CN105714249A - Mask plate, evaporation device and evaporation method - Google Patents

Mask plate, evaporation device and evaporation method Download PDF

Info

Publication number
CN105714249A
CN105714249A CN201610242604.6A CN201610242604A CN105714249A CN 105714249 A CN105714249 A CN 105714249A CN 201610242604 A CN201610242604 A CN 201610242604A CN 105714249 A CN105714249 A CN 105714249A
Authority
CN
China
Prior art keywords
mask plate
substrate
groove
filmed
plate body
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201610242604.6A
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Chinese (zh)
Inventor
薛丽红
康润芳
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EverDisplay Optronics Shanghai Co Ltd
Original Assignee
EverDisplay Optronics Shanghai Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EverDisplay Optronics Shanghai Co Ltd filed Critical EverDisplay Optronics Shanghai Co Ltd
Priority to CN201610242604.6A priority Critical patent/CN105714249A/en
Publication of CN105714249A publication Critical patent/CN105714249A/en
Pending legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04Coating on selected surface areas, e.g. using masks
    • C23C14/042Coating on selected surface areas, e.g. using masks using masks
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12Organic material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation

Abstract

The invention discloses a mask plate, an evaporation device and an evaporation method. The mask plate comprises mask plate bodies, through holes are formed in the mask plate bodies, and grooves are formed in the positions, where the through holes are not formed, of the first surfaces of the mask plate bodies. During use, the through holes correspond to the color positions required to be coated, the mask plate bodies are close to a substrate, and light resistance separation pillars on the substrate are inserted into the positions of the grooves of the mask plate bodies, so that the gap between the upper end face of a metal mask and the substrate is reduced, and the color mixing problem caused by diffusing evaporation materials to other colors is effectively solved.

