JP2019095662A - Attachment structure of optical device and exposure device - Google Patents

Abstract

To provide an attachment structure capable of preventing an optical axis from vibrating when moving an optical device up and down.SOLUTION: A guide member of substantially thin plate-shaped and substantially disc-shaped in a plan view, in which a round hole penetrating through in substantially vertical direction is formed in a frame body is provided in the frame body so as to cover the round hole. An attachment hole formed at a substantially center of the guide member is arranged substantially coaxially with the round hole, and a cylinder part is fixed to the guide member by inserting to the attachment hole such that the optical axis substantially coincides with the center of the attachment hole.SELECTED DRAWING: Figure 10

Description

  The present invention relates to an optical device mounting structure and an exposure apparatus.

  Patent Document 1 discloses an exposure apparatus that raises and lowers an exposure table and performs a focus adjustment process by controlling a prism pair that constitutes an exposure head when performing an exposure process on a sheet film placed on the exposure table. It is disclosed.

Unexamined-Japanese-Patent No. 2006-235457

  In the invention described in Patent Document 1, focus adjustment is performed by changing the thickness of the prism pair, but aberration occurs if the optical path length changes in the convergent light, so the performance of the optical system changes due to the focus adjustment. It will As described above, when the focus adjustment of the exposure head is performed by changing the arrangement of the optical components, there is a possibility that the optical performance can not be optimized.

  In order to cope with such a problem, it is conceivable to move the entire optical device up and down without changing the arrangement of the optical components. However, when moving the entire optical device up and down, the optical axis may shake (vertical position shift of the optical axis) as the vertical movement moves, which may lower the drawing accuracy. In particular, in the case of providing a plurality of optical devices, the relative relationship of the plurality of optical devices is important, and therefore it is necessary to further reduce the deflection amount of the optical axis.

  Further, in an apparatus for manufacturing a printed circuit board as described in Patent Document 1, a lens having an NA of about 0.2 to 0.3 is generally used. However, when the prism pair described in the invention described in Patent Document 1 is applied to an apparatus using a lens having an NA of about 0.65, the aberration becomes large and the range in which focusing can be performed becomes narrow. It will

  The present invention has been made in view of such circumstances, and it is an object of the present invention to provide an optical device mounting structure and an exposure device capable of preventing a shake of an optical axis when moving the optical device up and down.

  In order to solve the above problems, the mounting structure of an optical device according to the present invention includes, for example, an optical device having a cylindrical portion, a frame for assembling the optical device, and the optical device at the time of assembling the optical device. A substantially thin plate-shaped guide member provided between the frame and the drive unit for moving the optical device in the vertical direction, the frame having the substantially vertical direction A circular hole passing through is formed, the guide member has a substantially disc shape in a plan view, is provided in the frame so as to cover the circular hole, and an attachment hole is formed in the approximate center of the guide member. The mounting hole is disposed substantially concentrically with the round hole, and the cylindrical portion is inserted into the mounting hole and fixed to the guide member such that the optical axis substantially coincides with the center of the mounting hole. It is characterized by

  According to the mounting structure of the optical device in accordance with the present invention, the frame is formed with a circular hole penetrating in the substantially vertical direction, and the substantially thin plate-like guide member having a substantially disc shape in plan view covers the circular hole. It is provided in the said frame. The mounting hole formed substantially at the center of the guide member is disposed substantially concentrically with the round hole, and the cylindrical portion is inserted into the mounting hole so that the optical axis substantially coincides with the center of the mounting hole It is fixed. By uniformly deforming the guide member in this manner, it is possible to prevent the shake of the optical axis when moving the optical device up and down, that is, to move the optical device in the vertical direction without moving the optical device in the horizontal direction. it can.

  Here, the frame has a bottom plate provided substantially horizontally and a support plate provided substantially horizontal and above the bottom plate, and the bottom plate and the support plate are formed by the round holes. A first circular hole and a second circular hole are respectively formed, and the center of the first circular hole and the center of the second circular hole substantially coincide with each other in plan view, and the optical device is assembled to the frame The center of gravity of the optical device may be located near a position at which the drive unit pushes up the optical device. As a result, the drive unit pushes up the optical device near the center of gravity of the optical device, and the vertical movement of the optical device can be stabilized.

  Here, the frame has a support portion provided substantially horizontally, a column provided respectively at both ends of the support portion, and a moving mechanism for moving the support portion in the vertical direction, and the support The support portion side sliding surface is formed in the portion, the column side sliding surface is formed in the column so as to face the support portion side sliding surface, and the support portion is formed of a magnetic material. The pillar is provided with a permanent electromagnet having a permanent magnet and an electromagnet, and when the moving mechanism does not move the support portion, the permanent electromagnet flows the current to the coil of the electromagnet to cause the support portion to By suction, the support-part-side sliding surface may be in close contact with the column-side sliding surface. Thus, by moving the support portion, that is, the entire optical device in the vertical direction, the optical device can be moved up and down without moving the optical axis. In addition, when the support portion is not moved, the position of the support portion in the height direction is not changed by bringing the support portion-side sliding surface and the column-side sliding surface into close contact with each other. The support portion can be supported by friction with the column-side sliding surface.

  Here, the moving mechanism has a rack provided along the vertical direction on an end face substantially orthogonal to the longitudinal direction of the support portion, and a pinion rotatably provided on the pillar, and The teeth may be located on a line passing through the center of gravity of the support and substantially parallel to the vertical direction when viewed along the longitudinal direction of the support. Thereby, it is possible to prevent a moment from being generated when moving the support portion up and down.

  Here, the guide member may be formed of a metal having a thickness of about 0.1 mm. Thereby, it is possible to make the guide member easy to deform and durable.

  Here, a plurality of annular fan-shaped cutout holes may be formed in the guide member along the circumferential direction. Thereby, the optical device can be moved in the rotational direction.

  Here, the guide member is formed of metal having a thickness of about 1 mm, and a plurality of first arc-shaped first and second cutout holes are formed in the guide member, and the second cutout hole is formed. The circumferential direction positions of the end region including the end of the first cutout hole and the end region including the end of the second cutout hole substantially coincide with each other, and are disposed outside the first cutout hole. It is also good. Thus, even if a relatively thick metal plate having a thickness of about 1 mm is used as the guide member, the amount of deformation can be made substantially constant regardless of the location in the circumferential direction. In addition, since the guide member is relatively thick, the possibility of plastic deformation of the guide member beyond the elastic limit can be reduced.

  Here, the guide member has a substantially annular first thick portion substantially along the outer periphery, and a substantially annular second thick portion substantially along the attachment hole, and the first thick portion The guide member and the frame may be fixed to each other, and the guide member and the cylindrical portion may be fixed to each other through the second thick portion. Thereby, the deformation of the guide member can be prevented.

  Here, the optical device has an AF processing unit having an AF light source for emitting downward light and an AF sensor for receiving the reflected light, and the guide member passes through the center of the mounting hole. Two holes may be formed on a line so as to sandwich the mounting hole, and the two holes may overlap the positions of the AF light source and the AF sensor in plan view. Thereby, even when the guide member is used, AF processing of the optical device is possible.

  Here, the optical device includes an AF processing unit having an AF light source for emitting downward light, and an AF sensor for receiving the reflected light, and the cutout hole has the AF light source and the AF light source in plan view. It may overlap with the position of the AF sensor. Thereby, even when the guide member is used, AF processing of the optical device is possible.

  In order to solve the above problems, an exposure apparatus according to the present invention includes, for example, a plate on which a work is mounted, a light emitting section which has a cylindrical portion and which emits light to the work, and the light emitting section. A frame for holding the light emitting unit above the plate, and a substantially thin plate-like guide member provided between the light emitting unit and the frame when the light emitting unit is assembled. And a driving unit provided on the frame for moving the light emitting unit in the vertical direction, wherein the frame is formed with a circular hole penetrating in a substantially vertical direction, and the guide member is the circular hole. Provided in the frame so as to cover the guide member, and the guide member has a substantially disc shape in a plan view, an attachment hole is formed at the center, and the attachment hole is disposed substantially concentrically with the round hole The cylindrical portion may have the mounting hole such that the optical axis substantially coincides with the center of the mounting hole. Is inserted, characterized in that it is fixed to the guide member. By uniformly deforming the guide member in this manner, it is possible to prevent the deflection of the optical axis when moving the optical device up and down.

  According to the present invention, it is possible to prevent the swing of the optical axis when moving the optical device up and down.

FIG. 1 is a perspective view showing an outline of an exposure apparatus 1 according to a first embodiment. FIG. 7 is a schematic view showing how the measurement unit 40 and the laser interferometer 50 measure the position of the mask holding unit 20. It is a perspective view which shows the outline of the support part 15a of the frame 15, and is the figure seen from the back side (+ x side). It is a perspective view which shows the outline of the support part 15a of the frame 15, and is the figure seen from the front side (-x side). It is a figure which shows the outline when the frame 15 is cut | disconnected by the surface C of FIG. It is a principal part perspective view which shows the outline of the light irradiation part 30a. It is a side view showing an outline of drive part 39a. It is a perspective view which shows the outline of the reading part 60a, and is the figure which saw through the principal part. (A) shows the positional relationship between the bottom plate 151 and the guide member 70 when the guide member 70 is attached to the bottom plate 151, and (B) shows the support plate 153 and the guide member when the guide member 70A is attached to the support plate 153. The positional relationship with 70A is shown. It is a disassembled perspective view of the attachment structure in the part which attaches the light irradiation part 30a to the baseplate 151. FIG. It is a figure which shows the state in which the light irradiation part 30a was attached to the frame 15. As shown in FIG. (A) shows a state in which the light irradiation unit 30a is not moving (stroke center), (B) shows a state in which the light irradiation unit 30a is moved downward (stroke bottom), (C) shows a light irradiation unit The state 30a has moved upward (the upper end of the stroke). FIG. 2 is a block diagram showing an electrical configuration of the exposure apparatus 1; In the exposure apparatus according to the second embodiment, (A) shows the positional relationship between the bottom plate 151 and the guide member 70B when the guide member 70B is attached to the bottom plate 151, and (B) shows the guide member on the support plate 153. The positional relationship of the support plate 153 and 70 C of guide members when 70 C is attached is shown. It is a disassembled perspective view of the attachment structure in the part which attaches the light irradiation part 30a to the support plate 153. FIG. It is a figure which shows the state in which the light irradiation part 30a was attached to the frame 15. As shown in FIG. In the exposure apparatus according to the third embodiment, (A) shows the positional relationship between the bottom plate 151 and the guide member 70D when the guide member 70D is attached to the bottom plate 151, and (B) shows the guide member on the support plate 153. The positional relationship of the support plate 153 and the guide member 70E when 70E is attached is shown. (A) is a figure which shows the outline of guide part main body 71D, (B) is a figure which shows the outline of guide part main body 71E. It is a disassembled perspective view of the attachment structure in the part which attaches the light irradiation part 30a to the support plate 153. FIG.

