KR20180084880A - 패턴 형성용 자기 조직화 조성물 및 패턴 형성 방법 - Google Patents

패턴 형성용 자기 조직화 조성물 및 패턴 형성 방법 Download PDF

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KR20180084880A
KR20180084880A KR1020187016473A KR20187016473A KR20180084880A KR 20180084880 A KR20180084880 A KR 20180084880A KR 1020187016473 A KR1020187016473 A KR 1020187016473A KR 20187016473 A KR20187016473 A KR 20187016473A KR 20180084880 A KR20180084880 A KR 20180084880A
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self
pattern
forming method
organizing composition
pattern forming
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KR1020187016473A
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KR102079018B1 (ko
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카즈요 모리타
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오지 홀딩스 가부시키가이샤
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02Monomers containing only one unsaturated aliphatic radical
    • C08F212/04Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F212/06Hydrocarbons
    • C08F212/08Styrene
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G81/00Macromolecular compounds obtained by interreacting polymers in the absence of monomers, e.g. block polymers
    • C08G81/02Macromolecular compounds obtained by interreacting polymers in the absence of monomers, e.g. block polymers at least one of the polymers being obtained by reactions involving only carbon-to-carbon unsaturated bonds
    • C08G81/024Block or graft polymers containing sequences of polymers of C08C or C08F and of polymers of C08G
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F251/00Macromolecular compounds obtained by polymerising monomers on to polysaccharides or derivatives thereof
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/007After-treatment
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/24Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials for applying particular liquids or other fluent materials
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08BPOLYSACCHARIDES; DERIVATIVES THEREOF
    • C08B37/00Preparation of polysaccharides not provided for in groups C08B1/00 - C08B35/00; Derivatives thereof
    • C08B37/0006Homoglycans, i.e. polysaccharides having a main chain consisting of one single sugar, e.g. colominic acid
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08BPOLYSACCHARIDES; DERIVATIVES THEREOF
    • C08B37/00Preparation of polysaccharides not provided for in groups C08B1/00 - C08B35/00; Derivatives thereof
    • C08B37/0006Homoglycans, i.e. polysaccharides having a main chain consisting of one single sugar, e.g. colominic acid
    • C08B37/0057Homoglycans, i.e. polysaccharides having a main chain consisting of one single sugar, e.g. colominic acid beta-D-Xylans, i.e. xylosaccharide, e.g. arabinoxylan, arabinofuronan, pentosans; (beta-1,3)(beta-1,4)-D-Xylans, e.g. rhodymenans; Hemicellulose; Derivatives thereof
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F216/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical
    • C08F216/12Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical by an ether radical
    • C08F216/14Monomers containing only one unsaturated aliphatic radical
    • C08F216/16Monomers containing no hetero atoms other than the ether oxygen
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G81/00Macromolecular compounds obtained by interreacting polymers in the absence of monomers, e.g. block polymers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G81/00Macromolecular compounds obtained by interreacting polymers in the absence of monomers, e.g. block polymers
    • C08G81/02Macromolecular compounds obtained by interreacting polymers in the absence of monomers, e.g. block polymers at least one of the polymers being obtained by reactions involving only carbon-to-carbon unsaturated bonds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L5/00Compositions of polysaccharides or of their derivatives not provided for in groups C08L1/00 or C08L3/00
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L87/00Compositions of unspecified macromolecular compounds, obtained otherwise than by polymerisation reactions only involving unsaturated carbon-to-carbon bonds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D151/00Coating compositions based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
    • C09D151/006Coating compositions based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers grafted on to block copolymers containing at least one sequence of polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D151/00Coating compositions based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
    • C09D151/02Coating compositions based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers grafted on to polysaccharides
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D187/00Coating compositions based on unspecified macromolecular compounds, obtained otherwise than by polymerisation reactions only involving unsaturated carbon-to-carbon bonds
    • C09D187/005Block or graft polymers not provided for in groups C09D101/00 - C09D185/04
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00Manufacture or treatment of nanostructures
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/16Nitrogen-containing compounds
    • C08K5/34Heterocyclic compounds having nitrogen in the ring
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00Technologies relating to chemical industry
    • Y02P20/50Improvements relating to the production of bulk chemicals
    • Y02P20/54Improvements relating to the production of bulk chemicals using solvents, e.g. supercritical solvents or ionic liquids

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Biochemistry (AREA)
  • Graft Or Block Polymers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Prostheses (AREA)
KR1020187016473A 2015-12-25 2016-09-29 패턴 형성용 자기 조직화 조성물 및 패턴 형성 방법 KR102079018B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2015254986 2015-12-25
JPJP-P-2015-254986 2015-12-25
PCT/JP2016/078785 WO2017110190A1 (ja) 2015-12-25 2016-09-29 パターン形成用自己組織化組成物及びパターン形成方法

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KR20180084880A true KR20180084880A (ko) 2018-07-25
KR102079018B1 KR102079018B1 (ko) 2020-02-19

