KR20210092130A - 노광 장치, 및 물품의 제조 방법 - Google Patents

노광 장치, 및 물품의 제조 방법 Download PDF

Info

Publication number
KR20210092130A
KR20210092130A KR1020200181556A KR20200181556A KR20210092130A KR 20210092130 A KR20210092130 A KR 20210092130A KR 1020200181556 A KR1020200181556 A KR 1020200181556A KR 20200181556 A KR20200181556 A KR 20200181556A KR 20210092130 A KR20210092130 A KR 20210092130A
Authority
KR
South Korea
Prior art keywords
light
optical system
projection optical
measurement
receiving element
Prior art date
Application number
KR1020200181556A
Other languages
English (en)
Korean (ko)
Inventor
미츠루 이노우에
아츠시 이토
Original Assignee
캐논 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 캐논 가부시끼가이샤 filed Critical 캐논 가부시끼가이샤
Publication of KR20210092130A publication Critical patent/KR20210092130A/ko

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
KR1020200181556A 2020-01-15 2020-12-23 노광 장치, 및 물품의 제조 방법 KR20210092130A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020004671A JP7453790B2 (ja) 2020-01-15 2020-01-15 露光装置、および物品の製造方法
JPJP-P-2020-004671 2020-01-15

Publications (1)

Publication Number Publication Date
KR20210092130A true KR20210092130A (ko) 2021-07-23

Family

ID=76772241

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020200181556A KR20210092130A (ko) 2020-01-15 2020-12-23 노광 장치, 및 물품의 제조 방법

Country Status (3)

Country Link
JP (1) JP7453790B2 (ja)
KR (1) KR20210092130A (ja)
CN (1) CN113126448A (ja)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017072678A (ja) 2015-10-06 2017-04-13 キヤノン株式会社 露光装置、露光方法、及び物品の製造方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3448614B2 (ja) * 1993-08-12 2003-09-22 株式会社ニコン 投影露光方法、走査型投影露光装置、及び素子製造方法
JPH10289864A (ja) * 1997-04-11 1998-10-27 Nikon Corp 投影露光装置
JP3421922B2 (ja) * 2000-02-22 2003-06-30 富士写真光機株式会社 アライメント変動測定装置
JP2005294608A (ja) * 2004-04-01 2005-10-20 Nikon Corp 放電光源ユニット、照明光学装置、露光装置および露光方法
US7508489B2 (en) * 2004-12-13 2009-03-24 Carl Zeiss Smt Ag Method of manufacturing a miniaturized device
US7307262B2 (en) * 2004-12-23 2007-12-11 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7999939B2 (en) * 2007-08-17 2011-08-16 Asml Holding N.V. Real time telecentricity measurement
DE102008004762A1 (de) * 2008-01-16 2009-07-30 Carl Zeiss Smt Ag Projektionsbelichtungsanlage für die Mikrolithographie mit einer Messeinrichtung
JP2014135368A (ja) * 2013-01-09 2014-07-24 Canon Inc 露光装置、計測方法及びデバイスの製造方法
JP2017172678A (ja) * 2016-03-23 2017-09-28 Ntn株式会社 極低温環境用転がり軸受

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017072678A (ja) 2015-10-06 2017-04-13 キヤノン株式会社 露光装置、露光方法、及び物品の製造方法

Also Published As

Publication number Publication date
JP7453790B2 (ja) 2024-03-21
TW202129431A (zh) 2021-08-01
CN113126448A (zh) 2021-07-16
JP2021110905A (ja) 2021-08-02

Similar Documents

Publication Publication Date Title
KR101914536B1 (ko) 리소그래피 장치
US7965387B2 (en) Image plane measurement method, exposure method, device manufacturing method, and exposure apparatus
CN102314092B (zh) 位置传感器和光刻设备
US6819414B1 (en) Aberration measuring apparatus, aberration measuring method, projection exposure apparatus having the same measuring apparatus, device manufacturing method using the same measuring method, and exposure method
CN102193327B (zh) 光刻设备和器件制造方法
EP1079223A1 (en) Aberration measuring instrument and measuring method, projection exposure apparatus provided with the instrument and device-manufacturing method using the measuring method, and exposure method
JP5457767B2 (ja) 露光装置およびデバイス製造方法
JP2009252851A (ja) 露光装置及びデバイス製造方法
US20100209832A1 (en) Measurement apparatus, exposure apparatus, and device fabrication method
KR101476865B1 (ko) 노광 장치와 노광 방법, 및 디바이스 제조 방법
KR101562074B1 (ko) 면 위치 검출 장치, 면 위치 검출 방법, 노광 장치, 및 디바이스 제조 방법
JP2014135368A (ja) 露光装置、計測方法及びデバイスの製造方法
JP2002170754A (ja) 露光装置、光学特性検出方法及び露光方法
JP4099122B2 (ja) リソグラフ装置およびデバイスの製造方法
KR20210092130A (ko) 노광 장치, 및 물품의 제조 방법
TWI836164B (zh) 曝光裝置及物品的製造方法
WO2012073483A1 (ja) マーク検出方法、露光方法及び露光装置、並びにデバイス製造方法
US20160025480A1 (en) Interferometric level sensor
JP2005501241A (ja) 複数経路干渉分光法
WO2010143652A1 (ja) 露光方法及び装置、並びにデバイス製造方法
JP2022188520A (ja) ステージ装置、露光装置、及び物品の製造方法
WO2022078657A1 (en) Interferometer system and lithographic apparatus
JPH09237755A (ja) 投影露光装置
JP5565613B2 (ja) 計測方法、露光方法及び露光装置、並びにデバイス製造方法
JP2021089361A (ja) ステージ駆動装置

Legal Events

Date Code Title Description
A201 Request for examination