KR20250145009A - 투명 열선 반사막, 투명 열선 반사막의 제조 방법 - Google Patents

투명 열선 반사막, 투명 열선 반사막의 제조 방법

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Publication number
KR20250145009A
KR20250145009A KR1020257026136A KR20257026136A KR20250145009A KR 20250145009 A KR20250145009 A KR 20250145009A KR 1020257026136 A KR1020257026136 A KR 1020257026136A KR 20257026136 A KR20257026136 A KR 20257026136A KR 20250145009 A KR20250145009 A KR 20250145009A
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KR
South Korea
Prior art keywords
film
transparent heat
ray reflective
reflective film
ray
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020257026136A
Other languages
English (en)
Korean (ko)
Inventor
겐지 아다치
히데하루 오카미
Original Assignee
스미토모 긴조쿠 고잔 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication of KR20250145009A publication Critical patent/KR20250145009A/ko
Pending legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/083—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G41/00—Compounds of tungsten
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/70—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
    • C01P2002/72—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by d-values or two theta-values, e.g. as X-ray diagram
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/70—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
    • C01P2002/74—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by peak-intensities or a ratio thereof only
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/80—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70
    • C01P2002/85—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70 by XPS, EDX or EDAX data
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/40—Electric properties
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/60—Optical properties, e.g. expressed in CIELAB-values
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/80—Compositional purity
    • C01P2006/82—Compositional purity water content

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)
KR1020257026136A 2023-02-07 2024-02-05 투명 열선 반사막, 투명 열선 반사막의 제조 방법 Pending KR20250145009A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2023016778 2023-02-07
JPJP-P-2023-016778 2023-02-07
PCT/JP2024/003774 WO2024166882A1 (ja) 2023-02-07 2024-02-05 透明熱線反射膜、透明熱線反射膜の製造方法

Publications (1)

Publication Number Publication Date
KR20250145009A true KR20250145009A (ko) 2025-10-13

Family

ID=92262670

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020257026136A Pending KR20250145009A (ko) 2023-02-07 2024-02-05 투명 열선 반사막, 투명 열선 반사막의 제조 방법

Country Status (6)

Country Link
EP (1) EP4663808A1 (https=)
JP (1) JPWO2024166882A1 (https=)
KR (1) KR20250145009A (https=)
CN (1) CN120615137A (https=)
TW (1) TW202436907A (https=)
WO (1) WO2024166882A1 (https=)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6241740A (ja) 1985-08-19 1987-02-23 Nippon Sheet Glass Co Ltd 熱線反射ガラスの製造方法
WO2005037932A1 (ja) 2003-10-20 2005-04-28 Sumitomo Metal Mining Co., Ltd. 赤外線遮蔽材料微粒子分散体、赤外線遮蔽体、及び赤外線遮蔽材料微粒子の製造方法、並びに赤外線遮蔽材料微粒子
WO2005087680A1 (ja) 2004-03-16 2005-09-22 Sumitomo Metal Mining Co., Ltd. 日射遮蔽用合わせ構造体
JP2006117482A (ja) 2004-10-22 2006-05-11 Nippon Sheet Glass Co Ltd 熱線遮蔽ガラス及び熱線遮蔽複層ガラス

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011037255A (ja) * 2009-07-15 2011-02-24 Kiyoshi Chiba 積層体
JP2018118463A (ja) * 2017-01-26 2018-08-02 住友金属鉱山株式会社 熱線遮蔽透明樹脂積層体
JP7484378B2 (ja) * 2019-05-07 2024-05-16 住友金属鉱山株式会社 赤外線反射膜分散体、赤外線反射膜分散体の製造方法
JPWO2022202640A1 (https=) * 2021-03-22 2022-09-29
US20230027020A1 (en) 2021-07-21 2023-01-26 Beijing Funate Innovation Technology Co., Ltd. Physiotherapy sheet and method for using the same

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6241740A (ja) 1985-08-19 1987-02-23 Nippon Sheet Glass Co Ltd 熱線反射ガラスの製造方法
WO2005037932A1 (ja) 2003-10-20 2005-04-28 Sumitomo Metal Mining Co., Ltd. 赤外線遮蔽材料微粒子分散体、赤外線遮蔽体、及び赤外線遮蔽材料微粒子の製造方法、並びに赤外線遮蔽材料微粒子
WO2005087680A1 (ja) 2004-03-16 2005-09-22 Sumitomo Metal Mining Co., Ltd. 日射遮蔽用合わせ構造体
JP2006117482A (ja) 2004-10-22 2006-05-11 Nippon Sheet Glass Co Ltd 熱線遮蔽ガラス及び熱線遮蔽複層ガラス

Non-Patent Citations (5)

* Cited by examiner, † Cited by third party
Title
Hiroshi ITO, Keisuke TANAKA, Yuji YAMAMOTO, Yasuo HASHIMOTO, Hiroshi KURIHARA '고성능 열선 반사 유리의 텔레비전 전파 반사 특성의 개선' 텔레비전 학회 기술 보고 제15권 15-21항(1991)
Keiichi Sato, Isao Ando, Satoshi Yoshio, and Kenji Adachi, "Cesium polytungstate in sputtered solar control films. I. Microstructure and optical properties," Journal of Applied Physics, Vol.130, 113102 (2021)
Naomi Suzuki, Kayo Yabuki, Nobumitsu Oshimura, Satoshi Yoshio, Kenji Adachi,"X-ray photoelectron spectroscopic study of reduced alkali tungsten oxides with localized and delocalized electrons," Journal of Physical Chemistry C, Vol.126, 15436-15445 (2022)
Satoshi Yoshio, Mika Okada, and Kenji Adachi, "Destabilization of Pseudo Jahn-Teller Distortion in Cesium-doped Hexagonal Tungsten Bronzes," Journal of Applied Physics, Vol.124, 063109 (2018).
Shuhei Nakakura, Aditya Farhan Arif, Keisuke Machida, Kenji Adachi, and Takashi Ogi, "Cationic defect engineering for controlling the infrared absorption of hexagonal cesium tungsten bronze nanoparticles," Inorganic Chemistry, Vol. 58, 9101-9107 (2019)

Also Published As

Publication number Publication date
TW202436907A (zh) 2024-09-16
JPWO2024166882A1 (https=) 2024-08-15
WO2024166882A1 (ja) 2024-08-15
CN120615137A (zh) 2025-09-09
EP4663808A1 (en) 2025-12-17

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