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US (1) US10982032B2 (ko)
EP (1) EP3395859B1 (ko)
JP (1) JP6801671B2 (ko)
KR (1) KR102079018B1 (ko)
CN (1) CN109071823B (ko)
TW (1) TWI696648B (ko)
WO (1) WO2017110190A1 (ko)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI732825B (zh) * 2016-05-20 2021-07-11 日商王子控股股份有限公司 圖案形成用定向自組裝組成物、圖案形成用定向自組裝組成物用單體及圖案形成方法
US10995234B2 (en) 2016-09-28 2021-05-04 Tokyo Ohka Kogyo Co., Ltd. Method of producing structure containing phase-separated structure
EP3533524A4 (en) * 2016-10-28 2020-07-15 Oji Holdings Corporation PATTERN FORMING METHOD, BASE AGENT AND LAMINATE
SG11202000234PA (en) * 2017-07-13 2020-02-27 Oji Holdings Corp Underlayer film-forming composition, pattern-forming method, and copolymer for forming underlayer film used for pattern formation
JP2019085520A (ja) * 2017-11-09 2019-06-06 東ソー株式会社 ブロック共重合体、細胞培養基材及び細胞培養方法
WO2019163974A1 (ja) * 2018-02-26 2019-08-29 王子ホールディングス株式会社 パターン形成用材料、パターン形成方法及びパターン形成用材料用モノマー
JP7018791B2 (ja) * 2018-03-15 2022-02-14 東京応化工業株式会社 相分離構造を含む構造体の製造方法
FI129347B (en) * 2018-10-23 2021-12-15 Teknologian Tutkimuskeskus Vtt Oy Extraction of valuable components from bark
JP7467915B2 (ja) * 2019-01-16 2024-04-16 王子ホールディングス株式会社 成形材料及び成形体
CN112724737B (zh) * 2021-01-14 2022-02-22 中山大学 一种多巴胺墨水及其用于制备微纳图案的方法和应用
CN113817472B (zh) * 2021-11-23 2022-02-11 绍兴拓邦电子科技有限公司 一种太阳能电池硅片的制绒工艺

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20100123920A (ko) * 2008-03-21 2010-11-25 마이크론 테크놀로지, 인크. 이온성 액체를 이용하여 블록 공중합체 필름의 자기조립에서 장거리 질서를 개선하는 방법
US20120264214A1 (en) * 2010-10-27 2012-10-18 Empire Technology Development Llc Biocompatible polymerizable acrylate products and methods
JP2014005325A (ja) 2012-06-21 2014-01-16 Jsr Corp パターン形成用自己組織化組成物及びパターン形成方法
KR20140041773A (ko) * 2011-06-21 2014-04-04 보드 오브 리전츠, 더 유니버시티 오브 텍사스 시스템 리소그래피 적용을 위한 올리고당/규소 함유 블록 공중합체

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5484802A (en) 1977-12-19 1979-07-06 Agency Of Ind Science & Technol Masking of coexisting iron ion in froth treatment method
US6833488B2 (en) 2001-03-30 2004-12-21 Exotech Bio Solution Ltd. Biocompatible, biodegradable, water-absorbent material and methods for its preparation
JP2003048901A (ja) * 2001-08-09 2003-02-21 Oji Paper Co Ltd 長鎖キシロオリゴ糖組成物およびその製造方法
WO2006099541A2 (en) * 2005-03-15 2006-09-21 Richard Daniel Carliss Therapeutic wound care product
JP2007314585A (ja) * 2006-05-23 2007-12-06 Oji Paper Co Ltd オリゴ糖の製造方法
JP5410061B2 (ja) * 2008-10-03 2014-02-05 東京応化工業株式会社 パターン微細化用被覆剤、及びそれを用いた微細パターンの形成方法
FR2963355B1 (fr) * 2010-07-30 2013-07-12 Centre Nat Rech Scient Films minces nanoorganises a base de copolymeres a blocs polysaccharidiques pour des applications en nanotechnologie.
JP2012100546A (ja) 2010-11-08 2012-05-31 Oji Paper Co Ltd キシロオリゴ糖および酸性キシロオリゴ糖の製造方法
WO2012071004A1 (en) 2010-11-23 2012-05-31 Ecohelix Hb A method to increase the molecular weight of wood mannans and xylans comprising aromatic moieties
JP2012180424A (ja) 2011-02-28 2012-09-20 Univ Of Tokyo キシラン誘導体前駆体、キシラン誘導体、キシラングラフトコポリマー、及びこれらの製造方法、並びに、ポリマー成形体
JP6120590B2 (ja) 2013-02-01 2017-04-26 国立大学法人京都大学 変性ナノセルロース及び変性ナノセルロースを含む樹脂組成物

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20100123920A (ko) * 2008-03-21 2010-11-25 마이크론 테크놀로지, 인크. 이온성 액체를 이용하여 블록 공중합체 필름의 자기조립에서 장거리 질서를 개선하는 방법
US20120264214A1 (en) * 2010-10-27 2012-10-18 Empire Technology Development Llc Biocompatible polymerizable acrylate products and methods
KR20140041773A (ko) * 2011-06-21 2014-04-04 보드 오브 리전츠, 더 유니버시티 오브 텍사스 시스템 리소그래피 적용을 위한 올리고당/규소 함유 블록 공중합체
JP2014005325A (ja) 2012-06-21 2014-01-16 Jsr Corp パターン形成用自己組織化組成物及びパターン形成方法

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
B. Ke et al.. Controlled synthesis of linear and comb-like glycopolymers for preparation of honeycomb-patterned films. Polymer. Elsevier Ltd.. 2010, Vol. 51, pp. 2168-2176* *
도시바 리뷰 Vol 67 No.4 2012 p44-47

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Publication number Publication date
JPWO2017110190A1 (ja) 2018-10-11
EP3395859A4 (en) 2019-09-18
JP6801671B2 (ja) 2020-12-16
US10982032B2 (en) 2021-04-20
US20180362692A1 (en) 2018-12-20
KR102079018B1 (ko) 2020-02-19
CN109071823B (zh) 2021-03-23
TWI696648B (zh) 2020-06-21
TW201736447A (zh) 2017-10-16
WO2017110190A1 (ja) 2017-06-29
CN109071823A (zh) 2018-12-21
EP3395859A1 (en) 2018-10-31
EP3395859B1 (en) 2020-11-18

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