Description

Mask plate, evaporation coating device and evaporation coating method
Technical field
The present invention relates to evaporation process field, relate in particular to a kind of mask plate, evaporation coating device and evaporation coating method.
Background technology
Organic Light Emitting Diode (OLED) energy self-luminous, without visual angle obstacle, low temperature characteristics is good, and therefore OLED display has been considered as the flat faced display of new generation of most market value after liquid crystal display, plasma display.
The manufacturing process of OLED mostly adopts with ITO (indiumtinoxide) glass for substrate, utilizes evaporated device to be deposited sequentially on substrate by plural layers and is formed.OLED evaporation coating technique is for utilizing an evaporation source, and internal filling OLED material, evaporation source heating makes material sublimation or gasification under vacuum conditions, through metal mask, is deposited with on substrate.
In evaporation process, evaporation source is in lower section, as it is shown in figure 1, be provided with on metal mask 2 so that the through hole 21 that is deposited with, the gap between substrate 1 and metal mask 2 is more little, and shadow effect is more weak.But existing metal mask upper end level, owing to the photoresistance insulated column 11 of substrate has certain height so that gap cannot reduce further, for high-resolution substrate, evaporation material can diffuse in other color in certain degree, causes colour mixture.
Summary of the invention
For the problems referred to above, the embodiment of the present invention provides a kind of mask plate, evaporation coating device and evaporation coating method, and in order to solve the excesssive gap between metal mask and substrate, evaporation material can diffuse in other color in certain degree, the problem causing colour mixture.
To achieve these goals, technical scheme is as follows:
Mask plate, including mask plate body, described mask plate body is provided with through hole, it is characterised in that be not provided with through hole on the first surface of described mask plate body and be provided with groove.
In an alternate embodiment of the present invention where, described texturearunaperpendicular is square in the cross section in described mask plate body direction.
In an alternate embodiment of the present invention where, described texturearunaperpendicular is arcuate groove in the cross section in described mask plate body direction.
In an alternate embodiment of the present invention where, described texturearunaperpendicular is inverted trapezoidal groove in the cross section in described mask plate body direction.
In an alternate embodiment of the present invention where, groove is island distribution.
In an alternate embodiment of the present invention where, described groove is strip.
A kind of evaporation coating method, comprises the steps:
One above-mentioned mask plate is provided;
Thering is provided a substrate to be filmed, described substrate includes region to be filmed and multiple projection;
Described substrate to be filmed and described mask plate be arranged in parallel and para-position, make the described through hole of the corresponding described mask plate in region described to be filmed of described substrate, the described groove of the corresponding described mask plate of projection of described substrate;
Move described substrate to be filmed along being perpendicular to mask plate direction, make described substrate to be filmed near described mask plate to the described bottom portion of groove of described protruding insertion.
Also include: providing a vapor deposition source, described vapor deposition source and described mask plate are oppositely arranged and position is fixed.
In an alternate embodiment of the present invention where, described projection is photoresistance insulated column.
In an alternate embodiment of the present invention where, the degree of depth of described groove is more than or equal to the height of projection of described substrate.
During use, through hole is corresponding with the color position needing plated film, and by mask plate body near substrate, the photoresistance insulated column on substrate is made to insert the groove location on mask plate body, thus reducing gap between metal mask upper surface and substrate, it is prevented effectively from evaporation material to diffuse in other color, the problem causing colour mixture.
The feature of the present invention see graphic and better embodiment below the detailed description of this case and obtains and be well understood to.
Accompanying drawing explanation
Fig. 1 is the schematic diagram of prior art.
Fig. 2 is the schematic diagram of the embodiment of the present invention 1.
Fig. 3 is the schematic diagram of the embodiment of the present invention 2.
Fig. 4 is the schematic diagram of the embodiment of the present invention 3.
Fig. 5 is the schematic diagram of the embodiment of the present invention 4.
Detailed description of the invention
For the technological means making the present invention realize, creation characteristic, reach purpose and effect and be easy to understand, the present invention is expanded on further below in conjunction with specific embodiment.
Embodiment 1
Referring to Fig. 2, mask plate, including mask plate body 3, mask plate body being provided with through hole 31, the upper surface of mask plate body is provided with to hold the groove 32 of substrate surface photoresistance insulated column.
In the present embodiment, groove 32 is perpendicular to the cross section in mask plate body direction is inverted trapezoidal groove.
Adopt the concrete evaporation coating method of this mask plate, comprise the steps:
Thering is provided a substrate 1 to be filmed, substrate 1 to be filmed includes region to be filmed and multiple photoresistance insulated column 11;
Thering is provided a vapor deposition source, described vapor deposition source and described mask plate are oppositely arranged and position is fixed;
Substrate 1 to be filmed be arranged in parallel and para-position with mask plate body 3, makes the through hole 31 of the corresponding described mask plate in region to be filmed of described substrate 1, the inverted trapezoidal groove 32 of the corresponding mask plate of the photoresistance insulated column 11 of substrate 1;Move substrate 1 to be filmed along being perpendicular to mask plate body 3 direction, make substrate 1 to be filmed insert the bottom of inverted trapezoidal groove 32 to photoresistance insulated column 11 near described mask plate;It is deposited with by vapor deposition source.
Embodiment 2
Referring to Fig. 3, mask plate, including mask plate body, mask plate body being provided with through hole, the upper surface of mask plate body is provided with to hold the groove of substrate surface photoresistance insulated column.In the present embodiment, groove 33 is perpendicular to the cross section in described mask plate body direction is square.
Adopt the concrete evaporation coating method of this mask plate, comprise the steps:
Substrate 1 to be filmed be arranged in parallel and para-position with mask plate body 3, makes the through hole 31 of the corresponding described mask plate in region to be filmed of described substrate 1, the square groove 33 of the corresponding mask plate of the photoresistance insulated column 11 of substrate 1;Move substrate 1 to be filmed along being perpendicular to mask plate body 3 direction, make substrate 1 to be filmed insert the bottom of square groove 33 to photoresistance insulated column 11 near described mask plate;It is deposited with by vapor deposition source.
Embodiment 3
Referring to Fig. 4, mask plate, including mask plate body, mask plate body being provided with through hole, the upper surface of mask plate body is provided with to hold the groove of substrate surface photoresistance insulated column.In the present embodiment, groove 34 is perpendicular to the cross section in described mask plate body direction is arcuate groove.
Adopt the concrete evaporation coating method of this mask plate, comprise the steps:
Substrate 1 to be filmed be arranged in parallel and para-position with mask plate body 3, makes the through hole 31 of the corresponding described mask plate in region to be filmed of described substrate 1, the arcuate groove 34 of the corresponding mask plate of the photoresistance insulated column 11 of substrate 1;Move substrate 1 to be filmed along being perpendicular to mask plate body 3 direction, make substrate 1 to be filmed insert the bottom of arcuate groove 34 to photoresistance insulated column 11 near described mask plate;It is deposited with by vapor deposition source.
Embodiment 4
Referring to Fig. 5, mask plate, including mask plate body, mask plate body being provided with through hole, the upper surface of mask plate body is provided with to hold the groove of substrate surface photoresistance insulated column.In the present embodiment, groove 35 is strip.
Adopt the concrete evaporation coating method of this mask plate, comprise the steps:
Substrate 1 to be filmed be arranged in parallel and para-position with mask plate body 3, makes the through hole 31 of the corresponding described mask plate in region to be filmed of described substrate 1, the strip groove 35 of the corresponding mask plate of the photoresistance insulated column 11 of substrate 1;Move substrate 1 to be filmed along being perpendicular to mask plate body 3 direction, make substrate 1 to be filmed insert the bottom of strip groove 35 to photoresistance insulated column 11 near described mask plate;It is deposited with by vapor deposition source.
Embodiment 5
Mask plate, including mask plate body, mask plate body is provided with through hole, and the upper surface of mask plate body is provided with to hold the groove of substrate surface photoresistance insulated column.In the present embodiment, groove is island distribution.
The present invention reduces gap between metal mask upper surface and substrate, is prevented effectively from evaporation material and diffuses in other color, the problem causing colour mixture.The ultimate principle of the present invention, principal character and advantages of the present invention have more than been shown and described.Skilled person will appreciate that of the industry; the present invention is not restricted to the described embodiments; simply principles of the invention described in above-described embodiment and description; the present invention also has various changes and modifications without departing from the spirit and scope of the present invention, and these changes and improvements both fall within claimed the scope of the present invention.The protection domain of application claims is defined by appending claims and equivalent thereof.

