WO2021015099A1 - Exposure device and exposure method - Google Patents

Exposure device and exposure method Download PDF

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Publication number
WO2021015099A1
WO2021015099A1 PCT/JP2020/027723 JP2020027723W WO2021015099A1 WO 2021015099 A1 WO2021015099 A1 WO 2021015099A1 JP 2020027723 W JP2020027723 W JP 2020027723W WO 2021015099 A1 WO2021015099 A1 WO 2021015099A1
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WO
WIPO (PCT)
Prior art keywords
unit
stage
reading
light irradiation
reading unit
Prior art date
Application number
PCT/JP2020/027723
Other languages
French (fr)
Japanese (ja)
Inventor
尚敦 張
祥平 山崎
秀人 大墳
Original Assignee
株式会社ブイ・テクノロジー
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式会社ブイ・テクノロジー filed Critical 株式会社ブイ・テクノロジー
Priority to CN202080035298.3A priority Critical patent/CN113841089A/en
Priority to KR1020217035926A priority patent/KR20220034028A/en
Publication of WO2021015099A1 publication Critical patent/WO2021015099A1/en

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7019—Calibration
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/708—Mark formation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping

Definitions

  • the present invention relates to an exposure apparatus and an exposure method.
  • Patent Document 1 discloses an exposure device that calibrates an alignment sensor based on an alignment mark and a reference scale in an exposure device that exposes an image on a substrate arranged on a stage with an exposure head.
  • the first stage on which the substrate is arranged and the second stage on which the reference scale is fixed can be raised and lowered independently.
  • the present invention has been made in view of such circumstances, and an exposure apparatus capable of dealing with variations in the height direction due to various types of substrates having different thicknesses, assembly errors, etc., without using a complicated mechanism. It is an object of the present invention to provide an exposure apparatus.
  • the exposure apparatus is, for example, an exposure apparatus that exposes a substrate, and is a substantially plate-shaped stage on which the substrate is mounted on a substantially horizontal mounting surface.
  • a first driving unit that moves the stage in a first direction substantially along a horizontal plane, a light irradiation unit provided above the stage, and a light irradiation unit adjacent to or in the light irradiation unit.
  • the bottom surface of the rib is provided on the above-described mounting surface, and a plurality of the recognition marks are formed on the upper surface of the rib opposite to the bottom surface in the first direction. It is characterized in that it is provided along the line.
  • the upper surface of the stage on which the mask is placed is a rib whose height changes, and a rib along the first direction is provided, which is opposite to the bottom surface of the rib.
  • a plurality of recognition marks are provided on the upper surface of the side along the first direction.
  • the rib has a first rib and a second rib provided adjacent to each other along the second direction, and the upper surface of the first rib and the upper surface of the second rib have substantially the same inclination.
  • the height of the first rib at the highest position and the height of the second rib at the lowest position may be substantially the same.
  • the length of the stage in the first direction can be shortened.
  • three or more ribs can be considered as a combination of two ribs (first rib and second rib).
  • the relative position between the reading units can be measured, and drawing can be performed using a multi-head exposure machine having a plurality of light irradiation units.
  • three or more light irradiation units can be considered as a combination of two light irradiation units (first light irradiation unit and second light irradiation unit), and three or more reading units are two reading units (first). It can be considered by the combination of the reading unit and the second reading unit).
  • the read unit may be provided in the vicinity of two sides of the stage along the second direction. Thereby, it is possible to detect whether the stage is moving straight along the first direction, whether the stage is moving in the first direction while bending in the second direction, and the like.
  • an alignment mark is provided on the substrate, and the stage is moved in the first direction by the first driving unit to arrange the alignment mark in the field of view of the reading unit, and the second
  • the drive unit moves the light irradiation unit and the reading unit in the vertical direction according to the height of the substrate, the reading unit reads the alignment mark, and the first driving unit reads the stage.
  • the recognition mark is placed in the field of view of the reading unit by moving in one direction, the recognition mark is read by the reading unit, and the light irradiation unit is based on the result of reading the alignment mark and the recognition mark.
  • a control unit that performs drawing processing for irradiating the substrate with light may be provided.
  • the recognition mark has a thickness of about 5 ⁇ m or more, and has a substantially cross shape in a plan view having protrusions protruding in four directions substantially orthogonal to each other, and the cross-sectional shape of the protrusions is wide on the rib side, and the rib side is wide.
  • the opposite side of the rib has a narrow substantially trapezoidal shape, and the first side surface and the second side surface, which are the side surfaces on both sides of the protrusion, are inclined surfaces inclined with respect to the upper surface, and the inclination of the first side surface with respect to the upper surface.
  • the difference between the absolute value of the angle and the absolute value of the inclination angle of the second side surface with respect to the upper surface is within about 1 degree, and the control unit reads the recognition mark while moving the reading unit in the vertical direction. You may. As a result, the reading unit can correctly read the center of the trapezoidal recognition mark regardless of the height of the reading unit. As a result, the inclination of the optical axis of the reading unit is detected, and high-precision drawing becomes possible.
  • a substantially plate-shaped interchangeable read portion provided on the stage is provided, and the recognition mark has a thickness of about 10 nm to about 1 ⁇ m, and the replaceable read portion has a thickness of about 5 ⁇ m.
  • a trapezoidal recognition mark having a thickness of the above and having protrusions protruding in four directions substantially orthogonal to each other is provided, and the cross-sectional shape of the protrusions is in front of the interchangeable read portion.
  • the difference from the absolute value of the inclination angle with respect to the placement surface is within about 1 degree, and the control unit may read the trapezoidal recognition mark while moving the reading unit in the vertical direction.
  • the control unit may read the trapezoidal recognition mark while moving the reading unit in the vertical direction.
  • the exposure method according to the present invention is, for example, an exposure method in which a substrate is exposed using a light irradiation unit provided above a stage movably provided along a first direction.
  • the substrate is a step of placing the substrate on a substantially horizontal surface of the stage, a light irradiation unit, and a reading unit adjacent to the light irradiation unit or provided in the light irradiation unit.
  • At least one of the step of reading the substrate by the reading unit by moving in the vertical direction according to the height of the stage and two sides along the second direction substantially orthogonal to the first direction of the stage.
  • the alignment mark provided on the substrate is read by the reading unit, and in the step of irradiating the substrate with light from the light irradiation unit, the reading result of the alignment mark is obtained.
  • the substrate may be irradiated with light based on the reading result of the recognition mark. As a result, the alignment mark and the recognition mark can be read with the height of the reading unit aligned with the alignment mark.
  • the calibration step has a substantially reduced thickness while moving the reading unit in a direction closer to the stage and a direction away from the stage.
  • a step of reading a trapezoidal recognition mark having a substantially trapezoidal cross-sectional shape having a substantially trapezoidal cross-sectional shape with a wide stage side and a narrow upper surface side, which is 5 ⁇ m or more and having a substantially cross-shaped plan view, and the trapezoidal recognition mark In the step of irradiating the substrate with light from the light irradiation unit, including a step of detecting the inclination of the optical axis of the reading unit based on the reading result of the above, drawing is performed based on the inclination of the optical axis of the reading unit. The position may be adjusted. As a result, the inclination of the optical axis of the reading unit can be detected and high-precision drawing can be performed.
  • the present invention it is possible to deal with variations in the height direction due to various types of substrates having different thicknesses, assembly errors, etc., without using a complicated mechanism.
  • FIG. 1 It is a figure which shows the trapezoidal recognition mark 41, (A) is a plan view, (B) is a CC sectional view of (A). It is a figure which shows the state when the reading unit 60 is moved up and down, (A) is the case where the optical axis of the reading unit 60 is not tilted, (B) is the case where the optical axis of the reading unit 60 is tilted. Is. It is a figure which shows typically the field of view of the reading part 60 when the reading part 60 reads the read part 25. It is a perspective view which shows the schematic structure of the read
  • embodiments of the present invention are applied to an exposure apparatus that generates a photomask by irradiating a photosensitive substrate (for example, a glass substrate) held in a substantially horizontal direction with light such as a laser while moving it in the scanning direction.
  • a photosensitive substrate for example, a glass substrate
  • light such as a laser
  • photosensitive substrate for example, quartz glass having a very small coefficient of thermal expansion (for example, about 5.5 ⁇ 10-7 / K) is used.
  • Photosensitive substrates come in various sizes, ranging from those having a size of about 400 mm ⁇ 400 mm to large ones having a side of more than 1 m (for example, 1400 mm ⁇ 1220 mm).
  • the thickness of the photosensitive substrate varies depending on the size, and is, for example, 7.5 mm to 16 mm.
  • the photomask generated by the exposure device is, for example, an exposure mask used for manufacturing a substrate for a liquid crystal display device.
  • a photomask is a photomask in which one or a plurality of transfer patterns for an image device are formed on a substantially rectangular substrate.
  • the term mask 100 is used to cover the photosensitive substrate before, during, and after processing.
  • the exposure apparatus of the present invention is not limited to the mask manufacturing apparatus.
  • the exposure apparatus of the present invention is a concept including various devices that irradiate light (including laser, UV, polarized light, etc.) while moving a substrate held in a substantially horizontal direction in a scanning direction.
  • FIG. 1 is a perspective view showing an outline of the exposure apparatus 1 according to the first embodiment.
  • the exposure device 1 mainly includes a surface plate 11, a plate-shaped portion 12, rails 13 and 14, a frame body 15, a stage 20, a light irradiation unit 30, a laser interference meter 50, and a reading unit 60. Has. In FIG. 1, some configurations are not shown. Further, the exposure apparatus 1 is maintained at a constant temperature by a temperature adjusting unit (not shown) that covers the entire apparatus.
  • the directions substantially along the horizontal plane are defined as the x direction and the y direction
  • the directions substantially orthogonal to the x direction and the y direction are defined as the z direction.
  • the x direction and the y direction are substantially orthogonal to each other.
  • the surface plate 11 is placed on a plurality of vibration isolation tables (not shown) placed on an installation surface (for example, a floor). As a result, the surface plate 11 is placed on the installation surface via the vibration isolation table. Since the vibration isolator is already known, detailed description thereof will be omitted. The vibration isolation table is not essential.
  • a loader (not shown) for installing the mask 100 on the stage 20 is provided on the + x side of the surface plate 11.
  • the rail 13 is an elongated plate-shaped member made of ceramic, and is fixed to the upper surface 11a of the surface plate 11 so that the longitudinal direction is along the x direction.
  • the end of the rail 13 on the loader side (+ x side) is arranged at the end of the upper surface 11a, and the end of the rail 13 on the opposite loader side ( ⁇ x side) is arranged inside the end of the upper surface 11a.
  • the heights (positions in the z direction) of the three rails 13 are substantially the same, and the upper surfaces thereof are formed with high accuracy and high flatness.
  • the stage 20 is placed on the rail 14.
  • the stage 20 is provided on the upper surface 11a via the plate-shaped portion 12 and the rails 13 and 14.
  • the stage 20 has a substantially rectangular plate shape in a plan view, and has a low expansion ceramic having a coefficient of thermal expansion of about 0.5 to 1 ⁇ 10-7 / K and a coefficient of thermal expansion of about 5 ⁇ 10-8 / K. It is formed using the ultra-low expansion glass ceramic of. This makes it possible to prevent the stage 20 from being deformed.
  • the stage 20 may be formed of a material that expands and contracts like the mask 100.
  • a guide portion (not shown) is provided on the lower surface of the stage 20 so that the longitudinal direction is along the y direction.
  • the moving direction of the stage 20 is restricted so that the stage 20, that is, the plate-shaped portion 12 does not move in any direction other than the y direction.
  • the stage 20 (plate-shaped portion 12) is provided so as to be movable in the x direction along the rail 13, and the stage 20 is provided so as to be movable in the y direction along the rail 14.
  • the stage 20 has a substantially horizontal upper surface 20a which is a surface opposite to the surface facing the upper surface 11a.
  • the upper surface 20a is a mounting surface on which a mask 100 (see FIG. 2) provided with a plurality of alignment marks 101 is mounted. Further, a read portion 25 (see FIG. 2, detailed later) is provided on the upper surface 20a. The alignment mark 101 and the read unit 25 are read by the reading unit 60, and the stage 20, that is, the mask 100 is positioned (detailed later).
  • stage 20 may be configured to be movable not only in the x direction and the y direction but also in the z direction.
  • the exposure device 1 has drive units 81 and 82 (not shown in FIG. 1, see FIG. 8).
  • the drive units 81 and 82 are, for example, linear motors.
  • the drive unit 81 moves the stage 20 (plate-shaped portion 12) in the x direction along the rail 13, and the drive unit 82 moves the stage 20 in the y direction along the rail 14.
  • various already known methods can be used.
  • the exposure device 1 has a laser interferometer 50 that measures the position of the stage 20.
  • the laser interference meter 50 includes a laser interference meter 51 provided on a pillar provided on the ⁇ y side of the frame body 15 and a laser interference meter (not shown) provided on the + x side side surface of the surface plate 11.
  • a method for measuring the position of the stage 20 using the laser interferometer 50 various already known methods can be used.
  • a frame body 15 is provided on the surface plate 11.
  • a casting having a low expansion coefficient for example, a nickel-based alloy
  • the frame body 15 has a support portion 15a and two pillars 15c that support the support portion 15a at both ends.
  • the frame body 15 holds the light irradiation unit 30 above the stage 20 (+ z direction).
  • a light irradiation unit 30 is attached to the support portion 15a.
  • the frame body 15 will be described in detail later.
  • the light irradiation unit 30 irradiates the mask 100 with light (laser light in the present embodiment).
  • the light irradiation units 30 are provided at regular intervals (for example, approximately every 200 mm) along the y direction. In the present embodiment, it has seven light irradiation units 30a, a light irradiation unit 30b, a light irradiation unit 30c, a light irradiation unit 30d, a light irradiation unit 30e, a light irradiation unit 30f, and a light irradiation unit 30g.
  • the moving mechanism 161 see FIG.
  • the driving unit 39 sets the light irradiation unit 30a to 30g in the z direction in a range of about 30 ⁇ m (micrometer) in order to finely adjust the focal position of the light irradiation unit 30a to 30g. Make a slight movement.
  • the light irradiation unit 30 will be described in detail later.
  • the reading unit 60 reads the alignment mark 101 (see FIG. 2) and the recognition mark 25e (see FIG. 3) formed on the mask 100.
  • the alignment mark 101 and the recognition mark 25e are marks used for positioning (calibration, alignment, etc.) of the mask 100.
  • the reading unit 60 includes seven reading units 60a, a reading unit 60b, a reading unit 60c, a reading unit 60d, a reading unit 60e, a reading unit 60f, and a reading unit 60g.
  • the reading units 60a to 60g are provided in the light irradiation units 30a to 30g so as to be adjacent to the light irradiation units 30a to 30g, respectively.
  • the reading units 60a to 60g may be provided in the light irradiation units 30a to 30g, respectively.
  • a microscope having a magnification of about 50 times and a depth of focus of 1 ⁇ m or less is used as the reading unit 60.
  • the reading unit 60 will be described in detail later.
  • FIG. 2 is a plan view showing an outline of the exposure apparatus 1. In FIG. 2, only the main configuration is shown, and the other configurations are omitted.
  • the read unit 25 is provided in the vicinity of two sides 20b and 20c that are substantially parallel in the plan view of the stage 20.
  • the sides 20b and 20c are along the y direction.
  • a plurality of read portions 25 are provided along the sides 20b and 20c.
  • the read unit 25 is arranged between two reading units 60a to 60g adjacent to each other in the y direction.
  • the number of read units 25 provided between the two reading units 60a to 60g is not limited, and at least one read unit 25 may be provided between the two reading units 60a to 60g.
  • one read unit 25 is provided between the reading unit 60a and the reading unit 60b, between the reading unit 60b and the reading unit 60c, and between the reading unit 60d and the reading unit 60e.
  • Two read units 25 are provided between the reading unit 60c and the reading unit 60d, and between the reading unit 60e and the reading unit 60f.
  • the same read unit 25 can be read by two adjacent reading units 60 (for example, the reading unit 60a and the reading unit 60b). Can be done.
  • the read unit 25 is arranged between two reading units 60 adjacent to each other in the y direction. What to do is an essential configuration for drawing.
  • FIG. 3 is a perspective view showing a schematic configuration of the read unit 25.
  • the read portion 25 is provided on the stage 20 via the plate-shaped member 21, but the plate-shaped member 21 is not essential.
  • the upper surface 20a of the stage 20 includes the upper surface of the plate-shaped member 21.
  • the recognition mark 25e is provided with a size based on the inclination of the plate-shaped portions 25d of the ribs 25A and 25B and the characteristics of the reading portion 60.
  • the size of the recognition mark 25e is such that a plurality of recognition marks 25e are included in the field of view of the reading unit 60, and one of the recognition marks 25e is focused (two or more recognition marks 25e). It is a size (so that it is out of focus).
  • FIG. 4 is a perspective view showing an outline of the support portion 15a of the frame body 15, and is a view seen from the back surface side (+ x side).
  • the support portion 15a and the pillar 15c are shown slightly separated for the sake of explanation, but the support portion 15a and the pillar 15c are actually adjacent to each other.
  • the support portion 15a has a substantially rectangular cross-sectional shape and a substantially rod shape, and the inside is hollow.
  • the support portion 15a is provided so that the longitudinal direction is along the y direction.
  • the support portion 15a mainly has a bottom plate 151, a support plate 153, side plates 152 and 154 provided on both sides of the bottom plate 151 and the support plate 153, and a partition wall 159.
  • the bottom plate 151 and the support plate 153 are provided substantially horizontally, and the side plates 152 and 154 are provided substantially vertically.
  • the plate-shaped partition wall 159 is an internal reinforcement of the support portion 15a, and vibration and deformation (bending, twisting, etc.) of the support portion 15a are prevented at the position where the partition wall 159 is provided.
  • Round holes 155a to 155g and 156a to 156g are formed on the bottom plate 151 and the support plate 153, respectively, along the y direction.
  • the round holes 155a to 155g and 156a to 156g are holes that penetrate the bottom plate 151 and the support plate 153 in the substantially vertical direction, respectively, and are substantially circular in plan view. In a plan view, the position of the center of the round holes 155a to 155g and the position of the center of the round holes 156a to 156g are substantially the same.
  • the side plates 152 and 154 are each formed with holes used as cast holes for discharging casting sand during casting to form an internal space. These holes are used to attach the reading unit 60 to the round holes 157a to 157g.
  • the frame body 15 has a moving mechanism 161 that moves the support portion 15a along the pillar 15c in the z direction.
  • the moving mechanism 161 moves the support portion 15a in the z direction within a range of about 10 mm.
  • an actuator 161c (see FIG. 8) that rotationally drives the rack 161a, the pinion 161b, and the pinion 161b can be used.
  • the frame body 15 has two permanent electromagnets 163 provided on the pillar 15c.
  • the permanent magnet 163 is a permanent electromagnetic type having a permanent magnet and an electromagnet, and a current is passed through the coil of the electromagnet only at the time of attachment / detachment to turn on / off the built-in permanent magnet.
  • the permanent electromagnet 163 attracts the support portion 15a by passing an electric current through the coil of the electromagnet.
  • FIG. 5 is a perspective view of a main part showing an outline of the light irradiation unit 30a.
  • the light irradiation unit 30a mainly includes a DMD 31a, an objective lens 32a, a light source unit 33a, an AF processing unit 34a, a tubular portion 35a, a flange 36a, mounting portions 37a and 38a, and a driving unit 39a.
  • the light irradiation units 30b to 30g are DMD 31b to 31g, objective lenses 32b to 32g, light source units 33b to 33g, AF processing units 34b to 34g, tubular portions 35b to 35g, and flanges 36b to, respectively.
  • the objective lens 32a forms an image of the laser light reflected by each micromirror of the DMD 31a on the surface of the mask 100.
  • light is irradiated from each of the light irradiation unit 30a to the light irradiation unit 30g, and the light is imaged on the mask 100 to draw a pattern on the mask 100.
  • the light source unit 33a mainly includes a light source 331, a lens 332, a fly-eye lens 333, a lens 334, 335, and a mirror 336.
  • the light source 331 is, for example, a laser diode, and the light emitted from the light source 331 is guided to the lens 332 via an optical fiber or the like.
  • the fly-eye lens 333 is a two-dimensional arrangement of a plurality of lenses (not shown), and a large number of point light sources are created in the fly-eye lens 333.
  • the light that has passed through the fly-eye lens 333 becomes parallel light through the lens 334, 335 (for example, a condenser lens), and is reflected by the mirror 336 toward the DMD 31a.
  • the AF processing unit 34a focuses the light applied to the mask 100 to the mask 100, and mainly includes an AF light source 341, a collimator lens 342, an AF cylindrical lens 343, a pentaprism 344, and 345. It has a lens 346 and AF sensors 347 and 348.
  • the light emitted from the AF light source 341 becomes parallel light by the collimator lens 342, becomes linear light by the AF cylindrical lens 343, is reflected by the pentaprism 344, and forms an image on the surface of the mask 100.