  Hereinafter, an embodiment in which the present invention is applied to an exposure apparatus that generates a photomask by emitting light such as a laser while moving a photosensitive substrate (for example, a glass substrate) held in a substantially horizontal direction in a scanning direction An example will be described in detail with reference to the drawings. In the drawings, the same elements are denoted by the same reference numerals, and the description of the overlapping portions is omitted.

As the photosensitive substrate, for example, quartz glass having a very low coefficient of thermal expansion (for example, about 5.5 × 10 ⁻⁷ / K) is used. The photomask generated by the exposure apparatus is, for example, an exposure mask used to manufacture a substrate for a liquid crystal display device. In the photomask, one or a plurality of transfer patterns for image devices are formed on a large, substantially rectangular substrate having a side of, for example, more than 1 m (for example, 1400 mm × 1220 mm). Hereinafter, the term mask M is used as a concept encompassing the photosensitive substrate before, during, and after processing.

  However, the exposure apparatus of the present invention is not limited to the mask manufacturing apparatus. The exposure apparatus of the present invention is a concept including various apparatuses for emitting light (including laser, UV, polarized light, etc.) while moving a substrate held in a substantially horizontal direction in a scanning direction. Also, the optical device of the present invention is not limited to the light irradiation unit that irradiates light to the photosensitive substrate.

  FIG. 1 is a perspective view showing an outline of an exposure apparatus 1 according to the first embodiment. The exposure apparatus 1 mainly includes a surface plate 11, a plate portion 12, rails 13 and 14, a frame 15, a mask holding portion 20, a light irradiation portion 30, and a measurement portion 40 (see FIG. 2). , A laser interferometer 50, and a reading unit 60. In addition, illustration is abbreviate | omitted about the one part structure in FIG. The exposure apparatus 1 is maintained at a constant temperature by a temperature control unit (not shown) that covers the entire apparatus.

  The platen 11 is a member having a substantially rectangular parallelepiped shape (thick plate shape), and is formed of, for example, a stone (for example, granite) or a casting having a low expansion coefficient (for example, a nickel-based alloy). The platen 11 has an upper surface 11 a substantially horizontal (substantially parallel to the xy plane) on the upper side (+ z side).

  The platen 11 is placed on a plurality of vibration isolation tables (not shown) placed on an installation surface (for example, a floor). Thereby, the surface plate 11 is mounted on the installation surface via the vibration isolation table. Since the vibration isolation table is already known, the detailed description is omitted. Note that the vibration isolation table is not essential. On the + x side of the platen 11, a loader (not shown) for installing the mask M in the mask holding unit 20 is provided.

  The rail 13 is an elongated plate-like member made of ceramic, and is fixed to the upper surface 11 a of the surface plate 11 so that the longitudinal direction is along the x direction. The three rails 13 have substantially the same height (position in the z direction), and the upper surface is formed with high accuracy and high flatness.

  The end of the rail 13 on the loader side (+ x side) is disposed at the end of the upper surface 11a, and the rail 13 on the non-loader side (−x side) is disposed inside the end of the upper surface 11a.

  The plate-like portion 12 is placed on the rail 13. The plate-like portion 12 is a substantially plate-like member made of ceramic and has a substantially rectangular shape as a whole. A guide portion (not shown) is provided on the lower surface (the surface on the −z side) of the plate-like portion 12 so that the longitudinal direction is along the x direction. Thereby, the moving direction of the plate-like part 12 is regulated so that the plate-like part 12 does not move other than the x direction.

  A rail 14 is provided on the upper surface 12 a of the plate-like portion 12. The rails 14 are fixed so that the longitudinal direction is along the y direction. The rails 14 have substantially the same height, and the upper surface is formed with high precision and high flatness.

  The mask holding portion 20 has a substantially plate shape having a substantially rectangular shape in a plan view, and is formed using a low expansion ceramic having a thermal expansion coefficient of approximately 0.5 to 1 × 10 −7 / K. Thereby, the deformation of the mask holding unit 20 can be prevented. The mask holding portion 20 can also be formed using an ultra low expansion glass ceramic having a thermal expansion coefficient of approximately 5 × 10 −8 / K. In this case, even if a temperature change that can not be controlled occurs, the deformation of the mask holding unit 20 can be reliably prevented. The mask holding portion 20 may be formed of a material that expands and contracts in the same manner as the mask M.

  The mask holding unit 20 is placed on the rail 14. In other words, the mask holding unit 20 is provided on the upper surface 11 a via the plate-like portion 12 and the rails 13 and 14.

  Guides (not shown) are provided on the lower surface of the mask holding unit 20 so that the longitudinal direction is along the y direction. Thereby, the moving direction of the mask holding unit 20 is regulated so that the mask holding unit 20, that is, the plate-like portion 12 does not move other than the y direction.

  Thus, the mask holding portion 20 (plate-like portion 12) is provided so as to be movable in the x direction along the rail 13, and the mask holding portion 20 is provided to be movable in the y direction along the rail 14.

  The mask holding unit 20 has a substantially horizontal upper surface 20a. A mask M (not shown) is placed on the upper surface 20a. In addition, the bar mirrors 21, 22 and 23 are provided on the upper surface 20a (see FIG. 2).

  The exposure apparatus 1 has driving units 81 and 82 (not shown in FIG. 1, see FIG. 13) not shown. The drive units 81 and 82 are, for example, linear motors. The drive unit 81 moves the mask holding unit 20 (plate-like portion 12) in the x direction along the rails 13, and the drive unit 82 moves the mask holding unit 20 in the y direction along the rails 14. Various methods which are already known can be used as a method of moving the plate-like part 12 and the mask holding part 20 by the driving parts 81 and 82.

  A frame 15 is provided on the platen 11. For the frame 15, for example, a low expansion coefficient casting (for example, a nickel-based alloy) is used. The frame body 15 has a support portion 15a and two columns 15c supporting the support portion 15a at both ends. The frame 15 holds the light emitting unit 30 above the mask holding unit 20 (in the + z direction). The light irradiation part 30 is attached to the support part 15a. The frame 15 will be described in detail later.

  The light irradiator 30 irradiates the mask M with light (laser light in the present embodiment). The light irradiation units 30 are provided at regular intervals (for example, approximately every 200 mm) along the y direction. In the present embodiment, seven light irradiation units 30a, light irradiation units 30b, light irradiation units 30c, light irradiation units 30d, light irradiation units 30e, light irradiation units 30f, and light irradiation units 30g are provided. The driving unit (not shown) moves the whole of the light emitting units 30a to 30g in the z direction in the range of about 10 mm so that the focal positions of the light emitting units 30a to 30g are aligned with the upper surface of the mask M. In addition, the drive units 39 (see 39a (see FIG. 6) to 39g (to be described in detail later)) are approximately 30 μm (micrometers) of the light irradiation units 30a to 30g for fine adjustment of the focal positions of the light irradiation units 30a to 30g. Fine movement in the z direction in the range. The light irradiation unit 30 will be described in detail later.

  The reading unit 60 reads the pattern formed on the mask M. The reading unit 60 includes seven reading units 60a, 60b, 60c, 60d, 60e, 60f, and 60g. The reading units 60a to 60g are provided in the light emitting units 30a to 30g so as to be adjacent to the light emitting units 30a to 30g, respectively. The reading unit 60 will be described in detail later.

  The measuring unit 40 (not shown in FIG. 1, see FIG. 2) is, for example, a linear encoder, and the laser interferometer 50 for measuring the position of the mask holding unit 20 is a laser interferometer 51, 52 (not shown in FIG. See FIG. 2). A laser interferometer 51 is provided on a column provided on the −y side of the frame 15. A laser interferometer 52 (not shown in FIG. 1) is provided on the side surface on the + x side of the surface plate 11.

  FIG. 2 is a schematic view showing how the measurement unit 40 and the laser interferometer 50 measure the position of the mask holding unit 20. As shown in FIG. In FIG. 2, only a part of the rails 13 and 14 is illustrated. Further, in FIG. 2, only the light emitting units 30 a and 30 g are illustrated, and the light emitting units 30 b to 30 f are not illustrated.

  The measuring unit 40 has position measuring units 41 and 42. The position measurement units 41 and 42 respectively include scales 41 a and 42 a and detection heads 41 b and 42 b.

  The scale 41 a is provided on the end surface on the + y side of the rail 13 on the + y side and the end surface on the −y side of the rail 13 on the −y side. The detection head 41 b is provided on the end surface on the + y side and the −y side of the plate-like portion 12 (not shown in FIG. 2). In FIG. 2, the scale 41a on the + y side and the detection head 41b are not shown.

  The scale 42 a is provided on the + x side end face of the + x side rail 14 and the −x side end face of the −x side rail 13. The detection head 42 b is provided on the end surfaces on the + x side and the −x side of the mask holding unit 20. In FIG. 2, the scale 42 a on the −x side and the detection head 42 b are not shown.

