BR8500577A - Processo para a polimerizacao de um material polimerizavel - Google Patents

Processo para a polimerizacao de um material polimerizavel

Info

Publication number
BR8500577A
BR8500577A BR8500577A BR8500577A BR8500577A BR 8500577 A BR8500577 A BR 8500577A BR 8500577 A BR8500577 A BR 8500577A BR 8500577 A BR8500577 A BR 8500577A BR 8500577 A BR8500577 A BR 8500577A
Authority
BR
Brazil
Prior art keywords
polymerization
polymerizable material
polymerizable
Prior art date
Application number
BR8500577A
Other languages
English (en)
Inventor
Kurt Dr Meier
Hans Dr Zweifel
Original Assignee
Ciba Geigy Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy Ag filed Critical Ciba Geigy Ag
Publication of BR8500577A publication Critical patent/BR8500577A/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G85/00—General processes for preparing compounds provided for in this subclass
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Epoxy Resins (AREA)
  • Paints Or Removers (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
BR8500577A 1984-02-10 1985-02-08 Processo para a polimerizacao de um material polimerizavel BR8500577A (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH63284 1984-02-10
CH428684 1984-09-07

Publications (1)

Publication Number Publication Date
BR8500577A true BR8500577A (pt) 1985-09-24

Family

ID=25685189

Family Applications (1)

Application Number Title Priority Date Filing Date
BR8500577A BR8500577A (pt) 1984-02-10 1985-02-08 Processo para a polimerizacao de um material polimerizavel

Country Status (9)

Country Link
US (2) US5371115A (pt)
EP (1) EP0152377B1 (pt)
KR (1) KR930005138B1 (pt)
AU (1) AU575908B2 (pt)
BR (1) BR8500577A (pt)
CA (1) CA1293835C (pt)
DE (1) DE3561155D1 (pt)
HK (1) HK16190A (pt)
SG (1) SG3790G (pt)

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4707432A (en) * 1985-09-23 1987-11-17 Ciba-Geigy Corporation Ferrocenium/alpha-cleavage photoinitiator systems for free radical polymerizable compositions
US4861806A (en) * 1986-09-19 1989-08-29 Ciba-Geigy Corporation Process for curing polyisocyanate coatings in the presence of a ferrocenium compound
AU8155887A (en) * 1986-10-14 1988-05-06 Loctite Corporation Visible light curable free radical compositions containing pi-arene metal complexes
DE3879278D1 (pt) * 1987-06-05 1993-04-22 Ciba-Geigy Ag, Basel, Ch
US4920182A (en) * 1987-12-18 1990-04-24 Ciba-Geigy Corporation Epoxy resin compositions containing polyester flexibilizer and metallocene complex initiator
US4985340A (en) * 1988-06-01 1991-01-15 Minnesota Mining And Manufacturing Company Energy curable compositions: two component curing agents
DE3918105A1 (de) * 1988-06-02 1989-12-14 Toyo Boseki Photopolymerisierbare zusammensetzung
DE3832032A1 (de) * 1988-09-21 1990-03-22 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
US4954414A (en) * 1988-11-08 1990-09-04 The Mead Corporation Photosensitive composition containing a transition metal coordination complex cation and a borate anion and photosensitive materials employing the same
JP2775880B2 (ja) * 1989-08-21 1998-07-16 ブラザー工業株式会社 転写記録媒体
US5059512A (en) * 1989-10-10 1991-10-22 International Business Machines Corporation Ultraviolet light sensitive photoinitiator compositions, use thereof and radiation sensitive compositions
US5514521A (en) * 1990-08-22 1996-05-07 Brother Kogyo Kabushiki Kaisha Photocurable composition
CA2048232A1 (en) * 1990-09-05 1992-03-06 Jerry W. Williams Energy curable pressure-sensitive compositions
JPH0662692B2 (ja) * 1991-10-30 1994-08-17 オーテックス株式会社 光重合反応開始剤
US5212210A (en) * 1992-03-18 1993-05-18 Minnesota Mining And Manufacturing Company Energy curable compositions having improved cure speeds
JP3141517B2 (ja) 1992-05-14 2001-03-05 ブラザー工業株式会社 光硬化型組成物
US5667893A (en) * 1992-10-09 1997-09-16 Minnesota Mining And Manufacturing Company Substrate coated or impregnated with flexible epoxy composition
US5494943A (en) * 1993-06-16 1996-02-27 Minnesota Mining And Manufacturing Company Stabilized cationically-curable compositions
US5453450A (en) * 1993-06-16 1995-09-26 Minnesota Mining And Manufacturing Company Stabilized curable adhesives
US5705116A (en) * 1994-06-27 1998-01-06 Sitzmann; Eugene Valentine Increasing the useful range of cationic photoinitiators in stereolithography
JP2000227665A (ja) 1998-11-02 2000-08-15 Kansai Paint Co Ltd パターン形成方法
JP2000137325A (ja) 1998-11-04 2000-05-16 Kansai Paint Co Ltd 有機溶剤型感光性レジスト組成物及びレジストパターン形成方法
JP2000171972A (ja) 1998-12-04 2000-06-23 Kansai Paint Co Ltd 液状感光性組成物、水系感光性組成物及びそれらの組成物を使用したパターン形成方法
US6214915B1 (en) 1998-12-10 2001-04-10 General Electric Company Stabilized thermoplastic compositions
US6482868B1 (en) 1998-12-31 2002-11-19 3M Innovative Properties Company Accelerators useful for energy polymerizable compositions
US6265459B1 (en) 1998-12-31 2001-07-24 3M Innovative Properties Company Accelerators useful for energy polymerizable compositions
US6133335A (en) * 1998-12-31 2000-10-17 3M Innovative Properties Company Photo-polymerizable compositions and articles made therefrom
KR100804873B1 (ko) 1999-06-10 2008-02-20 얼라이드시그날 인코퍼레이티드 포토리소그래피용 ｓｏｇ 반사방지 코팅
US6824879B2 (en) 1999-06-10 2004-11-30 Honeywell International Inc. Spin-on-glass anti-reflective coatings for photolithography
US6635689B1 (en) 2000-06-26 2003-10-21 3M Innovative Properties Company Accelerators for cationic polymerization catalyzed by iron-based catalysts
CN1606713B (zh) 2001-11-15 2011-07-06 霍尼韦尔国际公司 用于照相平版印刷术的旋涂抗反射涂料
US20050058911A1 (en) * 2003-09-17 2005-03-17 Konica Minolta Medical & Graphic, Inc. Holographic recording medium, holographic recording method and holographic information medium
US20080251195A1 (en) * 2007-04-10 2008-10-16 Abm Associates Llc Activated anaerobic adhesive and use thereof
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
EP3194502A4 (en) 2015-04-13 2018-05-16 Honeywell International Inc. Polysiloxane formulations and coatings for optoelectronic applications
JP6712188B2 (ja) * 2015-07-13 2020-06-17 信越化学工業株式会社 レジスト下層膜形成用組成物及びこれを用いたパターン形成方法

