KR850005855A - 경화성 조성물 - Google Patents

경화성 조성물 Download PDF

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KR850005855A
KR850005855A KR1019850000784A KR850000784A KR850005855A KR 850005855 A KR850005855 A KR 850005855A KR 1019850000784 A KR1019850000784 A KR 1019850000784A KR 850000784 A KR850000784 A KR 850000784A KR 850005855 A KR850005855 A KR 850005855A
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composition
polymerized
compound
composition according
hydroperoxide
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KR1019850000784A
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KR930005138B1 (ko
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마이어 외 1 쿠르트
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아르놀트 자일러, 에른스트 알테르
시바-가이기 아크티엔 게젤샤프트
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G85/00—General processes for preparing compounds provided for in this subclass
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Epoxy Resins (AREA)
  • Paints Or Removers (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

내용 없음

Description

경화성 조성물
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (20)

  1. 유리기 또는 양이온 중합반응엥 의해 중합될 수 있는 물질; 하나이상의 일반식(Ⅰ)의 철 화합물; 일반식(Ⅰ)의 화합물에 대한 하나이상의 감광제; 및 유리기 중합반응에 의해 중합될 수 있는 물질의 경우에는 그에 대한 산형제로서 하나 이상의 전자수용체로 이루어진 경화성 조성물.
    상기식에서
    a는 1 또는 2이고, q는 1,2 또는 3이며, L은 2가 내지 7가의 금속 또는 비금속이고 Q는 할로겐 원자이며, m은 L과 q값의 합에 상응하는 정수이고, R1은 비치환 또는 치환된 n6-벤젠이며, R2는 비치환 또는 치환된 사이클로펜타디에닐음이온이다.
  2. 제1항에 있어서, 전자수용체가 또한 양이온중합반응에 의해 중합될 수 있는 물질에 대한 산화제로서 존재하는 조성물.
  3. 제1항 또는 제2항에 있어서, 철화합물, 또는 철화합물 및 산화조가 중합성 물질을 기준으로 하여 0.1내지 15중량%의 양으로 존재하는 조성물.
  4. 제3항에 있어서, 철화합물대 산형제의 중량비가 1:10 내지 5:1인 조성물
  5. 제1항에 있어서, 감광제가 처ㅎ화합물을 기준으로 하여 0.1내지 10중량%의 양으로 존재하는 조성물.
  6. 제1항에 있어서, R1이 동일 또는 상이한 할로겐 원자, 또는 C1-C12-알킬, C2-C12-알케닐, C2-C12-알키닐, C1-C8-알콕시, 시아노C1-C8-알킬티오, C2-C6-모노카복실산 에스테르, 페닐 C2-C5-알카노일 또는 벤조일그룹에 의해 일치환 또는 다치환된 조성물.
  7. 제1항에 있어서, R2가 동일 또는 상이한 C1-C8-알킬, C2-C8-알케닐, C2-C8-알키닐, C2-C6-모노카복실산 에스테르, 시아노, C2-C5-알카노일 또는 벤조일그룹에 의해 일치환 또는 다치환된 조성물.
  8. 제1항에 있어서, 일반식(Ⅰ)의 a가 1인 조성물.
  9. 제1항에 있어서, 일반식(Ⅰ)의 m이 6이고, L이 B,P,B,As 또는 Sb이며, Q가 ㄹ이고, q가 1인 조성물.
  10. 제1항에 있어서, 일반식(Ⅰ)의 R1이 벤젠, 톨루엔, 크실렌, 큐멘, 메시틸렌, 클로로벤젠, 클로로톨루엔, 아니솔, 디메톡시벤젠, 비페닐, 도데실벤젠 또는 테트랄린인 조성물.
  11. 제1항에 있어서, 일반식(Ⅰ)의 R2가 사이클로펜타디에닐 또는 메틸사이클로펜타디에닐 음이온인 조성물.
  12. 제1항에 있어서, 산화제가 유기하이드로퍼옥사이드, 유기과산 또는 퀴논인 조성물.
  13. 제12항에 있어서, 산화제가 3급 부틸하이드로 퍼옥사이드, 큐멘 하이드로퍼옥사이드, 트리페닐 메틸 하이드로 퍼옥사이드, 테트랄린 하이드로퍼옥사이드, α-메틸테트랄린 하이드로퍼옥사이드, 데칼린 하이드로퍼옥사이드, 과벤조산, m-클로로과벤조산 또는 벤조퀴논인 조성물.
  14. 제1항에 있어서, 감광제가 모노사이클릭 또는 폴리아시클릭 방향족 또는 헤테로방향족 탄화수소, 페논, 특히 아세토페논 및 벤조페논, 벤질, 스틸벤, 폴리아세틸렌, 크산톤 및 티오크산톤, 안트라센, 프탈이미드, 특히 프탈이미드 티오에테르, 및 인접한 CO그룹들을 갖는 디온으로 이루어진 그룹중에서 선택되는 조성물.
  15. 제14항에 있어서, 감광제가 티오크산톤, 프탈이미드, 큐마린 및 특히 안드라센인 조성물.
  16. 제1항에 있어서, 양이온중합반응에 의해 중합될 수 있는 유기물질이 에폭시수지인 조성물.
  17. 제1항에 있어서, 유리기 중합반응에 의해 중합될 수 있는 물질이 모노에틸렌성 또는 폴리에틸렌성불포화 화합물인 조성물.
  18. 제17항에 있어서, 유리기 중합반응에 의해 중합될 수 있는 물질이 에폭시수지와 아크릴산, 메타크릴산, 또는 이들산의 혼합물과의 부분에스테르 또는 폴리올의 아크릴산 에스테르 또는 메타크릴산 에스테르인 조성물.
  19. 제1항에 따른 조성물의 층을 기질의 적어도 한쪽표면에 적응시킨 피복된 재료.
  20. 중합가능한 물질을, 하나 이상의 일반식(Ⅰ)의 철화합물, 일반식(Ⅰ)의 화합물에 대한 하나 이상의 감광제, 및 유리기 중합반응에 의해 중합될 수 있는 물질의 경우에는 그에 대한 산화제로서 하나 이상의 전자수용체로 이루어진 혼합물인 광개시제의 존재하에서 방사선 조사하에, 경우에 따라, 가열하면서 유리기 또는 양이온 중합시킴을 특징으로 하여, 중합성물질을 중합시키는 방법.
    상기식에서
    a는 1 또는 2이고, q는 1,2 또는 3이며, L은 2가 내지 7가의 금속 또는 비금속이고, Q는 할로겐원자이며, m은 L과 q값의 합에 상응하느 정수이고, R1은 비치환 또는 치환된 n6-벤젠이며, R2는 비치환 또는 치환된 사이클로펜타디에닐 음이온이다.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019850000784A 1984-02-10 1985-02-08 경화성 조성물 및 이를 중합시키는 방법 KR930005138B1 (ko)

