TWI911482B - 防護膜 - Google Patents

防護膜

Info

Publication number
TWI911482B
TWI911482B TW111134429A TW111134429A TWI911482B TW I911482 B TWI911482 B TW I911482B TW 111134429 A TW111134429 A TW 111134429A TW 111134429 A TW111134429 A TW 111134429A TW I911482 B TWI911482 B TW I911482B
Authority
TW
Taiwan
Prior art keywords
protective film
adhesive layer
mass
meth
parts
Prior art date
Application number
TW111134429A
Other languages
English (en)
Chinese (zh)
Other versions
TW202313909A (zh
Inventor
伊藤健
佐藤靖
畦崎崇
小野陽介
Original Assignee
日商三井化學股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商三井化學股份有限公司 filed Critical 日商三井化學股份有限公司
Publication of TW202313909A publication Critical patent/TW202313909A/zh
Application granted granted Critical
Publication of TWI911482B publication Critical patent/TWI911482B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • C09J133/04—Homopolymers or copolymers of esters
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00—Adhesives in the form of films or foils
    • C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/38—Pressure-sensitive adhesives [PSA]
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00—Adhesives in the form of films or foils
    • C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/38—Pressure-sensitive adhesives [PSA]
    • C09J7/381—Pressure-sensitive adhesives [PSA] based on macromolecular compounds obtained by reactions involving only carbon-to-carbon unsaturated bonds
    • C09J7/385—Acrylic polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Adhesive Tapes (AREA)
  • Laminated Bodies (AREA)
TW111134429A 2021-09-13 2022-09-13 防護膜 TWI911482B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021-148632 2021-09-13
JP2021148632 2021-09-13

Publications (2)

Publication Number Publication Date
TW202313909A TW202313909A (zh) 2023-04-01
TWI911482B true TWI911482B (zh) 2026-01-11

Family

ID=85506493

Family Applications (1)

Application Number Title Priority Date Filing Date
TW111134429A TWI911482B (zh) 2021-09-13 2022-09-13 防護膜

Country Status (5)

Country Link
US (1) US20240377725A1 (https=)
JP (1) JP7691508B2 (https=)
CN (1) CN117916661A (https=)
TW (1) TWI911482B (https=)
WO (1) WO2023038140A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20230080753A1 (en) * 2020-03-27 2023-03-16 Mitsui Chemicals, Inc. Pellicle, and production method therefor

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000194121A (ja) * 1998-12-25 2000-07-14 Nec Corp ペリクル
JP2011113033A (ja) * 2009-11-30 2011-06-09 Shin-Etsu Chemical Co Ltd ペリクル膜の製造方法および装置
TW201629171A (zh) * 2014-12-02 2016-08-16 Lintec Corp 黏接片以及加工物之製造方法
JP2016167070A (ja) * 2009-11-18 2016-09-15 旭化成株式会社 ペリクル
WO2020196836A1 (ja) * 2019-03-28 2020-10-01 三井化学株式会社 ペリクル

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000194121A (ja) * 1998-12-25 2000-07-14 Nec Corp ペリクル
JP2016167070A (ja) * 2009-11-18 2016-09-15 旭化成株式会社 ペリクル
JP2011113033A (ja) * 2009-11-30 2011-06-09 Shin-Etsu Chemical Co Ltd ペリクル膜の製造方法および装置
TW201629171A (zh) * 2014-12-02 2016-08-16 Lintec Corp 黏接片以及加工物之製造方法
WO2020196836A1 (ja) * 2019-03-28 2020-10-01 三井化学株式会社 ペリクル

Also Published As

Publication number Publication date
US20240377725A1 (en) 2024-11-14
JPWO2023038140A1 (https=) 2023-03-16
WO2023038140A1 (ja) 2023-03-16
JP7691508B2 (ja) 2025-06-11
CN117916661A (zh) 2024-04-19
TW202313909A (zh) 2023-04-01
KR20240047425A (ko) 2024-04-12

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