TW201935136A - Attachment structure for optical device, and exposure device - Google Patents

Abstract

The present invention keeps an optical axis from shaking when an optical device is moved up/down. According to the present invention, a round hole that passes substantially in the vertical direction is formed in a frame body, and a guide member that is substantially thin-plate shaped and, in plan view, substantially disc-shaped, is provided to the frame body to cover the round hole. An attachment hole that is formed substantially at the center of the guide member is arranged to be substantially concentric with the round hole. A cylindrical part: is inserted into the attachment hole such that an optical axis substantially coincides with the center of the attachment hole; and is fixed to the guide member.

Description

Mounting structure of optical device and exposure device

The present invention relates to a mounting structure of an optical device and an exposure device.

Patent Document 1 discloses an exposure device for performing focus adjustment on a pair of films constituting an exposure head while raising and lowering the exposure table when performing exposure processing on a single film provided on the exposure table. deal with. [Prior Art Literature] [Patent Literature]

[Patent Document 1] Japanese Patent Laid-Open No. 2006-235457

[Problems to be Solved by the Invention]

The invention described in Patent Document 1 adjusts the focus by changing the thickness of the pair. However, if the optical path length is changed in the condensed light, aberrations will occur, so the performance of the optical system will change due to the focus adjustment. As described above, in the case where the focus adjustment of the exposure head is performed by changing the arrangement of the optical components, the optical performance may not be optimized.

To cope with such a problem, a method of moving the entire optical device up and down without changing the arrangement of the optical components is considered. However, when the entire optical device is moved up and down, the optical axis may be shaken (the position in the horizontal direction of the optical axis is shifted) with the up and down movement, and the drawing accuracy may be reduced. Especially when a plurality of optical devices are provided, the relative relationship between the plurality of optical devices is more important, so it is necessary to make the amount of jitter of the optical axis smaller.

In addition, in an apparatus for manufacturing a printed circuit board in the invention described in Patent Document 1, a lens having an NA of about 0.2 to 0.3 is generally used. However, if the pair of pairs described in the invention described in Patent Document 1 is to be applied to a device using a lens with an NA of about 0.65, the aberration becomes large and the range of focus convergence can be narrowed.

The present invention has been made in view of such a situation, and an object thereof is to provide an optical device mounting structure and an exposure device capable of preventing the optical axis from being shaken when the optical device is moved up and down. [Technical means to solve the problem]

In order to solve the above-mentioned problems, the installation structure of the optical device of the present invention is characterized by including, for example, an optical device having a cylindrical portion, a frame for assembling the optical device, and installing the optical device and the optical device when the optical device is assembled. A substantially thin plate-shaped guide member between the frame bodies and a driving portion provided in the frame body and moving the optical device in a vertical direction, wherein the frame body is formed with a circular hole penetrating in a substantially vertical direction, and the guide member The guide member has a substantially circular plate shape in plan view and is provided on the frame so as to cover the circular hole. The guide member is formed with a mounting hole at a substantially center. The mounting hole and the circular hole are arranged in a substantially concentric circle. The shape portion is inserted into the mounting hole so that the optical axis substantially coincides with the center of the mounting hole, and is fixed to the guide member.

According to the installation structure of the optical device of the present invention, a circular hole penetrating in a substantially vertical direction is formed in the frame, and a guide member that is substantially thin plate-shaped and substantially circular plate-shaped in plan view is provided on the frame to cover the circular hole. body. The mounting hole and the circular hole formed at the approximate center of the guide member are arranged in a substantially concentric circle shape, and the cylindrical portion is inserted into the mounting hole so that the optical axis substantially coincides with the center of the mounting hole, and is fixed to the guide member. By uniformly deforming the guide member in this way, it is possible to prevent the optical axis from being shaken when the optical device is moved up and down, that is, to move the optical device in the vertical direction without moving the optical device in the horizontal direction.

Here, the frame has a bottom plate provided substantially horizontally, and a support plate provided substantially horizontally and on the upper side of the bottom plate, and a first circular hole and a first circular hole are formed on the bottom plate and the support plate, respectively. The second circular hole has, in a plan view, a center of the first circular hole and a center of the second circular hole. When the optical device is assembled into the frame, a center of gravity of the optical device is located at the driving portion and is pushed up. The vicinity of the position of the optical device may be used. Thereby, the driving part pushes up the optical device near the center of gravity of the optical device, so that the up and down movement of the optical device can be stabilized.

Here, the frame has a support portion provided substantially horizontally, pillars respectively provided at both ends of the support portion, and a moving mechanism for moving the support portion in a vertical direction, and a support portion side is formed on the support portion. A sliding surface forms a column-side sliding surface on the column so as to face the supporting portion-side sliding surface. The supporting portion is formed of a magnetic material. A permanent magnet with permanent magnets and electromagnets is provided on the column, and the moving mechanism is provided on the column. When the supporting portion is not moved, the permanent magnet may be caused to adsorb the supporting portion by flowing a current into the coil of the electromagnet, and the supporting portion-side sliding surface and the column-side sliding surface may be closely contacted. Accordingly, by moving the support portion, that is, the entire optical device in the vertical direction, the optical device can be moved up and down without moving the optical axis. In addition, when the support portion is not moved, the support portion side sliding surface and the column side sliding surface are closely contacted, so that the position of the support portion in the height direction can be maintained. Friction to support the support.

Here, the moving mechanism includes a rack provided along an up-down direction on an end surface substantially orthogonal to the length direction of the support portion, and a pinion gear rotatably provided on the post, and is disposed along the support portion. When viewed in the longitudinal direction, the teeth of the rack may pass through the center of gravity of the support portion and may be located on a line approximately parallel to the vertical direction. Thereby, no moment is generated when the support portion is moved up and down.

Here, the guide member may be formed of a metal having a thickness of approximately 0.1 mm. Thereby, a guide member which is easily deformed and tough can be manufactured.

Here, a plurality of annular fan-shaped cutout holes may be formed in the guide member along the circumferential direction. Thereby, the optical device can be moved in the rotation direction.

Here, the guide member is formed of a metal having a thickness of about 1 mm, and a plurality of first cutout holes and second cutout holes each having a substantially circular arc shape are formed in the guide member, and the second cutout holes are arranged. The position of the end region including the end of the first cutout hole and the end region including the end of the second cutout hole in the circumferential direction may be substantially coincident with each other outside the first cutout hole. Thereby, even if a relatively thick metal plate having a thickness of about 1 mm is used as the guide member, the amount of deformation can be substantially fixed regardless of the location in the circumferential direction. In addition, since the guide member is relatively thick, the possibility of the guide member being plastically deformed beyond the elastic limit can be reduced.

Here, the guide member has a first thick-walled portion having a substantially annular shape substantially along an outer periphery, and a second thick-walled portion having a substantially annular shape substantially along the mounting hole, and the guide member and the frame body are provided. It may be fixed through the first thick wall portion, and the guide member and the tubular portion may be fixed through the second thick wall portion. Thereby, deformation of the guide member can be prevented.

Here, the above-mentioned optical device has an AF processing section having an AF light source for radiating downward light and an AF sensor for reflected light to be incident on the center of the guide member passing through the mounting hole. Two holes are formed on the line through the mounting holes, and the two holes may overlap the positions of the AF light source and the AF sensor in a plan view. Thereby, the AF processing of the optical device can be performed even when a guide member is used.

Here, the above-mentioned optical device has an AF processing unit having an AF light source for irradiating downward light and an AF sensor for reflected light to be incident, and the cutout hole and the AF light source are viewed in plan view. And the position of the AF sensor may overlap. Thereby, the AF processing of the optical device can be performed even when a guide member is used.

In order to solve the above-mentioned problems, the exposure device of the present invention is characterized by, for example, including a flat plate on which a workpiece is placed, a light irradiation portion having a cylindrical portion and irradiating light to the workpiece, an assembly of the light irradiation portion, and the light irradiation portion. A frame held above the flat plate, a substantially thin plate-shaped guide member provided between the light irradiating portion and the frame during assembly of the light irradiating portion, and a light irradiating the light provided on the frame A driving part that moves in a vertical direction and forms a circular hole penetrating in the vertical direction in the frame. The guide member is provided in the frame so as to cover the circular hole. The guide member is a plan view. It has a substantially circular plate shape, and a mounting hole is formed in the central portion. The mounting hole and the circular hole are arranged in a substantially concentric circle. The cylindrical portion is inserted into the optical axis so that the optical axis substantially coincides with the center of the mounting hole. The mounting hole is fixed to the guide member. By uniformly deforming the guide member in this way, it is possible to prevent the optical axis from being shaken when the optical device is moved up and down. [Effect of the invention]

According to the present invention, the optical axis can be prevented from being shaken when the optical device is moved up and down.

Hereinafter, the present invention will be described as an example of an embodiment of an exposure device that is applied to a photosensitive substrate (such as a glass substrate) that is held in a substantially horizontal direction while moving in the scanning direction to irradiate light such as laser light to generate a photomask. Detailed description. In each drawing, the same element is denoted by the same symbol, and description of the duplicated part is omitted.

As the photosensitive substrate, for example, thermal expansion coefficient is very small (e.g., about 5.5 × 10 ^- about ⁷ / K) of quartz glass. The photomask produced by the exposure device is, for example, a mask for exposure used for manufacturing a substrate for a liquid crystal display device. The photomask is one in which one or a plurality of image device transfer patterns are formed on a large, substantially rectangular substrate on one side, for example, more than 1 m (for example, 1400 mm × 1220 mm). Hereinafter, the term “mask M” is used in a concept including a photosensitive substrate before, during, and after processing.

However, the exposure apparatus of the present invention is not limited to a mask manufacturing apparatus. The exposure device of the present invention is a concept including various devices that irradiate light (including laser, UV, polarized light, etc.) while moving a substrate held in a substantially horizontal direction in a scanning direction. The optical device of the present invention is not limited to a light irradiating portion that irradiates light onto a photosensitive substrate.

FIG. 1 is a schematic perspective view showing an exposure apparatus 1 according to the first embodiment. The exposure device 1 mainly includes a platen 11, a plate-like portion 12, rails 13, 14, a frame 15, a mask holding portion 20, a light irradiating portion 30, a measuring portion 40 (see FIG. 2), a laser interferometer 50, And reading section 60. In addition, in FIG. 1, illustration of a part of the configuration is omitted. The exposure device 1 is maintained at a fixed temperature by a temperature adjustment unit (not shown) that covers the entire device.