  The scales 41a and 42a are, for example, laser hologram scales, and memories are formed at a 0.512 nm (nanometer) pitch. The detection heads 41b and 42b emit light (for example, laser light), acquire the light reflected by the scales 41a and 42a, divide the signal generated thereby into 512 equal parts, and obtain 1 nm, thereby generating The signal is divided equally into 5120 to obtain 0.1 nm. Since the position measurement units 41 and 42 are already known, detailed description will be omitted.

  The light irradiation unit 30a is provided with a mirror 55a having a reflection surface substantially parallel to the xz plane. The light irradiation unit 30g is provided with mirrors 55b and 55c having reflecting surfaces substantially parallel to the xz plane. The mirrors 55a, 55b, 55c are provided so that the positions in the x direction do not overlap.

  The light irradiation unit 30a is provided with a mirror 56a having a reflection surface substantially parallel to the yz plane. The light irradiation unit 30g is provided with a mirror 56g having a reflection surface substantially parallel to the yz plane.

  The laser interferometers 51 and 52 emit four laser beams. The laser interferometer 51 has laser interferometers 51a, 51b, 51c. The laser interferometer 52 has laser interferometers 52a and 52g.

  In FIG. 2, the path of the laser beam is indicated by a two-dot chain line. Two of the lights emitted from the laser interferometers 51a, 51b and 51c are reflected by the bar mirror 23, and the reflected light is received by the laser interferometers 51a, 51b and 51c.

  The remaining two of the light emitted from the laser interferometer 51a are reflected by the mirror 55a, and the reflected light is received by the laser interferometer 51a. The remaining two of the lights emitted from the laser interferometer 51b are reflected by the mirror 55b, and the reflected light is received by the laser interferometer 51b. The remaining two of the lights emitted from the laser interferometer 51c are reflected by the mirror 55c, and the reflected light is received by the laser interferometer 51c.

  The laser interferometers 51a to 51c measure the positional relationship between the light irradiation units 30a and 30g and the mask holding unit 20 in the y direction by measuring the position of the bar mirror 23 with reference to the positions of the mirrors 55a to 35c.

  Two of the lights emitted from the laser interferometer 52a are reflected by the bar mirror 22, and the reflected light is received by the laser interferometer 52a. Two of the lights emitted from the laser interferometer 52g are reflected by the bar mirror 21, and the reflected light is received by the laser interferometer 52g.

  The remaining two of the lights emitted from the laser interferometer 52a are reflected by the mirror 56a, and the reflected light is received by the laser interferometer 52a. The remaining two of the light emitted from the laser interferometer 52g are reflected by the mirror 56g, and the reflected light is received by the laser interferometer 52g.

  The laser interferometers 52a and 52g measure the positional relationship between the light irradiation units 30a to 30g and the mask holding unit 20 in the x direction by measuring the positions of the bar mirrors 21 and 22 based on the positions of the mirrors 56a and 56g, respectively. Do.

  In the present embodiment, no mirror is provided in the light irradiation units 30b to 30f, and no laser interferometer for measuring the position of the mirror is also provided. This is because the deflection of the optical axis when moving the light irradiation units 30a to 30g in the z direction in the range of about 30 μm is as small as several nm or less (described later), and the light irradiation units 30b to 30f It is because it is calculated | required by interpolation based on the position of 30a, 30g. Thereby, the device can be miniaturized and the cost can be reduced.

  Next, the frame 15 will be described. 3 and 4 are perspective views showing an outline of the support portion 15a of the frame 15. As shown in FIG. FIG. 3 is a view from the back side (−x side), and FIG. 4 is a view from the front side (+ x side). 3 and 4 illustrate the support 15a and the column 15c slightly apart for the purpose of explanation, but in actuality, the support 15a and the column 15c are adjacent to each other.

  The support portion 15 a is a substantially rod-like shape having a substantially rectangular cross-sectional shape, and the inside is hollow. The support portion 15a is provided such that the longitudinal direction is along the y direction. The support portion 15 a mainly includes a bottom plate 151, a support plate 153, side plates 152 and 154 provided on both sides of the bottom plate 151 and the support plate 153, and a partition wall 159. The bottom plate 151 and the support plate 153 are provided substantially horizontally, and the side plates 152 and 154 are provided substantially vertically.

  In the present embodiment, the thickness of the bottom plate 151, the support plate 153, and the side plates 152 and 154 is approximately 15 mm to 20 mm, and the length of the bottom plate 151, the support plate 153 and the side plates 152 and 154 in the y direction (W1 in FIG. ) Is approximately 2.2 m.

  Round holes 155a to 155g and 156a to 156g are formed in the bottom plate 151 and the support plate 153, respectively, along the y direction. The round holes 155a to 155g and 156a to 156g are holes that respectively penetrate the bottom plate 151 and the support plate 153 in the substantially vertical direction, and are substantially circular in plan view. In plan view, the positions of the centers of the round holes 155a to 155g and the positions of the centers of the round holes 156a to 156g substantially coincide with each other.

  Light irradiation units 30a to 30g are provided to the round holes 155a to 155g and 156a to 156g through guide members 70 and 70A (described in detail later) provided so as to cover the round holes 155a to 155g and 156a to 156g, respectively. Is attached. The attachment structure for attaching the light irradiation units 30a to 30g to the frame 15 will be described in detail later.

  In the bottom plate 151, round holes 157a to 157g are formed adjacent to the round holes 155a to 155g. A barrel 601 (described in detail later) of the reading unit 60 is inserted into the round holes 157a to 157g.

  Holes 152a to 152i and 154a to 154i are formed in the side plates 152 and 154, respectively. The holes 152a to 152g and 154a to 154g are provided such that the positions in the y direction overlap with the round holes 155a to 155g and 156a to 156g, respectively. Holes 152a-152g, 154a-154g are used to attach the reader 60 to the round holes 157a-157g. The holes 152h and 152i are respectively provided on both sides of the holes 152a to 152g, and the holes 154h and 154i are respectively provided on both sides of the round holes 154a to 154g. The frame 15 is a casting, and the holes 152a to 152i and 154a to 154i are used as casting holes for discharging casting sand at the time of casting to form an internal space.

  Although the inside of the support portion 15a is hollow, a partition wall 159 is provided inside the support portion 15a as a reinforcement. The partition wall 159 is a plate-like member, and the end surface is in contact with the bottom plate 151, the support plate 153, and the side plates 152 and 154. As a result, at the position where the partition wall 159 is provided, the internal cavity of the support portion 15a disappears, and the vibration and deformation (flexure, torsion, etc.) of the support portion 15a are prevented.

  The frame 15 has a moving mechanism 161 for moving the support portion 15a in the z direction along the column 15c. The moving mechanism 161 moves the support portion 15a in the range of about 10 mm in the z direction. The moving mechanism 161 of the present embodiment has a rack 161a provided along the z direction on an end face substantially orthogonal to the longitudinal direction of the support portion 15a, and a pinion 161b rotatably provided on the pillar 15c. The rack 161a is fixed to a convex portion 158 projecting outward from the side surface of the support portion 15a using a screw or the like (not shown).

  The frame 15 also has two permanent electromagnets 163 provided on the column 15c. The two permanent magnets 163 are disposed in the vicinity of both ends in the longitudinal direction of the support portion 15a. The permanent electromagnet 163 is a permanent electromagnetic type having a permanent magnet and an electromagnet, and supplies a current to the coil of the electromagnet only at the time of attachment / detachment to turn on / off the built-in permanent magnet. Since the low expansion alloy used for the frame 15 is a magnetic material, it can be moved by the permanent electromagnet 163. Since the permanent electromagnet 163 only needs to be energized for a short time (for example, about 0.2 seconds) at ON-OFF time, there is almost no heat generation. Also, in the permanent electromagnet 163, the magnetic force after the permanent magnet is turned on does not change constantly.

  FIG. 5 is a schematic view when the frame 15 is cut along the plane C of FIG. A convex portion 161 c is formed on the column 15 c. The surface on the + x side of the convex portion 161c is a sliding surface 161d, and is subjected to an exfoliation process which is a polishing process to reduce the frictional resistance.

  The surface on the -x side of the support portion 15a is a sliding surface 161e. The sliding surface 161e is subjected to scraping as in the case of the sliding surface 161d. Between the sliding surface 161e and the sliding surface 161d, an oil film of about several μm is formed by the lubricating oil accumulated in the minute unevenness of the sliding surfaces 161d, 161e.

  By rotating the pinion 161b provided on the column 15c, the support portion 15a to which the rack 161a is fixed moves up and down. When the moving mechanism 161 vertically moves the support portion 15a, the sliding surface 161d and the sliding surface 161e slide smoothly by the oil film formed between the sliding surface 161d and the sliding surface 161e.

  When the rack 161a is viewed along the y direction, the teeth are positioned on the center line c in the x direction of the support 15a. In other words, the teeth of the rack 161a are located on a line passing through the center of gravity of the support portion 15a and substantially parallel to the z direction. Therefore, no moment is generated when the pinion 161b is rotated to move the rack 161a (supporting portion 15a) up and down.

  As shown in FIGS. 3 and 4, a sliding surface 161d on which scraping is applied is also formed on the post 15c on which the rack 161a and the pinion 161b are not provided. A sliding surface 161e (see FIG. 5) is formed on the support portion 15a so as to abut on the sliding surface.

  An elastic member 160 is provided at the end of the support portion 15a along the pillar 15c. In FIG. 3, 4, it displays only about the elastic member 160 provided in the end by the side of-y, and omits illustration about the elastic member 160 provided in the end by the side of + y. As shown in FIG. 5, the elastic member 160 is provided below the support portion 15 a. A positioning member 162 is provided between the elastic member 160 and the support portion 15a. By inserting the elastic member 160 into the concave portion 162a formed on the bottom surface of the positioning member 162, the position of the elastic member 160 in the xy direction is determined, and the elastic member 160 can expand and contract with the vertical movement of the support portion 15a. Become. Thus, the elastic members 160 provided at both ends of the support portion 15a support the weight of the support portion 15a. The support portion 15a is about 660 kg to 700 kg, and the elastic member 160 can support a weight of about 600 kg.

