KR20200088270A - Optical device attachment structure and exposure device - Google Patents

Abstract

It is possible to prevent the optical axis from shaking when the optical device is moved up and down. In the frame, an annular hole penetrating in the substantially vertical direction is formed, and a guide member 70 having a substantially thin plate shape and an approximately disc shape in a plan view is provided in the frame so as to cover the annular hole. The attachment hole 74 formed at approximately the center of the guide member 70 is disposed in a substantially concentric shape with the annular hole, and the normal portion is inserted into the attachment hole 74 such that the optical axis approximately coincides with the center of the attachment hole 74. It is fixed to the guide member (70).

Description

Optical device attachment structure and exposure device

The present invention relates to an attachment structure and an exposure device for an optical device.

Patent Document 1 discloses an exposure apparatus that, when performing exposure processing on a sheet film provided on an exposure table, raises and lowers the exposure table and controls a prism pair constituting the exposure head to perform focus adjustment processing.

Japanese Patent Publication 2006-235457

In the invention described in Patent Document 1, focus adjustment is performed by changing the thickness of the prism pair, but aberration occurs when the optical path length is changed in the convergence light, and therefore the performance of the optical system is changed by focus adjustment. As described above, when focusing of the exposure head is performed by changing the arrangement of the optical components, there is a fear that the optical performance cannot be optimized.

To cope with this problem, a method of vertically moving the entire optical device without changing the arrangement of the optical components can be considered. However, when the entire optical device is moved up and down, the optical axis is shaken (the position in the horizontal direction of the optical axis is shifted) in accordance with the vertical motion, and there is a fear that rendering accuracy may be lowered. Particularly in the case of providing a plurality of optical devices, since the relative relationship between the plurality of optical devices is important, it is necessary to make the amount of shaking of the optical axis smaller.

Moreover, in the apparatus for manufacturing a printed circuit board as described in Patent Document 1, lenses having a NA (Numerical Aperture) of about 0.2 to 0.3 are generally used. However, when the prism pair described in the invention described in Patent Document 1 is applied to a device using a lens having a NA of about 0.65, the aberration becomes large and the range in which focus can be focused is narrowed.

The present invention has been made in view of such circumstances, and an object of the present invention is to provide an optical device attachment structure and an exposure device that can prevent the optical axis from shaking when the optical device is moved up and down.

In order to solve the above problems, the attachment structure of the optical device according to the present invention includes, for example, an optical device having a normal portion, a frame for assembling the optical device, and the optical device during assembly of the optical device. And a substantially thin plate-like guide member provided between the frame, and a driving unit installed in the frame and moving the optical device in the vertical direction, wherein the frame is formed with a hole that penetrates in the substantially vertical direction. , The guide member is substantially disc-shaped in planar view, and is installed in the frame so as to cover the hole, and an attachment hole is formed in the center of the guide member, and the attachment hole is substantially concentric with the hole. It is arranged, and the normal portion is characterized in that the optical axis is inserted into the attachment hole so as to approximately coincide with the center of the attachment hole and fixed to the guide member.

According to the attachment structure of the optical device according to the present invention, a ring is formed in the frame in a substantially vertical direction, and a guide member having a substantially thin plate shape and a planar shape in a planar shape is provided on the frame so as to cover the ring hole. The attachment hole formed in the center of the guide member is disposed in a substantially concentric shape with the annular hole, and the normal portion is inserted into the attachment hole so that the optical axis approximately coincides with the center of the attachment hole and fixed to the guide member. By uniformly deforming the guide member in this way, the optical axis is prevented from shaking when the optical device is moved up and down, that is, the optical device can be moved in the vertical direction without moving the optical device in the horizontal direction.

Here, the frame has a bottom plate installed substantially horizontally and a support plate installed substantially horizontally and on the upper side of the bottom plate, wherein the first hole and the second hole, which are the holes, are formed on the bottom plate and the support plate, respectively. In the planar view, when the center of the first ring hole and the center of the second ring hole approximately coincide, and when the optical device is assembled to the frame, the center of the optical device is the drive unit to the optical device. It may be located near the pushing position. Thereby, the driving part pushes the optical device near the center of the optical device, and the vertical motion of the optical device can be stabilized.

Here, the frame has a support part installed substantially horizontally, a column installed at both ends of the support part, and a moving mechanism for moving the support part in a vertical direction, wherein the support part is formed with a sliding surface on the support part side, and the pillar In, a pillar-side sliding surface is formed to face the sliding surface on the support portion side, the support portion is formed of a magnetic material, and a permanent magnet and an electromagnet having permanent magnets and electromagnets are installed on the pillar, and the moving mechanism is the support portion. When not moving, the electromagnet attracts the support portion by applying a current to the coil of the electromagnet, and the sliding surface on the support portion side and the sliding surface on the column side may be in close contact. Thereby, by moving the support part, that is, the whole optical device in the vertical direction, the optical device can be moved up and down without moving the optical axis. In addition, when the support portion is not moved, the support portion can be supported by friction between the support side side sliding surface and the column side sliding surface so that the position in the height direction of the support portion does not change by bringing the support side side sliding surface and the column side sliding surface into close contact. have.

Here, the moving mechanism has a rack installed in the vertical direction on a cross section substantially perpendicular to the longitudinal direction of the support portion, and a pinion rotatably installed on the pillar, and the teeth of the rack include: It may be located on a line passing through the center of the support portion and substantially parallel to the vertical direction. This makes it possible to prevent moments from occurring when the support is moved up and down.

Here, the guide member may be formed of a metal having a thickness of approximately 0.1 mm (about 0.1 mm). Thereby, it is easy to deform, and it can be set as a strong guide member.

Here, a plurality of annular fan-shaped cutout holes may be formed in the guide member along the circumferential direction. Thereby, the optical device can be moved in the rotational direction.

Here, the guide member is formed of a metal having a thickness of approximately 1 mm (approximately 1 mm), and the guide member is formed with a plurality of first cutout holes and second cutout holes each having an arc shape, The second cut-out hole is disposed outside the first cut-out hole, and includes an end region including a step of the first cut-out hole and a step of the second cut-out hole. The end region to be said may have substantially the same position in the circumferential direction. Thereby, even if a relatively thick metal plate having a thickness of approximately 1 mm is used as a guide member, the amount of deformation can be made substantially constant regardless of the place in the circumferential direction. In addition, since the guide member is relatively thick, the possibility that the guide member plastically deforms beyond the elastic limit can be reduced.

Here, the guide member has an approximately annular first thickness part along an outer circumference, and an approximately annular second thickness part approximately along the attachment hole, and the guide member and the frame through the first thickness part. This is fixed, and the guide member and the normal part may be fixed through the second thickening part. Thereby, deformation of a guide member can be prevented.

Here, the optical device has an AF (Auto Focus) processing unit having an AF (Auto Focus) light source for irradiating downward light and an AF (Auto Focus) sensor to which reflected light is incident, and attached to the guide member. On the line passing through the center of the hole, two holes are formed to sandwich the attachment hole, and the two holes may overlap the positions of the AF light source and the AF sensor in plan view. This enables AF processing of the optical device even when a guide member is used.

Here, the optical device has an AF processing unit having an AF light source for irradiating downward light and an AF sensor through which reflected light is incident, and the cut-out hole is formed by the AF light source and the AF sensor in plan view. You may overlap with the location. This enables AF processing of the optical device even when a guide member is used.

In order to solve the above problems, the exposure apparatus according to the present invention includes, for example, a plate on which a workpiece is placed, a normal portion, and a light irradiation portion that irradiates light to the workpiece, and the light irradiation portion By assembling, the frame holding the light irradiation portion above the plate, and when assembling the light irradiation portion, an approximately thin plate-like guide member provided between the light irradiation portion and the frame, and provided on the frame A driving portion for moving the light irradiation portion in the vertical direction is provided, and in the frame, an annular hole penetrating in the substantially vertical direction is formed, and the guide member is installed in the frame to cover the annular hole, and the guide member is flat When it is substantially disc-shaped, an attachment hole is formed in the center portion, and the attachment hole is disposed in a substantially concentric shape with the annular hole, and the normal portion is inserted into the attachment hole so that the optical axis approximately coincides with the center of the attachment hole It is characterized in that it is fixed to the guide member. By uniformly deforming the guide member in this way, the optical axis can be prevented from shaking when the optical device is moved up and down.

According to the present invention, it is possible to prevent the optical axis from shaking when the optical device is moved up and down.

1 is a perspective view showing an outline of an exposure apparatus 1 according to a first embodiment.
2 is a schematic view showing a state in which the measurement unit 40 and the laser interferometer 50 measure the position of the mask holding unit 20.
3 is a perspective view schematically showing the supporting portion 15a of the frame 15, and is a view seen from the back side (+x side).
4 is a perspective view schematically showing the supporting portion 15a of the frame 15, and is a view seen from the front side (-x side).
FIG. 5 is a diagram showing an outline when the frame 15 is cut with the surface C of FIG. 3.
6 is a perspective view of a main part showing an outline of the light irradiation part 30a.
7 is a side view showing an outline of the driving unit 39a.
8 is a perspective view showing an outline of the reading portion 60a, and is a view through the main portion.
9A shows a positional relationship between the bottom plate 151 and the guide member 70 when the guide member 70 is attached to the bottom plate 151, and (B) guides the support plate 153. The positional relationship between the support plate 153 and the guide member 70A when the member 70A is attached is shown.
10 is an exploded perspective view of an attachment structure in a portion where the light irradiation unit 30a is attached to the bottom plate 151.
11 is a view showing a state in which the light irradiation unit 30a is attached to the frame 15.
12(A) shows a state in which the light irradiation unit 30a is not moving (center of a stroke), and (B) shows a state in which the light irradiation unit 30a is moved downward (bottom of the stroke), (C) shows the state in which the light irradiation unit 30a has moved upward (the upper end of the stroke).
13 is a block diagram showing the electrical configuration of the exposure apparatus 1.
14 is an exposure apparatus according to the second embodiment, (A) is the position of the bottom plate 151 and the guide member 70B when the guide member 70B is attached to the bottom plate 151 (B) shows the positional relationship between the support plate 153 and the guide member 70C when the guide member 70C is attached to the support plate 153.
15 is an exploded perspective view of the attachment structure in a portion where the light irradiation portion 30a is attached to the support plate 153.
16 is a view showing a state in which the light irradiation unit 30a is attached to the frame 15.
Fig. 17 shows the position of the bottom plate 151 and the guide member 70D when the guide member 70D is attached to the bottom plate 151 in the exposure apparatus according to the third embodiment. (B) shows the positional relationship between the support plate 153 and the guide member 70E when the guide member 70E is attached to the support plate 153.
18A is a diagram showing the outline of the guide portion main body 71D, and (B) is a diagram showing the outline of the guide portion main body 71E.
19 is an exploded perspective view of the attachment structure in a portion where the light irradiation unit 30a is attached to the support plate 153.