  • the light reflected by the mask 100 is reflected by the pentaprism 345, condensed by the lens 346, and incident on the AF sensors 347 and 348.
  • the pentaprisms 344 and 345 bend the light at a bending angle of approximately 97 degrees.
  • a mirror may be used instead of the pentaprisms 344 and 345, but it is desirable to use a pentaprism because the focus is blurred due to the angle deviation of the mirror.
  • the AF processing unit 34a performs autofocus processing for obtaining the focusing position based on the result received by the AF sensors 347 and 348. Since such an autofocus process by the optical lever method is already known, detailed description thereof will be omitted.
  • the light irradiation unit 30a has a substantially cylindrical tubular portion 35a provided with an optical system (including an objective lens 32a) inside.
  • a flange 36a is provided at the upper end of the tubular portion 35a.
  • the flange 36a holds the lens 332, the fly-eye lens 333, and the lens 334, 335 on the upper side.
  • the tubular portion 35a is provided with mounting portions 37a and 38a.
  • the mounting portions 37a and 38a are used for mounting on the frame body 15.
  • the mounting portion 37a is provided near the flange 36a, and the mounting portion 38a is provided near the lower end of the tubular portion 35a.
  • a hollow portion 372 having a diameter larger than the outer diameter of the mounting portion 38a is formed in the mounting portion 37a. As a result, the tubular portion 35a can be pulled out upward.
  • the mounting portion 37a (that is, the light irradiation portion 30a) is moved in the vertical direction (z direction) by the driving unit 39a.
  • the drive unit 39a has a piezoelectric element which is a solid actuator in which displacement occurs when a voltage is applied. When the piezoelectric element expands, the light irradiation unit 30a moves in the + z direction, and when the piezoelectric element 391 contracts, the light irradiation unit 30a moves in the ⁇ z direction.
  • the amount of movement of the light irradiation unit 30a by the drive unit 39a is approximately 30 ⁇ m.
  • FIG. 6 is a perspective view showing an outline of the reading unit 60a, and is a perspective view of the main part.
  • the reading unit 60a is a high-magnification microscope optical system, and mainly includes a lens barrel 601 in which an objective lens is provided, a light source unit 602 that irradiates the objective lens with light (here, visible light), titanium, and zirconia.
  • the reading unit 60a is fixed to the tubular portion 35a via a mounting portion (not shown). As a result, the reading unit 60a moves in the z direction together with the light irradiation unit 30a.
  • the guide members 70 and 70A have guide unit main bodies 71 and 71A and pressing rings 72, 72A, 73 and 73A, respectively.
  • the guide portion main bodies 71 and 71A have a substantially thin plate shape and a substantially disc shape in a plan view.
  • the guide portions 71 and 71A are made of a metal having a thickness of about 0.1 mm so as to be easily deformed. As the metal, stainless steel, phosphor bronze and the like can be used, but it is desirable to use more homogeneous phosphor bronze.
  • the reading unit 60a (not shown in FIG. 7) provided in the light irradiation unit 30a also moves up and down as the light irradiation unit 30a moves up and down. Since the lens barrel 601 of the reading unit 60a is inserted into the round hole 157a (see FIG. 4 and the like) and the lens barrel 601 is not fixed to the round hole 157a, no problem occurs due to the vertical movement of the lens barrel 601.
  • the CPU 201 operates based on the programs stored in the RAM 202 and the ROM 203, and controls each part. Signals are input to the CPU 201 from the laser interference meter 50, the reading unit 60, and the like. The signal output from the CPU 201 is output to the drive units 81, 82, the light irradiation unit 30, and the like.
  • the control unit 201a reads the trapezoidal recognition mark 41 provided on the substantially plate-shaped interchangeable read unit (not shown) before performing the drawing process.
  • 9A and 9B are views showing the trapezoidal recognition mark 41, FIG. 9A is a plan view, and FIG. 9B is a sectional view taken along the line CC of FIG. 9A.
  • the bottom surface 41b and the top surface 41e are substantially parallel to the top surface 20a when the replaceable read unit is placed on the top surface 20a of the stage 20.
  • the side surfaces 41c and 41d on both sides of the protrusion 41a are inclined surfaces that are inclined with respect to the bottom surface 41b and the top surface 41e. In the cross-sectional view shown in FIG. 9B, the side surfaces 41c and 41d are substantially symmetrical.
  • the difference between the absolute value of the inclination angle of the side surface 41c with respect to the bottom surface 41b and the absolute value of the inclination angle of the side surface 41d with respect to the bottom surface 41b is preferably within about 1 degree.
  • the accuracy of the exposure apparatus according to the present embodiment is approximately 60 nm, and the accuracy of the exposure apparatus can be satisfied by setting the difference in inclination angles between the side surfaces 41c and 41d to 1 degree or less.
  • the trapezoidal recognition mark 41 is two-dimensionally arranged on the interchangeable read unit.
  • the replaceable read unit is provided separately from the read unit 25, and is removable from the stage 20.
  • the replaceable read unit is placed on the upper surface 20a of the stage 20.
  • the control unit 201a has a trapezoidal shape while moving the reading unit 60 closer to the stage 20 and away from the stage 20 by the driving unit 39 and the moving mechanism 161 while the replaceable reading unit is mounted on the stage 20. Read the recognition mark 41.
  • control unit 201a reads the trapezoidal recognition mark 41 while moving the reading unit 60 toward the stage 20 and away from the stage 20 before the drawing process, and based on the reading result of the trapezoidal recognition mark 41.
  • the characteristics of the reading unit 60, particularly the inclination of the optical axis, are detected.
  • the reading unit 60 reads the trapezoidal recognition mark 41, even if the reading unit 60 is moved up and down, it is possible to focus on some of the side surfaces 41c and 41d of the trapezoidal recognition mark 41. Since the side surfaces 41c and 41d are substantially symmetrical, even if the side surfaces 41c and 41d are focused on the low position (near the bottom surface 41b), the side surfaces 41c and 41d are focused on the high position (near the top surface 41e). Even if they match, the reading unit 60 can correctly read the center O of the trapezoidal recognition mark 41.
  • control unit 201a moves the stage 20 in the x-direction and the y-direction by the drive units 81 and 82 to arrange the read unit 25 provided near the side 20b in the field of view of the reading unit 60, and the reading unit 60. Read the recognition mark 25e with.
  • the control unit 201a detects the positions of the stage 20, that is, the mask 100 in the x-direction and the y-direction based on the reading results of the alignment mark 101 and the recognition mark 25e.
  • the control unit 201a adjusts the drawing position based on the inclination of the optical axis of the reading unit 60 obtained based on the reading result of the trapezoidal recognition mark 41. Then, the control unit 201a irradiates the mask 100 with light from the light irradiation units 30a to 30g based on the corrected drawing position. Specifically, the control unit 201a changes the timing of the signal (horizontal synchronization signal) that irradiates the light irradiation units 30a to 30g with light in the x direction, and shifts the drawing data in the y direction by the amount of the misalignment in the y direction. Adjust the drawing position by moving it.
  • the signal horizontal synchronization signal
  • the thickness of the recognition mark 25e used in the drawing process is made thinner than the depth of focus of the reading unit 60.
  • the recognition mark 25e is thinned.
  • the alignment mark 101 is provided on the mask 100, but the alignment mark 101 is not essential.
  • the control unit 201a may read an arbitrary pattern or the like existing on the mask 100, or the control unit 201a reads a side portion to the corner portion of the mask 100. May be good. Further, the control unit 201a may read the recognition mark 25e calculated from the height of the mask 100.
  • the exposure device 2 has a stage 20-1.
  • the stage 20-1 is provided with a read portion 25-1 via a plate-shaped member 21-1.
  • FIG. 12 is a perspective view showing a schematic configuration of the read unit 25-1.
  • the bottom surface 41b and the top surface 41e of the trapezoidal recognition mark 41 are substantially parallel to the plate-shaped portion 25f.
  • the side surfaces 41c and 41d of the trapezoidal recognition mark 41 are inclined surfaces that are inclined with respect to the plate-shaped portion 25f.
  • the operation of the exposure apparatus 2 configured in this way will be described.
  • the following processing is mainly performed by the control unit 201a.
  • control unit 201a proceeds to the drawing process.
  • the control unit 201a places the mask 100 on the upper surface 20a of the stage 20, and after several hours have passed, the reading unit 60 reads the alignment mark 101 of the mask 100. Further, the control unit 201a reads the trapezoidal recognition mark 41 of the read unit 25 provided in the vicinity of the side 20b by the reading unit 60.
  • the control unit 201a detects the positions of the stage 20 and the mask 100 in the x-direction and the y-direction based on the reading results of the alignment mark 101 and the trapezoidal recognition mark 41.
  • only the trapezoidal recognition mark 41 is provided on the read unit 25-1, but only one trapezoidal recognition mark 41 is provided on the read unit 25-1, and the other recognition marks 25e are provided. It may be provided.
  • substantially horizontal is not limited to the case of being strictly horizontal, and is a concept including an error of, for example, several degrees.
  • approximately 10 ⁇ m is not limited to 10 ⁇ m, but is a concept including an error of, for example, about 1 to 3 ⁇ m.
  • parallel, orthogonal, etc. not only the case of strictly parallel, orthogonal, etc., but also the case of substantially parallel, substantially orthogonal, etc. is included.
  • the "neighborhood” means to include a region of a certain range (which can be arbitrarily determined) near the reference position.
  • a region of a certain range which can be arbitrarily determined
  • it is a concept indicating that it is a region in a certain range near A and may or may not include A.
  • Exposure device 11 Plate 11a: Top surface 12: Plate-shaped portion 12a: Top surface 13, 14: Rail 15: Frame body 15a: Support portion 15c: Pillar 20, 20-1: Stage 20a: Top surface 20b, 20c : Sides 21, 21-1: Plate-shaped members 25, 25-1: Read portions 25A, 25A-1, 25B, 25B-1: Ribs 25a, 25b: Base portion 25c: Adhesive portion 25d, 25f: Plate-shaped portion 25e: Recognition mark 30 (30a to 30g): Light irradiation unit 32a to 32g: Objective lens 33a to 33g: Light source unit 34a to 34g: AF processing unit 35a to 35g: Cylindrical portion 36a to 36g: Flange 37a to 37g: Mounting Parts 38a to 38g: Mounting part 39 (39a to 39g): Drive part 41: Trapezoidal recognition mark 41a: Projection part 41b: Bottom surface 41c, 41d: Side surface 41e: Top surface 50, 51: Laser interferometer

Abstract

The present invention can accommodate variations in a height direction due to various kinds of substrates with different thicknesses, assembly error, and the like without using a complicated mechanism.　On the upper surface of a stage on which a mask is mounted, a rib having a height that changes and provided along a first direction approximately along a horizontal plane is provided. On the upper surface on the reverse side of the bottom surface of the rib, a plurality of recognition marks are provided along the first direction.

Description

露光装置及び露光方法Exposure device and exposure method
　本発明は、露光装置及び露光方法に関する。 The present invention relates to an exposure apparatus and an exposure method.
　特許文献１には、ステージ上に配された基板に露光ヘッドによって画像を露光する露光装置において、アライメントマークと基準スケールとに基づいてアライメントセンサの校正を行う露光装置が開示されている。この露光装置では、基板が配される第１のステージと、基準スケールが固定される第２のステージとがそれぞれ独立に昇降自在である。 Patent Document 1 discloses an exposure device that calibrates an alignment sensor based on an alignment mark and a reference scale in an exposure device that exposes an image on a substrate arranged on a stage with an exposure head. In this exposure apparatus, the first stage on which the substrate is arranged and the second stage on which the reference scale is fixed can be raised and lowered independently.
特開２００６－３３７８７３号公報Japanese Unexamined Patent Publication No. 2006-337773
　特許文献１に記載の発明では、基準スケールの厚みと基板の厚みとが異なる場合、第２のステージを昇降させて基準スケールの高さを露光基準面の高さに一致させなければならず、装置の構造が複雑になるという問題がある。 In the invention described in Patent Document 1, when the thickness of the reference scale and the thickness of the substrate are different, the height of the reference scale must be made to match the height of the exposure reference plane by raising and lowering the second stage. There is a problem that the structure of the device becomes complicated.
　本発明はこのような事情に鑑みてなされたもので、複雑な機構を用いることなく、厚みの異なる様々な種類の基板や組み立て誤差等による高さ方向のばらつきに対応することができる露光装置及び露光装置を提供することを目的とする。 The present invention has been made in view of such circumstances, and an exposure apparatus capable of dealing with variations in the height direction due to various types of substrates having different thicknesses, assembly errors, etc., without using a complicated mechanism. It is an object of the present invention to provide an exposure apparatus.
　上記課題を解決するために、本発明に係る露光装置は、例えば、基板に対して露光を行う露光装置であって、略水平な載置面に前記基板が載置される略板状のステージと、前記ステージを水平面に略沿った第１方向に移動させる第１駆動部と、前記ステージの上方に設けられた光照射部と、前記光照射部に隣接して又は前記光照射部に設けられた読取部と、前記光照射部及び前記読取部を鉛直方向に移動させる第２駆動部と、前記載置面の前記第１方向と略直交する第２方向に沿った２つの辺のうちの少なくとも一方の近傍に設けられた被読取部であって、複数の認識マークを含む被読取部と、を備え、前記被読取部は、高さが変化するリブであって、前記第１方向に沿って設けられたリブを有し、前記リブの底面は前記載置面に設けられており、前記リブの前記底面と反対側の上面には、複数の前記認識マークが前記第１方向に沿って設けられていることを特徴とする。 In order to solve the above problems, the exposure apparatus according to the present invention is, for example, an exposure apparatus that exposes a substrate, and is a substantially plate-shaped stage on which the substrate is mounted on a substantially horizontal mounting surface. A first driving unit that moves the stage in a first direction substantially along a horizontal plane, a light irradiation unit provided above the stage, and a light irradiation unit adjacent to or in the light irradiation unit. Of the two sides of the reading unit, the light irradiation unit, the second driving unit that moves the reading unit in the vertical direction, and the second side of the above-mentioned mounting surface along the second direction substantially orthogonal to the first direction. A read portion provided in the vicinity of at least one of the above, including a read portion including a plurality of recognition marks, and the read portion is a rib whose height changes and is in the first direction. The bottom surface of the rib is provided on the above-described mounting surface, and a plurality of the recognition marks are formed on the upper surface of the rib opposite to the bottom surface in the first direction. It is characterized in that it is provided along the line.
　本発明に係る露光装置によれば、マスクが載置されるステージの上面には、高さが変化するリブであって、第１方向に沿ったリブが設けられており、リブの底面と反対側の上面には複数の認識マークが第１方向に沿って設けられている。これにより、マスクの厚みが異なる場合においても、１つの認識マークの高さをアライメントマークの高さと略一致させることができる。したがって、複雑な機構を用いることなく、様々な厚みの基板に対応することができる。また、組み立て誤差による読取部の高さ方向のばらつきに対応することができる。なお、リブの高さは徐々に変化してもよいし、リブが階段状であってもよい。 According to the exposure apparatus according to the present invention, the upper surface of the stage on which the mask is placed is a rib whose height changes, and a rib along the first direction is provided, which is opposite to the bottom surface of the rib. A plurality of recognition marks are provided on the upper surface of the side along the first direction. Thereby, even if the thickness of the mask is different, the height of one recognition mark can be substantially matched with the height of the alignment mark. Therefore, it is possible to deal with substrates of various thicknesses without using a complicated mechanism. In addition, it is possible to deal with variations in the height direction of the reading unit due to assembly errors. The height of the rib may be gradually changed, or the rib may be stepped.
　ここで、前記リブは、前記第２方向に沿って隣接して設けられた第１リブ及び第２リブを有し、前記第１リブの上面及び前記第２リブの上面は、傾きが略同じであり、前記第１リブの最も高い位置における高さと、前記第２リブの最も低い位置における高さとが略同じであってもよい。これにより、ステージの第１方向の長さを短くすることができる。なお、３本以上のリブは２本のリブ（第１リブ及び第２リブ）の組み合わせで考えることができる。 Here, the rib has a first rib and a second rib provided adjacent to each other along the second direction, and the upper surface of the first rib and the upper surface of the second rib have substantially the same inclination. The height of the first rib at the highest position and the height of the second rib at the lowest position may be substantially the same. As a result, the length of the stage in the first direction can be shortened. Note that three or more ribs can be considered as a combination of two ribs (first rib and second rib).
　ここで、前記第１駆動部は、前記ステージを前記第２方向に移動させ、前記光照射部は、前記第２方向に沿って隣接して設けられた第１光照射部と第２光照射部とを有し、前記読取部は、前記第１光照射部に隣接して又は前記第１光照射部に設けられた第１読取部と、前記第２光照射部に隣接して又は前記第２光照射部に設けられた第２読取部とを有し、前記被読取部は、前記第２方向の位置が前記第１読取部と前記第２読取部との間に位置してもよい。これにより、隣接する２つ読取部で同じ被読取部を読むことができる。その結果、読取部間の相対位置を測定し、光照射部が複数あるマルチヘッド露光機を用いて描画を行うことができる。なお、３つ以上の光照射部は２つの光照射部（第１光照射部及び第２光照射部）の組み合わせで考えることができ、３つ以上の読取部は２つの読取部（第１読取部及び第２読取部部）の組み合わせで考えることができる。 Here, the first driving unit moves the stage in the second direction, and the light irradiation unit is a first light irradiation unit and a second light irradiation unit provided adjacent to each other along the second direction. The reading unit has a unit, and the reading unit is adjacent to the first light irradiation unit or adjacent to the first light irradiation unit or provided in the first light irradiation unit and the second light irradiation unit. It has a second reading unit provided in the second light irradiation unit, and the reading unit may be positioned between the first reading unit and the second reading unit in the second direction. Good. As a result, the same read unit can be read by two adjacent reading units. As a result, the relative position between the reading units can be measured, and drawing can be performed using a multi-head exposure machine having a plurality of light irradiation units. In addition, three or more light irradiation units can be considered as a combination of two light irradiation units (first light irradiation unit and second light irradiation unit), and three or more reading units are two reading units (first). It can be considered by the combination of the reading unit and the second reading unit).
　ここで、前記被読取部は、前記ステージの前記第２方向に沿った２つの辺の近傍に設けられていてもよい。これにより、ステージが第１方向に沿って真っ直ぐに移動しているか、ステージが第２方向に湾曲しながら第１方向に移動しているか等を検知することができる。 Here, the read unit may be provided in the vicinity of two sides of the stage along the second direction. Thereby, it is possible to detect whether the stage is moving straight along the first direction, whether the stage is moving in the first direction while bending in the second direction, and the like.
　ここで、前記認識マークは、前記読取部の開口数に基づいた大きさで前記リブに設けられていてもよい。これにより、認識マークの大きさを、１つの認識マークにのみ焦点が合い、複数の認識マークに焦点が合わないような大きさにすることができる。 Here, the recognition mark may be provided on the rib in a size based on the numerical aperture of the reading unit. As a result, the size of the recognition mark can be set so that only one recognition mark is focused and a plurality of recognition marks are not focused.
　ここで、前記基板には、アライメントマークが設けられており、前記第１駆動部により前記ステージを前記第１方向に移動させて前記読取部の視野内に前記アライメントマークを配置し、前記第２駆動部により前記基板の高さに合わせて前記光照射部及び前記読取部を鉛直方向に移動して、前記読取部で前記アライメントマークを読み取り、かつ、前記第１駆動部により前記ステージを前記第１方向に移動させて前記読取部の視野内に前記認識マークを配置し、前記読取部で前記認識マークを読み取る処理と、前記アライメントマーク及び前記認識マークを読み取った結果に基づいて前記光照射部から前記基板に光を照射する描画処理と、を行う制御部を備えてもよい。これにより、時間の経過に伴って温度変化等によりステージや基板の高さが変化したとしても、読取部の高さをアライメントマークに合わせた状態でアライメントマークと認識マークを読み取ることができる。 Here, an alignment mark is provided on the substrate, and the stage is moved in the first direction by the first driving unit to arrange the alignment mark in the field of view of the reading unit, and the second The drive unit moves the light irradiation unit and the reading unit in the vertical direction according to the height of the substrate, the reading unit reads the alignment mark, and the first driving unit reads the stage. The recognition mark is placed in the field of view of the reading unit by moving in one direction, the recognition mark is read by the reading unit, and the light irradiation unit is based on the result of reading the alignment mark and the recognition mark. A control unit that performs drawing processing for irradiating the substrate with light may be provided. As a result, even if the height of the stage or the substrate changes due to a temperature change or the like with the passage of time, the alignment mark and the recognition mark can be read with the height of the reading unit aligned with the alignment mark.
