KR840006191A - 분체(紛體)의 비수용액계전착법(非水容液系電着法) - Google Patents

분체(紛體)의 비수용액계전착법(非水容液系電着法) Download PDF

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Publication number
KR840006191A
KR840006191A KR1019830004306A KR830004306A KR840006191A KR 840006191 A KR840006191 A KR 840006191A KR 1019830004306 A KR1019830004306 A KR 1019830004306A KR 830004306 A KR830004306 A KR 830004306A KR 840006191 A KR840006191 A KR 840006191A
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KR
South Korea
Prior art keywords
powder
electrodeposition method
aqueous solution
electrodeposition
solution electrodeposition
Prior art date
Application number
KR1019830004306A
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English (en)
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KR900008254B1 (ko
Inventor
진 미즈구찌 (외 3)
Original Assignee
오오가 노리오
쏘니 가부시기 가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 오오가 노리오, 쏘니 가부시기 가이샤 filed Critical 오오가 노리오
Publication of KR840006191A publication Critical patent/KR840006191A/ko
Application granted granted Critical
Publication of KR900008254B1 publication Critical patent/KR900008254B1/ko

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/20—Manufacture of screens on or from which an image or pattern is formed, picked up, converted or stored; Applying coatings to the vessel
    • H01J9/22—Applying luminescent coatings
    • H01J9/221—Applying luminescent coatings in continuous layers
    • H01J9/225—Applying luminescent coatings in continuous layers by electrostatic or electrophoretic processes
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D13/00—Electrophoretic coating characterised by the process
    • C25D13/02—Electrophoretic coating characterised by the process with inorganic material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/04—Manufacture of electrodes or electrode systems of thermionic cathodes
    • H01J9/042—Manufacture, activation of the emissive part
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/12—Manufacture of electrodes or electrode systems of photo-emissive cathodes; of secondary-emission electrodes

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
  • Luminescent Compositions (AREA)
  • Optical Filters (AREA)
  • Paints Or Removers (AREA)
  • Cathode-Ray Tubes And Fluorescent Screens For Display (AREA)

Abstract

내용 없음

Description

분체(粉體)의 비수용액계전착법(非水容液系電着法)
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본원 발명에 의한 전착법을 실시하는 장치의 구성도.
제2도는 본원 발명에 의한 전착법을 컬러형광면의 작성에 적용할 경우에 전극패턴도.
제3도는 본원 발명에 의한 전착법의 전해액에 있어서의 황산의 첨가량과 전기전도도 및 PH와의 관계를 도시한 곡선도.
제4도는 역시 황산의 첨가량과 전착량과의 관계를 도시한 곡선도.
* 도면의 주요부분에 대한 부호의 설명
1 : 전착조 2 : 전해액
3 : 피전착체 6 : 대향전극

Claims (2)

  1. 케톤계용매에 니트로셀룰로우스를 용해하여, 분체를 혼입한 전해액에 의해서 전착이 이루어지는 분체의 비수용계 전착법에 있어서, 상기 전착액에 강산 및 강알칼리를 첨가하여 PH 1-7, 1-30μΩ/cm의 전기전도도로 한 전해액에 의해서 상기 분체의 전착을 하는 것을 특징으로 하는 분체의 비수용액계전착법.
  2. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019830004306A 1982-09-14 1983-09-13 분체(紛體)의 비수용액계전착법 KR900008254B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP160252 1982-09-14
JP57-160252 1982-09-14
JP57160252A JPS6010120B2 (ja) 1982-09-14 1982-09-14 粉体の非水溶液系電着法

Publications (2)

Publication Number Publication Date
KR840006191A true KR840006191A (ko) 1984-11-22
KR900008254B1 KR900008254B1 (ko) 1990-11-06

Family

ID=15710979

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019830004306A KR900008254B1 (ko) 1982-09-14 1983-09-13 분체(紛體)의 비수용액계전착법

Country Status (8)

