CN105714249A - Mask plate, evaporation device and evaporation method - Google Patents
Mask plate, evaporation device and evaporation method Download PDFInfo
- Publication number
- CN105714249A CN105714249A CN201610242604.6A CN201610242604A CN105714249A CN 105714249 A CN105714249 A CN 105714249A CN 201610242604 A CN201610242604 A CN 201610242604A CN 105714249 A CN105714249 A CN 105714249A
- Authority
- CN
- China
- Prior art keywords
- mask plate
- substrate
- groove
- filmed
- plate body
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
Abstract
The invention discloses a mask plate, an evaporation device and an evaporation method. The mask plate comprises mask plate bodies, through holes are formed in the mask plate bodies, and grooves are formed in the positions, where the through holes are not formed, of the first surfaces of the mask plate bodies. During use, the through holes correspond to the color positions required to be coated, the mask plate bodies are close to a substrate, and light resistance separation pillars on the substrate are inserted into the positions of the grooves of the mask plate bodies, so that the gap between the upper end face of a metal mask and the substrate is reduced, and the color mixing problem caused by diffusing evaporation materials to other colors is effectively solved.
Description
Technical field
The present invention relates to evaporation process field, relate in particular to a kind of mask plate, evaporation coating device and evaporation coating method.
Background technology
Organic Light Emitting Diode (OLED) energy self-luminous, without visual angle obstacle, low temperature characteristics is good, and therefore OLED display has been considered as the flat faced display of new generation of most market value after liquid crystal display, plasma display.
The manufacturing process of OLED mostly adopts with ITO (indiumtinoxide) glass for substrate, utilizes evaporated device to be deposited sequentially on substrate by plural layers and is formed.OLED evaporation coating technique is for utilizing an evaporation source, and internal filling OLED material, evaporation source heating makes material sublimation or gasification under vacuum conditions, through metal mask, is deposited with on substrate.
In evaporation process, evaporation source is in lower section, as it is shown in figure 1, be provided with on metal mask 2 so that the through hole 21 that is deposited with, the gap between substrate 1 and metal mask 2 is more little, and shadow effect is more weak.But existing metal mask upper end level, owing to the photoresistance insulated column 11 of substrate has certain height so that gap cannot reduce further, for high-resolution substrate, evaporation material can diffuse in other color in certain degree, causes colour mixture.
Summary of the invention
For the problems referred to above, the embodiment of the present invention provides a kind of mask plate, evaporation coating device and evaporation coating method, and in order to solve the excesssive gap between metal mask and substrate, evaporation material can diffuse in other color in certain degree, the problem causing colour mixture.
To achieve these goals, technical scheme is as follows:
Mask plate, including mask plate body, described mask plate body is provided with through hole, it is characterised in that be not provided with through hole on the first surface of described mask plate body and be provided with groove.
In an alternate embodiment of the present invention where, described texturearunaperpendicular is square in the cross section in described mask plate body direction.
In an alternate embodiment of the present invention where, described texturearunaperpendicular is arcuate groove in the cross section in described mask plate body direction.
In an alternate embodiment of the present invention where, described texturearunaperpendicular is inverted trapezoidal groove in the cross section in described mask plate body direction.
In an alternate embodiment of the present invention where, groove is island distribution.
In an alternate embodiment of the present invention where, described groove is strip.
A kind of evaporation coating method, comprises the steps:
One above-mentioned mask plate is provided;
Thering is provided a substrate to be filmed, described substrate includes region to be filmed and multiple projection;
Described substrate to be filmed and described mask plate be arranged in parallel and para-position, make the described through hole of the corresponding described mask plate in region described to be filmed of described substrate, the described groove of the corresponding described mask plate of projection of described substrate;
Move described substrate to be filmed along being perpendicular to mask plate direction, make described substrate to be filmed near described mask plate to the described bottom portion of groove of described protruding insertion.
Also include: providing a vapor deposition source, described vapor deposition source and described mask plate are oppositely arranged and position is fixed.
In an alternate embodiment of the present invention where, described projection is photoresistance insulated column.