　ここで、前記認識マークは、略５μｍ以上の厚みであり、略直交する４方向に突出する突起部を有する平面視略十字形状であり、前記突起部の断面形状は、前記リブ側が広く、前記リブの反対側が狭い略台形形状であり、前記突起部の両側の側面である第１側面及び第２側面は、前記上面に対して傾斜する傾斜面であり、前記第１側面の前記上面に対する傾斜角度の絶対値と、前記第２側面の前記上面に対する傾斜角度の絶対値との差が略１度以内であり、前記制御部は、前記読取部を鉛直方向に移動させながら前記認識マークを読み取ってもよい。これにより、読取部の高さに関わらず、読取部が台形型認識マークの中心を正しく読むことができる。その結果、読取部の光軸の傾きを検知し、高精度の描画が可能となる。 Here, the recognition mark has a thickness of about 5 μm or more, and has a substantially cross shape in a plan view having protrusions protruding in four directions substantially orthogonal to each other, and the cross-sectional shape of the protrusions is wide on the rib side, and the rib side is wide. The opposite side of the rib has a narrow substantially trapezoidal shape, and the first side surface and the second side surface, which are the side surfaces on both sides of the protrusion, are inclined surfaces inclined with respect to the upper surface, and the inclination of the first side surface with respect to the upper surface. The difference between the absolute value of the angle and the absolute value of the inclination angle of the second side surface with respect to the upper surface is within about 1 degree, and the control unit reads the recognition mark while moving the reading unit in the vertical direction. You may. As a result, the reading unit can correctly read the center of the trapezoidal recognition mark regardless of the height of the reading unit. As a result, the inclination of the optical axis of the reading unit is detected, and high-precision drawing becomes possible.
　ここで、前記ステージに着脱可能に設けられる略板状の交換式被読取部を備え、前記認識マークは、略数１０ｎｍから略１μｍの厚みであり、前記交換式被読取部には、略５μｍ以上の厚みであり、略直交する４方向に突出する突起部を有する平面視略十字形状の台形型認識マークが設けられており、前記突起部の断面形状は、前記交換式被読取部を前記載置面に載置したときに、前記ステージ側が広く、前記ステージの反対側が狭い略台形形状であり、前記突起部の両側の側面である第１側面及び第２側面は、前記交換式被読取部を前記載置面に載置したときに前記載置面に対して傾斜する傾斜面であり、前記第１側面の前記載置面に対する傾斜角度の絶対値と、前記第２側面の前記載置面に対する傾斜角度の絶対値との差が略１度以内であり、前記制御部は、前記読取部を鉛直方向に移動させながら前記台形型認識マークを読み取ってもよい。これにより、読取部の光軸の傾きを検知し、高精度の描画が可能となる。また、台形型認識マークを認識マークと別にして認識マークを薄くすることで、読取部が認識マークを正確に読み取ることができ、高精度の描画が可能となる。 Here, a substantially plate-shaped interchangeable read portion provided on the stage is provided, and the recognition mark has a thickness of about 10 nm to about 1 μm, and the replaceable read portion has a thickness of about 5 μm. A trapezoidal recognition mark having a thickness of the above and having protrusions protruding in four directions substantially orthogonal to each other is provided, and the cross-sectional shape of the protrusions is in front of the interchangeable read portion. When mounted on the mounting surface, the stage side is wide and the opposite side of the stage is narrow in a substantially trapezoidal shape, and the first side surface and the second side surface, which are the side surfaces on both sides of the protrusion, are the interchangeable read-reads. It is an inclined surface that is inclined with respect to the previously described mounting surface when the portion is placed on the previously described mounting surface, and the absolute value of the inclination angle with respect to the previously described mounting surface of the first side surface and the front description of the second side surface. The difference from the absolute value of the inclination angle with respect to the placement surface is within about 1 degree, and the control unit may read the trapezoidal recognition mark while moving the reading unit in the vertical direction. As a result, the inclination of the optical axis of the reading unit is detected, and high-precision drawing becomes possible. Further, by making the recognition mark thinner by separating the trapezoidal recognition mark from the recognition mark, the reading unit can accurately read the recognition mark, and high-precision drawing becomes possible.
　上記課題を解決するために、本発明に係る露光方法は、例えば、第１方向に沿って移動可能に設けられたステージの上方に設けられた光照射部を用いて基板に露光を行う露光方法であって、前記ステージの略水平な面に前記基板を載置するステップと、前記光照射部と、前記光照射部に隣接して又は前記光照射部に設けられた読取部とを前記基板の高さに合わせて鉛直方向に移動して、前記基板を前記読取部で読み取るステップと、前記ステージの前記第１方向と略直交する第２方向に沿った２つの辺のうちの少なくとも一方の近傍に設けられた被読取部であって、前記ステージに設けられた高さが変化するリブの上面に前記第１方向に沿って複数設けられている認識マークを前記読取部で読み取るステップと、前記基板の読取結果と、前記認識マークの読取結果とに基づいて、前記ステージを前記第１方向に移動させながら前記光照射部から前記基板に光を照射するステップと、含むことを特徴とする。これにより、複雑な機構を用いることなく、位置決め用の認識マークを様々な厚みの基板に対応させることができる。 In order to solve the above problems, the exposure method according to the present invention is, for example, an exposure method in which a substrate is exposed using a light irradiation unit provided above a stage movably provided along a first direction. The substrate is a step of placing the substrate on a substantially horizontal surface of the stage, a light irradiation unit, and a reading unit adjacent to the light irradiation unit or provided in the light irradiation unit. At least one of the step of reading the substrate by the reading unit by moving in the vertical direction according to the height of the stage and two sides along the second direction substantially orthogonal to the first direction of the stage. A step of reading a plurality of recognition marks provided in the vicinity along the first direction on the upper surface of a rib provided on the stage whose height changes, and a step of reading the recognition mark by the reading unit. Based on the reading result of the substrate and the reading result of the recognition mark, the step of irradiating the substrate with light from the light irradiation unit while moving the stage in the first direction is included. .. This makes it possible to make the recognition mark for positioning correspond to substrates of various thicknesses without using a complicated mechanism.
　ここで、前記基板を前記読取部で読み取るステップでは、前記基板に設けられたアライメントマークを前記読取部で読み取り、前記光照射部から前記基板に光を照射するステップでは、前記アライメントマークの読取結果と、前記認識マークの読取結果とに基づいて前記基板に光を照射してもよい。これにより、読取部の高さをアライメントマークに合わせた状態でアライメントマークと認識マークを読み取ることができる。 Here, in the step of reading the substrate by the reading unit, the alignment mark provided on the substrate is read by the reading unit, and in the step of irradiating the substrate with light from the light irradiation unit, the reading result of the alignment mark is obtained. The substrate may be irradiated with light based on the reading result of the recognition mark. As a result, the alignment mark and the recognition mark can be read with the height of the reading unit aligned with the alignment mark.
　ここで、前記ステージに前記基板を載置する前に行う校正ステップを有し、前記校正ステップは、前記読取部を前記ステージに近づける方向及び前記ステージから遠ざける方向に移動させながら、厚さが略５μｍ以上で平面視略十字形状の台形型認識マークであって、前記ステージ側が広く上面側が狭い略台形形状の断面形状を有する台形型認識マークを前記読取部で読み取るステップと、前記台形型認識マークの読取結果に基づいて前記読取部の光軸の傾きを検知するステップと、を含み、前記光照射部から前記基板に光を照射するステップでは、前記読取部の光軸の傾きに基づいて描画位置を調整してもよい。これにより、読取部の光軸の傾きを検知し、高精度の描画を行うことができる。 Here, there is a calibration step performed before mounting the substrate on the stage, and the calibration step has a substantially reduced thickness while moving the reading unit in a direction closer to the stage and a direction away from the stage. A step of reading a trapezoidal recognition mark having a substantially trapezoidal cross-sectional shape having a substantially trapezoidal cross-sectional shape with a wide stage side and a narrow upper surface side, which is 5 μm or more and having a substantially cross-shaped plan view, and the trapezoidal recognition mark In the step of irradiating the substrate with light from the light irradiation unit, including a step of detecting the inclination of the optical axis of the reading unit based on the reading result of the above, drawing is performed based on the inclination of the optical axis of the reading unit. The position may be adjusted. As a result, the inclination of the optical axis of the reading unit can be detected and high-precision drawing can be performed.
　本発明によれば、複雑な機構を用いることなく、厚みの異なる様々な種類の基板や組み立て誤差等による高さ方向のばらつきに対応することができる。 According to the present invention, it is possible to deal with variations in the height direction due to various types of substrates having different thicknesses, assembly errors, etc., without using a complicated mechanism.
第１の実施の形態に係る露光装置１の概略を示す斜視図である。It is a perspective view which shows the outline of the exposure apparatus 1 which concerns on 1st Embodiment. 露光装置１の概略を示す平面図である。It is a top view which shows the outline of the exposure apparatus 1. 被読取部２５の概略構成を示す斜視図である。It is a perspective view which shows the schematic structure of the read | read part 25. 枠体１５の支持部１５ａの概略を示す斜視図であり、背面側（＋ｘ側）から見た図である。It is a perspective view which shows the outline of the support part 15a of a frame body 15, and is the figure which was seen from the back side (+ x side). 光照射部３０ａの概略を示す要部透視図である。It is a main part perspective view which shows the outline of a light irradiation part 30a. 読取部６０ａの概略を示す斜視図であり、要部を透視した図である。It is a perspective view which shows the outline of the reading part 60a, and is the figure which see through the main part. 光照射部３０ａの取付構造を模式的に示す図である。It is a figure which shows typically the mounting structure of the light irradiation part 30a. 露光装置１の電気的な構成を示すブロック図である。It is a block diagram which shows the electrical structure of the exposure apparatus 1. 台形型認識マーク４１を示す図であり、（Ａ）は平面図であり、（Ｂ）は（Ａ）のＣ－Ｃ断面図である。It is a figure which shows the trapezoidal recognition mark 41, (A) is a plan view, (B) is a CC sectional view of (A). 読取部６０を上下動させたときの様子を示す図であり、（Ａ）は読取部６０の光軸が傾いていない場合であり、（Ｂ）は読取部６０の光軸が傾いている場合である。It is a figure which shows the state when the reading unit 60 is moved up and down, (A) is the case where the optical axis of the reading unit 60 is not tilted, (B) is the case where the optical axis of the reading unit 60 is tilted. Is. 読取部６０で被読取部２５を読み取るときの読取部６０の視野を模式的に示す図である。It is a figure which shows typically the field of view of the reading part 60 when the reading part 60 reads the read part 25. 被読取部２５－１の概略構成を示す斜視図である。It is a perspective view which shows the schematic structure of the read | read part 25-1.
　以下、本発明を、略水平方向に保持した感光性基板（例えば、ガラス基板）を走査方向に移動させながらレーザ等の光を照射してフォトマスクを生成する露光装置に適用した実施の形態を例に、図面を参照して詳細に説明する。各図面において、同一の要素には同一の符号が付されており、重複する部分については説明を省略する。 Hereinafter, embodiments of the present invention are applied to an exposure apparatus that generates a photomask by irradiating a photosensitive substrate (for example, a glass substrate) held in a substantially horizontal direction with light such as a laser while moving it in the scanning direction. An example will be described in detail with reference to the drawings. In each drawing, the same elements are designated by the same reference numerals, and the description of overlapping portions will be omitted.
　感光性基板としては、例えば、熱膨張率が非常に小さい（例えば、約５．５×１０－７／Ｋ程度）石英ガラスが用いられる。感光性基板は、様々な大きさのものがあり、４００ｍｍ×４００ｍｍ程度のものから、一辺が例えば１ｍを超える（例えば、１４００ｍｍ×１２２０ｍｍ）大型のものまである。また、感光性基板は、大きさに応じて厚みが異なり、例えば７．５ｍｍ～１６ｍｍである。 As the photosensitive substrate, for example, quartz glass having a very small coefficient of thermal expansion (for example, about 5.5 × 10-7 / K) is used. Photosensitive substrates come in various sizes, ranging from those having a size of about 400 mm × 400 mm to large ones having a side of more than 1 m (for example, 1400 mm × 1220 mm). The thickness of the photosensitive substrate varies depending on the size, and is, for example, 7.5 mm to 16 mm.
　露光装置により生成されるフォトマスクは、例えば液晶表示装置用の基板を製造するために用いられる露光用マスクである。フォトマスクは、略矩形形状の基板上に、１個または複数個のイメージデバイス用転写パターンが形成されたものである。以下、加工前、加工中及び加工後の感光性基板を包括してマスク１００という用語を使用する。 The photomask generated by the exposure device is, for example, an exposure mask used for manufacturing a substrate for a liquid crystal display device. A photomask is a photomask in which one or a plurality of transfer patterns for an image device are formed on a substantially rectangular substrate. Hereinafter, the term mask 100 is used to cover the photosensitive substrate before, during, and after processing.
　ただし、本発明の露光装置は、マスク製造装置に限定されない。本発明の露光装置は、略水平方向に保持した基板を走査方向に移動させながら光（レーザ、ＵＶ、偏光光等を含む）を照射する様々な装置を含む概念である。 However, the exposure apparatus of the present invention is not limited to the mask manufacturing apparatus. The exposure apparatus of the present invention is a concept including various devices that irradiate light (including laser, UV, polarized light, etc.) while moving a substrate held in a substantially horizontal direction in a scanning direction.
＜第１の実施の形態＞
　図１は、第１の実施の形態に係る露光装置１の概略を示す斜視図である。露光装置１は、主として、定盤１１と、板状部１２と、レール１３、１４と、枠体１５と、ステージ２０と、光照射部３０と、レーザ干渉計５０と、読取部６０と、を有する。なお、図１においては、一部の構成について図示を省略している。また、露光装置１は、装置全体を覆う図示しない温度調整部により、一定温度に保たれている。 <First Embodiment>
FIG. 1 is a perspective view showing an outline of the exposure apparatus 1 according to the first embodiment. The exposure device 1 mainly includes a surface plate 11, a plate-shaped portion 12, rails 13 and 14, a frame body 15, a stage 20, a light irradiation unit 30, a laser interference meter 50, and a reading unit 60. Has. In FIG. 1, some configurations are not shown. Further, the exposure apparatus 1 is maintained at a constant temperature by a temperature adjusting unit (not shown) that covers the entire apparatus.
　以下、水平面に略沿った方向をｘ方向及びｙ方向とし、ｘ方向及びｙ方向と略直交する方向（鉛直方向）をｚ方向とする。また、ｘ方向とｙ方向とは略直交する。 Hereinafter, the directions substantially along the horizontal plane are defined as the x direction and the y direction, and the directions substantially orthogonal to the x direction and the y direction (vertical direction) are defined as the z direction. Further, the x direction and the y direction are substantially orthogonal to each other.
　定盤１１は、略直方体形状（厚板状）の部材であり、例えば、石（例えば、花崗岩）や低膨張率の鋳物（例えば、ニッケル系の合金）で形成される。定盤１１は、上側（＋ｚ側）に略水平（ｘｙ平面と略平行）な上面１１ａを有する。 The surface plate 11 is a member having a substantially rectangular parallelepiped shape (thick plate shape), and is formed of, for example, a stone (for example, granite) or a casting having a low expansion coefficient (for example, a nickel-based alloy). The surface plate 11 has an upper surface 11a that is substantially horizontal (approximately parallel to the xy plane) on the upper side (+ z side).
　定盤１１は、設置面（例えば、床）上に載置された複数の除振台（図示せず）の上に載置される。これにより、定盤１１が除振台を介して設置面上に載置される。除振台はすでに公知であるため、詳細な説明を省略する。なお、除振台は必須ではない。定盤１１の＋ｘ側には、マスク１００をステージ２０に設置するローダ（図示せず）が設けられる。 The surface plate 11 is placed on a plurality of vibration isolation tables (not shown) placed on an installation surface (for example, a floor). As a result, the surface plate 11 is placed on the installation surface via the vibration isolation table. Since the vibration isolator is already known, detailed description thereof will be omitted. The vibration isolation table is not essential. A loader (not shown) for installing the mask 100 on the stage 20 is provided on the + x side of the surface plate 11.
　レール１３は、セラミック製の細長い板状の部材であり、定盤１１の上面１１ａに、長手方向がｘ方向に沿うように固定される。レール１３のローダ側（＋ｘ側）の、端が上面１１ａの端部に配置され、レール１３の反ローダ側（－ｘ側）は、端が上面１１ａの端部より内側に配置される。３本のレール１３は、高さ（ｚ方向の位置）が略同一であり、上面が高精度及び高平坦度で形成される。 The rail 13 is an elongated plate-shaped member made of ceramic, and is fixed to the upper surface 11a of the surface plate 11 so that the longitudinal direction is along the x direction. The end of the rail 13 on the loader side (+ x side) is arranged at the end of the upper surface 11a, and the end of the rail 13 on the opposite loader side (−x side) is arranged inside the end of the upper surface 11a. The heights (positions in the z direction) of the three rails 13 are substantially the same, and the upper surfaces thereof are formed with high accuracy and high flatness.
　板状部１２は、レール１３の上に載置される。板状部１２は、セラミック製の略板状の部材であり、全体として略矩形形状である。板状部１２の下面（－ｚ側の面）には、長手方向がｘ方向に沿うようにガイド部（図示せず）が設けられる。これにより、板状部１２がｘ方向以外に移動しないように板状部１２の移動方向が規制される。 The plate-shaped portion 12 is placed on the rail 13. The plate-shaped portion 12 is a substantially plate-shaped member made of ceramic, and has a substantially rectangular shape as a whole. A guide portion (not shown) is provided on the lower surface (the surface on the −z side) of the plate-shaped portion 12 so that the longitudinal direction is along the x direction. As a result, the moving direction of the plate-shaped portion 12 is restricted so that the plate-shaped portion 12 does not move in any direction other than the x direction.
　板状部１２の上面１２ａには、レール１４が設けられる。レール１４は、長手方向がｙ方向に沿うように固定される。レール１４は、高さが略同一であり、上面が高精度及び高平坦度で形成される。 A rail 14 is provided on the upper surface 12a of the plate-shaped portion 12. The rail 14 is fixed so that the longitudinal direction is along the y direction. The rails 14 have substantially the same height, and the upper surface is formed with high precision and high flatness.
　レール１４の上には、ステージ２０が載置される。言い換えれば、ステージ２０は、板状部１２及びレール１３、１４を介して上面１１ａに設けられる。 The stage 20 is placed on the rail 14. In other words, the stage 20 is provided on the upper surface 11a via the plate-shaped portion 12 and the rails 13 and 14.
　ステージ２０は、平面視略矩形形状の略板状であり、熱膨張係数が略０．５～１×１０－７／Ｋの低膨張性セラミックや熱膨張係数が略５×１０－８／Ｋの超低膨張性ガラスセラミックを用いて形成される。これにより、ステージ２０の変形を防止することができる。なお、ステージ２０をマスク１００と同様に伸び縮みする材料で形成してもよい。 The stage 20 has a substantially rectangular plate shape in a plan view, and has a low expansion ceramic having a coefficient of thermal expansion of about 0.5 to 1 × 10-7 / K and a coefficient of thermal expansion of about 5 × 10-8 / K. It is formed using the ultra-low expansion glass ceramic of. This makes it possible to prevent the stage 20 from being deformed. The stage 20 may be formed of a material that expands and contracts like the mask 100.
　ステージ２０の下面には、長手方向がｙ方向に沿うようにガイド部（図示せず）が設けられる。これにより、ステージ２０、すなわち板状部１２がｙ方向以外に移動しないようにステージ２０の移動方向が規制される。このように、ステージ２０（板状部１２）は、レール１３に沿ってｘ方向に移動可能に設けられ、ステージ２０は、レール１４に沿ってｙ方向に移動可能に設けられる。 A guide portion (not shown) is provided on the lower surface of the stage 20 so that the longitudinal direction is along the y direction. As a result, the moving direction of the stage 20 is restricted so that the stage 20, that is, the plate-shaped portion 12 does not move in any direction other than the y direction. As described above, the stage 20 (plate-shaped portion 12) is provided so as to be movable in the x direction along the rail 13, and the stage 20 is provided so as to be movable in the y direction along the rail 14.
　ステージ２０は、上面１１ａと対向する面と反対側の面である略水平な上面２０ａを有する。上面２０ａは、複数のアライメントマーク１０１が設けられたマスク１００（図２参照）が載置される載置面である。また、上面２０ａには、被読取部２５（図２参照、後に詳述）が設けられている。アライメントマーク１０１及び被読取部２５は、読取部６０によって読み取られ、ステージ２０すなわちマスク１００の位置決めが行われる（後に詳述）。 The stage 20 has a substantially horizontal upper surface 20a which is a surface opposite to the surface facing the upper surface 11a. The upper surface 20a is a mounting surface on which a mask 100 (see FIG. 2) provided with a plurality of alignment marks 101 is mounted. Further, a read portion 25 (see FIG. 2, detailed later) is provided on the upper surface 20a. The alignment mark 101 and the read unit 25 are read by the reading unit 60, and the stage 20, that is, the mask 100 is positioned (detailed later).
　なお、ステージ２０は、ｘ方向及びｙ方向のみでなく、ｚ方向にも移動可能に構成されていてもよい。 Note that the stage 20 may be configured to be movable not only in the x direction and the y direction but also in the z direction.