Country Link
US (1) US4482447A (ko)
JP (1) JPS6010120B2 (ko)
KR (1) KR900008254B1 (ko)
AU (1) AU568089B2 (ko)
CA (1) CA1195809A (ko)
DE (1) DE3333251A1 (ko)
FR (1) FR2532957B1 (ko)
GB (1) GB2127850B (ko)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0113999B1 (en) * 1982-12-22 1987-09-09 Nec Corporation Method of producing electrostrictive effect element
JPS60105769A (ja) * 1983-11-15 1985-06-11 松下電工株式会社 テレビジヨン付浴室
JPS6219518U (ko) * 1985-07-18 1987-02-05
JPH0230797A (ja) * 1988-07-21 1990-02-01 Mitsubishi Metal Corp 電気泳動法による厚膜の製造方法
US5536193A (en) * 1991-11-07 1996-07-16 Microelectronics And Computer Technology Corporation Method of making wide band gap field emitter
DE69214780T2 (de) * 1991-12-11 1997-05-15 Agfa Gevaert Nv Methode zur Herstellung eines radiographischen Schirmes
EP0546603B1 (en) * 1991-12-11 1996-10-23 Agfa-Gevaert N.V. Method for the production of a radiographic screen
US5686791A (en) * 1992-03-16 1997-11-11 Microelectronics And Computer Technology Corp. Amorphic diamond film flat field emission cathode
US5449970A (en) * 1992-03-16 1995-09-12 Microelectronics And Computer Technology Corporation Diode structure flat panel display
US5675216A (en) * 1992-03-16 1997-10-07 Microelectronics And Computer Technololgy Corp. Amorphic diamond film flat field emission cathode
US5763997A (en) * 1992-03-16 1998-06-09 Si Diamond Technology, Inc. Field emission display device
US6127773A (en) * 1992-03-16 2000-10-03 Si Diamond Technology, Inc. Amorphic diamond film flat field emission cathode
US5543684A (en) 1992-03-16 1996-08-06 Microelectronics And Computer Technology Corporation Flat panel display based on diamond thin films
US5679043A (en) * 1992-03-16 1997-10-21 Microelectronics And Computer Technology Corporation Method of making a field emitter
US5279511A (en) * 1992-10-21 1994-01-18 Copytele, Inc. Method of filling an electrophoretic display
WO1995012835A1 (en) * 1993-11-04 1995-05-11 Microelectronics And Computer Technology Corporation Methods for fabricating flat panel display systems and components
US5531880A (en) * 1994-09-13 1996-07-02 Microelectronics And Computer Technology Corporation Method for producing thin, uniform powder phosphor for display screens
FR2726581B1 (fr) 1994-11-08 1996-12-06 Commissariat Energie Atomique Suspension pour le depot de materiaux luminescents par electrophorese, notamment pour la realisation d'ecrans plats
US6942901B1 (en) * 1999-01-07 2005-09-13 The Penn State Research Foundation Fabrication of particulate tapes by electrophoretic deposition
CA2308092C (en) 2000-05-10 2008-10-21 Partho Sarkar Production of hollow ceramic membranes by electrophoretic deposition
WO2002001649A1 (en) * 2000-06-29 2002-01-03 Koninklijke Philips Electronics N.V. Optoelectric element
US6642652B2 (en) 2001-06-11 2003-11-04 Lumileds Lighting U.S., Llc Phosphor-converted light emitting device
US6576488B2 (en) * 2001-06-11 2003-06-10 Lumileds Lighting U.S., Llc Using electrophoresis to produce a conformally coated phosphor-converted light emitting semiconductor
US6864110B2 (en) * 2002-10-22 2005-03-08 Agilent Technologies, Inc. Electrophoretic processes for the selective deposition of materials on a semiconducting device
US8409906B2 (en) 2010-10-25 2013-04-02 Imra America, Inc. Non-vacuum method for fabrication of a photovoltaic absorber layer
US8748216B2 (en) 2010-10-25 2014-06-10 Imra America, Inc. Non-vacuum method for fabrication of a photovoltaic absorber layer
US9062847B2 (en) 2011-04-13 2015-06-23 Osram Gmbh Method for manufacturing a phospor device and lighting apparatus comprising such phosphor device

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB530635A (en) * 1939-06-16 1940-12-17 Trier Bros Ltd Improvements in or relating to the application of coatings of graphite to surfaces
US3070441A (en) * 1958-02-27 1962-12-25 Rca Corp Art of manufacturing cathode-ray tubes of the focus-mask variety
US3163592A (en) * 1960-09-01 1964-12-29 Sylvania Electric Prod Process for electrophoretically applying a coating of phosphor
US3551306A (en) * 1969-01-21 1970-12-29 Columbia Broadcasting Syst Inc Process for coating a metal
US3928785A (en) * 1971-11-23 1975-12-23 Adrian W Standaart Single gun, multi-screen, multi-beam, multi-color cathode ray tube
JPS5927983B2 (ja) * 1979-06-13 1984-07-10 松下電器産業株式会社 磁気テ−プ装置

Also Published As

Publication number Publication date
FR2532957B1 (fr) 1987-05-22
GB2127850A (en) 1984-04-18
KR900008254B1 (ko) 1990-11-06
JPS5950200A (ja) 1984-03-23
GB2127850B (en) 1985-09-11
CA1195809A (en) 1985-10-29
DE3333251A1 (de) 1984-03-22
FR2532957A1 (fr) 1984-03-16
AU568089B2 (en) 1987-12-17
JPS6010120B2 (ja) 1985-03-15
GB8324630D0 (en) 1983-10-19
US4482447A (en) 1984-11-13
AU1903983A (en) 1984-03-22

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