KR890004761A - 수소 정제 방법 - Google Patents

수소 정제 방법 Download PDF

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Publication number
KR890004761A
KR890004761A KR1019880011398A KR880011398A KR890004761A KR 890004761 A KR890004761 A KR 890004761A KR 1019880011398 A KR1019880011398 A KR 1019880011398A KR 880011398 A KR880011398 A KR 880011398A KR 890004761 A KR890004761 A KR 890004761A
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KR
South Korea
Prior art keywords
hydrogen
boron
phosphorus
activated carbon
aforementioned
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KR1019880011398A
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English (en)
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KR960014903B1 (ko
Inventor
홀 알렌 로버트
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필립 맥킨니 피펜저
에틸 코오포레이션
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Publication of KR890004761A publication Critical patent/KR890004761A/ko
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Publication of KR960014903B1 publication Critical patent/KR960014903B1/ko

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    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B3/00—Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it; Purification of hydrogen
    • C01B3/50—Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification
    • C01B3/56—Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification by contacting with solids; Regeneration of used solids
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00—Carbon; Compounds thereof
    • C01B32/30—Active carbon
    • C01B32/354—After-treatment
    • C01B32/36—Reactivation or regeneration
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C01B33/021—Preparation
    • C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
    • C01B33/029—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition of monosilane
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2203/00—Integrated processes for the production of hydrogen or synthesis gas
    • C01B2203/04—Integrated processes for the production of hydrogen or synthesis gas containing a purification step for the hydrogen or the synthesis gas
    • C01B2203/042—Purification by adsorption on solids
    • C01B2203/043—Regenerative adsorption process in two or more beds, one for adsorption, the other for regeneration
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2203/00—Integrated processes for the production of hydrogen or synthesis gas
    • C01B2203/04—Integrated processes for the production of hydrogen or synthesis gas containing a purification step for the hydrogen or the synthesis gas
    • C01B2203/0465—Composition of the impurity
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2203/00—Integrated processes for the production of hydrogen or synthesis gas
    • C01B2203/04—Integrated processes for the production of hydrogen or synthesis gas containing a purification step for the hydrogen or the synthesis gas
    • C01B2203/0465—Composition of the impurity
    • C01B2203/048—Composition of the impurity the impurity being an organic compound

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Silicon Compounds (AREA)
  • Hydrogen, Water And Hydrids (AREA)
  • Treating Waste Gases (AREA)
  • Separation Of Gases By Adsorption (AREA)

Abstract

내용 없음

Description

수소 정제 방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (10)