Claims (11)

1. a mask plate, including mask plate body, described mask plate body is provided with through hole, it is characterised in that be not provided with described through hole on the first surface of described mask plate body and be provided with groove.
2. mask plate according to claim 1, it is characterised in that described groove is island distribution.
3. mask plate according to claim 2, it is characterised in that described texturearunaperpendicular is square in the cross section in described mask plate body direction.
4. mask plate according to claim 2, it is characterised in that described texturearunaperpendicular is arcuate groove in the cross section in described mask plate body direction.
5. mask plate according to claim 2, it is characterised in that described texturearunaperpendicular is inverted trapezoidal groove in the cross section in described mask plate body direction.
6. mask plate according to claim 1, it is characterised in that described groove is strip.
7. an evaporation coating device, including such as power 1 to the mask plate weighed as described in 6 any one.
8. an evaporation coating method, it is characterised in that comprise the steps:
There is provided just like power 1 to the mask plate weighed described in 6 any one;
Thering is provided a substrate to be filmed, described substrate includes region to be filmed and multiple projection;
Described substrate to be filmed and described mask plate be arranged in parallel and para-position, make the described through hole of the corresponding described mask plate in region described to be filmed of described substrate, the described groove of the corresponding described mask plate of projection of described substrate;And
Move described substrate to be filmed along being perpendicular to mask plate direction, make described substrate to be filmed near described mask plate to the described groove of described protruding insertion.
9. evaporation coating method according to claim 8, it is characterised in that also include: providing a vapor deposition source, described vapor deposition source and described mask plate are oppositely arranged and position is fixed.
10. evaporation coating method according to claim 8, it is characterised in that described projection is photoresistance insulated column.
11. evaporation coating method according to claim 8, it is characterised in that the degree of depth of described groove is more than or equal to the height of projection of described substrate.
CN201610242604.6A 2016-04-19 2016-04-19 Mask plate, evaporation device and evaporation method Pending CN105714249A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201610242604.6A CN105714249A (en) 2016-04-19 2016-04-19 Mask plate, evaporation device and evaporation method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201610242604.6A CN105714249A (en) 2016-04-19 2016-04-19 Mask plate, evaporation device and evaporation method