　露光装置１は、駆動部８１、８２（図１では図示せず、図８参照）を有する。駆動部８１、８２は、例えばリニアモータである。駆動部８１はステージ２０（板状部１２）をレール１３に沿ってｘ方向に移動させ、駆動部８２はステージ２０をレール１４に沿ってｙ方向に移動させる。駆動部８１、８２が板状部１２やステージ２０を移動させる方法は、既に公知の様々な方法を用いることができる。 The exposure device 1 has drive units 81 and 82 (not shown in FIG. 1, see FIG. 8). The drive units 81 and 82 are, for example, linear motors. The drive unit 81 moves the stage 20 (plate-shaped portion 12) in the x direction along the rail 13, and the drive unit 82 moves the stage 20 in the y direction along the rail 14. As a method for the drive units 81 and 82 to move the plate-shaped portion 12 and the stage 20, various already known methods can be used.
　また、露光装置１は、ステージ２０の位置を測定するレーザ干渉計５０を有する。レーザ干渉計５０は、枠体１５の－ｙ側に設けられた柱に設けられたレーザ干渉計５１と、定盤１１の＋ｘ側の側面に設けられたレーザ干渉計（図示省略）を有する。レーザ干渉計５０を用いてステージ２０の位置を測定する方法は、既に公知の様々な方法を用いることができる。 Further, the exposure device 1 has a laser interferometer 50 that measures the position of the stage 20. The laser interference meter 50 includes a laser interference meter 51 provided on a pillar provided on the −y side of the frame body 15 and a laser interference meter (not shown) provided on the + x side side surface of the surface plate 11. As a method for measuring the position of the stage 20 using the laser interferometer 50, various already known methods can be used.
　定盤１１には、枠体１５が設けられる。枠体１５には、例えば低膨張率の鋳物（例えば、ニッケル系の合金）が用いられる。枠体１５は、支持部１５ａと、支持部１５ａを両端で支える２本の柱１５ｃと、を有する。枠体１５は、ステージ２０の上方（＋ｚ方向）に光照射部３０を保持する。支持部１５ａには、光照射部３０が取り付けられる。枠体１５については後に詳述する。 A frame body 15 is provided on the surface plate 11. For the frame body 15, for example, a casting having a low expansion coefficient (for example, a nickel-based alloy) is used. The frame body 15 has a support portion 15a and two pillars 15c that support the support portion 15a at both ends. The frame body 15 holds the light irradiation unit 30 above the stage 20 (+ z direction). A light irradiation unit 30 is attached to the support portion 15a. The frame body 15 will be described in detail later.
　光照射部３０は、マスク１００に光（本実施の形態では、レーザ光）を照射する。光照射部３０は、ｙ方向に沿って一定間隔（例えば、略２００ｍｍおき）で設けられる。本実施の形態では、７個の光照射部３０ａ、光照射部３０ｂ、光照射部３０ｃ、光照射部３０ｄ、光照射部３０ｅ、光照射部３０ｆ、光照射部３０ｇを有する。移動機構１６１（図４参照）は、光照射部３０ａ～３０ｇの焦点位置がマスク１００の上面に合うように、光照射部３０ａ～３０ｇ全体を１０ｍｍ程度の範囲でｚ方向に移動させる。また、駆動部３９（３９ａ～３９ｇ、後に詳述）は、光照射部３０ａ～３０ｇの焦点位置の微調整のため、光照射部３０ａ～３０ｇを３０μｍ（マイクロメートル）程度の範囲でｚ方向に微動させる。光照射部３０については後に詳述する。 The light irradiation unit 30 irradiates the mask 100 with light (laser light in the present embodiment). The light irradiation units 30 are provided at regular intervals (for example, approximately every 200 mm) along the y direction. In the present embodiment, it has seven light irradiation units 30a, a light irradiation unit 30b, a light irradiation unit 30c, a light irradiation unit 30d, a light irradiation unit 30e, a light irradiation unit 30f, and a light irradiation unit 30g. The moving mechanism 161 (see FIG. 4) moves the entire light irradiation unit 30a to 30g in the z direction within a range of about 10 mm so that the focal position of the light irradiation unit 30a to 30g matches the upper surface of the mask 100. Further, the driving unit 39 (39a to 39g, which will be described in detail later) sets the light irradiation unit 30a to 30g in the z direction in a range of about 30 μm (micrometer) in order to finely adjust the focal position of the light irradiation unit 30a to 30g. Make a slight movement. The light irradiation unit 30 will be described in detail later.
　読取部６０は、マスク１００に形成されたアライメントマーク１０１（図２参照）や認識マーク２５ｅ（図３参照）を読み取る。アライメントマーク１０１及び認識マーク２５ｅは、マスク１００の位置決め（キャリブレーション、アライメント等）に用いられるマークである。読取部６０は、７個の読取部６０ａ、読取部６０ｂ、読取部６０ｃ、読取部６０ｄ、読取部６０ｅ、読取部６０ｆ、読取部６０ｇを有する。読取部６０ａ～６０ｇは、それぞれ光照射部３０ａ～３０ｇに隣接するように、光照射部３０ａ～３０ｇに設けられる。なお、読取部６０ａ～６０ｇは、それぞれ光照射部３０ａ～３０ｇに設けられていてもよい。本実施の形態では、読取部６０として、倍率が略５０倍、焦点深度が１μｍ以下の顕微鏡を用いる。読取部６０については後に詳述する。 The reading unit 60 reads the alignment mark 101 (see FIG. 2) and the recognition mark 25e (see FIG. 3) formed on the mask 100. The alignment mark 101 and the recognition mark 25e are marks used for positioning (calibration, alignment, etc.) of the mask 100. The reading unit 60 includes seven reading units 60a, a reading unit 60b, a reading unit 60c, a reading unit 60d, a reading unit 60e, a reading unit 60f, and a reading unit 60g. The reading units 60a to 60g are provided in the light irradiation units 30a to 30g so as to be adjacent to the light irradiation units 30a to 30g, respectively. The reading units 60a to 60g may be provided in the light irradiation units 30a to 30g, respectively. In the present embodiment, a microscope having a magnification of about 50 times and a depth of focus of 1 μm or less is used as the reading unit 60. The reading unit 60 will be described in detail later.
　次に、被読取部２５について説明する。図２は、露光装置１の概略を示す平面図である。図２では、主要構成のみ図示し、その他の構成については図示を省略している。 Next, the read unit 25 will be described. FIG. 2 is a plan view showing an outline of the exposure apparatus 1. In FIG. 2, only the main configuration is shown, and the other configurations are omitted.
　被読取部２５は、ステージ２０の平面視において略平行な２つの辺２０ｂ、２０ｃの近傍に設けられている。辺２０ｂ、２０ｃは、ｙ方向に沿っている。被読取部２５は、辺２０ｂ、２０ｃに沿って複数設けられている。 The read unit 25 is provided in the vicinity of two sides 20b and 20c that are substantially parallel in the plan view of the stage 20. The sides 20b and 20c are along the y direction. A plurality of read portions 25 are provided along the sides 20b and 20c.
　被読取部２５は、ｙ方向に隣接する２つの読取部６０ａ～６０ｇの間に配置されている。なお、２つの読取部６０ａ～６０ｇの間に設けられる被読取部２５の数は限定されず、２つの読取部６０ａ～６０ｇの間に被読取部２５が少なくとも１つ設けれていればよい。図２に示す例では、読取部６０ａと読取部６０ｂとの間、読取部６０ｂと読取部６０ｃとの間、及び読取部６０ｄと読取部６０ｅとの間には１つの被読取部２５が設けられており、読取部６０ｃと読取部６０ｄとの間、及び読取部６０ｅと読取部６０ｆとの間には２つの被読取部２５が設けられている。 The read unit 25 is arranged between two reading units 60a to 60g adjacent to each other in the y direction. The number of read units 25 provided between the two reading units 60a to 60g is not limited, and at least one read unit 25 may be provided between the two reading units 60a to 60g. In the example shown in FIG. 2, one read unit 25 is provided between the reading unit 60a and the reading unit 60b, between the reading unit 60b and the reading unit 60c, and between the reading unit 60d and the reading unit 60e. Two read units 25 are provided between the reading unit 60c and the reading unit 60d, and between the reading unit 60e and the reading unit 60f.
　被読取部２５をｙ方向に隣接する２つの読取部６０の間に配置することで、隣接する２つ読取部６０（例えば、読取部６０ａと読取部６０ｂ）で同じ被読取部２５を読むことができる。光照射部３０が複数あるマルチヘッド露光機を用いて描画を行うときには読取部６０間の相対位置を測る必要があり、被読取部２５をｙ方向に隣接する２つの読取部６０の間に配置することは描画のための必須の構成である。 By arranging the read unit 25 between two adjacent reading units 60 in the y direction, the same read unit 25 can be read by two adjacent reading units 60 (for example, the reading unit 60a and the reading unit 60b). Can be done. When drawing with a multi-head exposure machine having a plurality of light irradiation units 30, it is necessary to measure the relative position between the reading units 60, and the read unit 25 is arranged between two reading units 60 adjacent to each other in the y direction. What to do is an essential configuration for drawing.
　また、被読取部２５は、読取部６０ａ～６０ｇとｘ方向の位置が同じであってもよい。図２に示す例では、読取部６０ｂのｘ方向の位置と被読取部２５のｘ方向の位置とが略同じである。 Further, the read unit 25 may have the same position in the x direction as the reading units 60a to 60g. In the example shown in FIG. 2, the position of the reading unit 60b in the x direction and the position of the read unit 25 in the x direction are substantially the same.
　図３は、被読取部２５の概略構成を示す斜視図である。被読取部２５は板状部材２１を介してステージ２０に設けられているが、板状部材２１は必須ではない。ステージ２０の上面２０ａは、板状部材２１の上面を含むものとする。 FIG. 3 is a perspective view showing a schematic configuration of the read unit 25. The read portion 25 is provided on the stage 20 via the plate-shaped member 21, but the plate-shaped member 21 is not essential. The upper surface 20a of the stage 20 includes the upper surface of the plate-shaped member 21.
　被読取部２５は、主として、リブ２５Ａ、２５Ｂを有する。リブ２５Ａ、２５Ｂは、それぞれ、高さが徐々に変化するリブであり、ｘ方向に沿って設けられている。なお、本実施の形態では、リブ２５Ａ、２５Ｂは、－ｘ側の端が高く、＋ｘ側の端が低くなるように高さが徐々に変化しているが、－ｘ側の端が低く、＋ｘ側の端が高くなってもよい。 The read unit 25 mainly has ribs 25A and 25B. The ribs 25A and 25B are ribs whose heights gradually change, and are provided along the x direction. In the present embodiment, the heights of the ribs 25A and 25B are gradually changed so that the end on the −x side is high and the end on the + x side is low, but the end on the −x side is low. The edge on the + x side may be higher.
　リブ２５Ａ、２５Ｂは、ｙ方向に沿って隣接して設けられている。リブ２５Ａ、２５Ｂの底面は、上面２０ａに設けられている。 The ribs 25A and 25B are provided adjacent to each other along the y direction. The bottom surfaces of the ribs 25A and 25B are provided on the upper surface 20a.
　リブ２５Ａ、２５Ｂは、それぞれ、ガラス等の透明部材で形成された土台部２５ａ、２５ｂと、複数の認識マーク２５ｅが形成された板状部２５ｄと、を有する。板状部２５ｄでは、リブ２５Ａ、２５Ｂの上面（底面と反対側の面）である。板状部２５ｄは、土台部２５ａ、２５ｂの上側（＋ｚ側）に、接着部２５ｃにより貼着又は接着されている。 The ribs 25A and 25B each have a base portion 25a and 25b formed of a transparent member such as glass, and a plate-shaped portion 25d formed with a plurality of recognition marks 25e, respectively. In the plate-shaped portion 25d, it is the upper surface (the surface opposite to the bottom surface) of the ribs 25A and 25B. The plate-shaped portion 25d is attached or adhered to the upper side (+ z side) of the base portions 25a and 25b by the adhesive portion 25c.
　板状部２５ｄは、ガラス等の透明部材で形成されており、上面（＋ｚ側の面）には複数の認識マーク２５ｅがｘ方向に沿って設けられている。認識マーク２５ｅは、金属製の薄膜であり、平面視略十字形状である。認識マーク２５ｅの高さ（厚さ）は、一般的には略数１０ｎｍ～略１００ｎｍであるが、略１０ｎｍ～略１μｍであればよい。また、認識マーク２５ｅの高さは、略１０ｎｍ～略３００ｎｍであることが好ましく、略１００ｎｍ～略２００ｎｍであることがさらに好ましい。 The plate-shaped portion 25d is formed of a transparent member such as glass, and a plurality of recognition marks 25e are provided along the x direction on the upper surface (the surface on the + z side). The recognition mark 25e is a thin film made of metal and has a substantially cross shape in a plan view. The height (thickness) of the recognition mark 25e is generally about 10 nm to about 100 nm, but may be about 10 nm to about 1 μm. The height of the recognition mark 25e is preferably about 10 nm to about 300 nm, and more preferably about 100 nm to about 200 nm.
　認識マーク２５ｅは、リブ２５Ａ、２５Ｂにそれぞれ１列ずつ設けられていてもよいし、複数列ずつ設けられていてもよい。リブ２５Ａ、２５Ｂのそれぞれに認識マーク２５ｅが複数列設けられてる場合には、認識マーク２５ｅが千鳥配置されていることが望ましい。 The recognition marks 25e may be provided in one row each on the ribs 25A and 25B, or may be provided in a plurality of rows. When a plurality of rows of recognition marks 25e are provided on each of the ribs 25A and 25B, it is desirable that the recognition marks 25e are staggered.
　リブ２５Ａに設けられた板状部２５ｄの傾きと、リブ２５Ｂに設けられた板状部２５ｄの傾きとは略同一である。リブ２５Ａの最も高い位置（－ｘ側の端）における高さと、リブ２５Ｂの最も低い位置（＋ｘ側の端）における高さとが略同じである。これにより、認識マーク２５ｅを異なる高さに配置しつつ、認識マーク２５ｅの高さの差を連続させることができる。 The inclination of the plate-shaped portion 25d provided on the rib 25A and the inclination of the plate-shaped portion 25d provided on the rib 25B are substantially the same. The height of the rib 25A at the highest position (the end on the −x side) and the height of the rib 25B at the lowest position (the end on the + x side) are substantially the same. As a result, the difference in height of the recognition marks 25e can be made continuous while the recognition marks 25e are arranged at different heights.
　リブ２５Ａ、２５Ｂの板状部２５ｄの傾き（傾斜角度）は、ステージ２０に載置されるマスク１００の厚みや読取部６０の特性に基づいた大きさに基づいて決定される。ここで、読取部６０の特性とは、開口数（ＮＡ）、視野（ＦＯＶ）、焦点深度（ＤＯＦ）等を含む。本実施の形態では、ステージ２０に様々な厚み（７．５ｍｍ～１６ｍｍ程度）のマスク１００が載置されるため、リブ２５Ａの最も低い位置（＋ｘ側の端）における高さと、リブ２５Ｂの最も高い位置（－ｘ側の端）における高さとの差を、ステージ２０に載置され得るマスク１００の厚みの最大値と最小値との差以上とする。例えば、ステージ２０に略８ｍｍ（最小値）～略１６ｍｍ（最大値）のマスク１００が載置される場合には、ステージ２０に載置されるマスク１００の厚みの最大値と最小値との差が略８ｍｍであり、リブ２５Ａ、２５Ｂの長さが２００ｍｍであるとすると、リブ２５Ａ、２５Ｂの板状部２５ｄの傾きは４／１００ｍｍである。 The inclination (inclination angle) of the plate-shaped portions 25d of the ribs 25A and 25B is determined based on the thickness of the mask 100 placed on the stage 20 and the size based on the characteristics of the reading portion 60. Here, the characteristics of the reading unit 60 include the numerical aperture (NA), the field of view (FOV), the depth of focus (DOF), and the like. In the present embodiment, since the mask 100 having various thicknesses (about 7.5 mm to 16 mm) is placed on the stage 20, the height at the lowest position (+ x side end) of the rib 25A and the highest of the rib 25B The difference from the height at the high position (the end on the −x side) is equal to or greater than the difference between the maximum value and the minimum value of the thickness of the mask 100 that can be placed on the stage 20. For example, when a mask 100 of about 8 mm (minimum value) to about 16 mm (maximum value) is placed on the stage 20, the difference between the maximum value and the minimum value of the thickness of the mask 100 placed on the stage 20. Is approximately 8 mm, and the lengths of the ribs 25A and 25B are 200 mm, the inclination of the plate-shaped portions 25d of the ribs 25A and 25B is 4/100 mm.
　また、認識マーク２５ｅは、リブ２５Ａ、２５Ｂの板状部２５ｄの傾きや読取部６０の特性に基づいた大きさで設けられる。本実施の形態では、認識マーク２５ｅの大きさは、読取部６０の視野に複数の認識マーク２５ｅが含まれ、そのうちの１つの認識マーク２５ｅに焦点が合うような（２つ以上の認識マーク２５ｅに焦点が合わないような）大きさである。 Further, the recognition mark 25e is provided with a size based on the inclination of the plate-shaped portions 25d of the ribs 25A and 25B and the characteristics of the reading portion 60. In the present embodiment, the size of the recognition mark 25e is such that a plurality of recognition marks 25e are included in the field of view of the reading unit 60, and one of the recognition marks 25e is focused (two or more recognition marks 25e). It is a size (so that it is out of focus).
　次に、枠体１５について説明する。図４は、枠体１５の支持部１５ａの概略を示す斜視図であり、背面側（＋ｘ側）から見た図である。図４は、説明のため、支持部１５ａと柱１５ｃとを少し離して図示しているが、実際は支持部１５ａと柱１５ｃとは隣接している。 Next, the frame body 15 will be described. FIG. 4 is a perspective view showing an outline of the support portion 15a of the frame body 15, and is a view seen from the back surface side (+ x side). In FIG. 4, the support portion 15a and the pillar 15c are shown slightly separated for the sake of explanation, but the support portion 15a and the pillar 15c are actually adjacent to each other.
　支持部１５ａは、断面形状が略矩形形状の略棒状であり、内部は空洞である。支持部１５ａは、長手方向がｙ方向に沿うように設けられる。支持部１５ａは、主として、底板１５１と、支持板１５３と、底板１５１及び支持板１５３の両側に設けられた側板１５２、１５４と、仕切り壁１５９とを有する。底板１５１及び支持板１５３は略水平に設けられ、側板１５２、１５４は略鉛直に設けられる。板状の仕切り壁１５９は、支持部１５ａの内部の補強であり、仕切り壁１５９が設けられた位置においては支持部１５ａの振動や変形（撓み、捩れ等）が防止される。 The support portion 15a has a substantially rectangular cross-sectional shape and a substantially rod shape, and the inside is hollow. The support portion 15a is provided so that the longitudinal direction is along the y direction. The support portion 15a mainly has a bottom plate 151, a support plate 153, side plates 152 and 154 provided on both sides of the bottom plate 151 and the support plate 153, and a partition wall 159. The bottom plate 151 and the support plate 153 are provided substantially horizontally, and the side plates 152 and 154 are provided substantially vertically. The plate-shaped partition wall 159 is an internal reinforcement of the support portion 15a, and vibration and deformation (bending, twisting, etc.) of the support portion 15a are prevented at the position where the partition wall 159 is provided.
　底板１５１及び支持板１５３には、それぞれ、ｙ方向に沿って丸孔１５５ａ～１５５ｇ、１５６ａ～１５６ｇが形成される。丸孔１５５ａ～１５５ｇ、１５６ａ～１５６ｇは、それぞれ底板１５１及び支持板１５３を略鉛直方向に貫通する孔であり、平面視略円形である。平面視において、丸孔１５５ａ～１５５ｇの中心の位置と、丸孔１５６ａ～１５６ｇの中心の位置とは略一致する。 Round holes 155a to 155g and 156a to 156g are formed on the bottom plate 151 and the support plate 153, respectively, along the y direction. The round holes 155a to 155g and 156a to 156g are holes that penetrate the bottom plate 151 and the support plate 153 in the substantially vertical direction, respectively, and are substantially circular in plan view. In a plan view, the position of the center of the round holes 155a to 155g and the position of the center of the round holes 156a to 156g are substantially the same.
　丸孔１５５ａ～１５５ｇ、１５６ａ～１５６ｇには、それぞれ、丸孔１５５ａ～１５５ｇ、１５６ａ～１５６ｇを覆うように設けられたガイド部材７０、７０Ａ（後に詳述）を介して、光照射部３０ａ～３０ｇが取り付けられる。ガイド部材７０と丸孔１５５ａ～１５５ｇとは略同心円状に配置され、ガイド部材７０Ａと丸孔１５６ａ～１５６ｇとは略同心円状に配置される。また、ガイド部材７０、７０Ａと光照射部３０ａ～３０ｇとは略同心円状に配置される。光照射部３０ａ～３０ｇを枠体１５に取り付ける取付構造については後に詳述する。 The round holes 155a to 155g and 156a to 156g are provided with guide members 70 and 70A (described in detail later) so as to cover the round holes 155a to 155g and 156a to 156g, respectively, and the light irradiation portions 30a to 30g. Is attached. The guide member 70 and the round holes 155a to 155g are arranged substantially concentrically, and the guide member 70A and the round holes 156a to 156g are arranged substantially concentrically. Further, the guide members 70 and 70A and the light irradiation portions 30a to 30g are arranged substantially concentrically. The mounting structure for mounting the light irradiation portions 30a to 30g to the frame body 15 will be described in detail later.