The pressure plate 11 is a member having a substantially rectangular parallelepiped shape (thick plate shape), and is formed of, for example, a rock (such as granite) or a low expansion coefficient casting (such as a nickel-based alloy). The platen 11 has an upper surface 11 a on the upper side (+ z side) which is substantially horizontal (substantially parallel to the xy plane).

The pressure plate 11 is placed on a plurality of vibration isolation tables (not shown) placed on a setting surface (such as a floor). Thereby, the pressure plate 11 is placed on the installation surface through the vibration isolation table. Since the vibration isolator is already known, detailed description is omitted. In addition, a vibration isolator is not necessary. A loader (not shown) is provided on the + x side of the platen 11 to set the mask M to the mask holding portion 20.

The rail 13 is an elongated plate-shaped member made of ceramics, and is fixed to the upper surface 11 a of the platen 11 so as to extend along the x direction in the longitudinal direction. The heights (positions in the z direction) of the three rails 13 are substantially the same, and the upper surfaces are formed with high accuracy and high flatness.

The end of the track 13 on the loader side (+ x side) is arranged on the end of the upper surface 11a, and the end of the track 13 on the opposite side of the loader (-x side) is arranged closer to the inside than the end of the upper surface 11a .

The plate-like portion 12 is placed on the rail 13. The plate-shaped portion 12 is a substantially plate-shaped member made of ceramic, and has a substantially rectangular shape as a whole. A guide portion (not shown) is provided on the lower surface (the surface on the −z side) of the plate-like portion 12 along the x direction in the length direction. Thereby, the moving direction of the plate-shaped portion 12 is restricted so that the plate-shaped portion 12 does not move in a direction other than the x direction.

A rail 14 is provided on the upper surface 12 a of the plate-shaped portion 12. The rail 14 is fixed in such a manner that the longitudinal direction is along the y-direction. The heights of the rails 14 are substantially the same, and the upper surface is formed with high accuracy and flatness.

The mask holding portion 20 is a substantially plate shape having a substantially rectangular shape in plan view, and is formed using a low-expansion ceramic having a thermal expansion coefficient of approximately 0.5 to 1 × 10 ^-7 / K. Accordingly, deformation of the mask holding portion 20 can be prevented. The mask holding portion 20 may be formed using an ultra-low-expansion glass ceramic having a thermal expansion coefficient of approximately 5 × 10 ^-8 / K. In this case, even if an uncontrollable temperature change occurs, deformation of the mask holding portion 20 can be reliably prevented. In addition, the mask holding portion 20 may be formed of a material that expands and contracts similarly to the mask M.

The mask holding portion 20 is placed on the rail 14. In other words, the mask holding portion 20 is provided on the upper surface 11 a through the plate-like portion 12 and the rails 13 and 14.

A guide portion (not shown) is provided on the lower surface of the mask holding portion 20 so that the longitudinal direction is along the y direction. Thereby, the moving direction of the mask holding part 20 is restricted so that the mask holding part 20, that is, the plate-shaped part 12 does not move in directions other than the y direction.

In this manner, the mask holding portion 20 (plate-like portion 12) is provided along the rail 13 so as to be movable in the x direction, and the mask holding portion 20 is provided along the rail 14 so as to be movable in the y direction.

The mask holding portion 20 has a substantially horizontal upper surface 20a. A mask M (not shown) is placed on the upper surface 20a. In addition, rod mirrors 21, 22, and 23 are provided on the upper surface 20a (see FIG. 2).

The exposure apparatus 1 includes drive units 81 and 82 (not shown in FIG. 1, see FIG. 13). The driving sections 81 and 82 are linear motors, for example. The driving section 81 moves the mask holding section 20 (plate-like section 12) along the rail 13 in the x direction, and the driving section 82 moves the mask holding section 20 along the rail 14 in the y direction. As the method of moving the plate-shaped part 12 or the mask holding part 20 by the drive parts 81 and 82, various well-known methods can be used.

A frame 15 is provided on the platen 11. The frame 15 is made of, for example, a low-expansion casting (for example, a nickel-based alloy). The frame 15 includes a support portion 15a and two pillars 15c that support the support portion 15a at both ends. The frame body 15 holds the light irradiation section 30 above (+ z direction) the mask holding section 20. A light irradiation unit 30 is attached to the support unit 15a. The frame 15 will be described in detail later.

The light irradiating unit 30 irradiates light to the mask M (laser light in the present embodiment). The light irradiation sections 30 are provided at a fixed interval (for example, approximately 200 mm apart) along the y direction. In this embodiment, there are a total of seven light irradiation sections 30a, 30b, 30c, 30d, 30e, 30f, and 30g. The driving portion (not shown) moves the light irradiating portions 30a to 30g in the z direction as a whole within a range of about 10 mm so that the focal position of the light irradiating portions 30a to 30g meets the upper surface of the mask M. In addition, the driving unit 39 (39a (refer to FIG. 6) to 39g, which will be described later in detail) is for finely adjusting the focal position of the light irradiation unit 30a to 30g, so that the light irradiation unit 30a to 30g is 30 μm (micron) Move in the z direction within the left and right range. The light irradiation unit 30 will be described in detail later.

The reading section 60 reads a pattern formed on the mask M. The reading unit 60 includes a total of seven reading units 60a, 60b, 60c, 60d, 60e, 60f, and 60g. The reading sections 60a to 60g are provided on the light irradiation sections 30a to 30g so as to be adjacent to the light irradiation sections 30a to 30g, respectively. The reading section 60 will be described in detail later.

The measurement unit 40 (illustration omitted in FIG. 1, see FIG. 2) is, for example, a linear encoder. The laser interferometer 50 for measuring the position of the mask holding unit 20 includes laser interferometers 51 and 52 (illustration omitted in FIG. 1). Refer to Figure 2). A laser interferometer 51 is provided on a pillar provided on the -y side of the frame 15. A laser interferometer 52 (not shown in FIG. 1) is provided on a side surface on the + x side of the platen 11.

FIG. 2 is a schematic diagram showing a state where the measurement unit 40 and the laser interferometer 50 measure the position of the mask holding unit 20. In addition, in FIG. 2, only a part of the tracks 13 and 14 is shown. In FIG. 2, only the light irradiation sections 30 a and 30 g are shown, and the light irradiation sections 30 b to 30 f are not shown.

The measurement section 40 includes position measurement sections 41 and 42. The position measuring units 41 and 42 include verniers 41a and 42a and detection heads 41b and 42b, respectively.

The vernier 41a is provided on the + y-side end surface of the + y-side track 13 and the -y-side end surface of the -y-side track 13. The detection head 41b is provided on the + y-side and -y-side end faces of the plate-like portion 12 (not shown in FIG. 2). In FIG. 2, illustrations of the vernier 41 a and the detection head 41 b on the + y side are omitted.

The vernier 42a is provided on the + x-side end surface of the + x-side track 14 and the -x-side end surface of the -x-side track 13. The detection head 42 b is provided on the end faces on the + x side and the −x side of the mask holding portion 20. In FIG. 2, the illustration of the vernier 42 a and the detection head 42 b on the −x side is omitted.

The vernier scales 41a and 42a are, for example, laser holographic vernier scales, and a memory is formed at a pitch of 0.512 nm (nanometer). The detection heads 41b and 42b are irradiated light (such as laser light) and obtain the light reflected by the vernier scales 41a and 42a. The signal generated by this is divided into 512 equal parts to obtain 1 nm, and the signal generated by this Divide into 5120 equal parts to obtain 0.1 nm. Since the position measuring units 41 and 42 are known, detailed descriptions are omitted.

The light irradiating portion 30a is provided with a reflecting mirror 55a having a reflecting surface substantially parallel to the xz plane. Mirrors 55b and 55c having a reflecting surface substantially parallel to the xz plane are provided on the light irradiating portion 30g. The reflecting mirrors 55a, 55b, and 55c are provided so that positions in the x direction do not overlap.

The light irradiating portion 30a is provided with a reflecting mirror 56a having a reflecting surface substantially parallel to the yz plane. A reflecting mirror 56g having a reflecting surface substantially parallel to the yz plane is provided on the light irradiating portion 30g.

The laser interferometers 51 and 52 irradiate four laser beams. The laser interferometer 51 includes laser interferometers 51a, 51b, and 51c. The laser interferometer 52 includes laser interferometers 52a and 52g.

In FIG. 2, the path of the laser light is indicated by a two-dot chain line. Two of the lights irradiated from the laser interferometers 51a, 51b, and 51c are reflected by the rod mirror 23, and the reflected light is received by the laser interferometers 51a, 51b, and 51c.

The remaining two beams of the light irradiated from the laser interferometer 51a are reflected by the mirror 55a, and the reflected light is received by the laser interferometer 51a. The remaining two beams of the light irradiated from the laser interferometer 51b are reflected by the mirror 55b, and the reflected light is received by the laser interferometer 51b. The remaining two beams of the light irradiated from the laser interferometer 51c are reflected by the mirror 55c, and the reflected light is received by the laser interferometer 51c.

The laser interferometers 51a to 51c measure the position of the rod mirror 23 with the positions of the mirrors 55a to 35c as reference, and measure the positional relationship between the light irradiating portions 30a and 30g and the mask holding portion 20 in the y direction.

Two of the lights irradiated from the laser interferometer 52a are reflected by the rod mirror 22, and the reflected light is received by the laser interferometer 52a. Two of the lights irradiated from the laser interferometer 52g are reflected by the rod mirror 21, and the reflected light is received by the laser interferometer 52g.

The remaining two beams of the light irradiated from the laser interferometer 52a are reflected by the mirror 56a, and the reflected light is received by the laser interferometer 52a. The remaining 2 beams of the light irradiated from the laser interferometer 52g are reflected by the reflecting mirror 56g, and the reflected light is received by the laser interferometer 52g.

The laser interferometers 52a and 52g measure the positions of the rod mirrors 21 and 22 with the positions of the mirrors 56a and 56g as reference, respectively, and measure the positional relationship between the light irradiating portions 30a to 30g and the mask holding portion 20 in the x direction .

