KR20190096577A - 프레임 일체형 마스크 및 프레임 일체형 마스크의 제조 방법 - Google Patents
프레임 일체형 마스크 및 프레임 일체형 마스크의 제조 방법 Download PDFInfo
- Publication number
- KR20190096577A KR20190096577A KR1020180016186A KR20180016186A KR20190096577A KR 20190096577 A KR20190096577 A KR 20190096577A KR 1020180016186 A KR1020180016186 A KR 1020180016186A KR 20180016186 A KR20180016186 A KR 20180016186A KR 20190096577 A KR20190096577 A KR 20190096577A
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- South Korea
- Prior art keywords
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- 238000000034 method Methods 0.000 title claims description 62
- 238000004519 manufacturing process Methods 0.000 claims abstract description 34
- 229910001374 Invar Inorganic materials 0.000 claims description 11
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 9
- QXZUUHYBWMWJHK-UHFFFAOYSA-N [Co].[Ni] Chemical compound [Co].[Ni] QXZUUHYBWMWJHK-UHFFFAOYSA-N 0.000 claims description 5
- 229910052759 nickel Inorganic materials 0.000 claims description 4
- 230000008569 process Effects 0.000 description 30
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 23
- 239000000853 adhesive Substances 0.000 description 22
- 230000001070 adhesive effect Effects 0.000 description 22
- 239000000463 material Substances 0.000 description 16
- 238000007747 plating Methods 0.000 description 16
- 238000000151 deposition Methods 0.000 description 15
- 230000008021 deposition Effects 0.000 description 13
- 238000010586 diagram Methods 0.000 description 13
- 239000010408 film Substances 0.000 description 13
- 238000003466 welding Methods 0.000 description 10
- 229910052751 metal Inorganic materials 0.000 description 9
- 239000002184 metal Substances 0.000 description 9
- 239000000758 substrate Substances 0.000 description 9
- 230000007547 defect Effects 0.000 description 7
- 230000005496 eutectics Effects 0.000 description 7
- 239000011368 organic material Substances 0.000 description 7
- 238000005530 etching Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 238000009713 electroplating Methods 0.000 description 5
- 239000012535 impurity Substances 0.000 description 5
- 230000002411 adverse Effects 0.000 description 4
- 230000008901 benefit Effects 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000007796 conventional method Methods 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- 239000007769 metal material Substances 0.000 description 3
- 229910044991 metal oxide Inorganic materials 0.000 description 3
- 150000004706 metal oxides Chemical class 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 239000007790 solid phase Substances 0.000 description 3
- 229910001111 Fine metal Inorganic materials 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 238000005137 deposition process Methods 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 238000005323 electroforming Methods 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- 210000004291 uterus Anatomy 0.000 description 2
- 101000869592 Daucus carota Major allergen Dau c 1 Proteins 0.000 description 1
- 101000650136 Homo sapiens WAS/WASL-interacting protein family member 3 Proteins 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 102100027539 WAS/WASL-interacting protein family member 3 Human genes 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 238000004026 adhesive bonding Methods 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000010405 anode material Substances 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- 239000010406 cathode material Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 229920001940 conductive polymer Polymers 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 239000002659 electrodeposit Substances 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000004680 force modulation microscopy Methods 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 238000005121 nitriding Methods 0.000 description 1
- 238000010943 off-gassing Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- H01L51/56—
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- H01L51/001—
-
- H01L51/0011—
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroluminescent Light Sources (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020180016186A KR20190096577A (ko) | 2018-02-09 | 2018-02-09 | 프레임 일체형 마스크 및 프레임 일체형 마스크의 제조 방법 |
CN201880086540.2A CN111656552A (zh) | 2018-02-09 | 2018-12-26 | 框架一体型掩模及框架一体型掩模的制造方法 |
PCT/KR2018/016653 WO2019156348A1 (ko) | 2018-02-09 | 2018-12-26 | 프레임 일체형 마스크 및 프레임 일체형 마스크의 제조 방법 |
TW108102259A TWI835771B (zh) | 2018-02-09 | 2019-01-21 | 框架一體型遮罩及框架一體型遮罩的製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020180016186A KR20190096577A (ko) | 2018-02-09 | 2018-02-09 | 프레임 일체형 마스크 및 프레임 일체형 마스크의 제조 방법 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020190067431A Division KR102142435B1 (ko) | 2019-06-07 | 2019-06-07 | 프레임 일체형 마스크 및 프레임 일체형 마스크의 제조 방법 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR20190096577A true KR20190096577A (ko) | 2019-08-20 |
Family
ID=67548478
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020180016186A KR20190096577A (ko) | 2018-02-09 | 2018-02-09 | 프레임 일체형 마스크 및 프레임 일체형 마스크의 제조 방법 |
Country Status (4)
Country | Link |
---|---|
KR (1) | KR20190096577A (zh) |
CN (1) | CN111656552A (zh) |
TW (1) | TWI835771B (zh) |
WO (1) | WO2019156348A1 (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20210065047A (ko) * | 2019-11-26 | 2021-06-03 | 주식회사 오럼머티리얼 | 프레임 일체형 마스크 제조용 프레임 및 그 제조 방법 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112725729A (zh) * | 2020-12-29 | 2021-04-30 | 天津市滨海新区微电子研究院 | 一种彩色硅基oled微显示器的制作方法及掩膜板 |
KR102618776B1 (ko) * | 2021-02-25 | 2023-12-29 | 주식회사 오럼머티리얼 | 프레임 일체형 마스크의 제조 방법 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100472012B1 (ko) * | 2001-12-17 | 2005-03-08 | 조수제 | 섀도우 마스크 및 그 제조 방법 |
KR100534580B1 (ko) * | 2003-03-27 | 2005-12-07 | 삼성에스디아이 주식회사 | 표시장치용 증착 마스크 및 그의 제조방법 |
JP2005042147A (ja) * | 2003-07-25 | 2005-02-17 | Dainippon Screen Mfg Co Ltd | 蒸着用マスクの製造方法および蒸着用マスク |
JP2010222687A (ja) * | 2009-03-25 | 2010-10-07 | Seiko Epson Corp | 成膜用マスク |
KR101742816B1 (ko) * | 2010-12-20 | 2017-06-02 | 삼성디스플레이 주식회사 | 마스크 프레임 조립체, 이의 제조 방법 및 이를 이용한 유기 발광 표시 장치의 제조 방법 |
KR20120105292A (ko) * | 2011-03-15 | 2012-09-25 | 삼성디스플레이 주식회사 | 증착 마스크 및 증착 마스크 제조 방법 |
US10597766B2 (en) * | 2013-03-26 | 2020-03-24 | Dai Nippon Printing Co., Ltd. | Vapor deposition mask, vapor deposition mask preparation body, method for producing vapor deposition mask, and method for producing organic semiconductor element |
JP5780350B2 (ja) * | 2013-11-14 | 2015-09-16 | 大日本印刷株式会社 | 蒸着マスク、フレーム付き蒸着マスク、及び有機半導体素子の製造方法 |
-
2018
- 2018-02-09 KR KR1020180016186A patent/KR20190096577A/ko active Application Filing
- 2018-12-26 WO PCT/KR2018/016653 patent/WO2019156348A1/ko active Application Filing
- 2018-12-26 CN CN201880086540.2A patent/CN111656552A/zh active Pending
-
2019
- 2019-01-21 TW TW108102259A patent/TWI835771B/zh active
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20210065047A (ko) * | 2019-11-26 | 2021-06-03 | 주식회사 오럼머티리얼 | 프레임 일체형 마스크 제조용 프레임 및 그 제조 방법 |
KR20230040971A (ko) * | 2019-11-26 | 2023-03-23 | 주식회사 오럼머티리얼 | 프레임 일체형 마스크 제조용 프레임 및 그 제조 방법 |
Also Published As
Publication number | Publication date |
---|---|
TWI835771B (zh) | 2024-03-21 |
CN111656552A (zh) | 2020-09-11 |
TW201936950A (zh) | 2019-09-16 |
WO2019156348A1 (ko) | 2019-08-15 |
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