In an alternate embodiment of the present invention where, the degree of depth of described groove is more than or equal to the height of projection of described substrate.
During use, through hole is corresponding with the color position needing plated film, and by mask plate body near substrate, the photoresistance insulated column on substrate is made to insert the groove location on mask plate body, thus reducing gap between metal mask upper surface and substrate, it is prevented effectively from evaporation material to diffuse in other color, the problem causing colour mixture.
The feature of the present invention see graphic and better embodiment below the detailed description of this case and obtains and be well understood to.
Accompanying drawing explanation
Fig. 1 is the schematic diagram of prior art.
Fig. 2 is the schematic diagram of the embodiment of the present invention 1.
Fig. 3 is the schematic diagram of the embodiment of the present invention 2.
Fig. 4 is the schematic diagram of the embodiment of the present invention 3.
Fig. 5 is the schematic diagram of the embodiment of the present invention 4.
Detailed description of the invention
For the technological means making the present invention realize, creation characteristic, reach purpose and effect and be easy to understand, the present invention is expanded on further below in conjunction with specific embodiment.
Embodiment 1
Referring to Fig. 2, mask plate, including mask plate body 3, mask plate body being provided with through hole 31, the upper surface of mask plate body is provided with to hold the groove 32 of substrate surface photoresistance insulated column.
In the present embodiment, groove 32 is perpendicular to the cross section in mask plate body direction is inverted trapezoidal groove.
Adopt the concrete evaporation coating method of this mask plate, comprise the steps:
Thering is provided a substrate 1 to be filmed, substrate 1 to be filmed includes region to be filmed and multiple photoresistance insulated column 11;
Thering is provided a vapor deposition source, described vapor deposition source and described mask plate are oppositely arranged and position is fixed;
Substrate 1 to be filmed be arranged in parallel and para-position with mask plate body 3, makes the through hole 31 of the corresponding described mask plate in region to be filmed of described substrate 1, the inverted trapezoidal groove 32 of the corresponding mask plate of the photoresistance insulated column 11 of substrate 1;Move substrate 1 to be filmed along being perpendicular to mask plate body 3 direction, make substrate 1 to be filmed insert the bottom of inverted trapezoidal groove 32 to photoresistance insulated column 11 near described mask plate;It is deposited with by vapor deposition source.
Embodiment 2
Referring to Fig. 3, mask plate, including mask plate body, mask plate body being provided with through hole, the upper surface of mask plate body is provided with to hold the groove of substrate surface photoresistance insulated column.In the present embodiment, groove 33 is perpendicular to the cross section in described mask plate body direction is square.
Adopt the concrete evaporation coating method of this mask plate, comprise the steps:
Substrate 1 to be filmed be arranged in parallel and para-position with mask plate body 3, makes the through hole 31 of the corresponding described mask plate in region to be filmed of described substrate 1, the square groove 33 of the corresponding mask plate of the photoresistance insulated column 11 of substrate 1;Move substrate 1 to be filmed along being perpendicular to mask plate body 3 direction, make substrate 1 to be filmed insert the bottom of square groove 33 to photoresistance insulated column 11 near described mask plate;It is deposited with by vapor deposition source.
Embodiment 3
Referring to Fig. 4, mask plate, including mask plate body, mask plate body being provided with through hole, the upper surface of mask plate body is provided with to hold the groove of substrate surface photoresistance insulated column.In the present embodiment, groove 34 is perpendicular to the cross section in described mask plate body direction is arcuate groove.
Adopt the concrete evaporation coating method of this mask plate, comprise the steps:
Substrate 1 to be filmed be arranged in parallel and para-position with mask plate body 3, makes the through hole 31 of the corresponding described mask plate in region to be filmed of described substrate 1, the arcuate groove 34 of the corresponding mask plate of the photoresistance insulated column 11 of substrate 1;Move substrate 1 to be filmed along being perpendicular to mask plate body 3 direction, make substrate 1 to be filmed insert the bottom of arcuate groove 34 to photoresistance insulated column 11 near described mask plate;It is deposited with by vapor deposition source.
