KR20230135595A - 리소그래피 장치, 어셈블리 및 방법 - Google Patents

리소그래피 장치, 어셈블리 및 방법 Download PDF

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Publication number
KR20230135595A
KR20230135595A KR1020237025933A KR20237025933A KR20230135595A KR 20230135595 A KR20230135595 A KR 20230135595A KR 1020237025933 A KR1020237025933 A KR 1020237025933A KR 20237025933 A KR20237025933 A KR 20237025933A KR 20230135595 A KR20230135595 A KR 20230135595A
Authority
KR
South Korea
Prior art keywords
membrane
film
lithographic apparatus
assembly
radiation beam
Prior art date
Application number
KR1020237025933A
Other languages
English (en)
Korean (ko)
Inventor
베르지 제라르두스 페르디난두스 텐
지미 헨드릭스
Original Assignee
에이에스엠엘 네델란즈 비.브이.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 에이에스엠엘 네델란즈 비.브이. filed Critical 에이에스엠엘 네델란즈 비.브이.
Publication of KR20230135595A publication Critical patent/KR20230135595A/ko

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020237025933A 2021-02-02 2022-01-12 리소그래피 장치, 어셈블리 및 방법 KR20230135595A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP21154767 2021-02-02
EP21154767.4 2021-02-02
PCT/EP2022/050471 WO2022167177A1 (en) 2021-02-02 2022-01-12 Lithographic apparatus, assembly, and method

Publications (1)

Publication Number Publication Date
KR20230135595A true KR20230135595A (ko) 2023-09-25

Family

ID=74505099

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020237025933A KR20230135595A (ko) 2021-02-02 2022-01-12 리소그래피 장치, 어셈블리 및 방법

Country Status (4)

Country Link
KR (1) KR20230135595A (zh)
CN (1) CN116802563A (zh)
TW (1) TW202234146A (zh)
WO (1) WO2022167177A1 (zh)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6835502B2 (en) * 2002-07-15 2004-12-28 International Business Machines Corporation In-situ pellicle monitor
JP5817976B2 (ja) * 2011-08-01 2015-11-18 株式会社ブイ・テクノロジー マイクロレンズアレイを使用したスキャン露光装置
JP6382298B2 (ja) * 2013-03-27 2018-08-29 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置

Also Published As

Publication number Publication date
WO2022167177A1 (en) 2022-08-11
CN116802563A (zh) 2023-09-22
TW202234146A (zh) 2022-09-01

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