In this embodiment, no reflection mirror is provided on the light irradiation sections 30b to 30f, and no laser interferometer for measuring the position of the reflection mirror is provided. The reason is that the jitter of the optical axis when the light irradiating sections 30a to 30g are moved in the z direction within a range of about 30 μm is as small as a few nm or less (which will be described in detail later). The positions are obtained by interpolation to obtain the positions of the light irradiating sections 30b to 30f. Thereby, the device can be miniaturized and the cost can be reduced.

Next, the housing 15 will be described. 3 and 4 are perspective views showing the outline of the supporting portion 15a of the frame body 15. Fig. 3 is a diagram viewed from the back side (-x side), and Fig. 4 is a diagram viewed from the front side (+ x side). 3 and 4 show the support portion 15a and the column 15c slightly apart for illustration, but the support portion 15a and the column 15c are actually adjacent to each other.

The support portion 15a has a substantially rod-like shape in cross-section, and has an internal cavity. The support part 15a is provided so that the longitudinal direction may be along the y direction. The support portion 15 a mainly includes a bottom plate 151, a support plate 153, side plates 152 and 154 provided on both sides of the bottom plate 151 and the support plate 153, and a partition wall 159. The bottom plate 151 and the support plate 153 are provided substantially horizontally, and the side plates 152 and 154 are provided substantially vertically.

In this embodiment, the thickness of the bottom plate 151, the support plate 153, and the side plates 152, 154 is approximately 15 mm to 20 mm. The length of the bottom plate 151, the support plate 153, and the side plates 152, 154 in the y direction (W1 in FIG. 9). ) Is approximately 2.2 m.

Circular holes 155a-155g and 156a-156g are formed in the bottom plate 151 and the support plate 153 along the y direction, respectively. The circular holes 155a to 155g and 156a to 156g are holes that pass through the bottom plate 151 and the support plate 153 in a substantially vertical direction, respectively, and are substantially circular in plan view. In a plan view, the position of the center of the circular holes 155a to 155g is substantially the same as the position of the center of the circular holes 156a to 156g.

Light irradiating sections 30a to 30g are mounted on the circular holes 155a to 155g and 156a to 156g through guide members 70 and 70A (described later in detail) provided to cover the circular holes 155a to 155g and 156a to 156g, respectively. The mounting structure for mounting the light irradiating portions 30a to 30g on the frame 15 will be described in detail later.

Further, circular holes 157a to 157g are formed on the bottom plate 151 so as to be adjacent to the circular holes 155a to 155g. The lens barrel 601 of the reading section 60 is inserted into the circular holes 157a to 157g (described in detail later).

Holes 152a-152i and 154a-154i are formed in the side plates 152 and 154, respectively. The holes 152a to 152g and 154a to 154g are provided so as to overlap the positions of the circular holes 155a to 155g and 156a to 156g in the y direction, respectively. The holes 152a to 152g and 154a to 154g are used to mount the reading section 60 to the circular holes 157a to 157g. The holes 152h and 152i are respectively provided on both sides of the holes 152a to 152g, and the holes 154h and 154i are respectively provided on both sides of the round holes 154a to 154g. The frame 15 is a casting, and the holes 152a to 152i and 154a to 154i are used as casting punches that discharge the foundry sand to form an internal space during casting.

The inside of the support portion 15a is a cavity, but a partition wall 159 is provided inside the support portion 15a as a reinforcement. The partition wall 159 is a plate-shaped member, and an end surface thereof comes into contact with the bottom plate 151, the support plate 153, and the side plates 152 and 154. Thereby, at the position where the partition wall 159 is provided, the cavity inside the support portion 15a disappears, and vibration or deformation (deflection, distortion, etc.) of the support portion 15a is prevented.

The frame 15 includes a moving mechanism 161 that moves the support portion 15a along the column 15c in the z direction. The moving mechanism 161 moves the support portion 15a in the z direction within a range of about 10 mm. The moving mechanism 161 of this embodiment includes a rack 161a provided along the z-direction on an end surface substantially orthogonal to the longitudinal direction of the support portion 15a, and a pinion 161b rotatably provided on the column 15c. The rack 161a is fixed to the convex part 158 which protrudes outward from the side surface of the support part 15a using a screw etc. (not shown).

The frame 15 includes two permanent magnets 163 provided on the column 15c. The two permanent magnets 163 are arranged near both ends in the longitudinal direction of the support portion 15a. Permanent magnet 163 is a permanent magnet with permanent magnets and electromagnets. Only when loading and unloading current flows into the coil of the electromagnet, the built-in permanent magnet is turned on-off. The low-expansion alloy used in the frame 15 is a magnetic material, so it can be moved by the permanent magnet 163. The permanent magnet 163 only needs to be energized for a short time (for example, about 0.2 seconds) when it is turned on and off, and therefore has almost no heat generation. In addition, the permanent magnet of the permanent magnet 163 is fixed and unchanged after being turned on.

FIG. 5 is a diagram schematically illustrating a case where the frame body 15 is cut along the plane C of FIG. 3. A convex portion 161c is formed on the pillar 15c. The surface on the + x side of the convex portion 161c is a sliding surface 161d, and is subjected to a scraping process that is a grinding process that reduces frictional resistance.

The surface on the -x side of the support portion 15a is a sliding surface 161e. The sliding surface 161e is subjected to a scraping treatment in the same manner as the sliding surface 161d. Between the sliding surface 161e and the sliding surface 161d, an oil film having a thickness of about several μm is provided by the lubricating oil retained between the minute irregularities of the sliding surfaces 161d and 161e.

By rotating the pinion 161b provided in the column 15c, the support portion 15a to which the rack 161a is fixed moves up and down. When the moving mechanism 161 moves the support portion 15a up and down, the sliding surface 161d and the sliding surface 161e slide smoothly by the oil film formed between the sliding surface 161d and the sliding surface 161e.

When viewed in the y direction, the teeth of the rack 161a are located on the center line c in the x direction of the support portion 15a. In other words, the teeth of the rack 161a pass through the center of gravity of the support portion 15a and are located on a line approximately parallel to the z-direction. Therefore, no torque is generated when the pinion 161b is rotated to move the rack 161a (supporting portion 15a) up and down.

As shown in Figs. 3 and 4, a sliding surface 161d is also formed on the post 15c on the side where the rack 161a and the pinion 161b are not provided. In addition, a sliding surface 161e (see FIG. 5) subjected to a scratching process is formed on the support portion 15a so as to be in contact with the sliding surface.

An elastic member 160 is provided at the end of the support portion 15a along the column 15c. In FIGS. 3 and 4, only the elastic member 160 provided at the end on the −y side is shown, and the illustration of the elastic member 160 provided on the end on the + y side is omitted. As shown in FIG. 5, the elastic member 160 is provided below the support portion 15 a. A positioning member 162 is provided between the elastic member 160 and the support portion 15a. By inserting the elastic member 160 into the recessed portion 162a formed on the bottom surface of the positioning member 162, the position in the xy direction of the elastic member 160 is determined, and the elastic member 160 can expand and contract as the support portion 15a moves up and down. In this way, the elastic members 160 provided at both ends of the support portion 15a support the weight of the support portion 15a. The support portion 15a is approximately 660 kg to 700 kg, and the elastic member 160 can support a weight of approximately 600 kg.

The weight of the support portion 15a that cannot be supported by the elastic member 160 is supported by friction between the sliding surface 161d and the sliding surface 161e. The permanent magnet 163 is provided in the column 15c, and attracts the support portion 15a by flowing a current into the coil of the electromagnet. When the moving mechanism 161 does not move the supporting portion 15a up and down along the column 15c, the permanent magnet 163 attracts the supporting portion 15a, whereby the supporting portion 15a, that is, the rack 161a and the sliding surface 161e, are directed to the left in FIG. 5 (refer to the arrow in FIG. 5) ), And the sliding surface 161d is in close contact with the sliding surface 161e. By strongly compressing the sliding surface 161d and the sliding surface 161e, the oil film formed between the sliding surface 161d and the sliding surface 161e is eliminated. As a result, friction occurs between the sliding surface 161d and the sliding surface 161e.

When the oil film is excluded, the friction coefficient between the sliding surface 161d and the sliding surface 161e is 0.1 to 0.2. If the adsorption force of the permanent magnet 163 is 1500 kg, the friction between the sliding surface 161d and the sliding surface 161e supports 150 kg. weight. There are two parts of the sliding surface on both sides of the support portion 15a, so the weight ta (approximately 60 kg to 100 kg) of the support portion 15a that cannot be supported by the elastic member 160 can be supported by friction. In this way, when the moving mechanism 161 does not move the supporting portion 15a up and down, the supporting portion 15a can be supported so that the position in the height direction of the supporting portion 15a does not change.

In addition, when the permanent magnet 163 does not attract the support portion 15a, the rack 161a and the pinion 161b can be meshed to make the rack 161a, that is, the support portion 15a to which the rack 161a is fixed and the sliding surface 161e formed on the support portion 15a to the figure. 5Move to the left. The weight ta of the support portion 15a that cannot be supported by the elastic member 160 is transmitted from the rack 161a to the pinion 161b. The pressure angle of the rack 161a and the pinion 161b is 20 degrees, and the pinion 161b is ta × cos20 ° in weight. The rack portion 161a, that is, the supporting portion 15a is pushed up, and the rack surface 161a, that is, the sliding surface 161e, is pressed against the sliding surface 161d by a force of ta × sin 20 °.

Next, the light irradiation unit 30 will be described. FIG. 6 is a perspective view of a main part showing the outline of the light irradiation section 30a. The light irradiation section 30a mainly includes a DMD 31a, an objective lens 32a, a light source section 33a, an AF processing section 34a, a cylindrical portion 35a, a flange 36a, mounting portions 37a, 38a, and a driving portion 39a. The light irradiating part 30b ~ 30g has DMD31b ~ 31g, objective lens 32b ~ 32g, light source part 33b ~ 33g, AF processing part 34b ~ 34g, cylindrical part 35b ~ 35g, flange 36b ~ 36g, mounting part 37b ~ 37g, 38b ~ 38g, and driving parts 39b ~ 39g. Since the light irradiating portion 30b to 30g have the same configuration as the light irradiating portion 30a, description thereof is omitted.

