KR20250004329A - 피복 기재 - Google Patents

피복 기재 Download PDF

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Publication number
KR20250004329A
KR20250004329A KR1020247039073A KR20247039073A KR20250004329A KR 20250004329 A KR20250004329 A KR 20250004329A KR 1020247039073 A KR1020247039073 A KR 1020247039073A KR 20247039073 A KR20247039073 A KR 20247039073A KR 20250004329 A KR20250004329 A KR 20250004329A
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KR
South Korea
Prior art keywords
film
thickness
substrate
atm
less
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020247039073A
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English (en)
Korean (ko)
Inventor
도모키 무라타
Original Assignee
니혼도꾸슈도교 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 니혼도꾸슈도교 가부시키가이샤 filed Critical 니혼도꾸슈도교 가부시키가이샤
Publication of KR20250004329A publication Critical patent/KR20250004329A/ko
Pending legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D9/00—Electrolytic coating other than with metals
    • C25D9/04—Electrolytic coating other than with metals with inorganic materials
    • C25D9/08—Electrolytic coating other than with metals with inorganic materials by cathodic processes
    • C25D9/12—Electrolytic coating other than with metals with inorganic materials by cathodic processes on light metals
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D9/00—Electrolytic coating other than with metals
    • C25D9/04—Electrolytic coating other than with metals with inorganic materials
    • C25D9/08—Electrolytic coating other than with metals with inorganic materials by cathodic processes
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D9/00—Electrolytic coating other than with metals
    • C25D9/04—Electrolytic coating other than with metals with inorganic materials
    • C25D9/08—Electrolytic coating other than with metals with inorganic materials by cathodic processes
    • C25D9/10—Electrolytic coating other than with metals with inorganic materials by cathodic processes on iron or steel

Landscapes

  • Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Cell Electrode Carriers And Collectors (AREA)
  • Chemical Vapour Deposition (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Laminated Bodies (AREA)
KR1020247039073A 2022-08-05 2023-07-20 피복 기재 Pending KR20250004329A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2022-125323 2022-08-05
JP2022125323 2022-08-05
PCT/JP2023/026615 WO2024029363A1 (ja) 2022-08-05 2023-07-20 被覆基材

Publications (1)

Publication Number Publication Date
KR20250004329A true KR20250004329A (ko) 2025-01-07

Family

ID=89848926

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020247039073A Pending KR20250004329A (ko) 2022-08-05 2023-07-20 피복 기재

Country Status (7)

Country Link
US (1) US20250327204A1 (https=)
EP (1) EP4567162A1 (https=)
JP (1) JPWO2024029363A1 (https=)
KR (1) KR20250004329A (https=)
CN (1) CN119301313A (https=)
TW (1) TW202417242A (https=)
WO (1) WO2024029363A1 (https=)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09202606A (ja) 1995-11-22 1997-08-05 Fuji Xerox Co Ltd 多層酸化物薄膜素子及びその製造方法
JP2009147192A (ja) 2007-12-17 2009-07-02 Fujifilm Corp 結晶性無機膜とその製造方法、半導体装置
JP2011032521A (ja) 2009-07-31 2011-02-17 Mitsubishi Materials Corp Ｃｓｄ溶液及び該溶液を用いたｃｉｓ系膜形成方法
JP2015093821A (ja) 2013-11-14 2015-05-18 東ソー株式会社 チタン酸化物膜の製造方法及びチタン酸化物膜

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0248103A (ja) * 1989-06-20 1990-02-16 Sumitomo Electric Ind Ltd 被覆超硬合金工具及びその製造法
JP3027502B2 (ja) * 1993-03-15 2000-04-04 健 増本 耐摩耗性非晶質硬質膜及びその製造方法
JP3001849B2 (ja) * 1998-03-16 2000-01-24 日立ツール株式会社 被覆硬質工具
JP2000117509A (ja) * 1998-10-14 2000-04-25 Mitsubishi Materials Corp 耐摩耗性の優れた表面被覆超硬合金製スローアウエイ切削チップ
JP2008231516A (ja) * 2007-03-20 2008-10-02 Toyota Motor Corp 金属酸化物薄膜、コンデンサ、水素分離膜−電解質膜接合体および燃料電池の製造方法
JP5535466B2 (ja) * 2008-10-31 2014-07-02 ゼネラル・エレクトリック・カンパニイ 金属酸化物コーティング
JP5896508B2 (ja) * 2011-04-28 2016-03-30 学校法人早稲田大学 組成物およびニッケル炭化物Ｎｉ３Ｃを主相とするめっき膜の製造用電気めっき液
WO2014101517A1 (zh) * 2012-12-26 2014-07-03 Wu Shanghua 一种采用物理气相沉积工艺在氮化硅切削刀具表面制备Al2O3涂层及其复合涂层的方法
JP7121234B2 (ja) * 2018-07-10 2022-08-18 三菱マテリアル株式会社 硬質被覆層が優れた耐チッピング性を発揮する表面切削工具

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09202606A (ja) 1995-11-22 1997-08-05 Fuji Xerox Co Ltd 多層酸化物薄膜素子及びその製造方法
JP2009147192A (ja) 2007-12-17 2009-07-02 Fujifilm Corp 結晶性無機膜とその製造方法、半導体装置
JP2011032521A (ja) 2009-07-31 2011-02-17 Mitsubishi Materials Corp Ｃｓｄ溶液及び該溶液を用いたｃｉｓ系膜形成方法
JP2015093821A (ja) 2013-11-14 2015-05-18 東ソー株式会社 チタン酸化物膜の製造方法及びチタン酸化物膜

Also Published As

Publication number Publication date
JPWO2024029363A1 (https=) 2024-02-08
US20250327204A1 (en) 2025-10-23
WO2024029363A1 (ja) 2024-02-08
EP4567162A1 (en) 2025-06-11
CN119301313A (zh) 2025-01-10
TW202417242A (zh) 2024-05-01

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PA0105 International application

Patent event date: 20241125

Patent event code: PA01051R01D

Comment text: International Patent Application

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