Hereinafter, an embodiment in which the present invention is applied to an exposure apparatus that generates a photomask by irradiating light such as a laser while moving a photosensitive substrate (for example, a glass substrate) held in a substantially horizontal direction in the scanning direction For example, it will be described in detail with reference to the drawings. In each drawing, the same reference numeral is attached to the same element, and the description of the overlapped portion is omitted.

As the photosensitive substrate, for example, quartz glass having a very small thermal expansion coefficient (for example, about 5.5×10 ⁻⁷ /K) is used. The photomask generated by the exposure apparatus is, for example, an exposure mask used for manufacturing a substrate for a liquid crystal display device. In a photomask, a transfer pattern for one or a plurality of image devices is formed on a large, substantially rectangular substrate having one side of, for example, over 1m (for example, 1400 mm×1220 mm). Hereinafter, the term mask M is used as a concept encompassing photosensitive substrates before, during, and after processing.

However, the exposure apparatus of the present invention is not limited to the mask manufacturing apparatus. The exposure apparatus of the present invention is a concept including various apparatuses that irradiate light (including laser, UV, polarized light, etc.) while moving a substrate held in a substantially horizontal direction in a scanning direction. Moreover, the optical device of the present invention is also not limited to a light irradiation unit that irradiates light on a photosensitive substrate.

1 is a perspective view showing an outline of an exposure apparatus 1 according to a first embodiment. The exposure apparatus 1 mainly includes a platen 11, a plate-shaped section 12, rails 13 and 14, a frame 15, a mask holding section 20, and a light irradiation section 30. , A measurement unit 40 (see FIG. 2 ), a laser interferometer 50, and a reading unit 60. In addition, in FIG. 1, illustration of some components is omitted. In addition, the exposure apparatus 1 is maintained at a constant temperature by a temperature adjusting unit (not shown) covering the entire apparatus.

The platen 11 is a substantially rectangular parallelepiped (thick plate) member, and is formed of, for example, a stone (for example, granite) or a low-expansion casting (for example, a nickel-based alloy). The surface plate 11 has an upper surface 11a that is substantially horizontal (approximately parallel to the xy plane) on the upper side (+z side).

The platen 11 is placed on a plurality of vibration damping tables (not shown) placed on an installation surface (for example, an image). Thereby, the surface plate 11 is mounted on the installation surface through the vibration isolation table. Since the vibration isolation table is already known, a detailed description is omitted. Also, a vibration isolation table is not essential. On the +x side of the surface plate 11, a loader (not shown) for installing the mask M on the mask holding portion 20 is provided.

The rail 13 is an elongated plate-shaped member made of ceramic, and is fixed to the upper surface 11a of the surface plate 11 so that the longitudinal direction follows the x direction. The three rails 13 have substantially the same height (the position in the z direction), and the upper surface is formed with high precision and high flatness.

In the rail 13 on the loader side (+x side), the end is disposed at the end of the upper surface 11a, and the rail 13 on the anti-loader side (-x side), The end is disposed inside the end of the upper surface 11a.

The plate-shaped part 12 is placed on the rail 13. The plate-shaped part 12 is a substantially plate-shaped member made of ceramic, and has a substantially rectangular shape as a whole. A guide portion (not shown) is provided on the lower surface of the plate-shaped portion 12 (the surface on the -z side) so that the longitudinal direction follows the x direction. Thereby, the moving direction of the plate-shaped part 12 is regulated so that the plate-shaped part 12 does not move other than the x direction.

A rail 14 is provided on the upper surface 12a of the plate-shaped portion 12. The rail 14 is fixed so that the longitudinal direction follows the y direction. The rails 14 have approximately the same height, and the upper surface is formed with high precision and high flatness.

The mask holding portion 20 is substantially plate-shaped in a substantially rectangular shape in plan view, and is formed using a low-expansion ceramic having a coefficient of thermal expansion of approximately 0.5 to 1 x 10 ^-7 /K. Accordingly, deformation of the mask holding portion 20 can be prevented. Also, the mask holding portion 20 may be formed using an ultra-low-expansion glass ceramic having a thermal expansion coefficient of approximately 5×10 ⁻⁸ /K. In this case, even if an uncontrollable temperature change occurs, deformation of the mask holding portion 20 can be reliably prevented. Further, the mask holding portion 20 may be formed of a material that expands and contracts like the mask M.

The mask holding portion 20 is placed on the rail 14. In other words, the mask holding portion 20 is provided on the upper surface 11a through the plate-shaped portion 12 and the rails 13 and 14.

On the lower surface of the mask holding portion 20, a guide portion (not shown) is provided so that the longitudinal direction follows the y direction. Thereby, the movement direction of the mask holding part 20 is restricted so that the mask holding part 20, that is, the plate-shaped part 12 does not move other than a y direction.

Thus, the mask holding part 20 (plate-shaped part 12) is movably provided along the rail 13 in the x direction, and the mask holding part 20 is in the y direction along the rail 14. It is installed to be movable.

The mask holding portion 20 has an approximately horizontal upper surface 20a. A mask M (not shown) is placed on the upper surface 20a. In addition, bar mirrors 21, 22, and 23 are provided on the upper surface 20a (see Fig. 2).

The exposure apparatus 1 has driving units 81 and 82 (not shown in FIG. 1, see FIG. 13) not shown. The driving units 81 and 82 are, for example, linear motors. The driving part 81 moves the mask holding part 20 (the plate-shaped part 12) along the rail 13 in the x direction, and the driving part 82 moves the mask holding part 20 along the rail 14 y Move in the direction. As a method for the drive parts 81 and 82 to move the plate-shaped part 12 or the mask holding part 20, various methods known in the art can be used.

The frame 15 is provided on the surface plate 11. For the frame 15, for example, a low-expansion casting (for example, a nickel-based alloy) is used. The frame 15 has a support portion 15a and two pillars 15c that support the support portion 15a at both ends. The frame 15 holds the light irradiation portion 30 above the mask holding portion 20 (+z direction). The light irradiation part 30 is attached to the support part 15a. The frame 15 will be described later.

The light irradiation unit 30 irradiates light (laser light in the present embodiment) to the mask M. The light irradiation unit 30 is provided at regular intervals (for example, approximately 200 mm apart) along the y-direction. In the present embodiment, seven light irradiation units 30a, light irradiation units 30b, light irradiation units 30c, light irradiation units 30d, light irradiation units 30e, light irradiation units 30f, and light irradiation units 30g are used. Have The driving unit (not shown) moves the entire light irradiation units 30a to 30g in the z direction in a range of about 10 mm so that the focal position of the light irradiation units 30a to 30g fits the upper surface of the mask M. In addition, the driver 39 ((39a) (refer to FIG. 6) to (39g), detailed later), the light irradiation unit 30a to 30g is 30 for fine adjustment of the focus position of the light irradiation unit 30a to 30g It is finely moved in the z direction in a range of about μm (micrometer). The light irradiation unit 30 will be described later.

The reading part 60 reads the pattern formed in the mask M. The reading unit 60 includes seven reading units 60a, a reading unit 60b, a reading unit 60c, a reading unit 60d, a reading unit 60e, a reading unit 60f, and a reading unit 60g Have The reading parts 60a to 60g are provided in the light irradiation parts 30a to 30g so as to be adjacent to the light irradiation parts 30a to 30g, respectively. The reading unit 60 will be described later.

The measurement unit 40 (not shown in FIG. 1, see FIG. 2) is, for example, a linear encoder, and the laser interferometer 50 for measuring the position of the mask holder 20 is a laser interferometer ( 51, 52) (not shown in FIG. 1, see FIG. 2). A laser interferometer 51 is provided on the pillar provided on the -y side of the frame 15. Further, a laser interferometer 52 (not shown in Fig. 1) is provided on the side of the surface 11 on the +x side.

2 is a schematic view showing a state in which the measurement unit 40 and the laser interferometer 50 measure the position of the mask holding unit 20. 2, only a part of the rails 13 and 14 is shown. In Fig. 2, only the light irradiation units 30a and 30g are shown, and the illustration of the light irradiation units 30b to 30f is omitted.

The measurement unit 40 has position measurement units 41 and 42. The position measurement units 41 and 42 have scales 41a and 42a and detection heads 41b and 42b, respectively.

The scale 41a is provided on the +y side cross section of the +y side rail 13 and the -y side cross section of the -y side rail 13. The detection head 41b is provided on the +y side and -y side cross section of the plate-shaped part 12 (not shown in FIG. 2). In Fig. 2, illustration of the scale 41a and the detection head 41b on the +y side is omitted.

The scale 42a is provided on the +x side cross section of the +x side rail 14 and the -x side cross section of the -x side rail 13. The detection head 42b is provided on the +x side and -x side end faces of the mask holding portion 20. In Fig. 2, illustration of the scale 42a and the detection head 42b on the -x side is omitted.

