KR20220093105A - 염화수소의 탈습 방법 - Google Patents

염화수소의 탈습 방법 Download PDF

Info

Publication number
KR20220093105A
KR20220093105A KR1020227012121A KR20227012121A KR20220093105A KR 20220093105 A KR20220093105 A KR 20220093105A KR 1020227012121 A KR1020227012121 A KR 1020227012121A KR 20227012121 A KR20227012121 A KR 20227012121A KR 20220093105 A KR20220093105 A KR 20220093105A
Authority
KR
South Korea
Prior art keywords
sulfuric acid
concentrated sulfuric
dehumidification
hydrogen chloride
concentration
Prior art date
Application number
KR1020227012121A
Other languages
English (en)
Korean (ko)
Inventor
준야 사카이
쇼지 이이야마
Original Assignee
가부시끼가이샤 도꾸야마
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=75158378&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=KR20220093105(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by 가부시끼가이샤 도꾸야마 filed Critical 가부시끼가이샤 도꾸야마
Priority claimed from PCT/JP2020/033526 external-priority patent/WO2021095329A1/ja
Publication of KR20220093105A publication Critical patent/KR20220093105A/ko

Links

Images

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/26—Drying gases or vapours
    • B01D53/28—Selection of materials for use as drying agents
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
    • C01B33/10742—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material
    • C01B33/10757—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material with the preferential formation of trichlorosilane
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/26—Drying gases or vapours
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/26—Drying gases or vapours
    • B01D53/263—Drying gases or vapours by absorption
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
    • C01B33/10742—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material
    • C01B33/10757—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material with the preferential formation of trichlorosilane
    • C01B33/10763—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material with the preferential formation of trichlorosilane from silicon
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B7/00—Halogens; Halogen acids
    • C01B7/01—Chlorine; Hydrogen chloride
    • C01B7/07—Purification ; Separation
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B7/00—Halogens; Halogen acids
    • C01B7/01—Chlorine; Hydrogen chloride
    • C01B7/07—Purification ; Separation
    • C01B7/0706—Purification ; Separation of hydrogen chloride
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2251/00—Reactants
    • B01D2251/50—Inorganic acids
    • B01D2251/506—Sulfuric acid
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2252/00—Absorbents, i.e. solvents and liquid materials for gas absorption
    • B01D2252/10—Inorganic absorbents
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2256/00—Main component in the product gas stream after treatment
    • B01D2256/26—Halogens or halogen compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/30—Sulfur compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Drying Of Gases (AREA)
  • Gas Separation By Absorption (AREA)
  • Silicon Compounds (AREA)
KR1020227012121A 2019-11-13 2020-09-04 염화수소의 탈습 방법 KR20220093105A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2019-205560 2019-11-13
JP2019205560 2019-11-13
PCT/JP2020/033526 WO2021095329A1 (ja) 2019-11-13 2020-09-04 塩化水素の脱湿方法

Publications (1)

Publication Number Publication Date
KR20220093105A true KR20220093105A (ko) 2022-07-05

Family

ID=75158378

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020227012121A KR20220093105A (ko) 2019-11-13 2020-09-04 염화수소의 탈습 방법

Country Status (5)

Country Link
US (1) US20220371886A1 (zh)
JP (1) JP6853424B1 (zh)
KR (1) KR20220093105A (zh)
CN (1) CN114555517B (zh)
DE (1) DE112020005549T5 (zh)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN202265420U (zh) 2011-09-30 2012-06-06 河南尚宇新能源股份有限公司 一种用于三氯氢硅的浓硫酸干燥设备

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4227890A (en) * 1978-05-11 1980-10-14 Olin Corporation Process for cooling and drying chlorine gas
JP2761659B2 (ja) * 1989-12-07 1998-06-04 鐘淵化学工業株式会社 塩素ガスの乾操方法
DE102006023261A1 (de) * 2006-05-18 2007-11-22 Bayer Materialscience Ag Verfahren zur Herstellung von Chlor aus Chlorwasserstoff und Sauerstoff
CN102530873A (zh) * 2011-12-21 2012-07-04 河南尚宇新能源股份有限公司 一种氯化氢脱水设备及工艺
CN105947983B (zh) * 2016-05-09 2018-11-30 杭州中昊科技有限公司 一种无水氯化氢的制备方法
CN106955567A (zh) * 2017-04-01 2017-07-18 湖北汇达科技发展有限公司 一种氯化氢组合干燥系统
JP2022065420A (ja) 2020-10-15 2022-04-27 セイコーエプソン株式会社 液滴吐出装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN202265420U (zh) 2011-09-30 2012-06-06 河南尚宇新能源股份有限公司 一种用于三氯氢硅的浓硫酸干燥设备

Also Published As

Publication number Publication date
DE112020005549T5 (de) 2022-08-25
CN114555517A (zh) 2022-05-27
CN114555517B (zh) 2024-05-14
JPWO2021095329A1 (ja) 2021-11-25
JP6853424B1 (ja) 2021-03-31
US20220371886A1 (en) 2022-11-24

Similar Documents

Publication Publication Date Title
US7794523B2 (en) Method for the recovery and re-use of process gases
TW201833091A (zh) 處理環氧乙烷之方法及系統
JP4922804B2 (ja) 含水有機化合物の脱水方法
US9186596B2 (en) Method and apparatus for odorant removal
US9540296B2 (en) Process for drying HCFO-1233zd
CN109173598B (zh) 利用复合溶剂回收粘胶纤维废气中cs2的方法
CN101318635A (zh) 高纯度氮气的制备方法及制备装置
WO2021095329A1 (ja) 塩化水素の脱湿方法
KR20220093105A (ko) 염화수소의 탈습 방법
CN103551007B (zh) 处理多晶硅还原尾气的方法和系统
RU2235710C2 (ru) Способ получения высокочистого моноэтиленгликоля
CN104709879A (zh) 脱除氯化苯生产的副产盐酸中有机物的工艺
JP6284404B2 (ja) トリチウム回収装置および方法
CN102935325A (zh) 一种减少丁基橡胶生产过程中氯甲烷物耗的方法
CN106349188A (zh) 一种脱丙烯、脱氧工艺
CN108483405A (zh) 一种双氧水后处理碱洗方法
CN110482764A (zh) 蒽醌法生产双氧水工艺中萃余液的再生系统
CN112473288B (zh) 一种酸浴洗涤除尘装置和方法
CN110121480A (zh) 精制过氧化氢水溶液的制造方法和制造系统
JP6209352B2 (ja) 精製アルコール中の酸化物を低減する方法及びアルコール精製装置
CN105032116B (zh) 一种氟碳烷烃生产装置中尾气的回收方法
CN105985261B (zh) 乙腈精制方法
CN219307959U (zh) 聚烯烃弹性体聚合溶剂除杂装置
CN107804827A (zh) 一种氯化氢回收方法及氯化氢回收系统
CN1561330A (zh) 制备尿素的方法