  The weight of the support portion 15a which can not be supported by the elastic member 160 is supported by the frictional force between the sliding surface 161d and the sliding surface 161e. The permanent electromagnet 163 is provided on the column 15c, and attracts the support portion 15a by supplying a current to the coil of the electromagnet. When the moving mechanism 161 does not move the support portion 15a up and down along the column 15c, the permanent electromagnet 163 adsorbs the support portion 15a, whereby the support portion 15a, that is, the rack 161a and the sliding surface 161e move in the left direction in FIG. Then, the sliding surface 161d and the sliding surface 161e come into close contact with each other. By strongly compressing the sliding surface 161d and the sliding surface 161e, the oil film formed between the sliding surface 161d and the sliding surface 161e is eliminated. As a result, friction is generated between the sliding surface 161d and the sliding surface 161e.

  Assuming that the friction coefficient between the sliding surface 161 d and the sliding surface 161 e when the oil film is removed is 0.1 to 0.2 and the attraction force of the permanent electromagnet 163 is 1500 kg, the sliding surface 161 d and the sliding surface 161 e Support the weight of 150kg by friction between. Since the sliding surfaces are present at two locations on both sides of the support portion 15a, the weight ta (approximately 60 kg to 100 kg) of the support portion 15a which can not be supported by the elastic member 160 can be supported by frictional force. As described above, when the moving mechanism 161 does not move the support portion 15a up and down, the support portion 15a is supported so that the position in the height direction of the support portion 15a does not change.

  When the permanent electromagnet 163 does not attract the support portion 15a, the rack 161a and the pinion 161b are engaged with each other to form the rack 161a, ie, the support portion 15a to which the rack 161a is fixed and the slide formed on the support portion 15a. The moving surface 161e can be moved in the left direction in FIG. The weight ta of the support portion 15a which can not be supported by the elastic member 160 is from the rack 161a to the pinion 161b, and the pressure angle of the rack 161a and the pinion 161b is 20 degrees, so that the pinion 161b has a weight ta × cos 20 ° The rack 161a, that is, the support portion 15a is pushed up by force, and the rack 161a, ie, the sliding surface 161e is pressed against the sliding surface 161d by a force of weight ta × sin 20 °.

  Next, the light irradiation unit 30 will be described. FIG. 6 is a perspective view of an essential part showing an outline of the light irradiation part 30a. The light irradiation unit 30a mainly includes the DMD 31a, the objective lens 32a, the light source unit 33a, the AF processing unit 34a, the cylindrical unit 35a, the flange 36a, the attachment units 37a and 38a, and the drive unit 39a. Have. The light irradiation units 30b to 30g respectively include the DMDs 31b to 31g, the objective lenses 32b to 32g, the light source units 33b to 33g, the AF processing units 34b to 34g, the cylindrical portions 35b to 35g, and the flanges 36b to 36 g, mounting portions 37 b to 37 g, 38 b to 38 g, and driving portions 39 b to 39 g. The light irradiation unit 30 b to the light irradiation unit 30 g have the same configuration as the light irradiation unit 30 a, and therefore the description thereof is omitted.

  The DMD 31 a is a digital mirror device (DMD), and can emit planar laser light. The DMD 31 a has a large number of movable micro mirrors (not shown), and light of one pixel is emitted from one micro mirror. The micromirrors have a size of approximately 10 μm and are two-dimensionally arranged. Light is emitted from the light source unit 33a (described in detail later) to the DMD 31a, and the light is reflected by each micro mirror. The micro mirror is rotatable about an axis substantially parallel to its diagonal, and can be switched ON (reflect light toward the mask M) and OFF (not reflect light toward the mask M). is there. Since the DMD 31a is already known, the detailed description is omitted.

  The objective lens 32 a focuses the laser light reflected by each micro mirror of the DMD 31 a on the surface of the mask M. At the time of drawing, light is irradiated from each of the light irradiation units 30a to 30g, and the light is imaged on the mask M, whereby a pattern is drawn on the mask M.

  The light source unit 33 a mainly includes a light source 331, a lens 332, a fly eye lens 333, lenses 334 and 335, and a mirror 336. The light source 331 is, for example, a laser diode, and light emitted from the light source 331 is guided to the lens 332 via an optical fiber or the like.

  Light is directed from lens 332 to fly's eye lens 333. The fly-eye lens 333 is a two-dimensional arrangement of a plurality of lenses (not shown), and the fly-eye lens 333 produces many point light sources. The light having passed through the fly's eye lens 333 passes through lenses 334 and 335 (for example, a condenser lens) to be collimated light, and is reflected by the mirror 336 toward the DMD 31 a.

  The AF processing unit 34a focuses the light irradiated to the mask M on the mask M, and mainly includes an AF light source 341, a collimator lens 342, an AF cylindrical lens 343, and pentaprisms 344, 345, It has a lens 346 and AF sensors 347 and 348. The light emitted from the light source 341 for AF is collimated by the collimator lens 342, is converted into linear light by the cylindrical lens 343 for AF, is reflected by the pentaprism 344 and forms an image on the surface of the mask M. The light reflected by the mask M is reflected by the pentaprism 345, condensed by the lens 346, and enters the AF sensors 347 and 348. Penta prisms 344, 345 bend the light at a bending angle of approximately 97 degrees. Although a mirror may be used instead of the pentaprisms 344 and 345, it is preferable to use a pentaprism because defocusing occurs due to an angular displacement of the mirrors. The AF processing unit 34a performs an autofocus process of obtaining an in-focus position based on the results of light reception by the AF sensors 347 and 348. In addition, since the autofocus process by such an optical lever type is already well-known, detailed description is abbreviate | omitted.

  The light irradiation unit 30a has a substantially cylindrical tubular portion 35a in which an optical system (including the objective lens 32a) is provided. A flange 36a is provided at the upper end of the cylindrical portion 35a. The flange 36 a holds the lens 332, the fly's eye lens 333 and the lenses 334 and 335 on the upper side. Therefore, the center of gravity of the light irradiator 30a is shifted to the left in FIG. 6 with respect to the optical axis ax.

  Further, mounting portions 37a and 38a are provided on the cylindrical portion 35a. The attachment portions 37 a and 38 a are used for attachment to the frame 15. The attachment portion 37a is provided in the vicinity of the flange 36a, and the attachment portion 38a is provided in the vicinity of the lower end of the cylindrical portion 35a. In the mounting portion 37a, a hollow portion 372 having a diameter larger than the outer diameter of the mounting portion 38a is formed. Thereby, the cylindrical portion 35a can be pulled upward. In FIG. 6, illustration of screw holes 371 and 381 (described later in detail) formed in the attachment portions 37 a and 38 a is omitted.

  The mounting portion 37a (that is, the light emitting portion 30a) is moved in the vertical direction (z direction) by the driving portion 39a. FIG. 7 is a side view showing an outline of the drive unit 39a. The drive unit 39 a mainly includes a piezoelectric element 391 and a connection unit 392.

  The piezoelectric element 391 is a solid actuator in which displacement is generated by applying a voltage. The piezoelectric element 391 is provided with a non-displaced portion (for example, the lower end) on the support portion 15a of the frame 15 via the attachment portion 395 (see FIG. 11). When a voltage is applied to the piezoelectric element 391, the piezoelectric element 391 expands and the upper end of the piezoelectric element 391 moves upward. The dotted line in FIG. 7 shows the state in which the piezoelectric element 391 is contracted, and the solid line in FIG. 7 shows the state in which the piezoelectric element 391 is extended.

  The connecting portion 392 is a substantially cylindrical member whose lower end is screwed to the piezoelectric element 391. The connecting portion 392 moves up and down with the expansion and contraction of the piezoelectric element 391.

  At the upper end of the connecting portion 392, a convex portion 393 having an arc-shaped tip is provided. The tip of the convex portion 393 abuts on the lower side of the attachment portion 37a (see FIG. 6). Therefore, when the piezoelectric element 391 is extended, the light emitting unit 30a moves in the + z direction, and when the piezoelectric element 391 is contracted, the light emitting unit 30a moves in the −z direction.

  A plurality of grooves 394 are formed on the side surface of the connection portion 392. The groove 394 is formed to cut obliquely downward as approaching the central axis. Therefore, even if the piezoelectric element 391 is bent and extended (see the two-dot chain line in FIG. 7), the connecting portion 392 is deformed at the groove 394 and the convex portion 393 is moved only in the vertical direction without moving in the horizontal direction. Can.

  Next, the reading unit 60 will be described. The reading unit 60a to the reading unit 60g have the same configuration, and therefore, the reading unit 60a will be described below.

  FIG. 8 is a perspective view showing the outline of the reading unit 60a and is a transparent view of the main part. The reading unit 60a is a high magnification microscope optical system, and the reading unit 60a mainly includes a lens barrel 601 in which an objective lens is provided, and a light source unit 602 that emits light (here, visible light) to the objective lens. A lens barrel 603 formed of a low heat conductor such as titanium or zirconia, a tube lens 604 provided inside the lens barrel 603, and light from the light source unit 602 are transmitted and led from the objective lens A microscope having a half mirror 605 for reflecting light, and a camera 606 for imaging a pattern acquired by the microscope.

  The light source unit 602 is a member that emits visible light (for example, light having a wavelength of approximately 450 to 600 nm), and emits surface-like light. The light source unit 602 is provided adjacent to the light source 621 installed far away, an optical bundle fiber 622 for guiding the light from the light source 621, a diffusion plate 623 installed near the end face of the optical fiber, and the diffusion plate 623 And a collimator lens 624.

  The light source 621 is, for example, a white LED, and emits light in the visible light range. Since the light source 621 generates heat, the light source 621 is provided at a position away from the reading unit 60a. The light emitted from the light source 621 is guided using an optical bundle fiber 622. The diffuser plate 623 is guided by the optical bundle fiber 622 to spread and uniformly convert the light emitted from the end face of the optical bundle fiber 622, and then the collimator lens 624 guides the light to the objective lens.

