KR20240072217A - 연마용 조성물 - Google Patents

연마용 조성물 Download PDF

Info

Publication number
KR20240072217A
KR20240072217A KR1020247013664A KR20247013664A KR20240072217A KR 20240072217 A KR20240072217 A KR 20240072217A KR 1020247013664 A KR1020247013664 A KR 1020247013664A KR 20247013664 A KR20247013664 A KR 20247013664A KR 20240072217 A KR20240072217 A KR 20240072217A
Authority
KR
South Korea
Prior art keywords
polishing
less
polishing composition
acid
abrasive grains
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020247013664A
Other languages
English (en)
Korean (ko)
Inventor
요시오 모리
유이치로 나카가이
히로유키 오다
Original Assignee
가부시키가이샤 후지미인코퍼레이티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 후지미인코퍼레이티드 filed Critical 가부시키가이샤 후지미인코퍼레이티드
Publication of KR20240072217A publication Critical patent/KR20240072217A/ko
Pending legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
    • B24B37/044—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor characterised by the composition of the lapping agent
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/04—Aqueous dispersions
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00—Etching, surface-brightening or pickling compositions
    • H01L21/31053—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • H10P52/40—Chemomechanical polishing [CMP]
    • H10P52/402—Chemomechanical polishing [CMP] of semiconductor materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P90/00—Preparation of wafers not covered by a single main group of this subclass, e.g. wafer reinforcement
    • H10P90/12—Preparing bulk and homogeneous wafers
    • H10P90/129—Preparing bulk and homogeneous wafers by polishing
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • H10P95/02—Planarisation of semiconductor materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • H10P95/06—Planarisation of inorganic insulating materials
    • H10P95/062—Planarisation of inorganic insulating materials involving a dielectric removal step

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Dispersion Chemistry (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
KR1020247013664A 2021-09-30 2022-09-27 연마용 조성물 Pending KR20240072217A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2021-162177 2021-09-30
JP2021162177 2021-09-30
PCT/JP2022/035995 WO2023054386A1 (ja) 2021-09-30 2022-09-27 研磨用組成物

Publications (1)

Publication Number Publication Date
KR20240072217A true KR20240072217A (ko) 2024-05-23

Family

ID=85782754

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020247013664A Pending KR20240072217A (ko) 2021-09-30 2022-09-27 연마용 조성물

Country Status (7)

Country Link
US (1) US20240400862A1 (https=)
EP (1) EP4410923A4 (https=)
JP (1) JPWO2023054386A1 (https=)
KR (1) KR20240072217A (https=)
CN (1) CN118043427A (https=)
TW (1) TW202330822A (https=)
WO (1) WO2023054386A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2025205563A1 (ja) * 2024-03-28 2025-10-02 株式会社フジミインコーポレーテッド 研磨用組成物

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016072370A1 (ja) 2014-11-07 2016-05-12 株式会社フジミインコーポレーテッド 研磨方法およびポリシング用組成物

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013054883A1 (ja) * 2011-10-13 2013-04-18 三井金属鉱業株式会社 研摩材スラリー及び研摩方法
JP6448314B2 (ja) * 2014-11-06 2019-01-09 株式会社ディスコ 研磨液及びＳｉＣ基板の研磨方法
CN110299403B (zh) * 2014-11-27 2022-03-25 住友电气工业株式会社 碳化硅基板
WO2017212971A1 (ja) * 2016-06-08 2017-12-14 三井金属鉱業株式会社 研摩液及び研摩物の製造方法
EP3604475B1 (en) * 2017-03-23 2025-06-04 Fujimi Incorporated Polishing composition
KR102337333B1 (ko) * 2017-05-25 2021-12-13 생-고뱅 세라믹스 앤드 플라스틱스, 인코포레이티드 세라믹 재료의 화학기계적 연마를 위한 산화 유체
US11339311B2 (en) * 2018-01-11 2022-05-24 Fujimi Incorporated Polishing composition
TWI861353B (zh) * 2020-01-31 2024-11-11 美商恩特葛瑞斯股份有限公司 用於研磨硬質材料之化學機械研磨(cmp)組合物
JP7405672B2 (ja) 2020-03-30 2023-12-26 イビデン株式会社 燃焼装置用消音器
CN115380097B (zh) * 2020-03-30 2024-06-14 福吉米株式会社 研磨用组合物
WO2022168858A1 (ja) * 2021-02-04 2022-08-11 株式会社フジミインコーポレーテッド 研磨用組成物
EP4314179A4 (en) * 2021-03-29 2025-06-18 Entegris, Inc. Suspension for chemical mechanical planarization (cmp) and method employing the same
CN114410226A (zh) * 2022-01-27 2022-04-29 中国科学院上海微系统与信息技术研究所 一种抛光液及其制备方法和应用

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016072370A1 (ja) 2014-11-07 2016-05-12 株式会社フジミインコーポレーテッド 研磨方法およびポリシング用組成物

Also Published As

Publication number Publication date
WO2023054386A1 (ja) 2023-04-06
EP4410923A4 (en) 2025-10-01
JPWO2023054386A1 (https=) 2023-04-06
CN118043427A (zh) 2024-05-14
TW202330822A (zh) 2023-08-01
EP4410923A1 (en) 2024-08-07
US20240400862A1 (en) 2024-12-05

Similar Documents

Publication Publication Date Title
KR102716012B1 (ko) 연마용 조성물
KR20240166014A (ko) 연마용 조성물
CN110431210B (zh) 研磨用组合物
KR20230141820A (ko) 연마 방법 및 연마용 조성물
WO2017170062A1 (ja) 研磨用組成物
KR20230141821A (ko) 연마용 조성물
US20260109881A1 (en) Polishing composition
JP7713928B2 (ja) 研磨用組成物および研磨方法
WO2022168858A1 (ja) 研磨用組成物
KR20240072217A (ko) 연마용 조성물
KR20240070626A (ko) 연마용 조성물
WO2026070711A1 (ja) 研磨用組成物および研磨方法
WO2025205562A1 (ja) 研磨用組成物
WO2025205564A1 (ja) 研磨用組成物
WO2025205563A1 (ja) 研磨用組成物
KR20250169236A (ko) 연마용 조성물
WO2026070712A1 (ja) 研磨用組成物、研磨用組成物の製造方法および研磨方法
WO2024203917A1 (ja) 研磨用組成物
WO2026070713A1 (ja) 研磨用組成物および研磨方法
CN116918040A (zh) 研磨方法和研磨用组合物

Legal Events

Date Code Title Description
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

A201 Request for examination
P22-X000 Classification modified

St.27 status event code: A-2-2-P10-P22-nap-X000