KR20180120603A - 콤팩트 편향 자석 - Google Patents

콤팩트 편향 자석 Download PDF

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Publication number
KR20180120603A
KR20180120603A KR1020180047916A KR20180047916A KR20180120603A KR 20180120603 A KR20180120603 A KR 20180120603A KR 1020180047916 A KR1020180047916 A KR 1020180047916A KR 20180047916 A KR20180047916 A KR 20180047916A KR 20180120603 A KR20180120603 A KR 20180120603A
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KR
South Korea
Prior art keywords
coils
yokes
magnet
type
axis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020180047916A
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English (en)
Korean (ko)
Inventor
로이 이. 랜드
비탈리 지스킨
Original Assignee
이마트렉스, 인코퍼레이티드
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Application filed by 이마트렉스, 인코퍼레이티드 filed Critical 이마트렉스, 인코퍼레이티드
Publication of KR20180120603A publication Critical patent/KR20180120603A/ko
Ceased legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1472—Deflecting along given lines
    • H01J37/1474—Scanning means
    • H01J37/1475—Scanning means magnetic
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/08—Deviation, concentration or focusing of the beam by electric or magnetic means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F7/00—Magnets
    • H01F7/02—Permanent magnets [PM]
    • H01F7/0273—Magnetic circuits with PM for magnetic field generation
    • H01F7/0278—Magnetic circuits with PM for magnetic field generation for generating uniform fields, focusing, deflecting electrically charged particles
    • H01F7/0284—Magnetic circuits with PM for magnetic field generation for generating uniform fields, focusing, deflecting electrically charged particles using a trimmable or adjustable magnetic circuit, e.g. for a symmetric dipole or quadrupole magnetic field
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
    • H01J29/58—Arrangements for focusing or reflecting ray or beam
    • H01J29/64—Magnetic lenses
    • H01J29/66—Magnetic lenses using electromagnetic means only
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
    • H01J29/70—Arrangements for deflecting ray or beam
    • H01J29/72—Arrangements for deflecting ray or beam along one straight line or along two perpendicular straight lines
    • H01J29/76—Deflecting by magnetic fields only
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/14—Lenses magnetic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
    • H05H7/04—Magnet systems, e.g. undulators, wigglers; Energisation thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/152—Magnetic means
    • H01J2237/1526—For X-Y scanning
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2803—Scanning microscopes characterised by the imaging method
    • H01J2237/2806—Secondary charged particle
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/31749—Focused ion beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/266—Measurement of magnetic or electric fields in the object; Lorentzmicroscopy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Power Engineering (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Particle Accelerators (AREA)
KR1020180047916A 2017-04-27 2018-04-25 콤팩트 편향 자석 Ceased KR20180120603A (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US201762491122P 2017-04-27 2017-04-27
US62/491,122 2017-04-27
US15/625,921 US10290463B2 (en) 2017-04-27 2017-06-16 Compact deflecting magnet
US15/625,921 2017-06-16

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020190142935A Division KR102088144B1 (ko) 2017-04-27 2019-11-08 콤팩트 편향 자석

Publications (1)

Publication Number Publication Date
KR20180120603A true KR20180120603A (ko) 2018-11-06

Family

ID=62062890

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020180047916A Ceased KR20180120603A (ko) 2017-04-27 2018-04-25 콤팩트 편향 자석
KR1020190142935A Expired - Fee Related KR102088144B1 (ko) 2017-04-27 2019-11-08 콤팩트 편향 자석

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020190142935A Expired - Fee Related KR102088144B1 (ko) 2017-04-27 2019-11-08 콤팩트 편향 자석

Country Status (7)

Country Link
US (3) US10290463B2 (enExample)
EP (2) EP3396696A1 (enExample)
JP (2) JP2018190709A (enExample)
KR (2) KR20180120603A (enExample)
CN (1) CN108807119B (enExample)
RU (1) RU2693565C1 (enExample)
TW (1) TWI670745B (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10290463B2 (en) 2017-04-27 2019-05-14 Imatrex, Inc. Compact deflecting magnet
US10395887B1 (en) * 2018-02-20 2019-08-27 Technische Universiteit Delft Apparatus and method for inspecting a surface of a sample, using a multi-beam charged particle column
US10504687B2 (en) * 2018-02-20 2019-12-10 Technische Universiteit Delft Signal separator for a multi-beam charged particle inspection apparatus
US11114270B2 (en) * 2018-08-21 2021-09-07 Axcelis Technologies, Inc. Scanning magnet design with enhanced efficiency
DE102019004124B4 (de) 2019-06-13 2024-03-21 Carl Zeiss Multisem Gmbh Teilchenstrahl-System zur azimutalen Ablenkung von Einzel-Teilchenstrahlen sowie seine Verwendung und Verfahren zur Azimut-Korrektur bei einem Teilchenstrahl-System
JP7531067B2 (ja) 2021-12-07 2024-08-08 株式会社日立ハイテク 多極子レンズおよび荷電粒子線装置

