KR20190021186A - 불활성 연마 입자의 분리 및 현탁을 위한 젤라틴성 입자의 안정한 현탁액의 현장 형성법 - Google Patents

불활성 연마 입자의 분리 및 현탁을 위한 젤라틴성 입자의 안정한 현탁액의 현장 형성법 Download PDF

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Publication number
KR20190021186A
KR20190021186A KR1020187010315A KR20187010315A KR20190021186A KR 20190021186 A KR20190021186 A KR 20190021186A KR 1020187010315 A KR1020187010315 A KR 1020187010315A KR 20187010315 A KR20187010315 A KR 20187010315A KR 20190021186 A KR20190021186 A KR 20190021186A
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KR
South Korea
Prior art keywords
particles
suspended
gel
inert
suspension
Prior art date
Application number
KR1020187010315A
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English (en)
Korean (ko)
Inventor
얼 이. 워드
Original Assignee
피피티 리서치 , 인코포레이티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US15/191,294 external-priority patent/US20160304748A1/en
Application filed by 피피티 리서치 , 인코포레이티드 filed Critical 피피티 리서치 , 인코포레이티드
Publication of KR20190021186A publication Critical patent/KR20190021186A/ko

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M103/00—Lubricating compositions characterised by the base-material being an inorganic material
    • C10M103/06—Metal compounds

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Colloid Chemistry (AREA)
KR1020187010315A 2016-06-23 2017-06-22 불활성 연마 입자의 분리 및 현탁을 위한 젤라틴성 입자의 안정한 현탁액의 현장 형성법 KR20190021186A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US15/191,294 2016-06-23
US15/191,294 US20160304748A1 (en) 2009-09-23 2016-06-23 In Situ Formation of Stable Aqueous, Semi-Aqueous or Non-Aqueous Slurry Suspensions of Gelatinous Particles for Separating and Suspending Inert and Abrasive Particles in a Carrier Medium
PCT/US2017/038737 WO2017223308A1 (en) 2016-06-23 2017-06-22 In situ formation of stable slurry suspensions of gelatinous particles for separating and suspending inert abrasive particles

Publications (1)

Publication Number Publication Date
KR20190021186A true KR20190021186A (ko) 2019-03-05

Family

ID=60784701

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020187010315A KR20190021186A (ko) 2016-06-23 2017-06-22 불활성 연마 입자의 분리 및 현탁을 위한 젤라틴성 입자의 안정한 현탁액의 현장 형성법

Country Status (4)

Country Link
JP (1) JP7116872B2 (ja)
KR (1) KR20190021186A (ja)
CN (1) CN108137991A (ja)
WO (1) WO2017223308A1 (ja)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108822739A (zh) * 2018-09-17 2018-11-16 珠海琴晟新材料有限公司 一种抛光液及其制备方法
CN109575818A (zh) * 2018-12-28 2019-04-05 天津洙诺科技有限公司 一种低钠抛光液及其制备方法和应用
CN110903810A (zh) * 2019-11-18 2020-03-24 宁波日晟新材料有限公司 一种亲水非油性无水陶瓷材料悬浮剂及其制备方法和应用
EP3977959B1 (de) * 2020-09-30 2024-07-31 Ivoclar Vivadent AG Verfahren zur herstellung eines dentalen formkörpers
CN112518571A (zh) * 2020-11-27 2021-03-19 华虹半导体(无锡)有限公司 铜化学机械研磨方法和设备
CN115339121B (zh) * 2021-05-12 2024-06-07 华侨大学 一种柔性溶胶凝胶抛光块体的制备方法
WO2024162437A1 (ja) * 2023-02-02 2024-08-08 三井金属鉱業株式会社 研磨材スラリー

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3663284A (en) * 1970-01-09 1972-05-16 Marine Colloids Inc Titanium dioxide suspensions
US4376655A (en) * 1982-02-17 1983-03-15 Scm Corporation Production of an optically efficient titanium slurry
US4693751A (en) * 1984-08-23 1987-09-15 Crompton & Knowles Corporation Titanium dioxide suspension for use in film coating
DE19543204C2 (de) * 1995-11-20 1997-09-18 Bayer Ag Verfahren zur Herstellung von nanodispersem Titandioxid und seine Verwendung
US7053125B2 (en) 2002-11-14 2006-05-30 The Board Of Trustees Of The University Of Illinois Controlled dispersion of colloidal suspension by comb polymers
US7100400B2 (en) * 2003-03-04 2006-09-05 Furukawa Electric Na Manufacture of silica bodies using sol-gel techniques
JP5105470B2 (ja) 2007-02-22 2012-12-26 協和化学工業株式会社 懸濁安定性を有する懸濁液組成物
JP5539321B2 (ja) 2008-04-24 2014-07-02 ピーピーティー リサーチ，インク． 安定な水性スラリー懸濁物
US9394502B2 (en) 2008-04-28 2016-07-19 Ppt Research, Inc. Stable aqueous slurry suspensions
US7985719B2 (en) 2008-04-28 2011-07-26 Ward Irl E Cutting and lubricating composition for use with a wire cutting apparatus
TW201240723A (en) * 2011-04-14 2012-10-16 Ppt Res Inc Stable aqueous slurry suspensions
US10822524B2 (en) 2017-12-14 2020-11-03 Rohm And Haas Electronic Materials Cmp Holdings, I Aqueous compositions of low dishing silica particles for polysilicon polishing

Also Published As

Publication number Publication date
WO2017223308A1 (en) 2017-12-28
CN108137991A (zh) 2018-06-08
JP2019520989A (ja) 2019-07-25
JP7116872B2 (ja) 2022-08-12

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