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Application Number Priority Date Filing Date Title
CH632/84-4 1984-02-10
CH63284 1984-02-10
CH4286/84-9 1984-09-07
CH428684 1984-09-07

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KR850005855A true KR850005855A (ko) 1985-09-26
KR930005138B1 KR930005138B1 (ko) 1993-06-16

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US (2) US5371115A (ko)
EP (1) EP0152377B1 (ko)
KR (1) KR930005138B1 (ko)
AU (1) AU575908B2 (ko)
BR (1) BR8500577A (ko)
CA (1) CA1293835C (ko)
DE (1) DE3561155D1 (ko)
HK (1) HK16190A (ko)
SG (1) SG3790G (ko)

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Publication number Publication date
KR930005138B1 (ko) 1993-06-16
BR8500577A (pt) 1985-09-24
AU3855185A (en) 1985-08-15
EP0152377B1 (de) 1987-12-09
EP0152377A2 (de) 1985-08-21
AU575908B2 (en) 1988-08-11
DE3561155D1 (ko) 1988-01-21
US5371115A (en) 1994-12-06
US5494944A (en) 1996-02-27
HK16190A (en) 1990-03-09
CA1293835C (en) 1991-12-31
EP0152377A3 (en) 1985-11-21
SG3790G (en) 1990-07-06

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