TW202445243A - 轉印用光罩、及顯示裝置之製造方法 - Google Patents

轉印用光罩、及顯示裝置之製造方法 Download PDF

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Publication number
TW202445243A
TW202445243A TW113112519A TW113112519A TW202445243A TW 202445243 A TW202445243 A TW 202445243A TW 113112519 A TW113112519 A TW 113112519A TW 113112519 A TW113112519 A TW 113112519A TW 202445243 A TW202445243 A TW 202445243A
Authority
TW
Taiwan
Prior art keywords
light
film
pattern
semi
transfer mask
Prior art date
Application number
TW113112519A
Other languages
English (en)
Chinese (zh)
Inventor
橋本憲尚
今敷修久
Original Assignee
日商Ｈｏｙａ股份有限公司
韓商韓國Ｈｏｙａ電子股份有限公司
台灣豪雅光電股份有限公司
大陸商重慶邁特光電有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商Ｈｏｙａ股份有限公司, 韓商韓國Ｈｏｙａ電子股份有限公司, 台灣豪雅光電股份有限公司, 大陸商重慶邁特光電有限公司 filed Critical 日商Ｈｏｙａ股份有限公司
Publication of TW202445243A publication Critical patent/TW202445243A/zh

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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • H10P95/06—Planarisation of inorganic insulating materials
    • H10P95/062—Planarisation of inorganic insulating materials involving a dielectric removal step
    • H10P95/064—Planarisation of inorganic insulating materials involving a dielectric removal step the removal being chemical etching
    • H10P95/066—Planarisation of inorganic insulating materials involving a dielectric removal step the removal being chemical etching the removal being a selective chemical etching step, e.g. selective dry etching through a mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/70—Adapting basic layout or design of masks to lithographic process requirements, e.g., second iteration correction of mask patterns for imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
TW113112519A 2023-04-14 2024-04-02 轉印用光罩、及顯示裝置之製造方法 TW202445243A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2023066386A JP2024152280A (ja) 2023-04-14 2023-04-14 転写用マスク、および、表示装置の製造方法
JP2023-066386 2023-04-14

Publications (1)

Publication Number Publication Date
TW202445243A true TW202445243A (zh) 2024-11-16

Family

ID=93028732

Family Applications (1)

Application Number Title Priority Date Filing Date
TW113112519A TW202445243A (zh) 2023-04-14 2024-04-02 轉印用光罩、及顯示裝置之製造方法

Country Status (4)

Country Link
JP (1) JP2024152280A (https=)
KR (1) KR20240153274A (https=)
CN (1) CN118795722A (https=)
TW (1) TW202445243A (https=)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018061195A1 (ja) 2016-09-30 2018-04-05 シャープ株式会社 有機ｅｌ表示装置および有機ｅｌ表示装置の製造方法
KR102367141B1 (ko) 2019-02-27 2022-02-23 호야 가부시키가이샤 포토마스크, 포토마스크의 제조 방법, 및 표시 장치의 제조 방법

Also Published As

Publication number Publication date
JP2024152280A (ja) 2024-10-25
CN118795722A (zh) 2024-10-18
KR20240153274A (ko) 2024-10-22

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