DMD31a is a digital micromirror device (DMD), which can illuminate planar laser light. The DMD31a includes a plurality of movable micromirrors (not shown), and one pixel of light is irradiated from one micromirror. The size of the micromirror is approximately 10 μm, and the micromirror is arranged in a two-dimensional shape. The DMD 31a is irradiated with light from the light source section 33a (to be described in detail later), and the light is reflected by each micromirror. The micromirror can rotate around an axis substantially parallel to its diagonal line, and can switch between ON (reflecting light to the mask M) and OFF (not reflecting light to the mask M). Since DMD31a is known, detailed description is omitted.

The objective lens 32 a images the laser light reflected by each micromirror of the DMD 31 a on the surface of the mask M. At the time of drawing, light is irradiated from the light irradiation portion 30a to the light irradiation portion 30g, respectively, and this light forms an image on the mask M, thereby drawing a pattern on the mask M.

The light source section 33 a mainly includes a light source 331, a lens 332, a fly-eye lens 333, lenses 334, 335, and a mirror 336. The light source 331 is, for example, a laser diode, and light emitted from the light source 331 is guided to the lens 332 through an optical fiber or the like.

Light is guided from the lens 332 to the fly-eye lens 333. The fly-eye lens 333 is a two-dimensional arrangement of a plurality of lenses (not shown), and a large number of point light sources are produced in the fly-eye lens 333. The light passing through the fly-eye lens 333 becomes parallel light through the lenses 334 and 335 (for example, a condenser lens), and is reflected by the mirror 336 toward the DMD 31 a.

The AF processing unit 34a gathers the focus of the light irradiated onto the mask M on the mask M, and mainly includes: an AF light source 341, a collimating lens 342, an AF cylindrical lens 343, a five lens 344, 345 and a lens 346 , And AF sensors 347, 348. The light irradiated from the AF light source 341 passes through the collimating lens 342 to become parallel light, passes through the AF cylindrical lens 343 to become linear light, is reflected by the lens 344, and is imaged on the surface of the mask M. The light reflected at the mask M is reflected by the five lenses 345, condensed by the lens 346, and incident on the AF sensors 347, 348. The five beams 344, 345 bend the light at a bending angle of approximately 97 degrees. In addition, mirrors can be used in place of the Mayan 344, 345, but the focus deviation is caused by the angular deviation of the reflector, so it is ideal to use Mayan. The AF processing unit 34a performs an auto-focusing process for determining a focus position based on a result of light received by the AF sensors 347 and 348. In addition, such an optical lever type (automatic focus type) automatic focusing process is known, so detailed description is omitted.

The light irradiating portion 30 a includes a cylindrical portion 35 a having a substantially cylindrical shape in which an optical system (including the objective lens 32 a) is provided. A flange 36a is provided at an end on the upper side of the cylindrical portion 35a. The flange 36 a holds the lens 332, the fly-eye lens 333, and the lenses 334 and 335 on the upper side. Therefore, the center of gravity of the light irradiation portion 30a is shifted from the optical axis ax to the left direction in FIG. 6.

Further, mounting portions 37a and 38a are provided on the cylindrical portion 35a. The mounting portions 37 a and 38 a are used for mounting to the frame body 15. The mounting portion 37a is provided near the flange 36a, and the mounting portion 38a is provided near the lower end of the cylindrical portion 35a. A hollow portion 372 having a larger diameter than the outer diameter of the mounting portion 38a is formed in the mounting portion 37a. Thereby, the cylindrical portion 35a can be pulled upward. In addition, in FIG. 6, illustrations of the screw holes 371 and 381 (described later in detail) formed in the mounting portions 37 a and 38 a are omitted.

The mounting portion 37a (ie, the light irradiation portion 30a) is moved in the vertical direction (z direction) by the driving portion 39a. FIG. 7 is a side view schematically showing the driving unit 39a. The driving portion 39 a mainly includes a piezoelectric element 391 and a connection portion 392.

The piezoelectric element 391 is a solid actuator that is displaced by applying a voltage. The non-displaced portion (for example, the lower end) of the piezoelectric element 391 is provided on the support portion 15 a of the frame 15 through the mounting portion 395 (see FIG. 11). When a voltage is applied to the piezoelectric element 391, the piezoelectric element 391 expands, and the upper end of the piezoelectric element 391 moves upward. A broken line in FIG. 7 indicates a state where the piezoelectric element 391 is contracted, and a solid line in FIG. 7 indicates a state where the piezoelectric element 391 is extended.

The connection portion 392 is a substantially cylindrical member whose lower end is screwed to the piezoelectric element 391. The connection portion 392 moves up and down as the piezoelectric element 391 expands and contracts.

A convex portion 393 having an arcuate tip is provided on the upper end of the connecting portion 392. The front end of the convex portion 393 is in contact with the lower side of the mounting portion 37 a (see FIG. 6). Therefore, when the piezoelectric element 391 is extended, the light irradiation portion 30a moves in the + z direction, and when the piezoelectric element 391 contracts, the light irradiation portion 30a moves in the -z direction.

A plurality of grooves 394 are provided on a side surface of the connecting portion 392. The groove 394 is formed so as to cut diagonally downward as it approaches the central axis. Therefore, even if the piezoelectric element 391 is bent and extended (refer to the two-dot chain line in FIG. 7), the connecting portion 392 is deformed in the portion of the groove 394, so that the convex portion 393 can be moved in the vertical direction without moving in the horizontal direction.

Next, the reading unit 60 will be described. The reading unit 60a to the reading unit 60g have the same configuration. Therefore, the reading unit 60a will be described below.

FIG. 8 is a perspective view showing the outline of the reading section 60a, and is a perspective view of the main part. The reading section 60a is a high magnification microscope optical system, and mainly includes a microscope and a camera 606 for imaging a pattern obtained by the microscope. The microscope has a lens barrel 601 with an objective lens inside, and irradiates light to the objective lens (here, visible light). ), A light source unit 602, a lens barrel 603 formed of a low thermal conductor such as titanium, zirconia, a tube lens 604 provided inside the lens barrel 603, and light transmitted from the light source unit 602 and guided from an objective lens Reflective half mirror 605.

The light source unit 602 is a member that irradiates visible light (for example, light having a wavelength of approximately 450 to 600 nm) and irradiates light in the form of a surface light source. The light source unit 602 includes a light source 621 disposed in a distance, a fiber bundle 622 that guides light from the light source 621, a diffusion plate 623 disposed near an end face of the optical fiber, and a collimating lens 624 disposed adjacent to the diffusion plate 623.

The light source 621 is, for example, a white LED, and emits light in a visible light region. Since the light source 621 generates heat, the light source 621 is disposed at a position separated from the reading section 60a. The light emitted from the light source 621 is guided using a fiber bundle 622. After the diffusion plate 623 is guided by the optical fiber bundle 622, the light radiated from the end surface of the optical fiber bundle 622 is expanded and converted uniformly, and the collimating lens 624 guides the light to the objective lens.

The light irradiated from the light source unit 602 passes through the objective lens and is reflected at the pattern P or the like, and then is guided to the objective lens again. The objective lens is a visible light lens having a high magnification of approximately 100 times, a numerical aperture (NA, numerical aperture) of approximately 0.8, and an operating distance of approximately 2 mm. The tube lens 604 is a lens that images light from an infinity-corrected objective lens and has a focal length of approximately 200 mm.

The camera 606 series has a resolution of about UXGA (1600 × 1200 pixels), a size of about 2/3 inches, and a power consumption of about 3 W. The camera 606 acquires an image of the pattern P. The camera 606 is surrounded by a water-cooled water jacket. The camera 606 can perform ultra-low-speed scanning by the control unit 201 a (see FIG. 13). Therefore, the fine pattern drawn on the mask M can be accurately read.

The reading portion 60a is fixed to the cylindrical portion 35a through a mounting portion (not shown). Thereby, the reading section 60a moves in the z direction together with the light irradiation section 30a.

Next, a mounting structure for mounting the light irradiating sections 30a to 30g on the frame 15 will be described. In the mounting structure of this embodiment, the guide member 70 is mounted on the base plate 151, the guide member 70A is mounted on the support plate 153, and the light irradiation portions 30a to 30g are mounted on the guide members 70 and 70A, thereby the light irradiation portion 30a ~ 30g is installed in frame 15.

FIG. 9 (A) shows the positional relationship between the base plate 151 and the guide member 70 when the guide member 70 is mounted on the base plate 151, and FIG. 9 (B) shows the support plate 153 and the guide member 70A when the guide member 70A is mounted on the support plate 153 Location relationship.

Seven guide members 70 are provided on the bottom plate 151 so as to cover the circular holes 155a to 155g. Seven guide members 70A are provided on the support plate 153 so as to cover the circular holes 156a to 156g.

The difference between the guide member 70 and the guide member 70A is the presence or absence of the holes 75 and 76 and the diameter. Holes 75 and 76 are formed in the guide body 71 of the guide member 70, but holes 75 and 76 are not formed in the guide body 71A of the guide member 70A.

Mounting holes 74 and 74A are formed in the guide members 70 and 70A at substantially the center. The holes 75 and 76 are formed on a line passing through the center of the mounting hole 74 with the mounting hole 74 therebetween. The guide members 70 and 70A will be described in detail later.

The guide member 70 and the circular holes 155a to 155g are arranged substantially concentrically, and the guide member 70A and the circular holes 156a to 156g are arranged substantially concentrically.

The guide members 70 and the circular holes 155a to 155g are evenly arranged in the central portion of the bottom plate 151, and the guide members 70A and the circular holes 156a to 156g are evenly arranged in the central portion of the support plate 153. The interval between the adjacent circular holes 155a to 155g (that is, the guide member 70) and the interval W2 between the adjacent circular holes 156a to 156g (that is, the guide member 70A) are approximately the same as the interval between the light irradiation portions 30a to 30g.

A cylindrical portion 35 of a light irradiation portion 30a is provided on the guide members 70 and 70A provided in the circular holes 155a and 156a. A light irradiation section 30b is provided on the guide members 70 and 70A provided in the circular holes 155b and 156b. Similarly, the light irradiating portions 30c to 30g are provided on the guide members 70 and 70A provided in the circular holes 155c to 155g and 156c to 156g, respectively.

The circular hole 155a and the circular hole 156a are formed so as to overlap with each other in a plan view. Similarly, the circular holes 155b to 155g and the circular holes 156b to 156g are formed so that their positions in a plan view overlap each other.