  1. 붕소-및/또는 인-함유 오염 물질을 함유하는 수소 기류에서 전술한 오염 물질의 양을 감소시키는 방법에 있어서 전술한 기류를 극저온에서 활성 탄소와 접촉시키고, 이에 의해 붕소-및/또는 인-함유 오염 물질을 전술한 기류에서 제거함을 특징으로 하는 수소 기류에서 붕소-및/또는 인-함유 오염 물질의 양을 감소시키는 방법.
  2. 제1항에 있어서, 전술한 온도가 -101℃∼-173℃의 범위내에 있음을 특징으로 하는 방법.
  3. 폴리실리콘을 제조하는 유동 베드 반응기로 재순환시키기 위한 수소의 품질 향상 방법에 있어서, 상기 반응기에서 나오는 배출 기체를 극저온(cryogenic temperature)에서 활성 탄소와 접촉 시키고, 이에 의해 붕소-및/또는 인-함유 불순물을 전술한 배출 기계에서 제거하여 품질 향상된 수소를 형성시키고 상기 품질 향상된 수소를 전술한 반응기로 재순환시킴을 특징으로 하는 수소의 품질 향상 방법.
  4. 실리콘의 화학적 증기 증착에 의하여 실란에서 실리콘을 제조하는 유동 배드 반응기에서 나오는 기체상 수소 배출 기체의 품질을 향상시키는 방법에 있어서, 전술한 수소 배출 기체를 극저온에서 활성 탄소와 접촉 시키고, 이에 의해 전술한 배출 수소 중의 붕소-및/또는 인-함유 오염 물질의 양을 감소시켜 품질 향상된 수소 생성물을 형성시키고, 붕소 및/또는 인 함량이 감소된 품질 향상된 수소 생성물을 실란용 담체로서 전술한 반응기로 재순환시킴을 특징으로 하는 기체상 수소 배출 기체의 품질 향상 방법.
  5. 제4항에 있어서, 전술한 온도가 -101℃∼-173℃임을 특징으로 하는 방법.
  6. 제4항에 있어서, 6.9∼344.8kPa의 압력에서 수행함을 특징으로 하는 방법.
  7. 제4항에 있어서, 전술한 수소 배출 기체를 활성 탄소로 처리하기 이전에 처리하여 실리콘 분말 또는 미분질 입자를 제거함을 특징으로 하는 방법.
  8. 제4항에 있어서, 전술한 활성 탄소가 300∼2500㎥/g 의 표시 면적을 가짐을 특징으로 하는 방법.
  9. 제4항에 있어서, 전술한 활성 탄소를 추가의 붕소-및/또는 인-함유 성분을 흡착하는 그의 능력이 감소된 후 재생함을 특징으로 하는 방법.
  10. 제9항에 있어서, 전술한 재생은 수소를 청정 기체로서 사용하여 175∼200℃의 온도에서 활성 탄소를 청정함으로써 수행됨을 특징으로 하는 방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019880011398A 1987-09-03 1988-09-03 수소 정제 방법 KR960014903B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US92,638 1987-09-03
US092,638 1987-09-03
US07/092,638 US4871524A (en) 1987-09-03 1987-09-03 Hydrogen purification process

Publications (2)

Publication Number Publication Date
KR890004761A true KR890004761A (ko) 1989-05-09
KR960014903B1 KR960014903B1 (ko) 1996-10-21

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019880011398A KR960014903B1 (ko) 1987-09-03 1988-09-03 수소 정제 방법

Country Status (6)

Country Link
US (1) US4871524A (ko)
EP (1) EP0305867B1 (ko)
JP (1) JP2641265B2 (ko)
KR (1) KR960014903B1 (ko)
CA (1) CA1289454C (ko)
DE (1) DE3863411D1 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6999696B2 (en) 1995-03-27 2006-02-14 Canon Kabushiki Kaisha Coupling part, photosensitive drum, process cartridge and electrophotographic image forming apparatus

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US20060105105A1 (en) * 2004-11-12 2006-05-18 Memc Electronic Materials, Inc. High purity granular silicon and method of manufacturing the same
DE102011078676A1 (de) 2011-07-05 2013-01-10 Wacker Chemie Ag Verfahren zur Produktion von Polysilicium
DE102014221928A1 (de) 2014-10-28 2016-04-28 Wacker Chemie Ag Wirbelschichtreaktor und Verfahren zur Herstellung von polykristallinem Siliciumgranulat

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6999696B2 (en) 1995-03-27 2006-02-14 Canon Kabushiki Kaisha Coupling part, photosensitive drum, process cartridge and electrophotographic image forming apparatus
US7092655B2 (en) 1995-03-27 2006-08-15 Canon Kabushiki Kaisha Coupling part, photosensitive drum, process cartridge and electrophotographic image forming apparatus

Also Published As

Publication number Publication date
KR960014903B1 (ko) 1996-10-21
EP0305867A3 (en) 1989-08-02
JP2641265B2 (ja) 1997-08-13
EP0305867B1 (en) 1991-06-26
US4871524A (en) 1989-10-03
DE3863411D1 (de) 1991-08-01
EP0305867A2 (en) 1989-03-08
CA1289454C (en) 1991-09-24
JPH01103901A (ja) 1989-04-21

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