CN108137991A - 用于分离和悬浮惰性磨料颗粒的凝胶状颗粒的稳定的浆料悬浮体的原位形成 - Google Patents

用于分离和悬浮惰性磨料颗粒的凝胶状颗粒的稳定的浆料悬浮体的原位形成 Download PDF

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Publication number
CN108137991A
CN108137991A CN201780003720.5A CN201780003720A CN108137991A CN 108137991 A CN108137991 A CN 108137991A CN 201780003720 A CN201780003720 A CN 201780003720A CN 108137991 A CN108137991 A CN 108137991A
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CN
China
Prior art keywords
particle
suspended
gel
mounting medium
gel particle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
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CN201780003720.5A
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English (en)
Chinese (zh)
Inventor
I.E.沃德
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
PPT Research Inc
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PPT Research Inc
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Publication date
Priority claimed from US15/191,294 external-priority patent/US20160304748A1/en
Application filed by PPT Research Inc filed Critical PPT Research Inc
Publication of CN108137991A publication Critical patent/CN108137991A/zh
Pending legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09GPOLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00Polishing compositions
    • C09G1/02Polishing compositions containing abrasives or grinding agents
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10MLUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M103/00Lubricating compositions characterised by the base-material being an inorganic material
    • C10M103/06Metal compounds

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Colloid Chemistry (AREA)
CN201780003720.5A 2016-06-23 2017-06-22 用于分离和悬浮惰性磨料颗粒的凝胶状颗粒的稳定的浆料悬浮体的原位形成 Pending CN108137991A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US15/191,294 US20160304748A1 (en) 2009-09-23 2016-06-23 In Situ Formation of Stable Aqueous, Semi-Aqueous or Non-Aqueous Slurry Suspensions of Gelatinous Particles for Separating and Suspending Inert and Abrasive Particles in a Carrier Medium
US15/191,294 2016-06-23
PCT/US2017/038737 WO2017223308A1 (en) 2016-06-23 2017-06-22 In situ formation of stable slurry suspensions of gelatinous particles for separating and suspending inert abrasive particles

Publications (1)

Publication Number Publication Date
CN108137991A true CN108137991A (zh) 2018-06-08

Family

ID=60784701

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201780003720.5A Pending CN108137991A (zh) 2016-06-23 2017-06-22 用于分离和悬浮惰性磨料颗粒的凝胶状颗粒的稳定的浆料悬浮体的原位形成

Country Status (4)

Country Link
JP (1) JP7116872B2 (ja)
KR (1) KR20190021186A (ja)
CN (1) CN108137991A (ja)
WO (1) WO2017223308A1 (ja)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108822739A (zh) * 2018-09-17 2018-11-16 珠海琴晟新材料有限公司 一种抛光液及其制备方法
CN109575818A (zh) * 2018-12-28 2019-04-05 天津洙诺科技有限公司 一种低钠抛光液及其制备方法和应用
CN110903810A (zh) * 2019-11-18 2020-03-24 宁波日晟新材料有限公司 一种亲水非油性无水陶瓷材料悬浮剂及其制备方法和应用
CN112518571A (zh) * 2020-11-27 2021-03-19 华虹半导体(无锡)有限公司 铜化学机械研磨方法和设备
CN114349499A (zh) * 2020-09-30 2022-04-15 义获嘉伟瓦登特公司 用于制备牙科成型体的方法
WO2022237200A1 (zh) * 2021-05-12 2022-11-17 华侨大学 一种柔性溶胶凝胶抛光块体的制备方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2024162437A1 (ja) * 2023-02-02 2024-08-08 三井金属鉱業株式会社 研磨材スラリー

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3663284A (en) * 1970-01-09 1972-05-16 Marine Colloids Inc Titanium dioxide suspensions
US20040096469A1 (en) * 2002-11-14 2004-05-20 Lewis Jennifer A. Controlled dispersion of colloidal suspensions by comb polymers
CN102027101A (zh) * 2008-04-24 2011-04-20 Ppt研究公司 稳定的水性浆料悬浮体
TW201240723A (en) * 2011-04-14 2012-10-16 Ppt Res Inc Stable aqueous slurry suspensions

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4376655A (en) * 1982-02-17 1983-03-15 Scm Corporation Production of an optically efficient titanium slurry
US4693751A (en) * 1984-08-23 1987-09-15 Crompton & Knowles Corporation Titanium dioxide suspension for use in film coating
DE19543204C2 (de) * 1995-11-20 1997-09-18 Bayer Ag Verfahren zur Herstellung von nanodispersem Titandioxid und seine Verwendung
US7100400B2 (en) * 2003-03-04 2006-09-05 Furukawa Electric Na Manufacture of silica bodies using sol-gel techniques
JP5105470B2 (ja) 2007-02-22 2012-12-26 協和化学工業株式会社 懸濁安定性を有する懸濁液組成物
US9394502B2 (en) 2008-04-28 2016-07-19 Ppt Research, Inc. Stable aqueous slurry suspensions
US7985719B2 (en) 2008-04-28 2011-07-26 Ward Irl E Cutting and lubricating composition for use with a wire cutting apparatus
US10822524B2 (en) 2017-12-14 2020-11-03 Rohm And Haas Electronic Materials Cmp Holdings, I Aqueous compositions of low dishing silica particles for polysilicon polishing

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3663284A (en) * 1970-01-09 1972-05-16 Marine Colloids Inc Titanium dioxide suspensions
US20040096469A1 (en) * 2002-11-14 2004-05-20 Lewis Jennifer A. Controlled dispersion of colloidal suspensions by comb polymers
CN102027101A (zh) * 2008-04-24 2011-04-20 Ppt研究公司 稳定的水性浆料悬浮体
TW201240723A (en) * 2011-04-14 2012-10-16 Ppt Res Inc Stable aqueous slurry suspensions

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108822739A (zh) * 2018-09-17 2018-11-16 珠海琴晟新材料有限公司 一种抛光液及其制备方法
CN109575818A (zh) * 2018-12-28 2019-04-05 天津洙诺科技有限公司 一种低钠抛光液及其制备方法和应用
CN110903810A (zh) * 2019-11-18 2020-03-24 宁波日晟新材料有限公司 一种亲水非油性无水陶瓷材料悬浮剂及其制备方法和应用
CN114349499A (zh) * 2020-09-30 2022-04-15 义获嘉伟瓦登特公司 用于制备牙科成型体的方法
CN112518571A (zh) * 2020-11-27 2021-03-19 华虹半导体(无锡)有限公司 铜化学机械研磨方法和设备
WO2022237200A1 (zh) * 2021-05-12 2022-11-17 华侨大学 一种柔性溶胶凝胶抛光块体的制备方法

Also Published As

Publication number Publication date
WO2017223308A1 (en) 2017-12-28
JP2019520989A (ja) 2019-07-25
KR20190021186A (ko) 2019-03-05
JP7116872B2 (ja) 2022-08-12

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Application publication date: 20180608