KR20230123432A - 임프린트 장치, 임프린트 방법 및 물품 제조 방법 - Google Patents

임프린트 장치, 임프린트 방법 및 물품 제조 방법 Download PDF

Info

Publication number
KR20230123432A
KR20230123432A KR1020230013462A KR20230013462A KR20230123432A KR 20230123432 A KR20230123432 A KR 20230123432A KR 1020230013462 A KR1020230013462 A KR 1020230013462A KR 20230013462 A KR20230013462 A KR 20230013462A KR 20230123432 A KR20230123432 A KR 20230123432A
Authority
KR
South Korea
Prior art keywords
substrate
mold
imprint
contact
contacting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020230013462A
Other languages
English (en)
Korean (ko)
Inventor
요시히로 마츠오카
Original Assignee
캐논 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 캐논 가부시끼가이샤 filed Critical 캐논 가부시끼가이샤
Publication of KR20230123432A publication Critical patent/KR20230123432A/ko
Pending legal-status Critical Current

Links

Images

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7042Alignment for lithographic apparatus using patterning methods other than those involving the exposure to radiation, e.g. by stamping or imprinting
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/002Component parts, details or accessories; Auxiliary operations
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/022Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/026Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing of layered or coated substantially flat surfaces
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/022Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
    • B29C2059/023Microembossing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
KR1020230013462A 2022-02-16 2023-02-01 임프린트 장치, 임프린트 방법 및 물품 제조 방법 Pending KR20230123432A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2022022305A JP7759276B2 (ja) 2022-02-16 2022-02-16 インプリント装置、インプリント方法及び物品の製造方法
JPJP-P-2022-022305 2022-02-16

Publications (1)

Publication Number Publication Date
KR20230123432A true KR20230123432A (ko) 2023-08-23

Family

ID=87559561

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020230013462A Pending KR20230123432A (ko) 2022-02-16 2023-02-01 임프린트 장치, 임프린트 방법 및 물품 제조 방법

Country Status (3)

Country Link
US (1) US12547069B2 (https=)
JP (1) JP7759276B2 (https=)
KR (1) KR20230123432A (https=)

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011124346A (ja) * 2009-12-09 2011-06-23 Canon Inc インプリント装置及び物品の製造方法
JP2012084732A (ja) * 2010-10-13 2012-04-26 Canon Inc インプリント方法及び装置
JP2013021155A (ja) * 2011-07-12 2013-01-31 Canon Inc インプリント装置、およびそれを用いた物品の製造方法
JP5787691B2 (ja) * 2011-09-21 2015-09-30 キヤノン株式会社 インプリント装置、それを用いた物品の製造方法
JP5824380B2 (ja) * 2012-02-07 2015-11-25 キヤノン株式会社 インプリント装置、インプリント方法、及び物品の製造方法
JP5868215B2 (ja) * 2012-02-27 2016-02-24 キヤノン株式会社 インプリント装置およびインプリント方法、それを用いた物品の製造方法
JP6550178B2 (ja) * 2013-04-24 2019-07-24 キヤノン株式会社 インプリント方法、インプリント装置および物品の製造方法
JP6412317B2 (ja) * 2013-04-24 2018-10-24 キヤノン株式会社 インプリント方法、インプリント装置および物品の製造方法
JP6271875B2 (ja) * 2013-06-18 2018-01-31 キヤノン株式会社 インプリント装置、インプリント方法および物品の製造方法
JP6315963B2 (ja) * 2013-12-09 2018-04-25 キヤノン株式会社 インプリント装置、及び物品の製造方法
JP6294686B2 (ja) * 2014-02-04 2018-03-14 キヤノン株式会社 インプリント装置、インプリント方法及び物品の製造方法
JP6497849B2 (ja) * 2014-04-15 2019-04-10 キヤノン株式会社 インプリント装置、および物品の製造方法
JP6506521B2 (ja) * 2014-09-17 2019-04-24 キヤノン株式会社 インプリント方法、インプリント装置、および物品の製造方法
JP6457773B2 (ja) * 2014-10-07 2019-01-23 キヤノン株式会社 インプリント方法、インプリント装置及び物品製造方法
JP6549834B2 (ja) * 2014-11-14 2019-07-24 キヤノン株式会社 インプリント装置及び物品の製造方法
US10583608B2 (en) * 2015-02-09 2020-03-10 Canon Kabushiki Kaisha Lithography apparatus, control method therefor, and method of manufacturing article
JP6562795B2 (ja) 2015-02-12 2019-08-21 キヤノン株式会社 インプリント装置、および物品の製造方法
JP2016162928A (ja) * 2015-03-03 2016-09-05 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法
US10248018B2 (en) * 2015-03-30 2019-04-02 Canon Kabushiki Kaisha Imprint apparatus and method of manufacturing article
JP6553926B2 (ja) * 2015-04-09 2019-07-31 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法
JP6590598B2 (ja) * 2015-08-31 2019-10-16 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法
JP6748461B2 (ja) * 2016-03-22 2020-09-02 キヤノン株式会社 インプリント装置、インプリント装置の動作方法および物品製造方法
JP6761279B2 (ja) * 2016-05-16 2020-09-23 キヤノン株式会社 位置決め装置、リソグラフィー装置および物品製造方法
JP6882103B2 (ja) * 2017-07-04 2021-06-02 キヤノン株式会社 インプリント装置、および物品の製造方法
JP7060961B2 (ja) * 2018-01-05 2022-04-27 キヤノン株式会社 インプリント装置、インプリント方法および物品製造方法
JP7116605B2 (ja) * 2018-06-28 2022-08-10 キヤノン株式会社 インプリント材のパターンを形成するための方法、インプリント装置、インプリント装置の調整方法、および、物品製造方法
JP7324051B2 (ja) * 2019-05-28 2023-08-09 キヤノン株式会社 リソグラフィ装置、物品の製造方法及び制御方法

