR 890007708 A KR890007708 A KR 890007708A
Authority
KR
South Korea
Prior art keywords
vacuum evaporator
evaporator
vacuum
Prior art date
Application number
KR1019870014123A
Other languages
English (en)
Other versions
KR930007853B1 (ko
Inventor
히로시 노마
히로시 후지야스
Original Assignee
후지 세이끼 가부시기 가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP61294510A external-priority patent/JPS63149371A/ja
Priority claimed from JP62051605A external-priority patent/JPS63219571A/ja
Application filed by 후지 세이끼 가부시기 가이샤 filed Critical 후지 세이끼 가부시기 가이샤
Publication of KR890007708A publication Critical patent/KR890007708A/ko
Application granted granted Critical
Publication of KR930007853B1 publication Critical patent/KR930007853B1/ko

Links

Classifications

    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
    • A61B5/00—Measuring for diagnostic purposes; Identification of persons
    • A61B5/02—Detecting, measuring or recording pulse, heart rate, blood pressure or blood flow; Combined pulse/heart-rate/blood pressure determination; Evaluating a cardiovascular condition not otherwise provided for, e.g. using combinations of techniques provided for in this group with electrocardiography or electroauscultation; Heart catheters for measuring blood pressure
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
    • C30B23/02—Epitaxial-layer growth
    • C30B23/06—Heating of the deposition chamber, the substrate or the materials to be evaporated
    • C30B23/066—Heating of the material to be evaporated

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Heart & Thoracic Surgery (AREA)
  • Medical Informatics (AREA)
  • Physiology (AREA)
  • Biophysics (AREA)
  • Pathology (AREA)
  • Biomedical Technology (AREA)
  • Cardiology (AREA)
  • Physics & Mathematics (AREA)
  • Molecular Biology (AREA)
  • Surgery (AREA)
  • Animal Behavior & Ethology (AREA)
  • General Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Veterinary Medicine (AREA)
  • Physical Vapour Deposition (AREA)
KR1019870014123A 1986-12-10 1987-12-10 진공 증발장치 KR930007853B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP86-294510 1986-12-10
JP61294510A JPS63149371A (ja) 1986-12-10 1986-12-10 複数の蒸着源を有する蒸着源保持装置
JP87-51605 1987-03-06
JP62051605A JPS63219571A (ja) 1987-03-06 1987-03-06 蒸着装置

Publications (2)

Publication Number Publication Date
KR890007708A true KR890007708A (ko) 1989-07-05
KR930007853B1 KR930007853B1 (ko) 1993-08-20

Family

ID=26392153

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019870014123A KR930007853B1 (ko) 1986-12-10 1987-12-10 진공 증발장치

Country Status (4)