The scales 41a and 42a are, for example, laser hologram scales, and a memory is formed at a pitch of 0.512 nm (nanometer). The detection heads 41b and 42b irradiate light (e.g., laser light), acquire light reflected from the scales 41a and 42a, and divide the resulting signal into 512 equal parts to obtain 1 nm, The resulting signal is divided into 5120 equal parts to obtain 0.1 nm. Since the position measurement units 41 and 42 are already known, a detailed description is omitted.

A mirror 55a having a reflective surface approximately parallel to the xz plane is provided in the light irradiation portion 30a. Mirrors 55b and 55c having reflective surfaces substantially parallel to the xz plane are provided in the light irradiation portion 30g. The mirrors 55a, 55b, 55c are provided so that positions in the x direction do not overlap.

In the light irradiation unit 30a, a mirror 56a having a reflective surface approximately parallel to the yz plane is provided. In the light irradiation section 30g, a mirror 56g having a reflective surface approximately parallel to the yz plane is provided.

The laser interferometers 51 and 52 irradiate four laser lights. The laser interferometer 51 has laser interferometers 51a, 51b, and 51c. The laser interferometer 52 has laser interferometers 52a and 52g.

In Fig. 2, the path of the laser light is indicated by a two-dot chain line. Two of the light irradiated from the laser interferometers 51a, 51b, and 51c are reflected by the bar mirror 23, and the reflected light is received by the laser interferometers 51a, 51b, 51c.

The other two of the light irradiated from the laser interferometer 51a are reflected by the mirror 55a, and the reflected light is received by the laser interferometer 51a. The other two of the light irradiated from the laser interferometer 51b are reflected by the mirror 55b, and the reflected light is received by the laser interferometer 51b. The other two of the light irradiated from the laser interferometer 51c are reflected by the mirror 55c, and the reflected light is received by the laser interferometer 51c.

The laser interferometers 51a to 51c measure the positions of the rod mirrors 23 based on the positions of the mirrors 55a to 35c, respectively, so that the y direction of the light irradiation units 30a and 30g and the mask holding unit 20 Measure the positional relationship.

Two of the light irradiated from the laser interferometer 52a are reflected by the rod mirror 22, and the reflected light is received by the laser interferometer 52a. Two of the light irradiated from the laser interferometer 52g are reflected by the rod mirror 21, and the reflected light is received by the laser interferometer 52g.

The other two of the light irradiated from the laser interferometer 52a are reflected by the mirror 56a, and the reflected light is received by the laser interferometer 52a. The other two of the light irradiated from the laser interferometer 52g are reflected by the mirror 56g, and the reflected light is received by the laser interferometer 52g.

The laser interferometers 52a and 52g measure the positions of the rod mirrors 21 and 22 based on the positions of the mirrors 56a and 56g, respectively, so that the light irradiation units 30a to 30g and the mask holder 20 The positional relationship in the x direction is measured.

In this embodiment, no mirror is provided in the light irradiation units 30b to 30f, and a laser interferometer for measuring the position of the mirror is also not provided. This means that the shaking of the optical axis when moving the light irradiation units 30a to 30g in the range of about 30 μm in the z direction is small to a few nm or less (described later), and the position of the light irradiation units 30b to 30f is determined by the light irradiation unit ( This is because it is obtained by interpolation based on the positions of 30a and 30g). Thereby, the apparatus can be downsized and the cost can be reduced.

Next, the frame 15 will be described. 3 and 4 are perspective views showing the outline of the supporting portion 15a of the frame 15. 3 is a view seen from the back side (-x side), and FIG. 4 is a view seen from the front side (+x side). 3 and 4 show the support portion 15a and the pillar 15c a little apart for explanation, but the support portion 15a and the pillar 15c are actually adjacent.

The support portion 15a has a substantially rod-like shape with a substantially rectangular cross section, and has a hollow inside. The support part 15a is provided so that the longitudinal direction follows the y direction. The support portion 15a mainly includes a bottom plate 151, a support plate 153, side plates 152 and 154 provided on both sides of the bottom plate 151 and the support plate 153, and a partition wall 159. . The bottom plate 151 and the support plate 153 are installed substantially horizontally, and the side plates 152 and 154 are installed substantially vertically.

In this embodiment, the plate thickness of the bottom plate 151, the support plate 153 and the side plates 152, 154 is approximately 15 mm to 20 mm, and the bottom plate 151, the support plate 153 and the side plates 152, The length in the y direction (W1 in Fig. 9) of 154) is approximately 2.2 m.

In the bottom plate 151 and the support plate 153, annular holes 155a to 155g and 156a to 156g are formed along the y direction, respectively. The annular holes 155a to 155g and 156a to 156g are holes penetrating the bottom plate 151 and the support plate 153 in the substantially vertical direction, respectively, and are substantially circular in plan view. In the planar view, the position of the center of the holes 155a to 155g and the position of the center of the holes 156a to 156g approximately coincide.

Through the guide members 70 and 70A (described later) provided to cover the holes 155a to 155g and 156a to 156g, respectively, the light irradiation units 30a to 30g are provided in the holes 155a to 155g and 156a to 156g, respectively. Is attached. The attachment structure for attaching the light irradiation units 30a to 30g to the frame 15 will be described later.

In addition, the bottom plate 151 is provided with a hole 157a to 157g adjacent to the hole 155a to 155g. The cylinder 601 (described later) of the reading part 60 is inserted into the holes 157a to 157g.

Holes 152a to 152i and 154a to 154i are formed in the side plates 152 and 154, respectively. The holes 152a to 152g and 154a to 154g are provided so that the positions in the y direction overlap with the holes 155a to 155g and 156a to 156g, respectively. The holes 152a to 152g and 154a to 154g are used to attach the reading portion 60 to the holes 157a to 157g. The holes 152h and 152i are provided on both sides of the holes 152a to 152g, respectively, and the holes 154h and 154i are provided on both sides of the holes 154a to 154g, respectively. The frame 15 is a casting, and the holes 152a to 152i and 154a to 154i are used as casting extraction holes for discharging casting sand during casting to form an interior space.

The inside of the support portion 15a is a cavity, but as a reinforcement, a partition wall 159 is provided inside the support portion 15a. The partition wall 159 is a plate-shaped member, and its cross section abuts the bottom plate 151, the support plate 153, and the side plates 152, 154. Thereby, the cavity inside the support portion 15a disappears at the position where the partition wall 159 is installed, and vibration or deformation (bending, warping, etc.) of the support portion 15a is prevented.

The frame 15 has a moving mechanism 161 that moves the support portion 15a along the pillar 15c in the z direction. The moving mechanism 161 moves the support portion 15a in a range of about 10 mm in the z direction. The moving mechanism 161 of the present embodiment includes a rack 161a provided along the z direction on a cross section approximately perpendicular to the longitudinal direction of the support portion 15a, and a pinion 161b rotatably installed on the pillar 15c. Have The rack 161a is fixed to the convex portion 158 projecting outward from the side surface of the support portion 15a using screws or the like (not shown).

In addition, the frame 15 has two electromagnets 163 provided on the pillar 15c. The two electromagnets 163 are disposed near both ends in the longitudinal direction of the support portion 15a. The electromagnet 163 is a zero-electron type having a permanent magnet and an electromagnet, and flows a current through the coil of the electromagnet only when it is detached to turn on and off the built-in permanent magnet. Since the low-expansion alloy used for the frame 15 is a magnetic material, it can be moved by the electromagnet 163. Since the electromagnet 163 only needs to flow for a short time (for example, about 0.2 seconds) during ON-OFF, there is little heat generation. In addition, the magnetoelectric magnet 163 has a constant magnetic force after the permanent magnet is turned on and does not change.

FIG. 5 is a diagram showing an outline when the frame 15 is cut with the surface C of FIG. 3. A convex portion 161c is formed in the pillar 15c. The surface on the +x side of the convex portion 161c is a sliding surface 161d, and a scraper process, which is a polishing process to reduce frictional resistance, is performed.

The surface of the support portion 15a on the -x side is a sliding surface 161e. Scraper processing is performed on the sliding surface 161e like the sliding surface 161d. Between the sliding surface 161e and the sliding surface 161d, an oil film of about several micrometers is formed by lubricating oil collected in minute irregularities of the sliding surfaces 161d and 161e.

By rotating the pinion 161b installed on the pillar 15c, the support portion 15a to which the rack 161a is fixed moves up and down. When the moving mechanism 161 moves the support portion 15a up and down, the sliding surface 161d and the sliding surface 161e slide smoothly by an oil film formed between the sliding surface 161d and the sliding surface 161e ( sliding).

The rack 161a is located on the center line c in the x direction of the support portion 15a when viewed along the y direction. In other words, the teeth of the rack 161a pass through the center of the support portion 15a and are located on a line approximately parallel to the z direction. Therefore, no moment is generated when the pinion 161b rotates to move the rack 161a (the support portion 15a) up and down.

As shown in Figs. 3 and 4, a sliding surface 161d on which scraper processing is performed is also formed on the pillar 15c on the side where the rack 161a and the pinion 161b are not installed. Then, a sliding surface 161e (see FIG. 5) on which the scraper processing is performed is formed on the support portion 15a so as to come into contact with the sliding surface.

At the end of the support portion 15a, an elastic member 160 is provided along the pillar 15c. 3 and 4, only the elastic member 160 provided on the -y-side end is displayed, and the illustration of the elastic member 160 provided on the +y-side end is omitted. 5, the elastic member 160 is provided under the support part 15a. A positioning member 162 is provided between the elastic member 160 and the support portion 15a. The elastic member 160 is inserted into the concave portion 162a formed on the bottom surface of the positioning member 162, whereby the position of the elastic member 160 in the xy direction can be determined and elastic according to the vertical movement of the support portion 15a. The member 160 becomes stretchable. As described above, the elastic members 160 installed at both ends of the support portion 15a support the weight of the support portion 15a. The support portion 15a is approximately 660 kg to 700 kg, and the elastic member 160 can support a weight of approximately 600 kg.

