KR20240163660A - 반도체 세정액 및 반도체 세정액의 제조 방법 - Google Patents

반도체 세정액 및 반도체 세정액의 제조 방법 Download PDF

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Publication number
KR20240163660A
KR20240163660A KR1020247033182A KR20247033182A KR20240163660A KR 20240163660 A KR20240163660 A KR 20240163660A KR 1020247033182 A KR1020247033182 A KR 1020247033182A KR 20247033182 A KR20247033182 A KR 20247033182A KR 20240163660 A KR20240163660 A KR 20240163660A
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KR
South Korea
Prior art keywords
distillation tower
isopropyl alcohol
stage
distillation
semiconductor cleaning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020247033182A
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English (en)
Korean (ko)
Inventor
슌스케 호사카
šœ스케 호사카
타카시 도쿠나가
요시아키 야마시타
Original Assignee
가부시키가이샤 도쿠야마
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 도쿠야마 filed Critical 가부시키가이샤 도쿠야마
Publication of KR20240163660A publication Critical patent/KR20240163660A/ko
Pending legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C11D7/261—Alcohols; Phenols
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C29/00—Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring
    • C07C29/03—Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring by addition of hydroxy groups to unsaturated carbon-to-carbon bonds, e.g. with the aid of H2O2
    • C07C29/04—Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring by addition of hydroxy groups to unsaturated carbon-to-carbon bonds, e.g. with the aid of H2O2 by hydration of carbon-to-carbon double bonds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C29/00—Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring
    • C07C29/74—Separation; Purification; Use of additives, e.g. for stabilisation
    • C07C29/76—Separation; Purification; Use of additives, e.g. for stabilisation by physical treatment
    • C07C29/80—Separation; Purification; Use of additives, e.g. for stabilisation by physical treatment by distillation
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C29/00—Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring
    • C07C29/74—Separation; Purification; Use of additives, e.g. for stabilisation
    • C07C29/76—Separation; Purification; Use of additives, e.g. for stabilisation by physical treatment
    • C07C29/80—Separation; Purification; Use of additives, e.g. for stabilisation by physical treatment by distillation
    • C07C29/82—Separation; Purification; Use of additives, e.g. for stabilisation by physical treatment by distillation by azeotropic distillation
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C31/00—Saturated compounds having hydroxy or O-metal groups bound to acyclic carbon atoms
    • C07C31/02—Monohydroxylic acyclic alcohols
    • C07C31/10—Monohydroxylic acyclic alcohols containing three carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/24—Hydrocarbons
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C11D7/264—Aldehydes; Ketones; Acetals or ketals
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • C11D7/5004—Organic solvents
    • C11D7/5022—Organic solvents containing oxygen
    • H01L21/02041—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P70/00—Cleaning of wafers, substrates or parts of devices
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P70/00—Cleaning of wafers, substrates or parts of devices
    • H10P70/10—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H10P70/15—Cleaning before device manufacture, i.e. Begin-Of-Line process by wet cleaning only

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Health & Medical Sciences (AREA)
  • Emergency Medicine (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Detergent Compositions (AREA)
KR1020247033182A 2022-03-16 2023-02-07 반도체 세정액 및 반도체 세정액의 제조 방법 Pending KR20240163660A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2022-041318 2022-03-16
JP2022041318 2022-03-16
PCT/JP2023/003901 WO2023176192A1 (ja) 2022-03-16 2023-02-07 半導体洗浄液および半導体洗浄液の製造方法

Publications (1)

Publication Number Publication Date
KR20240163660A true KR20240163660A (ko) 2024-11-19

Family

ID=88022808

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020247033182A Pending KR20240163660A (ko) 2022-03-16 2023-02-07 반도체 세정액 및 반도체 세정액의 제조 방법

Country Status (7)

Country Link
US (1) US20250171718A1 (https=)
JP (1) JP7402385B1 (https=)
KR (1) KR20240163660A (https=)
CN (1) CN118742996A (https=)
DE (1) DE112023001404T5 (https=)
TW (1) TW202344677A (https=)
WO (1) WO2023176192A1 (https=)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20260021637A (ko) * 2023-06-13 2026-02-13 가부시키가이샤 도쿠야마 반도체 약액 및 반도체 약액의 제조방법
CN121752541A (zh) * 2023-09-07 2026-03-27 株式会社德山 纯化异丙醇水溶液的制造方法
JP2026505851A (ja) * 2023-11-15 2026-02-18 エルジー・ケム・リミテッド イソプロピルアルコールの精製方法
WO2025105774A1 (ko) * 2023-11-15 2025-05-22 주식회사 엘지화학 이소프로필 알코올의 제조방법
JP7651784B1 (ja) * 2023-11-28 2025-03-26 株式会社トクヤマ 精製イソプロピルアルコールの製造方法
WO2025115528A1 (ja) * 2023-11-28 2025-06-05 株式会社トクヤマ 精製イソプロピルアルコールの製造方法
JP7695493B1 (ja) * 2023-12-01 2025-06-18 株式会社トクヤマ 精製イソプロピルアルコールの製造方法および製造装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017217279A1 (ja) 2016-06-17 2017-12-21 株式会社トクヤマ イソプロピルアルコールの製造方法及び不純物が低減されたイソプロピルアルコール

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4754058B2 (ja) * 2000-10-16 2011-08-24 三井化学株式会社 イソプロピルアルコールの製造方法
WO2009037953A1 (ja) * 2007-09-19 2009-03-26 Mitsui Chemicals, Inc. アルコールの製造方法および酸処理ラネー触媒
JP7118898B2 (ja) * 2017-01-23 2022-08-16 株式会社トクヤマ イソプロピルアルコール組成物及びイソプロピルアルコールの製造方法
KR102333873B1 (ko) * 2018-10-03 2021-12-02 가부시키가이샤 도쿠야마 고순도 이소프로필 알코올 및 그 제조 방법
JP6980952B1 (ja) * 2020-04-02 2021-12-15 株式会社トクヤマ 半導体処理液及びその製造方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017217279A1 (ja) 2016-06-17 2017-12-21 株式会社トクヤマ イソプロピルアルコールの製造方法及び不純物が低減されたイソプロピルアルコール

Also Published As

Publication number Publication date
CN118742996A (zh) 2024-10-01
DE112023001404T5 (de) 2024-12-24
JPWO2023176192A1 (https=) 2023-09-21
TW202344677A (zh) 2023-11-16
JP7402385B1 (ja) 2023-12-20
US20250171718A1 (en) 2025-05-29
WO2023176192A1 (ja) 2023-09-21

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P22-X000 Classification modified

St.27 status event code: A-2-2-P10-P22-nap-X000