  The light emitted from the light source unit 602 passes through the objective lens, is reflected by the pattern P or the like, and is guided to the objective lens again. The objective lens is a visible light lens having characteristics such as a high magnification of about 100 ×, a numerical aperture (NA, numerical aperture) of about 0.8, and a working distance of about 2 mm. The tube lens 604 is a lens for focusing the light from the objective lens corrected to infinity, and has a focal length of approximately 200 mm.

  The camera 606 has a resolution of about UXGA (1600 × 1200 pixels), a size of about 2⁄3 inch, and a power consumption of about 3 W. The camera 606 acquires an image of the pattern P. The camera 606 is surrounded by a water jacket for water cooling. The camera 606 can perform ultra-low speed scanning by the control unit 201a (see FIG. 13), and therefore can accurately read the fine pattern drawn on the mask M.

  The reading unit 60a is fixed to the cylindrical portion 35a via a mounting unit (not shown). Thereby, the reading unit 60a moves in the z direction together with the light emitting unit 30a.

  Next, a mounting structure for mounting the light emitting units 30a to 30g to the frame 15 will be described. In the mounting structure of the present embodiment, the light irradiation units 30a to 30g are mounted by attaching the guide member 70 to the bottom plate 151, attaching the guide member 70A to the support plate 153, and attaching the light irradiation units 30a to 30g to the guide members 70 and 70A. Attach 30 g to the frame 15.

  FIG. 9A shows the positional relationship between the bottom plate 151 and the guide member 70 when the guide member 70 is attached to the bottom plate 151, and FIG. 9B shows the support plate when the guide member 70A is attached to the support plate 153. The positional relationship between 153 and the guide member 70A is shown.

  Seven guide members 70 are provided on the bottom plate 151 so as to cover the round holes 155a to 155g. Seven guide members 70A are provided on the support plate 153 so as to cover the round holes 156a to 156g.

  The difference between the guide member 70 and the guide member 70A is the presence or absence and the diameter of the holes 75, 76. Although the holes 75 and 76 are formed in the guide portion main body 71 of the guide member 70, the holes 75 and 76 are not formed in the guide portion main body 71A of the guide member 70A.

  In the guide members 70 and 70A, attachment holes 74 and 74A are formed substantially at the center. The holes 75 and 76 are formed to sandwich the mounting hole 74 on a line passing through the center of the mounting hole 74. The guide members 70 and 70A will be described in detail later.

  The guide member 70 and the round holes 155a to 155g are disposed substantially concentrically, and the guide member 70A and the round holes 156a to 156g are disposed substantially concentrically.

  The guide members 70 and the round holes 155a to 155g are evenly disposed in the central portion of the bottom plate 151, and the guide members 70A and the round holes 156a to 156g are uniformly disposed in the central portion of the support plate 153. The distance between the adjacent round holes 155a to 155g (that is, the guide members 70) and the distance W2 between the adjacent round holes 156a to 156g (that is, the guide members 70A) are substantially the same as the distance between the light irradiation units 30a to 30g.

  The cylindrical part 35 of the light irradiation part 30a is provided in the guide members 70 and 70A provided in the round holes 155a and 156a. The light irradiation part 30b is provided in the guide members 70 and 70A provided in the round holes 155b and 156b. Similarly, the light irradiation parts 30c to 30g are provided on the guide members 70 and 70A provided in the round holes 155c, 156c to 155g, and 156g, respectively.

  The round holes 155a and the round holes 156a are formed such that the positions in plan view overlap. Similarly, the round holes 155b to 155g and the round holes 156b to 156g are formed such that positions in plan view overlap with each other.

  Next, the attachment structure will be described by taking the attachment of the light irradiation unit 30a to the bottom plate 151 as an example. FIG. 10 is an exploded perspective view of the attachment structure in the portion where the light irradiator 30 a is attached to the bottom plate 151. The mounting structure for mounting the light emitting units 30b to 30g to the bottom plate 151 and the mounting structure for mounting the light emitting units 30a to 30g to the support plate 153 are the same as the mounting structure for mounting the light emitting units 30a to the bottom plate 151. Omit.

  First, the guide member 70 will be described. The guide member 70 mainly includes a substantially thin plate-shaped guide portion main body 71 and pressing rings 72 and 73.

  The guide main body 71 has a substantially thin plate shape and a substantially disc shape in plan view. The guide main body 71 is formed of metal having a thickness of about 0.1 mm so as to be easily deformed. As the metal, stainless steel, phosphor bronze or the like can be used, but it is desirable to use more homogeneous phosphor bronze.

  A mounting hole 74 is formed in substantially the center of the guide body 71. The mounting hole 74 is formed such that the center a1 of the guide portion main body 71 is at the center of the mounting hole 74. Further, in the guide portion main body 71, a plurality of holes 77 are formed along the outer periphery of the guide portion main body 71, and a plurality of holes 78 are formed along the attachment holes 74. The hole 77 is a hole into which the screw 85 is inserted, and the hole 78 is a hole into which the screw 86 is inserted. The positions and the number of the holes 77 and 78 are not limited to the illustrated form.

  In the state in which the guide portion main body 71 is provided in the bottom plate 151, the mounting hole 74 is disposed substantially concentrically with the round hole 155a. The cylindrical portion 35 a is inserted into the mounting hole 74. When the cylindrical portion 35 a is inserted into the mounting hole 74, the optical axis ax substantially coincides with the center a 1 of the mounting hole 74.

  The holding rings 72 and 73 have a thickness of about 3 mm and are formed of the same material as the guide portion main body 71. In the present embodiment, the guide main body 71 and the pressing rings 72 and 73 are separately formed, but the guide main body 71 and the pressing rings 72 and 73 may be integrally formed.

  The pressing ring 72 is substantially annular and is provided substantially along the outer periphery of the guide portion main body 71. The pressing ring 73 is substantially annular and is provided substantially along the mounting hole 74. A plurality of holes 77A into which the screws 85 are inserted are formed in the pressing ring 72, and a plurality of holes 78A into which the screws 86 are inserted are formed in the pressing ring 73.

  Next, attachment of the light irradiation unit 30a to the bottom plate 151 will be described. The guide member 70 is provided between the light irradiation unit 30a and the frame 15 (here, the bottom plate 151).

  The guide member 70 is provided on the bottom plate 151 so as to cover the round hole 155a. The guide ring 70 is placed on the guide main body 71, the screw 85 is inserted into the holes 77 and 77A, and the screw 85 is screwed into the screw hole 155h formed in the bottom plate 151, whereby the guide member 70 is a bottom plate. It is fixed to 151.

  The light irradiation part 30a (that is, the cylindrical part 35a) is provided in the guide member 70 via the attachment part 38a. A guide ring 70 is provided under the guide main body 71, the screw 86 is inserted into the holes 78 and 78A, and the screw 86 is screwed into the screw hole 381 formed in the flange 38, whereby the guide member 70 is attached to the mounting portion 38a. It is fixed to

  As described above, by fixing the guide member 70 to the frame 15 and the cylindrical portion 35 via the pressing rings 72 and 73, the deformation of the guide portion main body 71 can be prevented.

  The light irradiation part 30a is demonstrated to an example about the state by which the light irradiation parts 30a-30g were attached to the frame 15 by the attachment structure of this invention. In addition, since the attachment state to the frame 15 of the light irradiation parts 30b-30g is the same as the attachment state to the frame 15 of the light irradiation part 30a, description is abbreviate | omitted.

  FIG. 11: is a figure which shows typically the state to which the light irradiation part 30a was attached to the frame 15 (here support part 15a). In FIG. 11, the state cut | disconnected in the surface which passes through the center of the attachment hole 74 and the holes 75 and 76 is shown. In FIG. 11, some of the constituent requirements are shown in cross section. Further, in FIG. 11, the illustration of the fastening members such as the screws 85 and 86 and the holes in which these are provided is omitted.

  The cylindrical portion 35a is inserted into the attachment holes 74 and 74A of the guide members 70 and 70A. The mounting portion 38a is positioned above the guide member 70, and the portion below the mounting portion 38a of the cylindrical portion 35a is positioned lower than the guide member 70. The part 38a is fixed. Also, with the mounting portion 37a positioned above the guide member 70A, and the portion lower than the mounting portion 37a of the cylindrical portion 35a positioned below the guide member 70A, the guide member 70A using the pressing ring 73A. And the mounting portion 37a are fixed. The guide member 70 is fixed to the bottom plate 151 using a holding ring 72, and the guide member 70A is fixed to the support plate 153 using a holding ring 72A.

  Since the center of the circular hole 155a and the center of the circular hole 156a substantially coincide with each other in plan view, the light irradiation unit 30a is attached to the support 15a such that the optical axis ax is substantially vertical.

  Horizontal positions of the holes 75 and 76 coincide with the light source 341 for AF and the AF sensors 347 and 348 so that light emitted downward from the light source 341 for AF and reflected light from the mask M can pass through. In other words, the positions of the holes 75 and 76 overlap the positions of the AF light source 341 and the AF sensors 347 and 348 in plan view, respectively. As described above, by forming the holes 75 and 76, AF processing of the light irradiation unit 30a becomes possible even when the guide members 70 and 70A are used.

  The drive portion 39a pushes up the attachment portion 37a via the pressing ring 73A. The center of gravity G of the light emitting unit 30a is located near the position where the drive unit 39a pushes up the mounting unit 37a. Therefore, the drive unit 39a pushes up the light emitting unit 30a near the center of gravity G. Thus, the vertical movement of the light irradiation unit 30a is stabilized.

  FIG. 12 shows (A) a state in which the light irradiation unit 30a is not moving (stroke center), and (B) a state in which the light irradiation unit 30a is moved downward (stroke bottom), (C) Shows the state (stroke upper end) in which the light irradiation part 30a moved upward.

  Since the guide members 70, 70A are fixed to the cylindrical portion 35a via the mounting portions 37a, 38a (not shown in FIG. 12), when the cylindrical portion 35a is moved up and down by the drive portion 39a, the guide member 70 and 70A are deformed.

