KR20250075657A - 정압 기체 베어링 장치 - Google Patents

정압 기체 베어링 장치 Download PDF

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Publication number
KR20250075657A
KR20250075657A KR1020257013359A KR20257013359A KR20250075657A KR 20250075657 A KR20250075657 A KR 20250075657A KR 1020257013359 A KR1020257013359 A KR 1020257013359A KR 20257013359 A KR20257013359 A KR 20257013359A KR 20250075657 A KR20250075657 A KR 20250075657A
Authority
KR
South Korea
Prior art keywords
groove
porous body
bearing device
static pressure
pressure gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020257013359A
Other languages
English (en)
Korean (ko)
Inventor
코지 아카시
Original Assignee
교세라 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 교세라 가부시키가이샤 filed Critical 교세라 가부시키가이샤
Publication of KR20250075657A publication Critical patent/KR20250075657A/ko
Pending legal-status Critical Current

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C32/00—Bearings not otherwise provided for
    • F16C32/06—Bearings not otherwise provided for with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings
    • F16C32/0603—Bearings not otherwise provided for with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings supported by a gas cushion, e.g. an air cushion
    • F16C32/0614—Bearings not otherwise provided for with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings supported by a gas cushion, e.g. an air cushion the gas being supplied under pressure, e.g. aerostatic bearings
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C32/00—Bearings not otherwise provided for
    • F16C32/06—Bearings not otherwise provided for with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • H01L21/027—
    • H01L21/683—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Magnetic Bearings And Hydrostatic Bearings (AREA)
KR1020257013359A 2022-10-26 2023-10-24 정압 기체 베어링 장치 Pending KR20250075657A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2022171335 2022-10-26
JPJP-P-2022-171335 2022-10-26
PCT/JP2023/038377 WO2024090442A1 (ja) 2022-10-26 2023-10-24 静圧気体軸受装置

Publications (1)

Publication Number Publication Date
KR20250075657A true KR20250075657A (ko) 2025-05-28

Family

ID=90830837

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020257013359A Pending KR20250075657A (ko) 2022-10-26 2023-10-24 정압 기체 베어링 장치

Country Status (3)

Country Link
JP (1) JPWO2024090442A1 (https=)
KR (1) KR20250075657A (https=)
WO (1) WO2024090442A1 (https=)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0510330A (ja) 1991-06-29 1993-01-19 Canon Inc 静圧軸受装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3106474B2 (ja) * 1990-02-21 2000-11-06 日本精工株式会社 静圧気体軸受
JP2003232352A (ja) * 2002-02-06 2003-08-22 Nikon Corp エアパッド、このエアパッドを用いたステージ装置及びこのステージ装置を備える露光装置
JP4992986B2 (ja) * 2010-01-22 2012-08-08 新東工業株式会社 静圧軸受装置および静圧軸受装置を備えたステージ
CN110848258A (zh) * 2019-12-16 2020-02-28 江苏集萃精凯高端装备技术有限公司 一种气体静压气浮垫及气浮导轨

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0510330A (ja) 1991-06-29 1993-01-19 Canon Inc 静圧軸受装置

Also Published As

Publication number Publication date
WO2024090442A1 (ja) 2024-05-02
JPWO2024090442A1 (https=) 2024-05-02

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Legal Events

Date Code Title Description
P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

P22-X000 Classification modified

St.27 status event code: A-2-2-P10-P22-nap-X000