JP2024152280A - 転写用マスク、および、表示装置の製造方法 - Google Patents

転写用マスク、および、表示装置の製造方法 Download PDF

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Publication number
JP2024152280A
JP2024152280A JP2023066386A JP2023066386A JP2024152280A JP 2024152280 A JP2024152280 A JP 2024152280A JP 2023066386 A JP2023066386 A JP 2023066386A JP 2023066386 A JP2023066386 A JP 2023066386A JP 2024152280 A JP2024152280 A JP 2024152280A
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JP
Japan
Prior art keywords
light
transmitting
film
pattern
semi
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2023066386A
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English (en)
Japanese (ja)
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JP2024152280A5 (https=
Inventor
憲尚 橋本
Kensho Hashimoto
修久 今敷
Nobuhisa Imashiki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Chongqing Mastek Electronics Co Ltd
Hoya Microelectronics Taiwan Co Ltd
Hoya Corp
Hoya Electronics Korea Co Ltd
Original Assignee
Chongqing Mastek Electronics Co Ltd
Hoya Microelectronics Taiwan Co Ltd
Hoya Corp
Hoya Electronics Korea Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chongqing Mastek Electronics Co Ltd, Hoya Microelectronics Taiwan Co Ltd, Hoya Corp, Hoya Electronics Korea Co Ltd filed Critical Chongqing Mastek Electronics Co Ltd
Priority to JP2023066386A priority Critical patent/JP2024152280A/ja
Priority to TW113112519A priority patent/TW202445243A/zh
Priority to CN202410419905.6A priority patent/CN118795722A/zh
Priority to KR1020240048620A priority patent/KR20240153274A/ko
Publication of JP2024152280A publication Critical patent/JP2024152280A/ja
Publication of JP2024152280A5 publication Critical patent/JP2024152280A5/ja
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • H10P95/06—Planarisation of inorganic insulating materials
    • H10P95/062—Planarisation of inorganic insulating materials involving a dielectric removal step
    • H10P95/064—Planarisation of inorganic insulating materials involving a dielectric removal step the removal being chemical etching
    • H10P95/066—Planarisation of inorganic insulating materials involving a dielectric removal step the removal being chemical etching the removal being a selective chemical etching step, e.g. selective dry etching through a mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/70—Adapting basic layout or design of masks to lithographic process requirements, e.g., second iteration correction of mask patterns for imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
JP2023066386A 2023-04-14 2023-04-14 転写用マスク、および、表示装置の製造方法 Pending JP2024152280A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2023066386A JP2024152280A (ja) 2023-04-14 2023-04-14 転写用マスク、および、表示装置の製造方法
TW113112519A TW202445243A (zh) 2023-04-14 2024-04-02 轉印用光罩、及顯示裝置之製造方法
CN202410419905.6A CN118795722A (zh) 2023-04-14 2024-04-09 转印用掩模及显示装置的制造方法
KR1020240048620A KR20240153274A (ko) 2023-04-14 2024-04-11 전사용 마스크 및 표시 장치의 제조 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2023066386A JP2024152280A (ja) 2023-04-14 2023-04-14 転写用マスク、および、表示装置の製造方法

Publications (2)

Publication Number Publication Date
JP2024152280A true JP2024152280A (ja) 2024-10-25
JP2024152280A5 JP2024152280A5 (https=) 2026-02-06

Family

ID=93028732

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023066386A Pending JP2024152280A (ja) 2023-04-14 2023-04-14 転写用マスク、および、表示装置の製造方法

Country Status (4)

Country Link
JP (1) JP2024152280A (https=)
KR (1) KR20240153274A (https=)
CN (1) CN118795722A (https=)
TW (1) TW202445243A (https=)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018061195A1 (ja) 2016-09-30 2018-04-05 シャープ株式会社 有機ｅｌ表示装置および有機ｅｌ表示装置の製造方法
KR102367141B1 (ko) 2019-02-27 2022-02-23 호야 가부시키가이샤 포토마스크, 포토마스크의 제조 방법, 및 표시 장치의 제조 방법

Also Published As

Publication number Publication date
CN118795722A (zh) 2024-10-18
TW202445243A (zh) 2024-11-16
KR20240153274A (ko) 2024-10-22

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