　また、底板１５１には、丸孔１５５ａ～１５５ｇに隣接して丸孔１５７ａ～１５７ｇが形成される。丸孔１５７ａ～１５７ｇには、読取部６０の鏡筒６０１（後に詳述）が挿入される。 Further, in the bottom plate 151, round holes 157a to 157 g are formed adjacent to the round holes 155a to 155 g. The lens barrel 601 (detailed later) of the reading unit 60 is inserted into the round holes 157a to 157g.
　側板１５２、１５４には、それぞれ、鋳造時に鋳砂を排出して内部空間を形成するための鋳抜き穴として用いられる孔が形成される。これらの孔は、丸孔１５７ａ～１５７ｇへ読取部６０を取り付けるのに用いられる。 The side plates 152 and 154 are each formed with holes used as cast holes for discharging casting sand during casting to form an internal space. These holes are used to attach the reading unit 60 to the round holes 157a to 157g.
　枠体１５は、支持部１５ａを柱１５ｃに沿ってｚ方向に移動させる移動機構１６１を有する。移動機構１６１は、支持部１５ａをｚ方向に１０ｍｍ程度の範囲で移動させる。例えば、移動機構１６１として、ラック１６１ａ、ピニオン１６１ｂ及びピニオン１６１ｂを回転駆動するアクチュエータ１６１ｃ（図８参照）を用いることができる。 The frame body 15 has a moving mechanism 161 that moves the support portion 15a along the pillar 15c in the z direction. The moving mechanism 161 moves the support portion 15a in the z direction within a range of about 10 mm. For example, as the moving mechanism 161, an actuator 161c (see FIG. 8) that rotationally drives the rack 161a, the pinion 161b, and the pinion 161b can be used.
　また枠体１５は、柱１５ｃに設けられた２つの永電磁石１６３を有する。永電磁石１６３は、永久磁石と電磁石とを有する永電磁式であり、着脱時のみ電磁石のコイルに電流を流し、内蔵されている永久磁石のＯＮ－ＯＦＦを行う。永電磁石１６３は、電磁石のコイルに電流を流すことで支持部１５ａを吸着する。 Further, the frame body 15 has two permanent electromagnets 163 provided on the pillar 15c. The permanent magnet 163 is a permanent electromagnetic type having a permanent magnet and an electromagnet, and a current is passed through the coil of the electromagnet only at the time of attachment / detachment to turn on / off the built-in permanent magnet. The permanent electromagnet 163 attracts the support portion 15a by passing an electric current through the coil of the electromagnet.
　支持部１５ａの端には、柱１５ｃに沿って弾性部材１６０が設けられている。図４では、－ｙ側の端に設けられた弾性部材１６０についてのみ表示し、＋ｙ側の端に設けられた弾性部材１６０については図示を省略している。弾性部材１６０は、支持部１５ａの下側に設けられており、支持部１５ａの上下動にともなって弾性部材１６０が伸縮可能となる。このように、支持部１５ａの両端に設けられた弾性部材１６０が支持部１５ａの重さを支える。 An elastic member 160 is provided at the end of the support portion 15a along the pillar 15c. In FIG. 4, only the elastic member 160 provided at the end on the −y side is displayed, and the elastic member 160 provided at the end on the + y side is not shown. The elastic member 160 is provided on the lower side of the support portion 15a, and the elastic member 160 can be expanded and contracted as the support portion 15a moves up and down. In this way, the elastic members 160 provided at both ends of the support portion 15a support the weight of the support portion 15a.
　次に、光照射部３０について説明する。図５は、光照射部３０ａの概略を示す要部透視図である。光照射部３０ａは、主として、ＤＭＤ３１ａと、対物レンズ３２ａと、光源部３３ａと、ＡＦ処理部３４ａと、筒状部３５ａと、フランジ３６ａと、取付部３７ａ、３８ａと、駆動部３９ａと、を有する。光照射部３０ｂ～光照射部３０ｇは、それぞれＤＭＤ３１ｂ～３１ｇと、対物レンズ３２ｂ～３２ｇと、光源部３３ｂ～３３ｇと、ＡＦ処理部３４ｂ～３４ｇと、筒状部３５ｂ～３５ｇと、フランジ３６ｂ～３６ｇと、取付部３７ｂ～３７ｇ、３８ｂ～３８ｇと、駆動部３９ｂ～３９ｇとを有する。光照射部３０ｂ～光照射部３０ｇは、光照射部３０ａと同一の構成であるため説明を省略する。 Next, the light irradiation unit 30 will be described. FIG. 5 is a perspective view of a main part showing an outline of the light irradiation unit 30a. The light irradiation unit 30a mainly includes a DMD 31a, an objective lens 32a, a light source unit 33a, an AF processing unit 34a, a tubular portion 35a, a flange 36a, mounting portions 37a and 38a, and a driving unit 39a. Have. The light irradiation units 30b to 30g are DMD 31b to 31g, objective lenses 32b to 32g, light source units 33b to 33g, AF processing units 34b to 34g, tubular portions 35b to 35g, and flanges 36b to, respectively. It has 36 g, mounting portions 37b to 37 g, 38b to 38 g, and a driving portion 39b to 39 g. Since the light irradiation unit 30b to the light irradiation unit 30g have the same configuration as the light irradiation unit 30a, the description thereof will be omitted.
　ＤＭＤ３１ａは、デジタルミラーデバイス（Ｄｉｇｉｔａｌ　Ｍｉｒｒｏｒ　Ｄｅｖｉｃｅ、ＤＭＤ）であり、面状のレーザ光が照射可能である。ＤＭＤ３１ａは、多数の可動式のマイクロミラー（図示省略）を有し、１枚のマイクロミラーから１画素分の光が照射される。マイクロミラーは、大きさが略１０μｍであり、２次元状に配置されている。ＤＭＤ３１ａには光源部３３ａから光が照射され、光は各マイクロミラーで反射される。マイクロミラーは、その対角線と略平行な軸を中心に回転可能であり、ＯＮ（マスク１００に向けて光を反射させる）とＯＦＦ（マスク１００に向けて光を反射させない）との切り替えが可能である。ＤＭＤ３１ａはすでに公知であるため、詳細な説明を省略する。なお、基板に結像させる像を形成するデバイスは、ＤＭＤ３１ａに限られず、ＤＭＤ３１ａ以外の２次元光空間変調器や１次元光空間変調器、例えばＧＬＶを用いてもよい。また、ＤＭＤ３１ａに代えて、ＬＣＤやフォトマスクを用いてもよい。 The DMD31a is a digital mirror device (DMD), and can be irradiated with a planar laser beam. The DMD31a has a large number of movable micromirrors (not shown), and one pixel of light is emitted from one micromirror. The micromirror has a size of about 10 μm and is arranged two-dimensionally. The DMD 31a is irradiated with light from the light source unit 33a, and the light is reflected by each micromirror. The micromirror can rotate around an axis substantially parallel to its diagonal line, and can be switched between ON (reflecting light toward mask 100) and OFF (does not reflect light toward mask 100). is there. Since DMD31a is already known, detailed description thereof will be omitted. The device that forms the image to be imaged on the substrate is not limited to DMD31a, and a two-dimensional optical space modulator or a one-dimensional optical space modulator other than DMD31a, for example, GLV may be used. Further, instead of DMD31a, an LCD or a photomask may be used.
　対物レンズ３２ａは、ＤＭＤ３１ａの各マイクロミラーで反射されたレーザ光をマスク１００の表面に結像させる。描画時には、光照射部３０ａ～光照射部３０ｇのそれぞれから光が照射され、この光がマスク１００上で結像することにより、マスク１００にパターンが描画される。光源部３３ａは、主として、光源３３１と、レンズ３３２と、フライアイレンズ３３３と、レンズ３３４、３３５と、ミラー３３６と、を有する。光源３３１は、例えばレーザダイオードであり、光源３３１から出射された光は、光ファイバ等を介してレンズ３３２に導かれる。 The objective lens 32a forms an image of the laser light reflected by each micromirror of the DMD 31a on the surface of the mask 100. At the time of drawing, light is irradiated from each of the light irradiation unit 30a to the light irradiation unit 30g, and the light is imaged on the mask 100 to draw a pattern on the mask 100. The light source unit 33a mainly includes a light source 331, a lens 332, a fly-eye lens 333, a lens 334, 335, and a mirror 336. The light source 331 is, for example, a laser diode, and the light emitted from the light source 331 is guided to the lens 332 via an optical fiber or the like.
　光は、レンズ３３２からフライアイレンズ３３３に導かれる。フライアイレンズ３３３は複数枚のレンズ（図示せず）を２次元状に配置したものであり、フライアイレンズ３３３において多数の点光源が作られる。フライアイレンズ３３３を通過した光は、レンズ３３４、３３５（例えば、コンデンサレンズ）を通って平行光となり、ミラー３３６でＤＭＤ３１ａに向けて反射される。 Light is guided from the lens 332 to the fly-eye lens 333. The fly-eye lens 333 is a two-dimensional arrangement of a plurality of lenses (not shown), and a large number of point light sources are created in the fly-eye lens 333. The light that has passed through the fly-eye lens 333 becomes parallel light through the lens 334, 335 (for example, a condenser lens), and is reflected by the mirror 336 toward the DMD 31a.
　ＡＦ処理部３４ａは、マスク１００へ照射される光の焦点をマスク１００に合わせるものであり、主として、ＡＦ用光源３４１と、コリメータレンズ３４２と、ＡＦ用シリンドリカルレンズ３４３、ペンタプリズム３４４、３４５と、レンズ３４６と、ＡＦセンサ３４７、３４８と、を有する。ＡＦ用光源３４１から照射された光はコリメータレンズ３４２で平行光となり、ＡＦ用シリンドリカルレンズ３４３で線状の光となり、ペンタプリズム３４４で反射されてマスク１００の表面に結像する。マスク１００で反射した光は、ペンタプリズム３４５で反射され、レンズ３４６で集光されて、ＡＦセンサ３４７、３４８に入射する。ペンタプリズム３４４、３４５は、略９７度の曲げ角度で光を曲げる。なお、ペンタプリズム３４４、３４５の代わりにミラーを用いてもよいが、ミラーの角度ズレにより焦点ボケを起こすため、ペンタプリズムを用いることが望ましい。ＡＦ処理部３４ａは、ＡＦセンサ３４７、３４８で受光された結果に基づいて合焦位置を求めるオートフォーカス処理を行う。なお、このような光テコ式によるオートフォーカス処理はすでに公知であるため、詳細な説明を省略する。 The AF processing unit 34a focuses the light applied to the mask 100 to the mask 100, and mainly includes an AF light source 341, a collimator lens 342, an AF cylindrical lens 343, a pentaprism 344, and 345. It has a lens 346 and AF sensors 347 and 348. The light emitted from the AF light source 341 becomes parallel light by the collimator lens 342, becomes linear light by the AF cylindrical lens 343, is reflected by the pentaprism 344, and forms an image on the surface of the mask 100. The light reflected by the mask 100 is reflected by the pentaprism 345, condensed by the lens 346, and incident on the AF sensors 347 and 348. The pentaprisms 344 and 345 bend the light at a bending angle of approximately 97 degrees. A mirror may be used instead of the pentaprisms 344 and 345, but it is desirable to use a pentaprism because the focus is blurred due to the angle deviation of the mirror. The AF processing unit 34a performs autofocus processing for obtaining the focusing position based on the result received by the AF sensors 347 and 348. Since such an autofocus process by the optical lever method is already known, detailed description thereof will be omitted.
　光照射部３０ａは、内部に光学系（対物レンズ３２ａを含む）が設けられた略円筒形状の筒状部３５ａを有する。筒状部３５ａの上側の端には、フランジ３６ａが設けられる。フランジ３６ａは、上側にレンズ３３２、フライアイレンズ３３３及びレンズ３３４、３３５を保持する。また、筒状部３５ａには、取付部３７ａ、３８ａが設けられる。取付部３７ａ、３８ａは、枠体１５への取り付けに用いられる。取付部３７ａは、フランジ３６ａの近傍に設けられ、取付部３８ａは、筒状部３５ａの下端近傍に設けられる。取付部３７ａには、取付部３８ａの外径より大きい直径を有する中空部３７２が形成される。これにより、筒状部３５ａが上方に引き抜き可能となる。 The light irradiation unit 30a has a substantially cylindrical tubular portion 35a provided with an optical system (including an objective lens 32a) inside. A flange 36a is provided at the upper end of the tubular portion 35a. The flange 36a holds the lens 332, the fly-eye lens 333, and the lens 334, 335 on the upper side. Further, the tubular portion 35a is provided with mounting portions 37a and 38a. The mounting portions 37a and 38a are used for mounting on the frame body 15. The mounting portion 37a is provided near the flange 36a, and the mounting portion 38a is provided near the lower end of the tubular portion 35a. A hollow portion 372 having a diameter larger than the outer diameter of the mounting portion 38a is formed in the mounting portion 37a. As a result, the tubular portion 35a can be pulled out upward.
　取付部３７ａ（すなわち、光照射部３０ａ）は、駆動部３９ａにより鉛直方向（ｚ方向）に移動される。駆動部３９ａは、電圧を印加することで変位が生じる固体アクチュエータである圧電素子を有する。圧電素子が伸びると光照射部３０ａが＋ｚ方向に移動し、圧電素子３９１が縮むと光照射部３０ａが－ｚ方向に移動する。駆動部３９ａによる光照射部３０ａの移動量は略３０μｍである。 The mounting portion 37a (that is, the light irradiation portion 30a) is moved in the vertical direction (z direction) by the driving unit 39a. The drive unit 39a has a piezoelectric element which is a solid actuator in which displacement occurs when a voltage is applied. When the piezoelectric element expands, the light irradiation unit 30a moves in the + z direction, and when the piezoelectric element 391 contracts, the light irradiation unit 30a moves in the −z direction. The amount of movement of the light irradiation unit 30a by the drive unit 39a is approximately 30 μm.
　次に、読取部６０について説明する。読取部６０ａ～読取部６０ｇは、同一の構成であるため、以下、読取部６０ａについて説明する。 Next, the reading unit 60 will be described. Since the reading unit 60a to the reading unit 60g have the same configuration, the reading unit 60a will be described below.
　図６は、読取部６０ａの概略を示す斜視図であり、要部を透視した図である。読取部６０ａは、高倍率顕微鏡光学系であり、主として、対物レンズが内部に設けられた鏡筒６０１と、対物レンズへ光（ここでは、可視光）を照射する光源ユニット６０２と、チタン、ジルコニア等の低熱伝導体で形成された鏡筒６０３と、鏡筒６０３の内部に設けられたチューブレンズ６０４と、光源ユニット６０２からの光を透過させると共に、対物レンズから導かれた光を反射するハーフミラー６０５と、を有する顕微鏡と、顕微鏡により取得されたパターンを結像するカメラ６０６と、を有する。 FIG. 6 is a perspective view showing an outline of the reading unit 60a, and is a perspective view of the main part. The reading unit 60a is a high-magnification microscope optical system, and mainly includes a lens barrel 601 in which an objective lens is provided, a light source unit 602 that irradiates the objective lens with light (here, visible light), titanium, and zirconia. A half that transmits light from a lens barrel 603 formed of a low thermal conductor such as the above, a tube lens 604 provided inside the lens barrel 603, and a light source unit 602, and reflects light guided from an objective lens. It has a mirror having a mirror 605, and a camera 606 that forms a pattern acquired by the mirror.
　光源ユニット６０２は、可視光線（例えば、波長が略４５０～６００ｎｍの光）を照射する部材であり、面光源状の光を照射する。光源ユニット６０２は、遠方に設置された光源６２１と、光源６２１からの光を導く光バンドルファイバ６２２と、光ファイバの端面近傍に設置された拡散板６２３と、拡散板６２３に隣接して設けられるコリメータレンズ６２４と、を有する。 The light source unit 602 is a member that irradiates visible light (for example, light having a wavelength of approximately 450 to 600 nm), and irradiates light in the form of a surface light source. The light source unit 602 is provided adjacent to the light source 621 installed at a distance, the optical bundle fiber 622 that guides the light from the light source 621, the diffuser plate 623 installed near the end face of the optical fiber, and the diffuser plate 623. It has a collimator lens 624 and.
　光源６２１は、例えば白色ＬＥＤであり、可視光域の光を照射する。光源６２１は発熱するため、光源６２１は読取部６０ａから離れた位置に設けられる。光源６２１から照射された光は、光バンドルファイバ６２２を用いて導光される。拡散板６２３は、光バンドルファイバ６２２により導光されて、光バンドルファイバ６２２の端面から放射される光を広げ均一に変換した後、コリメータレンズ６２４は、その光を対物レンズに導く。 The light source 621 is, for example, a white LED and irradiates light in the visible light range. Since the light source 621 generates heat, the light source 621 is provided at a position away from the reading unit 60a. The light emitted from the light source 621 is guided by using the optical bundle fiber 622. The diffuser plate 623 is guided by the optical bundle fiber 622 to spread the light radiated from the end face of the optical bundle fiber 622 and uniformly convert the light, and then the collimator lens 624 guides the light to the objective lens.
　光源ユニット６０２から照射された光は、対物レンズを通り、パターンＰ等で反射して、再び対物レンズへ導かれる。対物レンズは、倍率が略１００倍の高倍率、開口数（ＮＡ、ｎｕｍｅｒｉｃａｌ　ａｐｅｒｔｕｒｅ）が略０．８、作動距離が略２ｍｍの特性を有する可視光レンズである。チューブレンズ６０４は、無限遠補正された対物レンズからの光を結像させるレンズであり、焦点距離が略２００ｍｍである。 The light emitted from the light source unit 602 passes through the objective lens, is reflected by the pattern P or the like, and is guided to the objective lens again. The objective lens is a visible light lens having a high magnification of about 100 times, a numerical aperture (NA, numerical aperture) of about 0.8, and a working distance of about 2 mm. The tube lens 604 is a lens that forms an image of light from an objective lens corrected for infinity, and has a focal length of approximately 200 mm.
　カメラ６０６は、解像度がＵＸＧＡ（１６００×１２００画素）程度であり、大きさが２／３インチ程度であり、消費電力が３Ｗ程度である。カメラ６０６は、パターンＰの像を取得する。カメラ６０６は、水冷用ウオータージャケットで囲まれている。カメラ６０６は、制御部２０１ａ（図８参照）により、超低速度スキャンが可能であり、したがってマスク１００に描画された細かいパターンを正確に読み取ることができる。 The camera 606 has a resolution of about UXGA (1600 x 1200 pixels), a size of about 2/3 inch, and a power consumption of about 3 W. The camera 606 acquires an image of the pattern P. The camera 606 is surrounded by a water cooling water jacket. The camera 606 can perform ultra-low speed scanning by the control unit 201a (see FIG. 8), and therefore can accurately read the fine pattern drawn on the mask 100.
　読取部６０ａは、図示しない取付部を介して筒状部３５ａに固定される。これにより、読取部６０ａは、光照射部３０ａと共にｚ方向に移動する。 The reading unit 60a is fixed to the tubular portion 35a via a mounting portion (not shown). As a result, the reading unit 60a moves in the z direction together with the light irradiation unit 30a.
　次に、光照射部３０ａ～３０ｇを枠体１５に取り付ける取付構造について説明する。図７は、光照射部３０ａの取付構造を模式的に示す図である。なお、光照射部３０ｂ～光照射部３０ｇの取付構造は、光照射部３０ａの取付構造と同一の構成であるため説明を省略する。 Next, a mounting structure for mounting the light irradiation units 30a to 30g to the frame body 15 will be described. FIG. 7 is a diagram schematically showing a mounting structure of the light irradiation unit 30a. Since the mounting structure of the light irradiation unit 30b to the light irradiation unit 30g has the same structure as the mounting structure of the light irradiation unit 30a, the description thereof will be omitted.
　ガイド部材７０、７０Ａは、それぞれ、ガイド部本体７１、７１Ａと、押さえリング７２、７２Ａ、７３、７３Ａと、を有する。ガイド部本体７１、７１Ａは、略薄板状であり、平面視略円板形状である。ガイド部本体７１、７１Ａは、変形しやすいように、厚さが略０．１ｍｍ程度の金属で形成される。金属としては、ステンレス鋼、リン青銅等を用いることができるが、より均質なリン青銅を用いることが望ましい。 The guide members 70 and 70A have guide unit main bodies 71 and 71A and pressing rings 72, 72A, 73 and 73A, respectively. The guide portion main bodies 71 and 71A have a substantially thin plate shape and a substantially disc shape in a plan view. The guide portions 71 and 71A are made of a metal having a thickness of about 0.1 mm so as to be easily deformed. As the metal, stainless steel, phosphor bronze and the like can be used, but it is desirable to use more homogeneous phosphor bronze.
