JPWO2023038140A1 - - Google Patents

Info

Publication number
JPWO2023038140A1
JPWO2023038140A1 JP2023547022A JP2023547022A JPWO2023038140A1 JP WO2023038140 A1 JPWO2023038140 A1 JP WO2023038140A1 JP 2023547022 A JP2023547022 A JP 2023547022A JP 2023547022 A JP2023547022 A JP 2023547022A JP WO2023038140 A1 JPWO2023038140 A1 JP WO2023038140A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2023547022A
Other languages
Japanese (ja)
Other versions
JPWO2023038140A5 (https=
JP7691508B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2023038140A1 publication Critical patent/JPWO2023038140A1/ja
Publication of JPWO2023038140A5 publication Critical patent/JPWO2023038140A5/ja
Application granted granted Critical
Publication of JP7691508B2 publication Critical patent/JP7691508B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • C09J133/04Homopolymers or copolymers of esters
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/30Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/38Pressure-sensitive adhesives [PSA]
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/30Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/38Pressure-sensitive adhesives [PSA]
    • C09J7/381Pressure-sensitive adhesives [PSA] based on macromolecular compounds obtained by reactions involving only carbon-to-carbon unsaturated bonds
    • C09J7/385Acrylic polymers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Adhesive Tapes (AREA)
  • Laminated Bodies (AREA)
JP2023547022A 2021-09-13 2022-09-12 ペリクル Active JP7691508B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021148632 2021-09-13
JP2021148632 2021-09-13
PCT/JP2022/034109 WO2023038140A1 (ja) 2021-09-13 2022-09-12 ペリクル

Publications (3)

Publication Number Publication Date
JPWO2023038140A1 true JPWO2023038140A1 (https=) 2023-03-16
JPWO2023038140A5 JPWO2023038140A5 (https=) 2024-06-04
JP7691508B2 JP7691508B2 (ja) 2025-06-11

Family

ID=85506493

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023547022A Active JP7691508B2 (ja) 2021-09-13 2022-09-12 ペリクル

Country Status (5)

Country Link
US (1) US20240377725A1 (https=)
JP (1) JP7691508B2 (https=)
CN (1) CN117916661A (https=)
TW (1) TWI911482B (https=)
WO (1) WO2023038140A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20230080753A1 (en) * 2020-03-27 2023-03-16 Mitsui Chemicals, Inc. Pellicle, and production method therefor

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000194121A (ja) * 1998-12-25 2000-07-14 Nec Corp ペリクル
JP2011113033A (ja) * 2009-11-30 2011-06-09 Shin-Etsu Chemical Co Ltd ペリクル膜の製造方法および装置
JP2011128605A (ja) * 2009-11-18 2011-06-30 Asahi Kasei E-Materials Corp ペリクル
WO2020196836A1 (ja) * 2019-03-28 2020-10-01 三井化学株式会社 ペリクル

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG11201704347YA (en) * 2014-12-02 2017-06-29 Lintec Corp Adhesive sheet, and method for manufacturing processed article

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000194121A (ja) * 1998-12-25 2000-07-14 Nec Corp ペリクル
JP2011128605A (ja) * 2009-11-18 2011-06-30 Asahi Kasei E-Materials Corp ペリクル
JP2016167070A (ja) * 2009-11-18 2016-09-15 旭化成株式会社 ペリクル
JP2011113033A (ja) * 2009-11-30 2011-06-09 Shin-Etsu Chemical Co Ltd ペリクル膜の製造方法および装置
WO2020196836A1 (ja) * 2019-03-28 2020-10-01 三井化学株式会社 ペリクル

Also Published As

Publication number Publication date
US20240377725A1 (en) 2024-11-14
TWI911482B (zh) 2026-01-11
WO2023038140A1 (ja) 2023-03-16
JP7691508B2 (ja) 2025-06-11
CN117916661A (zh) 2024-04-19
TW202313909A (zh) 2023-04-01
KR20240047425A (ko) 2024-04-12

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