KR20240036145A - 가스 엔클로저 시스템 - Google Patents

가스 엔클로저 시스템 Download PDF

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Publication number
KR20240036145A
KR20240036145A KR1020247007913A KR20247007913A KR20240036145A KR 20240036145 A KR20240036145 A KR 20240036145A KR 1020247007913 A KR1020247007913 A KR 1020247007913A KR 20247007913 A KR20247007913 A KR 20247007913A KR 20240036145 A KR20240036145 A KR 20240036145A
Authority
KR
South Korea
Prior art keywords
gas
gas enclosure
enclosure assembly
various embodiments
assembly
Prior art date
Application number
KR1020247007913A
Other languages
English (en)
Korean (ko)
Inventor
저스틴 모윅
알렉산더 소우-강 고
엘리야후 브론스키
샨돈 앨더슨
Original Assignee
카티바, 인크.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 카티바, 인크. filed Critical 카티바, 인크.
Publication of KR20240036145A publication Critical patent/KR20240036145A/ko

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/811Controlling the atmosphere during processing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J29/00Details of, or accessories for, typewriters or selective printing mechanisms not otherwise provided for
    • B41J29/12Guards, shields or dust excluders
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J29/00Details of, or accessories for, typewriters or selective printing mechanisms not otherwise provided for
    • B41J29/377Cooling or ventilating arrangements
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J3/00Typewriters or selective printing or marking mechanisms characterised by the purpose for which they are constructed
    • B41J3/407Typewriters or selective printing or marking mechanisms characterised by the purpose for which they are constructed for marking on special material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67155Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/6719Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the processing chambers, e.g. modular processing chambers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10Deposition of organic active material
    • H10K71/12Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/13Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
    • H10K71/135Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing using ink-jet printing

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electroluminescent Light Sources (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
KR1020247007913A 2011-12-22 2012-12-19 가스 엔클로저 시스템 KR20240036145A (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US201161579233P 2011-12-22 2011-12-22
US61/579,233 2011-12-22
PCT/US2012/070717 WO2013096503A1 (en) 2011-12-22 2012-12-19 Gas enclosure assembly and system
KR1020237015116A KR20230069251A (ko) 2011-12-22 2012-12-19 가스 엔클로저 시스템

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020237015116A Division KR20230069251A (ko) 2011-12-22 2012-12-19 가스 엔클로저 시스템

Publications (1)

Publication Number Publication Date
KR20240036145A true KR20240036145A (ko) 2024-03-19

Family

ID=48669466

Family Applications (7)

Application Number Title Priority Date Filing Date
KR1020247007913A KR20240036145A (ko) 2011-12-22 2012-12-19 가스 엔클로저 시스템
KR1020237015116A KR20230069251A (ko) 2011-12-22 2012-12-19 가스 엔클로저 시스템
KR1020217041139A KR102530263B1 (ko) 2011-12-22 2012-12-19 가스 엔클로저 시스템
KR1020187016567A KR102005688B1 (ko) 2011-12-22 2012-12-19 가스 엔클로저 시스템
KR1020197021637A KR20190090064A (ko) 2011-12-22 2012-12-19 가스 엔클로저 시스템
KR1020147020478A KR101869134B1 (ko) 2011-12-22 2012-12-19 가스 엔클로저 시스템
KR1020207032729A KR102341544B1 (ko) 2011-12-22 2012-12-19 가스 엔클로저 시스템

Family Applications After (6)

Application Number Title Priority Date Filing Date
KR1020237015116A KR20230069251A (ko) 2011-12-22 2012-12-19 가스 엔클로저 시스템
KR1020217041139A KR102530263B1 (ko) 2011-12-22 2012-12-19 가스 엔클로저 시스템
KR1020187016567A KR102005688B1 (ko) 2011-12-22 2012-12-19 가스 엔클로저 시스템
KR1020197021637A KR20190090064A (ko) 2011-12-22 2012-12-19 가스 엔클로저 시스템
KR1020147020478A KR101869134B1 (ko) 2011-12-22 2012-12-19 가스 엔클로저 시스템
KR1020207032729A KR102341544B1 (ko) 2011-12-22 2012-12-19 가스 엔클로저 시스템

Country Status (4)

Country Link
JP (4) JP6153539B2 (zh)
KR (7) KR20240036145A (zh)
TW (2) TWI623640B (zh)
WO (1) WO2013096503A1 (zh)

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US10434804B2 (en) 2008-06-13 2019-10-08 Kateeva, Inc. Low particle gas enclosure systems and methods
US8899171B2 (en) 2008-06-13 2014-12-02 Kateeva, Inc. Gas enclosure assembly and system
US12018857B2 (en) 2008-06-13 2024-06-25 Kateeva, Inc. Gas enclosure assembly and system
KR101878084B1 (ko) 2013-12-26 2018-07-12 카티바, 인크. 전자 장치의 열 처리를 위한 장치 및 기술
EP3975229A1 (en) * 2014-01-21 2022-03-30 Kateeva, Inc. Apparatus and techniques for electronic device encapsulation
CN110265326B (zh) 2014-04-30 2024-03-08 科迪华公司 用于衬底涂覆的气垫设备和技术
US9909022B2 (en) * 2014-07-25 2018-03-06 Kateeva, Inc. Organic thin film ink compositions and methods
US9753463B2 (en) 2014-09-12 2017-09-05 Applied Materials, Inc. Increasing the gas efficiency for an electrostatic chuck
JP6570147B2 (ja) * 2014-11-26 2019-09-04 カティーバ, インコーポレイテッド 環境的に制御されたコーティングシステム
KR20230165387A (ko) * 2015-07-31 2023-12-05 카티바, 인크. 잉크 전달 시스템 및 방법
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JP7306683B2 (ja) * 2019-05-29 2023-07-11 株式会社西部技研 ガス置換用ドライルーム
JP7344450B2 (ja) * 2020-03-05 2023-09-14 トヨタ自動車株式会社 電池作製設備および電極スタックの作製空間形成方法
KR102473786B1 (ko) 2021-01-07 2022-12-06 (주)유니젯 인클로저 시스템
KR102279864B1 (ko) * 2021-02-16 2021-07-22 (주)삼백테크놀로지 이중확산 자연대류 순환형 냉각장치 및 이를 이용한 대용량 엘이디 등기구
US11892382B2 (en) * 2021-08-27 2024-02-06 Taiwan Semiconductor Manufacturing Company Ltd. Method for detecting environmental parameter in semiconductor fabrication facility

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Also Published As

Publication number Publication date
KR102005688B1 (ko) 2019-10-01
TW201343948A (zh) 2013-11-01
KR102341544B1 (ko) 2021-12-21
JP2018200887A (ja) 2018-12-20
KR102530263B1 (ko) 2023-05-08
JP2019220472A (ja) 2019-12-26
KR20190090064A (ko) 2019-07-31
KR101869134B1 (ko) 2018-06-19
TW201716616A (zh) 2017-05-16
TWI568874B (zh) 2017-02-01
WO2013096503A1 (en) 2013-06-27
JP6605089B2 (ja) 2019-11-13
KR20210156856A (ko) 2021-12-27
JP6379255B2 (ja) 2018-08-22
TWI623640B (zh) 2018-05-11
KR20230069251A (ko) 2023-05-18
JP6153539B2 (ja) 2017-06-28
KR20140110967A (ko) 2014-09-17
JP2017228770A (ja) 2017-12-28
KR20200130757A (ko) 2020-11-19
KR20180069096A (ko) 2018-06-22
JP2015510254A (ja) 2015-04-02

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A107 Divisional application of patent