KR840003364A - 감광성 수지 조성물(感光性樹脂組成物) - Google Patents

감광성 수지 조성물(感光性樹脂組成物) Download PDF

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Publication number
KR840003364A
KR840003364A KR1019830000225A KR830000225A KR840003364A KR 840003364 A KR840003364 A KR 840003364A KR 1019830000225 A KR1019830000225 A KR 1019830000225A KR 830000225 A KR830000225 A KR 830000225A KR 840003364 A KR840003364 A KR 840003364A
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KR
South Korea
Prior art keywords
compound
resin composition
amide
photosensitive resin
amino group
Prior art date
Application number
KR1019830000225A
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English (en)
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KR910008750B1 (ko
Inventor
페이 마사루 난 (외 3)
Original Assignee
우노 오사무
도오요오 보오세끼 가부시끼 가이샤
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Publication of KR840003364A publication Critical patent/KR840003364A/ko
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Publication of KR910008750B1 publication Critical patent/KR910008750B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/107—Polyamide or polyurethane

Abstract

내용 없음

Description

감광성 수지조성물(感光性樹脂組成物)
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (7)

  1. 가용성 합성선상(線狀)고분자화합물, 광중합 가능한 불포화결합을 가진 단량체, 광중합개시제를 기본성분으로 하는 감광성수지 조성물에 있어서, 가용성합성 선상 고분자화합물의 일부 또는 전부가, 양말단이 실질적으로 제1급 및/또는 제2급 아미노기이며, 또한 아미드 결합을 1개 이상 가진 아미드화합물과, 디이소시아네이트 화합물과의 부가중합물인 것을 특징으로 하는 감광성수지조성물.
  2. 제1항에 있어서, 가용성합성선상 고분자화합물이 전조성물에 대하여 25내지 95중량% 함유되는 것을 특징으로 하는 감광성수지조성물.
  3. 제1항 또는 제2항에 있어서, 가용성합성선상 고분자화합물중에 디이소시아네이트 화합물과 반응할 수 있는 양말단이 실질적으로 제1급 및/또는 제2급 아미노기이며, 또한 아미드 결합을 1개이상 가진 아미드 화합물이 5중량% 이상 함유되는 것을 특징으로 하는 감광성수지조성물.
  4. 제1항 또는 제3항에 있어서, 양말단이 실질적으로 제1급 및/ 또는 제2급 아미노기이며, 또한 아미드결합을 1개 이상가진 아미드 화합물의 평균분자량이 300내지 20,000인 것을 특징으로 하는 감광성수지조성물.
  5. 제1항 또는 제4항중 어느 하나에 있어서, 양말단이 실질적으로 제1급 및/또는 제2급 아미노기이며 또한 아미드 결합을 1개 이상 가진 아미드화합물이 주쇄 (主鎖)및/또는 측쇄(側鎖)에 염기성 제3급 질소원자 및/또는 제4급 암모늄염을 가지고 있는 것을 특징으로 하는 감광성수지조성물.
  6. 제1항에 있어서, 디이소시아네이트 화합물이 글리콜과 디이소시아네이트 화합물과의 반응에 의해서 얻어지는 실질적으로 양말단이 이소시아네이트기인 것을 특징으로 하는 감광성수지조성물.
  7. 제1항 또는 제6항중 어느하나에 있어서, 양말단이 실질적으로 제1급 및/또는 제2급 아미노기이며 또한 아미드 결합을 1개 이상가진 아미드화합물과, 디이소시아네이트 화합물과의 반응비율(중량비)이 97:3 내지 3:97인 것을 특징으로 하는 감광성수지조성물.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019830000225A 1982-02-15 1983-01-21 감광성 수지조성물(感光性樹脂組成物) KR910008750B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP57-23266 1982-02-15
JP57023266A JPS58140737A (ja) 1982-02-15 1982-02-15 感光性樹脂組成物
JP23266 1988-02-02

Publications (2)

Publication Number Publication Date
KR840003364A true KR840003364A (ko) 1984-08-20
KR910008750B1 KR910008750B1 (ko) 1991-10-19

Family

ID=12105793

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019830000225A KR910008750B1 (ko) 1982-02-15 1983-01-21 감광성 수지조성물(感光性樹脂組成物)

Country Status (5)

Country Link
US (1) US4544624A (ko)
EP (1) EP0086653B1 (ko)
JP (1) JPS58140737A (ko)
KR (1) KR910008750B1 (ko)
DE (1) DE3369741D1 (ko)

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JP2507348B2 (ja) * 1986-09-18 1996-06-12 東レ株式会社 水なし平版印刷版
JP2507347B2 (ja) * 1986-09-18 1996-06-12 東レ株式会社 水なし平版印刷版
JP2622113B2 (ja) * 1986-12-02 1997-06-18 キヤノン 株式会社 転写記録媒体及び画像記録方法
JPH01182845A (ja) * 1988-01-13 1989-07-20 Toyobo Co Ltd 感光性樹脂組成物
EP0348063B1 (en) * 1988-06-10 1993-05-26 Asahi Kasei Kogyo Kabushiki Kaisha Thermoplastic elastomer and photosensitive resin composition based thereon, and printing plate precursor comprising the composition
DE3927628A1 (de) * 1989-08-22 1991-02-28 Basf Ag Strahlungsempfindliches gemisch
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JP4247725B1 (ja) 2008-07-16 2009-04-02 東洋紡績株式会社 感光性凸版印刷原版
EP3072914B1 (en) * 2013-11-22 2018-05-16 Mitsubishi Gas Chemical Company, Inc. Polyfunctional urethane (meth)acrylate and curable resin composition containing same
KR20160112495A (ko) * 2015-03-19 2016-09-28 한국과학기술연구원 잉크젯 헤드와 분말 상자―기반 ３ｄ 프린팅용 잉크 조성물
JP7229332B2 (ja) 2019-02-27 2023-02-27 旭化成株式会社 フレキソ印刷原版及びフレキソ印刷版の製造方法
CN110471256B (zh) * 2019-08-29 2023-05-12 杭州福斯特电子材料有限公司 一种感光性树脂组合物
CN117099048A (zh) 2021-03-30 2023-11-21 旭化成株式会社 柔性印刷原版和柔性印刷版的制造方法

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Also Published As

Publication number Publication date
JPH0352619B2 (ko) 1991-08-12
EP0086653A3 (en) 1983-11-30
EP0086653B1 (en) 1987-02-04
EP0086653A2 (en) 1983-08-24
JPS58140737A (ja) 1983-08-20
KR910008750B1 (ko) 1991-10-19
US4544624A (en) 1985-10-01
DE3369741D1 (en) 1987-03-12

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