Next, the mounting structure will be described by taking the mounting of the light irradiating portion 30a to the bottom plate 151 as an example. FIG. 10 is an exploded perspective view of a mounting structure of a portion where the light irradiation portion 30 a is mounted on the bottom plate 151. The mounting structure for mounting the light irradiating portions 30b to 30g on the base plate 151 and the mounting structure for mounting the light irradiating portions 30a to 30g on the support plate 153 are the same as the mounting structure for mounting the light irradiating portion 30a on the base plate 151, Explanation is omitted.

First, the guide member 70 will be described. The guide member 70 mainly includes a substantially thin plate-shaped guide portion body 71 and pressing rings 72 and 73.

The guide body 71 has a substantially thin plate shape, and has a substantially circular plate shape in a plan view. The guide body 71 is formed of a metal having a thickness of approximately 0.1 mm so as to be easily deformed. As the metal, stainless steel, phosphor bronze, or the like can be used, but it is preferable to use a more homogeneous phosphor bronze.

A mounting hole 74 is formed in the guide portion body 71 at substantially the center. The mounting hole 74 is formed such that the center a1 of the guide body 71 becomes the center of the mounting hole 74. Further, a plurality of holes 77 are formed along the outer periphery of the guide portion body 71 in the guide portion body 71, and a plurality of holes 78 are formed along the mounting hole 74. Hole 77 is a hole for inserting the screw 85, and hole 78 is a hole for inserting the screw 86. The positions and numbers of the holes 77 and 78 are not limited to those shown in the drawings.

In a state where the guide body 71 is provided on the bottom plate 151, the mounting holes 74 and the circular holes 155a are arranged in a substantially concentric circle shape. The cylindrical portion 35 a is inserted into the mounting hole 74. In a state where the cylindrical portion 35 a is inserted into the mounting hole 74, the optical axis ax and the center a1 of the mounting hole 74 substantially coincide.

The pressing rings 72 and 73 have a thickness of about 3 mm and are formed of the same material as the guide body 71. In this embodiment, the guide body 71 and the pressure rings 72 and 73 are formed separately, but the guide body 71 and the pressure rings 72 and 73 may be integrally formed.

The pressing ring 72 is substantially annular and is provided substantially along the outer periphery of the guide body 71. The pressing ring 73 is substantially annular and is provided substantially along the mounting hole 74. A plurality of holes 77A for inserting screws 85 are formed in the pressing ring 72, and a plurality of holes 78A for inserting screws 86 are formed in the pressing ring 73.

Next, the attachment of the light irradiation part 30a to the base plate 151 is demonstrated. The guide member 70 is provided between the light irradiation portion 30 a and the frame 15 (here, the bottom plate 151).

The guide member 70 is provided on the bottom plate 151 so as to cover the circular hole 155a. Place the pressing ring 72 on the guide body 71, insert the screws 85 into the holes 77, 77A, and screw the screws 85 into the screw holes 155h formed in the bottom plate 151, thereby fixing the guide member 70 to the bottom plate 151 .

The light irradiation portion 30 a (that is, the cylindrical portion 35 a) is provided on the guide member 70 through the mounting portion 38 a. Set the pressing ring 73 under the guide body 71, insert the screw 86 into the holes 78, 78A, and screw the screw 86 into the screw hole 381 formed in the flange 38, thereby fixing the guide member 70 to the mounting portion 38a.

By fixing the guide member 70 to the frame body 15 and the cylindrical portion 35 through the pressing rings 72 and 73 in this manner, deformation of the guide portion body 71 can be prevented.

The state where the light irradiating portions 30a to 30g are mounted on the housing 15 by the mounting structure of the present invention will be described using the light irradiating portion 30a as an example. The mounting state of the light irradiating portions 30b to 30g to the frame body 15 is the same as the mounting state of the light irradiating portion 30a to the frame body 15, and therefore description thereof is omitted.

FIG. 11 is a diagram schematically showing a state where the light irradiation section 30 a is mounted on the frame body 15 (here, the support section 15 a). FIG. 11 shows a state cut along a surface passing through the center of the mounting hole 74 and the holes 75 and 76. In Fig. 11, the cross-section shows a part of the constituent elements. In FIG. 11, illustrations of fastening members such as screws 85 and 86 and holes for providing these are omitted.

The cylindrical portion 35a is inserted into the mounting holes 74 and 74A of the guide members 70 and 70A. In a state where the mounting portion 38 a is positioned above the guide member 70 and a portion closer to the lower side than the mounting portion 38 a of the cylindrical portion 35 a is positioned closer to the lower side than the guide member 70, the guide member 70 and the mounting member are mounted using the pressing ring 73. The parts 38a are fixed together. Further, in a state where the mounting portion 37a is positioned above the guide member 70A, and a portion closer to the lower side than the mounting portion 37a of the cylindrical portion 35a is positioned closer to the lower side than the guide member 70A, the guide member 70A is pressed using the pressing ring 73A. It is fixed to the mounting portion 37a. The guide member 70 is fixed to the bottom plate 151 using a pressing ring 72, and the guide member 70A is fixed to the support plate 153 using a pressing ring 72A.

In a plan view, the center of the circular hole 155a and the center of the circular hole 156a are substantially the same. Therefore, the light irradiating portion 30a is mounted on the support portion 15a so that the optical axis ax becomes a substantially vertical direction.

The holes 75 and 76 are aligned with the positions of the AF light source 341 and the AF sensors 347 and 348 in a horizontal direction in such a manner that the light radiated downward from the AF light source 341 and the reflected light at the mask M can pass through, respectively. In other words, the positions of the holes 75 and 76 overlap the positions of the AF light source 341 and the AF sensors 347 and 348 in a plan view, respectively. By forming the holes 75 and 76 in this manner, even when the guide members 70 and 70A are used, the AF processing of the light irradiation portion 30a can be performed.

The driving portion 39a pushes up the mounting portion 37a through the pressing ring 73A. The center of gravity G of the light irradiation portion 30a is located near the position where the driving portion 39a pushes up the mounting portion 37a. Therefore, the driving portion 39a pushes up the light irradiation portion 30a near the center of gravity G. Thereby, the light irradiation part 30a moves stably up and down.

(A) of FIG. 12 shows a state in which the light irradiating portion 30a is not moved (center of the stroke), (B) shows a state in which the light irradiating portion 30a is moved to the lower side (lower stroke end), and (C) shows that the light irradiating portion 30a is moved to the upper side Status (upper stroke).

Since the guide members 70 and 70A are fixed to the cylindrical portion 35a through the mounting portions 37a and 38a (not shown in FIG. 12), if the cylindrical portion 35a is moved up and down by the drive portion 39a, the guide members 70 and 70A are accompanied by This up and down movement deforms.

The moving amount of the cylindrical portion 35a obtained by the driving portion 39a is approximately 30 μm. Since the guide members 70 and 70A are made of thin metal, the guide members 70 and 70A expand and contract (elastically deform) in cooperation with the cylindrical portion 35a of approximately 30 μm to move up and down. Since the guide members 70 and 70A have a substantially circular shape in a plan view, the amount of deformation of the guide members 70 and 70A does not depend on the place, and is substantially fixed, and the cylindrical portion 35a does not move in the xy direction. In addition, since the holes 75 and 76 are sufficiently small, the influence given to the deformation of the guide members 70 and 70A is small. In addition, by exemplifying that the movement amount of the cylindrical portion 35a obtained by the driving portion 39a, that is, approximately 30 μm is the amount required for the AF, the driving portion 39a may move the cylindrical portion 35a by approximately several tens of μm.

In addition, as the light irradiation section 30a moves up and down, the reading section 60a (not shown in FIG. 12) provided in the light irradiation section 30a also moves up and down. The lens barrel 601 of the reading section 60a is inserted into the circular hole 157a (see FIG. 3 and the like), and the lens barrel 601 is not fixed in the circular hole 157a. Therefore, the lens barrel 601 does not cause defects due to its movement up and down.

FIG. 13 is a block diagram showing the electrical configuration of the exposure apparatus 1. As shown in FIG. The exposure device 1 includes a central processing unit (CPU) 201, a random access memory (RAM) 202, a read only memory (ROM) 203, and an input / output interface (I / F). ) 204, communication interface (I / F) 205, and media interface (I / F) 206, which are related to the light irradiation section 30, the position measuring sections 41 and 42, the laser interferometers 51 and 52, and the driving sections 81 and 82. , 83, etc. are interconnected.

The CPU 201 operates based on programs stored in the RAM 202 and the ROM 203 and controls each unit. The CPU 201 receives input signals from the position measuring units 41 and 42 and the laser interferometers 51 and 52. The signals output from the CPU 201 are output to the driving sections 81, 82, and 83 and the light irradiation section 30.

The RAM 202 is a volatile memory. The ROM 203 is a non-volatile memory that stores various control programs and the like. The CPU 201 operates based on programs stored in the RAM 202 and the ROM 203 and controls each unit. In addition, the ROM 203 stores a startup program performed by the CPU 201 when the exposure device 1 is started, a program depending on the hardware of the exposure device 1, and drawing data to the mask M, and the like. The RAM 202 stores programs executed by the CPU 201 and data used by the CPU 201.

The CPU 201 controls an input / output device 211 such as a keyboard or a mouse through the input / output interface 204. The communication interface 205 receives data from other devices through the network 212 and sends it to the CPU 201, and sends data generated by the CPU 201 to other devices through the network 212.

The media interface 206 reads programs or data stored in the memory medium 213 and stores the programs or data in the RAM 202. The storage medium 213 is, for example, an IC card, an SD card, or a DVD.

In addition, a program that realizes each function is read from, for example, the storage medium 213, is installed in the exposure device 1 through the RAM 202, and is executed by the CPU 201.

The CPU 201 has a function of a control section 201 a that controls each section of the exposure apparatus 1 based on an input signal. The control unit 201a is constructed by executing a specific program read by the CPU 201. The processing performed by the control unit 201a will be described in detail later.

The configuration of the exposure device 1 shown in FIG. 13 is the main configuration when describing the features of this embodiment. For example, the configuration provided by a general information processing device is not excluded. The constituent elements of the exposure device 1 may be classified into more constituent elements according to the processing content, and processing of a plurality of constituent elements may be performed for one constituent element.