Embodiment 4
Referring to Fig. 5, mask plate, including mask plate body, mask plate body being provided with through hole, the upper surface of mask plate body is provided with to hold the groove of substrate surface photoresistance insulated column.In the present embodiment, groove 35 is strip.
Adopt the concrete evaporation coating method of this mask plate, comprise the steps:
Substrate 1 to be filmed be arranged in parallel and para-position with mask plate body 3, makes the through hole 31 of the corresponding described mask plate in region to be filmed of described substrate 1, the strip groove 35 of the corresponding mask plate of the photoresistance insulated column 11 of substrate 1;Move substrate 1 to be filmed along being perpendicular to mask plate body 3 direction, make substrate 1 to be filmed insert the bottom of strip groove 35 to photoresistance insulated column 11 near described mask plate;It is deposited with by vapor deposition source.
Embodiment 5
Mask plate, including mask plate body, mask plate body is provided with through hole, and the upper surface of mask plate body is provided with to hold the groove of substrate surface photoresistance insulated column.In the present embodiment, groove is island distribution.
The present invention reduces gap between metal mask upper surface and substrate, is prevented effectively from evaporation material and diffuses in other color, the problem causing colour mixture.The ultimate principle of the present invention, principal character and advantages of the present invention have more than been shown and described.Skilled person will appreciate that of the industry; the present invention is not restricted to the described embodiments; simply principles of the invention described in above-described embodiment and description; the present invention also has various changes and modifications without departing from the spirit and scope of the present invention, and these changes and improvements both fall within claimed the scope of the present invention.The protection domain of application claims is defined by appending claims and equivalent thereof.
Claims (11)
1. a mask plate, including mask plate body, described mask plate body is provided with through hole, it is characterised in that be not provided with described through hole on the first surface of described mask plate body and be provided with groove.
2. mask plate according to claim 1, it is characterised in that described groove is island distribution.
3. mask plate according to claim 2, it is characterised in that described texturearunaperpendicular is square in the cross section in described mask plate body direction.
4. mask plate according to claim 2, it is characterised in that described texturearunaperpendicular is arcuate groove in the cross section in described mask plate body direction.
5. mask plate according to claim 2, it is characterised in that described texturearunaperpendicular is inverted trapezoidal groove in the cross section in described mask plate body direction.
6. mask plate according to claim 1, it is characterised in that described groove is strip.
7. an evaporation coating device, including such as power 1 to the mask plate weighed as described in 6 any one.
8. an evaporation coating method, it is characterised in that comprise the steps:
There is provided just like power 1 to the mask plate weighed described in 6 any one;
Thering is provided a substrate to be filmed, described substrate includes region to be filmed and multiple projection;
Described substrate to be filmed and described mask plate be arranged in parallel and para-position, make the described through hole of the corresponding described mask plate in region described to be filmed of described substrate, the described groove of the corresponding described mask plate of projection of described substrate;And
Move described substrate to be filmed along being perpendicular to mask plate direction, make described substrate to be filmed near described mask plate to the described groove of described protruding insertion.
9. evaporation coating method according to claim 8, it is characterised in that also include: providing a vapor deposition source, described vapor deposition source and described mask plate are oppositely arranged and position is fixed.
10. evaporation coating method according to claim 8, it is characterised in that described projection is photoresistance insulated column.
11. evaporation coating method according to claim 8, it is characterised in that the degree of depth of described groove is more than or equal to the height of projection of described substrate.