Publications (1)

Publication Number Publication Date
CN105714249A true CN105714249A (en) 2016-06-29

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Family Applications (1)

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Country Status (1)

Country Link
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Cited By (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106567052A (en) * 2016-10-24 2017-04-19 武汉华星光电技术有限公司 Mask plate and encapsulating method for OLED device
CN106756780A (en) * 2017-01-23 2017-05-31 京东方科技集团股份有限公司 A kind of mask plate and sputter equipment for spatter film forming technique
CN107460437A (en) * 2017-09-08 2017-12-12 深圳市华星光电半导体显示技术有限公司 The preparation method of metal mask plate, package assembling and OLED display screen
CN107507915A (en) * 2017-08-09 2017-12-22 武汉华星光电半导体显示技术有限公司 A kind of substrate and evaporation coating device for manufacturing organic electroluminescence display panel
CN107636191A (en) * 2016-09-30 2018-01-26 深圳市柔宇科技有限公司 Metal cover and OLED evaporation coating methods for OLED evaporations
CN107699852A (en) * 2017-09-12 2018-02-16 深圳市华星光电半导体显示技术有限公司 Mask plate and its manufacture method, evaporation coating method
CN108198956A (en) * 2017-12-28 2018-06-22 武汉华星光电半导体显示技术有限公司 Evaporation mask plate
WO2018120288A1 (en) * 2016-12-27 2018-07-05 武汉华星光电技术有限公司 Packaging structure for oled protective film and packaging method therefor
WO2018137328A1 (en) * 2017-01-24 2018-08-02 京东方科技集团股份有限公司 Evaporation mask plate, and manufacturing method and evaporation method therefor
CN108546914A (en) * 2018-05-07 2018-09-18 武汉华星光电半导体显示技术有限公司 The mask plate and mask plate device of vapor deposition
CN108559945A (en) * 2018-04-25 2018-09-21 京东方科技集团股份有限公司 A kind of vapor deposition mask plate
CN108690951A (en) * 2017-03-31 2018-10-23 乐金显示有限公司 Deposition mas and the depositing device for using the deposition mas
CN108866479A (en) * 2018-07-25 2018-11-23 京东方科技集团股份有限公司 Mask plate and mask assembly
CN110692147A (en) * 2017-12-13 2020-01-14 深圳市柔宇科技有限公司 Mask plate for vacuum evaporation, evaporation method, display device and evaporation equipment
CN111621743A (en) * 2020-06-10 2020-09-04 京东方科技集团股份有限公司 Mask plate
WO2020199762A1 (en) * 2019-04-01 2020-10-08 京东方科技集团股份有限公司 Mask and evaporation device
WO2021258892A1 (en) * 2020-06-22 2021-12-30 京东方科技集团股份有限公司 Mask for evaporation
CN115537723A (en) * 2022-10-25 2022-12-30 合肥维信诺科技有限公司 Mask plate, substrate, evaporation device and evaporation method
CN116162893A (en) * 2023-02-17 2023-05-26 京东方科技集团股份有限公司 Mask plate and evaporation device

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CN103205713A (en) * 2012-01-16 2013-07-17 昆山允升吉光电科技有限公司 Three-dimensional vapor plating mask plate
CN105154823A (en) * 2015-09-07 2015-12-16 信利(惠州)智能显示有限公司 Evaporation masking plate and manufacturing method thereof

