CN118795722A - 转印用掩模及显示装置的制造方法 - Google Patents

转印用掩模及显示装置的制造方法 Download PDF

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Publication number
CN118795722A
CN118795722A CN202410419905.6A CN202410419905A CN118795722A CN 118795722 A CN118795722 A CN 118795722A CN 202410419905 A CN202410419905 A CN 202410419905A CN 118795722 A CN118795722 A CN 118795722A
Authority
CN
China
Prior art keywords
light
transmissive
film
pattern
semi
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202410419905.6A
Other languages
English (en)
Chinese (zh)
Inventor
桥本宪尚
今敷修久
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Chongqing Maite Optoelectronics Co ltd
Taiwan Haoya Optoelectronics Co ltd
Hoya Corp
Hoya Electronics Korea Co Ltd
Original Assignee
Chongqing Maite Optoelectronics Co ltd
Taiwan Haoya Optoelectronics Co ltd
Hoya Corp
Hoya Electronics Korea Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chongqing Maite Optoelectronics Co ltd, Taiwan Haoya Optoelectronics Co ltd, Hoya Corp, Hoya Electronics Korea Co Ltd filed Critical Chongqing Maite Optoelectronics Co ltd
Publication of CN118795722A publication Critical patent/CN118795722A/zh
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • H10P95/06—Planarisation of inorganic insulating materials
    • H10P95/062—Planarisation of inorganic insulating materials involving a dielectric removal step
    • H10P95/064—Planarisation of inorganic insulating materials involving a dielectric removal step the removal being chemical etching
    • H10P95/066—Planarisation of inorganic insulating materials involving a dielectric removal step the removal being chemical etching the removal being a selective chemical etching step, e.g. selective dry etching through a mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/70—Adapting basic layout or design of masks to lithographic process requirements, e.g., second iteration correction of mask patterns for imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
CN202410419905.6A 2023-04-14 2024-04-09 转印用掩模及显示装置的制造方法 Pending CN118795722A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2023066386A JP2024152280A (ja) 2023-04-14 2023-04-14 転写用マスク、および、表示装置の製造方法
JP2023-066386 2023-04-14

Publications (1)

Publication Number Publication Date
CN118795722A true CN118795722A (zh) 2024-10-18

Family

ID=93028732

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202410419905.6A Pending CN118795722A (zh) 2023-04-14 2024-04-09 转印用掩模及显示装置的制造方法

Country Status (4)

Country Link
JP (1) JP2024152280A (https=)
KR (1) KR20240153274A (https=)
CN (1) CN118795722A (https=)
TW (1) TW202445243A (https=)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018061195A1 (ja) 2016-09-30 2018-04-05 シャープ株式会社 有機ｅｌ表示装置および有機ｅｌ表示装置の製造方法
KR102367141B1 (ko) 2019-02-27 2022-02-23 호야 가부시키가이샤 포토마스크, 포토마스크의 제조 방법, 및 표시 장치의 제조 방법

Also Published As

Publication number Publication date
JP2024152280A (ja) 2024-10-25
TW202445243A (zh) 2024-11-16
KR20240153274A (ko) 2024-10-22

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