The weight of the support portion 15a that the elastic member 160 cannot support is supported by the frictional force between the sliding surface 161d and the sliding surface 161e. The electromagnet 163 is provided on the pillar 15c, and adsorbs the support portion 15a by passing an electric current through the coil of the electromagnet. When the moving mechanism 161 does not move the support portion 15a up and down along the pillar 15c, the electromagnet 163 adsorbs the support portion 15a so that the support portion 15a, that is, the rack 161a and the sliding surface The 161e moves in the left direction of FIG. 5 (see the arrow in FIG. 5 ), and the sliding surface 161d and the sliding surface 161e are in close contact. By strongly compressing the sliding surface 161d and the sliding surface 161e, the oil film formed between the sliding surface 161d and the sliding surface 161e is excluded. As a result, friction is generated between the sliding surface 161d and the sliding surface 161e.

If the friction coefficient between the sliding surface 161d and the sliding surface 161e when the oil film is excluded is 0.1 to 0.2, and the adsorption force of the electromagnet 163 is 1500 kg, the sliding surface 161d and the sliding surface 161e The weight of 150kg is supported by friction between the. Since there are two sliding surfaces on both sides of the support portion 15a, the weight ta (approximately 60 kg to 100 kg) of the support portion 15a that the elastic member 160 cannot support can be supported by frictional force. Thus, when the moving mechanism 161 does not move the support part 15a up and down, the support part 15a is supported so that the position of the support part 15a in the height direction does not change.

In addition, when the electromagnet 163 is not adsorbing the support portion 15a, the rack 161a and the pinion 161b are engaged to engage the rack 161a, that is, the support portion 15a to which the rack 161a is fixed, and It is possible to move the sliding surface 161e formed on the support 15a in the left direction of FIG. 5. The weight ta of the support portion 15a, which the elastic member 160 cannot support, is applied to the pinion 161b from the rack 161a, and the pinion pins are 20° by the pressure angle of the rack 161a and the pinion 161b. (161b), the weight of the ta × cos20 ° force of the rack (161a), that is, the support portion (15a) to push up, the weight of ta × sin20 ° of the rack (161a), that is, the sliding surface (161e) sliding surface (161d) Press tight on.

Next, the light irradiation unit 30 will be described. 6 is a perspective view of a main part showing an outline of the light irradiation part 30a. The light irradiation unit 30a mainly includes a DMD 31a, an objective lens 32a, a light source unit 33a, an AF processing unit 34a, a normal unit 35a, a flange 36a, and an attachment unit ( 37a, 38a) and a driving unit 39a. The light irradiation unit 30b-light irradiation unit 30g includes DMDs 31b-31g, objective lenses 32b-32g, light source units 33b-33g, AF processing units 34b-34g, and normal units ( 35b to 35g), flanges 36b to 36g, attachment parts 37b to 37g, 38b to 38g, and driving parts 39b to 39g. Since the light irradiation part 30b-light irradiation part 30g has the same structure as the light irradiation part 30a, description is abbreviate|omitted.

The DMD 31a is a digital mirror device (DMD), and is capable of irradiating surface-shaped laser light. The DMD 31a has a plurality of movable micromirrors (not shown), and light of one pixel is irradiated from one micromirror. The micromirrors are approximately 10 µm in size and are arranged in a two-dimensional shape. The DMD 31a is irradiated with light from the light source unit 33a (described later), and the light is reflected by each micro mirror. The micromirror can be rotated around an axis substantially parallel to the diagonal, and can be switched between ON (reflecting light toward the mask M) and OFF (not reflecting light toward the mask M). Since the DMD 31a is already known, a detailed description is omitted.

The objective lens 32a forms the laser light reflected from each micro-mirror of the DMD 31a on the upper surface of the mask M. At the time of drawing, light is irradiated from each of the light irradiation units 30a to 30g, and the pattern is drawn on the mask M by forming the light on the mask M.

The light source unit 33a mainly includes a light source 331, a lens 332, a fly-eye lens 333, lenses 334 and 335, and a mirror 336. The light source 331 is, for example, a laser diode, and light emitted from the light source 331 is guided to the lens 332 through an optical fiber or the like.

Light is directed from the lens 332 to the fly-eye lens 333. The fly-eye lens 333 is a plurality of lenses (not shown) arranged in a two-dimensional shape, and a plurality of point light sources are made for the fly-eye lens 333. The light that has passed through the fly-eye lens 333 passes through the lenses 334 and 335 (for example, a condenser lens), becomes parallel light, and is reflected toward the mirror 336 and the DMD 31a.

The AF processing unit 34a sets the focus of light irradiated on the mask M to the mask M, and mainly includes an AF light source 341, a collimator lens 342, an AF cylindrical lens 343, and a 5-angle It has prisms 344 and 345, a lens 346, and AF sensors 347 and 348. The light irradiated from the AF light source 341 becomes parallel light in the collimator lens 342, becomes linear light in the AF cylindrical lens 343, is reflected by the pentagonal prism 344, and the mask M Image on the upper surface. The light reflected by the mask M is reflected by the pentagonal prism 345, condensed by the lens 346, and enters the AF sensors 347 and 348. The pentagonal prisms 344 and 345 bend light at a bending angle of approximately 97°. It is also possible to use a mirror instead of the pentagonal prisms 344 and 345, but it is preferable to use a pentagonal prism because it causes focal blurring due to the angular displacement of the mirror. The AF processing unit 34a performs an auto-focus processing that requests a focusing position based on the results received by the AF sensors 347 and 348. In addition, since the autofocus processing by the optical lever type is already known, detailed description is omitted.

The light irradiation part 30a has a substantially cylindrical normal part 35a in which an optical system (including an objective lens 32a) is provided. A flange 36a is provided at the upper end of the normal portion 35a. The flange 36a has a lens 332, a fly-eye lens 333, and lenses 334 and 335 on the image side. Therefore, the center of the light irradiation section 30a is shifted in the left direction in Fig. 6 from the optical axis ax.

Moreover, the attachment parts 37a, 38a are provided in the normal part 35a. The attachment parts 37a, 38a are used for installation to the frame 15. The attachment portion 37a is provided in the vicinity of the flange 36a, and the attachment portion 38a is provided in the vicinity of the lower end of the normal portion 35a. A hollow portion 372 having a diameter larger than the outer diameter of the attachment portion 38a is formed in the attachment portion 37a. Thereby, the normal part 35a can be pulled upward. In Fig. 6, the illustration of the screw holes 371 and 381 (described later) formed in the attachment portions 37a and 38a is omitted.

The attachment portion 37a (that is, the light irradiation portion 30a) is moved in the vertical direction (z direction) by the drive portion 39a. 7 is a side view showing an outline of the driving unit 39a. The driving part 39a mainly has a piezoelectric element 391 and a connecting part 392.

The piezoelectric element 391 is a solid actuator in which displacement occurs by applying a voltage. In the piezoelectric element 391, a non-displacement portion (for example, a lower end) is provided to the support portion 15a of the frame 15 through the attachment portion 395 (see FIG. 11). When a voltage is applied to the piezoelectric element 391, the piezoelectric element 391 increases, and the upper end of the piezoelectric element 391 moves upward. The dotted line in FIG. 7 represents a state in which the piezoelectric element 391 is reduced, and the solid line in FIG. 7 represents a state in which the piezoelectric element 391 is stretched.

The connecting portion 392 is a substantially cylindrical member whose lower end is joined to the piezoelectric element 391. The connecting portion 392 moves up and down as the piezoelectric element 391 expands and contracts.

At the upper end of the connecting portion 392, a convex portion 393 having a circular arc shape at its tip is provided. The tip of the convex portion 393 abuts on the lower side of the attachment portion 37a (see Fig. 6). Therefore, when the piezoelectric element 391 increases, the light irradiation unit 30a moves in the +z direction, and when the piezoelectric element 391 decreases, the light irradiation unit 30a moves in the -z direction.

A plurality of grooves 394 are formed on the side surface of the connecting portion 392. The groove 394 is formed to be cut obliquely downward as it approaches the central axis. Therefore, even if the piezoelectric element 391 is bent and stretched (see Fig. 7, 2-dot chain line), the connecting portion 392 is deformed at a portion of the groove 394, and the convex portion 393 is moved in the horizontal direction. It can be moved only in the vertical direction.

Next, the reading unit 60 will be described. Since the reading part 60a-reading part 60g has the same structure, the reading part 60a is demonstrated below.

8 is a perspective view showing an outline of the reading portion 60a, and is a view through the main portion. The reading section 60a is a high-magnification microscope optical system, and mainly includes a barrel 601 provided with an objective lens therein, a light source unit 602 for irradiating light (herein, visible light) to the objective lens, titanium, and oxidation The tube 603 formed of a low heat conductor such as zirconium, the tube lens 604 provided inside the tube 603, and the light from the light source unit 602 are transmitted, and light reflected from the objective lens is reflected. It has a microscope having a half mirror 605, and a camera 606 that forms a pattern acquired by the microscope.

The light source unit 602 is a member that irradiates visible light (for example, light having a wavelength of approximately 450 to 600 nm) and irradiates light having a surface light source shape. The light source unit 602 includes a light source 621 installed at a remote location, an optical bundle fiber 622 for guiding light from the light source 621, and a diffusion plate 623 installed near the cross section of the optical fiber. , Has a collimator lens 624 installed adjacent to the diffuser plate 623.

The light source 621 is, for example, a white LED, and irradiates light in the visible light region. Since the light source 621 generates heat, the light source 621 is installed at a position away from the reading portion 60a. Light irradiated from the light source 621 is guided using an optical bundle fiber 622. The diffuser plate 623 is guided by an optical bundle fiber 622, and after widening and uniformly converting light emitted from the end face of the optical bundle fiber 622, the collimator lens 624 ) Guides the light to the objective lens.

The light irradiated from the light source unit 602 passes through the objective lens, reflects from the pattern P or the like, and is again guided to the objective lens. The objective lens is a visible light lens having characteristics of high magnification, magnification of approximately 100 times, aberration (NA) of approximately 0.8, and operating distance of approximately 2 mm. The tube lens 604 is a lens for imaging light from an objective lens corrected infinitely, and has a focal length of approximately 200 mm.