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JPH08269685A (en) * 1995-03-30 1996-10-15 Sony Corp Mask for forming thin-film pattern and film forming method using the same
US20020025406A1 (en) * 2000-08-25 2002-02-28 Nec Corporation Metal mask structure and method for maufacturing thereof
CN103168114A (en) * 2010-10-19 2013-06-19 夏普株式会社 Vapor deposition device, vapor deposition method, and method for producing organic electroluminescence display device
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Cited By (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107636191B (en) * 2016-09-30 2020-01-21 深圳市柔宇科技有限公司 Metal mask for OLED evaporation and OLED evaporation method
CN107636191A (en) * 2016-09-30 2018-01-26 深圳市柔宇科技有限公司 Metal cover and OLED evaporation coating methods for OLED evaporations
WO2018058521A1 (en) * 2016-09-30 2018-04-05 深圳市柔宇科技有限公司 Metal mask for oled evaporation deposition and oled evaporation deposition method
CN106567052B (en) * 2016-10-24 2018-11-23 武汉华星光电技术有限公司 The packaging method of mask plate and OLED device
CN106567052A (en) * 2016-10-24 2017-04-19 武汉华星光电技术有限公司 Mask plate and encapsulating method for OLED device
WO2018120288A1 (en) * 2016-12-27 2018-07-05 武汉华星光电技术有限公司 Packaging structure for oled protective film and packaging method therefor
CN106756780A (en) * 2017-01-23 2017-05-31 京东方科技集团股份有限公司 A kind of mask plate and sputter equipment for spatter film forming technique
US11155913B2 (en) 2017-01-24 2021-10-26 Boe Technology Group Co., Ltd. Evaporation mask plate, manufacturing method thereof and evaporation method
WO2018137328A1 (en) * 2017-01-24 2018-08-02 京东方科技集团股份有限公司 Evaporation mask plate, and manufacturing method and evaporation method therefor
CN108690951A (en) * 2017-03-31 2018-10-23 乐金显示有限公司 Deposition mas and the depositing device for using the deposition mas
CN108690951B (en) * 2017-03-31 2020-07-24 乐金显示有限公司 Deposition mask and deposition apparatus using the same
CN107507915B (en) * 2017-08-09 2019-09-13 武汉华星光电半导体显示技术有限公司 A kind of substrate and evaporation coating device manufacturing organic light emitting display panel
CN107507915A (en) * 2017-08-09 2017-12-22 武汉华星光电半导体显示技术有限公司 A kind of substrate and evaporation coating device for manufacturing organic electroluminescence display panel
CN107460437A (en) * 2017-09-08 2017-12-12 深圳市华星光电半导体显示技术有限公司 The preparation method of metal mask plate, package assembling and OLED display screen
WO2019051931A1 (en) * 2017-09-12 2019-03-21 深圳市华星光电半导体显示技术有限公司 Mask plate, and manufacturing method and evaporation method therefor
CN107699852A (en) * 2017-09-12 2018-02-16 深圳市华星光电半导体显示技术有限公司 Mask plate and its manufacture method, evaporation coating method
CN110692147A (en) * 2017-12-13 2020-01-14 深圳市柔宇科技有限公司 Mask plate for vacuum evaporation, evaporation method, display device and evaporation equipment
CN108198956A (en) * 2017-12-28 2018-06-22 武汉华星光电半导体显示技术有限公司 Evaporation mask plate
CN108559945A (en) * 2018-04-25 2018-09-21 京东方科技集团股份有限公司 A kind of vapor deposition mask plate
CN108546914A (en) * 2018-05-07 2018-09-18 武汉华星光电半导体显示技术有限公司 The mask plate and mask plate device of vapor deposition
CN108866479A (en) * 2018-07-25 2018-11-23 京东方科技集团股份有限公司 Mask plate and mask assembly
WO2020199762A1 (en) * 2019-04-01 2020-10-08 京东方科技集团股份有限公司 Mask and evaporation device
CN111621743A (en) * 2020-06-10 2020-09-04 京东方科技集团股份有限公司 Mask plate
WO2021258892A1 (en) * 2020-06-22 2021-12-30 京东方科技集团股份有限公司 Mask for evaporation
CN115537723A (en) * 2022-10-25 2022-12-30 合肥维信诺科技有限公司 Mask plate, substrate, evaporation device and evaporation method
CN116162893A (en) * 2023-02-17 2023-05-26 京东方科技集团股份有限公司 Mask plate and evaporation device

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Application publication date: 20160629