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2632753A (en) * 1950-02-23 1953-03-24 Libbey Owens Ford Glass Co Polyester compositions stabilized with p-benzoquinone
US4256828A (en) * 1975-09-02 1981-03-17 Minnesota Mining And Manufacturing Company Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials
US4069054A (en) * 1975-09-02 1978-01-17 Minnesota Mining And Manufacturing Company Photopolymerizable composition containing a sensitized aromatic sulfonium compound and a cationacally polymerizable monomer
US4318766A (en) * 1975-09-02 1982-03-09 Minnesota Mining And Manufacturing Company Process of using photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials
US4156035A (en) * 1978-05-09 1979-05-22 W. R. Grace & Co. Photocurable epoxy-acrylate compositions
CH640849A5 (de) * 1979-05-18 1984-01-31 Ciba Geigy Ag Thioxanthoncarbonsaeureester, -thioester und -amide.
US4250203A (en) * 1979-08-30 1981-02-10 American Can Company Cationically polymerizable compositions containing sulfonium salt photoinitiators and odor suppressants and method of polymerization using same
US4348530A (en) * 1980-02-05 1982-09-07 Ciba-Geigy Corporation Thioxanthonecarboxylic acids, esters, thioesters and amides with reactive functional groups
CH644362A5 (de) * 1980-05-06 1984-07-31 Ciba Geigy Ag 3,5-disubstituierte phthalsaeureimide.
US4459414A (en) * 1981-04-08 1984-07-10 Ciba-Geigy Corporation Tetrasubstituted phthalic acid derivatives, and a process for their preparation
GB2099825B (en) * 1981-06-04 1984-12-05 Ciba Geigy Ag Photopolymerisable mixtures and processes for the photopolymerisation of cationically polymerisable compounds
EP0094914B1 (de) * 1982-05-19 1986-09-24 Ciba-Geigy Ag Photopolymerisation mittels organometallischer Salze
EP0094915B1 (de) * 1982-05-19 1987-01-21 Ciba-Geigy Ag Härtbare, Metallocenkomplexe enthaltende Zusammensetzungen, daraus erhältliche aktivierte Vorstufen und deren Verwendung
US5089536A (en) * 1982-11-22 1992-02-18 Minnesota Mining And Manufacturing Company Energy polmerizable compositions containing organometallic initiators
US5073476A (en) * 1983-05-18 1991-12-17 Ciba-Geigy Corporation Curable composition and the use thereof
US4533446A (en) * 1983-07-20 1985-08-06 Loctite (Ireland) Ltd. Radiation-activatable anaerobic adhesive composition
ATE37242T1 (de) * 1984-02-10 1988-09-15 Ciba Geigy Ag Verfahren zur herstellung einer schutzschicht oder einer reliefabbildung.

Also Published As

Publication number Publication date
SG3790G (en) 1990-07-06
HK16190A (en) 1990-03-09
US5494944A (en) 1996-02-27
AU575908B2 (en) 1988-08-11
EP0152377A3 (en) 1985-11-21
CA1293835C (en) 1991-12-31
KR850005855A (ko) 1985-09-26
EP0152377A2 (de) 1985-08-21
US5371115A (en) 1994-12-06
KR930005138B1 (ko) 1993-06-16
EP0152377B1 (de) 1987-12-09
AU3855185A (en) 1985-08-15
DE3561155D1 (pt) 1988-01-21

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Legal Events

Date Code Title Description
MM Lapse due to non-payment of fees (art. 50)