Priority Applications (1)
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CN201610242604.6A CN105714249A (en) | 2016-04-19 | 2016-04-19 | Mask plate, evaporation device and evaporation method |
Applications Claiming Priority (1)
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CN201610242604.6A CN105714249A (en) | 2016-04-19 | 2016-04-19 | Mask plate, evaporation device and evaporation method |
Publications (1)
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CN105714249A true CN105714249A (en) | 2016-06-29 |
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Family Applications (1)
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CN201610242604.6A Pending CN105714249A (en) | 2016-04-19 | 2016-04-19 | Mask plate, evaporation device and evaporation method |
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Cited By (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106567052A (en) * | 2016-10-24 | 2017-04-19 | 武汉华星光电技术有限公司 | Mask plate and encapsulating method for OLED device |
CN106756780A (en) * | 2017-01-23 | 2017-05-31 | 京东方科技集团股份有限公司 | A kind of mask plate and sputter equipment for spatter film forming technique |
CN107460437A (en) * | 2017-09-08 | 2017-12-12 | 深圳市华星光电半导体显示技术有限公司 | The preparation method of metal mask plate, package assembling and OLED display screen |
CN107507915A (en) * | 2017-08-09 | 2017-12-22 | 武汉华星光电半导体显示技术有限公司 | A kind of substrate and evaporation coating device for manufacturing organic electroluminescence display panel |
CN107636191A (en) * | 2016-09-30 | 2018-01-26 | 深圳市柔宇科技有限公司 | Metal cover and OLED evaporation coating methods for OLED evaporations |
CN107699852A (en) * | 2017-09-12 | 2018-02-16 | 深圳市华星光电半导体显示技术有限公司 | Mask plate and its manufacture method, evaporation coating method |
CN108198956A (en) * | 2017-12-28 | 2018-06-22 | 武汉华星光电半导体显示技术有限公司 | Evaporation mask plate |
WO2018120288A1 (en) * | 2016-12-27 | 2018-07-05 | 武汉华星光电技术有限公司 | Packaging structure for oled protective film and packaging method therefor |
WO2018137328A1 (en) * | 2017-01-24 | 2018-08-02 | 京东方科技集团股份有限公司 | Evaporation mask plate, and manufacturing method and evaporation method therefor |
CN108546914A (en) * | 2018-05-07 | 2018-09-18 | 武汉华星光电半导体显示技术有限公司 | The mask plate and mask plate device of vapor deposition |
CN108559945A (en) * | 2018-04-25 | 2018-09-21 | 京东方科技集团股份有限公司 | A kind of vapor deposition mask plate |
CN108690951A (en) * | 2017-03-31 | 2018-10-23 | 乐金显示有限公司 | Deposition mas and the depositing device for using the deposition mas |
CN108866479A (en) * | 2018-07-25 | 2018-11-23 | 京东方科技集团股份有限公司 | Mask plate and mask assembly |
CN110692147A (en) * | 2017-12-13 | 2020-01-14 | 深圳市柔宇科技有限公司 | Mask plate for vacuum evaporation, evaporation method, display device and evaporation equipment |
CN111621743A (en) * | 2020-06-10 | 2020-09-04 | 京东方科技集团股份有限公司 | Mask plate |
WO2020199762A1 (en) * | 2019-04-01 | 2020-10-08 | 京东方科技集团股份有限公司 | Mask and evaporation device |
WO2021258892A1 (en) * | 2020-06-22 | 2021-12-30 | 京东方科技集团股份有限公司 | Mask for evaporation |
CN115537723A (en) * | 2022-10-25 | 2022-12-30 | 合肥维信诺科技有限公司 | Mask plate, substrate, evaporation device and evaporation method |
CN116162893A (en) * | 2023-02-17 | 2023-05-26 | 京东方科技集团股份有限公司 | Mask plate and evaporation device |
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CN105154823A (en) * | 2015-09-07 | 2015-12-16 | 信利(惠州)智能显示有限公司 | Evaporation masking plate and manufacturing method thereof |
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JPH08269685A (en) * | 1995-03-30 | 1996-10-15 | Sony Corp | Mask for forming thin-film pattern and film forming method using the same |
US20020025406A1 (en) * | 2000-08-25 | 2002-02-28 | Nec Corporation | Metal mask structure and method for maufacturing thereof |
