KR20230016620A - 극자외 광원의 정렬 기술 - Google Patents
극자외 광원의 정렬 기술 Download PDFInfo
- Publication number
- KR20230016620A KR20230016620A KR1020227037425A KR20227037425A KR20230016620A KR 20230016620 A KR20230016620 A KR 20230016620A KR 1020227037425 A KR1020227037425 A KR 1020227037425A KR 20227037425 A KR20227037425 A KR 20227037425A KR 20230016620 A KR20230016620 A KR 20230016620A
- Authority
- KR
- South Korea
- Prior art keywords
- light
- metrology
- target
- light beam
- path
- Prior art date
Links
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- 239000013077 target material Substances 0.000 claims abstract description 70
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- 239000005337 ground glass Substances 0.000 claims description 4
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- 229910052744 lithium Inorganic materials 0.000 description 2
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910052724 xenon Inorganic materials 0.000 description 2
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- 229910000846 In alloy Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
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- 238000001459 lithography Methods 0.000 description 1
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- 238000000206 photolithography Methods 0.000 description 1
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Images
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
- H05G2/005—X-ray radiation generated from plasma being produced from a liquid or gas containing a metal as principal radiation generating component
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- General Physics & Mathematics (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202063031265P | 2020-05-28 | 2020-05-28 | |
| US63/031,265 | 2020-05-28 | ||
| PCT/EP2021/060794 WO2021239357A1 (en) | 2020-05-28 | 2021-04-26 | Alignment of extreme ultraviolet light source |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20230016620A true KR20230016620A (ko) | 2023-02-02 |
Family
ID=75787039
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020227037425A KR20230016620A (ko) | 2020-05-28 | 2021-04-26 | 극자외 광원의 정렬 기술 |
Country Status (4)
| Country | Link |
|---|---|
| KR (1) | KR20230016620A (zh) |
| CN (1) | CN115669232A (zh) |
| TW (1) | TW202202945A (zh) |
| WO (1) | WO2021239357A1 (zh) |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6513025B2 (ja) * | 2013-09-17 | 2019-05-15 | ギガフォトン株式会社 | 極端紫外光生成装置 |
| US11029324B2 (en) * | 2018-09-28 | 2021-06-08 | Taiwan Semiconductor Manufacturing Co., Ltd. | Particle image velocimetry of extreme ultraviolet lithography systems |
-
2021
- 2021-04-26 WO PCT/EP2021/060794 patent/WO2021239357A1/en active Application Filing
- 2021-04-26 CN CN202180037890.1A patent/CN115669232A/zh active Pending
- 2021-04-26 KR KR1020227037425A patent/KR20230016620A/ko active Search and Examination
- 2021-04-30 TW TW110115736A patent/TW202202945A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| CN115669232A (zh) | 2023-01-31 |
| WO2021239357A1 (en) | 2021-12-02 |
| TW202202945A (zh) | 2022-01-16 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A201 | Request for examination |