The camera 606 has a resolution of about U×GA (1600×1200 pixels), a size of about 2/3 inch, and a power consumption of about 3W. The camera 606 acquires an image of the pattern P. The camera 606 is surrounded by a water jacket for water cooling. The camera 606 is capable of ultra-low-speed scanning by the control unit 201a (see FIG. 13), so that it is possible to accurately read detailed patterns drawn on the mask M.

The reading portion 60a is fixed to the normal portion 35a through an attachment portion (not shown). Thereby, the reading part 60a moves in the z direction together with the light irradiation part 30a.

Next, an attachment structure for attaching the light irradiation units 30a to 30g to the frame 15 will be described. In the attachment structure of this embodiment, the guide member 70 is attached to the bottom plate 151, the guide member 70A is attached to the support plate 153, and the light irradiation section 30a is attached to the guide members 70, 70A. ~30g), the light irradiation units 30a to 30g are attached to the frame 15.

9A shows the positional relationship between the bottom plate 151 and the guide member 70 when the guide member 70 is attached to the bottom plate 151, and FIG. 9B shows the support plate 153 ) Shows the positional relationship between the support plate 153 and the guide member 70A when the guide member 70A is attached.

Seven guide members 70 are provided on the bottom plate 151 so as to cover the holes 155a to 155g. Seven guide members 70A are provided on the support plate 153 so as to cover the holes 156a to 156g.

The difference between the guide member 70 and the guide member 70A is the presence or absence and diameter of the holes 75 and 76. Although the holes 75 and 76 are formed in the guide part main body 71 of the guide member 70, the holes 75 and 76 are not formed in the guide part main body 71A of the guide member 70A.

In the guide members 70 and 70A, attachment holes 74 and 74A are formed approximately in the center. The holes 75 and 76 are formed on the line passing through the center of the attachment hole 74 with the attachment hole 74 interposed therebetween. The guide members 70 and 70A will be described later.

The guide member 70 and the holes 155a to 155g are disposed in a substantially concentric shape, and the guide members 70A and the holes 156a to 156g are disposed in a substantially concentric shape.

The guide member 70 and the holes 155a to 155g are equally arranged in the central portion of the bottom plate 151, and the guide members 70A and the holes 156a to 156g are located in the central portion of the support plate 153. They are evenly placed. The spacing W2 of the adjacent annular holes 155a to 155g (that is, the guide member 70) and the adjacent annular holes 156a to 156g (that is, the guide member 70A) is equal to that of the light irradiation units 30a to 30g. It is roughly the same as the interval.

The normal parts 35 of the light irradiation part 30a are provided in the guide members 70 and 70A provided in the ring holes 155a and 156a. The light irradiation part 30b is provided in the guide members 70 and 70A provided in the ring holes 155b and 156b. Similarly, light guides 30c to 30g are provided in the guide members 70 and 70A provided in the holes 155c, 156c to 155g and 156g, respectively.

The ring hole 155a and the ring hole 156a are formed so that the positions in the plane view overlap. Similarly, the annular holes 155b to 155g and the annular holes 156b to 156g are formed so that the positions in the plan view overlap.

Next, the attachment structure will be described as an example of attachment of the light irradiation unit 30a to the bottom plate 151. 10 is an exploded perspective view of an attachment structure in a portion where the light irradiation unit 30a is attached to the bottom plate 151. In addition, the attachment structure for attaching the light irradiation units 30b to 30g to the bottom plate 151 and the attachment structure for attaching the light irradiation units 30a to 30g to the support plate 153, the light irradiation unit 30a to the bottom plate 151 Since it is the same as the attachment structure to be attached to, the description is omitted.

First, the guide member 70 will be described. The guide member 70 mainly has a substantially thin plate-shaped guide portion body 71 and push rings 72 and 73.

The guide main body 71 is substantially thin in plate shape and has a substantially disc shape in plan view. The guide main body 71 is easily deformed, and is formed of a metal having a thickness of approximately 0.1 mm (about 0.1 mm). As the metal, stainless steel, phosphor bronze, and the like can be used, but it is preferable to use a more homogeneous phosphor bronze. Moreover, about 0.1 mm (about 0.1 mm) contains an error of about 0.1 mm or less with respect to about 0.1 mm.

In the guide portion main body 71, an attachment hole 74 is formed approximately at the center. The attachment hole 74 is formed so that the center a1 of the guide body 71 is the center of the attachment hole 74. In addition, a plurality of holes 77 are formed in the guide portion main body 71 along the outer circumference of the guide portion main body 71, and a plurality of holes 78 are formed along the attachment hole 74. The hole 77 is a hole into which the screw 85 is inserted, and the hole 78 is a hole into which the screw 86 is inserted. In addition, the position and number of holes 77 and 78 are not limited to the illustrated shape.

In the state where the guide body main body 71 is provided on the bottom plate 151, the attachment hole 74 is arranged substantially in a concentric shape with the hole 155a. A normal portion 35a is inserted into the attachment hole 74. In the state where the normal portion 35a is inserted into the attachment hole 74, the optical axis ax approximately coincides with the center a1 of the attachment hole 74.

The pressing rings 72 and 73 have a thickness of approximately 3 mm (about 3 mm), and are formed of the same material as the guide body 71. In the present embodiment, the pressing rings 72 and 73 are separately formed on the guide body 71, but the pressing rings 72 and 73 may be integrally formed on the guide body 71.

The pressing ring 72 is substantially annular, and is provided substantially along the outer circumference of the guide body 71. The push ring 73 is substantially annular, and is provided along the attachment hole 74 approximately. A plurality of holes 77A into which the screws 85 are inserted is formed in the pressing ring 72, and a plurality of holes 78A into which the screws 86 are inserted is formed in the pressing ring 73.

Next, the attachment of the light irradiation unit 30a to the bottom plate 151 will be described. The guide member 70 is provided between the light irradiation part 30a and the frame 15 (here, the bottom plate 151).

The guide member 70 is provided on the bottom plate 151 so as to cover the hole 155a. The pressing ring 72 is mounted on the guide body 71, the screws 85 are inserted into the holes 77 and 77A, and the screws 85 are inserted into the screw holes 155h formed in the bottom plate 151. By joining, the guide member 70 is fixed to the bottom plate 151.

The light irradiation portion 30a (that is, the normal portion 35a) is provided to the guide member 70 through the attachment portion 38a. By installing the pressing ring 73 under the guide body 71, inserting the screws 86 into the holes 78 and 78A, and screwing the screws 86 into the screw holes 381 formed in the flange 38 , The guide member 70 is fixed to the attachment portion 38a.

Thus, by fixing the guide member 70 to the frame 15 and the normal part 35 through the push rings 72 and 73, deformation of the guide part main body 71 can be prevented.

With respect to the state in which the light irradiation units 30a to 30g are attached to the frame 15 by the attachment structure of the present invention, the light irradiation unit 30a will be described as an example. Note that the state of attachment of the light irradiation units 30b to 30g to the frame 15 is the same as the state of attachment of the light irradiation units 30a to the frame 15, and thus descriptions thereof are omitted.

11 is a diagram schematically showing a state in which the light irradiation portion 30a is attached to the frame 15 (here, the support portion 15a). In FIG. 11, the state cut through the surface passing through the center of the attachment hole 74 and the holes 75 and 76 is shown. In Fig. 11, some of the structural requirements are cross-sectionally displayed. 11, the illustration of fastening members, such as screws 85 and 86, and the holes in which they are provided is omitted.

The normal portion 35a is inserted into the attachment holes 74 and 74A of the guide members 70 and 70A. The attachment portion 38a is located on the upper side of the guide member 70, and a portion lower than the attachment portion 38a of the normal portion 35a is positioned below the guide member 70, and the push ring 73 is used. By doing so, the guide member 70 and the attachment portion 38a are fixed. In addition, while the attachment portion 37a is located on the upper side of the guide member 70A, and the portion below the attachment portion 37a of the normal portion 35a is located below the guide member 70A, the pressing ring 73A The guide member 70A and the attachment portion 37a are fixed using. The guide member 70 is fixed to the bottom plate 151 using a pressing ring 72, and the guide member 70A is fixed to the support plate 153 using a pressing ring 72A.

In the planar view, the center of the ring hole 155a and the center of the ring hole 156a approximately coincide, so that the light irradiation portion 30a is attached to the support portion 15a such that the optical axis ax is in the substantially vertical direction.

The holes 75, 76 are horizontally aligned with the AF light sources 341 and AF sensors 347, 348, respectively, so that the light irradiated downward from the AF light source 341 and the reflected light from the mask M can pass. The location of matches. In other words, the positions of the holes 75 and 76 overlap with the positions of the AF light sources 341 and AF sensors 347 and 348 in plan view, respectively. Thus, by forming the holes 75 and 76, AF processing of the light irradiation unit 30a can be performed even when the guide members 70 and 70A are used.

The driving portion 39a pushes up the attachment portion 37a through the pressing ring 73A. The center G of the light irradiation portion 30a is located near the position where the driving portion 39a pushes the attachment portion 37a up. Therefore, the driving part 39a pushes up the light irradiation part 30a near the center G. Thus, the vertical movement of the light irradiation unit 30a is stabilized.

12(A) shows a state in which the light irradiation unit 30a is not moving (center of a stroke), and (B) shows a state in which the light irradiation unit 30a is moved downward (bottom of the stroke), (C) shows the state in which the light irradiation unit 30a has moved upward (the upper end of the stroke).

Since the guide members 70 and 70A are fixed to the normal portion 35a through the attachment portions 37a and 38a (not shown in FIG. 12), when the normal portion 35a moves up and down by the drive portion 39a, it As a result, the guide members 70 and 70A deform.

