KR20240047425A - 펠리클 - Google Patents

펠리클 Download PDF

Info

Publication number
KR20240047425A
KR20240047425A KR1020247008335A KR20247008335A KR20240047425A KR 20240047425 A KR20240047425 A KR 20240047425A KR 1020247008335 A KR1020247008335 A KR 1020247008335A KR 20247008335 A KR20247008335 A KR 20247008335A KR 20240047425 A KR20240047425 A KR 20240047425A
Authority
KR
South Korea
Prior art keywords
pellicle
mass
adhesive layer
meth
parts
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020247008335A
Other languages
English (en)
Korean (ko)
Inventor
켄 이토
야스시 사토
다카시 우네자키
요스케 오노
Original Assignee
미쯔이가가꾸가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 미쯔이가가꾸가부시끼가이샤 filed Critical 미쯔이가가꾸가부시끼가이샤
Publication of KR20240047425A publication Critical patent/KR20240047425A/ko
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • C09J133/04—Homopolymers or copolymers of esters
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00—Adhesives in the form of films or foils
    • C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/38—Pressure-sensitive adhesives [PSA]
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00—Adhesives in the form of films or foils
    • C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/38—Pressure-sensitive adhesives [PSA]
    • C09J7/381—Pressure-sensitive adhesives [PSA] based on macromolecular compounds obtained by reactions involving only carbon-to-carbon unsaturated bonds
    • C09J7/385—Acrylic polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Adhesive Tapes (AREA)
  • Laminated Bodies (AREA)
KR1020247008335A 2021-09-13 2022-09-12 펠리클 Pending KR20240047425A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021148632 2021-09-13
JPJP-P-2021-148632 2021-09-13
PCT/JP2022/034109 WO2023038140A1 (ja) 2021-09-13 2022-09-12 ペリクル

Publications (1)

Publication Number Publication Date
KR20240047425A true KR20240047425A (ko) 2024-04-12

Family

ID=85506493

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020247008335A Pending KR20240047425A (ko) 2021-09-13 2022-09-12 펠리클

Country Status (6)

Country Link
US (1) US20240377725A1 (https=)
JP (1) JP7691508B2 (https=)
KR (1) KR20240047425A (https=)
CN (1) CN117916661A (https=)
TW (1) TWI911482B (https=)
WO (1) WO2023038140A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021193681A1 (ja) * 2020-03-27 2021-09-30 三井化学株式会社 ペリクル、およびその製造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011107469A (ja) 2009-11-18 2011-06-02 Asahi Kasei E-Materials Corp ペリクル
JP2011128605A (ja) 2009-11-18 2011-06-30 Asahi Kasei E-Materials Corp ペリクル

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3331996B2 (ja) * 1998-12-25 2002-10-07 日本電気株式会社 ペリクル
JP2011113033A (ja) * 2009-11-30 2011-06-09 Shin-Etsu Chemical Co Ltd ペリクル膜の製造方法および装置
CN106795396B (zh) * 2014-12-02 2020-12-18 琳得科株式会社 粘着片以及加工物的制造方法
CN113677722A (zh) * 2019-03-28 2021-11-19 三井化学株式会社 防护膜组件

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011107469A (ja) 2009-11-18 2011-06-02 Asahi Kasei E-Materials Corp ペリクル
JP2011128605A (ja) 2009-11-18 2011-06-30 Asahi Kasei E-Materials Corp ペリクル

Also Published As

Publication number Publication date
CN117916661A (zh) 2024-04-19
US20240377725A1 (en) 2024-11-14
JP7691508B2 (ja) 2025-06-11
TW202313909A (zh) 2023-04-01
TWI911482B (zh) 2026-01-11
JPWO2023038140A1 (https=) 2023-03-16
WO2023038140A1 (ja) 2023-03-16

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