JP6626977B2 - 膜形成装置及び膜形成方法 - Google Patents

膜形成装置及び膜形成方法 Download PDF

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Publication number
JP6626977B2
JP6626977B2 JP2018532098A JP2018532098A JP6626977B2 JP 6626977 B2 JP6626977 B2 JP 6626977B2 JP 2018532098 A JP2018532098 A JP 2018532098A JP 2018532098 A JP2018532098 A JP 2018532098A JP 6626977 B2 JP6626977 B2 JP 6626977B2
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JP
Japan
Prior art keywords
process separation
separation wall
processing
wall
closure plate
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JP2018532098A
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English (en)
Japanese (ja)
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JP2019502025A5 (enExample
JP2019502025A (ja
Inventor
アンドレアス ザウアー，
アンドレアス ザウアー，
アナベル ホフマン，
アナベル ホフマン，
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
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Applied Materials Inc
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Publication of JP2019502025A5 publication Critical patent/JP2019502025A5/ja
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4409—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber characterised by sealing means
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
JP2018532098A 2015-12-21 2015-12-21 膜形成装置及び膜形成方法 Active JP6626977B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2015/080841 WO2017108081A1 (en) 2015-12-21 2015-12-21 Film forming apparatus

Publications (3)

Publication Number Publication Date
JP2019502025A JP2019502025A (ja) 2019-01-24
JP2019502025A5 JP2019502025A5 (enExample) 2019-04-25
JP6626977B2 true JP6626977B2 (ja) 2019-12-25

Family

ID=55071009

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2018532098A Active JP6626977B2 (ja) 2015-12-21 2015-12-21 膜形成装置及び膜形成方法

Country Status (7)

Country Link
US (1) US20180363130A1 (enExample)
EP (1) EP3394313A1 (enExample)
JP (1) JP6626977B2 (enExample)
KR (1) KR20180096728A (enExample)
CN (1) CN108474112B (enExample)
TW (1) TWI647743B (enExample)
WO (1) WO2017108081A1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6681524B1 (ja) 2019-03-12 2020-04-15 株式会社アルバック 真空蒸着装置
KR102796523B1 (ko) * 2019-03-12 2025-04-16 가부시키가이샤 알박 진공 증착 장치
CN110791744A (zh) * 2019-11-27 2020-02-14 无锡光润真空科技有限公司 分体式多工序真空镀膜装置
CN118497698B (zh) * 2024-07-19 2024-09-17 成都国泰真空设备有限公司 一种多功能卷绕镀膜机

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8309324D0 (en) * 1983-04-06 1983-05-11 Gen Eng Radcliffe Vacuum coating apparatus
EP0122092A3 (en) * 1983-04-06 1985-07-10 General Engineering Radcliffe Limited Vacuum coating apparatus
DE4207525C2 (de) * 1992-03-10 1999-12-16 Leybold Ag Hochvakuum-Beschichtungsanlage

Also Published As

Publication number Publication date
TWI647743B (zh) 2019-01-11
US20180363130A1 (en) 2018-12-20
TW201737318A (zh) 2017-10-16
CN108474112B (zh) 2020-06-19
JP2019502025A (ja) 2019-01-24
EP3394313A1 (en) 2018-10-31
KR20180096728A (ko) 2018-08-29
WO2017108081A1 (en) 2017-06-29
CN108474112A (zh) 2018-08-31

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