The moving amount of the normal portion 35a by the drive portion 39a is approximately 30 µm. Since the guide members 70 and 70A are made of thin metal, the guide members 70 and 70A stretch and contract (elastic deformation) in accordance with the vertical movement of the normal portion 35a of approximately 30 µm. Since the guide members 70 and 70A are substantially circular in plan view, the amount of deformation of the guide members 70 and 70A is substantially constant regardless of the location, and the normal portion 35a does not move in the xy direction. Further, since the holes 75 and 76 are sufficiently small, the influence on the deformation of the guide members 70 and 70A is small. In addition, approximately 30 µm, which is the amount of movement of the normal portion 35a by the drive portion 39a, is an example of the amount required for AF, and the drive portion 39a may move the normal portion 35a in approximately tens of µm increments.

In addition, with the vertical movement of the light irradiation unit 30a, the reading unit 60a (not shown in FIG. 12) provided in the light irradiation unit 30a moves vertically. Since the cylinder 601 of the reading part 60a is inserted into the ring hole 157a (refer to FIG. 3, etc.), and the tube 601 is not fixed to the ring hole 157a, it is used for vertical movement of the tube 601. There is no inconvenience.

13 is a block diagram showing the electrical configuration of the exposure apparatus 1. The exposure apparatus 1 includes a central processing unit (CPU) 201, a random access memory (RAM) 202, a read only memory (ROM) 203, and an input/output interface (I/F) 204. Wow, it has a communication interface (I/F) 205 and a media interface (I/F) 206, which are the light irradiation section 30, the position measurement sections 41 and 42, and the laser interferometers 51 and 52. , And drive parts 81, 82, 83, and the like.

The CPU 201 operates based on the programs stored in the RAM 202 and the ROM 203, and controls each part. Signals are input to the CPU 201 from the position measurement units 41 and 42, the laser interferometers 51 and 52, and the like. The signals output from the CPU 201 are output to the driving units 81, 82, 83, and the light irradiation unit 30.

The RAM 202 is a volatile memory. The ROM 203 is a nonvolatile memory in which various control programs and the like are stored. The CPU 201 operates based on the programs stored in the RAM 202 and the ROM 203, and controls each part. Further, the ROM 203 stores a boot program executed by the CPU 201 when the exposure apparatus 1 is started, a program dependent on the hardware of the exposure apparatus 1, drawing data to the mask M, and the like. . Further, the RAM 202 stores programs executed by the CPU 201, data used by the CPU 201, and the like.

The CPU 201 controls the input/output device 211 such as a keyboard or mouse through the input/output interface 204. The communication interface 205 receives data from other devices via the network 212 and transmits the data to the CPU 201, and transmits data generated by the CPU 201 to other devices through the network 212. .

The media interface 206 reads the program or data stored in the storage medium 213 and stores it in the RAM 202. Further, the storage medium 213 is, for example, an IC card, SD card, DVD, or the like.

In addition, a program for realizing each function is read out from the storage medium 213, for example, is installed in the exposure apparatus 1 via the RAM 202, and executed by the CPU 201.

The CPU 201 has a function of a control unit 201a that controls each part of the exposure apparatus 1 based on the input signal. The control unit 201a is constructed by executing a predetermined program read by the CPU 201. The processing performed by the control unit 201a will be described later.

The configuration of the exposure apparatus 1 shown in FIG. 13 is a description of the main configuration at the time of describing the features of the present embodiment, and does not exclude, for example, a configuration provided by a general information processing apparatus. The components of the exposure apparatus 1 may be classified into more components depending on the contents of processing, and one component may perform processing of a plurality of components.

The operation of the exposure apparatus 1 configured as described above will be described. The following processing is mainly performed by the control unit 201a.

The control unit 201a calibrates the position measurement units 41 and 42 using the laser interferometers 51 and 52. Although the measured values of the laser interferometers 51 and 52 are correct, fluctuations close to 10 nm occur due to the down flow of clean air in the exposure apparatus 1. Further, the laser interferometers 51 and 52 can only measure relative positions (the origin is not known).

The measurement results of the position measuring units 41 and 42 include errors due to pitching or yawing of the mask holding unit 20. Therefore, the relationship between the measured values of the laser interferometers 51 and 52 and the measured values by the position measuring units 41 and 42 is examined in advance so that the measurement result by the position measuring units 41 and 42 does not include an error, The accuracy can be improved by performing the calibration processing of the position measuring units 41 and 42 and then performing the rendering processing using the position measuring units 41 and 42.

Before performing the rendering process, the control unit 201a irradiates light from the light irradiation units 30a to 30g toward the mask M to draw a pattern, and reads the pattern with the reading unit 60 to generate correction data do. Further, the control unit 201a detects that the light irradiation units 30a to 30g are out of focus by the AF processing units 34a to 34g, and the light irradiation units 30a to 30g are respectively driven by the driving units 39a to 39g. Move in the z direction, and focus the light irradiation units 30a to 30g.

The rendering process is performed after several hours have elapsed since the mask M was placed on the mask holding portion 20. The control unit 201a moves the mask holding unit 20 in the x direction and the y direction based on the measurement results of the position measurement units 41 and 42. The control unit 201a irradiates light from the light irradiation unit 30 when the mask M passes through the lower side of the light irradiation unit 30 while moving the mask holding unit 20 and performs rendering processing.

According to this embodiment, since it has the attachment structure using the guide members 70 and 70A, the light irradiation part 30 can be moved up and down in the vertical direction, and the optical axis ax can be prevented from shaking.

For example, in the case of using a cross roller guide for vertical movement of the light irradiation unit 30, since the cylindrical degree of the roller is limited, the optical axis ax when moving about 30 µm is Shaking occurs about 100 nm. Also, for example, in the case of using an air slider for vertical movement of the light irradiation unit 30, the light irradiation unit 30 vibrates about 30 nm in the horizontal direction when moving about 30 µm. In this method, since the amount of movement in the horizontal direction of the optical axis ax is too large, the positions of the light irradiation units 30b to 30f cannot be obtained by interpolation based on the positions of the light irradiation units 30a and 30g, and the drawing position Control becomes impossible. On the other hand, in this embodiment, since it has the attachment structure using the guide members 70 and 70A, the shaking of the optical axis ax when the light irradiation part 30 is moved up and down is made as small as possible (the shaking of the optical axis ax is several nm) Below, the thickness change of the mask M to be imaged or the change in the height direction (z direction) of the mask holding portion 20 during drawing can be acquired by the optical lever type AF processing units 34a to 34g, and also high precision. The drawing process can be performed.

In particular, in the present embodiment, since the vertical movement of the light irradiation unit 30 is small to about several tens of µm, the guide members 70 and 70A do not undergo plastic deformation even when the optical irradiation unit 30 moves vertically, and a thin metal guide member The attachment structure using (70, 70A) is employable. In addition, since the guide members 70 and 70A are substantially disc-shaped in plan view, and the guide members 70 and 70A deform evenly, the shaking of the optical axis ax when the light irradiation unit 30 is moved up and down is several nm or less. It can be made small. In particular, when the guide members 70 and 70A are made of a metal having a thickness of about 0.1 mm, it is easy to deform and can also be made to be strong guide members 70 and 70A.

Further, according to the present embodiment, since the guide members 70 and 70A have push rings 72 and 73, the guide members 70 and 70A are guided by attaching them to the frame 15 and the light irradiation section 30. It is possible to prevent deformation of the sub body 71.

In addition, according to the present embodiment, since the entire light irradiation unit 30 is moved up and down to achieve a focus, focus adjustment processing is also possible for a mask manufacturing apparatus using a high-resolution lens having a NA of about 0.65. . For example, applying a focus adjustment process that changes the arrangement of the optical components to the mask manufacturing apparatus is not realistic because inconveniences such as aberrations increase or a focusing range narrows occur. On the other hand, if it is the focus adjustment process which makes the whole light irradiation part 30 vertically move, it can apply to a mask manufacturing apparatus. In other words, this embodiment is particularly valuable for application to a mask manufacturing apparatus that is a high-precision exposure apparatus.

<second embodiment>

The second embodiment of the present invention is a form in which a plurality of clipping holes are formed in the guide member. Hereinafter, the exposure apparatus of the second embodiment will be described. Since the difference between the exposure apparatus 1 of the first embodiment and the exposure apparatus of the second embodiment is only the attachment structure of the light irradiation unit 30, the exposure apparatus of the second embodiment will be described below. Only the attachment structure of the light irradiation part 30 in this case is demonstrated. In addition, the same code|symbol is attached|subjected about the part similar to 1st Embodiment, and description is abbreviate|omitted.

14 is an exposure apparatus according to the second embodiment, (A) is the position of the bottom plate 151 and the guide member 70B when the guide member 70B is attached to the bottom plate 151 (B) shows the positional relationship between the support plate 153 and the guide member 70C when the guide member 70C is attached to the support plate 153.

In the attachment structure in which the light irradiation units 30a to 30g are attached to the frame 15, guide members 70B and 70C are attached to the bottom plate 151 and support plate 153, and light is guided to the guide members 70B and 70C. Attach the irradiation portion (30a ~ 30g). Seven guide members 70B are installed on the bottom plate 151 to cover the holes 155a to 155g, and seven guide members 70C are provided on the support plate 153 to cover the holes 156a to 156g. Is installed.

The difference between the guide member 70 and the guide member 70B and the difference between the guide member 70A and the guide member 70C are the presence or absence of the cutout hole 79. The guide members 70B and 70C each have substantially thin plate-shaped guide parts main bodies 71B and 71C. The difference between the guide body 71B and the guide body 71C is only the diameter.

The guide body bodies 71B and 71C, like the guide body bodies 71 and 71A, are substantially thin plate-shaped formed of metal having a thickness of approximately 0.1 mm (approximately 0.1 mm), and are substantially disc-shaped in plan view. In the guide body bodies 71B and 71C, attachment holes 74 and 74A are formed approximately in the center.

A plurality of annular fan-shaped cut-out holes 79 are formed in the guide body bodies 71B and 71C. The cut-out hole 79 is formed along the circumferential direction. In the present embodiment, eight clipping holes 79 are disposed at approximately 45° intervals, but the number, location, size, shape, etc. of the clipping holes 79 are not limited to this.