The operation of the exposure apparatus 1 configured as described above will be described. The following processing is mainly performed by the control unit 201a.

The control unit 201a uses the laser interferometers 51 and 52 to perform the calibration of the position measuring units 41 and 42. Although the measured values of the laser interferometers 51 and 52 are correct, fluctuations close to 10 nm occur under the downflow of clean air in the exposure device 1. In addition, the laser interferometers 51 and 52 can only measure the relative position (the origin cannot be known).

The measurement results of the position measurement sections 41 and 42 include errors and the like caused by the pitch and sideways of the mask holding section 20. Therefore, the relationship between the measurement values of the laser interferometers 51 and 52 and the measurement values obtained by the position measurement sections 41 and 42 is investigated in advance so that the measurement results obtained by the position measurement sections 41 and 42 contain no errors. After the correction processing by the position measuring units 41 and 42 is performed, the drawing processing is performed using the position measuring units 41 and 42 to improve accuracy.

The control unit 201 a draws a pattern toward the temporary mask M from the light irradiation portions 30 a to 30 g before performing drawing processing, and reads the pattern by the reading portion 60 to generate correction data. In addition, when the control unit 201a detects that the light irradiation units 30a to 30g are not focused by the AF processing units 34a to 34g, the drive units 39a to 39g respectively move the light irradiation units 30a to 30g in the z direction to cause the light irradiation units 30a ~ 30g focus.

The drawing process is performed after several hours have passed after the mask M is placed on the mask holding portion 20. The control unit 201a moves the mask holding unit 20 in the x direction and the y direction based on the measurement results of the position measurement units 41 and 42. While the control unit 201 a moves the mask holding unit 20, it irradiates light from the light irradiation unit 30 when the mask M passes under the light irradiation unit 30 to perform drawing processing.

According to this embodiment, since the mounting structure using the guide members 70 and 70A is provided, the light irradiation portion 30 can be moved up and down in the vertical direction and the optical axis ax can be prevented from being shaken.

For example, when a cross roller guide is used in the upward and downward movement of the light irradiating part 30, since the cylindricality of the roller has a limit, the jitter of the optical axis ax when it is moved about 30 μm will generate about 100 nm. In addition, for example, when an air slider is used for moving the light irradiating part 30 up and down, the light irradiating part 30 vibrates about 30 nm in the horizontal direction when it is moved about 30 μm. In these methods, since the amount of movement in the horizontal direction of the optical axis ax is too large, the positions of the light irradiation parts 30b to 30f cannot be obtained by interpolation based on the positions of the light irradiation parts 30a and 30g, and the drawing position cannot be controlled. In contrast, this embodiment has a mounting structure using the guide members 70 and 70A, so that the jitter of the optical axis ax when the light irradiating part 30 is moved up and down can be minimized (the jitter of the optical axis ax is several nm or less) In the drawing, a light lever-type AF processing section 34a to 34g is used to obtain a change in the thickness of the mask M as a drawing object or a change in the height direction (z direction) of the mask holding section 20 with high accuracy. Perform drawing processing.

In particular, in this embodiment, since the light irradiating portion 30 moves up and down relatively small, which is about several tens of μm, even if the light irradiating portion 30 moves up and down, the guide members 70 and 70A will not be plastically deformed. Mounting structure of metal guide members 70 and 70A. In addition, since the guide members 70 and 70A have a substantially circular plate shape in plan view, and the guide members 70 and 70A are evenly deformed, the jitter of the optical axis ax when the light irradiation portion 30 is moved up and down can be reduced to a few nm or less. . In particular, the guide members 70 and 70A are made of metal having a thickness of approximately 0.1 mm, and the guide members 70 and 70A can be easily deformed and tough.

Moreover, according to this embodiment, since the guide members 70 and 70A have the pressing rings 72 and 73, deformation of the guide body 71 caused by mounting the guide members 70 and 70A to the frame 15 and the light irradiation portion 30 can be prevented.

In addition, according to this embodiment, since the entire light irradiation unit 30 is moved up and down to focus it, it is possible to perform focus adjustment processing on a mask manufacturing apparatus using a high-resolution lens having an NA of about 0.65. For example, the application of focus adjustment processing that changes the configuration of optical components to a mask manufacturing device is impractical because defects such as aberrations become larger or focus ranges become narrower. In view of this, if it is a focus adjustment process for moving the entire light irradiation unit 30 up and down, it can be applied to a mask manufacturing apparatus. In other words, this embodiment is particularly valuable for applying to a mask manufacturing apparatus that is a high-precision exposure apparatus.

<Second Embodiment> A second embodiment of the present invention is a state in which a plurality of cutout holes are formed in the guide member. Hereinafter, an exposure apparatus according to a second embodiment will be described. The difference between the exposure device 1 of the first embodiment and the exposure device of the second embodiment is only the mounting structure of the light irradiation portion 30. Therefore, the following describes only the mounting structure of the light irradiation portion 30 in the exposure device of the second embodiment. Be explained. The same parts as those in the first embodiment are denoted by the same reference numerals and descriptions thereof are omitted.

FIG. 14 relates to the exposure apparatus of the second embodiment, and (A) shows the positional relationship between the base plate 151 and the guide member 70B when the guide member 70B is mounted on the base plate 151, and (B) shows the guide member 70C on the support plate 153. The positional relationship between the support plate 153 and the guide member 70C.

In the mounting structure in which the light irradiating portions 30a to 30g are mounted on the housing 15, the guide members 70B and 70C are mounted on the base plate 151 and the support plate 153, and the light irradiating portions 30a to 30g are mounted on the guide members 70B and 70C. Seven guide members 70B are provided on the bottom plate 151 so as to cover the circular holes 155a to 155g, and seven guide members 70C are provided on the support plate 153 so as to cover the circular holes 156a to 156g.

The difference between the guide member 70 and the guide member 70B and the difference between the guide member 70A and the guide member 70C are the presence or absence of a cutout hole 79. The guide members 70B and 70C each have a guide plate body 71B and 71C having a substantially thin plate shape. The difference between the guide body 71B and the guide body 71C is only the diameter.

The guide body 71B and 71C are formed in the same manner as the guide bodies 71 and 71A, and are formed into a substantially thin plate shape by a metal having a thickness of approximately 0.1 mm, and have a substantially circular plate shape in a plan view. Mounting holes 74 and 74A are formed in the guide body 71B and 71C at approximately the center.

A plurality of annular fan-shaped cutout holes 79 are formed in the guide body 71B and 71C. The cutout hole 79 is formed along the circumferential direction. In this embodiment, the eight cutout holes 79 are arranged at intervals of approximately 45 degrees, and the number, position, size, shape, and the like of the cutout holes 79 are not limited to this.

FIG. 15 is an exploded perspective view of a mounting structure of a portion where the light irradiation portion 30 a is mounted on the support plate 153. In FIG. 15, a portion located above the flange 36 a of the light irradiation portion 30 a is omitted. The mounting structure for mounting the light irradiating portion 30a to 30g on the base plate 151 and the mounting structure for mounting the light irradiating portion 30b to 30g on the support plate 153 are the same as the mounting structure for mounting the light irradiating portion 30a to the support plate 153, and are therefore omitted. Instructions.

The guide member 70C is provided on the support plate 153 so as to cover the circular hole 156a. Place the pressing ring 72A on the guide body 71B, insert the screw 85 into the holes 77 and 77A, and screw the screw 85 into the screw hole 156h formed in the support plate 153, thereby fixing the guide member 70C to Support board 153.

The cylindrical portion 35a is provided on the guide member 70C through the mounting portion 37a. Set the pressing ring 73A under the guide body 71B, insert the screw 86 into the holes 78, 78A, and screw the screw 86 into the screw hole 371 formed in the flange 37, thereby fixing the guide member 70C to the installation部 37a。 37a.

FIG. 16 is a view showing a state in which the light irradiating portion 30 a is mounted on the housing 15. The cylindrical portion 35a is inserted into the mounting holes 74 and 74A of the guide members 70B and 70C. The AF light source 341 and the AF sensors 347 and 348 are aligned with the cutout hole 79 in the horizontal direction. In other words, the position of the cutout hole 79 overlaps the positions of the AF light source 341 and the AF sensors 347 and 348 in a plan view. Therefore, the light radiated downward from the AF light source 341 is reflected at the mask M, and the reflected light is incident on the AF sensors 347 and 348.

In this embodiment, since the guide members 70B and 70C have cutout holes 79, the position of the light irradiation portion 30a in the rotation direction can be fine-tuned. The rotation driving unit 90a will be described below. In addition, the light irradiating sections 30b to 30g also have the rotation driving sections 90b to 90g similarly to the light irradiating section 30a. However, since the rotation driving sections 90a to 90g have the same structure, the description of the rotation driving sections 90b to 90g is omitted.

As shown in FIG. 15, the rotation driving unit 90 a mainly includes a protrusion 91 a, a piezoelectric element 92 a, and an elastic member 93 a. The protrusion 91a has a substantially rod shape and is provided on a side surface of the flange 36a. The front end of the piezoelectric element 92a is in contact with the protrusion 91a. The non-displaced portion of the piezoelectric element 92a (the end on the side not in contact with the protrusion 91a) is provided on the support portion 15a (see FIG. 3 and the like). An elastic member 93a is provided on the protrusion 91a. The elastic member 93a is, for example, a compression spring, and one end is provided on the protrusion 91a, and the other end is provided on the support portion 15a. Therefore, when the piezoelectric element 92a is elongated, the light irradiating portion 30a is rotated in a counterclockwise direction when viewed from the + z direction, and when the piezoelectric element 92a is contracted, the light irradiating portion 30a is rotated in a clockwise direction when viewed from the + z direction.

According to this embodiment, since the mounting structure using the guide members 70B and 70C is provided, the optical axis ax can be prevented from being shaken when the light irradiation section 30 is moved up and down. Further, since the cutout holes 79 are formed in the guide members 70B and 70C, not only the light irradiation portion 30 can be moved in the vertical direction, but also can be moved in the rotation direction. Since the piezoelectric element 92a is used for movement in the rotation direction, the angle can be adjusted in seconds (1 second = approximately 2.78 degrees).

