JPWO2024090442A1 - - Google Patents
Info
- Publication number
- JPWO2024090442A1 JPWO2024090442A1 JP2024553086A JP2024553086A JPWO2024090442A1 JP WO2024090442 A1 JPWO2024090442 A1 JP WO2024090442A1 JP 2024553086 A JP2024553086 A JP 2024553086A JP 2024553086 A JP2024553086 A JP 2024553086A JP WO2024090442 A1 JPWO2024090442 A1 JP WO2024090442A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
- F16C32/00—Bearings not otherwise provided for
- F16C32/06—Bearings not otherwise provided for with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings
- F16C32/0603—Bearings not otherwise provided for with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings supported by a gas cushion, e.g. an air cushion
- F16C32/0614—Bearings not otherwise provided for with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings supported by a gas cushion, e.g. an air cushion the gas being supplied under pressure, e.g. aerostatic bearings
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
- F16C32/00—Bearings not otherwise provided for
- F16C32/06—Bearings not otherwise provided for with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
Landscapes
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Magnetic Bearings And Hydrostatic Bearings (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022171335 | 2022-10-26 | ||
| PCT/JP2023/038377 WO2024090442A1 (ja) | 2022-10-26 | 2023-10-24 | 静圧気体軸受装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2024090442A1 true JPWO2024090442A1 (https=) | 2024-05-02 |
| JPWO2024090442A5 JPWO2024090442A5 (https=) | 2025-07-22 |
Family
ID=90830837
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024553086A Pending JPWO2024090442A1 (https=) | 2022-10-26 | 2023-10-24 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPWO2024090442A1 (https=) |
| KR (1) | KR20250075657A (https=) |
| WO (1) | WO2024090442A1 (https=) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03244827A (ja) * | 1990-02-21 | 1991-10-31 | Nippon Seiko Kk | 静圧気体軸受 |
| JP2003232352A (ja) * | 2002-02-06 | 2003-08-22 | Nikon Corp | エアパッド、このエアパッドを用いたステージ装置及びこのステージ装置を備える露光装置 |
| JP2011149500A (ja) * | 2010-01-22 | 2011-08-04 | Sintokogio Ltd | 静圧軸受装置および静圧軸受装置を備えたステージ |
| CN110848258A (zh) * | 2019-12-16 | 2020-02-28 | 江苏集萃精凯高端装备技术有限公司 | 一种气体静压气浮垫及气浮导轨 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0510330A (ja) | 1991-06-29 | 1993-01-19 | Canon Inc | 静圧軸受装置 |
-
2023
- 2023-10-24 WO PCT/JP2023/038377 patent/WO2024090442A1/ja not_active Ceased
- 2023-10-24 KR KR1020257013359A patent/KR20250075657A/ko active Pending
- 2023-10-24 JP JP2024553086A patent/JPWO2024090442A1/ja active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03244827A (ja) * | 1990-02-21 | 1991-10-31 | Nippon Seiko Kk | 静圧気体軸受 |
| JP2003232352A (ja) * | 2002-02-06 | 2003-08-22 | Nikon Corp | エアパッド、このエアパッドを用いたステージ装置及びこのステージ装置を備える露光装置 |
| JP2011149500A (ja) * | 2010-01-22 | 2011-08-04 | Sintokogio Ltd | 静圧軸受装置および静圧軸受装置を備えたステージ |
| CN110848258A (zh) * | 2019-12-16 | 2020-02-28 | 江苏集萃精凯高端装备技术有限公司 | 一种气体静压气浮垫及气浮导轨 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2024090442A1 (ja) | 2024-05-02 |
| KR20250075657A (ko) | 2025-05-28 |
Similar Documents
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