  The moving amount of the cylindrical portion 35a by the driving portion 39a is approximately 30 μm. Since the guide members 70 and 70A are made of thin metal, the guide members 70 and 70A expand and contract (elastically deform) in accordance with the vertical movement of the cylindrical portion 35a of approximately 30 μm. Since the guide members 70 and 70A have a substantially circular shape in plan view, the amount of deformation of the guide members 70 and 70A is substantially constant regardless of the place, and the cylindrical portion 35a does not move in the xy direction. Since the holes 75 and 76 are sufficiently small, the influence on the deformation of the guide members 70 and 70A is small. Further, approximately 30 μm, which is the amount of movement of the cylindrical portion 35a by the driving portion 39a, is an example of the amount necessary for AF, and the driving portion 39a may move the cylindrical portion 35a in units of several tens of μm.

  Note that, along with the vertical movement of the light irradiation unit 30a, the reading unit 60a (not shown in FIG. 12) provided in the light irradiation unit 30a also moves up and down. Since the lens barrel 601 of the reading unit 60a is inserted into the round hole 157a (see FIG. 3 etc.) and the lens barrel 601 is not fixed to the round hole 157a, no problem occurs due to the vertical movement of the lens barrel 601.

  FIG. 13 is a block diagram showing the electrical configuration of the exposure apparatus 1. The exposure apparatus 1 includes a central processing unit (CPU) 201, a random access memory (RAM) 202, a read only memory (ROM) 203, an input / output interface (I / F) 204, and a communication interface (I / F). 205 and a media interface (I / F) 206, which are mutually connected to the light irradiation unit 30, the position measurement units 41 and 42, the laser interferometers 51 and 52, the drive units 81, 82, 83, etc. ing.

  The CPU 201 operates based on programs stored in the RAM 202 and the ROM 203 to control each part. Signals are input to the CPU 201 from the position measurement units 41 and 42, the laser interferometers 51 and 52, and the like. The signals output from the CPU 201 are output to the drivers 81, 82, 83, and the light irradiator 30.

  The RAM 202 is a volatile memory. The ROM 203 is a non-volatile memory in which various control programs and the like are stored. The CPU 201 operates based on programs stored in the RAM 202 and the ROM 203 to control each part. The ROM 203 also stores a boot program executed by the CPU 201 when the exposure apparatus 1 is activated, a program depending on the hardware of the exposure apparatus 1, drawing data on the mask M, and the like. The RAM 202 also stores programs executed by the CPU 201, data used by the CPU 201, and the like.

  The CPU 201 controls an input / output device 211 such as a keyboard or a mouse via the input / output interface 204. The communication interface 205 receives data from another device via the network 212 and transmits the data to the CPU 201, and transmits data generated by the CPU 201 to the other device via the network 212.

  The media interface 206 reads a program or data stored in the storage medium 213 and stores the program or data in the RAM 202. The storage medium 213 is, for example, an IC card, an SD card, a DVD, or the like.

  A program for realizing each function is read from, for example, the storage medium 213, installed in the exposure apparatus 1 via the RAM 202, and executed by the CPU 201.

  The CPU 201 has a function of a control unit 201 a that controls each unit of the exposure apparatus 1 based on an input signal. The control unit 201a is constructed by executing a predetermined program read by the CPU 201. The process performed by the control unit 201a will be described in detail later.

  The configuration of the exposure apparatus 1 shown in FIG. 13 has been described for the main configuration in describing the features of the present embodiment, and does not exclude the configuration provided in, for example, a general information processing apparatus. The components of the exposure apparatus 1 may be classified into more components depending on the processing content, or one component may execute processing of a plurality of components.

  The operation of the exposure apparatus 1 configured as described above will be described. The following processing is mainly performed by the control unit 201a.

  The control unit 201 a performs calibration of the position measurement units 41 and 42 using the laser interferometers 51 and 52. Although the measurement values of the laser interferometers 51 and 52 are accurate, the downflow of the clean air in the exposure apparatus 1 generates a fluctuation close to 10 nm. In addition, the laser interferometers 51 and 52 can only measure the relative position (the origin can not be known).

  The measurement results of the position measurement units 41 and 42 include an error due to pitching and yawing of the mask holding unit 20, and the like. Therefore, the relationship between the measurement values of the laser interferometers 51 and 52 and the measurement values of the position measurement units 41 and 42 is checked in advance so that the measurement results of the position measurement units 41 and 42 do not include an error. The accuracy can be improved by performing the drawing process using the position measurement units 41 and after performing the calibration process of.

  The control unit 201a irradiates light from the light irradiation units 30a to 30g toward the temporary mask M to draw a pattern, and reads the pattern by the reading unit 60 before performing the drawing process, and thereby the correction data is read. Generate In addition, when the AF processing units 34a to 34g detect that the light emitting units 30a to 30g are not focused, the control unit 201a causes the driving units 39a to 39g to move the light emitting units 30a to 30g in the z direction. And focus the light irradiation units 30a to 30g.

  The drawing process is performed several hours after the mask M is placed on the mask holding unit 20. The control unit 201a moves the mask holding unit 20 in the x direction and the y direction based on the measurement results of the position measurement units 41 and 42. While moving the mask holding unit 20, the control unit 201a applies light from the light emitting unit 30 when the mask M passes below the light emitting unit 30, and performs drawing processing.

  According to the present embodiment, since the mounting structure using the guide members 70 and 70A is provided, the light irradiation unit 30 can be vertically moved in the vertical direction to prevent the shake of the optical axis ax.

  For example, in the case where the cross roller guide is used to move the light emitting unit 30 up and down, there is a limit to the degree of cylindricity of the roller, so that the deflection of the optical axis ax when moving about 30 μm occurs about 100 nm. In addition, for example, in the case of using the air slider for the vertical movement of the light irradiation unit 30, the light irradiation unit 30 vibrates in the horizontal direction by about 30 nm when moved by about 30 μm. In these methods, since the amount of horizontal movement of the optical axis ax is too large, the positions of the light irradiation units 30b to 30f can not be determined by interpolation based on the positions of the light irradiation units 30a and 30g. Control becomes impossible. On the other hand, in the present embodiment, since the mounting structure using the guide members 70 and 70A is provided, the deflection of the optical axis ax when moving the light irradiation unit 30 up and down is minimized (the deflection of the optical axis ax is several nm And the change in the thickness direction of the mask M to be drawn and the change in the height direction (z direction) of the mask holding unit 20 can be acquired by the light lever AF processing units 34a to 34g. Drawing processing can be performed with high accuracy.

  In particular, in the present embodiment, since the vertical movement of the light irradiation unit 30 is as small as about several tens of μm, even if the light irradiation unit 30 moves up and down, the guide members 70 and 70A are not plastically deformed and a thin metal guide A mounting structure using the members 70 and 70A can be employed. Then, the guide members 70 and 70A have a substantially disc shape in plan view, and the guide members 70 and 70A deform uniformly, so the swing of the optical axis ax when moving the light irradiation unit 30 up and down is as small as several nm or less can do. In particular, by making the guide members 70 and 70A of metal with a thickness of about 0.1 mm, the guide members 70 and 70A can be easily deformed and strong.

  Further, according to the present embodiment, since the guide members 70 and 70A have the pressing rings 72 and 73, the deformation of the guide portion main body 71 by attaching the guide members 70 and 70A to the frame 15 and the light irradiation portion 30 is realized. It can be prevented.

  Further, according to the present embodiment, since the whole of the light irradiation unit 30 is moved vertically to focus, the focus adjustment process is performed also for a mask manufacturing apparatus using a high resolution lens with a NA of about 0.65. It becomes possible. For example, applying a focus adjustment process for changing the arrangement of optical components to a mask manufacturing apparatus is not realistic because problems such as a large aberration and a narrow focus range occur. On the other hand, if it is a focus adjustment process which vertically moves the whole light irradiation part 30, it is applicable to a mask manufacturing apparatus. In other words, the present embodiment is particularly valuable in applying to a mask manufacturing apparatus which is a high precision exposure apparatus.

Second Embodiment
According to a second embodiment of the present invention, a plurality of cutout holes are formed in a guide member. The exposure apparatus of the second embodiment will be described below. The difference between the exposure apparatus 1 of the first embodiment and the exposure apparatus of the second embodiment is only in the mounting structure of the light irradiation unit 30. Therefore, in the exposure apparatus of the second embodiment, Only the attachment structure of the light irradiation unit 30 will be described. The same parts as those of the first embodiment are denoted by the same reference numerals, and the description thereof is omitted.

  FIG. 14 shows the positional relationship between the bottom plate 151 and the guide member 70B when the guide member 70B is attached to the bottom plate 151 in the exposure apparatus according to the second embodiment, and (B) is a support plate The positional relationship between the support plate 153 and the guide member 70C when the guide member 70C is attached to 153 is shown.

  In the attachment structure for attaching the light emitting units 30a to 30g to the frame 15, the guide members 70B and 70C are attached to the bottom plate 151 and the support plate 153, and the light emitting units 30a to 30g are attached to the guide members 70B and 70C. Seven guide members 70B are provided on the bottom plate 151 so as to cover the round holes 155a to 155g, and seven guide members 70C are provided on the support plate 153 so as to cover the round holes 156a to 156g.

  The difference between the guide member 70 and the guide member 70B and the difference between the guide member 70A and the guide member 70C are the presence or absence of the cutout hole 79. The guide members 70B and 70C respectively include substantially thin plate-shaped guide portion main bodies 71B and 71C. The difference between the guide main body 71B and the guide main body 71C is only the diameter.

  The guide main bodies 71B and 71C are substantially thin plate made of metal having a thickness of about 0.1 mm as in the case of the guide main bodies 71 and 71A, and have a substantially disk shape in plan view. Attachment holes 74 and 74A are formed in the approximate center of the guide main bodies 71B and 71C.