In addition, according to this embodiment, the position of the cutout hole 79 overlaps the positions of the AF light source 341 and the AF sensors 347 and 348 in a plan view. Therefore, it is not necessary to form the holes 75 and 76 in the guide members 70B and 70C. In addition, since the cutout holes 79 are arranged approximately evenly in the circumferential direction, when the light irradiation portion 30a is moved up and down, the guide portion bodies 71B and 71C are evenly deformed. Therefore, the light irradiation portion 30a can be prevented from moving in the horizontal direction.

In this embodiment, the rotation driving units 90a to 90g are used to rotate the light irradiation units 30a to 30g, respectively, but the method of rotating the light irradiation units 30a to 30g is not limited to this. For example, a feed screw may be provided on the protrusion 91a so that the front end of the feed screw abuts on the side plate 154, and the feed screw may be manually rotated to rotate the light irradiation portion 30a.

<Third Embodiment> A third embodiment of the present invention is a configuration in which the plate thickness of the guide member is about 1 mm. Hereinafter, an exposure apparatus according to a third embodiment will be described. The difference between the exposure device 1 of the first embodiment and the exposure device of the third embodiment is only the mounting structure of the light irradiation section 30. Therefore, the following describes only the mounting structure of the light irradiation section 30 in the exposure device of the third embodiment. Be explained. The same parts as those in the first embodiment are denoted by the same reference numerals and descriptions thereof are omitted.

FIG. 17 is an exposure apparatus according to the third embodiment, and (A) shows the positional relationship between the base plate 151 and the guide member 70D when the guide member 70D is mounted on the base plate 151, and (B) shows the guide member 70E on the support plate 153. The positional relationship between the support plate 153 and the guide member 70E.

In the mounting structure in which the light irradiating portions 30a to 30g are mounted on the frame 15, the guide members 70D and 70E are mounted on the base plate 151 and the support plate 153, and the light irradiating portions 30a to 30g (not shown in FIG. 17) are mounted on The guide members 70D and 70E. Seven guide members 70D are provided on the bottom plate 151 so as to cover the circular holes 155a to 155g, and seven guide members 70E are provided on the support plate 153 so as to cover the circular holes 156a to 156g.

The guide members 70D and 70E respectively have guide portion bodies 71D and 71E having a substantially thin plate shape. FIG. 18 (A) is a diagram showing the outline of the guide body 71D, and FIG. 18 (B) is a diagram showing the outline of the guide body 71E.

The difference between the guide member 70 and the guide member 70D, and the difference between the guide member 70A and the guide member 70E are the plate thickness and the presence or absence of cutout holes 79A to 79D. In addition, the hole 76 is omitted in FIG. 18 (A).

The guide portion bodies 71D and 71E are substantially thin plates, and are substantially circular plates in a plan view. The guide body 71D and 71E are formed of a metal having a thickness of approximately 1 mm. As the metal, stainless steel, phosphor bronze, or the like can be used, but it is preferable to use a more homogeneous phosphor bronze. In addition, the term "approximately 1 mm" in the present invention means an error including approximately 1 mm or less with respect to approximately 1 mm.

Mounting holes 74 and 74A are formed in the guide body 71D and 71E at approximately the center. Further, a plurality of holes 77 are formed along the outer periphery of the guide portion body 71 in the guide portion bodies 71D and 71E, and a plurality of holes 78 are formed along the mounting holes 74 and 74A.

A plurality of cutout holes 79A, 79B each having a substantially circular arc shape are formed in the guide portion body 71D, so that the guide portion body 71D is easily deformed. The cutout holes 79A and 79B are arranged at equal intervals in the circumferential direction, respectively. The radius of the cutout hole 79A is smaller than the radius of the cutout hole 79B. The cutout hole 79B is disposed outside the cutout hole 79A. In addition, the end region 79Aa including the end of the cutout hole 79A and the end region 79Ba including the end of the cutout hole 79B approximately coincide with each other in the circumferential direction. In addition, end regions 79Aa and 79Ba exist at both ends of the cutout holes 79A and 79B, respectively.

A plurality of cutout holes 79C and 79D each having a substantially circular arc shape are formed in the guide portion body 71E, so that the guide portion body 71E is easily deformed. The cutout holes 79C and 79D are arranged at equal intervals in the circumferential direction, respectively. The radius of the cutting hole 79C is smaller than the radius of the cutting hole 79D, and the cutting hole 79D is disposed outside the cutting hole 79C. In addition, the end region 79Ca including the end of the cutout hole 79C and the end region 79Da including the end of the cutout hole 79D substantially coincide with each other in the circumferential direction. In addition, end regions 79Ca and 79Da exist at both ends of the cutout holes 79C and 79D, respectively.

In this embodiment, there are four cutout holes 79A, 79B, 79C, and 79D, and the positions and numbers of the cutout holes 79A, 79B, 79C, and 79D are not limited thereto.

The positions of the end region 79Aa and the end region 79Ba in the circumferential direction are substantially the same, and the overlapping positions are arranged in the circumferential direction on average (for example, at approximately every 45 degrees). Further, the positions of the end region 79Ca and the end region 79Da in the circumferential direction are substantially the same, and the overlapping positions are arranged in the circumferential direction on average (for example, at approximately every 45 degrees). Therefore, if a line extending radially in a radial direction is drawn from the center point of the guide body 71D, 71E, the line must pass through at least one of the cutout holes 79A to 79D. Therefore, the amount of deformation of the guide body 71D, 71E is substantially constant regardless of the position in the circumferential direction. In addition, by arranging the cutout holes 79A to 79D in this way, even if a thicker plate having a thickness of about 1 mm is used for the guide portion bodies 71D and 71E, the guide portion bodies 71D and 71E follow the cylindrical portion 35a of approximately 30 μm. Move up and down to scale.

FIG. 19 is an exploded perspective view of a mounting structure of a portion where the light irradiation portion 30 a is mounted on the support plate 153. In FIG. 19, a portion located above the flange 36 a of the light irradiation portion 30 a is omitted. The mounting structure for mounting the light irradiating portion 30a to 30g on the base plate 151 and the mounting structure for mounting the light irradiating portion 30b to 30g on the support plate 153 are the same as the mounting structure for mounting the light irradiating portion 30a to the support plate 153, and are omitted. Instructions.

The guide member 70E is provided on the support plate 153 so as to cover the circular hole 156a. The screw 85 is inserted into the hole 77, and the screw 85 is screwed into the screw hole 156h formed in the support plate 153, thereby fixing the guide member 70E to the support plate 153.

The cylindrical portion 35a is provided on the guide member 70E through the mounting portion 37a. The screw 86 is inserted into the hole 78, and the screw 86 is screwed into the screw hole 371 formed in the flange 37, thereby fixing the guide member 70E to the mounting portion 37a.

As described above, since the guide member 70E is fixed to the cylindrical portion 35a through the mounting portion 37a, the guide member 70E is deformed as the cylindrical portion 35a of approximately 30 μm moves up and down.

According to this embodiment, since the guide members 70D and 70E are formed using a metal of approximately 1 mm, the guide members 70D and 70E can be elastically deformed even when the light irradiation portion 30 is heavy. For example, when the guide member is formed using a metal of about 0.1 mm, the guide member may exceed the elastic limit if the light irradiation portion 30 becomes heavy. On the other hand, when the guide members 70D and 70E are formed of a metal of about 1 mm, the guide members 70D and 70E become tough. Therefore, it is possible to reduce the possibility of the guide members 70D and 70E plastically deforming beyond the elastic limit.

In addition, in this embodiment, the guide members 70D and 70E have the guide body 71D and 71E, respectively, but the guide members 70D and 70E may have the pressure rings 72 and 72A and the pressure rings 73 and 73A, respectively. However, since the thicknesses of the guide members 70D and 70E in this embodiment are relatively large, about 1 mm, the pressing rings 72, 72A, 73, and 73A are not necessary.

As mentioned above, the embodiment of the present invention has been described in detail with reference to the drawings, but the specific configuration is not limited to the embodiment, and also includes design changes without departing from the scope of the present invention. As long as it is a person with ordinary knowledge in the technical field to which he belongs, each element of the embodiment can be appropriately changed, added, converted, or the like.

In addition, in the present invention, the term "approximately" refers to a concept including a degree of error or deformation without losing the sameness, rather than a case where it is exactly the same. For example, the term "approximately horizontal" is not limited to the case where it is strictly horizontal, for example, it is a concept including an error of several degrees. In addition, for example, when the expression is only parallel, orthogonal, etc., it is considered to include situations that are substantially parallel, orthogonal, etc., rather than strictly parallel, orthogonal, etc. In addition, in the present invention, "nearby" means an area including a certain range (optionally determined) in the vicinity of the position serving as a reference. For example, when referring to the situation around A, it is a concept that indicates a situation in which a range of areas around A may include A or not.