Country Link
US (1) US4854264A (ko)
EP (1) EP0271351B1 (ko)
KR (1) KR930007853B1 (ko)
DE (1) DE3786237T2 (ko)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3851701T2 (de) * 1988-06-03 1995-03-30 Ibm Verfahren zur Herstellung künstlicher Hochtemperatur-Supraleiter mit mehrschichtiger Struktur.
DE4006489A1 (de) * 1990-03-02 1991-09-05 Hoechst Ag Vorrichtung zum herstellen duenner schichten aus metallmischoxiden aus organischen metallverbindungen auf einem substrat
US5447569A (en) * 1990-12-12 1995-09-05 Hiskes; Ronald MOCVD system for forming superconducting thin films
US5596673A (en) * 1994-11-18 1997-01-21 Xerox Corporation Evaporation crucible assembly
US5532102A (en) * 1995-03-30 1996-07-02 Xerox Corporation Apparatus and process for preparation of migration imaging members
US5582393A (en) * 1995-04-21 1996-12-10 Xerox Corporation Method to maintain the levelness of a heated crucible
US5764849A (en) * 1996-03-27 1998-06-09 Micron Technology, Inc. Solid precursor injector apparatus and method
US6136678A (en) * 1998-03-02 2000-10-24 Motorola, Inc. Method of processing a conductive layer and forming a semiconductor device
TWI336905B (en) 2002-05-17 2011-02-01 Semiconductor Energy Lab Evaporation method, evaporation device and method of fabricating light emitting device
US20040035360A1 (en) * 2002-05-17 2004-02-26 Semiconductor Energy Laboratory Co., Ltd. Manufacturing apparatus
DE10316228B3 (de) * 2003-04-09 2004-12-16 Dr. Eberl Mbe-Komponenten Gmbh Effusionszelle mit verbesserter Temperaturkontrolle des Tiegels
JP4673190B2 (ja) * 2005-11-01 2011-04-20 長州産業株式会社 薄膜堆積用分子線源とその分子線量制御方法
WO2007122203A2 (en) * 2006-04-20 2007-11-01 Shell Erneuerbare Energien Gmbh Thermal evaporation apparatus, use and method of depositing a material
FI121430B (fi) * 2006-04-28 2010-11-15 Beneq Oy Kuuma lähde
US8056742B2 (en) * 2007-07-31 2011-11-15 Rexam Healthcare Packaging Inc. Two-piece child-resistant closure and package
US7945344B2 (en) * 2008-06-20 2011-05-17 SAKT13, Inc. Computational method for design and manufacture of electrochemical systems
US9249502B2 (en) * 2008-06-20 2016-02-02 Sakti3, Inc. Method for high volume manufacture of electrochemical cells using physical vapor deposition
US20100159132A1 (en) * 2008-12-18 2010-06-24 Veeco Instruments, Inc. Linear Deposition Source
US20100285218A1 (en) * 2008-12-18 2010-11-11 Veeco Instruments Inc. Linear Deposition Source
WO2011065998A1 (en) * 2008-12-18 2011-06-03 Veeco Instruments Inc. Linear deposition source
KR100952313B1 (ko) * 2009-03-26 2010-04-09 에스엔유 프리시젼 주식회사 원료 공급 유닛과 원료 공급 방법 및 박막 증착 장치
US8357464B2 (en) 2011-04-01 2013-01-22 Sakti3, Inc. Electric vehicle propulsion system and method utilizing solid-state rechargeable electrochemical cells
US20110104398A1 (en) * 2009-10-29 2011-05-05 General Electric Company Method and system for depositing multiple materials on a substrate
US10770745B2 (en) 2011-11-09 2020-09-08 Sakti3, Inc. Monolithically integrated thin-film solid state lithium battery device having multiple layers of lithium electrochemical cells
US8301285B2 (en) 2011-10-31 2012-10-30 Sakti3, Inc. Computer aided solid state battery design method and manufacture of same using selected combinations of characteristics
US9127344B2 (en) * 2011-11-08 2015-09-08 Sakti3, Inc. Thermal evaporation process for manufacture of solid state battery devices
US9627717B1 (en) 2012-10-16 2017-04-18 Sakti3, Inc. Embedded solid-state battery
TWI477625B (zh) * 2012-12-26 2015-03-21 Au Optronics Corp 蒸鍍裝置
KR101332804B1 (ko) * 2013-06-18 2013-11-27 주식회사 에이에스이 성장로의 씨드 교체장치 및 이를 이용한 교체방법
US9627709B2 (en) 2014-10-15 2017-04-18 Sakti3, Inc. Amorphous cathode material for battery device
US11266005B2 (en) * 2019-02-07 2022-03-01 Fermi Research Alliance, Llc Methods for treating superconducting cavities
CN113388884A (zh) * 2021-06-18 2021-09-14 北京理工大学 一种双坩埚蒸发源

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3925146A (en) * 1970-12-09 1975-12-09 Minnesota Mining & Mfg Method for producing epitaxial thin-film fabry-perot cavity suitable for use as a laser crystal by vacuum evaporation and product thereof
JPS53110973A (en) * 1977-03-10 1978-09-28 Futaba Denshi Kogyo Kk Method and apparatus for manufacturing compounds
US4681773A (en) * 1981-03-27 1987-07-21 American Telephone And Telegraph Company At&T Bell Laboratories Apparatus for simultaneous molecular beam deposition on a plurality of substrates
US4482799A (en) * 1981-05-28 1984-11-13 Gte Products Corporation Evaporation heater
CH651592A5 (de) * 1982-10-26 1985-09-30 Balzers Hochvakuum Dampfquelle fuer vakuumbedampfungsanlagen.
JPS5992996A (ja) * 1982-11-16 1984-05-29 Nec Corp 分子線結晶成長用分子線源
JPS59152296A (ja) * 1983-02-17 1984-08-30 Agency Of Ind Science & Technol 分子線エピタキシヤル成長における分子線強度制御方法
JPS59156996A (ja) * 1983-02-23 1984-09-06 Koito Mfg Co Ltd 化合物結晶膜の製造方法とその装置
JPS605509A (ja) * 1983-06-24 1985-01-12 Hitachi Ltd 分子線エピタキシ装置
US4553022A (en) * 1984-06-04 1985-11-12 The Perkin-Elmer Corporation Effusion cell assembly
JPS6197190A (ja) * 1984-10-15 1986-05-15 Fujitsu Ltd 結晶成長装置

Also Published As

Publication number Publication date
EP0271351A2 (en) 1988-06-15
DE3786237T2 (de) 1993-09-23
KR930007853B1 (ko) 1993-08-20
EP0271351B1 (en) 1993-06-16
EP0271351A3 (en) 1989-07-26
DE3786237D1 (de) 1993-07-22
US4854264A (en) 1989-08-08

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Legal Events

Date Code Title Description
A201 Request for examination
G160 Decision to publish patent application
E701 Decision to grant or registration of patent right
NORF Unpaid initial registration fee