  A plurality of annular fan-shaped cutout holes 79 are formed in the guide portion main bodies 71B and 71C. The cutout holes 79 are formed along the circumferential direction. In the present embodiment, eight cutout holes 79 are arranged approximately every 45 degrees, but the number, position, size, shape, etc. of the cutout holes 79 are not limited to this.

  FIG. 15 is an exploded perspective view of the attachment structure in the portion where the light irradiator 30 a is attached to the support plate 153. In FIG. 15, the portion above the flange 36a of the light irradiation unit 30a is omitted. The mounting structure for mounting the light emitting units 30a to 30g to the bottom plate 151 and the mounting structure for mounting the light emitting units 30b to 30g to the support plate 153 are the same as the mounting structure for mounting the light emitting units 30a to the support plate 153. I omit it.

  The guide member 70C is provided on the support plate 153 so as to cover the round hole 156a. The guide ring 70A is placed on the guide main body 71B, the screw 85 is inserted into the holes 77 and 77A, and the screw 85 is screwed into the screw hole 156h formed in the support plate 153. It is fixed to the support plate 153.

  The cylindrical portion 35a is provided to the guide member 70C via the attachment portion 37a. A guide ring 70A is provided under the guide main body 71B, the screw 86 is inserted into the holes 78 and 78A, and the screw 86 is screwed into the screw hole 371 formed in the flange 37, whereby the guide member 70C is attached to the attachment portion 37a. It is fixed to

  FIG. 16 is a view showing the light irradiation unit 30a attached to the frame 15. As shown in FIG. The cylindrical portion 35a is inserted into the attachment holes 74 and 74A of the guide members 70B and 70C. The positions of the AF light source 341, the AF sensors 347 and 348, and the cutout holes 79 in the horizontal direction coincide with each other. In other words, the position of the cutout hole 79 overlaps the positions of the AF light source 341 and the AF sensors 347 and 348 in plan view. Therefore, the light emitted downward from the AF light source 341 is reflected by the mask M, and the reflected light is incident on the AF sensors 347 and 348.

  In the present embodiment, since the guide members 70B and 70C have the cutout holes 79, the position of the light irradiation unit 30a in the rotational direction can be finely adjusted. Hereinafter, the rotation drive unit 90a will be described. The light irradiators 30b to 30g also have rotary drivers 90b to 90g, respectively, like the light irradiators 30a, but since the rotary drivers 90a to 90g have the same structure, the rotary drivers 90b to 90g have the same structure. The description is omitted.

  As shown in FIG. 15, the rotation drive unit 90a mainly includes a protrusion 91a, a piezoelectric element 92a, and an elastic member 93a. The protrusion 91a is substantially rod-shaped and is provided on the side surface of the flange 36a. The tip of the piezoelectric element 92a abuts on the protrusion 91a. The piezoelectric element 92a is provided with a non-displaceable portion (the end not in contact with the protrusion 91a) on the support portion 15a (see FIG. 3 and the like). Further, an elastic member 93a is provided on the projection 91a. The elastic member 93a is, for example, a compression spring, and one end is provided on the protrusion 91a, and the other end is provided on the support portion 15a. Therefore, when the piezoelectric element 92a is extended, the light emitting unit 30a rotates counterclockwise as viewed from the + z direction, and when the piezoelectric element 92a is contracted, the light emitting unit 30a rotates clockwise as viewed from the + z direction.

  According to the present embodiment, since the mounting structure using the guide members 70B and 70C is provided, it is possible to prevent the swing of the optical axis ax when the light emitting unit 30 is moved up and down. Further, by forming the cutout holes 79 in the guide members 70B and 70C, it is possible to move the light irradiation unit 30 in the vertical direction as well as in the rotational direction. Since the piezoelectric element 92a is used for movement in the rotational direction, adjustment is possible at an angle in seconds (1 second = approximately 2.78 degrees).

  Further, according to the present embodiment, since the position of the cutout hole 79 overlaps with the positions of the AF light source 341 and the AF sensors 347 and 348 in plan view, it is necessary to form the holes 75 and 76 in the guide members 70B and 70C. There is no. Then, since the cutout holes 79 are arranged substantially equally in the circumferential direction, the guide main bodies 71B and 71C are uniformly deformed when moving the light emitting part 30a up and down. Therefore, the light irradiation part 30a can prevent the movement to a horizontal direction.

  In the present embodiment, the light irradiation units 30a to 30g are rotated using the rotation driving units 90a to 90g, but the method of rotating the light irradiation units 30a to 30g is not limited thereto. For example, the projection 91a may be provided with a feed screw, the tip of the feed screw may be brought into contact with the side plate 154, and the light irradiation unit 30a may be rotated by manually rotating the feed screw.

Third Embodiment
In the third embodiment of the present invention, the plate thickness of the guide member is as thick as about 1 mm. The exposure apparatus of the third embodiment will be described below. The difference between the exposure apparatus 1 of the first embodiment and the exposure apparatus of the third embodiment is only in the mounting structure of the light irradiation unit 30. Therefore, in the exposure apparatus of the third embodiment, Only the attachment structure of the light irradiation unit 30 will be described. The same parts as those of the first embodiment are denoted by the same reference numerals, and the description thereof is omitted.

  FIG. 17A shows the positional relationship between the bottom plate 151 and the guide member 70D when the guide member 70D is attached to the bottom plate 151 in the exposure apparatus according to the third embodiment, and FIG. The positional relationship between the support plate 153 and the guide member 70E when the guide member 70E is attached to 153 is shown.

  In the attachment structure for attaching the light emitting units 30a to 30g to the frame 15, the guide members 70D and 70E are attached to the bottom plate 151 and the support plate 153, and the light emitting units 30a to 30g are not illustrated in the guide members 70D and 70E (not shown in FIG. 17). Attach the. Seven guide members 70D are provided on the bottom plate 151 so as to cover the round holes 155a to 155g, and seven guide members 70E are provided on the support plate 153 so as to cover the round holes 156a to 156g.

  The guide members 70D and 70E respectively have substantially thin plate-shaped guide portion main bodies 71D and 71E. FIG. 18A is a view schematically showing the guide main body 71D, and FIG. 18B is a view schematically showing the guide main body 71E.

  The difference between the guide member 70 and the guide member 70D and the difference between the guide member 70A and the guide member 70E are the plate thickness and the presence or absence of the cutout holes 79A to 79D. In FIG. 18A, the holes 76 are omitted.

  The guide main bodies 71D and 71E have a substantially thin plate shape and a substantially disc shape in plan view. The guide main bodies 71D, 71E are formed of metal having a thickness of about 1 mm. As the metal, stainless steel, phosphor bronze or the like can be used, but it is desirable to use more homogeneous phosphor bronze. The term "about 1 mm" in the present invention includes an error of about 1 mm or less with respect to about 1 mm.

  Mounting holes 74 and 74A are formed in the approximate center of the guide main bodies 71D and 71E. Further, a plurality of holes 77 are formed in the guide portion main bodies 71D and 71E along the outer periphery of the guide portion main body 71, and a plurality of holes 78 are formed along the attachment holes 74 and 74A.

  In the guide portion main body 71D, a plurality of substantially arc-shaped cutout holes 79A and 79B are formed so that the guide portion main body 71D is easily deformed. The cutout holes 79A and 79B are respectively arranged at equal intervals along the circumferential direction. The radius of the cutout hole 79A is smaller than the radius of the cutout hole 79B, and the cutout hole 79B is disposed outside the cutout hole 79A. Further, the end region 79Aa including the end of the cutout hole 79A and the end region 79Ba including the end of the cutout hole 79B substantially coincide in circumferential position. The end regions 79Aa and 79Ba are present at both ends of the cutout holes 79A and 79B, respectively.

  A plurality of substantially arc-shaped cutout holes 79C and 79D are formed in the guide main body 71E so that the guide main body 71E is easily deformed. The cutout holes 79C and 79D are arranged at equal intervals along the circumferential direction. The radius of the cutout hole 79C is smaller than the radius of the cutout hole 79D, and the cutout hole 79D is disposed outside the cutout hole 79C. Further, the end region 79Ca including the end of the cutout hole 79C and the end region 79Da including the end of the cutout hole 79D substantially coincide in circumferential position. The end regions 79Ca and 79Da are present at both ends of the cutout holes 79C and 79D, respectively.

  In the present embodiment, there are four cutout holes 79A, 79B, 79C, 79D, and the position and number of the cutout holes 79A, 79B, 79C, 79D are not limited to this.

  The positions in the circumferential direction of the end area 79Aa and the end area 79Ba substantially coincide with each other, and the overlapping positions are arranged uniformly (for example, approximately every 45 degrees) in the circumferential direction. Further, the positions in the circumferential direction of the end region 79Ca and the end region 79Da substantially coincide with each other, and the overlapping positions are arranged uniformly (for example, approximately every 45 degrees) in the circumferential direction. Therefore, when a line radially extending from the center point of the guide portion main bodies 71D and 71E is drawn, the line necessarily passes through at least one of the cutout holes 79A to 79D. Therefore, the amount of deformation of the guide portion main bodies 71D and 71E is substantially constant regardless of the place in the circumferential direction. Also, by arranging the cutout holes 79A to 79D in this way, even if a thin plate having a thickness of about 1 mm is used for the guide main bodies 71D and 71E, according to the vertical movement of the cylindrical portion 35a of about 30 μm. The guide main bodies 71D and 71E expand and contract.

  FIG. 19 is an exploded perspective view of the attachment structure in the portion where the light irradiator 30 a is attached to the support plate 153. In FIG. 19, a portion above the flange 36 a of the light irradiation unit 30 a is omitted. The mounting structure for mounting the light emitting units 30a to 30g to the bottom plate 151 and the mounting structure for mounting the light emitting units 30b to 30g to the support plate 153 are the same as the mounting structure for mounting the light emitting units 30a to the support plate 153. I omit it.

  The guide member 70E is provided on the support plate 153 so as to cover the round hole 156a. The guide member 70E is fixed to the support plate 153 by inserting the screw 85 into the hole 77 and screwing the screw 85 into the screw hole 156h formed in the support plate 153.