1‧‧‧Exposure device

11‧‧‧ platen

11a‧‧‧upper surface

12‧‧‧ plate

12a‧‧‧upper surface

13, 14‧‧‧ track

15‧‧‧Frame

15a‧‧‧Support Department

15c‧‧‧column

20‧‧‧Mask holding section

20a‧‧‧upper surface

21, 22, 23‧‧‧ rod mirrors 30, 30a, 30b, 30c, 30d, 30e, 30f, 30g

32a, 32b, 32c, 32d, 32e, 32f, 32g

33a, 33b, 33c, 33d, 33e, 33f, 33g

34a, 34b, 34c, 34d, 34e, 34f, 34g‧‧‧AF processing department

35, 35a, 35b, 35c, 35d, 35e, 35f, 35g

36, 36a, 36b, 36c, 36d, 36e, 36f, 36g‧‧‧ flange

37, 37a‧‧‧Mounting Department

38, 38a‧‧‧Mounting Department

39, 39a, 39b, 39c, 39d, 39e, 39f, 39g‧‧‧Driver

40‧‧‧Measurement Department

41, 42‧‧‧ Position Measurement Department

41a, 42a‧‧‧ Vernier

41b, 42b‧‧‧detection head

50, 51, 51a, 51b, 51c, 52, 52a, 52g‧‧‧ laser interferometer

55a, 55b, 55c, 56a, 56g

60, 60a, 60b, 60c, 60d, 60e, 60f, 60g

70, 70A, 70B, 70C, 70D, 70E‧‧‧Guide members

71, 71A, 71B, 71C, 71D, 71E‧‧‧ guide body

72, 72A, 73, 73A‧‧‧Press ring

74, 74A‧‧‧Mounting holes

75, 76, 77, 77A, 78, 78A ‧‧‧ holes

79, 79A, 79B, 79C, 79D‧‧‧‧cut hole

79Aa, 79Ba, 79Ca, 79Da‧‧‧End regions

81, 82, 83‧‧‧Driver

85, 86‧‧‧ Screw

90a, 90b, 90c, 90d, 90e, 90f, 90g‧‧‧rotation drive unit

91a‧‧‧ protrusion

92a‧‧‧piezoelectric element

93a‧‧‧elastic member

151‧‧‧ floor

153‧‧‧Support board

152, 154‧‧‧Side panels

152a, 152b, 152c, 152d, 152e, 152f, 152g‧‧‧ holes

154a, 154b, 154c, 154d, 154e, 154f, 154g

152h, 152i, 154h, 154i‧‧‧ holes

155a, 155b, 155c, 155d, 155e, 155f, 155g

155h‧‧‧Screw hole

156a, 156b, 156c, 156d, 156e, 156f, 156g‧‧‧ round hole

156h‧‧‧Screw hole

157a, 157b, 157c, 157d, 157e, 157f, 157g

158‧‧‧ convex

159‧‧‧ partition

160‧‧‧ Elastic member

161‧‧‧mobile agency

161a‧‧‧ rack

161b‧‧‧pinion

161c‧‧‧ convex

161d, 161e‧‧‧ sliding surface

162‧‧‧Positioning member

162a‧‧‧Concave

163‧‧‧Permanent Magnet

201‧‧‧CPU

201a‧‧‧Control Department

202‧‧‧RAM

203‧‧‧ROM

204‧‧‧I / O interface

205‧‧‧Communication interface

206‧‧‧Media Interface

211‧‧‧I / O device

212‧‧‧Internet

213‧‧‧Memory Media

331‧‧‧light source

332‧‧‧Lens

333‧‧‧Flying Eye Lens

334, 335‧‧‧ lens

336‧‧‧Reflector

341‧‧‧AF light source

342‧‧‧Collimating lens

343‧‧‧AF cylindrical lens

344, 345‧‧‧Five

346‧‧‧lens

347, 348‧‧‧AF sensor

371, 381‧‧‧ screw holes

372‧‧‧Hollow

391‧‧‧piezoelectric element

392‧‧‧Connection Department

393‧‧‧ convex

394‧‧‧slot

395‧‧‧Mounting Department

601‧‧‧Mirror tube

602‧‧‧light source unit

603‧‧‧Mirror tube

604‧‧‧ tube lens

605‧‧‧half mirror

606‧‧‧ Camera

621‧‧‧light source

622‧‧‧Fiber Bundle

623‧‧‧ diffuser

624‧‧‧ Collimating lens

a1‧‧‧ the center of the guide body

ax‧‧‧optical axis

FIG. 1 is a schematic perspective view showing an exposure apparatus 1 according to the first embodiment. FIG. 2 is a schematic diagram showing a state where the measurement unit 40 and the laser interferometer 50 measure the position of the mask holding unit 20. FIG. 3 is a schematic perspective view showing a supporting portion 15 a of the frame body 15 and is a view viewed from the back side (+ x side). FIG. 4 is a schematic perspective view showing the support portion 15 a of the frame body 15 and is a view viewed from the front side (−x side). FIG. 5 is a diagram schematically illustrating a case where the frame body 15 is cut along the plane C of FIG. 3. FIG. 6 is a perspective view of a main part showing the outline of the light irradiation section 30a. FIG. 7 is a side view schematically showing the driving unit 39a. FIG. 8 is a perspective view showing the outline of the reading section 60a, and is a perspective view of the main part. FIG. 9 (A) shows the positional relationship between the base plate 151 and the guide member 70 when the guide member 70 is mounted on the base plate 151, and FIG. 9 (B) shows the support plate 153 and the guide member 70A when the guide member 70A is mounted on the support plate 153 Location relationship. FIG. 10 is an exploded perspective view of a mounting structure of a portion where the light irradiation portion 30 a is mounted on the bottom plate 151. FIG. 11 is a diagram showing a state in which the light irradiating portion 30 a is mounted on the housing 15. FIG. 12 (A) shows a state in which the light irradiation portion 30a is not moved (center of the stroke), FIG. 12 (B) shows a state in which the light irradiation portion 30a is moved to the lower side (lower stroke), and FIG. 12 (C) shows a light irradiation portion 30a Move to the upper side (upper stroke end). FIG. 13 is a block diagram showing the electrical configuration of the exposure apparatus 1. As shown in FIG. 14 is an exposure apparatus according to the second embodiment. (A) shows the positional relationship between the bottom plate 151 and the guide member 70B when the guide member 70B is mounted on the bottom plate 151, and (B) shows the position member when the guide member 70C is mounted on the support plate 153. The positional relationship between the support plate 153 and the guide member 70C. FIG. 15 is an exploded perspective view of a mounting structure of a portion where the light irradiation portion 30 a is mounted on the support plate 153. FIG. 16 is a view showing a state in which the light irradiating portion 30 a is mounted on the housing 15. FIG. 17 is an exposure apparatus according to the third embodiment, and (A) shows the positional relationship between the base plate 151 and the guide member 70D when the guide member 70D is mounted on the base plate 151, and (B) shows the guide member 70E on the support plate 153. The positional relationship between the support plate 153 and the guide member 70E. FIG. 18 (A) is a diagram showing the outline of the guide body 71D, and FIG. 18 (B) is a diagram showing the outline of the guide body 71E. FIG. 19 is an exploded perspective view of a mounting structure of a portion where the light irradiation portion 30 a is mounted on the support plate 153.

Claims (11)

An optical device mounting structure, comprising an optical device having a cylindrical portion; a frame for assembling the optical device; and a substantially thin plate provided between the optical device and the frame when the optical device is assembled A guide member that is arranged in the frame and moves the optical device in a vertical direction; wherein the frame is formed with a circular hole penetrating in a substantially vertical direction; the guide member is a substantially circular plate in plan view Shape, and is provided on the frame so as to cover the circular hole; the guide member is formed with a mounting hole at approximately the center; the mounting hole and the circular hole are arranged in a substantially concentric circle; the cylindrical portion is based on an optical axis It is inserted into the said mounting hole and fixed to the said guide member so that it may correspond substantially to the center of the said mounting hole. The installation structure of the optical device according to claim 1, wherein the frame body has a bottom plate disposed substantially horizontally, and a support plate disposed substantially horizontally and disposed above the bottom plate; and the bottom plate and the support plate are formed separately. There are a first circular hole and a second circular hole as the circular hole. In a plan view, the center of the first circular hole and the center of the second circular hole are substantially the same. When the optical device is assembled to the frame, the above The center of gravity of the optical device is located near the position where the driving unit pushes up the optical device. The mounting structure of the optical device according to claim 1 or 2, wherein the frame body has a support portion provided substantially horizontally, pillars respectively provided at both ends of the support portion, and a mechanism for moving the support portion in a vertical direction. A moving mechanism; and the supporting portion is formed with a supporting portion side sliding surface; the column is formed with a column side sliding surface so as to face the supporting portion side sliding surface; the supporting portion is formed of a magnetic material; Permanent magnets of permanent magnets and electromagnets; when the moving mechanism does not move the support portion, the permanent magnet is attracted to the support portion by flowing a current into the coil of the electromagnet, so that the support portion sliding surface and the column The side sliding surfaces are in close contact. The mounting structure of the optical device according to claim 3, wherein the moving mechanism has a rack provided along an up-down direction on an end surface substantially orthogonal to the length direction of the support portion, and a small portion rotatably provided on the post. A gear; and when viewed along the length direction of the support portion, the teeth of the rack gear pass through the center of gravity of the support portion and are located on a line substantially parallel to the vertical direction. The mounting structure of the optical device according to any one of claims 1 to 4, wherein the guide member is formed of a metal having a thickness of approximately 0.1 mm. The mounting structure of the optical device according to claim 5, wherein a plurality of annular fan-shaped cutout holes are formed in the guide member along the circumferential direction. The mounting structure of the optical device according to any one of claims 1 to 4, wherein the guide member is formed of a metal having a thickness of approximately 1 mm; and the guide member is formed with a plurality of approximately circular arc shapes, respectively. A first cutout hole and a second cutout hole; the second cutout hole is disposed outside the first cutout hole; an end region including an end of the first cutout hole, and an end portion including an end of the second cutout hole The positions of the regions in the circumferential direction are substantially the same. The mounting structure of the optical device according to any one of claims 1 to 7, wherein the guide member has a first thick wall portion having a substantially annular shape substantially along an outer periphery, and a substantially The ring-shaped second thick wall portion; the guide member and the frame body are fixed through the first thick wall portion; and the guide member and the cylindrical portion are fixed through the second thick wall portion. The mounting structure of the optical device according to any one of claims 1 to 8, wherein the optical device has an AF processing section having an AF light source for radiating downward-pointing light, and an AF for reflecting light incidence The sensor; the guide member is formed with two holes on a line passing through the center of the mounting hole so as to be separated from the mounting hole; and the two holes are connected to the AF light source and the AF sensor in a plan view. Positions overlap. The mounting structure of the optical device according to claim 6, wherein the optical device has an AF processing section having an AF light source for radiating downward-pointing light, and an AF sensor for incident reflected light; and The cutout hole overlaps the positions of the AF light source and the AF sensor in a plan view. An exposure device comprising a flat plate on which a workpiece is placed; a light irradiation portion having a cylindrical portion and irradiating light to the workpiece; a frame for assembling the light irradiation portion and holding the light irradiation portion above the plate; A substantially thin plate-shaped guide member provided between the light irradiating portion and the frame during assembly of the light irradiating portion; and a driving portion provided in the frame and moving the light irradiating portion in a vertical direction Wherein, the frame body is formed with a circular hole penetrating in a substantially vertical direction; the guide member is provided on the frame body so as to cover the circular hole; the guide member has a substantially circular plate shape in a plan view, and is located at the center A mounting hole is formed; the mounting hole and the circular hole are arranged substantially concentrically; the cylindrical portion is inserted into the mounting hole so that the optical axis substantially coincides with the center of the mounting hole and is fixed to the guide member .