KR20180096728A - 필름 형성 장치 - Google Patents
필름 형성 장치 Download PDFInfo
- Publication number
- KR20180096728A KR20180096728A KR1020187020768A KR20187020768A KR20180096728A KR 20180096728 A KR20180096728 A KR 20180096728A KR 1020187020768 A KR1020187020768 A KR 1020187020768A KR 20187020768 A KR20187020768 A KR 20187020768A KR 20180096728 A KR20180096728 A KR 20180096728A
- Authority
- KR
- South Korea
- Prior art keywords
- processing
- separation wall
- process separation
- wall portion
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 238000000034 method Methods 0.000 claims abstract description 326
- 238000012545 processing Methods 0.000 claims abstract description 320
- 238000000926 separation method Methods 0.000 claims abstract description 295
- 230000008569 process Effects 0.000 claims abstract description 294
- 239000000758 substrate Substances 0.000 claims abstract description 75
- 239000010409 thin film Substances 0.000 claims abstract description 28
- 230000003014 reinforcing effect Effects 0.000 claims description 37
- 238000011144 upstream manufacturing Methods 0.000 claims description 7
- 230000003213 activating effect Effects 0.000 claims description 5
- 238000003825 pressing Methods 0.000 claims description 4
- 238000000151 deposition Methods 0.000 description 75
- 230000008021 deposition Effects 0.000 description 72
- 239000007789 gas Substances 0.000 description 56
- 230000002787 reinforcement Effects 0.000 description 29
- 238000004804 winding Methods 0.000 description 25
- 238000007789 sealing Methods 0.000 description 20
- 238000012423 maintenance Methods 0.000 description 17
- 238000000576 coating method Methods 0.000 description 16
- 239000011248 coating agent Substances 0.000 description 15
- 238000002955 isolation Methods 0.000 description 12
- 238000012546 transfer Methods 0.000 description 7
- 230000009286 beneficial effect Effects 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 238000005192 partition Methods 0.000 description 5
- 230000003068 static effect Effects 0.000 description 5
- 239000003570 air Substances 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 230000033001 locomotion Effects 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 238000001771 vacuum deposition Methods 0.000 description 4
- 230000008901 benefit Effects 0.000 description 3
- 238000005137 deposition process Methods 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 238000005240 physical vapour deposition Methods 0.000 description 3
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000003989 dielectric material Substances 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 2
- 238000005086 pumping Methods 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000012080 ambient air Substances 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000012864 cross contamination Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000000638 solvent extraction Methods 0.000 description 1
- 239000003351 stiffener Substances 0.000 description 1
- 238000002207 thermal evaporation Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4409—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber characterised by sealing means
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
- C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/EP2015/080841 WO2017108081A1 (en) | 2015-12-21 | 2015-12-21 | Film forming apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20180096728A true KR20180096728A (ko) | 2018-08-29 |
Family
ID=55071009
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020187020768A Ceased KR20180096728A (ko) | 2015-12-21 | 2015-12-21 | 필름 형성 장치 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20180363130A1 (enExample) |
| EP (1) | EP3394313A1 (enExample) |
| JP (1) | JP6626977B2 (enExample) |
| KR (1) | KR20180096728A (enExample) |
| CN (1) | CN108474112B (enExample) |
| TW (1) | TWI647743B (enExample) |
| WO (1) | WO2017108081A1 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20210136967A (ko) * | 2019-03-12 | 2021-11-17 | 가부시키가이샤 알박 | 진공 증착 장치 |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6681524B1 (ja) | 2019-03-12 | 2020-04-15 | 株式会社アルバック | 真空蒸着装置 |
| CN110791744A (zh) * | 2019-11-27 | 2020-02-14 | 无锡光润真空科技有限公司 | 分体式多工序真空镀膜装置 |
| CN118497698B (zh) * | 2024-07-19 | 2024-09-17 | 成都国泰真空设备有限公司 | 一种多功能卷绕镀膜机 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB8309324D0 (en) * | 1983-04-06 | 1983-05-11 | Gen Eng Radcliffe | Vacuum coating apparatus |
| EP0122092A3 (en) * | 1983-04-06 | 1985-07-10 | General Engineering Radcliffe Limited | Vacuum coating apparatus |
| DE4207525C2 (de) * | 1992-03-10 | 1999-12-16 | Leybold Ag | Hochvakuum-Beschichtungsanlage |
-
2015
- 2015-12-21 US US16/062,072 patent/US20180363130A1/en not_active Abandoned
- 2015-12-21 EP EP15820514.6A patent/EP3394313A1/en not_active Withdrawn
- 2015-12-21 WO PCT/EP2015/080841 patent/WO2017108081A1/en not_active Ceased
- 2015-12-21 CN CN201580085470.5A patent/CN108474112B/zh active Active
- 2015-12-21 KR KR1020187020768A patent/KR20180096728A/ko not_active Ceased
- 2015-12-21 JP JP2018532098A patent/JP6626977B2/ja active Active
-
2016
- 2016-12-20 TW TW105142199A patent/TWI647743B/zh not_active IP Right Cessation
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20210136967A (ko) * | 2019-03-12 | 2021-11-17 | 가부시키가이샤 알박 | 진공 증착 장치 |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI647743B (zh) | 2019-01-11 |
| US20180363130A1 (en) | 2018-12-20 |
| TW201737318A (zh) | 2017-10-16 |
| CN108474112B (zh) | 2020-06-19 |
| JP2019502025A (ja) | 2019-01-24 |
| EP3394313A1 (en) | 2018-10-31 |
| WO2017108081A1 (en) | 2017-06-29 |
| JP6626977B2 (ja) | 2019-12-25 |
| CN108474112A (zh) | 2018-08-31 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0105 | International application |
Patent event date: 20180718 Patent event code: PA01051R01D Comment text: International Patent Application |
|
| A201 | Request for examination | ||
| PA0201 | Request for examination |
Patent event code: PA02012R01D Patent event date: 20180719 Comment text: Request for Examination of Application |
|
| PG1501 | Laying open of application | ||
| A302 | Request for accelerated examination | ||
| PA0302 | Request for accelerated examination |
Patent event date: 20181219 Patent event code: PA03022R01D Comment text: Request for Accelerated Examination |
|
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20190415 Patent event code: PE09021S01D |
|
| E601 | Decision to refuse application | ||
| PE0601 | Decision on rejection of patent |
Patent event date: 20190821 Comment text: Decision to Refuse Application Patent event code: PE06012S01D Patent event date: 20190415 Comment text: Notification of reason for refusal Patent event code: PE06011S01I |