DE3369741D1 - Photosensitive resin composition - Google Patents

Photosensitive resin composition

Info

Publication number
DE3369741D1
DE3369741D1 DE8383300728T DE3369741T DE3369741D1 DE 3369741 D1 DE3369741 D1 DE 3369741D1 DE 8383300728 T DE8383300728 T DE 8383300728T DE 3369741 T DE3369741 T DE 3369741T DE 3369741 D1 DE3369741 D1 DE 3369741D1
Authority
DE
Germany
Prior art keywords
resin composition
photosensitive resin
photosensitive
composition
resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8383300728T
Other languages
English (en)
Inventor
Masaru Nanpei
Akira Tomita
Toshiaki Fujimura
Kuniomi Etoh
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyobo Co Ltd
Original Assignee
Toyobo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyobo Co Ltd filed Critical Toyobo Co Ltd
Application granted granted Critical
Publication of DE3369741D1 publication Critical patent/DE3369741D1/de
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/107—Polyamide or polyurethane

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Medicinal Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Materials For Photolithography (AREA)
DE8383300728T 1982-02-15 1983-02-14 Photosensitive resin composition Expired DE3369741D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57023266A JPS58140737A (ja) 1982-02-15 1982-02-15 感光性樹脂組成物

Publications (1)

Publication Number Publication Date
DE3369741D1 true DE3369741D1 (en) 1987-03-12

Family

ID=12105793

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8383300728T Expired DE3369741D1 (en) 1982-02-15 1983-02-14 Photosensitive resin composition

Country Status (5)

Country Link
US (1) US4544624A (de)
EP (1) EP0086653B1 (de)
JP (1) JPS58140737A (de)
KR (1) KR910008750B1 (de)
DE (1) DE3369741D1 (de)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2507347B2 (ja) * 1986-09-18 1996-06-12 東レ株式会社 水なし平版印刷版
JP2507348B2 (ja) * 1986-09-18 1996-06-12 東レ株式会社 水なし平版印刷版
JP2622113B2 (ja) * 1986-12-02 1997-06-18 キヤノン 株式会社 転写記録媒体及び画像記録方法
JPH01182845A (ja) * 1988-01-13 1989-07-20 Toyobo Co Ltd 感光性樹脂組成物
DE68906723T2 (de) * 1988-06-10 1994-01-20 Asahi Chemical Ind Thermoplastisches Elastomer und darauf basierende lichtempfindliche Harzzusammensetzung und Druckplattenvorläufer, der die Zusammensetzung enthält.
DE3927628A1 (de) * 1989-08-22 1991-02-28 Basf Ag Strahlungsempfindliches gemisch
DE69130496T2 (de) * 1990-08-09 1999-06-10 Toyo Boseki K.K., Osaka Lichtempfindliche Harzzusammensetzung
US5204223A (en) * 1990-08-09 1993-04-20 Toyo Boseki Kabushiki Kaisha Photosensitive resin composition
JP3362797B2 (ja) 1993-04-30 2003-01-07 東洋紡績株式会社 印刷原版用感光性樹脂積層体
US6455132B1 (en) 1999-02-04 2002-09-24 Kodak Polychrome Graphics Llc Lithographic printing printable media and process for the production thereof
US6500877B1 (en) 1999-11-05 2002-12-31 Krohn Industries, Inc. UV curable paint compositions and method of making and applying same
JP4860525B2 (ja) * 2007-03-27 2012-01-25 富士フイルム株式会社 硬化性組成物及び平版印刷版原版
EP2229418A1 (de) * 2008-01-10 2010-09-22 DSM IP Assets B.V. Zusammensetzung mit einem polymer und einem oxidationskatalysator
JP4247725B1 (ja) 2008-07-16 2009-04-02 東洋紡績株式会社 感光性凸版印刷原版
EP3072914B1 (de) * 2013-11-22 2018-05-16 Mitsubishi Gas Chemical Company, Inc. Polyfunktionelles urethan(meth)acrylat und härtbare harzzusammensetzung damit
KR20160112495A (ko) * 2015-03-19 2016-09-28 한국과학기술연구원 잉크젯 헤드와 분말 상자―기반 ３ｄ 프린팅용 잉크 조성물
JP7229332B2 (ja) 2019-02-27 2023-02-27 旭化成株式会社 フレキソ印刷原版及びフレキソ印刷版の製造方法
CN110471256B (zh) * 2019-08-29 2023-05-12 杭州福斯特电子材料有限公司 一种感光性树脂组合物
JPWO2022210577A1 (de) 2021-03-30 2022-10-06

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3632536A (en) * 1967-08-24 1972-01-04 Matsushita Electric Works Ltd Block copolymers prepared by reacting prepolymers containing terminal isocyanate groups with aromatic oligamides
US3924023A (en) * 1973-04-03 1975-12-02 Gaf Corp Floor tile production and products
AU477002B2 (en) * 1972-12-14 1976-10-14 Polychrome Corporation Monometric reaction products of organic dii-socyanates
DE2361041C3 (de) * 1973-12-07 1980-08-14 Hoechst Ag, 6000 Frankfurt Photopolymerisierbares Gemisch
GB1495746A (en) * 1974-07-05 1977-12-21 Ciba Geigy Ag Polymerisation of unsaturated amides
FR2389924A2 (de) * 1977-05-04 1978-12-01 Hercules Inc
US4216267A (en) * 1977-12-29 1980-08-05 Gaf Corporation Flexible substrates containing a radiation curable coating composition
US4186069A (en) * 1978-01-30 1980-01-29 Richardson Graphics Company Photopolymerizable latex systems
DE2822190A1 (de) * 1978-05-20 1979-11-22 Hoechst Ag Photopolymerisierbares gemisch
US4234399A (en) * 1978-10-13 1980-11-18 Lord Corporation Radiation curable compositions containing acyloin urethane compounds
DE3014579A1 (de) * 1980-04-16 1981-10-22 Basf Ag, 6700 Ludwigshafen Photopolymerisierbare mischung mit einem copolyamid, monomeren und photoinitiator
DE3047126A1 (de) * 1980-12-13 1982-07-29 Basf Ag, 6700 Ludwigshafen Photopolymerisierbares aufzeichnungsmaterial und verfahren zur herstellung von reliefformen mittels dieses aufzeichnungsmaterials

Also Published As

Publication number Publication date
JPH0352619B2 (de) 1991-08-12
KR910008750B1 (ko) 1991-10-19
JPS58140737A (ja) 1983-08-20
EP0086653A2 (de) 1983-08-24
KR840003364A (ko) 1984-08-20
EP0086653A3 (en) 1983-11-30
EP0086653B1 (de) 1987-02-04
US4544624A (en) 1985-10-01

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition