KR20190040306A - OLED deposition metal mask and OLED deposition method - Google Patents

Abstract

In the OLED deposition metal mask and the OLED deposition method provided by the present invention, it is possible to reflect the deposition material and prevent the diffusion of the deposition material by providing a retaining wall at the edge of the opening of the metal mask, Is solved in the deposition region as much as possible so as to solve the technical problem of causing color mixture of the pixel region when depositing on the OLED substrate and thus the effect of displaying the light emission of the OLED is greatly improved.

Description

OLED deposition metal mask and OLED deposition method

The present invention relates to metal deposition techniques, and more particularly to OLED deposition metal masks and OLED deposition methods.

Organic light emitting diodes (OLED) displays are not only light but also thin and can emit spontaneously. They are widely applied to terminals such as smart phones and tablets because of their fast speeds. In the conventional technique, a method of forming a light emitting sub-pixel of an OLED employs a vapor deposition method, in which a metal mask is disposed between a deposition surface of an OLED substrate and an evaporation source, and the evaporation material is evaporated by heating, Lt; / RTI > to the corresponding sub-pixel region of the deposition surface. However, when the metal mask deposition method is liable to cause a shadow effect, that is, the deposition material is deposited on the first sub pixel region, the deposition material may diffuse out of the first sub pixel region, 3 sub-pixel region to cause color mixture, which affects the light-emitting display effect of the OLED.

The present invention provides an OLED deposition metal mask and an OLED deposition method for solving the technical problem of causing color mixing of a pixel region when depositing on an OLED substrate.

An OLED deposition metal mask according to the present invention includes a substrate, an opening passing through the substrate, and a retaining wall formed to protrude from one surface of the substrate, the retaining wall surrounding the edge of the opening, Is a reflective surface, and the retaining wall is used to isolate the opening from other portions of the substrate.

Wherein the inner surface of the retaining wall is a reflective surface having a V-shaped cross section.

Wherein a cross section of the retaining wall perpendicular to the substrate is an isosceles trapezoidal shape so that the inner surface opens outwardly of the opening.

Wherein an inner surface of the retaining wall includes an inclined surface connected to an edge of the opening and inclined away from the opening and a shielding surface connected to the inclined surface and perpendicular to the surface of the substrate.

Wherein a cross section of the retaining wall perpendicular to the substrate is L-shaped and the inner surface of the retaining wall forms two reflecting surfaces provided with steps.

Among them, the inner surface of the retaining wall is an arc surface protruding outward.

Wherein said retaining wall comprises a first portion connected to said substrate and a second portion connected to said first portion and made of a material different from the material of said first portion, The inner surface of the second portion is provided as a step to constitute the reflecting surface.

Wherein said retaining wall includes a first wall and a second wall, said first wall adjacent said edge of said opening, said second wall surrounding said first wall and also spaced from said first wall And an inner surface of the first wall facing the opening is opened to the outside of the opening to form the reflecting surface.

Wherein the retaining wall comprises a top surface, such as the substrate, and the top surface is planar, or the top surface is a curved surface.

The metal mask for vapor deposition according to the present invention comprises a substrate and an opening penetrating through the substrate, wherein a groove is formed on a surface of the substrate, the opening and the groove are spaced apart, and the space between the opening and the groove A retaining wall is formed.

The OLED deposition method according to the present invention comprises the steps of: establishing a plurality of deposition areas on the surface of an OLED panel; installing a metal mask between the deposition material and the surface of the OLED panel in a vacuum environment; And isolating the deposition region from the other deposition region by the retaining wall, and heating deposition.

A method for depositing OLEDs according to the present invention includes the steps of: establishing a plurality of deposition regions on the surface of an OLED panel, wherein isolation columns are provided between each of the two deposition regions; A method of fabricating a semiconductor device, the method comprising: providing a mask; placing an opening of the metal mask in a deposition area; inserting the isolation column into the recess; and a retaining wall between the recess and the opening, Isolating other deposition regions other than the region, and heating deposition.

The metal mask for OLED deposition provided by the present invention is characterized in that a retaining wall is provided on the edge of the opening of the substrate one by one and deposited on the OLED substrate by the OLED deposition method so that the deposition material diffuses out of the defined sub- Thereby preventing the color mixture from being caused, thereby improving the light emitting display effect of the OLED.

BRIEF DESCRIPTION OF THE DRAWINGS In order that the technical solution according to an embodiment of the present invention will be described more clearly, The accompanying drawings in the following description merely illustrate some embodiments of the invention and those skilled in the art will also appreciate that other drawings may also be derived based on these drawings without creative effort.
1 is a view showing a metal mask for an OLED deposition according to a first embodiment of the present invention.
2 is a view showing an effect of processing an OLED subpixel by a metal mask for OLED deposition according to the first embodiment of the present invention.
3 is a view showing an OLED deposition metal mask according to a second embodiment of the present invention.
4 is a view showing a metal mask for an OLED deposition according to a third embodiment of the present invention.
5 is a view showing an OLED deposition metal mask according to a fourth embodiment of the present invention.
6 is a view showing an OLED deposition metal mask according to a fifth embodiment of the present invention.
7 is a view showing an OLED deposition metal mask according to a sixth embodiment of the present invention.
8 is a view showing an OLED deposition metal mask according to a seventh embodiment of the present invention.
9 is a view showing an OLED deposition metal mask according to an eighth embodiment of the present invention.
10 is a view showing the effect of processing an OLED subpixel by an OLED deposition metal mask according to an eighth embodiment of the present invention.
11 is a flowchart of an OLED deposition method using a metal mask according to the second to seventh embodiments of the present invention.
12 is a flowchart of an OLED deposition method using a metal mask according to an eighth embodiment of the present invention.

Hereinafter, a technical solution according to an embodiment of the present invention will be described in detail with reference to the accompanying drawings of embodiments of the present invention.

Referring to Figure 1, the present invention provides a metal mask 100 for OLED deposition and is used to form subpixel regions of an OLED. The metal mask 100 includes a substrate 10, an opening 20 penetrating the substrate 10, and a retaining wall 30 surrounding the edge of the opening 20 do. The substrate 10 includes a first surface 11 and a second surface 12 opposite the first surface 11. The first surface 11 has a first surface 11, The opening 20 is truncated, i.e., the open end of the first surface is slightly smaller than the open end of the second surface, and the cross section of the opening 20 perpendicular to the substrate 10 is an isosceles trapezoid. The retaining wall 30 is formed to protrude from the first surface 11 of the substrate 10 and is formed to surround the edge of the opening 20.

The retaining wall 30 is used to isolate the opening 20 from other portions of the substrate 10. [ The retaining wall 30 includes an inner surface 301 facing the opening 20 and an upper surface 302 such as the substrate. The inner surface 301 is a reflective surface. The action of the inner surface 301 blocks and reflects the deposition material so that the deposition material does not diffuse to a location other than the defined deposition area of the OLED substrate. The upper surface 302 is a flat surface and the retaining wall 30 perpendicular to the substrate 10 is formed with an inclined surface that is open to the outside of the opening 20, Section is an isosceles trapezoid. The retaining wall 30 is formed of the same material. The material of the retaining wall 30 is iron, nickel, aluminum, or an alloy, or an organic material, or an inorganic material. The organic material is polyimide, acrylic resin or the like, and the inorganic material is SiNx or the like.

2, the OLED panel 200 includes an OLED substrate 210, a plurality of deposition regions 220 arranged in an array on the OLED substrate 210, a plurality of deposition regions 220 disposed in each of the two deposition regions 220, And includes a column 230. A deposition operation is performed on the deposition region 220 to form sub-pixels arranged in an array form. Because the subpixels have different colors, the OLED panel exhibits different colors, and the deposition area 220 also includes different deposition areas in which different colored materials are deposited. The deposition region 220 of the present application includes a first deposition region 2201 on which red is deposited, a second deposition region 2202 on which blue is deposited, and a third deposition region 2203 on which green is deposited . The OLED panel 200 is stacked on the metal mask 100 and the isolation pillars 230 are disposed on the first surface 11 and have a deposition region corresponding to the opening, Other deposition areas can be further isolated. The deposition material enters the deposition region 220 from the opening portion 20 and a part of the evaporation material is diffused into the retaining wall 30 to be blocked and reflected on the inner surface 301 of the retaining wall 30, The deposition material is diffused outside the prescribed sub-pixel region to avoid color mixture, and the OLED display effect is improved.

It is to be understood that the shape of the retaining wall 30 may be various, and the materials for forming the retaining walls 30 may be different from each other. Specifically, it can be selected in accordance with the use situation.

Referring to FIG. 3, the second embodiment of the present invention provides a metal mask 300, which differs from the first embodiment in that the metal mask 300 according to the present embodiment has the same structure as that of the retaining wall 330 of the metal mask 300 The inner surface 3301 is a reflecting surface having a V-shaped cross section, the diffusion path of the evaporation material is as shown in the drawing, the evaporation material is reflected by the reflection surface several times through the reflection surface, Is diffused into an area other than the opening to reduce the influence on other deposition areas.

Referring to FIG. 4, the third embodiment of the present invention provides a metal mask 400, which is different from the first and second embodiments. In the present embodiment, The inner surface 4301 of the retaining wall 430 includes an inclined surface 4301a connected to the edge of the opening 20 and inclined to be distanced from the opening portion and an inclined surface 4301b connected to the inclined surface 4301a, And a shielding surface 4301b perpendicular to the surface.

Referring to FIG. 5, the fourth embodiment of the present invention provides a metal mask 500, which differs from the first to third embodiments. In the fourth embodiment of the present invention, The inner surface 5301 of the retaining wall 530 is an outwardly projecting circular arc surface, and its upper surface 5302 is a curved surface. The end face of the retaining wall 530 perpendicular to the substrate 10 has a parabolic shape.

Referring to FIG. 6, the fifth embodiment of the present invention provides a metal mask 600, which differs from the first to fourth embodiments, The inner surface 6301 of the retaining wall 630 forms two stepped surfaces and the two stepped surfaces are inclined surfaces that extend outward in the direction away from the opening 10. [ The first step 631 provided on the first surface 11 of the substrate 10 forms an L-shaped short side of the substrate 10, And the second step 632 provided on the first step 631 forms an L-shaped long side. The deposition material is reflected many times on the reflecting surface provided by the step, thereby reducing the diffusion of the evaporation material to other areas than the opening 10. [

Referring to FIG. 7, the sixth embodiment of the present invention provides a metal mask 700, which is different from the first to fifth embodiments. In the sixth embodiment of the present invention, The retaining wall 730 includes a first portion 733 connected to the substrate 10 and a second portion 734 connected to the first portion 733. The constituent materials of the first portion 733 and the second portion 734 are different. The first portion 733 is provided so as to surround the edge of the opening 20. The second portion 734 is disposed above the first portion 733 and its edge is slightly spaced from the opening 20. The inner surface of the first portion 733 and the inner surface of the second portion 734 are provided in a stepped manner to form an inner surface 7301. The inner surface of the first portion 733, The inner surface of the second portion 734 is an inclined surface that extends outwardly in a direction away from the opening portion 20.

Referring to FIG. 8, the seventh embodiment of the present invention provides a metal mask 800, which is different from the first to sixth embodiments. In the present embodiment, The retaining wall 830 includes a first wall 835 and a second wall 836. The first wall 835 is adjacent the opening 20 and surrounds the edge of the opening 20 and the second wall 836 surrounds the first wall 835, (835). The inner surface 8301 of the first wall 835 facing the opening 20 opens outwardly of the opening 20 to form a reflecting surface. The cross-section of the first wall 835 and the second wall 836 perpendicular to the substrate 10 are all isosceles trapezoidal. In the present embodiment, the shape and material of the first wall 835 and the second wall 836 may be the same or different, and the shape of the first wall 835 and the second wall 836 may be the same as those of the first through sixth embodiments But it should be understood that it can be any shape.

Referring to Figs. 9 and 10, an eighth embodiment of the present invention provides a metal mask 900. Fig. The metal mask 900 includes a substrate 10, an opening 20 through the substrate 10, and a recess 940 formed in the first surface 11 of the substrate. The opening 20 and the groove 940 are spaced apart from each other and a retaining wall is formed between the opening 20 and the groove 940. The recesses 940 and the isolation pillars 230 of the OLED panel 200 are disposed to correspond to each other. The isolation column 230 may be inserted into the recess 940 so that the substrate 10 may approach the OLED substrate 210. In this case, the recesses 940 and the openings 20 prevents the evaporation material from diffusing into the area other than the opening 20. [

The metal masks according to the first to seventh embodiments of the present invention are all formed by a patterning process such as photoresist application, exposure, development, and etching. It mainly comprises the following steps:

In the first step, a first photoresist layer is coated on the surface of the metal mask substrate and a light transmitting region is formed in the first photoresist layer by a patterning process;

In the second step, etching is performed on the metal mask base material to form openings in portions of the metal mask base material that are located in the light-transmitting regions, and the first photoresist layer is removed;

In a third step, a second photoresist layer is coated on the other surface of the metal mask substrate and the second photoresist layer is patterned to define the pattern of the retaining wall;

In the fourth step, a retaining wall is formed according to the pattern of the retaining wall, and the material of the retaining wall is? ? ? to be.

Referring again to Figures 2 and 11, the present invention also provides a method of depositing OLEDs, wherein the present application exemplifies the use of the metal mask according to the first embodiment as the metal mask used in the OLED deposition process. OLED displays exhibit different colors because they form subpixels of different colors (typically three primary colors of red, green, and blue) arranged in an array by different organic luminescent materials. Therefore, it is necessary to deposit an organic light emitting material exhibiting a hue corresponding to a specific region. In the present application, the OLED deposition method includes the following steps.

In step S1, an OLED panel 200 is provided and a plurality of deposition areas 220 on the surface of the OLED panel are determined.

In this step, the plurality of deposition areas 220 are the material positions of the subpixels.

In step S2, the metal mask 100 is provided between the deposition material and the surface of the OLED panel 200 in a vacuum environment.

In this step, the OLED panel 200 is stacked on the metal mask 100, and with respect to the first to seventh embodiments, the isolation pillars 230 of the OLED panel 200 are formed on the metal mask 100, Is disposed on the first surface (11) of the substrate (100).

In the step S3, the opening 10 of the metal mask 100 is opposed to one deposition region 2201, and the deposition region 2201 and the other deposition regions 2201 are opposed to each other by the retaining wall 30 of the metal mask 100, . In this step, the deposition region 2201 is a material position of a subpixel of the same color.

In step S4, heating deposition is performed.

In this step, the heating deposition means heating the deposition material to evaporate and diffuse the deposition material to be adhered to the deposition area 2201. After the deposition of one deposition area 2201 is completed, the deposition material of another color is again selected, the metal mask is horizontally moved so that the opening of the metal mask is opposed to the next deposition area, and the above operation is repeated To form subpixels of different colors, i.e., the OLED deposition process is completed. In the deposition process, the retaining wall 30 can isolate the deposition region 2201 from the other deposition regions, thereby preventing color mixing.

Referring to FIG. 12, when the metal mask according to the eighth embodiment is used as a metal mask used in an OLED deposition process, the present application method includes the following steps:

Step S1: establishing a plurality of deposition regions of the surface of the OLED panel, wherein a separation column is provided between each of the two deposition regions;

Step S2: Install a metal mask between the deposition material and the OLED panel surface in a vacuum environment;

Step S3: The opening of the metal mask is opposed to one deposition area, and the isolation column 230 is inserted into the recess 940. A retaining wall 930 between the recess and the opening prevents the deposition area Isolating the deposition area other than the deposition area opposite to the opening;

Step S4: Heat deposition is performed.

In the OLED deposition metal mask and the OLED deposition method provided by the present application, it is possible to reflect the deposition material and prevent diffusion of the deposition material by providing a retaining wall in the metal mask, It is possible to prevent the occurrence of color mixture caused by the maximum retention in the deposition region and diffusion of the evaporation material to the other deposition region, and thus the effect of displaying the light emission of the OLED is greatly improved.

Claims (13)

And a retaining wall formed to protrude from one surface of the substrate, wherein the retaining wall surrounds an edge of the opening, and an inner surface facing the opening of the retaining wall is a reflective surface, Wherein the retaining wall is used to isolate the opening from another portion of the substrate.
The method according to claim 1,
Wherein the inner surface of the retaining wall is a reflective surface having a V-shaped cross section.
The method according to claim 1,
Wherein a cross-section of the retaining wall perpendicular to the substrate is an isosceles trapezoid, and the inner surface is opened to the outside of the opening.
The method according to claim 1,
Wherein an inner surface of the retaining wall includes an inclined surface connected to an edge of the opening and inclined to be away from the opening and a shielding surface connected to the inclined surface and perpendicular to the surface of the substrate. Metal mask.
The method according to claim 1,
Wherein the cross section of the retaining wall perpendicular to the substrate is L-shaped, and the inner surface of the retaining wall forms two reflecting surfaces provided with steps.
The method according to claim 1,
Wherein the inner surface of the retaining wall is an outwardly projecting circular arc surface.
The method according to claim 1,
Wherein the retaining wall comprises a first portion connected to the substrate and a second portion connected to the first portion and made of a material different from the material of the first portion, Wherein the inner surface of the metal mask is provided with a step to constitute the reflecting surface.
The method according to claim 1,
Wherein the retaining wall includes a first wall and a second wall, the first wall adjacent the edge of the opening, the second wall surrounding the first wall and spaced from the first wall, And an inner surface of the first wall facing the opening is opened to the outside of the opening to form the reflecting surface.
8. The method according to any one of claims 1 to 7,
Wherein the retaining wall comprises an upper surface such as the substrate and the upper surface is planar, or the upper surface is a curved surface.
The method according to claim 1,
Wherein the material of the retaining wall is iron, nickel, aluminum, or an alloy, or an organic material, or an inorganic material.
A substrate and an opening penetrating through the substrate, wherein a groove is formed on a surface of the substrate, the opening and the groove are spaced apart, and a retaining wall is formed between the opening and the groove. A vapor-wearing metal mask.
Determining a plurality of deposition areas of the surface of the OLED panel;
Providing a metal mask between the deposition material and the surface of the OLED panel in a vacuum environment,
Opposing the opening of the metal mask to one deposition region and isolating the deposition region from another deposition region by the retaining wall,
Heating deposition,
≪ / RTI >
Wherein a plurality of deposition regions of the surface of the OLED panel are defined, wherein isolation columns are provided between each of the two deposition regions,
Providing a metal mask between the deposition material and the OLED panel surface in a vacuum environment,
And a retaining wall between the recess and the opening separates the deposition area and a deposition area other than the deposition area opposite to the opening, , ≪ / RTI &
Heating deposition,
≪ / RTI >

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