　ガイド部本体７１、７１Ａには、それぞれ、略中央に取付孔７４、７４Ａが形成される。取付孔７４、７４Ａには、筒状部３５ａが挿入される。筒状部３５ａが取付孔７４、７４Ａに挿入された状態では、光軸ａｘが取付孔７４、７４Ａの中心と略一致する。 Mounting holes 74 and 74A are formed in the guide portion main bodies 71 and 71A at substantially the center, respectively. A tubular portion 35a is inserted into the mounting holes 74 and 74A. When the tubular portion 35a is inserted into the mounting holes 74 and 74A, the optical axis ax substantially coincides with the center of the mounting holes 74 and 74A.
　押さえリング７２、７２Ａ、７３、７３Ａは、厚さが略３ｍｍ程度であり、ガイド部本体７１と同じ材料で形成される。押さえリング７２、７２Ａは、略環状であり、ガイド部本体７１、７１Ａの外周に略沿って設けられる。押さえリング７３、７３Ａは、略環状であり、取付孔７４、７４Ａに略沿って設けられる。押さえリング７２、７２Ａ、７３、７３Ａを介してガイド部材７０、７０Ａを枠体１５及び筒状部３５ａに固定することで、ガイド部本体７１、７１Ａの変形を防止することができる。 The pressing rings 72, 72A, 73, 73A have a thickness of about 3 mm and are made of the same material as the guide portion main body 71. The pressing rings 72 and 72A are substantially annular and are provided substantially along the outer periphery of the guide portion main bodies 71 and 71A. The pressing rings 73 and 73A are substantially annular and are provided substantially along the mounting holes 74 and 74A. By fixing the guide members 70, 70A to the frame body 15 and the tubular portion 35a via the pressing rings 72, 72A, 73, 73A, deformation of the guide portion main bodies 71, 71A can be prevented.
　ガイド部本体７１には、孔７５、７６が設けられている孔７５、７６は、ＡＦ用光源３４１から下向きに照射された光及びマスク１００での反射光が通過できるように、それぞれＡＦ用光源３４１及びＡＦセンサ３４７、３４８と水平方向の位置が一致する。言い換えれば、孔７５、７６の位置は、それぞれ平面視においてＡＦ用光源３４１及びＡＦセンサ３４７、３４８の位置と重なる。このように、孔７５、７６を形成することで、ガイド部材７０、７０Ａを用いた場合においても光照射部３０ａのＡＦ処理が可能となる。 Holes 75 and 76 are provided in the guide portion main body 71. The holes 75 and 76 are AF light sources so that the light radiated downward from the AF light source 341 and the reflected light from the mask 100 can pass through, respectively. The horizontal positions of 341 and AF sensors 347 and 348 coincide with each other. In other words, the positions of the holes 75 and 76 overlap with the positions of the AF light source 341 and the AF sensors 347 and 348 in a plan view, respectively. By forming the holes 75 and 76 in this way, the AF treatment of the light irradiation unit 30a becomes possible even when the guide members 70 and 70A are used.
　駆動部３９ａは、押さえリング７３Ａを介して取付部３７ａを押し上げる。駆動部３９ａが重心Ｇの近くで光照射部３０ａを押し上げることで、光照射部３０ａの上下動が安定する。 The drive unit 39a pushes up the mounting unit 37a via the pressing ring 73A. When the drive unit 39a pushes up the light irradiation unit 30a near the center of gravity G, the vertical movement of the light irradiation unit 30a is stabilized.
　なお、光照射部３０ａの上下動に伴い、光照射部３０ａに設けられた読取部６０ａ（図７では図示省略）も上下動する。読取部６０ａの鏡筒６０１が丸孔１５７ａ（図４等参照）に挿入されており、鏡筒６０１は丸孔１５７ａに固定されていないため、鏡筒６０１の上下動により不具合は生じない。 Note that the reading unit 60a (not shown in FIG. 7) provided in the light irradiation unit 30a also moves up and down as the light irradiation unit 30a moves up and down. Since the lens barrel 601 of the reading unit 60a is inserted into the round hole 157a (see FIG. 4 and the like) and the lens barrel 601 is not fixed to the round hole 157a, no problem occurs due to the vertical movement of the lens barrel 601.
　図８は、露光装置１の電気的な構成を示すブロック図である。露光装置１は、ＣＰＵ（Ｃｅｎｔｒａｌ Ｐｒｏｃｅｓｓｉｎｇ Ｕｎｉｔ）２０１と、ＲＡＭ（Ｒａｎｄｏｍ Ａｃｃｅｓｓ Ｍｅｍｏｒｙ）２０２と、ＲＯＭ（Ｒｅａｄ Ｏｎｌｙ Ｍｅｍｏｒｙ）２０３と、入出力インターフェース（Ｉ／Ｆ）２０４と、通信インターフェース（Ｉ／Ｆ）２０５と、メディアインターフェース（Ｉ／Ｆ）２０６と、を有し、これらは光照射部３０、レーザ干渉計５０、読取部６０、駆動部８１、８２等と互いに接続されている。 FIG. 8 is a block diagram showing the electrical configuration of the exposure apparatus 1. The exposure device 1 includes a CPU (Central Processing Unit) 201, a RAM (Random Access Memory) 202, a ROM (Read Only Memory) 203, an input / output interface (I / F) 204, and a communication interface (I / F). It has a 205 and a media interface (I / F) 206, which are connected to each other with a light irradiation unit 30, a laser interferometer 50, a reading unit 60, drive units 81, 82 and the like.
　ＣＰＵ２０１は、ＲＡＭ２０２、ＲＯＭ２０３に格納されたプログラムに基づいて動作し、各部の制御を行う。ＣＰＵ２０１には、レーザ干渉計５０、読取部６０等から信号が入力される。ＣＰＵ２０１から出力された信号は、駆動部８１、８２、光照射部３０等に出力される。 The CPU 201 operates based on the programs stored in the RAM 202 and the ROM 203, and controls each part. Signals are input to the CPU 201 from the laser interference meter 50, the reading unit 60, and the like. The signal output from the CPU 201 is output to the drive units 81, 82, the light irradiation unit 30, and the like.
　ＲＡＭ２０２は、揮発性メモリである。ＲＯＭ２０３は、各種制御プログラム等が記憶されている不揮発性メモリである。ＣＰＵ２０１は、ＲＡＭ２０２、ＲＯＭ２０３に格納されたプログラムに基づいて動作し、各部の制御を行う。また、ＲＯＭ２０３は、露光装置１の起動時にＣＰＵ２０１が行うブートプログラムや、露光装置１のハードウェアに依存するプログラム、マスク１００への描画データなどを格納する。また、ＲＡＭ２０２は、ＣＰＵ２０１が実行するプログラム及びＣＰＵ２０１が使用するデータなどを格納する。 RAM 202 is a volatile memory. The ROM 203 is a non-volatile memory in which various control programs and the like are stored. The CPU 201 operates based on the programs stored in the RAM 202 and the ROM 203, and controls each part. Further, the ROM 203 stores a boot program performed by the CPU 201 when the exposure device 1 is started, a program depending on the hardware of the exposure device 1, drawing data on the mask 100, and the like. Further, the RAM 202 stores a program executed by the CPU 201, data used by the CPU 201, and the like.
　ＣＰＵ２０１は、入出力インターフェース２０４を介して、キーボードやマウス等の入出力装置２１１を制御する。通信インターフェース２０５は、ネットワーク２１２を介して他の機器からデータを受信してＣＰＵ２０１に送信すると共に、ＣＰＵ２０１が生成したデータを、ネットワーク２１２を介して他の機器に送信する。 The CPU 201 controls an input / output device 211 such as a keyboard and a mouse via the input / output interface 204. The communication interface 205 receives data from another device via the network 212 and transmits the data to the CPU 201, and also transmits the data generated by the CPU 201 to the other device via the network 212.
　メディアインターフェース２０６は、記憶媒体２１３に格納されたプログラム又はデータを読み取り、ＲＡＭ２０２に格納する。なお、記憶媒体２１３は、例えば、ＩＣカード、ＳＤカード、ＤＶＤ等である。 The media interface 206 reads the program or data stored in the storage medium 213 and stores it in the RAM 202. The storage medium 213 is, for example, an IC card, an SD card, a DVD, or the like.
　なお、各機能を実現するプログラムは、例えば、記憶媒体２１３から読み出されて、ＲＡＭ２０２を介して露光装置１にインストールされ、ＣＰＵ２０１によって実行される。 The program that realizes each function is read from, for example, the storage medium 213, installed in the exposure apparatus 1 via the RAM 202, and executed by the CPU 201.
　ＣＰＵ２０１は、入力信号に基づいて露光装置１の各部を制御する制御部２０１ａの機能を有する。制御部２０１ａは、ＣＰＵ２０１が読み込んだ所定のプログラムを実行することにより構築される。制御部２０１ａが行う処理については、後に詳述する。 The CPU 201 has a function of a control unit 201a that controls each unit of the exposure device 1 based on an input signal. The control unit 201a is constructed by executing a predetermined program read by the CPU 201. The process performed by the control unit 201a will be described in detail later.
　図８に示す露光装置１の構成は、本実施形態の特徴を説明するにあたって主要構成を説明したのであって、例えば一般的な情報処理装置が備える構成を排除するものではない。露光装置１の構成要素は、処理内容に応じてさらに多くの構成要素に分類されてもよいし、１つの構成要素が複数の構成要素の処理を実行してもよい。 The configuration of the exposure device 1 shown in FIG. 8 describes the main configuration in explaining the features of the present embodiment, and does not exclude, for example, the configuration provided in a general information processing device. The components of the exposure apparatus 1 may be further classified into more components depending on the processing content, or one component may execute processing of a plurality of components.
　このように構成された露光装置１の作用について説明する。以下の処理は、主として制御部２０１ａによって行われる。 The operation of the exposure apparatus 1 configured in this way will be described. The following processing is mainly performed by the control unit 201a.
　制御部２０１ａは、描画処理を行う前に、略板状の交換式被読取部（図示省略）に設けられた台形型認識マーク４１を読み取る。図９は、台形型認識マーク４１を示す図であり、（Ａ）は平面図であり、（Ｂ）は（Ａ）のＣ－Ｃ断面図である。 The control unit 201a reads the trapezoidal recognition mark 41 provided on the substantially plate-shaped interchangeable read unit (not shown) before performing the drawing process. 9A and 9B are views showing the trapezoidal recognition mark 41, FIG. 9A is a plan view, and FIG. 9B is a sectional view taken along the line CC of FIG. 9A.
　台形型認識マーク４１は、図９（Ａ）に示すように、直交する４方向に突出する突起部４１ａを有する平面視略十字形状である。台形型認識マーク４１は、図９（Ｂ）に示すように厚肉であり、厚みは略５μｍ以上である。なお、台形型認識マーク４１の厚みは、略５μｍ以上から略１ｍｍであることが好ましく、略５μｍから略１００μｍであることがより好ましく、略５μｍ以上から略３０μｍであることがさらに好ましい。 As shown in FIG. 9A, the trapezoidal recognition mark 41 has a substantially cross shape in a plan view having protrusions 41a protruding in four orthogonal directions. The trapezoidal recognition mark 41 is thick as shown in FIG. 9B, and has a thickness of about 5 μm or more. The thickness of the trapezoidal recognition mark 41 is preferably from about 5 μm or more to about 1 mm, more preferably from about 5 μm to about 100 μm, and even more preferably from about 5 μm or more to about 30 μm.
　突起部４１ａの断面形状は、底面側が広く、底面の反対側（上面）が狭い略台形形状である。突起部４１ａの高さｔは、読取部６０の焦点深度の数倍以上であり、本実施の形態では略５μｍである。底面４１ｂの幅ｗは、高さｔよりも大きく、本実施の形態では略８μｍ～１０μｍである。 The cross-sectional shape of the protrusion 41a is a substantially trapezoidal shape in which the bottom surface side is wide and the opposite side (top surface) of the bottom surface is narrow. The height t of the protrusion 41a is several times or more the depth of focus of the reading unit 60, and is approximately 5 μm in the present embodiment. The width w of the bottom surface 41b is larger than the height t, and is approximately 8 μm to 10 μm in the present embodiment.
　底面４１ｂ及び上面４１ｅは、交換式被読取部をステージ２０の上面２０ａに載置したときに、上面２０ａと略平行である。突起部４１ａの両側の側面４１ｃ、４１ｄは、底面４１ｂ及び上面４１ｅに対して傾斜する傾斜面である。図９（Ｂ）に示す断面視において、側面４１ｃ、４１ｄは、略左右対称である。そして、側面４１ｃの底面４１ｂに対する傾斜角度の絶対値と、側面４１ｄの底面４１ｂに対する傾斜角度の絶対値との差は、略１度以内であることが望ましい。 The bottom surface 41b and the top surface 41e are substantially parallel to the top surface 20a when the replaceable read unit is placed on the top surface 20a of the stage 20. The side surfaces 41c and 41d on both sides of the protrusion 41a are inclined surfaces that are inclined with respect to the bottom surface 41b and the top surface 41e. In the cross-sectional view shown in FIG. 9B, the side surfaces 41c and 41d are substantially symmetrical. The difference between the absolute value of the inclination angle of the side surface 41c with respect to the bottom surface 41b and the absolute value of the inclination angle of the side surface 41d with respect to the bottom surface 41b is preferably within about 1 degree.
　例えば、底面４１ｂに対する傾斜角度の絶対値が６０度である場合、側面４１ｃの傾きと側面４１ｄの傾きが１度異なる場合の中心位置のずれは、略４４ｎｍ（＝５μｍ×（ｓｉｎ６０°－ｓｉｎ５９°））となる。本実施の形態の露光装置の精度は略６０ｎｍであり、側面４１ｃ、４１ｄの傾斜角度の差異が１度以下とすることで露光装置の精度を満足させることができる。 For example, when the absolute value of the inclination angle with respect to the bottom surface 41b is 60 degrees, the deviation of the center position when the inclination of the side surface 41c and the inclination of the side surface 41d differ by 1 degree is approximately 44 nm (= 5 μm × (sin60 ° −sin59 °). )). The accuracy of the exposure apparatus according to the present embodiment is approximately 60 nm, and the accuracy of the exposure apparatus can be satisfied by setting the difference in inclination angles between the side surfaces 41c and 41d to 1 degree or less.
　なお、断面視において側面４１ｃ、４１ｄを左右対称にするためには、ウェットエッチングにより台形型認識マーク４１を形成することが望ましい。 In order to make the side surfaces 41c and 41d symmetrical in cross-sectional view, it is desirable to form the trapezoidal recognition mark 41 by wet etching.
　台形型認識マーク４１は、交換式被読取部に二次元配置されている。交換式被読取部は、被読取部２５とは別に設けられるものであり、ステージ２０に対して着脱可能である。ここでは、交換式被読取部は、ステージ２０の上面２０ａに載置される。制御部２０１ａは、ステージ２０に交換式被読取部を載置した状態で、駆動部３９や移動機構１６１により読取部６０をステージ２０に近づける方向及びステージ２０から遠ざける方向に移動させながら、台形型認識マーク４１を読み取る。 The trapezoidal recognition mark 41 is two-dimensionally arranged on the interchangeable read unit. The replaceable read unit is provided separately from the read unit 25, and is removable from the stage 20. Here, the replaceable read unit is placed on the upper surface 20a of the stage 20. The control unit 201a has a trapezoidal shape while moving the reading unit 60 closer to the stage 20 and away from the stage 20 by the driving unit 39 and the moving mechanism 161 while the replaceable reading unit is mounted on the stage 20. Read the recognition mark 41.
　読取部６０の光軸が傾いている場合には、読取部６０を上下動させることで読取部６０の視野がｘ方向又はｙ方向にずれる。図１０は、読取部６０を上下動させたときの様子を示す図であり、（Ａ）は読取部６０の光軸が傾いていない場合であり、（Ｂ）は読取部６０の光軸が傾いている場合である。 When the optical axis of the reading unit 60 is tilted, the field of view of the reading unit 60 shifts in the x direction or the y direction by moving the reading unit 60 up and down. 10A and 10B are views showing a state when the reading unit 60 is moved up and down. FIG. 10A shows a case where the optical axis of the reading unit 60 is not tilted, and FIG. 10B shows a case where the optical axis of the reading unit 60 is not tilted. This is the case when it is tilted.
　図１０（Ａ）に示すように、読取部６０の光軸が傾いていない場合は、読取部６０のｚ方向の位置が変化しても、光軸とステージ２０（又はマスク１００）が交差する位置は変化せず、読取部６０の視野も変化しない。 As shown in FIG. 10A, when the optical axis of the reading unit 60 is not tilted, the optical axis and the stage 20 (or the mask 100) intersect even if the position of the reading unit 60 in the z direction changes. The position does not change, and the field of view of the reading unit 60 does not change.
　それに対し、図１０（Ｂ）に示すように、読取部６０の光軸が傾いている場合は、読取部６０のｚ方向の位置が変化すると、光軸とステージ２０（又はマスク１００）が交差する位置が図１０における横方向に変化し、読取部６０の視野も変化する。 On the other hand, as shown in FIG. 10B, when the optical axis of the reading unit 60 is tilted, the optical axis and the stage 20 (or the mask 100) intersect when the position of the reading unit 60 in the z direction changes. The position to be used changes in the horizontal direction in FIG. 10, and the field of view of the reading unit 60 also changes.
　したがって、制御部２０１ａは、描画処理の前に、読取部６０をステージ２０に近づける方向及びステージ２０から遠ざける方向に移動させながら台形型認識マーク４１を読み取り、台形型認識マーク４１の読取結果に基づいて読取部６０の特性、特に光軸の傾きを検知する。 Therefore, the control unit 201a reads the trapezoidal recognition mark 41 while moving the reading unit 60 toward the stage 20 and away from the stage 20 before the drawing process, and based on the reading result of the trapezoidal recognition mark 41. The characteristics of the reading unit 60, particularly the inclination of the optical axis, are detected.
　また、読取部６０が台形型認識マーク４１を読み取るため、読取部６０を上下動させたとしても、台形型認識マーク４１の側面４１ｃ、４１ｄのどこかに焦点をあわせることができる。側面４１ｃ、４１ｄは、略左右対称であるため、側面４１ｃ、４１ｄの低い位置（底面４１ｂの近傍）に焦点が合った場合も、側面４１ｃ、４１ｄの高い位置（上面４１ｅの近傍）に焦点が合った場合も、読取部６０が台形型認識マーク４１の中心Ｏを正しく読むことができる。 Further, since the reading unit 60 reads the trapezoidal recognition mark 41, even if the reading unit 60 is moved up and down, it is possible to focus on some of the side surfaces 41c and 41d of the trapezoidal recognition mark 41. Since the side surfaces 41c and 41d are substantially symmetrical, even if the side surfaces 41c and 41d are focused on the low position (near the bottom surface 41b), the side surfaces 41c and 41d are focused on the high position (near the top surface 41e). Even if they match, the reading unit 60 can correctly read the center O of the trapezoidal recognition mark 41.
　その後、制御部２０１ａは処理を描画処理に進める。描画処理は、ステージ２０から交換式被読取部を取り外し、ステージ２０の上面２０ａにマスク１００を載置し、その後数時間経過してから行なわれる。 After that, the control unit 201a proceeds to the drawing process. The drawing process is performed after the interchangeable read unit is removed from the stage 20, the mask 100 is placed on the upper surface 20a of the stage 20, and several hours have passed thereafter.
　まず、制御部２０１ａは、駆動部８１、８２によりステージ２０をｘ方向やｙ方向に移動させて読取部６０の視野内にアライメントマーク１０１を配置し、駆動部３９や移動機構１６１により読取部６０をマスク１００の高さに合わせてｘ方向に移動させ、読取部６０でマスク１００のアライメントマーク１０１を読み取る。読取部６０の焦点深度は浅いため、アライメントマーク１０１に合焦させるため、駆動部３９や移動機構１６１により読取部６０をマスク１００の高さに合わせる必要がある。 First, the control unit 201a moves the stage 20 in the x direction and the y direction by the drive units 81 and 82 to arrange the alignment mark 101 in the field of view of the reading unit 60, and the drive unit 39 and the moving mechanism 161 move the reading unit 60. Is moved in the x direction according to the height of the mask 100, and the alignment mark 101 of the mask 100 is read by the reading unit 60. Since the depth of focus of the reading unit 60 is shallow, it is necessary to adjust the reading unit 60 to the height of the mask 100 by the driving unit 39 or the moving mechanism 161 in order to focus on the alignment mark 101.
　その後、制御部２０１ａは、駆動部８１、８２によりステージ２０をｘ方向やｙ方向に移動させて読取部６０の視野内に辺２０ｂ近傍に設けられた被読取部２５を配置し、読取部６０で認識マーク２５ｅを読み取る。 After that, the control unit 201a moves the stage 20 in the x-direction and the y-direction by the drive units 81 and 82 to arrange the read unit 25 provided near the side 20b in the field of view of the reading unit 60, and the reading unit 60. Read the recognition mark 25e with.