  The cylindrical portion 35a is provided to the guide member 70E via the mounting portion 37a. The guide member 70E is fixed to the mounting portion 37a by inserting the screw 86 into the hole 78 and screwing the screw 86 into the screw hole 371 formed in the flange 37.

  As described above, since the guide member 70E is fixed to the cylindrical portion 35a via the mounting portion 37a, the guide member 70E is deformed in accordance with the vertical movement of the cylindrical portion 35a of approximately 30 μm.

  According to the present embodiment, since the guide members 70D and 70E are formed of a metal of about 1 mm, the guide members 70D and 70E can be elastically deformed even when the light irradiation unit 30 is heavy. For example, in the case where the guide member is formed of a metal of about 0.1 mm, if the light irradiation unit 30 becomes heavy, the guide member may exceed the elastic limit. On the other hand, when the guide members 70D, 70E are formed of a metal of about 1 mm, the guide members 70D, 70E become strong, so the guide members 70D, 70E may be plastically deformed beyond the elastic limit. Can be reduced.

  In the present embodiment, the guide members 70D and 70E respectively have the guide main bodies 71D and 71E, but the guide members 70D and 70E may have the pressing rings 72 and 72A and the pressing rings 73 and 73A, respectively. . However, in the present embodiment, since the thickness of the guide members 70D, 70E is as thick as about 1 mm, the pressing rings 72, 72A, 73, 73A are not essential.

  The embodiment of the present invention has been described in detail with reference to the drawings, but the specific configuration is not limited to this embodiment, and design changes and the like within the scope of the present invention are also included. . Those skilled in the art can appropriately change, add, convert, etc. the elements of the embodiment.

  Further, in the present invention, “abbreviation” is a concept including not only the case of strictly identical but also an error and a deformation that do not lose the sameness. For example, “substantially horizontal” is not limited to the case of strictly horizontal, and is a concept including an error of, for example, several degrees. Further, for example, when expressing simply as parallel, orthogonal, etc., not only strictly parallel, orthogonal, etc., but also substantially parallel, substantially orthogonal, etc. shall be included. Further, in the present invention, “near” means including a range (which can be arbitrarily determined) of a region near a reference position. For example, the term “in the vicinity of A” is a concept that indicates a range of area near A, which may or may not include A.

1: Exposure apparatus 11: Surface plate 11a: Upper surface 12: Plate-like portion 12a: Upper surface 13, 14: Rail 15: Frame 15a: Support portion 15c: Column 20: Mask holding portion 20a: Upper surface 21, 22, 23: Bar mirror 30, 30a, 30b, 30c, 30d, 30f, 30g: light irradiation units 32a, 32b, 32c, 32d, 32e, 32f, 32g: objective lenses 33a, 33b, 33c, 33d, 33e, 33f, 33g: light sources Parts 34a, 34b, 34c, 34d, 34e, 34f, 34g: AF processing parts 35, 35a, 35b, 35c, 35d, 35e, 35f, 35g: cylindrical parts 36, 36a, 36b, 36c, 36d, 36e, 36f , 36g: flange 37, 37a: mounting portion 38, 38a: mounting portion 39, 39a, 39b, 39c, 39d, 39e, 39 f, 39g: drive unit 40: measuring unit 41, 42: position measuring unit 41a, 42a: scale 41b, 42b: detection head 50, 51, 51a, 51b, 51c, 52, 52a, 52g: laser interferometer 55a, 55b , 55c, 56a, 56g: mirrors 60, 60a, 60b, 60c, 60d, 60f, 60g: reading units 70, 70A, 70B, 70C, 70D, 70E: guide members 71, 71A, 71B, 71C, 71D, 71E: Guide body 72, 72A, 73, 73A: Retaining ring 74, 74A: Mounting hole 75, 76, 77, 77A, 78, 78A: Hole 79, 79A, 79B, 79C, 79D: Cutting hole 79Aa, 79Ba , 79Ca, 79Da: end area 81, 82, 83: drive part 85, 86: screw 90a, 90b, 90c, 90 d, 90e, 90f, 90g: rotation drive part 91a: projection 92a: piezoelectric element 93a: elastic member 151: bottom plate 153: support plate 152, side plate 152, 152b, 152c, 152d, 152e, 152f, 152g: hole 154a , 154b, 154c, 154d, 154e, 154f, 154g: holes 152h, 152i, 154h, 154i: holes 155a, 155b, 155c, 155d, 155e, 155f, 155g: round holes 155h: screw holes 156a, 156b, 156c, 156d , 156e, 156f, 156g: round holes 156h: screw holes 157a, 157b, 157c, 157d, 157e, 157f, 157g: round holes 158: convex portion 159: partition wall 160: elastic member 161: moving mechanism 161a: rack 161b: Pini ON 161c: convex portion 161d, 161e: sliding surface 162: positioning member 162a: concave portion 163: permanent electromagnet 201: CPU
201a: control unit 202: RAM
203: ROM
204: input / output interface 205: communication interface 206: media interface 211: input / output device 212: network 213: storage medium 331: light source 332: lens 333: fly eye lens 334, lens 335: lens 336: light source 342 for AF : Collimator lens 343: AF cylindrical lens 344, 345: Penta prism 346: Lens 347, 348: AF sensor 371, 381: Screw hole 372: Hollow part 391: Piezoelectric element 392: Coupling part 393: Convex part 394: Groove 395 : Mounting portion 601: lens barrel 602: light source unit 603: lens barrel 604: tube lens 605: half mirror 606: camera 621: light source 622: light bundle fiber 623: diffusion plate 624: collimation Lens

Claims (11)

An optical device having a tubular portion;
A frame for assembling the optical device;
A substantially thin plate-shaped guide member provided between the optical device and the frame when assembling the optical device;
A driving unit provided on the frame for moving the optical device in the vertical direction;
Equipped with
The frame body is formed with a round hole penetrating in a substantially vertical direction,
The guide member has a substantially disc shape in a plan view, and is provided on the frame so as to cover the round hole,
An attachment hole is formed in substantially the center of the guide member,
The mounting hole is disposed substantially concentrically with the round hole,
A mounting structure of an optical device, wherein the cylindrical portion is inserted into the mounting hole and fixed to the guide member such that an optical axis substantially coincides with a center of the mounting hole. The frame has a bottom plate provided substantially horizontally, and a support plate provided substantially horizontal and above the bottom plate,
A first round hole and a second round hole, which are the round holes, are respectively formed in the bottom plate and the support plate,
In plan view, the center of the first round hole and the center of the second round hole substantially coincide,
The optical device according to claim 1, wherein when the optical device is assembled to the frame, a center of gravity of the optical device is located near a position where the drive unit pushes up the optical device. Mounting structure. The frame has a support portion provided substantially horizontally, a column provided at each end of the support portion, and a movement mechanism for moving the support portion in the vertical direction,
In the support portion, a support portion-side sliding surface is formed;
The column-side sliding surface is formed on the column so as to face the support-part-side sliding surface,
The support portion is formed of a magnetic material,
The pillar is provided with a permanent magnet having a permanent magnet and an electromagnet,
When the moving mechanism does not move the support portion, the permanent electromagnet attracts the support portion by supplying current to the coil of the electromagnet, and the support portion-side sliding surface and the column-side sliding surface The optical device mounting structure according to claim 1 or 2, wherein the optical device is in close contact. The moving mechanism includes a rack provided along an up-down direction on an end face substantially orthogonal to the longitudinal direction of the support portion, and a pinion rotatably provided on the pillar.
The optical system according to claim 3, wherein the teeth of the rack are located on a line passing through the center of gravity of the support and substantially parallel to the vertical direction when viewed along the longitudinal direction of the support. Device mounting structure. The mounting structure of the optical device according to any one of claims 1 to 4, wherein the guide member is formed of a metal having a thickness of about 0.1 mm. The mounting structure of the optical device according to claim 5, wherein a plurality of annular fan-shaped cutout holes are formed in the guide member along a circumferential direction. The guide member is formed of metal having a thickness of about 1 mm,
A plurality of substantially arc-shaped first and second cutout holes are formed in the guide member, respectively.
The second cutout hole is disposed outside the first cutout hole.
The end region including the end of the first cutout hole and the end region including the end of the second cutout hole substantially coincide in circumferential position. The mounting structure of the optical device according to one item. The guide member has a substantially annular first thick portion substantially along the outer periphery, and a substantially annular second thick portion substantially along the attachment hole,
The guide member and the frame are fixed via the first thick portion,
The optical device mounting structure according to any one of claims 1 to 7, wherein the guide member and the cylindrical portion are fixed via the second thick portion. The optical device includes an AF processing unit having an AF light source for emitting downward light and an AF sensor for receiving reflected light.
In the guide member, two holes are formed on the line passing through the center of the mounting hole so as to sandwich the mounting hole.
The mounting structure of an optical device according to any one of claims 1 to 8, wherein the two holes overlap with the positions of the AF light source and the AF sensor in plan view. The optical device includes an AF processing unit having an AF light source for emitting downward light and an AF sensor for receiving reflected light.
The mounting structure of an optical device according to claim 6, wherein the cutout hole overlaps the positions of the AF light source and the AF sensor in a plan view. A plate on which a workpiece is placed,
A light irradiation unit having a cylindrical portion and irradiating light to the work;
A frame for assembling the light emitting unit and holding the light emitting unit above the plate;
A substantially thin plate-shaped guide member provided between the light irradiation unit and the frame when assembling the light irradiation unit;
A driving unit provided on the frame for moving the light emitting unit in the vertical direction;
Equipped with
The frame body is formed with a round hole penetrating in a substantially vertical direction,
The guide member is provided on the frame so as to cover the round hole,
The guide member has a substantially disc shape in a plan view, and a mounting hole is formed in a central portion,
The mounting hole is disposed substantially concentrically with the round hole,
An exposure apparatus, wherein the cylindrical portion is inserted into the mounting hole and fixed to the guide member such that an optical axis substantially coincides with a center of the mounting hole.

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