KR20240153274A - 전사용 마스크 및 표시 장치의 제조 방법 - Google Patents

전사용 마스크 및 표시 장치의 제조 방법 Download PDF

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Publication number
KR20240153274A
KR20240153274A KR1020240048620A KR20240048620A KR20240153274A KR 20240153274 A KR20240153274 A KR 20240153274A KR 1020240048620 A KR1020240048620 A KR 1020240048620A KR 20240048620 A KR20240048620 A KR 20240048620A KR 20240153274 A KR20240153274 A KR 20240153274A
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KR
South Korea
Prior art keywords
light
film
pattern
semi
transfer mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020240048620A
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English (en)
Korean (ko)
Inventor
노리따까 하시모또
노부히사 이마시끼
Original Assignee
호야 가부시키가이샤
한국 호야 전자 주식회사
호야 마이크로일렉트로닉스 타이완 씨오., 엘티디.
충칭 마스텍 일렉트로닉스 씨오., 엘티디.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 호야 가부시키가이샤, 한국 호야 전자 주식회사, 호야 마이크로일렉트로닉스 타이완 씨오., 엘티디., 충칭 마스텍 일렉트로닉스 씨오., 엘티디. filed Critical 호야 가부시키가이샤
Publication of KR20240153274A publication Critical patent/KR20240153274A/ko
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • H10P95/06—Planarisation of inorganic insulating materials
    • H10P95/062—Planarisation of inorganic insulating materials involving a dielectric removal step
    • H10P95/064—Planarisation of inorganic insulating materials involving a dielectric removal step the removal being chemical etching
    • H10P95/066—Planarisation of inorganic insulating materials involving a dielectric removal step the removal being chemical etching the removal being a selective chemical etching step, e.g. selective dry etching through a mask
    • H01L21/31056—
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/70—Adapting basic layout or design of masks to lithographic process requirements, e.g., second iteration correction of mask patterns for imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • H01L21/0273—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
KR1020240048620A 2023-04-14 2024-04-11 전사용 마스크 및 표시 장치의 제조 방법 Pending KR20240153274A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2023066386A JP2024152280A (ja) 2023-04-14 2023-04-14 転写用マスク、および、表示装置の製造方法
JPJP-P-2023-066386 2023-04-14

Publications (1)

Publication Number Publication Date
KR20240153274A true KR20240153274A (ko) 2024-10-22

Family

ID=93028732

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020240048620A Pending KR20240153274A (ko) 2023-04-14 2024-04-11 전사용 마스크 및 표시 장치의 제조 방법

Country Status (4)

Country Link
JP (1) JP2024152280A (https=)
KR (1) KR20240153274A (https=)
CN (1) CN118795722A (https=)
TW (1) TW202445243A (https=)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018061195A1 (ja) 2016-09-30 2018-04-05 シャープ株式会社 有機ｅｌ表示装置および有機ｅｌ表示装置の製造方法
JP2020140207A (ja) 2019-02-27 2020-09-03 Hoya株式会社 フォトマスク、フォトマスクの製造方法、および表示装置の製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018061195A1 (ja) 2016-09-30 2018-04-05 シャープ株式会社 有機ｅｌ表示装置および有機ｅｌ表示装置の製造方法
JP2020140207A (ja) 2019-02-27 2020-09-03 Hoya株式会社 フォトマスク、フォトマスクの製造方法、および表示装置の製造方法

Also Published As

Publication number Publication date
JP2024152280A (ja) 2024-10-25
CN118795722A (zh) 2024-10-18
TW202445243A (zh) 2024-11-16

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PA0109 Patent application

St.27 status event code: A-0-1-A10-A12-nap-PA0109

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

R18-X000 Changes to party contact information recorded

St.27 status event code: A-3-3-R10-R18-oth-X000

P22-X000 Classification modified

St.27 status event code: A-2-2-P10-P22-nap-X000