15 is an exploded perspective view of the attachment structure in a portion where the light irradiation portion 30a is attached to the support plate 153. In FIG. 15, the part above the flange 36a of the light irradiation part 30a is omitted. The attachment structure for attaching the light irradiation units 30a to 30g to the bottom plate 151 and the attachment structure for attaching the light irradiation units 30b to 30g to the support plate 153 attach the light irradiation unit 30a to the support plate 153. The description is omitted because it is the same as the attachment structure.

The guide member 70C is provided on the support plate 153 so as to cover the hole 156a. The pressing ring 72A is placed on the guide body 71B, the screws 85 are inserted into the holes 77, 77A, and the screws 85 are inserted into the screw holes 156h formed in the support plate 153. By joining, the guide member 70C is fixed to the support plate 153.

The normal portion 35a is provided on the guide member 70C through the attachment portion 37a. The push ring 73A is installed under the guide body 71B, the screws 86 are inserted into the holes 78, 78A, and the screws 86 are screwed into the screw holes 371 formed in the flange 37. By doing so, the guide member 70C is fixed to the attachment portion 37a.

16 is a view showing a state in which the light irradiation unit 30a is attached to the frame 15. The normal portion 35a is inserted into the attachment holes 74 and 74A of the guide members 70B and 70C. The horizontal position of the AF light source 341 and AF sensors 347 and 348 and the clipping hole 79 coincide. In other words, the position of the clipping hole 79 overlaps the positions of the AF light sources 341 and AF sensors 347 and 348 in plan view. Therefore, light irradiated downward from the AF light source 341 reflects off the mask M, and the reflected light enters the AF sensors 347 and 348.

In this embodiment, since the guide members 70B and 70C have a cut-out hole 79, the position of the light irradiation portion 30a in the rotational direction can be finely adjusted. Hereinafter, the rotation drive unit 90a will be described. The light irradiation units 30b to 30g also have rotation driving units 90b to 90g, respectively, as in the light irradiation units 30a, but the rotation driving units 90b to 90g have the same structure as the rotation driving units 90a to 90g. ) Will be omitted.

As shown in Fig. 15, the rotation drive unit 90a mainly includes a projection 91a, a piezoelectric element 92a, and an elastic member 93a. The projection 91a is substantially rod-shaped and is provided on the side surface of the flange 36a. The front end of the piezoelectric element 92a comes into contact with the projection 91a. In the piezoelectric element 92a, a portion that does not displace (the end of the side that does not come into contact with the projection 91a) is provided on the support portion 15a (see Fig. 3 and the like). Moreover, the elastic member 93a is provided in the projection 91a. The elastic member 93a is, for example, a compression spring, and one end is provided on the projection 91a, and the other end is provided on the support portion 15a. Therefore, when the piezoelectric element 92a is extended, the light irradiation portion 30a rotates counterclockwise as viewed from the +z direction, and when the piezoelectric element 92a is reduced, the light irradiation portion 30a is viewed as viewed from the +z direction. Rotate in the direction.

According to this embodiment, since it has the attachment structure using the guide members 70B and 70C, the optical axis ax can be prevented from shaking when the light irradiation part 30 is moved up and down. Moreover, by forming the cutout hole 79 in the guide members 70B and 70C, the light irradiation part 30 can be moved in the rotational direction in addition to the vertical direction. Since the piezoelectric element 92a is used for movement in the rotational direction, the angle in seconds (1 second = approximately 2.78° can be adjusted).

Moreover, according to this embodiment, since the position of the clipping hole 79 overlaps with the positions of the AF light sources 341 and AF sensors 347 and 348 in plan view, the guide members 70B and 70C It is not necessary to form the holes 75, 76 in. And, since the cut-out hole 79 is disposed substantially evenly in the circumferential direction, the guide portion main bodies 71B and 71C deform evenly when the light irradiating portion 30a is moved up and down. Therefore, the light irradiation unit 30a can prevent movement in the horizontal direction.

Further, in the present embodiment, the light irradiation units 30a to 30g are respectively rotated using the rotation driving units 90a to 90g, but the method for rotating the light irradiation units 30a to 30g is not limited to this. For example, a light screw 30a may be rotated by installing a feed screw on the protrusion 91a, making the tip of the feed screw abut against the side plate 154, and manually rotating the feed screw.

<third embodiment>

In the third embodiment of the present invention, the plate thickness of the guide member is about 1 mm thick. Hereinafter, the exposure apparatus of the third embodiment will be described. Since the difference between the exposure apparatus 1 of the first embodiment and the exposure apparatus of the third embodiment is only the attachment structure of the light irradiation unit 30, the exposure apparatus of the third embodiment will be described below. Only the attachment structure of the light irradiation part 30 in this case is demonstrated. In addition, the same code|symbol is attached|subjected about the part similar to 1st Embodiment, and description is abbreviate|omitted.

Fig. 17 shows the position of the bottom plate 151 and the guide member 70D when the guide member 70D is attached to the bottom plate 151 in the exposure apparatus according to the third embodiment. (B) shows the positional relationship between the support plate 153 and the guide member 70E when the guide member 70E is attached to the support plate 153.

In the attachment structure in which the light irradiation units 30a to 30g are attached to the frame 15, guide members 70D and 70E are attached to the bottom plate 151 and the support plate 153, and light is guided to the guide members 70D and 70E. The irradiation units 30a to 30g (not shown in Fig. 17) are attached. Seven guide members 70D are installed on the bottom plate 151 to cover the holes 155a to 155g, and seven guide members 70E are placed on the support plate 153 to cover the holes 156a to 156g. Is installed.

The guide members 70D and 70E each have substantially thin plate-shaped guide parts main bodies 71D and 71E. Fig. 18A is a diagram showing the outline of the guide body 71D, and Fig. 18B is a diagram showing the outline of the guide body 71E.

The difference between the guide member 70 and the guide member 70D, and the difference between the guide member 70A and the guide member 70E is the presence or absence of the plate thickness and the cutout holes 79A to 79D. In addition, in FIG. 18A, the hole 76 is omitted.

The guide parts main body 71D, 71E are substantially thin plate shape, and are substantially disc shape in plan view. The guide body bodies 71D and 71E are formed of metal having a thickness of approximately 1 mm (about 1 mm). As the metal, stainless steel, phosphor bronze, and the like can be used, but it is preferable to use a more homogeneous phosphor bronze. In addition, about 1 mm (about 1 mm or so) in the present invention includes an error of about 1 mm or less with respect to about 1 mm.

Attachment holes 74 and 74A are formed approximately in the center of the guide body 71D and 71E. In addition, a plurality of holes 77 are formed along the outer circumference of the guide portion main body 71 and a plurality of holes 78 are formed in the guide portion main bodies 71D and 71E along the outer periphery of the attachment portions 74 and 74A.

In the guide portion main body 71D, the guide portion main body 71D is easily deformed, and a plurality of cut-out holes 79A and 79B having a substantially arc shape are respectively formed. The cut-out holes 79A and 79B are arranged at equal intervals along the circumferential direction, respectively. The radius of the clipping hole 79A is smaller than the radius of the clipping hole 79B, and the clipping hole 79B is disposed outside the clipping hole 79A. Moreover, the position in the circumferential direction is substantially the same between the end region 79Aa including the end of the cutting hole 79A and the end region 79Ba including the end of the cutting hole 79B. do. In addition, the end regions 79Aa and 79Ba are present at both ends of the cut-out holes 79A and 79B, respectively.

In the guide body 71E, the guide body 71E is easily deformed, and a plurality of cutout holes 79C and 79D having a substantially arc shape are respectively formed. The clipping holes 79C and 79D are arranged at equal intervals along the circumferential direction, respectively. The radius of the clipping hole 79C is smaller than the radius of the clipping hole 79D, and the clipping hole 79D is disposed outside the clipping hole 79C. Moreover, the position of the circumferential direction is substantially the same between the end area 79Ca including the end of the cutting hole 79C and the end area 79Da including the end of the cutting hole 79D. do. Further, the end regions 79Ca and 79Da are present at both ends of the cutout holes 79C and 79D, respectively.

In this embodiment, there are four cutout holes 79A, 79B, 79C, and 79D, respectively, and the position and number of cutout holes 79A, 79B, 79C, and 79D are not limited to this.

The circumferential position of the end region 79Aa and the end region 79Ba coincide roughly, and the overlapping positions are evenly arranged in the circumferential direction (for example, approximately every 45°). Further, the positions in the circumferential direction of the end region 79Ca and the end region 79Da coincide, and the overlapping positions are evenly arranged (for example, approximately every 45°) in the circumferential direction. Therefore, if a line extending radially from the center point of the guide body 71D, 71E in the radial direction is drawn, the line necessarily passes through at least one of the clipping holes 79A-79D. Therefore, the amount of deformation of the guide unit main bodies 71D and 71E is substantially constant regardless of the place in the circumferential direction. Further, by arranging the cut-out holes 79A to 79D in this way, even if a thin board having a thickness of about 1 mm is used for the main body parts 71D and 71E of the guide parts, the vertical motion of the normal part 35a of approximately 30 mu m is increased. In accordance with this, the main body parts 71D and 71E are stretched.

19 is an exploded perspective view of the attachment structure in a portion where the light irradiation unit 30a is attached to the support plate 153. In FIG. 19, the part above the flange 36a of the light irradiation part 30a is omitted. The attachment structure for attaching the light irradiation units 30a to 30g to the bottom plate 151 and the attachment structure for attaching the light irradiation units 30b to 30g to the support plate 153 attach the light irradiation unit 30a to the support plate 153. The description is omitted because it is the same as the attachment structure.

The guide member 70E is provided on the support plate 153 so as to cover the hole 156a. The guide member 70E is fixed to the support plate 153 by inserting the screw 85 into the hole 77 and screwing the screw 85 into the screw hole 156h formed in the support plate 153.

