KR20220028041A - 보호층 형성용 조성물, 층상막, 보호층, 적층체 및 반도체 디바이스의 제조 방법 - Google Patents

보호층 형성용 조성물, 층상막, 보호층, 적층체 및 반도체 디바이스의 제조 방법 Download PDF

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KR20220028041A
KR20220028041A KR1020227003190A KR20227003190A KR20220028041A KR 20220028041 A KR20220028041 A KR 20220028041A KR 1020227003190 A KR1020227003190 A KR 1020227003190A KR 20227003190 A KR20227003190 A KR 20227003190A KR 20220028041 A KR20220028041 A KR 20220028041A
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South Korea
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preferable
protective layer
group
composition
molecular weight
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KR1020227003190A
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English (en)
Korean (ko)
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히데키 타카쿠와
카즈토 시마다
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후지필름 가부시키가이샤
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Publication of KR20220028041A publication Critical patent/KR20220028041A/ko

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/06—Ethers; Acetals; Ketals; Ortho-esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L29/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical; Compositions of hydrolysed polymers of esters of unsaturated alcohols with saturated carboxylic acids; Compositions of derivatives of such polymers
    • C08L29/02—Homopolymers or copolymers of unsaturated alcohols
    • C08L29/04—Polyvinyl alcohol; Partially hydrolysed homopolymers or copolymers of esters of unsaturated alcohols with saturated carboxylic acids
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • H01L51/107—
    • H01L51/448—
    • H01L51/5253—
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
    • H10K10/80—Constructional details
    • H10K10/88—Passivation; Containers; Encapsulations
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
    • H10K30/80—Constructional details
    • H10K30/88—Passivation; Containers; Encapsulations
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/549—Organic PV cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Engineering & Computer Science (AREA)
  • Electromagnetism (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Materials For Photolithography (AREA)
  • Laminated Bodies (AREA)
KR1020227003190A 2019-07-30 2020-07-28 보호층 형성용 조성물, 층상막, 보호층, 적층체 및 반도체 디바이스의 제조 방법 KR20220028041A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2019-140023 2019-07-30
JP2019140023 2019-07-30
PCT/JP2020/028783 WO2021020361A1 (ja) 2019-07-30 2020-07-28 保護層形成用組成物、層状膜、保護層、積層体および半導体デバイスの製造方法

Publications (1)

Publication Number Publication Date
KR20220028041A true KR20220028041A (ko) 2022-03-08

Family

ID=74230692

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020227003190A KR20220028041A (ko) 2019-07-30 2020-07-28 보호층 형성용 조성물, 층상막, 보호층, 적층체 및 반도체 디바이스의 제조 방법

Country Status (4)

Country Link
JP (1) JP7182007B2 (ja)
KR (1) KR20220028041A (ja)
TW (1) TW202121712A (ja)
WO (1) WO2021020361A1 (ja)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014044810A (ja) 2012-08-24 2014-03-13 Canon Inc 有機ｅｌ装置の製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0356954A3 (en) * 1988-08-30 1991-05-08 E.I. Du Pont De Nemours And Company A plasticized polyvinyl alcohol release layer for a flexographic printing plate
JPH0816781B2 (ja) * 1991-06-28 1996-02-21 ソマール株式会社 感光性組成物
JP2004302208A (ja) * 2003-03-31 2004-10-28 Fuji Photo Film Co Ltd 平版印刷版原版の製造方法
JP5025107B2 (ja) * 2004-08-23 2012-09-12 株式会社半導体エネルギー研究所 半導体装置の作製方法
KR20190105117A (ko) * 2015-04-28 2019-09-11 후지필름 가부시키가이샤 적층체 및 키트

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014044810A (ja) 2012-08-24 2014-03-13 Canon Inc 有機ｅｌ装置の製造方法

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Publication number Publication date
JPWO2021020361A1 (ja) 2021-02-04
TW202121712A (zh) 2021-06-01
JP7182007B2 (ja) 2022-12-01
WO2021020361A1 (ja) 2021-02-04

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