　高さが徐々に変化するリブ２５Ａ、２５Ｂの板状部２５ｄに認識マーク２５ｅが設けられているため、読取部６０の位置がマスク１００の高さ、すなわちアライメントマーク１０１の高さに合わせて調整されていたとしても、１つの認識マーク２５ｅの高さをアライメントマーク１０１の高さと略一致させ、１つの認識マーク２５ｅに焦点を合わせることができる。 Since the recognition mark 25e is provided on the plate-shaped portions 25d of the ribs 25A and 25B whose heights gradually change, the position of the reading portion 60 is adjusted according to the height of the mask 100, that is, the height of the alignment mark 101. Even if it is, the height of one recognition mark 25e can be made to substantially match the height of the alignment mark 101, and one recognition mark 25e can be focused.
　そして、様々な厚みのマスク１００を上面２０ａに載置したとしても、複数の認識マーク２５ｅのうちの１つの認識マーク２５ｅの高さをアライメントマーク１０１の高さと略一致させることができる。 Then, even if the masks 100 having various thicknesses are placed on the upper surface 20a, the height of the recognition mark 25e of the plurality of recognition marks 25e can be substantially matched with the height of the alignment mark 101.
　図１１は、読取部６０で被読取部２５を読み取るときの読取部６０の視野を模式的に示す図である。図１１の点線Ａで囲む領域が読取部６０の視野であり、図１１の点線Ｂで囲む領域が読取部６０の合焦領域である。 FIG. 11 is a diagram schematically showing the field of view of the reading unit 60 when the reading unit 60 reads the read unit 25. The area surrounded by the dotted line A in FIG. 11 is the field of view of the reading unit 60, and the area surrounded by the dotted line B in FIG. 11 is the focusing area of the reading unit 60.
　読取部６０は焦点深度が浅く、ステージ２０に載置されるマスク１００の厚みの最大値と最小値との差（ここでは、略８ｍｍ程度）を吸収することはできない。本実施の形態では、読取部６０の視野に含まれる認識マーク２５ｅの高さはすべて異なるため、マスク１００の高さに合わせて読取部６０の高さを調整していたとしても、読取部６０が合焦する認識マーク２５ｅが１つ存在する。そして、読取部６０が合焦した認識マーク２５ｅを読み取ることで、制御部２０１ａがステージ２０の位置を検知することができる。 The reading unit 60 has a shallow depth of focus and cannot absorb the difference between the maximum and minimum thicknesses of the mask 100 mounted on the stage 20 (here, about 8 mm). In the present embodiment, since the heights of the recognition marks 25e included in the field of view of the reading unit 60 are all different, even if the height of the reading unit 60 is adjusted according to the height of the mask 100, the reading unit 60 There is one recognition mark 25e that focuses on. Then, the reading unit 60 can read the focused recognition mark 25e, so that the control unit 201a can detect the position of the stage 20.
　制御部２０１ａは、アライメントマーク１０１及び認識マーク２５ｅの読取結果に基づいてステージ２０、すなわちマスク１００のｘ方向及びｙ方向の位置を検知する。 The control unit 201a detects the positions of the stage 20, that is, the mask 100 in the x-direction and the y-direction based on the reading results of the alignment mark 101 and the recognition mark 25e.
　制御部２０１ａは、検知したマスク１００のｘ方向及びｙ方向の位置に基づいて、ステージ２０をｘ方向移動させつつ、光照射部３０の下側をマスク１００が通過するときに光照射部３０から光を照射して、マスク１００に対して描画処理を行う。 The control unit 201a moves the stage 20 in the x direction based on the detected positions of the mask 100 in the x and y directions, and when the mask 100 passes under the light irradiation unit 30, the light irradiation unit 30 The mask 100 is irradiated with light to perform drawing processing.
　制御部２０１ａは、台形型認識マーク４１の読取結果に基づいて求められた読取部６０の光軸の傾きに基づいて、描画位置を調整する。そして、制御部２０１ａは、補正後の描画位置に基づいて、光照射部３０ａ～３０ｇからマスク１００へ光を照射する。具体的には、制御部２０１ａは、ｘ方向については光照射部３０ａ～３０ｇへ光を照射する信号（水平同期信号）のタイミングを変え、ｙ方向については描画データを位置ずれ分だけｙ方向に移動させることで描画位置を調整する。 The control unit 201a adjusts the drawing position based on the inclination of the optical axis of the reading unit 60 obtained based on the reading result of the trapezoidal recognition mark 41. Then, the control unit 201a irradiates the mask 100 with light from the light irradiation units 30a to 30g based on the corrected drawing position. Specifically, the control unit 201a changes the timing of the signal (horizontal synchronization signal) that irradiates the light irradiation units 30a to 30g with light in the x direction, and shifts the drawing data in the y direction by the amount of the misalignment in the y direction. Adjust the drawing position by moving it.
　また、制御部２０１ａは、ステージ２０をｘ方向移動させるときに、辺２０ｂ近傍に設けられた認識マーク２５ｅ及び辺２０ｃ近傍に設けられた認識マーク２５ｅを読取部６０で読み取る。これにより、ステージ２０がｘ方向に沿って真っ直ぐに移動しているか、ステージ２０がｙ方向に湾曲しながらｘ方向に移動しているか等を検知するすることができる。この場合、制御部２０１ａは、検知したステージ２０のｙ方向への湾曲に基づいて描画位置を調整する。 Further, when the stage 20 is moved in the x direction, the control unit 201a reads the recognition mark 25e provided near the side 20b and the recognition mark 25e provided near the side 20c by the reading unit 60. Thereby, it is possible to detect whether the stage 20 is moving straight along the x direction, whether the stage 20 is moving in the x direction while bending in the y direction, and the like. In this case, the control unit 201a adjusts the drawing position based on the detected curvature of the stage 20 in the y direction.
　制御部２０１ａは、描画しつつステージ２０を＋ｘ端まで移動させたら、ステージ２０を－ｘ端まで戻す。そして、制御部２０１ａは、再度ステージ２０を＋ｘ端まで移動させつつ描画を行う。時間の経過に伴い、温度変化等によりステージ２０やマスク１００の高さが変化するため、ステージ２０を－ｘ端まで戻す度に、制御部２０１ａは、読取部６０の高さをアライメントマーク１０１に合わせた状態でアライメントマーク１０１と認識マーク２５ｅを読み取り、その読取結果に基づいて次の描画を行う。 The control unit 201a moves the stage 20 to the + x end while drawing, and then returns the stage 20 to the −x end. Then, the control unit 201a draws while moving the stage 20 to the + x end again. Since the heights of the stage 20 and the mask 100 change with the passage of time due to temperature changes and the like, every time the stage 20 is returned to the −x end, the control unit 201a sets the height of the reading unit 60 to the alignment mark 101. The alignment mark 101 and the recognition mark 25e are read in the combined state, and the next drawing is performed based on the reading result.
　本実施の形態によれば、高さが徐々に変化するリブ２５Ａ、２５Ｂの板状部２５ｄに認識マーク２５ｅが設けられているため、マスク１００（アライメントマーク１０１）の高さが異なる場合においても、１つの認識マーク２５ｅの高さをアライメントマーク１０１の高さと略一致させ、１つの認識マーク２５ｅに焦点を合わせることができる。 According to the present embodiment, since the recognition mark 25e is provided on the plate-shaped portions 25d of the ribs 25A and 25B whose heights gradually change, even when the heights of the masks 100 (alignment marks 101) are different. The height of one recognition mark 25e can be substantially matched with the height of the alignment mark 101 to focus on one recognition mark 25e.
　例えば、ステージ２０に認識マーク２５ｅが直接設けられている場合には、様々な厚みのマスク１００を上面２０ａに載置すると、読取部６０の高さをアライメントマーク１０１の高さに合わせると認識マーク２５ｅに合焦させることができない。また、マスク１００の厚みに合わせて認識マーク２５ｅを上下動させるとすると、装置構成が複雑になってしまう。 For example, when the recognition mark 25e is directly provided on the stage 20, when masks 100 of various thicknesses are placed on the upper surface 20a, the recognition mark is aligned with the height of the reading unit 60 to match the height of the alignment mark 101. Cannot focus on 25e. Further, if the recognition mark 25e is moved up and down according to the thickness of the mask 100, the device configuration becomes complicated.
　それに対し、本実施の形態のように、高さの異なる複数の認識マーク２５ｅを設けておくことで、複雑な機構を用いることなく、様々な厚みの基板に対応することができる。また、高さの異なる複数の認識マーク２５ｅを設けておくことで、組み立て誤差等による読取部６０のｚ方向の位置のばらつきに対応することができる。 On the other hand, by providing a plurality of recognition marks 25e having different heights as in the present embodiment, it is possible to deal with substrates of various thicknesses without using a complicated mechanism. Further, by providing a plurality of recognition marks 25e having different heights, it is possible to deal with variations in the position of the reading unit 60 in the z direction due to an assembly error or the like.
　また、本実施の形態によれば、平行な２つの辺２０ｂ、２０ｃ近傍に被読取部２５を設けることで、ステージ２０の移動特性、すなわちステージ２０がｘ方向に沿って真っ直ぐに移動しているか、ステージ２０がｙ方向に湾曲しながらｘ方向に移動しているか等を検知するすることができる。 Further, according to the present embodiment, by providing the read portion 25 in the vicinity of the two parallel sides 20b and 20c, the movement characteristic of the stage 20, that is, whether the stage 20 is moving straight along the x direction. , It is possible to detect whether the stage 20 is moving in the x direction while being curved in the y direction.
　また、本実施の形態によれば、描画処理の前に、読取部６０を上下方向に移動させながら台形型認識マーク４１を読み取ることで、読取部６０の特性、特に光軸の傾きを検知することができる。また、台形型認識マーク４１の側面４１ｃ、４１ｄが略左右対称であるため、読取部６０の高さ方向の位置によらず、読取部６０が台形型認識マーク４１の中心Ｏを正しく読むことができる。 Further, according to the present embodiment, the characteristics of the reading unit 60, particularly the inclination of the optical axis, is detected by reading the trapezoidal recognition mark 41 while moving the reading unit 60 in the vertical direction before the drawing process. be able to. Further, since the side surfaces 41c and 41d of the trapezoidal recognition mark 41 are substantially symmetrical, the reading unit 60 can correctly read the center O of the trapezoidal recognition mark 41 regardless of the position of the reading unit 60 in the height direction. it can.
　また、本実施の形態によれば、描画処理で用いる認識マーク２５ｅの厚みを読取部６０の焦点深度より薄くする点に特徴がある。高精度の描画（精度が略６０ｎｍ）を行う場合には、読取部６０の１ピクセル（略１００ｎｍ）より小さいため、高精度に認識マーク２５ｅを読み取る必要があるが、認識マーク２５ｅを薄くして認識マーク２５ｅに確実に合焦させることで、読取部６０が認識マーク２５ｅを正確に読み取ることができる。 Further, according to the present embodiment, the thickness of the recognition mark 25e used in the drawing process is made thinner than the depth of focus of the reading unit 60. When drawing with high accuracy (accuracy is approximately 60 nm), it is necessary to read the recognition mark 25e with high accuracy because it is smaller than one pixel (approximately 100 nm) of the reading unit 60, but the recognition mark 25e is thinned. By ensuring that the recognition mark 25e is in focus, the reading unit 60 can accurately read the recognition mark 25e.
　なお、本実施の形態では、辺２０ｂ、２０ｃの近傍に被読取部２５が設けられていたが、ステージ２０やマスク１００のｘ方向及びｙ方向の位置を検知するためには、辺２０ｂ、２０ｃのうちの少なくとも一方の近傍に被読取部２５が設けられていればよい。ただし、ステージ２０の移動特性を検知するためには、辺２０ｂ、２０ｃの近傍に被読取部２５を設けることが望ましい。 In the present embodiment, the read unit 25 is provided in the vicinity of the sides 20b and 20c, but in order to detect the positions of the stage 20 and the mask 100 in the x-direction and the y-direction, the sides 20b and 20c are provided. The read unit 25 may be provided in the vicinity of at least one of them. However, in order to detect the movement characteristics of the stage 20, it is desirable to provide the read unit 25 in the vicinity of the sides 20b and 20c.
　また、本実施の形態では、光照射部３０及び読取部６０をｙ方向に沿って複数設けたため、被読取部２５もｙ方向に沿って複数設けたが、光照射部３０及び読取部６０が１つずつである場合には、被読取部２５も１つでよい。 Further, in the present embodiment, since a plurality of light irradiation units 30 and reading units 60 are provided along the y direction, a plurality of reading units 25 are also provided along the y direction, but the light irradiation unit 30 and the reading unit 60 are provided. In the case of one by one, the number of read portions 25 may be one.
　また、本実施の形態では、隣接して２本のリブ２５Ａ、２５Ｂを設けたが、リブの数はこれに限られない。例えば、ステージ２０や板状部材２１のｘ方向の長さに制限が無ければ、ｘ方向に沿った長いリブ（リブ２５Ａ、２５Ｂの長さの倍の長さのリブ）を１本設ければよい。また、例えば、ステージ２０や板状部材２１のｘ方向の長さに余裕がなければ、３本以上のリブをｙ方向に沿って並べればよい。 Further, in the present embodiment, two ribs 25A and 25B are provided adjacent to each other, but the number of ribs is not limited to this. For example, if the length of the stage 20 or the plate-shaped member 21 in the x direction is not limited, one long rib (rib having a length twice the length of the ribs 25A and 25B) along the x direction may be provided. Good. Further, for example, if there is no margin in the length of the stage 20 or the plate-shaped member 21 in the x direction, three or more ribs may be arranged along the y direction.
　また、本実施の形態では、高さが徐々に変化するリブ２５Ａ、２５Ｂを用いて高さの異なる複数の認識マーク２５ｅを設けたが、高さの異なる複数の認識マーク２５ｅを設ける形態はこれに限られない。例えば、高さが階段状に変化するリブを用い、踏面に相当する部分にそれぞれ認識マーク２５ｅを設けることで、高さの異なる複数の認識マーク２５ｅを設けてもよい。 Further, in the present embodiment, a plurality of recognition marks 25e having different heights are provided by using ribs 25A and 25B whose heights gradually change, but this is a form in which a plurality of recognition marks 25e having different heights are provided. Not limited to. For example, a plurality of recognition marks 25e having different heights may be provided by using ribs whose height changes in a stepped manner and providing recognition marks 25e on the portions corresponding to the treads.
　また、本実施の形態では、交換式被読取部は着脱可能（交換式）であり、ステージ２０の上面２０ａに載置されるが、交換式被読取部の形態はこれに限られない。例えば、交換式被読取部が交換式でなく、交換式被読取部をステージ２０の端面部に設けておいてもよい。 Further, in the present embodiment, the replaceable read portion is removable (replaceable) and is mounted on the upper surface 20a of the stage 20, but the form of the replaceable read portion is not limited to this. For example, the replaceable read portion is not the replaceable type, and the replaceable read portion may be provided on the end face portion of the stage 20.
　また、本実施の形態では、マスク１００にアライメントマーク１０１を設けたが、アライメントマーク１０１は必須ではない。アライメントマーク１０１が設けられていない場合には、制御部２０１ａは、マスク１００上に存在する任意のパターン等を読み取ってもよいし、制御部２０１ａは、マスク１００の角部へ辺部を読み取ってもよい。また、制御部２０１ａは、マスク１００の高さから計算される認識マーク２５ｅを読み取ってもよい。 Further, in the present embodiment, the alignment mark 101 is provided on the mask 100, but the alignment mark 101 is not essential. When the alignment mark 101 is not provided, the control unit 201a may read an arbitrary pattern or the like existing on the mask 100, or the control unit 201a reads a side portion to the corner portion of the mask 100. May be good. Further, the control unit 201a may read the recognition mark 25e calculated from the height of the mask 100.
　＜第２の実施の形態＞
　本発明の第２の実施の形態は、台形型認識マークを被読取部に設ける形態である。以下、第２の実施の形態の露光装置２について説明する。第１の実施の形態の露光装置１と、第２の実施の形態の露光装置２との差異は被読取部のみであるため、以下、第２の実施の形態の露光装置における被読取部についてのみ説明する。また、第１の実施の形態と同一の部分については、同一の符号を付し、説明を省略する。 <Second Embodiment>
A second embodiment of the present invention is a form in which a trapezoidal recognition mark is provided on a read unit. Hereinafter, the exposure apparatus 2 of the second embodiment will be described. Since the difference between the exposure device 1 of the first embodiment and the exposure device 2 of the second embodiment is only the read unit, the read unit in the exposure device of the second embodiment will be described below. Only explain. Further, the same parts as those in the first embodiment are designated by the same reference numerals, and the description thereof will be omitted.
　露光装置２は、ステージ２０－１を有する。ステージ２０－１には、板状部材２１－１を介して被読取部２５－１が設けられている。図１２は、被読取部２５－１の概略構成を示す斜視図である。 The exposure device 2 has a stage 20-1. The stage 20-1 is provided with a read portion 25-1 via a plate-shaped member 21-1. FIG. 12 is a perspective view showing a schematic configuration of the read unit 25-1.
　被読取部２５－１は、主として、リブ２５Ａ－１、２５Ｂ－１を有する。リブ２５Ａ－１、２５Ｂ－１は、それぞれ、ガラス等の透明部材で形成された土台部２５ａ、２５ｂと、複数の台形型認識マーク４１が形成された板状部２５ｆと、を有する。板状部２５ｆは、リブ２５Ａ－１、２５Ｂ－１の上面であり、土台部２５ａ、２５ｂの上側（＋ｚ側）に接着部２５ｃにより貼着又は接着されている。 The read unit 25-1 mainly has ribs 25A-1 and 25B-1. The ribs 25A-1 and 25B-1 each have a base portion 25a and 25b formed of a transparent member such as glass, and a plate-shaped portion 25f on which a plurality of trapezoidal recognition marks 41 are formed. The plate-shaped portion 25f is the upper surface of the ribs 25A-1 and 25B-1, and is attached or adhered to the upper side (+ z side) of the base portions 25a and 25b by the adhesive portion 25c.
　台形型認識マーク４１の底面４１ｂ及び上面４１ｅは、板状部２５ｆと略平行である。台形型認識マーク４１の側面４１ｃ、４１ｄは、板状部２５ｆに対して傾斜する傾斜面である。 The bottom surface 41b and the top surface 41e of the trapezoidal recognition mark 41 are substantially parallel to the plate-shaped portion 25f. The side surfaces 41c and 41d of the trapezoidal recognition mark 41 are inclined surfaces that are inclined with respect to the plate-shaped portion 25f.
　このように構成された露光装置２の作用について説明する。以下の処理は、主として制御部２０１ａによって行われる。 The operation of the exposure apparatus 2 configured in this way will be described. The following processing is mainly performed by the control unit 201a.
　制御部２０１ａは、描画処理を行う前に、駆動部３９や移動機構１６１により読取部６０をステージ２０に近づける方向及びステージ２０から遠ざける方向に移動させながら、被読取部２５－１に設けられた台形型認識マーク４１を読み取る。制御部２０１ａは、台形型認識マーク４１の読取結果に基づいて読取部６０の特性、特に光軸の傾きを検知する。 The control unit 201a is provided on the read unit 25-1 while moving the reading unit 60 toward the stage 20 and away from the stage 20 by the driving unit 39 and the moving mechanism 161 before performing the drawing process. Read the trapezoidal recognition mark 41. The control unit 201a detects the characteristics of the reading unit 60, particularly the inclination of the optical axis, based on the reading result of the trapezoidal recognition mark 41.
　その後、制御部２０１ａは処理を描画処理に進める。制御部２０１ａは、ステージ２０の上面２０ａにマスク１００を載置して数時間経過した後で、読取部６０でマスク１００のアライメントマーク１０１を読み取る。また、制御部２０１ａは、読取部６０で辺２０ｂ近傍に設けられた被読取部２５の台形型認識マーク４１を読み取る。制御部２０１ａは、アライメントマーク１０１及び台形型認識マーク４１の読取結果に基づいてステージ２０、やマスク１００のｘ方向及びｙ方向の位置を検知する。 After that, the control unit 201a proceeds to the drawing process. The control unit 201a places the mask 100 on the upper surface 20a of the stage 20, and after several hours have passed, the reading unit 60 reads the alignment mark 101 of the mask 100. Further, the control unit 201a reads the trapezoidal recognition mark 41 of the read unit 25 provided in the vicinity of the side 20b by the reading unit 60. The control unit 201a detects the positions of the stage 20 and the mask 100 in the x-direction and the y-direction based on the reading results of the alignment mark 101 and the trapezoidal recognition mark 41.
　制御部２０１ａは、検知したマスク１００のｘ方向及びｙ方向の位置に基づいて、ステージ２０をｘ方向移動させつつ、光照射部３０の下側をマスク１００が通過するときに光照射部３０から光を照射して、マスク１００に対して描画処理を行う。 The control unit 201a moves the stage 20 in the x direction based on the detected positions of the mask 100 in the x and y directions, and when the mask 100 passes under the light irradiation unit 30, the light irradiation unit 30 The mask 100 is irradiated with light to perform drawing processing.
