KR20220011084A - 리소그래피 장치, 마크 형성방법 및 패턴 형성방법 - Google Patents

리소그래피 장치, 마크 형성방법 및 패턴 형성방법 Download PDF

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Publication number
KR20220011084A
KR20220011084A KR1020210090689A KR20210090689A KR20220011084A KR 20220011084 A KR20220011084 A KR 20220011084A KR 1020210090689 A KR1020210090689 A KR 1020210090689A KR 20210090689 A KR20210090689 A KR 20210090689A KR 20220011084 A KR20220011084 A KR 20220011084A
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KR
South Korea
Prior art keywords
mark
substrate
forming
unit
lithographic apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020210090689A
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English (en)
Korean (ko)
Inventor
타이치 요시오카
노부유키 카와바타
켄지 이케다
마사토 안자이
타수쿠 스즈키
준 키타가와
Original Assignee
캐논 가부시끼가이샤
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Publication date
Application filed by 캐논 가부시끼가이샤 filed Critical 캐논 가부시끼가이샤
Publication of KR20220011084A publication Critical patent/KR20220011084A/ko
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/708—Mark formation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020210090689A 2020-07-20 2021-07-12 리소그래피 장치, 마크 형성방법 및 패턴 형성방법 Pending KR20220011084A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020123746A JP7516143B2 (ja) 2020-07-20 2020-07-20 リソグラフィ装置、マーク形成方法、及びパターン形成方法
JPJP-P-2020-123746 2020-07-20

Publications (1)

Publication Number Publication Date
KR20220011084A true KR20220011084A (ko) 2022-01-27

Family

ID=79460363

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020210090689A Pending KR20220011084A (ko) 2020-07-20 2021-07-12 리소그래피 장치, 마크 형성방법 및 패턴 형성방법

Country Status (3)

Country Link
JP (1) JP7516143B2 (enExample)
KR (1) KR20220011084A (enExample)
CN (1) CN113960898A (enExample)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2019200444A (ja) 2019-08-30 2019-11-21 キヤノン株式会社 リソグラフィ装置、パターン形成方法及び物品の製造方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07295230A (ja) * 1994-04-25 1995-11-10 Dainippon Screen Mfg Co Ltd 拡大投影型露光装置における投影像のアライメント方法
JP3892565B2 (ja) * 1997-02-28 2007-03-14 株式会社東芝 パターン形成方法
JP2001223147A (ja) 2000-02-09 2001-08-17 Canon Inc 投影露光方法、露光装置およびデバイス製造方法
JP2002280288A (ja) 2001-03-19 2002-09-27 Nikon Corp 較正用基準ウエハ、較正方法、位置検出方法、位置検出装置、及び露光装置
JP4151286B2 (ja) 2002-03-14 2008-09-17 日本電気株式会社 重ね合わせ露光方法と露光装置
US20060012779A1 (en) 2004-07-13 2006-01-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7415319B2 (en) * 2006-04-04 2008-08-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2009198793A (ja) 2008-02-21 2009-09-03 Dainippon Screen Mfg Co Ltd 光の照射位置の補正方法およびパターン描画装置
WO2017067748A1 (en) 2015-10-19 2017-04-27 Asml Netherlands B.V. Method and apparatus to reduce effects of nonlinear behavior
JP6584567B1 (ja) * 2018-03-30 2019-10-02 キヤノン株式会社 リソグラフィ装置、パターン形成方法及び物品の製造方法
JP6861693B2 (ja) 2018-12-06 2021-04-21 キヤノン株式会社 形成方法、システム、リソグラフィ装置、物品の製造方法、およびプログラム

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2019200444A (ja) 2019-08-30 2019-11-21 キヤノン株式会社 リソグラフィ装置、パターン形成方法及び物品の製造方法

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CN113960898A (zh) 2022-01-21
JP2022020322A (ja) 2022-02-01
JP7516143B2 (ja) 2024-07-16

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