Also Published As

Publication number Publication date
JP7759276B2 (ja) 2025-10-23
US12547069B2 (en) 2026-02-10
US20230259023A1 (en) 2023-08-17
JP2023119412A (ja) 2023-08-28

Similar Documents

Publication Publication Date Title
KR102293478B1 (ko) 임프린트 장치 및 물품의 제조 방법
JP7171468B2 (ja) 情報処理装置、プログラム、リソグラフィ装置、物品の製造方法、物品の製造システム、及び出力方法
KR20190132216A (ko) 임프린트 장치 및 물품 제조 방법
US11681237B2 (en) Lithography apparatus and method of manufacturing article
US11194249B2 (en) Molding apparatus for molding composition on substrate with mold, and article manufacturing method
US11835871B2 (en) Imprint apparatus, imprint method, and article manufacturing method
US20200026202A1 (en) Method of manufacturing pattern and article manufacturing method
KR102854316B1 (ko) 임프린트 방법, 임프린트 장치 및 물품 제조 방법
US12528243B2 (en) Imprint apparatus, imprint method and article manufacturing method
KR20230123432A (ko) 임프린트 장치, 임프린트 방법 및 물품 제조 방법
US12076910B2 (en) Forming apparatus and article manufacturing method
US11237487B2 (en) Imprint apparatus and article manufacturing method
US11506974B2 (en) Imprint apparatus and article manufacturing method
US11820068B2 (en) Imprint apparatus and article manufacturing method
US12276908B2 (en) Imprint method and article manufacturing method
US20240242994A1 (en) Conveyance apparatus, conveyance method, lithography apparatus, and article manufacturing method
KR20220165650A (ko) 성형 장치, 성형 방법, 및 물품 제조 방법
JP2024171087A (ja) インプリント装置、インプリント方法、および物品の製造方法
JP2024090241A (ja) インプリント方法、インプリント装置、および物品の製造方法
KR20250033965A (ko) 임프린트 장치, 임프린트 방법, 정보 처리 장치 및 물품 제조 방법
JP2024093674A (ja) インプリント装置及び物品の製造方法

Legal Events

Date Code Title Description
PA0109 Patent application

St.27 status event code: A-0-1-A10-A12-nap-PA0109

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

A201 Request for examination
PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

D21 Rejection of application intended

Free format text: ST27 STATUS EVENT CODE: A-1-2-D10-D21-EXM-PE0902 (AS PROVIDED BY THE NATIONAL OFFICE)

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

P11 Amendment of application requested

Free format text: ST27 STATUS EVENT CODE: A-2-2-P10-P11-NAP-X000 (AS PROVIDED BY THE NATIONAL OFFICE)

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

D21 Rejection of application intended

Free format text: ST27 STATUS EVENT CODE: A-1-2-D10-D21-EXM-PE0902 (AS PROVIDED BY THE NATIONAL OFFICE)

PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902