The normal portion 35a is provided on the guide member 70E through the attachment portion 37a. The guide member 70E is fixed to the attachment portion 37a by inserting the screw 86 into the hole 78 and screwing the screw 86 into the screw hole 371 formed in the flange 37.

As described above, since the guide member 70E is fixed to the normal portion 35a through the attachment portion 37a, the guide member 70E is deformed in accordance with the vertical movement of the normal portion 35a of approximately 30 μm.

According to this embodiment, since the guide members 70D and 70E are formed of a metal of about 1 mm, the guide members 70D and 70E can be elastically deformed even when the light irradiation portion 30 is heavy. For example, when the guide member is formed of a metal of about 0.1 mm or so, when the light irradiation portion 30 becomes heavy, there is a fear that the guide member will exceed the elastic limit. On the other hand, when the guide members 70D, 70E are formed of a metal of about 1 mm or so, since the guide members 70D, 70E become strong, the guide members 70D, 70E are plastically deformed beyond the elastic limit. You can reduce the likelihood of doing it.

In addition, in the present embodiment, the guide members 70D and 70E have guide body bodies 71D and 71E, respectively, but the guide members 70D and 70E have push rings 72 and 72A and push rings 73, respectively. , 73A). However, in the present embodiment, since the thickness of the guide members 70D and 70E is approximately 1 mm, the pressing rings 72, 72A, 73, and 73A are not essential.

The embodiments of the present invention have been described above with reference to the drawings, but the specific configuration is not limited to this embodiment, and design changes and the like within a range not departing from the gist of the present invention are also included. It is possible for a person skilled in the art to appropriately change, add, and convert each element of the embodiment.

In addition, in the present invention, "approximately" is a concept that includes not only strictly identical cases, but also errors and deformations to the extent that identity is not lost. For example, roughly horizontal is not strictly limited to horizontal, and is a concept including, for example, an error in the degree of water supply. In addition, for example, in the case of simply expressing parallel, orthogonal, and the like, it is assumed that not only strictly parallel or orthogonal, but also substantially parallel or substantially orthogonal. Moreover, with respect to the present invention, "near" means to include an area within a certain range (optionally determined) near the reference position. For example, in the case of the vicinity of A, it is a concept that indicates whether or not A may be included as an area in a range near A.

1: exposure apparatus
11: Platen 11a: Top surface
12: plate-shaped part (12a): upper surface
13, 14: rail 15: frame
15a: support 15c: pillar
20: mask holding portion 20a: top surface
21, 22, 23: bar mirror
30, 30a, 30b, 30c, 30d, 30e, 30f, 30g: light irradiation unit
32a, 32b, 32c, 32d, 32e, 32f, 32g: objective lens
33a, 33b, 33c, 33d, 33e, 33f, 33g: light source unit
34a, 34b, 34c, 34d, 34e, 34f, 34g: AF (Auto Focus) processing unit
35, 35a, 35b, 35c, 35d, 35e, 35f, 35g: normal part
36, 36a, 36b, 36c, 36d, 36e, 36f, 36g: flange
37, 37a: attachment portion 38, 38a: attachment portion
39, 39a, 39b, 39c, 39d, 39e, 39f, 39g: drive unit
40: measuring unit 41, 42: position measuring unit
41a, 42a: scale
41b, 42b: detection head
50, 51, 51a, 51b, 51c, 52, 52a, 52g: laser interferometer
55a, 55b, 55c, 56a, 56g: mirror
60, 60a, 60b, 60c, 60d, 60e, 60f, 60g: reading part
70, 70A, 70B, 70C, 70D, 70E: no guide
71, 71A, 71B, 71C, 71D, 71E: Guide body
72, 72A, 73, 73A,: Push ring
74, 74A: Attachment hole
75, 76, 77, 77A, 78, 78A: hole
79, 79A, 79B, 79C, 79D: clipping hole
79Aa, 79Ba, 79Ca, 79Da: End region
81, 82, 83: drive unit 85, 86: screw
90a, 90b, 90c, 90d, 90e, 90f, 90g: rotary drive
91a: projection
92a: Piezoelectric element 93a: Elastic member
151: bottom plate 153: support plate
152, 154: side plate
152a, 152b, 152c, 152d, 152e, 152f, 152g: hole
154a, 154b, 154c, 154d, 154e, 154f, 154g: hole
152h, 152i, 154h, 154i: hole
155a, 155b, 155c, 155d, 155e, 155f, 155g: round hole
155h: screw hole
156a, 156b, 156c, 156d, 156e, 156f, 156g: round hole
156h: screw hole
157a, 157b, 157c, 157d, 157e, 157f, 157g: hole
158: convex part 159: partition wall
160: elastic member 161: moving mechanism
161a: rack 161b: pinion
161c: convex portions 161d, 161e: sliding surface
162: positioning member 162a: recess
163: Young electromagnet
201: CPU 201a: control unit
202: RAM 203: ROM
204: input/output interface 205: communication interface
206: media interface 211: input and output devices
212: network 213: storage medium
331: light source 332: lens
333: fly eye lens
334, 335: lens 336: mirror (mirror)
341: AF (Auto Focus) light source
342: collimator lens
343: Cylindrical lens for AF (Auto Focus)
344, 345: 5-angle prism 346: Lens
347, 348: Auto Focus (AF) sensor
371, 381: screw hole 372: hollow
391: Piezoelectric element
392: connecting portion 393: convex portion
394: Groove 395: Attachment
601: light tube 602: light source unit
603: a tube 604: a tube lens
605: half mirror 606: camera
621: light source
622: optical bundle fiber 623: diffuser plate
624: collimator lens

Claims (11)

An optical device having a normal portion,
A frame for assembling the optical device,
When assembling the optical device, a substantially thin plate-like guide member provided between the optical device and the frame,
It is installed on the frame, and has a driving unit for moving the optical device in the vertical direction,
In the frame, an annular hole penetrating in the substantially vertical direction is formed,
The guide member is substantially disc-shaped in plan view, and is installed on the frame so as to cover the hole,
In the guide member, an attachment hole is formed approximately in the center,
The attachment hole is arranged in a substantially concentric shape with the hole,
The normal portion is attached to the optical member, characterized in that the optical axis is inserted into the attachment hole so as to approximately coincide with the center of the attachment hole, and fixed to the guide member. According to claim 1,
The frame has a bottom plate installed approximately horizontally and a support plate installed approximately horizontally and above the bottom plate,
In the bottom plate and the support plate, the first hole and the second hole, which are the holes, are respectively formed.
In plan view, the center of the first hole and the center of the second hole are approximately coincident,
When the optical device is assembled to the frame, the optical device attachment structure is characterized in that the center of the optical device is located near the position where the driving part pushes the optical device. The method according to claim 1 or 2,
The frame has a support part installed substantially horizontally, a pillar installed at both ends of the support part, and a moving mechanism for moving the support part in a vertical direction,
In the support portion, a sliding surface on the support portion side is formed,
In the pillar, a pillar-side sliding surface is formed to face the support-side sliding surface,
The support portion is formed of a magnetic material,
On the pillar, a permanent magnet and an electromagnet having an electromagnet are installed,
When the moving mechanism does not move the support, the electromagnet attracts the support by applying an electric current to the coil of the electromagnet, and the sliding surface of the support side and the sliding surface of the column side are in close contact with each other. The attachment structure of the device. According to claim 3,
The moving mechanism has a rack installed along the vertical direction on a cross section approximately perpendicular to the longitudinal direction of the support, and a pinion rotatably installed on the pillar,
The attachment structure of the optical device, characterized in that the teeth of the rack are located on a line passing through the center of the support portion and substantially parallel to the vertical direction. The method according to any one of claims 1 to 4,
The guide member is formed of a metal having a thickness of approximately 0.1 mm. The method of claim 5,
The guide member has a plurality of annular fan-shaped clipping holes formed along the circumferential direction. The method according to any one of claims 1 to 4,
The guide member is formed of a metal having a thickness of approximately 1 mm,
In the guide member, a plurality of first cutout holes and second cutout holes in a substantially arc shape are respectively formed,
The second clipping hole is disposed outside the first clipping hole,
An optical device characterized in that the end region including the end of the first cut-out hole and the end region including the end of the second cut-out hole substantially coincide in the circumferential position. Attachment structure. The method according to any one of claims 1 to 7,
The guide member has a substantially annular first thick portion along the outer circumference, and a substantially circular second thick portion along the attachment hole,
The guide member and the frame are fixed through the first thickening part,
The attachment structure of the optical device, characterized in that the guide member and the normal portion are fixed through the second thickening portion. The method according to any one of claims 1 to 8,
The optical device has an AF processing unit having an AF light source for irradiating downward light and an AF sensor through which reflected light is incident,
On the guide member, on the line passing through the center of the attachment hole, two holes are formed so as to sandwich the attachment hole therebetween,
The two holes overlap the position of the AF light source and the AF sensor in plan view, and the attachment structure of the optical device is characterized in that. The method of claim 6,
The optical device has an AF processing unit having an AF light source for irradiating downward light and an AF sensor through which reflected light is incident,
The cut-out hole overlaps the positions of the AF light source and the AF sensor in plan view. A plate on which the workpiece is placed,
A light irradiation unit having a normal portion, and irradiating light to the work piece;
A frame for assembling the light irradiation unit and holding the light irradiation unit above the plate;
When assembling the light irradiation portion, a substantially thin plate-shaped guide member provided between the light irradiation portion and the frame,
It is provided on the frame and provided with a driving unit for moving the light irradiation portion in the vertical direction,
In the frame, an annular hole penetrating in the substantially vertical direction is formed,
The guide member is installed on the frame to cover the hole,
The guide member has a substantially disc shape in a planar view, and an attachment hole is formed in the center portion,
The attachment hole is arranged in a substantially concentric shape with the hole,
The exposure unit, characterized in that the normal portion is inserted into the attachment hole so that the optical axis approximately coincides with the center of the attachment hole and fixed to the guide member.

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