　本実施の形態によれば、台形型認識マーク４１を被読取部２５－１に設けることで、台形型認識マーク４１が設けられた交換式被読取部を用いることなく読取部６０の特性を検知することができる。 According to the present embodiment, by providing the trapezoidal recognition mark 41 on the read unit 25-1, the characteristics of the reading unit 60 can be detected without using the replaceable read unit provided with the trapezoidal recognition mark 41. can do.
　なお、本実施の形態では、被読取部２５－１に台形型認識マーク４１のみを設けたが、被読取部２５－１に１つだけ台形型認識マーク４１を設け、その他は認識マーク２５ｅを設けるようにしてもよい。 In the present embodiment, only the trapezoidal recognition mark 41 is provided on the read unit 25-1, but only one trapezoidal recognition mark 41 is provided on the read unit 25-1, and the other recognition marks 25e are provided. It may be provided.
　以上、この発明の実施形態を、図面を参照して詳述してきたが、具体的な構成はこの実施形態に限られるものではなく、この発明の要旨を逸脱しない範囲の設計変更等も含まれる。当業者であれば、実施形態の各要素を、適宜、変更、追加、変換等することが可能である。 Although the embodiment of the present invention has been described in detail with reference to the drawings, the specific configuration is not limited to this embodiment and includes design changes and the like within a range not deviating from the gist of the present invention. .. A person skilled in the art can appropriately change, add, convert, and the like each element of the embodiment.
　また、本発明において、「略」とは、厳密に同一である場合のみでなく、同一性を失わない程度の誤差や変形を含む概念である。例えば、略水平とは、厳密に水平の場合には限られず、例えば数度程度の誤差を含む概念である。また、例えば、略１０μｍとは、１０μｍに限らず、例えば１～３μｍ程度の誤差を含む概念である。また、例えば、単に平行、直交等と表現する場合において、厳密に平行、直交等の場合のみでなく、略平行、略直交等の場合を含むものとする。また、本発明において「近傍」とは、基準となる位置の近くのある範囲（任意に定めることができる）の領域を含むことを意味する。例えば、Ａの近傍という場合に、Ａの近くのある範囲の領域であって、Ａを含んでもいても含んでいなくてもよいことを示す概念である。 Further, in the present invention, "abbreviation" is a concept that includes not only the case of being exactly the same but also an error or deformation to the extent that the identity is not lost. For example, substantially horizontal is not limited to the case of being strictly horizontal, and is a concept including an error of, for example, several degrees. Further, for example, approximately 10 μm is not limited to 10 μm, but is a concept including an error of, for example, about 1 to 3 μm. Further, for example, in the case of simply expressing parallel, orthogonal, etc., not only the case of strictly parallel, orthogonal, etc., but also the case of substantially parallel, substantially orthogonal, etc. is included. Further, in the present invention, the "neighborhood" means to include a region of a certain range (which can be arbitrarily determined) near the reference position. For example, in the case of the vicinity of A, it is a concept indicating that it is a region in a certain range near A and may or may not include A.
１、２　　　：露光装置
１１　　　　：定盤
１１ａ　　　：上面
１２　　　　：板状部
１２ａ　　　：上面
１３、１４　：レール
１５　　　　：枠体
１５ａ　　　：支持部
１５ｃ　　　：柱
２０、２０－１：ステージ
２０ａ　　　：上面
２０ｂ、２０ｃ：辺
２１、２１－１：板状部材
２５、２５－１：被読取部
２５Ａ、２５Ａ－１、２５Ｂ、２５Ｂ－１：リブ
２５ａ、２５ｂ：土台部
２５ｃ　　　：接着部
２５ｄ、２５ｆ：板状部
２５ｅ　　　：認識マーク
３０（３０ａ～３０ｇ）：光照射部
３２ａ～３２ｇ：対物レンズ
３３ａ～３３ｇ：光源部
３４ａ～３４ｇ：ＡＦ処理部
３５ａ～３５ｇ：筒状部
３６ａ～３６ｇ：フランジ
３７ａ～３７ｇ：取付部
３８ａ～３８ｇ：取付部
３９（３９ａ～３９ｇ）：駆動部
４１　　　　：台形型認識マーク
４１ａ　　　：突起部
４１ｂ　　　：底面
４１ｃ、４１ｄ：側面
４１ｅ　　　：上面
５０、５１：レーザ干渉計
６０（６０ａ～６０ｇ）：読取部
７０、７０Ａ：ガイド部材
７１、７１Ａ：ガイド部本体
７２、７２Ａ、７３、７３Ａ：押さえリング
７４、７４Ａ：取付孔
７５、７６　：孔
８１、８２　：駆動部
１００　　　：マスク
１０１　　　：アライメントマーク
１５１　　　：底板
１５２　　　：側板
１５３　　　：支持板
１５４　　　：側板
１５５ａ～１５５ｇ、１５６ａ～１５６ｇ、１５７ａ～１５７ｇ：丸孔
１５９　　　：仕切り壁
１６０　　　：弾性部材
１６１　　　：移動機構
１６１ａ　　：ラック
１６１ｂ　　：ピニオン
１６１ｃ　　：アクチュエータ
１６３　　　：永電磁石
２０１　　　：ＣＰＵ
２０１ａ　　：制御部
２０２　　　：ＲＡＭ
２０３　　　：ＲＯＭ
２０４　　　：入出力インターフェース
２０５　　　：通信インターフェース
２０６　　　：メディアインターフェース
２１１　　　：入出力装置
２１２　　　：ネットワーク
２１３　　　：記憶媒体
３３１　　　：光源
３３２　　　：レンズ
３３３　　　：フライアイレンズ
３３４、３３５：レンズ
３３６　　　：ミラー
３４１　　　：ＡＦ用光源
３４２　　　：コリメータレンズ
３４３　　　：ＡＦ用シリンドリカルレンズ
３４４、３４５：ペンタプリズム
３４６　　　：レンズ
３４７、３４８：センサ
３７２　　　：中空部
３９１　　　：圧電素子
６０１　　　：鏡筒
６０２　　　：光源ユニット
６０３　　　：鏡筒
６０４　　　：チューブレンズ
６０５　　　：ハーフミラー
６０６　　　：カメラ
６２１　　　：光源
６２２　　　：光バンドルファイバ
６２３　　　：拡散板
６２４　　　：コリメータレンズ 1, 2: Exposure device 11: Plate 11a: Top surface 12: Plate-shaped portion 12a: Top surface 13, 14: Rail 15: Frame body 15a: Support portion 15c: Pillar 20, 20-1: Stage 20a: Top surface 20b, 20c : Sides 21, 21-1: Plate-shaped members 25, 25-1: Read portions 25A, 25A-1, 25B, 25B-1: Ribs 25a, 25b: Base portion 25c: Adhesive portion 25d, 25f: Plate-shaped portion 25e: Recognition mark 30 (30a to 30g): Light irradiation unit 32a to 32g: Objective lens 33a to 33g: Light source unit 34a to 34g: AF processing unit 35a to 35g: Cylindrical portion 36a to 36g: Flange 37a to 37g: Mounting Parts 38a to 38g: Mounting part 39 (39a to 39g): Drive part 41: Trapezoidal recognition mark 41a: Projection part 41b: Bottom surface 41c, 41d: Side surface 41e: Top surface 50, 51: Laser interferometer 60 (60a to 60g) : Reading unit 70, 70A: Guide member 71, 71A: Guide unit main body 72, 72A, 73, 73A: Pressing ring 74, 74A: Mounting hole 75, 76: Hole 81, 82: Drive unit 100: Mask 101: Alignment mark 151: Bottom plate 152: Side plate 153: Support plate 154: Side plate 155a to 155g, 156a to 156g, 157a to 157g: Round hole 159: Partition wall 160: Elastic member 161: Moving mechanism 161a: Rack 161b: Pinion 161c: Actuator 163: Permanent electromagnet 201: CPU
201a: Control unit 202: RAM
203: ROM
204: Input / output interface 205: Communication interface 206: Media interface 211: Input / output device 212: Network 213: Storage medium 331: Light source 332: Lens 333: Fly-eye lens 334: 335: Lens 336: Mirror 341: AF light source 342 : Collimeter lens 343: Cylindrical lens for AF 344, 345: Penta prism 346: Lens 347, 348: Sensor 372: Hollow part 391: piezoelectric element 601: Lens barrel 602: Light source unit 603: Lens barrel 604: Tube lens 605: Half Mirror 606: Camera 621: Light source 622: Optical bundle fiber 623: Diffusing plate 624: Collimeter lens

Claims (11)

  1. 　基板に対して露光を行う露光装置であって、
    　略水平な載置面に前記基板が載置される略板状のステージと、
    　前記ステージを水平面に略沿った第１方向に移動させる第１駆動部と、
    　前記ステージの上方に設けられた光照射部と、
    　前記光照射部に隣接して又は前記光照射部に設けられた読取部と、
    　前記光照射部及び前記読取部を鉛直方向に移動させる第２駆動部と、
    　前記載置面の前記第１方向と略直交する第２方向に沿った２つの辺のうちの少なくとも一方の近傍に設けられた被読取部であって、複数の認識マークを含む被読取部と、
    　を備え、
    　前記被読取部は、高さが変化するリブであって、前記第１方向に沿って設けられたリブを有し、
    　前記リブの底面は前記載置面に設けられており、
    　前記リブの前記底面と反対側の上面には、複数の前記認識マークが前記第１方向に沿って設けられている
    　ことを特徴とする露光装置。     An exposure device that exposes a substrate
    A substantially plate-shaped stage on which the substrate is placed on a substantially horizontal mounting surface,
    A first drive unit that moves the stage in a first direction substantially along a horizontal plane,
    A light irradiation unit provided above the stage and
    With a reading unit adjacent to or provided in the light irradiation unit,
    A second drive unit that moves the light irradiation unit and the reading unit in the vertical direction, and
    A read unit provided in the vicinity of at least one of two sides along a second direction substantially orthogonal to the first direction of the above-mentioned mounting surface, and includes a read unit including a plurality of recognition marks. ,
    With
    The read portion is a rib whose height changes, and has a rib provided along the first direction.
    The bottom surface of the rib is provided on the above-mentioned mounting surface.
    An exposure apparatus characterized in that a plurality of the recognition marks are provided along the first direction on the upper surface of the rib opposite to the bottom surface.
  2. 　前記リブは、前記第２方向に沿って隣接して設けられた第１リブ及び第２リブを有し、
    　前記第１リブの上面及び前記第２リブの上面は、傾きが略同じであり、
    　前記第１リブの最も高い位置における高さと、前記第２リブの最も低い位置における高さとが略同じである
    　ことを特徴とする請求項１に記載の露光装置。     The rib has a first rib and a second rib provided adjacent to each other along the second direction.
    The upper surface of the first rib and the upper surface of the second rib have substantially the same inclination.
    The exposure apparatus according to claim 1, wherein the height of the first rib at the highest position and the height of the second rib at the lowest position are substantially the same.
  3. 　前記第１駆動部は、前記ステージを前記第２方向に移動させ、
    　前記光照射部は、前記第２方向に沿って隣接して設けられた第１光照射部と第２光照射部とを有し、
    　前記読取部は、前記第１光照射部に隣接して又は前記第１光照射部に設けられた第１読取部と、前記第２光照射部に隣接して又は前記第２光照射部に設けられた第２読取部とを有し、
    　前記被読取部は、前記第２方向の位置が前記第１読取部と前記第２読取部との間に位置する
    　ことを特徴とする請求項１又は２に記載の露光装置。     The first drive unit moves the stage in the second direction.
    The light irradiation unit has a first light irradiation unit and a second light irradiation unit provided adjacent to each other along the second direction.
    The reading unit is adjacent to the first light irradiation unit or is provided on the first light irradiation unit, and is adjacent to the second light irradiation unit or on the second light irradiation unit. It has a second reading unit provided and
    The exposure apparatus according to claim 1 or 2, wherein the read unit is located between the first reading unit and the second reading unit in the second direction.
  4. 　前記被読取部は、前記ステージの前記第２方向に沿った２つの辺の近傍に設けられている
    　ことを特徴とする請求項１から３のいずれか一項に記載の露光装置。     The exposure apparatus according to any one of claims 1 to 3, wherein the read unit is provided in the vicinity of two sides of the stage along the second direction.
  5. 　前記認識マークは、前記読取部の開口数に基づいた大きさで前記リブに設けられる
    　ことを特徴とする請求項１から４のいずれか一項に記載の露光装置。     The exposure apparatus according to any one of claims 1 to 4, wherein the recognition mark has a size based on the numerical aperture of the reading unit and is provided on the rib.
  6. 　前記基板には、アライメントマークが設けられており、
    　前記第１駆動部により前記ステージを前記第１方向に移動させて前記読取部の視野内に前記アライメントマークを配置し、前記第２駆動部により前記基板の高さに合わせて前記光照射部及び前記読取部を鉛直方向に移動して、前記読取部で前記アライメントマークを読み取り、かつ、前記第１駆動部により前記ステージを前記第１方向に移動させて前記読取部の視野内に前記認識マークを配置し、前記読取部で前記認識マークを読み取る処理と、前記アライメントマーク及び前記認識マークを読み取った結果に基づいて前記光照射部から前記基板に光を照射する描画処理と、を行う制御部を備えた
    　ことを特徴とする請求項１から５のいずれか一項に記載の露光装置。     An alignment mark is provided on the substrate.
    The stage is moved in the first direction by the first drive unit to arrange the alignment mark in the field of view of the reading unit, and the light irradiation unit and the light irradiation unit are adjusted to the height of the substrate by the second drive unit. The reading unit is moved in the vertical direction, the alignment mark is read by the reading unit, and the stage is moved in the first direction by the first driving unit, and the recognition mark is in the field of view of the reading unit. A control unit that performs a process of reading the recognition mark by the reading unit and a drawing process of irradiating the substrate with light from the light irradiation unit based on the result of reading the alignment mark and the recognition mark. The exposure apparatus according to any one of claims 1 to 5, wherein the exposure apparatus is provided with.
  7. 　前記認識マークは、略５μｍ以上の厚みであり、略直交する４方向に突出する突起部を有する平面視略十字形状であり、
    　前記突起部の断面形状は、前記リブ側が広く、前記リブの反対側が狭い略台形形状であり、
    　前記突起部の両側の側面である第１側面及び第２側面は、前記上面に対して傾斜する傾斜面であり、前記第１側面の前記上面に対する傾斜角度の絶対値と、前記第２側面の前記上面に対する傾斜角度の絶対値との差が略１度以内であり、
    　前記制御部は、前記読取部を鉛直方向に移動させながら前記認識マークを読み取る
    　ことを特徴とする請求項６に記載の露光装置。     The recognition mark has a thickness of about 5 μm or more, and has a substantially cross-shaped plan view having protrusions protruding in four directions substantially orthogonal to each other.
    The cross-sectional shape of the protrusion is a substantially trapezoidal shape in which the rib side is wide and the opposite side of the rib is narrow.
    The first side surface and the second side surface, which are the side surfaces on both sides of the protrusion, are inclined surfaces that are inclined with respect to the upper surface, and the absolute value of the inclination angle of the first side surface with respect to the upper surface and the second side surface. The difference from the absolute value of the inclination angle with respect to the upper surface is within about 1 degree.
    The exposure apparatus according to claim 6, wherein the control unit reads the recognition mark while moving the reading unit in the vertical direction.
  8. 　前記ステージに着脱可能に設けられる略板状の交換式被読取部を備え、
    　前記認識マークは、略数１０ｎｍから略１μｍの厚みであり、
    　前記交換式被読取部には、略５μｍ以上の厚みであり、略直交する４方向に突出する突起部を有する平面視略十字形状の台形型認識マークが設けられており、
    　前記突起部の断面形状は、前記交換式被読取部を前記載置面に載置したときに、前記ステージ側が広く、前記ステージの反対側が狭い略台形形状であり、
    　前記突起部の両側の側面である第１側面及び第２側面は、前記交換式被読取部を前記載置面に載置したときに前記載置面に対して傾斜する傾斜面であり、前記第１側面の前記載置面に対する傾斜角度の絶対値と、前記第２側面の前記載置面に対する傾斜角度の絶対値との差が略１度以内であり、
    　前記制御部は、前記読取部を鉛直方向に移動させながら前記台形型認識マークを読み取る
    　ことを特徴とする請求項６に記載の露光装置。     It is provided with a substantially plate-shaped replaceable read unit provided on the stage so as to be removable.
    The recognition mark has a thickness of about 10 nm to about 1 μm.
    The interchangeable read portion is provided with a trapezoidal recognition mark having a thickness of about 5 μm or more and having protrusions protruding in four directions substantially orthogonal to each other in a substantially cross shape in a plan view.
    The cross-sectional shape of the protrusion is a substantially trapezoidal shape in which the stage side is wide and the opposite side of the stage is narrow when the replaceable read portion is placed on the above-mentioned mounting surface.
    The first side surface and the second side surface, which are the side surfaces on both sides of the protrusion, are inclined surfaces that are inclined with respect to the previously described mounting surface when the interchangeable read portion is placed on the previously described mounting surface. The difference between the absolute value of the tilt angle of the first side surface with respect to the previously described mounting surface and the absolute value of the tilt angle of the second side surface with respect to the previously described mounting surface is within approximately 1 degree.
    The exposure apparatus according to claim 6, wherein the control unit reads the trapezoidal recognition mark while moving the reading unit in the vertical direction.
  9. 　第１方向に沿って移動可能に設けられたステージの上方に設けられた光照射部を用いて基板に露光を行う露光方法であって、
    　前記ステージの略水平な面に前記基板を載置するステップと、
    　前記光照射部と、前記光照射部に隣接して又は前記光照射部に設けられた読取部とを前記基板の高さに合わせて鉛直方向に移動して、前記基板を前記読取部で読み取るステップと、
    　前記ステージの前記第１方向と略直交する第２方向に沿った２つの辺のうちの少なくとも一方の近傍に設けられた被読取部であって、前記ステージに設けられた高さが変化するリブの上面に前記第１方向に沿って複数設けられている認識マークを前記読取部で読み取るステップと、
    　前記基板の読取結果と、前記認識マークの読取結果とに基づいて、前記ステージを前記第１方向に移動させながら前記光照射部から前記基板に光を照射するステップと、
    　を含むことを特徴とする露光方法。     An exposure method in which a substrate is exposed using a light irradiation unit provided above a stage movably provided along a first direction.
    A step of placing the substrate on a substantially horizontal surface of the stage,
    The light irradiation unit and the reading unit adjacent to the light irradiation unit or provided in the light irradiation unit are moved in the vertical direction according to the height of the substrate, and the substrate is read by the reading unit. Steps and
    A rib to be read provided in the vicinity of at least one of two sides along a second direction substantially orthogonal to the first direction of the stage, and a rib provided on the stage whose height changes. A step of reading a plurality of recognition marks provided on the upper surface of the surface along the first direction by the reading unit, and
    Based on the reading result of the substrate and the reading result of the recognition mark, the step of irradiating the substrate with light from the light irradiation unit while moving the stage in the first direction.
    An exposure method comprising.
  10. 　前記基板を前記読取部で読み取るステップでは、前記基板に設けられたアライメントマークを前記読取部で読み取り、
    　前記光照射部から前記基板に光を照射するステップでは、前記アライメントマークの読取結果と、前記認識マークの読取結果とに基づいて前記基板に光を照射する
    　ことを特徴とする請求項９に記載の露光方法。     In the step of reading the substrate by the reading unit, the alignment mark provided on the substrate is read by the reading unit.
    The ninth aspect of the present invention, wherein in the step of irradiating the substrate with light from the light irradiation unit, the substrate is irradiated with light based on the reading result of the alignment mark and the reading result of the recognition mark. Exposure method.
  11. 　前記ステージに前記基板を載置する前に行う校正ステップを有し、
    　前記校正ステップは、
    　前記読取部を前記ステージに近づける方向及び前記ステージから遠ざける方向に移動させながら、厚さが略５μｍ以上で平面視略十字形状の台形型認識マークであって、前記ステージ側が広く上面側が狭い略台形形状の断面形状を有する台形型認識マークを前記読取部で読み取るステップと、
    　前記台形型認識マークの読取結果に基づいて前記読取部の光軸の傾きを検知するステップと、
    　を含み、
    　前記光照射部から前記基板に光を照射するステップでは、前記読取部の光軸の傾きに基づいて描画位置を調整する
    　ことを特徴とする請求項９又は１０に記載の露光方法。     It has a calibration step performed before mounting the substrate on the stage.
    The calibration step
    A trapezoidal recognition mark having a thickness of about 5 μm or more and a substantially cross-shaped cross-section while moving the reading unit closer to the stage and away from the stage, and the stage side is wide and the upper surface side is narrow. A step of reading a trapezoidal recognition mark having a cross-sectional shape with the reading unit,
    A step of detecting the inclination of the optical axis of the reading unit based on the reading result of the trapezoidal recognition mark, and
    Including
    The exposure method according to claim 9 or 10, wherein in the step of irradiating the substrate with light from the light irradiation unit, the drawing position is adjusted based on the inclination of the optical axis of the reading unit.
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