CN103168114A (en) * | 2010-10-19 | 2013-06-19 | 夏普株式会社 | Vapor deposition device, vapor deposition method, and method for producing organic electroluminescence display device |
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Cited By (26)
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CN107636191B (en) * | 2016-09-30 | 2020-01-21 | 深圳市柔宇科技有限公司 | Metal mask for OLED evaporation and OLED evaporation method |
CN107636191A (en) * | 2016-09-30 | 2018-01-26 | 深圳市柔宇科技有限公司 | Metal cover and OLED evaporation coating methods for OLED evaporations |
WO2018058521A1 (en) * | 2016-09-30 | 2018-04-05 | 深圳市柔宇科技有限公司 | Metal mask for oled evaporation deposition and oled evaporation deposition method |
CN106567052B (en) * | 2016-10-24 | 2018-11-23 | 武汉华星光电技术有限公司 | The packaging method of mask plate and OLED device |
CN106567052A (en) * | 2016-10-24 | 2017-04-19 | 武汉华星光电技术有限公司 | Mask plate and encapsulating method for OLED device |
WO2018120288A1 (en) * | 2016-12-27 | 2018-07-05 | 武汉华星光电技术有限公司 | Packaging structure for oled protective film and packaging method therefor |
CN106756780A (en) * | 2017-01-23 | 2017-05-31 | 京东方科技集团股份有限公司 | A kind of mask plate and sputter equipment for spatter film forming technique |
US11155913B2 (en) | 2017-01-24 | 2021-10-26 | Boe Technology Group Co., Ltd. | Evaporation mask plate, manufacturing method thereof and evaporation method |
WO2018137328A1 (en) * | 2017-01-24 | 2018-08-02 | 京东方科技集团股份有限公司 | Evaporation mask plate, and manufacturing method and evaporation method therefor |
CN108690951A (en) * | 2017-03-31 | 2018-10-23 | 乐金显示有限公司 | Deposition mas and the depositing device for using the deposition mas |
CN108690951B (en) * | 2017-03-31 | 2020-07-24 | 乐金显示有限公司 | Deposition mask and deposition apparatus using the same |
CN107507915B (en) * | 2017-08-09 | 2019-09-13 | 武汉华星光电半导体显示技术有限公司 | A kind of substrate and evaporation coating device manufacturing organic light emitting display panel |
CN107507915A (en) * | 2017-08-09 | 2017-12-22 | 武汉华星光电半导体显示技术有限公司 | A kind of substrate and evaporation coating device for manufacturing organic electroluminescence display panel |
CN107460437A (en) * | 2017-09-08 | 2017-12-12 | 深圳市华星光电半导体显示技术有限公司 | The preparation method of metal mask plate, package assembling and OLED display screen |
WO2019051931A1 (en) * | 2017-09-12 | 2019-03-21 | 深圳市华星光电半导体显示技术有限公司 | Mask plate, and manufacturing method and evaporation method therefor |
CN107699852A (en) * | 2017-09-12 | 2018-02-16 | 深圳市华星光电半导体显示技术有限公司 | Mask plate and its manufacture method, evaporation coating method |
CN110692147A (en) * | 2017-12-13 | 2020-01-14 | 深圳市柔宇科技有限公司 | Mask plate for vacuum evaporation, evaporation method, display device and evaporation equipment |
CN108198956A (en) * | 2017-12-28 | 2018-06-22 | 武汉华星光电半导体显示技术有限公司 | Evaporation mask plate |
CN108559945A (en) * | 2018-04-25 | 2018-09-21 | 京东方科技集团股份有限公司 | A kind of vapor deposition mask plate |
CN108546914A (en) * | 2018-05-07 | 2018-09-18 | 武汉华星光电半导体显示技术有限公司 | The mask plate and mask plate device of vapor deposition |
CN108866479A (en) * | 2018-07-25 | 2018-11-23 | 京东方科技集团股份有限公司 | Mask plate and mask assembly |
WO2020199762A1 (en) * | 2019-04-01 | 2020-10-08 | 京东方科技集团股份有限公司 | Mask and evaporation device |
CN111621743A (en) * | 2020-06-10 | 2020-09-04 | 京东方科技集团股份有限公司 | Mask plate |
WO2021258892A1 (en) * | 2020-06-22 | 2021-12-30 | 京东方科技集团股份有限公司 | Mask for evaporation |
CN115537723A (en) * | 2022-10-25 | 2022-12-30 | 合肥维信诺科技有限公司 | Mask plate, substrate, evaporation device and evaporation method |
CN116162893A (en) * | 2023-02-17 | 2023-05-26 | 京东方科技集团股份有限公司 | Mask plate and evaporation device |
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