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US3622679A (en) 1970-09-29 1971-11-23 Air Reduction Heating system for electron beam furnace
SU370899A1 (ru) 1971-10-26 1979-04-05 Институт Электросварки Им. Е.О. Патона Ан Украинской Сср Установка дл электроннолучевого нагрева материалов
JPS5239124B2 (enExample) * 1972-07-11 1977-10-03
JPS50117727U (enExample) 1974-03-09 1975-09-26
JPS5826616B2 (ja) 1975-08-21 1983-06-03 イケガミ ヒデツグ タキヨクジバソウチ
SU705699A2 (ru) 1976-05-03 1979-12-25 Орденов Ленина И Трудового Красного Знамени Институт Электросварки Им. Е.О.Патона Установка дл электроннолучевого нагрева материалов
US4221937A (en) * 1978-08-10 1980-09-09 Fidelity-Research, Inc. Moving iron type cartridge
DE19631899A1 (de) * 1996-08-07 1998-02-12 Siemens Ag Röntgenröhre
DE19634456A1 (de) * 1996-08-26 1998-03-05 Rainer Dr Spehr Elektronenoptische Linsenanordnung mit spaltförmigem Öffnungsquerschnitt
JP3449198B2 (ja) * 1997-10-22 2003-09-22 日新電機株式会社 イオン注入装置
US6160869A (en) * 1998-10-01 2000-12-12 Imatron, Inc. Chicane magnet focusing system and deflection magnet for a scanning electron beam computed tomography system
DE19903872C2 (de) 1999-02-01 2000-11-23 Siemens Ag Röntgenröhre mit Springfokus zur vergrößerten Auflösung
RU2198485C1 (ru) * 2001-02-13 2003-02-10 Сумский Государственный Университет Многоканальный линейный индукционный ускоритель заряженных частиц
US6933507B2 (en) 2002-07-17 2005-08-23 Kenneth H. Purser Controlling the characteristics of implanter ion-beams
CN103177919B (zh) * 2006-10-13 2016-12-28 皇家飞利浦电子股份有限公司 电子光学设备、x射线发射装置及产生电子束的方法
WO2008115339A1 (en) * 2007-03-15 2008-09-25 White Nicholas R Open-ended electromagnetic corrector assembly and method for deflecting, focusing, and controlling the uniformity of a traveling ion beam
EP2148524B1 (en) * 2008-05-13 2014-10-22 Hosiden Corporation Electroacoustic transducer
DE102013104778A1 (de) * 2013-05-08 2014-11-13 Ruprecht-Karls-Universität Heidelberg Vorrichtung zur Erfassung und Regelung eines durch einen Elektromagneten erzeugten Magnetfelds
JP6227294B2 (ja) * 2013-06-20 2017-11-08 惠州市大亜湾永昶電子工業有限公司 手振れ抑制機能付きレンズ駆動装置
US9620327B2 (en) * 2014-12-26 2017-04-11 Axcelis Technologies, Inc. Combined multipole magnet and dipole scanning magnet
AT516871B1 (de) * 2015-03-05 2018-03-15 Bhm Tech Produktionsgesellschaft M B H Elektromagnetischer Signalwandler für einen Knochenleitungshörer
US9793087B2 (en) 2015-09-10 2017-10-17 Varian Semiconductor Equipment Associates, Inc. Techniques and apparatus for manipulating an ion beam
US10290463B2 (en) 2017-04-27 2019-05-14 Imatrex, Inc. Compact deflecting magnet

Also Published As

Publication number Publication date
KR102088144B1 (ko) 2020-03-11
US10290463B2 (en) 2019-05-14
US20190198286A1 (en) 2019-06-27
RU2693565C1 (ru) 2019-07-03
US20180315578A1 (en) 2018-11-01
US20190259565A1 (en) 2019-08-22
TW201842523A (zh) 2018-12-01
JP7022718B2 (ja) 2022-02-18
US10332718B1 (en) 2019-06-25
EP3396696A1 (en) 2018-10-31
EP3537469A1 (en) 2019-09-11
JP2019149387A (ja) 2019-09-05
JP2018190709A (ja) 2018-11-29
KR20190129786A (ko) 2019-11-20
CN108807119A (zh) 2018-11-13
TWI670745B (zh) 2019-09-01
CN108807119B (zh) 2022-01-21

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